JP2009214193A - Processing waste liquid treatment device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a processing waste liquid treatment device capable of always maintaining a processing liquid circulated through a processing device and a processing waste liquid treatment device in an adequate range. <P>SOLUTION: The processing waste liquid treatment device is provided with: a waste liquid filtration means for purifying the processing waste liquid produced by processing of the processing liquid fed by a processing liquid feed means at processing of a processing device to clear water; a clear water storage tank for storing the clear water; a pipe for circulating pure water to the processing liquid feed means; and a control means for controlling the respective constitution means, and is provided with a clear water level detection means for detecting a water level of the clear water stored in the clear water storage tank; and a water replenishing means for replenishing water to the clear water storage tank. The control means operates the water replenishing means and replenishes water to the clear water storage tank based on a detection signal from the clear water level detection means if the water level of the clear water stored in the clear water storage tank is a first water level or less, and stops operation of the water replenishing means if the water level of the clear water stored in the clear water storage tank reaches to a second water lever or more higher than the first water level after replenishment of water by the water replenishing means is started. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a processing waste liquid processing apparatus that is attached to a processing apparatus such as a cutting apparatus that cuts a workpiece such as a semiconductor wafer and processes a waste liquid of a processing liquid supplied during processing.

  In the semiconductor device manufacturing process, a plurality of regions are partitioned by dividing lines called streets arranged in a lattice pattern on the surface of a substantially wafer-shaped semiconductor wafer, and devices such as ICs, LSIs, etc. are partitioned in the partitioned regions. Form. Then, the semiconductor wafer is cut along the streets to divide the region in which the device is formed to manufacture individual semiconductor devices. In addition, optical device wafers with gallium nitride compound semiconductors laminated on the surface of a sapphire substrate are also divided into individual optical devices such as light emitting diodes and laser diodes by cutting along the streets, and are widely used in electrical equipment. ing.

  Cutting along the streets of the above-described semiconductor wafer, optical device wafer or the like is usually performed by a cutting device called a dicer. This cutting apparatus includes a chuck table for holding a workpiece such as a semiconductor wafer, a cutting means having a cutting blade for cutting the workpiece held on the chuck table, and supplying processing water to the cutting blade. A cutting water supply means for cooling the cutting blade by supplying the cutting water to the cutting blade that rotates, and supplying the cutting water to the cutting portion of the workpiece by the cutting blade. Carry out cutting work.

As described above, cutting waste generated by cutting silicon or a gallium nitride compound semiconductor is mixed in the machining fluid supplied at the time of cutting. Since the processing waste liquid mixed with the cutting waste made of the semiconductor material contaminates the environment, it is reused or discarded after the cutting waste is removed by using the processing waste liquid processing apparatus. (For example, refer to Patent Document 1.)
Japanese Patent Laid-Open No. 2004-230527

  The processing waste liquid treatment apparatus includes a waste liquid storage tank that stores a processing waste liquid generated by the processing liquid supplied during processing of the processing apparatus, and a pump that feeds the processing waste liquid stored in the waste liquid storage tank. And a waste liquid filtering means for filtering the processing waste liquid fed by the pump and refining it into fresh water, a fresh water storage tank for storing fresh water purified by the waste liquid filtration means, and a fresh water stored in the fresh water storage tank A pure water supply pump for supplying pure water, a pure water generating means including an ion exchange means for purifying the pure water supplied by the fresh water supply pump into pure water, and purified water purified by the pure water generating means. Pure water temperature adjusting means for adjusting to a predetermined temperature, and configured to circulate pure water adjusted to a predetermined temperature by the pure water temperature adjusting means to the processing liquid supply means of the processing apparatus. There.

Thus, since the processing liquid circulating through the processing apparatus and the processing waste liquid treatment apparatus is gradually reduced by evaporation or the like, it needs to be replenished.
In addition, processing waste liquid contains organic carbon released from dicing tape and synthetic resin hoses that hold workpieces such as wafers, and this organic carbon gradually increases as the processing waste liquid circulates. There is a problem that the quality of the wafer is deteriorated when organic carbon of a predetermined amount or more adheres to the wafer. Since organic carbon contained in this processing waste liquid is at the molecular level, it cannot be captured even by a precise filter.

The present invention has been made in view of the above facts, and a first technical problem thereof is a processing waste liquid treatment apparatus capable of always maintaining the amount of the processing liquid circulating through the processing apparatus and the processing waste liquid treatment apparatus within an appropriate range. Is to provide.
Moreover, the second technical problem of the present invention is to provide a processing waste liquid treatment apparatus capable of maintaining the organic carbon content in the processing liquid circulating in the processing apparatus and the processing waste liquid treatment apparatus at a predetermined level or less. It is in.

In order to solve the first technical problem, according to the present invention, a waste liquid storage tank for storing a processing waste liquid generated by processing a processing liquid supplied by a processing liquid supply means at the time of processing of a processing apparatus; A pump that feeds the processing waste liquid stored in the waste liquid storage tank, a waste liquid filtering means that filters the processing waste liquid fed by the pump and purifies it into fresh water, and stores fresh water purified by the waste liquid filtering means A fresh water storage tank, a fresh water feed pump for feeding fresh water stored in the fresh water storage tank, a pure water generating means for purifying the fresh water fed by the fresh water feed pump into pure water, and the pure water Pure water temperature adjusting means for adjusting the pure water purified by the water generating means to a predetermined temperature, and piping for circulating the pure water adjusted to the predetermined temperature by the pure water temperature adjusting means to the processing liquid supply means; ,the above In the processing waste liquid processing device and a control means for controlling the configuration unit,
A fresh water level detection means for detecting the level of fresh water stored in the fresh water storage tank and sending a detection signal to the control means; and a water supply means for supplying water to the fresh water storage tank,
The control means activates the water replenishing means based on the detection signal from the fresh water level detection means and operates the water replenishing means if the fresh water level stored in the fresh water storage tank is equal to or lower than the first water level. When the water level of the fresh water stored in the fresh water storage tank reaches a second water level higher than the first water level after replenishing the water storage tank and starting the water supply by the water supply means Stop the operation of the water supply means and stop the supply of water to the fresh water storage tank;
A processing waste liquid treatment apparatus is provided.

In order to solve the second technical problem, according to the present invention, a waste liquid storage tank for storing a processing waste liquid generated by processing a processing liquid supplied by a processing liquid supply means during processing of the processing apparatus. A pump for feeding the processing waste liquid stored in the waste liquid storage tank, a waste liquid filtering means for filtering the processing waste liquid fed by the pump and purifying it into fresh water, and a purified water purified by the waste liquid filtering means A fresh water storage tank that stores the fresh water, a fresh water feed pump that feeds the fresh water stored in the fresh water storage tank, and a pure water generating means that purifies the fresh water fed by the fresh water feed pump into pure water, Pure water temperature adjusting means for adjusting pure water purified by the pure water generating means to a predetermined temperature, and pure water adjusted to a predetermined temperature by the pure water temperature adjusting means are circulated to the processing liquid supply means. Piping and In the processing waste liquid processing device and a control means for controlling the respective constituent unit,
A total organic carbon meter disposed in a path from the pure water generating means to the processing liquid supply means and detecting the organic carbon content contained in the pure water and sending a detection signal to the control means; and Water replenishment means for replenishing water to the fresh water storage tank,
The control means operates the water supply means if the organic carbon content contained in the pure water is equal to or higher than the first content based on the detection signal from the total organic carbon meter. The fresh water storage tank is replenished with water, and after the replenishment of water by the water replenishing means is started, the organic carbon content contained in the pure water is lower than the first content, but less than the second content The water supply means is stopped to stop water supply to the fresh water storage tank
A processing waste liquid treatment apparatus is provided.

Furthermore, in order to solve the second technical problem, according to the present invention, a waste liquid storage tank that stores a processing waste liquid generated by processing using a processing liquid supplied by a processing liquid supply means during processing of the processing apparatus. A pump for feeding the processing waste liquid stored in the waste liquid storage tank, a waste liquid filtering means for filtering the processing waste liquid fed by the pump and purifying it into fresh water, and a purified water purified by the waste liquid filtering means A fresh water storage tank that stores the fresh water, a fresh water feed pump that feeds the fresh water stored in the fresh water storage tank, and a pure water generating means that purifies the fresh water fed by the fresh water feed pump into pure water, Pure water temperature adjusting means for adjusting pure water purified by the pure water generating means to a predetermined temperature, and pure water adjusted to a predetermined temperature by the pure water temperature adjusting means are circulated to the processing liquid supply means. Piping and In the processing waste liquid processing device and a control means for controlling the respective constituent unit,
A flow accumulator arranged in a path from the pure water generating means to the machining fluid supply means and integrating the pure water flow rate and sending the flow integrated value to the control means; and water replenishment for replenishing the fresh water storage tank Means,
The control means operates the water supply means to supply water to the fresh water storage tank when the integrated value of the pure water flow reaches the first integrated value or more based on the detection signal from the flow integrating meter. When the integrated value of the pure water flow reaches the second integrated value or more after starting the water supply by the water supply means, the operation of the water supply means is stopped and the fresh water storage tank is supplied with water. Stop,
A processing waste liquid treatment apparatus is provided.

In the processing waste liquid treatment apparatus according to the present invention, when the water level detected by the fresh water level detection means reaches the first water level or lower, the water supply means is operated to supply water to the fresh water storage tank, and the water supply means If the water level detected by the fresh water level detection means after the start of water supply reaches the second water level or higher, the operation of the water supply means is stopped and the water supply to the fresh water storage tank is stopped. The amount of machining fluid stored in the fresh water storage tank is always maintained within an appropriate range.
In the processing waste liquid treatment apparatus according to the present invention, the water supply means is activated when the organic carbon content in the pure water detected by the total organic carbon meter reaches the first content or higher. The water content of the organic carbon contained in the pure water detected by the total organic carbon meter after replenishing the fresh water storage tank and starting the water replenishment by the water replenishing means is greater than the first content rate. If the water content is low but below the second content, the water supply means stops operating and the water supply to the fresh water storage tank stops, so the organic carbon content in the pure water is the quality of the wafer. Is maintained within a range that does not affect
Further, in the processing waste liquid treatment apparatus according to the present invention, when the integrated value of the flow rate of pure water detected by the flow rate accumulator reaches the first integrated value or more, the water replenishing means is operated to supply water to the fresh water storage tank. When the integrated value of the pure water flow detected by the flow accumulator reaches the second integrated value or less after the water replenishing means starts supplying water, the operation of the water replenishing means is stopped. Since the supply of water to the fresh water storage tank is stopped, the organic carbon content in the pure water is maintained in a range that does not affect the quality of the wafer.

  DESCRIPTION OF EMBODIMENTS Hereinafter, preferred embodiments of a processing waste liquid treatment apparatus configured according to the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a perspective view of a processing waste liquid processing apparatus according to the present invention disposed adjacent to a cutting apparatus as a processing apparatus.
The cutting device 2 as a processing device includes a device housing 20 having a substantially rectangular parallelepiped shape. A chuck table 21 that holds a workpiece is disposed in the apparatus housing 20 so as to be movable in a direction indicated by an arrow X that is a cutting feed direction. The chuck table 21 sucks and holds a workpiece on a holding surface which is an upper surface by operating a suction means (not shown). Further, the chuck table 21 is configured to be rotatable by a rotation mechanism (not shown). The chuck table 21 is provided with a clamp 211 for fixing an annular frame that supports a wafer, which will be described later, as a workpiece via a dicing tape. The chuck table 21 configured as described above can be moved in a cutting feed direction indicated by an arrow X by a cutting feed means (not shown).

  A cutting apparatus 2 shown in FIG. 1 includes a spindle unit 22 as cutting means. The spindle unit 22 is moved in the index feed direction indicated by an arrow Y in FIG. 1 by an index feed means (not shown), and is moved in the cut feed direction indicated by an arrow Z in FIG. 1 by a notch feed means (not shown). ing. The spindle unit 22 is mounted on a moving base (not shown) and is adjusted to move in a direction indicated by an arrow Y that is an indexing direction and a direction indicated by an arrow Z that is a cutting direction, and the spindle housing 221 is freely rotatable. And a cutting blade 223 attached to the front end portion of the rotating spindle 222. A blade cover 224 that covers the upper half of the cutting blade 223 is attached to the front end of the spindle housing 221, and a machining fluid supply nozzle 225 that injects a machining fluid toward the cutting blade 223 on the blade cover 224. It is arranged. The machining liquid supply nozzle 225 is connected to a machining liquid supply unit (not shown).

  The cutting apparatus 2 shown in FIG. 1 includes an image pickup means 23 for picking up an image of the surface of the workpiece held on the chuck table 21 and detecting a region to be cut by the cutting blade 223. The imaging means 23 is composed of optical means such as a microscope and a CCD camera. A cassette placement table 24 for placing a cassette that accommodates a workpiece is disposed in the cassette placement region 24 a of the apparatus housing 20. This cassette mounting table 24 is configured to be movable in the vertical direction by lifting means (not shown). On the cassette mounting table 24, a cassette 25 for storing a semiconductor wafer W as a workpiece is placed. The semiconductor wafer W accommodated in the cassette 25 has a grid-like street formed on the surface, and devices such as ICs and LSIs are formed in a plurality of rectangular areas partitioned by the grid-like street. The semiconductor wafer W formed in this way is accommodated in the cassette 25 with the back surface adhered to the front surface of the dicing tape T mounted on the annular support frame F.

  Further, the cutting apparatus 2 in the illustrated embodiment is supported by a semiconductor wafer W (an annular frame F supported by a dicing tape T) accommodated in a cassette 25 placed on a cassette placement table 24. ) On the temporary table 26, first conveying means 28 for conveying the semiconductor wafer W carried on the temporary table 26 onto the chuck table 21, and cutting on the chuck table 21. A cleaning means 29 for cleaning the processed semiconductor wafer W and a second transfer means 290 for transferring the semiconductor wafer W cut on the chuck table 21 to the cleaning means 29 are provided.

The cutting device 2 shown in FIG. 1 is configured as described above, and its operation will be briefly described below.
The semiconductor wafer W (supported by the annular frame F via the dicing tape T) accommodated in a predetermined position of the cassette 25 placed on the cassette placement table 24 is transferred to the cassette by an elevating means (not shown). The mounting table 24 is positioned at the carry-out position by moving up and down. Next, the unloading means 27 moves forward and backward to unload the semiconductor wafer W positioned at the unloading position onto the temporary placement table 26. The semiconductor wafer W carried out to the temporary placement table 26 is transferred onto the chuck table 21 by the turning operation of the first transfer means 28. When the semiconductor wafer W is placed on the chuck table 21, suction means (not shown) is operated to suck and hold the semiconductor wafer W on the chuck table 21. The annular frame F that supports the semiconductor wafer W via the dicing tape T is fixed by the clamp 211. In this way, the chuck table 21 holding the semiconductor wafer W is moved to just below the imaging means 23. When the chuck table 21 is positioned immediately below the image pickup means 23, the street formed on the semiconductor wafer W is detected by the image pickup means 23, and the spindle unit 22 is moved and adjusted in the direction of the arrow Y, which is the indexing direction. A precision alignment operation with the blade 223 is performed.

  After that, the cutting blade 223 is cut and fed by a predetermined amount in the direction indicated by the arrow Z and rotated in the predetermined direction, while the chuck table 21 holding the semiconductor wafer W is sucked and held in the direction indicated by the arrow X (cutting blade 223). The semiconductor wafer W held on the chuck table 21 is cut along a predetermined street by the cutting blade 223 (cutting process). In this cutting process, the machining fluid supply means (not shown) is operated to eject the machining fluid from the machining fluid supply nozzle 225 toward the machining portion by the cutting blade 223. When the semiconductor wafer W is cut along a predetermined street in this way, the chuck table 21 is indexed and fed in the direction indicated by the arrow Y by the street interval, and the above-described cutting process is performed. When the cutting process is performed along all the streets extending in a predetermined direction of the semiconductor wafer W, the chuck table 21 is rotated 90 degrees to extend in a direction orthogonal to the predetermined direction of the semiconductor wafer W. By performing the cutting process along the streets, all the streets formed in a lattice shape on the semiconductor wafer W are cut and divided into individual chips. Note that the divided chips do not fall apart due to the action of the dicing tape T, but are supported by the annular frame F to maintain the wafer state.

  As described above, when the cutting process is completed along the street of the semiconductor wafer W, the chuck table 21 holding the semiconductor wafer W is first returned to the position where the semiconductor wafer W is sucked and held. Then, the suction holding of the semiconductor wafer W is released. Next, the semiconductor wafer W is transferred to the cleaning unit 29 by the second transfer unit 290. The semiconductor wafer W conveyed to the cleaning means 29 is cleaned and dried here. The semiconductor wafer W thus cleaned and dried is transferred to the temporary placement table 26 by the first transfer means 28. Then, the semiconductor wafer W is stored in a predetermined position of the cassette 25 by the unloading / loading means 27.

  In the cutting process described above, the machining fluid sprayed from the machining fluid supply nozzle 225 to the machining portion by the cutting blade 223 by the machining fluid supply means (not shown) is recovered as machining waste liquid after cooling the cutting blade 223 and the machining portion, The processed waste liquid treatment apparatus 10 disposed adjacent to the apparatus 2 is purified to pure water and reused. The processing waste liquid treatment apparatus 10 will be described with reference to FIGS. 1 to 3.

  The processing waste liquid treatment apparatus 10 in the illustrated embodiment includes an apparatus housing 100, and the components of the processing waste liquid treatment apparatus are disposed in the apparatus housing 100. A first embodiment of the components of the processing waste liquid treatment apparatus disposed in the apparatus housing 100 will be described with reference to FIG.

  FIG. 2 shows components of the processing waste liquid treatment apparatus configured according to the present invention in accordance with the flow of the processing waste liquid. The processing waste liquid treatment apparatus 10 in the illustrated embodiment is a waste liquid tank that stores a processing waste liquid generated by processing with a processing liquid supplied from a processing liquid supply nozzle 225 to a processing portion by a cutting blade 223 during processing in the cutting apparatus 2. 3 and a waste liquid feed pump 30 that feeds the processing waste liquid stored in the waste liquid tank 3. The waste liquid tank 3 is connected by piping 31 to the processing waste liquid delivery means provided in the cutting device 2. Therefore, the processing liquid waste sent from the processing liquid discharge means provided in the cutting device 2 is introduced into the liquid waste tank 3 through the pipe 31. A waste liquid feed pump 30 for feeding the processing waste liquid to the upper wall of the waste liquid tank 3 is disposed.

  The processing waste liquid fed by the waste liquid feed pump 30 is sent to the waste liquid filtering means 4 through a pipe 32 made of a flexible hose. The waste liquid filtering means 4 includes a fresh water receiving pan 41 and a first filter 42 a and a second filter 42 b disposed on the fresh water receiving pan 41. The first filter 42 a and the second filter 42 b are detachably disposed on the fresh water receiving pan 41. Note that an electromagnetic on-off valve 43a and an electromagnetic on-off valve 43b are disposed on the pipe 32 connecting the waste liquid feed pump 30 to the first filter 42a and the second filter 42b. When the electromagnetic on-off valve 43a is energized (ON) and opened, the processing waste liquid fed by the waste liquid feed pump 30 is introduced into the first filter 42a, and when the electromagnetic on-off valve 43b is energized (ON) and opened. The processing waste liquid fed by the waste liquid feed pump 30 is introduced into the second filter 42b. The processing waste liquid introduced into the first filter 42a and the second filter 42b is filtered by the first filter 42a and the second filter 42b, and the cutting waste mixed in the processing waste liquid is captured and purified into fresh water. It flows out into the fresh water receiving pan 41. The fresh water receiving pan 41 is connected to the fresh water storage tank 5 by a pipe 44 made of a flexible hose. Therefore, the fresh water flowing out to the fresh water receiving pan 41 is sent to the fresh water storage tank 5 through the pipe 44 made of a flexible hose and stored. Is done.

  The pipe 32 is provided with pressure detection means 33 for detecting the pressure of the processing waste liquid supplied to the first filter 42 a and the second filter 42 b of the waste liquid filtering means 4, and this pressure detection means 33. Sends a detection signal to the control means described later. For example, if the detection signal from the pressure detection means 33 reaches a predetermined pressure value or more in a state where the electromagnetic on-off valve 43a is energized (ON) and the processing waste liquid is filtered by the first filter 42a, The control means to be described later determines that the processing waste has accumulated on the first filter 42a and has lost its function as a filter, and deenergizes (OFF) the electromagnetic open / close valve 43a and energizes (ON) the electromagnetic open / close valve 43b. ) And the control means mentioned later displays on the display means provided in the operation panel mentioned later that it switched from the 1st filter 42a to the 2nd filter 42b. Thus, based on the message displayed on the display means, the operator can sense that the first filter 42a has reached the end of its life and replace the filter. Further, when the electromagnetic on / off valve 43b is energized (ON) and the processing waste liquid is filtered by the second filter 42b, if the detection signal from the pressure detecting means 33 reaches a predetermined pressure value or more, The control means which will be described later judges that the processing waste has accumulated on the second filter 42b and has lost its function as a filter, and deenergizes (OFF) the electromagnetic on / off valve 43b and energizes (ON) the electromagnetic on / off valve 43a. ) And the control means mentioned later displays on the display means provided in the operation panel mentioned later that it switched from the 2nd filter 42b to the 1st filter 42a.

  The fresh water sent from the waste liquid filtering means 4 through the pipe 44 made of a flexible hose and stored in the fresh water storage tank 5 is fed by the fresh water feed pump 50 and is supplied with pure water through the pipe 51 made of the flexible hose. 6 is sent. The pure water generating means 6 in the illustrated embodiment includes a support base 61, a partition plate 611 erected on the support base 61, and an ultraviolet irradiation means 62 disposed on the rear side of the partition plate 611 in the support base 61. The first ion exchanging means 63a and the second ion exchanging means 63b provided with an ion exchange resin arranged on the front side of the partition plate 611 in the support base 61, and the rear side of the partition plate 611 in the support base 61. A precision filter 64 is provided. The first ion exchange means 63a, the second ion exchange means 63b, and the precision filter 64 are detachably disposed on the support base 61. The fresh water fed by the fresh water feed pump 50 and sent through the pipe 51 made of a flexible hose is introduced into the ultraviolet irradiation means 62 where it is sterilized by being irradiated with ultraviolet rays (UV). The fresh water sterilized by the ultraviolet irradiation means 62 is introduced into the first ion exchange means 63a or the second ion exchange means 63b via the pipe 65. The pipe 65 is provided with an electromagnetic on-off valve 66a and an electromagnetic on-off valve 66b. When the electromagnetic on-off valve 66a is energized (ON) and opened, the sterilized fresh water is introduced into the first ion exchange means 63a, and when the electromagnetic on-off valve 66b is energized (ON) and opened, the sterilized fresh water is introduced. Is introduced into the second ion exchange means 63b. The fresh water introduced into the first ion exchange means 63a or the second ion exchange means 63b is purified to pure water by exchanging ions. The purified water purified by ion exchange in this way is mixed with fine substances such as resin waste of ion exchange resin constituting the first ion exchange means 63a and the second ion exchange means 63b. There may be. For this reason, in the illustrated embodiment, the pure water purified by the ion exchange of the fresh water by the first ion exchange means 63a and the second ion exchange means 63b is supplied to the precision filter 64 through the pipe 67 as described above. The fine filter 64 is used to capture fine substances such as resin waste of ion exchange resin mixed in pure water.

  The pipe 67 is provided with a pressure detection means 68 for detecting the pressure of pure water fed from the first ion exchange means 63a and the second ion exchange means 63b to the precision filter 64, The pressure detection means 68 sends a detection signal to the control means described later. For example, if the detection signal from the pressure detection means 68 reaches a predetermined pressure value or more, the control means described later determines that a fine substance such as resin waste has accumulated on the precision filter 64 and the filter function has been lost. And it displays on the display means provided in the operation panel mentioned later. Thus, based on the message displayed on the display means, the operator can sense that the precision filter 64 has reached the end of its life and replace the filter.

  The pipe 67 is provided with a specific resistance meter 69 for detecting the specific resistance of pure water supplied to the precision filter 64 from the first ion exchange means 63a or the second ion exchange means 63b. The specific resistance meter 69 sends a detection signal to the control means described later. In a state where the electromagnetic switching valve 66a is energized (ON) and fresh water is purified to pure water by the first ion exchange means 63a, the control means to be described later has a detection signal from the resistivity meter 69 of a predetermined value. If it has reached (for example, 10 MΩ · cm) or less, the control means described later determines that the pure water purification capacity by the first ion exchange means 63a has declined, and deenergizes (OFF) the electromagnetic on-off valve 66a, The electromagnetic on-off valve 66b is energized (ON). And the control means mentioned later displays on the display means provided in the operation panel mentioned later that it switched from the 1st ion exchange means 63a to the 2nd ion exchange means 63b. Thus, based on the message displayed on the display means, the operator can sense that the first ion exchange means 63a has reached the end of its life, and can exchange the ion exchange resin of the first ion exchange means 63a. In addition, when the electromagnetic on-off valve 66b is energized (ON) and the purified water is purified to pure water by the second ion exchange means 63b, the detection signal from the resistivity meter 69 is a predetermined value (for example, 10 MΩ · cm) or less, the control means to be described later determines that the pure water purifying capacity of the second ion exchange means 63b has declined, and deenergizes (OFF) the electromagnetic on-off valve 66b to turn off the electromagnetic on-off valve 66a. Energize (ON). And the control means mentioned later displays on the display means provided in the operation panel mentioned later that it switched from the 2nd ion exchange means 63b to the 1st ion exchange means 63a.

  The pure water purified by the pure water generating means 6 is sent to the pure water temperature adjusting means 7 through a pipe 60 made of a flexible hose. The pure water sent to the pure water temperature adjusting means 7 is adjusted to a predetermined temperature (for example, 23 ° C.) and circulated through the piping 70 to the machining fluid supply means equipped in the cutting apparatus 2.

  Continuing the description with reference to FIG. 2, the processing waste liquid treatment apparatus 10 in the illustrated embodiment includes fresh water level detection means 52 that detects the level of fresh water stored in the fresh water storage tank 5. The fresh water level detection means 52 sends a detection signal to the control means described later. Further, the processing waste liquid treatment apparatus 10 in the illustrated embodiment includes a water supply means 55 for supplying water to the fresh water storage tank 5. The water replenishing means 55 is controlled by a control means, which will be described later, to which a detection signal sent from the fresh water level detecting means 52 is input, and replenishes the fresh water storage tank 5 through a pipe 56. The water supplied to the fresh water storage tank 5 by the water supply means 55 may be city water.

  The waste liquid tank 3, the waste liquid filtering means 4, the pure water generating means 6, the pure water temperature adjusting means 7, each pipe and the like are arranged in the apparatus housing 100 shown in FIGS. 1 and 3. 3 is a perspective view of each wall, which will be described later, constituting the apparatus housing 100. In the apparatus housing 100, the waste liquid tank 3, the waste liquid filtering means 4, the pure water generating means 6, the pure water temperature adjusting means 7, each piping, etc. The state in which is arranged is shown. The apparatus housing 100 in the illustrated embodiment includes a frame 110 that forms a rectangular parallelepiped storage chamber, a bottom wall 121, an upper wall 122, a left wall 123, a right wall 124, and a rear wall 125 that are attached to the frame 110. And an opening / closing door 126 that is mounted on the front side of the frame body 110 and opens and closes the front opening 101 formed on the front side of the frame body 110.

  The waste liquid tank 2, the fresh water storage tank 5, and the pure water generating means 6 are disposed on the bottom wall 121 of the apparatus housing 100 configured as described above. The waste liquid tank 3 is disposed on the rear wall 125 side of the bottom wall 121 of the apparatus housing 100, the fresh water storage tank 5 is disposed in the center of the bottom wall 121 adjacent to the waste liquid tank 3, and the pure water generating means 6 is a fresh water storage unit. Adjacent to the tank 5, the bottom wall 121 is disposed on the front opening 101 side (opening / closing door 126 side).

  In the illustrated embodiment, the pure water generating means 6 is arranged so as to be drawn out through the front opening 101 of the apparatus housing 100. That is, a pair of guide rails 130, 130 arranged opposite to each other and extending in the front-rear direction in parallel with the upper surface of the bottom wall 121 are arranged at the lower ends of the inner surfaces of the left wall 123 and the right wall 124 constituting the apparatus housing 100. It is installed. By placing the support 61 of the pure water generating means 6 on the pair of guide rails 130, 130, the pure water generating means 6 passes through the front opening 101 of the apparatus housing 100 along the pair of guide rails 130, 130. It is supported so that it can be pulled out. Therefore, the first ion exchange disposed on the support base 61 constituting the pure water generating means 6 by pulling the pure water generating means 6 along the pair of guide rails 130 and 130 through the front opening 101 of the apparatus housing 100. The precision filter 64 can be easily replaced with the means 63a and the second ion exchange means 63b.

  In the processing waste liquid treatment apparatus 10 in the illustrated embodiment, the waste liquid filtering means 4 is disposed on the upper side of the pure water generating means 6 and the fresh water storage tank 5 in the apparatus housing 100 so as to be able to be drawn out through the front opening 101 of the apparatus housing 100. Has been. That is, the inner surfaces of the left wall 123 and the right wall 124 constituting the apparatus housing 100 are arranged opposite to each other and parallel to the upper surface of the bottom wall 121 (parallel to the pair of guide rails 130 and 130). A pair of guide rails 140, 140 extending in the direction are disposed. By placing the fresh water receiving pan 41 of the waste liquid filtering means 4 on the pair of guide rails 140, 140, the waste liquid filtering means 4 is pulled out through the front opening 101 of the apparatus housing 100 along the pair of guide rails 140, 140. Supported as possible. In order to facilitate the operation of pulling out the waste liquid filtering means 4, a handle 411 protruding downward is provided at the front end of the fresh water receiving pan 41 constituting the waste liquid filtering means 4. Accordingly, by pulling out the waste liquid filtering means 4 along the pair of guide rails 140 and 140 through the front opening 101 of the apparatus housing 100, the first is disposed detachably on the fresh water receiving pan 41 constituting the waste liquid filtering means 4. The filter 42a and the second filter 42b can be easily exchanged. Since the waste liquid filtering means 4 is arranged in such a manner that it can be drawn out, the pipe connecting the fresh water receiving pan 41 of the waste liquid filtering means 4 and the fresh water storage tank 5 is connected by a pipe 44 made of a flexible hose. .

  As described above, in connection with the connection between the fresh water receiving pan 41 of the waste liquid filtering means 4 and the fresh water storage tank 5 by the pipe 44 formed of a flexible hose, the rear wall 125 side of the waste liquid filtering means 4 in the apparatus housing 100 is connected. Is provided with a hose support plate 150 for supporting a pipe 44 made of a flexible hose. The hose support plate 150 is configured to be inclined so as to increase toward the rear wall 125 side and to increase toward the right wall 124 side, and the pipe 44 made of a flexible hose is caused by its own weight. The pipe 44 made of a flexible hose is prevented from being bent downward so that the fresh water receiving pan 41 side is always positioned at a high position. Therefore, the fresh water that has flowed out into the fresh water receiving pan 41 can flow into the fresh water storage tank 5 through the piping 44 made of a flexible hose by its own weight.

  In the processing waste liquid treatment apparatus 10 in the illustrated embodiment, the pure water temperature adjusting means 7 is disposed above the hose support plate 150 in the apparatus housing 100. That is, the pure water temperature adjusting means 7 is placed on a support member (not shown) mounted on the left side wall 123 and the right side wall 124 constituting the apparatus housing 100 and fixed by an appropriate fixing means.

  A processing waste liquid treatment apparatus 10 in the illustrated embodiment includes a control means 8 that controls the operation of each of the above-described constituent means, and an operation panel 9 that inputs processing information such as waste liquid treatment start information to the control means 8. . The control means 8 and the operation panel 9 are integrally configured in the illustrated embodiment. The control means 8 and the operation panel 9 configured as described above are arranged above the waste liquid filtering means 4 in the apparatus housing 100. That is, the control means 8, the control means 8 and the operation panel 9 are placed on a support member (not shown) mounted on the left side wall 123 and the right side wall 124 constituting the apparatus housing 100 and fixed by appropriate fixing means. The At this time, the operation panel 9 is positioned on the front side of the device housing 100 (the side disposed on the opening / closing door 126 side). The operation panel 9 is provided with an input unit 91 for inputting processing information and the like, a display unit 92 for displaying processing information by the control unit 8 and the like.

Here, the control means 8 will be described with reference to FIG.
The control means 8 shown in FIG. 4 is constituted by a computer, a central processing unit (CPU) 81 that performs arithmetic processing according to a control program, a read-only memory (ROM) 82 that stores a control program and the like, and a workpiece to be described later. A random access memory (RAM) 83 capable of storing data of X and Y coordinate values of the starting point and ending point of the pulse laser beam, calculation results, and the like, and an input interface 84 and an output interface 85 are provided. Detection signals and input signals from the pressure detection means 33, the pressure detection means 68, the specific resistance meter 69, the input means 91, and the like are input to the input interface 84 of the control means 8. From the output interface 85 of the control means 8, the waste liquid feed pump 30, the electromagnetic on-off valve 43a, the electromagnetic on-off valve 43b, the fresh water feed pump 50, the water replenishing means 55, the electromagnetic on-off valve 66a, the electromagnetic on-off valve 66b, A control signal is output to the display means 92 and the like.

  The processing waste liquid treatment apparatus in the illustrated embodiment is configured as described above, and when the operator inputs waste liquid treatment start information from the operation panel 9, the control means 8 controls each of the above-mentioned construction means to discharge the waste liquid as described above. Perform processing tasks. Then, the control means 8 deenergizes (turns off) the electromagnetic on-off valve 43a of the waste liquid filtering means 4 based on the detection signal from the pressure detecting means 33 as described above when performing the above-described waste liquid treatment work. When the electromagnetic on-off valve 43b is energized (ON) or when the electromagnetic on-off valve 43b is de-energized (OFF) and the electromagnetic on-off valve 43a is energized (ON), the first filter 42a to the second filter The display means 92 of the operation panel 9 displays that the switch from the second filter 42b or the second filter 42b to the first filter 42a is made. Thus, based on the message displayed on the display means 92, the operator senses that the first filter 42a or the second filter 42b has reached the end of its life, opens the open / close door 126 of the apparatus housing 10, and filters the waste liquid. The means 4 is pulled out through the front opening 101 of the device housing 10 along a pair of guide rails 140, 140. At this time, the operator holds and pulls the handle 411 provided on the fresh water receiving pan 41 constituting the waste liquid filtering means 4. Then, the operator replaces the first filter 42a or the second filter 42b according to the message displayed on the display means 92.

  Further, the control means 8 determines that the function of the precision filter 64 has been lost if the detection signal from the pressure detection means 68 reaches a predetermined pressure value or more during execution of the above-described waste liquid treatment work. Are displayed on the display means 92 of the operation panel 9. Based on the message displayed on the display means in this manner, the operator senses that the precision filter 64 has reached the end of its life, opens the door 126 of the apparatus housing 10, and moves the pure water generating means 6 to the pair of guide rails 130. , 130 through the front opening 101 of the device housing 10. At this time, the operator holds and pulls the handle 612 provided on the partition plate 611 standing on the support base 61 constituting the pure water generating means 6. Then, the operator replaces the precision filter 64 according to the message displayed on the display means 92.

  Furthermore, when the waste liquid treatment operation described above is being performed, the control means 8 detects that the detection signal from the resistivity meter 69 has reached a predetermined value (for example, 10 MΩ · cm) or less, and the electromagnetic open / close valve of the pure water generation means 6. If the electromagnetic on-off valve 66b is energized (ON) by de-energizing 66a or the electromagnetic on-off valve 66a is energized (ON) by de-energizing (OFF) the electromagnetic on-off valve 66b, The display means 92 of the operation panel 9 displays that the switch from the first ion exchange means 63a to the second ion exchange means 63b or the second ion exchange means 63b to the first ion exchange means 63a. Thus, based on the message displayed on the display means 92, the operator senses that the first ion exchange means 63a or the second ion exchange means 63b has reached the end of its life, and opens the door 126 of the apparatus housing 10. The pure water generating means 6 is pulled out through the front opening 101 of the apparatus housing 10 along the pair of guide rails 130 and 130. At this time, the operator grasps and pulls the handle 612 provided on the partition plate 611 erected on the support base 61 constituting the pure water generating means 6 as described above. Then, the operator replaces the ion exchange resin of the first ion exchange means 63a or the second ion exchange means 63b in accordance with the message displayed on the display means 92.

  As described above, the processing liquid circulating through the processing apparatus 2 and the processing waste liquid treatment apparatus 10 gradually decreases due to evaporation or the like. Since the amount of machining fluid sprayed from the machining fluid supply nozzle 225 to the machining portion by the cutting blade 223 by the machining fluid supply means (not shown) is constant, if the amount of all circulating machining fluid decreases, the fresh water storage tank The level of fresh water stored in 5 drops. If the level of the fresh water stored in the fresh water storage tank 5 falls below a predetermined level, the stable supply of the machining fluid is hindered, so it is necessary to replenish the fresh water storage tank 5 with water. Hereinafter, the first embodiment of the water supply control will be described with reference to the flowchart shown in FIG.

  The control means 8 inputs a detection signal from the fresh water level detection means 52 at predetermined intervals, and checks whether the water level (H) detected by the fresh water level detection means 52 is equal to or lower than the first water level (H1). (Step S1). If the water level (H) detected by the fresh water level detection means 52 is not less than or equal to the first water level (H1) in step S1, the control means 8 determines that the level of the fresh water stored in the fresh water storage tank 5 is within an appropriate range. This routine is terminated. In step S1, when the water level (H) detected by the fresh water level detection means 52 is equal to or lower than the first water level (H1), the control means 8 indicates that the level of the fresh water stored in the fresh water storage tank 5 is appropriate. It is determined that the value has become lower than the lower limit value of the range, the process proceeds to step S2, and the water supply means 55 is activated (ON). As a result, water is supplied from the water supply means 55 to the fresh water storage tank 5 through the pipe 56.

  If the water replenishing means 55 is activated (ON) in step S2, the control means 8 proceeds to step S3 and the water level (H) detected by the fresh water level detecting means 52 is higher than the first water level (H1). Check whether or not the water level has reached or exceeded the high second water level (H2). When the water level (H) detected by the fresh water level detection means 52 in step S3 is lower than the second water level (H2), the control means 8 determines that the level of the fresh water stored in the fresh water storage tank 5 is within an appropriate range. It is determined that the upper limit has not been reached, and the process returns to step S2 to repeatedly execute steps S2 and S3. When the water level (H) detected by the fresh water level detection means 52 in step S3 is equal to or higher than the second water level (H2), the control means 8 determines that the level of the fresh water stored in the fresh water storage tank 5 is within an appropriate range. It is determined that the upper limit has been reached, the process proceeds to step S4, the operation of the water supply means 55 is stopped (OFF), and the supply of water to the fresh water storage tank 5 is stopped.

  As described above, in the first embodiment of the processing waste liquid treatment apparatus 10 in the illustrated embodiment, if the water level (H) detected by the fresh water level detection means 52 is equal to or lower than the first water level (H1). If the water supply means 55 is operated (ON) to supply water to the fresh water storage tank 5 and the water level (H) detected by the fresh water level detection means 52 reaches the second water level (H2) or higher, the water is supplied. Since the operation of the replenishing means 55 is stopped (OFF) and the replenishment of water to the fresh water storage tank 5 is stopped, the working fluid stored in the fresh water storage tank 5 is always maintained in an appropriate range.

Next, a second embodiment of the processing waste liquid treatment apparatus according to the present invention will be described with reference to FIG. In FIG. 6, the same components as those in the processing waste liquid treatment apparatus shown in FIG.
The processing waste liquid treatment apparatus 10 shown in FIG. 6 is a total organic carbon that detects the content of organic carbon contained in pure water in a pipe 60 that connects the pure water generating means 6 and the pure water temperature adjusting means 7. A total (TOC meter) 95 is provided. The total organic carbon meter (TOC meter) 95 sends a detection signal to the control means 8. Note that the total organic carbon meter (TOC meter) 95 may be disposed in a pipe 70 that connects the pure water temperature adjusting means 7 and the machining fluid supply means equipped in the cutting device 2. The processing waste liquid treatment apparatus 10 shown in FIG. 6 is configured as described above, and the operation thereof will be described below.

  As described above, the processing waste liquid circulating through the processing apparatus 2 and the processing waste liquid treatment apparatus 10 contains organic carbon released from the dicing tape T that holds the wafer W and the synthetic resin hose. There is a problem that the quality of the wafer W is deteriorated when the organic carbon adhering to the wafer W increases gradually as the processing waste liquid circulates and adheres to the wafer W. Since organic carbon contained in the processing waste liquid is at the molecular level, it cannot be captured by the precision filter 64. Therefore, it is necessary to reduce the organic carbon content contained in the processing waste liquid to such an extent that the quality of the wafer W is not affected. Hereinafter, a second embodiment of the water replenishment control for maintaining the organic carbon content in the processing waste liquid below a predetermined value will be described with reference to the flowchart shown in FIG.

  The control means 8 inputs a detection signal from the total organic carbon meter (TOC meter) 95 at predetermined intervals, and the organic carbon content (A) contained in the processing waste liquid (pure water) is the first content rate. It is checked whether or not (A1) (for example, 0.1 ppm) or more (step P1). In Step P1, when the organic carbon content (A) contained in the pure water detected by the total organic carbon meter (TOC meter) 95 is lower than the first content rate (A1) (for example, 0.1 ppm) Therefore, the control means 8 determines that the organic carbon content in the processing waste liquid does not affect the quality of the wafer W, and terminates this routine. When the organic carbon content (A) in the pure water detected by the total organic carbon meter (TOC meter) 95 in step P1 is equal to or higher than the first content rate (A1) (for example, 0.1 ppm) The control means 8 determines that the organic carbon content contained in the pure water affects the quality of the wafer W, and proceeds to step P3 to activate (ON) the water replenishing means 55. As a result, water is supplied from the water supply means 55 to the fresh water storage tank 5 through the pipe 551. The flow rate per unit time of water replenished from the water replenishing means 55 to the fresh water storage tank 5 corresponds to the flow rate per unit time of fresh water sent from the fresh water storage tank 5 by the fresh water feed pump 50. Is set. At this time, as shown in FIG. 6, a predetermined amount of fresh water may be drained by opening the drain valve 57 disposed in the fresh water storage tank 5. Thus, by supplying water to the fresh water storage tank 5, the organic carbon content (A) contained in the pure water gradually decreases.

  If the water replenishing means 55 is activated (ON) in step P2, the control means 8 proceeds to step P3 and contains organic carbon contained in the pure water detected by the total organic carbon meter (TOC meter) 95. It is checked whether or not the rate (A) has reached a second content rate (A2) (for example, 0.1 ppm) lower than the first content rate (A1) (for example, 0.1 ppm). When the organic carbon content (A) contained in the pure water detected by the total organic carbon meter (TOC meter) 95 in step P3 is higher than the second content (A2) (eg, 0.01 ppm) The control means 8 returns to step P2 and repeatedly executes step P2 and step P3. In Step P3, if the organic carbon content (A) contained in the pure water detected by the total organic carbon meter (TOC meter) 95 is less than or equal to the second content rate (eg, 0.01 ppm) Then, the control means 8 determines that the organic carbon content (A) contained in the pure water has sufficiently decreased, proceeds to step P4, stops the operation of the water supply means 55 (OFF), and the fresh water storage tank 5 Stop water supply to

  As described above, in the second embodiment of the processing waste liquid treatment apparatus 10 in the illustrated embodiment, the content of organic carbon contained in pure water detected by the total organic carbon meter (TOC meter) 95 ( When A) is not less than the first content (A1) (for example, 0.1 ppm), the water replenishing means 55 is operated (ON) to replenish the fresh water storage tank 5 with water, and the total organic carbon meter (TOC The content (A) of organic carbon contained in the pure water detected by 95 is lower than the first content (A1) (for example, 0.1 ppm), but the second content (for example, 0.01 ppm). When the following is reached, the operation of the water replenishing means 55 is stopped (OFF), and the replenishment of water to the fresh water storage tank 5 is stopped, so that the organic carbon content (A) contained in the pure water is It is maintained within a range that does not affect the quality of W.

  Next, a third embodiment of the processing waste liquid processing apparatus according to the present invention will be described. The third embodiment of the processing waste liquid treatment apparatus according to the present invention is the flow rate of pure water in the pipe 60 connecting the pure water generating means 6 and the pure water temperature adjusting means 7 in the processing waste liquid treatment apparatus 10 shown in FIG. Is provided. This flow accumulator 96 sends a detection signal to the control means 8. The flow accumulator 96 may be disposed in a pipe 70 that connects the pure water temperature adjusting means 7 and the machining fluid supply means provided in the cutting apparatus 2. The third embodiment of the processing waste liquid treatment apparatus according to the present invention is configured as described above, and the operation thereof will be described below with reference to the flowchart shown in FIG.

  The control means 8 starts integration by the flow accumulator 96 (step R1), inputs a detection signal from the flow accumulator 96, and the integrated value (Q) of pure water flow becomes the first integrated value (Q1) ( For example, it is checked whether it has reached 100 kiloliters or more (step R2). The first integrated value (Q1) is an integrated value of the flow rate of pure water until the organic carbon content is increased by circulating pure water and the content becomes, for example, 0.1 ppm. This is a value obtained experimentally using the total organic carbon meter (TOC meter) 95. In step R2, if the integrated value (Q) of the pure water flow detected by the flow integrator 96 does not reach the first integrated value (Q1) (for example, 100 kiloliters), the control means 8 performs processing. It is determined that the organic carbon content contained in the waste liquid does not affect the quality of the wafer W, and this routine is terminated. In step R2, when the integrated value (Q) of the pure water flow detected by the flow integrating meter 96 reaches or exceeds the first integrated value (Q1) (for example, 100 kiloliters), the control means 8 It is determined that the content of organic carbon contained in the water affects the quality of the wafer W, the process proceeds to step R3, the water replenishing means 55 is operated (ON), and the flow accumulator 96 is cleared. As a result, water is supplied from the water supply means 55 to the fresh water storage tank 5 through the pipe 551. The flow rate per unit time of water supplied from the water supply means 55 to the fresh water storage tank 5 corresponds to the flow rate per unit time of fresh water sent from the fresh water storage tank 5 by the fresh water feed pump 50. Is set. Thus, by supplying water to the fresh water storage tank 5, the organic carbon content (A) contained in the pure water gradually decreases.

  If the water replenishing means 55 is activated (ON) in step R3, the control means 8 proceeds to step R4 and inputs a detection signal from the flow accumulator 96 so that the integrated value (Q) of the pure water flow rate is the second. It is checked whether or not the accumulated value (Q2) of (for example, 100 liters) has been reached. The second integrated value (Q2) is the flow rate of pure water from the start of water supply by the water supply means 55 until the organic carbon content in the pure water reaches 0.01 ppm, for example. This is an integrated value, and is a value obtained experimentally using the total organic carbon meter (TOC meter) 95. In step R4, when the integrated value (Q) of the flow rate of pure water detected by the flow integrating meter 96 has not reached the second integrated value (Q2) (for example, 100 liters), the control means 8 performs the above step. Returning to R3, step R3 and step R4 are repeatedly executed. In step R4, if the integrated value (Q) of the flow rate of pure water detected by the flow integrating meter 96 reaches the second integrated value (Q2) (for example, 100 liters), the control means 8 controls the processing waste liquid (pure water). It is judged that the content of organic carbon contained in the water) has sufficiently decreased, the process proceeds to Step R5, the operation of the water supply means 55 is stopped (OFF), and the supply of water to the pure water is stopped. The flow accumulator 96 is cleared.

  As described above, in the third embodiment of the processing waste liquid treatment apparatus 10 in the illustrated embodiment, the integrated value (Q) of the pure water flow detected by the flow integrating meter 96 is the first integrated value (Q1). ) (For example, 100 kiloliters) or more, the water replenishing means 55 is operated (ON) to replenish the fresh water storage tank 5 with water, and the pure water detected by the flow accumulator 96 after the water is replenished. When the integrated value (Q) of the water flow reaches the second integrated value (Q2) (for example, 100 liters) or less, the operation of the water supply means 55 is stopped (OFF), and the fresh water storage tank 5 is supplied with water. Therefore, the organic carbon content in the processing waste liquid (pure water) is maintained in a range that does not affect the quality of the wafer W. In the third embodiment, since the first integrated value (Q1) and the second integrated value (Q2) are obtained experimentally, the total organic carbon as in the second embodiment. There is no need to use a total (TOC meter) 95.

  As mentioned above, although the example which applied the processing waste liquid processing apparatus comprised according to this invention to the cutting device was shown, even if it applies to other processing apparatuses, such as a processing waste liquid processing apparatus by this invention, the same effect is obtained. can get.

The perspective view which shows the state which has arrange | positioned the processing waste-liquid processing apparatus comprised according to this invention adjacent to the cutting device as a processing apparatus. Explanatory drawing which shows 1st Embodiment of the component of the processing waste liquid processing apparatus comprised according to this invention according to the flow of processing waste liquid. FIG. 3 is a perspective view illustrating a state in which constituent walls of a processing waste liquid treatment apparatus are disposed in the apparatus housing through the walls constituting the apparatus housing illustrated in FIG. 2. The block diagram of the configuration of the control means equipped in the processing waste liquid treatment apparatus constructed according to the present invention. The flowchart which shows 1st Embodiment of the replenishment control of the water in the control means with which the process waste liquid processing apparatus comprised according to this invention is equipped. Explanatory drawing which shows 2nd Embodiment of the component of the processing waste liquid processing apparatus comprised according to this invention according to the flow of processing waste liquid. The flowchart which shows 2nd Embodiment of the replenishment control of the water in the control means with which the processing waste liquid processing apparatus comprised according to this invention is equipped. The flowchart which shows 3rd Embodiment of the water replenishment control in the control means with which the process waste liquid processing apparatus comprised according to this invention is equipped.

Explanation of symbols

2: Cutting device 21: Chuck table 22: Spindle unit 221: Spindle housing 222: Rotating spindle 223: Cutting blade 225: Processing liquid supply nozzle 3: Waste liquid tank 31: Waste liquid feed pump 4: Waste liquid filtering means 41: Fresh water receiving pan 42a: 1st filter 42b: 2nd filter 43a, 43b: Electromagnetic on-off valve 5: Fresh water storage tank 50: Fresh water feed pump 52: Fresh water level detection means 55: Water supply device 6: Pure water generation means 61: Support Table 62: UV irradiation means 63a: first ion exchange means 63b: second ion exchange means 64: precision filters 66a, 66b: electromagnetic on-off valve 7: pure water temperature adjusting means 71: cooling liquid layer 72: cooling liquid feed Feed pump 73: Cooler 74: Heat exchanger 8: Control means 9: Operation panel 91: Input means 92: Display means 95: Organic carbon meter (TOC meter)
96: Flow accumulator 10: Processing waste liquid treatment device 100: Device housing

Claims (3)

A waste liquid storage tank for storing the processing waste liquid generated by the processing liquid supplied by the processing liquid supply means during processing of the processing apparatus; a pump for feeding the processing waste liquid stored in the waste liquid storage tank; Waste liquid filtering means for filtering the processing waste liquid fed by the pump to purify it into fresh water, a fresh water storage tank for storing fresh water purified by the waste liquid filtration means, and fresh water stored in the fresh water storage tank A pure water feed pump to be supplied, a pure water generating means for purifying the pure water fed by the fresh water feed pump into pure water, and a pure water for adjusting the pure water purified by the pure water generating means to a predetermined temperature. A processing waste liquid treatment system comprising: a water temperature adjusting means; a pipe for circulating pure water adjusted to a predetermined temperature by the pure water temperature adjusting means to the working liquid supply means; and a control means for controlling each of the constituent means. In the device,
A fresh water level detection means for detecting the level of fresh water stored in the fresh water storage tank and sending a detection signal to the control means; and a water supply means for supplying water to the fresh water storage tank,
The control means activates the water replenishing means based on the detection signal from the fresh water level detection means and operates the water replenishing means if the fresh water level stored in the fresh water storage tank is equal to or lower than the first water level. When the water level of the fresh water stored in the fresh water storage tank reaches a second water level higher than the first water level after replenishing the water storage tank and starting the water supply by the water supply means Stop the operation of the water supply means and stop the supply of water to the fresh water storage tank;
A processing waste liquid treatment apparatus characterized by that. A waste liquid storage tank for storing the processing waste liquid generated by the processing liquid supplied by the processing liquid supply means during processing of the processing apparatus; a pump for feeding the processing waste liquid stored in the waste liquid storage tank; Waste liquid filtering means for filtering the processing waste liquid fed by the pump to purify it into fresh water, a fresh water storage tank for storing fresh water purified by the waste liquid filtration means, and fresh water stored in the fresh water storage tank A pure water feed pump to be supplied, a pure water generating means for purifying the pure water fed by the fresh water feed pump into pure water, and a pure water for adjusting the pure water purified by the pure water generating means to a predetermined temperature. A processing waste liquid treatment system comprising: a water temperature adjusting means; a pipe for circulating pure water adjusted to a predetermined temperature by the pure water temperature adjusting means to the working liquid supply means; and a control means for controlling each of the constituent means. In the device,
A total organic carbon meter disposed in a path from the pure water generating means to the processing liquid supply means and detecting the organic carbon content contained in the pure water and sending a detection signal to the control means; and Water replenishment means for replenishing water to the fresh water storage tank,
The control means operates the water supply means if the organic carbon content contained in the pure water is equal to or higher than the first content based on the detection signal from the total organic carbon meter. The fresh water storage tank is replenished with water, and after the replenishment of water by the water replenishing means is started, the organic carbon content contained in the pure water is lower than the first content, but less than the second content The water supply means is stopped to stop water supply to the fresh water storage tank
A processing waste liquid treatment apparatus characterized by that. A waste liquid storage tank for storing the processing waste liquid generated by the processing liquid supplied by the processing liquid supply means during processing of the processing apparatus; a pump for feeding the processing waste liquid stored in the waste liquid storage tank; Waste liquid filtering means for filtering the processing waste liquid fed by the pump to purify it into fresh water, a fresh water storage tank for storing fresh water purified by the waste liquid filtration means, and fresh water stored in the fresh water storage tank A pure water feed pump to be supplied, a pure water generating means for purifying the pure water fed by the fresh water feed pump into pure water, and a pure water for adjusting the pure water purified by the pure water generating means to a predetermined temperature. A processing waste liquid treatment system comprising: a water temperature adjusting means; a pipe for circulating pure water adjusted to a predetermined temperature by the pure water temperature adjusting means to the working liquid supply means; and a control means for controlling each of the constituent means. In the device,
A flow accumulator arranged in a path from the pure water generating means to the machining fluid supply means and integrating the pure water flow rate and sending the flow integrated value to the control means; and water replenishment for replenishing the fresh water storage tank Means,
The control means operates the water supply means to supply water to the fresh water storage tank when the integrated value of the pure water flow reaches the first integrated value or more based on the detection signal from the flow integrating meter. When the integrated value of the pure water flow reaches the second integrated value or more after starting the water supply by the water supply means, the operation of the water supply means is stopped and the fresh water storage tank is supplied with water. Stop,
A processing waste liquid treatment apparatus characterized by that.

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