JP2012216852A5 - Substrate processing apparatus and method for controlling substrate processing apparatus - Google Patents
Substrate processing apparatus and method for controlling substrate processing apparatus Download PDFInfo
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- JP2012216852A5 JP2012216852A5 JP2012129085A JP2012129085A JP2012216852A5 JP 2012216852 A5 JP2012216852 A5 JP 2012216852A5 JP 2012129085 A JP2012129085 A JP 2012129085A JP 2012129085 A JP2012129085 A JP 2012129085A JP 2012216852 A5 JP2012216852 A5 JP 2012216852A5
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本発明は、基板に所定の処理を施す基板処理装置および基板処理装置の制御方法に関する。 The present invention relates to a substrate processing apparatus that performs predetermined processing on a substrate and a control method for the substrate processing apparatus .
そこで、本発明は、ロット毎に要求される微細加工の程度に応じて、搬送方法の変更を制御する基板処理装置および基板処理装置の制御方法を提供する。 Therefore, the present invention provides a substrate processing apparatus and a substrate processing apparatus control method for controlling the change of the transfer method according to the degree of fine processing required for each lot.
すなわち、上記課題を解決するために、本発明のある観点によれば、基板に所定の処理を施す複数の処理室と、前記基板を搬送する搬送機構と、前記複数の処理室および前記搬送機構を制御する装置コントローラとを備えた基板処理装置であって、前記装置コントローラと基板処理システム全体を管理するホストコンピュータとの間、および前記装置コントローラと管理サーバとの間は、顧客側ＬＡＮによりそれぞれ接続され、前記装置コントローラは、前記ホストコンピュータに搬送単位の変更を要求せずに、次に搬送すべき処理室を選択するとともに、ロット毎に要求される微細加工の程度に応じて、同一処理室に搬送する基板の単位を１ロット単位または１基板単位のいずれにするかをロット毎に選択する選択部と、前記選択部により選択された単位に含まれる基板を前記選択部により選択された処理室に順に搬送する搬送制御部とを備えることを特徴とする基板処理装置が提供される。 That is, in order to solve the above problems, according to an aspect of the present invention, a plurality of processing chambers for performing predetermined processing on a substrate, a transport mechanism for transporting the substrate, the plurality of processing chambers and the transfer mechanism the substrate processing equipment that includes a device controller for controlling, between a host computer which manages the entire device controller and a substrate processing system, and the between the device controller and the management server, the customer LAN The apparatus controller is connected to each other , selects the processing chamber to be transported next without requiring the host computer to change the transport unit, and is the same according to the degree of fine processing required for each lot. A selection unit that selects, for each lot, whether the unit of the substrate to be transferred to the processing chamber is one lot unit or one substrate unit, and the selection unit A substrate processing apparatus, characterized in that it comprises a conveyance control unit that conveys the substrate contained in-option by the unit in order to process chamber selected by the selection unit is provided.
しかし、このような場合であっても、かかる構成によれば、微細加工が要求されているロットに含まれる基板の搬送方法は、装置コントローラの指示により加工状態にバラツキが生じない上記搬送手順に変更される。このようにして、搬送単位の変更をホストコンピュータに要求することなく、装置コントローラが自ら搬送単位を変更することにより、現時点にて稼働しているホストコンピュータ側のシステムの機能を大幅に換えることなく、ユーザの要求に迅速に対応することができる。 However, even in such a case, according to such a configuration, the method for transporting a substrate included in a lot for which microfabrication is required is performed according to the transport procedure described above in which the processing state does not vary according to an instruction from the apparatus controller. Be changed. In this way, without requesting the host computer to change the transport unit, the device controller can change the transport unit itself without significantly changing the function of the system on the host computer currently operating. It is possible to respond quickly to user requests.
Claims (8)
前記装置コントローラと基板処理システム全体を管理するホストコンピュータとの間、および前記装置コントローラと管理サーバとの間は、顧客側ＬＡＮによりそれぞれ接続され、
前記装置コントローラは、
前記ホストコンピュータに搬送単位の変更を要求せずに、次に搬送すべき処理室を選択するとともに、ロット毎に要求される微細加工の程度に応じて、同一処理室に搬送する基板の単位を１ロット単位または１基板単位のいずれにするかをロット毎に選択する選択部と、
前記選択部により選択された単位に含まれる基板を前記選択部により選択された処理室に順に搬送する搬送制御部とを備えることを特徴とする基板処理装置。 A plurality of processing chambers for performing predetermined processing on a substrate, a substrate processing equipment having a transport mechanism, and a device controller for controlling the plurality of processing chambers and the transfer mechanism for transferring the substrate,
Between the apparatus controller and a host computer that manages the entire substrate processing system, and between the apparatus controller and the management server are connected by a customer side LAN, respectively.
The device controller is
Without requesting the host computer to change the transport unit, the processing chamber to be transported next is selected, and the unit of the substrate transported to the same processing chamber is selected according to the degree of fine processing required for each lot. A selection unit for selecting, for each lot, whether one lot unit or one substrate unit;
A substrate processing apparatus comprising: a transfer control unit that sequentially transfers substrates included in a unit selected by the selection unit to a processing chamber selected by the selection unit.
前記複数の処理室のうち、基板の処理に使用された処理室の順番を記憶する記憶部を更に備え、 Of the plurality of processing chambers, further comprising a storage unit for storing the order of the processing chambers used for processing the substrate,
前記選択部は、 The selection unit includes:
前記記憶部に記憶された処理室の順番に基づいて、レシピにより指定された処理室群のうち最も以前に処理が施された処理室を選択し、 Based on the order of the processing chambers stored in the storage unit, select the processing chamber that was most recently processed among the processing chamber group specified by the recipe,
前記搬送制御部は、 The conveyance control unit
前記選択された処理室に前記選択された単位に含まれる基板を順に搬送する請求項１に記載された基板処理装置。 The substrate processing apparatus according to claim 1, wherein the substrates included in the selected unit are sequentially transferred to the selected processing chamber.
各処理室をクリーニングするまでに各処理室にて処理された基板の総処理枚数を処理室毎に記憶する記憶部を更に備え、 A storage unit for storing the total number of substrates processed in each processing chamber before each processing chamber is cleaned for each processing chamber;
前記選択部は、 The selection unit includes:
前記記憶部に記憶された基板の総処理枚数に基づいて、レシピにより指定された処理室群のうち最も処理枚数の少ない処理室を選択し、 Based on the total number of processed substrates stored in the storage unit, the processing chamber with the smallest processing number is selected from the processing chamber group designated by the recipe,
前記搬送制御部は、 The conveyance control unit
前記選択された処理室に前記選択された単位に含まれる基板を順に搬送する請求項１に記載された基板処理装置。 The substrate processing apparatus according to claim 1, wherein the substrates included in the selected unit are sequentially transferred to the selected processing chamber.
各処理室をクリーニングするまでに各処理室にて処理された基板の総処理時間を処理室毎に記憶する記憶部を更に備え、 A storage unit for storing the total processing time of the substrates processed in each processing chamber before each processing chamber is cleaned for each processing chamber;
前記選択部は、 The selection unit includes:
前記記憶部に記憶された基板の総処理時間に基づいて、レシピにより指定された処理室群のうち最も処理時間の短い処理室を選択し、 Based on the total processing time of the substrate stored in the storage unit, select the processing chamber with the shortest processing time among the processing chamber group specified by the recipe,
前記搬送制御部は、 The conveyance control unit
前記選択された単位に含まれる基板を前記選択された処理室に順に搬送する請求項１に記載された基板処理装置。 The substrate processing apparatus according to claim 1, wherein a substrate included in the selected unit is sequentially transferred to the selected processing chamber.
前記選択部により１ロット単位が選択された場合、前記ロットに含まれるすべての基板を前記選択された処理室に順に搬送し、前記選択部により１基板単位が選択された場合、前記ロットに含まれる最初の基板を、レシピにより指定された処理室群のうち、最も以前に処理が施された処理室、最も処理枚数の少ない処理室または最も処理時間の短い処理室のいずれかから選択された処理室に搬送し、前記ロットに含まれる次の基板を次の処理室に搬送することを前記ロットに含まれる最後の基板まで繰り返す請求項２〜４のいずれかに記載された基板処理装置。 When one lot unit is selected by the selection unit, all substrates included in the lot are sequentially transferred to the selected processing chamber, and when one substrate unit is selected by the selection unit, it is included in the lot. The first substrate to be selected is selected from among the processing chambers that have been processed most recently, the processing chamber with the fewest number of processing, or the processing chamber with the shortest processing time among the processing chamber groups specified by the recipe. The substrate processing apparatus according to claim 2, wherein the substrate processing apparatus repeats the transfer to the processing chamber and the transfer of the next substrate included in the lot to the next processing chamber up to the last substrate included in the lot.
前記選択部により１ロット単位が選択された場合、製品用基板を搬送する前に、試用基板を前記選択された処理室にのみ搬送する請求項１〜５のいずれかに記載された基板処理装置。 The substrate processing apparatus according to claim 1, wherein, when one lot unit is selected by the selection unit, the test substrate is transferred only to the selected processing chamber before the product substrate is transferred. .
前記選択部により１基板単位が選択された場合、製品用基板を搬送する前に、試用基板をレシピにより指定された処理室群の各処理室にのみ搬送する請求項１〜５のいずれかに記載された基板処理装置。 When one board | substrate unit is selected by the said selection part, before conveying a product substrate, a test substrate is conveyed only to each process chamber of the process chamber group designated by the recipe. The substrate processing apparatus described.
前記装置コントローラと基板処理システム全体を管理するホストコンピュータとの間、および前記装置コントローラと管理サーバとの間が、顧客側ＬＡＮによりそれぞれ接続され、 Between the apparatus controller and a host computer that manages the entire substrate processing system, and between the apparatus controller and the management server are respectively connected by a customer side LAN,
前記装置コントローラが、前記ホストコンピュータに搬送単位の変更を要求せずに、次に搬送すべき処理室を選択するとともに、ロット毎に要求される微細加工の程度に応じて、同一処理室に搬送する基板の単位を１ロット単位または１基板単位のいずれかから選択し、 The apparatus controller selects the processing chamber to be transported next without requiring the host computer to change the transport unit, and transports it to the same processing chamber according to the degree of fine processing required for each lot. Select the board unit to be selected from one lot unit or one board unit,
前記選択された単位に含まれる基板を前記選択された処理室に順に搬送させることを特徴とする基板処理装置の制御方法。 A method of controlling a substrate processing apparatus, comprising: sequentially transferring substrates included in the selected unit to the selected processing chamber.
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| JP6105436B2 (en) * | 2013-08-09 | 2017-03-29 | 東京エレクトロン株式会社 | Substrate processing system |
| JP6704008B2 (en) | 2018-03-26 | 2020-06-03 | 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ | Substrate processing apparatus, semiconductor device manufacturing method, and recording medium |
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