JP2012208360A5 - - Google Patents

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Publication number
JP2012208360A5
JP2012208360A5 JP2011074648A JP2011074648A JP2012208360A5 JP 2012208360 A5 JP2012208360 A5 JP 2012208360A5 JP 2011074648 A JP2011074648 A JP 2011074648A JP 2011074648 A JP2011074648 A JP 2011074648A JP 2012208360 A5 JP2012208360 A5 JP 2012208360A5
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JP
Japan
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JP2011074648A
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Japanese (ja)
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JP5742376B2 (en
JP2012208360A (en
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Priority to JP2011074648A priority Critical patent/JP5742376B2/en
Priority claimed from JP2011074648A external-priority patent/JP5742376B2/en
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Publication of JP2012208360A5 publication Critical patent/JP2012208360A5/ja
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特開2006−313237号公報JP 2006-313237 A 特開2008−224984号公報JP 2008-224984 A 特開2007−78781号公報JP 2007-78781 A 特開2009−258471号公報JP 2009-258471 A 特開2011−17898号公報JP 2011-17898 A

JP2011074648A 2011-03-30 2011-03-30 Positive photosensitive resin composition Active JP5742376B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011074648A JP5742376B2 (en) 2011-03-30 2011-03-30 Positive photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011074648A JP5742376B2 (en) 2011-03-30 2011-03-30 Positive photosensitive resin composition

Publications (3)

Publication Number Publication Date
JP2012208360A JP2012208360A (en) 2012-10-25
JP2012208360A5 true JP2012208360A5 (en) 2014-04-03
JP5742376B2 JP5742376B2 (en) 2015-07-01

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ID=47188143

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011074648A Active JP5742376B2 (en) 2011-03-30 2011-03-30 Positive photosensitive resin composition

Country Status (1)

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JP (1) JP5742376B2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6102736B2 (en) * 2012-09-24 2017-03-29 東レ株式会社 Positive photosensitive resin composition
WO2014050558A1 (en) * 2012-09-25 2014-04-03 東レ株式会社 Positive photosensitive resin composition, and method for producing semiconductor device containing a cured film using said composition
JP6358095B2 (en) * 2013-01-09 2018-07-18 Jsr株式会社 Photosensitive composition, polymer, resin film, method for producing the same, and electronic component
KR101720717B1 (en) * 2014-04-10 2017-03-28 제일모직 주식회사 Positive photosensitive resin composition, photosensitive resin film, and display device using the same
US10705425B2 (en) 2015-03-27 2020-07-07 Toray Industries, Inc. Photosensitive resin composition, photosensitive, sheet, semiconductor device and method for manufacturing semiconductor device
WO2017043375A1 (en) * 2015-09-08 2017-03-16 東レ株式会社 Photosensitive resin composition, photosensitive sheet, semiconductor device, and method for manufacturing semiconductor device
MY184067A (en) * 2015-09-28 2021-03-17 Toray Industries Cured film and method for manufacturing same
JPWO2017073481A1 (en) * 2015-10-28 2018-08-16 東レ株式会社 Positive photosensitive resin composition, photosensitive sheet, cured film, interlayer insulating film, semiconductor protective film, method for manufacturing semiconductor device, semiconductor electronic component, and semiconductor device
SG11201807876SA (en) * 2016-03-28 2018-10-30 Toray Industries Photosensitive film
JP7003659B2 (en) * 2016-04-25 2022-01-20 東レ株式会社 Resin composition
CN114207520A (en) 2019-08-01 2022-03-18 东丽株式会社 Photosensitive resin composition, photosensitive sheet, cured film, method for producing cured film, interlayer insulating film, and electronic component

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4957884B2 (en) * 2005-03-24 2012-06-20 信越化学工業株式会社 Epoxy resin composition and semiconductor device
JP4655757B2 (en) * 2005-05-19 2011-03-23 住友電気工業株式会社 Positive photosensitive adhesive
CN102186904A (en) * 2008-10-20 2011-09-14 日本化药株式会社 Polyamide resin and composition thereof

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