JP2012192586A - Transfer foil, transfer medium, and method of manufacturing transfer foil - Google Patents

Transfer foil, transfer medium, and method of manufacturing transfer foil Download PDF

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JP2012192586A
JP2012192586A JP2011057577A JP2011057577A JP2012192586A JP 2012192586 A JP2012192586 A JP 2012192586A JP 2011057577 A JP2011057577 A JP 2011057577A JP 2011057577 A JP2011057577 A JP 2011057577A JP 2012192586 A JP2012192586 A JP 2012192586A
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transfer foil
forming layer
reflectance
layer
diffractive
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Naoki Minamikawa
直樹 南川
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a transfer foil capable of preventing peeling action by achieving an appearance in which the transfer foil is embedded and transferred to prevent counterfeiting caused by peeling an anti-counterfeiting medium and attaching the anti-counterfeiting medium to a counterfeit to be used.SOLUTION: The transfer foil includes: an adhesive layer 15; a diffraction structure formation layer 13 located on the adhesive layer 15; and a reflection layer 14 arranged on the diffraction structure side of the diffraction structure formation layer 13. A reflection reduction structure 2 is provided on a side opposite to the diffraction structure side on the diffraction structure formation layer 13 along a shape contour of the transfer foil. The reflection reduction structure is composed of a minute irregular structure having 2,050-400 nm of a distance between apexes and 0.25 or more of an aspect ratio.

Description

本発明は、セキュリティを必要とする媒体に転写される、回折格子に代表されるOVD(Optical Variable Device)を有する転写箔と、その製造方法に関するものであり、特に物品から偽造防止媒体を不正に剥離して偽造品に貼付されることを防止するための、転写箔および転写箔の製造方法関するものである。   The present invention relates to a transfer foil having an optical variable device (OVD) typified by a diffraction grating, which is transferred to a medium requiring security, and a method for manufacturing the same. The present invention relates to a transfer foil and a method for manufacturing the transfer foil for preventing the film from being peeled off and attached to a counterfeit product.

従来、粗悪な偽造品被害が大きな社会問題となっている。そこで偽造防止対策として、真正品であることを判定するためのラベル等の偽造防止媒体を物品に設けることにより、本物と偽物を区別できるようにする手段がある。この偽造防止媒体としては、偽造防止用機能性インキ、特殊印刷、ホログラム、磁気記録、ICタグ等、多くの偽造防止手段が採用されている。しかし、これら偽造防止策手段が物品に貼付されているとしても、偽造防止ラベルを真正品から剥がし取り、偽造品に貼りつけるといった不正行為が頻繁に行われてしまっている。   In the past, bad counterfeit damage has become a major social problem. Therefore, as a countermeasure against forgery, there is a means for providing a forgery prevention medium such as a label for determining whether the article is a genuine product so that the article can be distinguished from the forgery. As this anti-counterfeit medium, many anti-counterfeit means such as functional ink for anti-counterfeiting, special printing, hologram, magnetic recording, IC tag and the like are adopted. However, even if these anti-counterfeit measures are affixed to the article, fraudulent acts such as peeling off the anti-counterfeit label from the genuine product and attaching it to the counterfeit product are frequently performed.

このようなことから、偽造防止ラベルの再貼り付け防止を目的とする方法が考えられている。例えば、偽造防止ラベルに切り欠きを設け、無理に剥がそうとすると、切り欠きがきっかけとなり偽造防止ラベルが裂けてしまう方法や、偽造防止ラベルの基材を脆性材料にする方法、もしくはラベルを剥がそうとすると表面基材に“VOID”等の文字が現れ、物品にインキが付着するパターン脆性タイプのもの等がある。   For this reason, a method aimed at preventing reattachment of a forgery prevention label has been considered. For example, if a forgery prevention label is notched and you try to peel it off forcibly, the notch will trigger and the forgery prevention label will tear, a method for making the base material of the forgery prevention label a brittle material, If it does so, characters, such as "VOID", will appear on a surface base material, and there exists a pattern brittle type etc. with which ink adheres to articles | goods.

しかしながら、これらの方法では、ラベル剥がし液等の有機溶剤を染みこませ、そっと偽造防止ラベルを剥がせば、ラベルが損傷しないため再使用が可能となってしまう。   However, in these methods, if an organic solvent such as a label remover is soaked and the anti-counterfeit label is gently peeled off, the label will not be damaged and can be reused.

さらに、有機溶剤による剥離を防止するために、有機溶剤溶解染料が含有されていて、ラベル剥がし液等で剥がそうとした時、前記染料が印刷部よりにじみ出すことで再貼り付けを防止する方法がある(特許文献1)。   Furthermore, in order to prevent peeling due to an organic solvent, a method for preventing re-sticking by containing an organic solvent-dissolving dye and causing the dye to ooze out from the printed part when it is peeled off with a label peeling liquid or the like. (Patent Document 1).

また、ラベルの粘着層中に発泡粒子を含有することで、ドライヤー等でラベルを温めた場合、粘着層中の発泡粒子が発泡することで、再貼り付けを防止する方法がある(特許文献2)。   Moreover, when the label is warmed with a dryer or the like by containing foam particles in the pressure-sensitive adhesive layer of the label, there is a method for preventing re-sticking by foaming the foam particles in the pressure-sensitive adhesive layer (Patent Document 2). ).

さらにラベルの粘着剤を難溶性にすることで再貼り付けを防止する方法がある(特許文献3)。   Furthermore, there is a method for preventing re-sticking by making the adhesive of the label hardly soluble (Patent Document 3).

しかしながら、有機溶剤溶解染料を用いる方法では、ドライヤー等で偽造防止ラベルの表面を温めることによりきれいに剥がれる。また発泡粒子を含有させ、粘着剤を難溶性とする方法を用いても、偽造防止ラベルを貼付している物品の表層ごと削ぎ落とすことで、偽造防止ラベルに損傷を与えず再利用が可能となる。この場合、物品自身が損傷するが、物品が装置の消耗品である場合、消耗品等を使い終わった後に行うのならば、一部が損傷しても関係がないため、深刻な問題となってしまう。   However, in the method using an organic solvent-soluble dye, the surface of the anti-counterfeit label is warmly peeled off with a dryer or the like. In addition, even if using a method that contains foam particles and makes the adhesive hardly soluble, by scraping the entire surface of the article with the anti-counterfeit label attached, it can be reused without damaging the anti-counterfeit label. Become. In this case, the article itself is damaged. However, if the article is a consumable part of the device, if it is performed after the consumable part has been used, there is no problem even if a part of the article is damaged. End up.

特開平10−204363号公報JP-A-10-204363 特開2000−293108号公報JP 2000-293108 A 特開2005―266147号公報JP 2005-266147 A

本発明は、前記偽造防止技術の問題点に鑑みてなされた発明であり、偽造防止媒体を剥離し、その偽造防止媒体を偽造品に貼り付けて使用する偽造を防止するために、転写箔が埋め込まれて転写されている外観とすることにより、剥離行為を防止する転写箔を提供することにある。   The present invention is an invention made in view of the problems of the anti-counterfeiting technology, in order to prevent forgery that peels off the anti-counterfeit medium and attaches the anti-counterfeit medium to a forgery product to prevent forgery. It is in providing the transfer foil which prevents peeling action by making it the external appearance embedded and transferred.

上記の課題を解決するための手段として、請求項1に記載の発明は、接着層と、接着層上に回折構造形成層と、回折構造形成層の回折構造側に設けられた反射層とを備えた転写箔であって、回折構造形成層上の回折構造側と対峙する側に、転写箔の形状輪郭に沿って反射低減構造が設けられ、前記反射低減構造が、頂点間隔が200〜400nmでアスペクト比が0.25以上の微細凹凸構造からなることを特徴とする転写箔である。   As means for solving the above problems, the invention described in claim 1 includes an adhesive layer, a diffractive structure forming layer on the adhesive layer, and a reflective layer provided on the diffractive structure side of the diffractive structure forming layer. A reflection reduction structure is provided along the shape outline of the transfer foil on the side facing the diffraction structure side on the diffraction structure forming layer, and the reflection reduction structure has a vertex interval of 200 to 400 nm. The transfer foil is characterized by having a fine concavo-convex structure with an aspect ratio of 0.25 or more.

また、請求項2に記載の発明は、接着層と、接着層上に回折構造形成層と、回折構造形成層の回折構造側に設けられた反射層とを備えた転写箔であって、回折構造形成層上の回折構造側と対峙する側に、転写箔の形状輪郭に沿った領域と、形状輪郭に沿った領域以外の領域に文字や模様状に反射低減構造が設けられ、前記反射低減構造が、頂点間隔が250〜400nmでアスペクト比が0.25以上の微細凹凸構造からなることを特徴とする転写箔である。   The invention according to claim 2 is a transfer foil comprising an adhesive layer, a diffractive structure forming layer on the adhesive layer, and a reflective layer provided on the diffractive structure side of the diffractive structure forming layer. On the side facing the diffractive structure side on the structure forming layer, a reflection reducing structure is provided in a region along the shape contour of the transfer foil and a region other than the region along the shape contour in the form of letters or patterns, and the reflection reduction The transfer foil is characterized in that the structure is a fine concavo-convex structure having a vertex interval of 250 to 400 nm and an aspect ratio of 0.25 or more.

また、請求項3に記載の発明は、請求項1または請求項2に記載の転写箔を転写したことを特徴とする転写媒体である。   The invention described in claim 3 is a transfer medium obtained by transferring the transfer foil according to claim 1 or claim 2.

また、請求項4に記載の発明は、基材上に反射率低減構造形成層を設け、前記反射率低減構造形成層の表面に転写箔の形状輪郭に沿って、微細凹凸構造からなる反射率低減構造を形成し、続いて回折構造形成層を積層して、前記回折構造形成層に回折構造を形成し、さらに反射層、接着層を順次積層する、反射率低減構造形成層と回折構造形成層との界面にて剥離する転写箔の製造方法であって、反射率低減構造形成層に設けられる微細凹凸構造を、頂点間隔が200〜400nmでアスペクト比が0.25以上の微細凹凸構造を持つスタンパーを作製し、前記スタンパーの微細凹凸構造を転写させて形成することを特徴とする転写箔の製造方法である。   Further, the invention according to claim 4 is provided with a reflectance-reducing structure forming layer on a substrate, and a reflectance comprising a fine concavo-convex structure along the shape contour of the transfer foil on the surface of the reflectance-reducing structure forming layer. A reduced structure is formed, and then a diffractive structure forming layer is stacked, a diffractive structure is formed on the diffractive structure forming layer, and a reflective layer and an adhesive layer are sequentially stacked. A method for producing a transfer foil that peels off at an interface with a layer, wherein a fine concavo-convex structure provided on a reflectance-reducing structure forming layer has a fine concavo-convex structure with a vertex interval of 200 to 400 nm and an aspect ratio of 0.25 or more. A stamping foil is produced, and the fine concavo-convex structure of the stamper is transferred and formed.

また、請求項5に記載の発明は、基材上に反射率低減構造形成層を設け、前記反射率低減構造形成層の表面に転写箔の形状輪郭に沿った領域と、形状輪郭に沿った領域以外の領域に文字や模様状に、微細凹凸構造からなる反射率低減構造を形成し、続いて回折構造形成層を積層して、前記回折構造形成層に回折構造を形成し、さらに反射層、接着層を順次積層する、反射率低減構造形成層と回折構造形成層との界面にて剥離する転写箔の製造方法であって、反射率低減構造形成層に設けられる微細凹凸構造を、頂点間隔が250〜400nmでアスペクト比が0.25以上の微細凹凸構造を持つスタンパーを作製し、前記スタンパーの微細凹凸構造を転写させて形成することを特徴とする転写箔の製造方法である。   Further, the invention according to claim 5 is provided with a reflectance reducing structure forming layer on a base material, a region along the shape contour of the transfer foil on the surface of the reflectance reducing structure forming layer, and the shape contour. A reflectance reduction structure composed of a fine concavo-convex structure is formed in a region other than the region in the form of letters and patterns, followed by laminating a diffractive structure forming layer, forming a diffractive structure in the diffractive structure forming layer, and further reflecting layer A method for producing a transfer foil in which adhesive layers are sequentially laminated and peeled at an interface between a reflectance-reducing structure forming layer and a diffraction structure-forming layer. A stamper having a fine concavo-convex structure with an interval of 250 to 400 nm and an aspect ratio of 0.25 or more is produced, and the fine concavo-convex structure of the stamper is transferred and formed.

転写箔の形状輪郭に沿って反射低減構造が設けられることにより、転写箔の端部境界線が目立たなくなり、埋め込まれたような外観となるため、物品から転写箔を不正に剥離して偽造品に貼付される不正を防止でき、セキュリティ性の向上が図れる。   By providing a reflection reduction structure along the shape outline of the transfer foil, the edge boundary line of the transfer foil becomes inconspicuous, and it becomes an embedded appearance. It is possible to prevent fraud that is affixed to the card and improve security.

本発明の、転写箔の形状輪郭に沿って反射低減構造が設けられ転写箔を正面から見た時の概念図である。It is a conceptual diagram when the reflection reduction structure is provided along the shape outline of the transfer foil of the present invention and the transfer foil is viewed from the front. 本発明の、転写箔の形状輪郭に沿った領域と、形状輪郭に沿った領域以外の領域に文字や模様状に反射低減構造が設けられ転写箔を正面から見た時の概念図である。It is a conceptual diagram when the reflection reduction structure is provided in the area | region along the shape outline of the transfer foil of this invention, and the area | region other than the area | region along the shape outline in the shape of a character or a pattern, and the transfer foil is seen from the front. 本発明の転写箔の形状輪郭に沿って反射低減構造が設けられ転写箔を断面図を示した概念図である。It is the conceptual diagram which provided the reflection reduction structure along the shape outline of the transfer foil of this invention, and showed sectional drawing. 本発明の転写箔の形状輪郭に沿って反射低減構造が設けられ転写箔を被転写物に転写した状態を示した断面概念図である。It is the cross-sectional conceptual diagram which showed the state which provided the reflection reduction structure along the shape outline of the transfer foil of this invention, and transcribe | transferred the transfer foil to the to-be-transferred object. 本発明の転写箔の形状輪郭に沿って反射低減構造が設けられ転写箔の製造方法において、支持体上の反射率低減構造形成層に、スタンパーに形成された反射率低減構造部を転写箔の形状輪郭に沿って転写する工程を示した概念図である。In the method for manufacturing a transfer foil in which the reflection reducing structure is provided along the shape contour of the transfer foil of the present invention, the reflectance reducing structure formed on the stamper is formed on the reflectance reducing structure forming layer on the support. It is the conceptual diagram which showed the process transferred along a shape outline. 本発明の転写箔の形状輪郭に沿って反射低減構造が設けられ転写箔の製造方法において、支持体上の反射率低減構造形成層に、スタンパーに形成された反射率低減構造部を光照射により形成する工程を示した概念図である。In the method for manufacturing a transfer foil according to the present invention, a reflection reduction structure is provided along the shape contour of the transfer foil, and the reflectance reduction structure formed on the stamper is applied to the reflectance reduction structure formation layer on the support by light irradiation. It is the conceptual diagram which showed the process to form. 本発明の転写箔の製造方法において転写箔の形状輪郭に沿って反射率低減構造部が成形された状態を示した概念図である。It is the conceptual diagram which showed the state by which the reflectance reduction structure part was shape | molded along the shape outline of a transfer foil in the manufacturing method of the transfer foil of this invention. 本発明の非反射率低減構造部を転写箔の形状輪郭に沿った領域と、形状輪郭に沿った領域以外の領域に文字や模様状に設けた転写箔の製造方法において、支持体上の反射率低減構造形成層に、スタンパーに形成された反射率低減構造部を熱プレスにより形成する工程を示した概念図である。In the method for manufacturing a transfer foil in which the non-reflectance reducing structure according to the present invention is provided in a region along the shape contour of the transfer foil and a region other than the region along the shape contour in a letter or pattern shape, the reflection on the support is reflected It is the conceptual diagram which showed the process of forming the reflectance reduction structure part formed in the stamper in a rate reduction structure formation layer by hot press. 本発明の非反射率低減構造部を転写箔の形状輪郭に沿った領域と、形状輪郭に沿った領域以外の領域に文字や模様状に設けた転写箔の製造方法において、支持体上の反射率低減構造形成層に、スタンパーに形成された反射率低減構造部を光照射により形成する工程を示した概念図である。In the method for manufacturing a transfer foil in which the non-reflectance reducing structure according to the present invention is provided in a region along the shape contour of the transfer foil and a region other than the region along the shape contour in a letter or pattern shape, the reflection on the support is reflected. It is the conceptual diagram which showed the process of forming the reflectance reduction structure part formed in the stamper by light irradiation in a rate reduction structure formation layer. 本発明の非反射率低減構造部を転写箔の形状輪郭に沿った領域と、形状輪郭に沿った領域以外の領域に文字や模様状に設けた転写箔の製造方法において反射率低減構造部が成形された状態を示した概念図である。In the method for manufacturing a transfer foil in which the non-reflectance reducing structure portion of the present invention is provided in a region along the shape contour of the transfer foil and a region other than the region along the shape contour in a letter or pattern shape, the reflectance reduction structure portion is It is the conceptual diagram which showed the shape | molded state.

以下本発明を実施するための形態を、図面を用いて詳細に説明する。図1は本発明の被転写物16に転写された転写箔1を示しており、転写箔の形状輪郭に沿って非反射率低減構造部が設けられているため、転写箔の端部境界線が目立たなくなり、埋め込まれたような外観となった状態を示している。   DESCRIPTION OF EMBODIMENTS Hereinafter, embodiments for carrying out the present invention will be described in detail with reference to the drawings. FIG. 1 shows a transfer foil 1 transferred to an object to be transferred 16 according to the present invention, and a non-reflectance reducing structure portion is provided along the shape contour of the transfer foil. Is inconspicuous and shows an embedded appearance.

図2は反射部4及び回折構造部3の上に形成される反射率低減構造部2を転写箔の形状輪郭に沿った領域と、形状輪郭に沿った領域以外の領域に設け、形状輪郭に沿った領域以外の領域には、文字パターン「TOP」を設けた状態を示しており、傾けると、反射光の強度の違いでパターンが出現する状態を示している。文字パターン「TOP」の部分にだけ反射率低減構造部2が形成されており、角度によって「TOP」文字パターンが観察できる。   In FIG. 2, the reflectance reduction structure 2 formed on the reflection part 4 and the diffraction structure part 3 is provided in a region along the shape contour of the transfer foil and in a region other than the region along the shape contour. The area other than the area along the line shows a state in which the character pattern “TOP” is provided, and when tilted, the pattern appears due to the difference in intensity of reflected light. The reflectance reduction structure portion 2 is formed only in the portion of the character pattern “TOP”, and the “TOP” character pattern can be observed depending on the angle.

図3は本発明の転写箔1の断面図を示した概念図であり、支持体11上に反射率低減構造形成層12が積層されており、低減構造形成層12表面には反射率低減構造部2が転写箔の形状輪郭に沿って形成され、その上に回折構造形成層13が積層され、回折構造形成層13の表面には回折構造部3が形成され、回折構造部3の表面には反射層14が設けられ、更に接着層15が積層されている。   FIG. 3 is a conceptual diagram showing a cross-sectional view of the transfer foil 1 of the present invention, in which a reflectance-reducing structure forming layer 12 is laminated on a support 11, and the surface of the reducing structure-forming layer 12 has a reflectance-reducing structure. The portion 2 is formed along the contour of the transfer foil, and the diffractive structure forming layer 13 is laminated thereon, the diffractive structure portion 3 is formed on the surface of the diffractive structure forming layer 13, and the surface of the diffractive structure portion 3 is formed. Is provided with a reflective layer 14 and an adhesive layer 15 is further laminated thereon.

図4は本発明の転写箔1を被転写物16に転写した状態を示した断面概念図であり、転写時には反射率低減構造形成層12と回折構造形成層13の界面から剥離し、転写された箔の表面には反射率低減構造部2が転写箔の形状輪郭に沿って形成されている。   FIG. 4 is a conceptual cross-sectional view showing a state in which the transfer foil 1 of the present invention has been transferred to the transfer object 16. During transfer, the transfer foil 1 is peeled off from the interface between the reflectance-reducing structure forming layer 12 and the diffraction structure forming layer 13 and transferred. The reflectance reducing structure 2 is formed on the surface of the foil along the shape contour of the transfer foil.

図5、図6、図7は、本発明の転写箔1の表面に形成される反射率低減構造部2の成形方法を示しており、支持体11上に積層された反射率低減構造形成層12と表面に反射率低減構造部2を形成したスタンパー21とを重ね合わせ、透明固定冶具23にセットし、硬化光22を照射することにより、反射率低減構造形成層12表面に反射率低減構造部2を転写箔の形状輪郭に沿って形成する工程を示している。   5, FIG. 6 and FIG. 7 show a method for forming the reflectance reducing structure 2 formed on the surface of the transfer foil 1 of the present invention, and the reflectance reducing structure forming layer laminated on the support 11. 12 and the stamper 21 having the reflectance reducing structure portion 2 formed on the surface thereof are overlapped, set on the transparent fixing jig 23, and irradiated with the curing light 22, whereby the reflectance reducing structure is formed on the surface of the reflectance reducing structure forming layer 12. The process which forms the part 2 along the shape outline of transfer foil is shown.

図8、図9、図10は、本発明の反射率低減構造部2を転写箔の形状輪郭に沿った領域と、転写箔の形状輪郭に沿った領域以外の領域には、パターン状に反射率低減構造部2を設ける転写箔の製造方法を示しており、支持体11上に積層された反射率低減構造形成層12と表面に反射率低減構造部2と非反射率低減構造部5とを形成したスタンパー21とを重ね合わせ、透明固定冶具23にセットし、硬化光22を照射することにより、反射率低減構造形成層12表面に反射率低減構造部2を形成する工程を示している。   8, 9, and 10, the reflectance reduction structure portion 2 of the present invention is reflected in a pattern shape in a region along the shape contour of the transfer foil and a region other than the region along the shape contour of the transfer foil. 1 shows a manufacturing method of a transfer foil provided with a reflectance reduction structure portion 2, a reflectance reduction structure forming layer 12 laminated on a support 11, a reflectance reduction structure portion 2 and a non-reflectivity reduction structure portion 5 on the surface, The step of forming the reflectivity reducing structure 2 on the surface of the reflectivity reducing structure forming layer 12 is shown by superimposing the stamper 21 on which is formed, setting on the transparent fixing jig 23 and irradiating the curing light 22. .

形成された反射率低減構造部2を持つ反射率低減構造形成層12上に、さらに回折構造形成層13を積層し、回折構造形成層13表面にホログラムや回折格子といった回折構造部3を形成したスタンパーを用い、熱プレスにより転写成形する。   A diffractive structure forming layer 13 is further laminated on the reflectance reducing structure forming layer 12 having the formed reflectance reducing structure 2, and a diffractive structure 3 such as a hologram or a diffraction grating is formed on the surface of the diffractive structure forming layer 13. Using a stamper, transfer molding is performed by hot pressing.

更に回折構造形成層13表面の回折構造部3の表面に反射層14として、金属や金属酸化物を真空の抵抗加熱方式やEB加熱方式により薄膜形成し、更にその上に接着層15を設け転写箔を製造する。接着層15として粘着剤を用いる場合には剥離紙を貼り合わせる必要がある。   Furthermore, a thin film of metal or metal oxide is formed on the surface of the diffractive structure 3 on the surface of the diffractive structure forming layer 13 as a reflective layer 14 by a vacuum resistance heating method or an EB heating method, and an adhesive layer 15 is further provided thereon for transfer. Manufacture foil. When an adhesive is used as the adhesive layer 15, it is necessary to bond release paper.

製造された転写箔1は、被転写物16に転写して使用されるが、転写後、支持体11を剥がすと、反射率低減構造形成層12と回折構造形成層13の界面~剥がれ、転写箔1の表面の反射率低減構造部2が現れる。   The produced transfer foil 1 is used after being transferred to the transfer object 16. When the support 11 is peeled off after the transfer, the interface between the reflectance-reducing structure forming layer 12 and the diffractive structure forming layer 13 is peeled off and transferred. The reflectance reducing structure 2 on the surface of the foil 1 appears.

本発明における反射低減構造部2の構造としては、頂点間隔が200〜400nm、アスペクト比が0.25以上の凹凸構造にある。原理的には、頂点間隔が200〜400nmと可視光波長よりも小さいスケールなので凹凸による可視光波長域(400nmから700nm)で光の干渉による強め合いがないこと、アスペクト比が0.25以上という、凹凸構造の深さ方向の規定により散乱・反射が抑制され、散乱も小さくなるためであり、照射光の入射角に拘わらず、法線方向へ回折光を射出するのを防ぐことができる。また頂点間隔が小さすぎると、アスペクト比を維持した場合でも深さが浅くなってしまうため、反射が増加してしまう。このため頂点間隔は200nm以上が好ましい。   The structure of the reflection reducing structure 2 in the present invention is an uneven structure having a vertex interval of 200 to 400 nm and an aspect ratio of 0.25 or more. In principle, since the vertex interval is 200 to 400 nm, which is a smaller scale than the visible light wavelength, there is no strengthening due to light interference in the visible light wavelength range (400 nm to 700 nm) due to irregularities, and the aspect ratio is 0.25 or more This is because the scattering / reflection is suppressed and the scattering is reduced by defining the depth direction of the concavo-convex structure, and it is possible to prevent the diffracted light from being emitted in the normal direction regardless of the incident angle of the irradiated light. If the vertex interval is too small, the depth becomes shallow even when the aspect ratio is maintained, so that reflection increases. For this reason, the vertex interval is preferably 200 nm or more.

凹凸構造における凹部または凸部の配置パターンは、マトリックス状、ハニカム状に限定されるものではなく、矩形格子等の別の周期性を伴う配置パターン、あるいはランダムな凸部パターンであつても良い。少なくとも回折構造形成層の表面に2次元的に反射率低減構造部2が形成されていれば良い。   The arrangement pattern of the concave portions or the convex portions in the concavo-convex structure is not limited to a matrix shape or a honeycomb shape, and may be an arrangement pattern with another periodicity such as a rectangular lattice or a random convex portion pattern. It is only necessary that the reflectance reduction structure portion 2 is formed two-dimensionally on the surface of at least the diffraction structure forming layer.

図7で示した全面に反射低減構造部2を形成した転写箔1では、転写箔1の形状輪郭に沿った領域の表面の反射が低減され、転写箔の端部境界線が目立たなくなり、埋め込まれたような外観となる。図10で示したパターン状に反射低減構造部2を形成した箔では、形状輪郭に沿った領域以外の領域に、パターン状に反射低減構造部2が設けられ、見る角度により回折光以外の光がパターン状に確認できるため偽造防止効果を高めることになる。   In the transfer foil 1 in which the reflection reducing structure portion 2 is formed on the entire surface shown in FIG. 7, the reflection on the surface of the region along the shape outline of the transfer foil 1 is reduced, and the end boundary line of the transfer foil becomes inconspicuous and embedded. The appearance looks like this. In the foil in which the reflection reducing structure 2 is formed in the pattern shown in FIG. 10, the reflection reducing structure 2 is provided in a pattern in a region other than the region along the shape contour, and light other than the diffracted light depends on the viewing angle. Since it can be confirmed in a pattern shape, the forgery prevention effect is enhanced.

本発明を構成する支持体11、反射率低減構造形成層12、回折構造形成層13、反射層14、接着層15に使用する材料に関して説明する。   The materials used for the support 11, the reflectance-reducing structure forming layer 12, the diffractive structure forming layer 13, the reflecting layer 14, and the adhesive layer 15 constituting the present invention will be described.

基材1としては、ポリエチレンテレフタレート(PET)及びポリカーボネート(PC)などの樹脂からなるフィルム又はシートであり、反射率低減構造形成層12を硬化させるために、透明であることが必要である。   The substrate 1 is a film or sheet made of a resin such as polyethylene terephthalate (PET) and polycarbonate (PC), and is required to be transparent in order to cure the reflectance-reducing structure forming layer 12.

反射率低減構造形成層12には光硬化性樹脂等が使用できる。例えば、エポキシ(メタ)アクリル、ウレタン(メタ)アクリレート等が使用できる。   A photocurable resin or the like can be used for the reflectance-reducing structure forming layer 12. For example, epoxy (meth) acryl, urethane (meth) acrylate, etc. can be used.

回折構造形成層13には熱可塑性樹脂、熱硬化性樹脂、が使用できる。例えば、熱可塑性樹脂では、アクリル系樹脂、エポキシ系樹脂、セルロース系樹脂、ビニル系樹脂等があげられる。   A thermoplastic resin or a thermosetting resin can be used for the diffraction structure forming layer 13. For example, acrylic resins include acrylic resins, epoxy resins, cellulose resins, vinyl resins, and the like.

また、反応性水酸基を有するアクリルポリオールやポリエステルポリオール等にポリイソシアネートを架橋剤として添加して架橋させたウレタン樹脂、メラミン系樹脂、フェノール系樹脂等が使用できる。その厚さとしては0.5〜5.0μmが好ましい。   In addition, urethane resins, melamine resins, phenol resins, and the like obtained by adding polyisocyanate as a crosslinking agent to an acrylic polyol or polyester polyol having a reactive hydroxyl group and crosslinking can be used. The thickness is preferably 0.5 to 5.0 μm.

反射層14にはアルミニウム、金、銀、銅、Sn(スズ)及びこれらの金属を含む合金や金属の酸化物、硫化物を使用することができ、厚みとしては100Å〜1000Åが好ましい。   The reflective layer 14 can be made of aluminum, gold, silver, copper, Sn (tin), alloys containing these metals, metal oxides or sulfides, and the thickness is preferably 100 to 1000 mm.

反射層14のパターン化はマスクを用いパターン状に蒸着して形成し、回折構造形成部5上に蒸着層14を設け、更にその上に透明な樹脂塗液をパターン状にレジストとして設け、乾燥後エッチング液にて、露出した蒸着膜からなる反射層14を除去してパターンを形成することもできる。反射層14としてアルミ蒸着膜を用いる場合には、水酸化ナトリウム水溶液をエッチング液として用いることが知られている。   The reflective layer 14 is patterned by vapor deposition in a pattern using a mask, the vapor deposition layer 14 is provided on the diffractive structure forming portion 5, and a transparent resin coating liquid is provided thereon as a resist and dried. The pattern can also be formed by removing the reflective layer 14 made of the exposed deposited film with a post-etching solution. In the case where an aluminum vapor deposition film is used as the reflective layer 14, it is known that an aqueous sodium hydroxide solution is used as an etching solution.

接着層15は、ポリエステル樹脂、アクリル樹脂、塩化ビニル樹脂、ポリアミド樹脂、ポリ酢酸ビニル樹脂、ゴム系樹脂、エチレン−酢酸ビニル共重合樹脂、塩化ビニル酢酸共重合樹脂等の熱可塑性樹脂が使用できる。膜厚は1〜20μmが好ましい。   For the adhesive layer 15, thermoplastic resins such as polyester resin, acrylic resin, vinyl chloride resin, polyamide resin, polyvinyl acetate resin, rubber resin, ethylene-vinyl acetate copolymer resin, vinyl chloride acetate copolymer resin can be used. The film thickness is preferably 1 to 20 μm.

頂点間隔が2500〜400nm、アスペクト比が0.25以上の凹凸構造は、ガラス基板上に塗布されたEB樹脂に電子ビーム描画して、凹凸構造を得るのが一般的である。形成された凹凸構造上に金や銀の薄膜を形成し、その上に金属めっきを行うことにより、スタンパー21を形成する。   In general, a concavo-convex structure having a vertex interval of 2500 to 400 nm and an aspect ratio of 0.25 or more is obtained by electron beam drawing on an EB resin coated on a glass substrate to obtain a concavo-convex structure. A stamper 21 is formed by forming a thin film of gold or silver on the formed concavo-convex structure and performing metal plating thereon.

作製したスタンパーを21そのまま用いて、反射率低減構造形成層12に加熱加圧を行い、基材側から紫外線あるいは電子線を照射して硬化させ表面の反射率低減構造部2を転写成形しても良いが、一般的にはスタンパー21は複製して用いられている。   The prepared stamper 21 is used as it is, and the reflectance-reducing structure forming layer 12 is heated and pressurized, cured by irradiating ultraviolet rays or an electron beam from the substrate side, and the surface-reduced reflectance reducing structure portion 2 is transferred and molded. In general, however, the stamper 21 is duplicated and used.

また回折構造部3も同様の方法で形成でき、回折構造形成層13に回折構造部3を持つスタンパー13を用い回折構造部3に加熱加圧を行い転写形成する。   The diffractive structure 3 can also be formed by the same method. The stamper 13 having the diffractive structure 3 is used as the diffractive structure forming layer 13, and the diffractive structure 3 is heated and pressed to form a transfer.

作製した転写箔1を被転写物16に貼付け、基材1を剥がすと、反射率低減構造形成層12と回折構造形成層13との界面にて剥離し、転写箔1は表面に反射率低減構造部2を持った回折構造形成層13となる。   When the produced transfer foil 1 is attached to the transfer object 16 and the substrate 1 is peeled off, the transfer foil 1 is peeled off at the interface between the reflectance-reducing structure forming layer 12 and the diffraction structure-forming layer 13, and the transfer foil 1 has a reduced reflectance on the surface. The diffractive structure forming layer 13 having the structure portion 2 is formed.

以下実施例により詳細に説明する。厚さ25μmの透明なポリエチレンテレフタレートフィルムからなる支持体11の片面に、反射率低減構造形成層12として下記の配合比からなる組成物をグラビア印刷法により、塗布厚3μm、乾燥温度110℃で塗布し形成し
た。
<反射率低減構造形成層>
不飽和基含有ウレタン樹脂 100部
光重合開始剤(チバスペシャリティケミカルズ社製イルガキュア184) 1.5部
離型剤(ビックケミー社製アクリルシリコーンBYK−3700) 3部
溶剤(メチルエチルケトン) 400部
その後、頂点間隔350nm、アスペクト比0.5の微細凹凸構造を転写箔1の形状輪郭に沿った領域とパターン状に有するニッケルスタンパー(母型)と、前記フィルムを線圧500N/cm、130℃で加熱圧接し、その状態で、支持体側からメタルハライドランプを使用して200mJ/cm2の光量を照射して硬化させた。そして、このエンボス加工したフィルムをニッケルスタンパー(母型)から剥離して、反射率低減構造が形成されたエンボス加工フィルムを得た。さらに表面硬度をあげるため、エンボス加工面から窒素雰囲気下、高圧水銀灯で300mJ/cm2の光量を追加露光した。
Examples will be described in detail below. On one side of a support 11 made of a transparent polyethylene terephthalate film having a thickness of 25 μm, a composition having the following blending ratio was applied as a reflectance-reducing structure forming layer 12 by a gravure printing method at a coating thickness of 3 μm and a drying temperature of 110 ° C. Formed.
<Reflectance reduction structure forming layer>
Unsaturated group-containing urethane resin 100 parts Photopolymerization initiator (Irgacure 184 manufactured by Ciba Specialty Chemicals) 1.5 parts Release agent (acrylic silicone BYK-3700 manufactured by Big Chemie) 3 parts Solvent (methyl ethyl ketone) 400 parts Thereafter, vertex interval A nickel stamper (matrix) having a fine concavo-convex structure of 350 nm and an aspect ratio of 0.5 in a pattern and a region along the shape contour of the transfer foil 1 is heated and pressed at 130 ° C. with a linear pressure of 500 N / cm. In that state, a metal halide lamp was used from the support side to irradiate a light amount of 200 mJ / cm 2 to be cured. And this embossed film was peeled from the nickel stamper (matrix), and the embossed film in which the reflectance reduction structure was formed was obtained. In order to further increase the surface hardness, a light amount of 300 mJ / cm 2 was additionally exposed from the embossed surface with a high-pressure mercury lamp in a nitrogen atmosphere.

回折構造形成層として、下記の配合比からなる組成物を、グラビア印刷法によって、塗布厚2μm、乾燥温度110℃で塗布した。
<回折構造形成層>
塩化ビニル−酢酸ビニル共重合体とウレタン樹脂の混合物 25部
溶剤
(メチルエチルケトン) 70部
(トルエン) 30部
その後、頂点間隔0.05mm、アスペクト比0.1の回折構造を有するニッケルスタンパー(母型)と、前記フィルムを線圧500N/cm、180℃で加熱圧接し硬化させた。そして、このエンボス加工したフィルムをニッケルスタンパー(母型)から剥離して、回折構造が形成されたエンボス加工フィルムを得た。
As the diffraction structure forming layer, a composition having the following blending ratio was applied at a coating thickness of 2 μm and a drying temperature of 110 ° C. by a gravure printing method.
<Diffraction structure forming layer>
Mixture of vinyl chloride-vinyl acetate copolymer and urethane resin 25 parts Solvent (methyl ethyl ketone) 70 parts (toluene) 30 parts Nickel stamper (matrix) having a diffractive structure with an apex interval of 0.05 mm and an aspect ratio of 0.1 The film was heated and pressed at a linear pressure of 500 N / cm and 180 ° C. to be cured. And this embossed film was peeled from the nickel stamper (matrix), and the embossed film in which the diffraction structure was formed was obtained.

成形された回折構造上に反射層14として金属薄膜であるAl薄膜を、真空蒸着法にて膜厚80nmを全面に設け、その後、前記回折構造の形成部分に位置整合させてパターンマスクを一時的に設けた後、アルカリ処理によって、パターンマスクが設けられていない部分の金属反射層を除去した。   An Al thin film, which is a metal thin film, is provided as a reflective layer 14 on the entire surface of the formed diffractive structure to a thickness of 80 nm by vacuum deposition, and then the pattern mask is temporarily aligned with the diffractive structure forming portion. Then, the portion of the metal reflective layer where the pattern mask was not provided was removed by alkali treatment.

次に接着層として、下記の配合比からなる組成物をグラビア印刷法によって、塗布厚4.0μm、乾燥温度110℃で塗布した。
<接着層>
ポリエステル樹脂 30部
溶剤
(トルエン) 40部
(メチルエチルケトン) 40部
以上のようにして作製した転写箔を、被転写媒体(紙)に転写し、偽造防止物品とし、作製した偽造防止物品を目視観察した。従来の回折構造付転写箔に比べ、本発明による回折構造付き転写箔は転写箔の端部境界線が目立たなくなり、埋め込まれたような外観となった。また転写箔1の形状輪郭に沿った領域以外の部分には、箔表面の反射光量による潜像が付与されており、偽造防止効果が高まった。
Next, as an adhesive layer, a composition having the following blending ratio was applied by a gravure printing method at a coating thickness of 4.0 μm and a drying temperature of 110 ° C.
<Adhesive layer>
Polyester resin 30 parts Solvent (toluene) 40 parts (Methyl ethyl ketone) 40 parts The transfer foil produced as described above was transferred to a medium to be transferred (paper) to obtain an anti-counterfeit article, and the produced anti-counterfeit article was visually observed. . Compared with the conventional transfer foil with a diffractive structure, the transfer foil with a diffractive structure according to the present invention has an appearance that the end boundary line of the transfer foil becomes inconspicuous and is embedded. Moreover, the latent image by the reflected light amount of the foil surface was provided to parts other than the area | region along the shape outline of the transfer foil 1, and the forgery prevention effect increased.

1・・・転写箔
2・・・反射率低減構造部
3・・・回折構造部
4・・・反射部
5・・・非反射率低減構造部
11・・・支持体
12・・・反射率低減構造形成層
13・・・回折構造形成層
14・・・反射層
15・・・接着層
16・・・被転写物
21・・・スタンパー
22・・・硬化光
23・・・透明固定治具
DESCRIPTION OF SYMBOLS 1 ... Transfer foil 2 ... Reflectivity reduction structure part 3 ... Diffraction structure part 4 ... Reflection part 5 ... Non-reflectance reduction structure part 11 ... Support body 12 ... Reflectivity Reduction structure forming layer 13 ... Diffraction structure forming layer 14 ... Reflective layer 15 ... Adhesive layer 16 ... Transfer 21 ... Stamper 22 ... Curing light 23 ... Transparent fixing jig

Claims (5)

接着層と、接着層上に回折構造形成層と、回折構造形成層の回折構造側に設けられた反射層とを備えた転写箔であって、回折構造形成層上の回折構造側と対峙する側に、転写箔の形状輪郭に沿って反射低減構造が設けられ、前記反射低減構造が、頂点間隔が200〜400nmでアスペクト比が0.25以上の微細凹凸構造からなることを特徴とする転写箔。   A transfer foil comprising an adhesive layer, a diffractive structure forming layer on the adhesive layer, and a reflective layer provided on the diffractive structure side of the diffractive structure forming layer, facing the diffractive structure side on the diffractive structure forming layer A reflection reduction structure is provided on the side along the shape contour of the transfer foil, and the reflection reduction structure is composed of a fine concavo-convex structure having a vertex interval of 200 to 400 nm and an aspect ratio of 0.25 or more. Foil. 接着層と、接着層上に回折構造形成層と、回折構造形成層の回折構造側に設けられた反射層とを備えた転写箔であって、回折構造形成層上の回折構造側と対峙する側に、転写箔の形状輪郭に沿った領域と、形状輪郭に沿った領域以外の領域に文字や模様状に反射低減構造が設けられ、前記反射低減構造が、頂点間隔が200〜400nmでアスペクト比が0.25以上の微細凹凸構造からなることを特徴とする転写箔。   A transfer foil comprising an adhesive layer, a diffractive structure forming layer on the adhesive layer, and a reflective layer provided on the diffractive structure side of the diffractive structure forming layer, facing the diffractive structure side on the diffractive structure forming layer On the side, a reflection reducing structure is provided in a region along the shape contour of the transfer foil and a region other than the region along the shape contour in the form of letters or patterns, and the reflection reduction structure has an aspect ratio of 200 to 400 nm between the vertices. A transfer foil comprising a fine relief structure having a ratio of 0.25 or more. 請求項1または請求項2に記載の転写箔を転写したことを特徴とする転写媒体。   A transfer medium obtained by transferring the transfer foil according to claim 1. 基材上に反射率低減構造形成層を設け、前記反射率低減構造形成層の表面に転写箔の形状輪郭に沿って、微細凹凸構造からなる反射率低減構造を形成し、続いて回折構造形成層を積層して、前記回折構造形成層に回折構造を形成し、さらに反射層、接着層を順次積層する、反射率低減構造形成層と回折構造形成層との界面にて剥離する転写箔の製造方法であって、反射率低減構造形成層に設けられる微細凹凸構造を、頂点間隔が200〜400nmでアスペクト比が0.25以上の微細凹凸構造を持つスタンパーを作製し、前記スタンパーの微細凹凸構造を転写させて形成することを特徴とする転写箔の製造方法。   A reflectance-reducing structure forming layer is provided on a substrate, and a reflectance-reducing structure consisting of a fine concavo-convex structure is formed on the surface of the reflectance-reducing structure forming layer along the shape contour of the transfer foil, followed by formation of a diffraction structure. The transfer foil is peeled off at the interface between the reflectance reduction structure forming layer and the diffraction structure forming layer. A method for producing a stamper having a fine concavo-convex structure having a fine concavo-convex structure provided on a reflectance-reducing structure forming layer and having a fine concavo-convex structure having an apex interval of 200 to 400 nm and an aspect ratio of 0.25 or more. A method for producing a transfer foil, wherein the structure is formed by transferring a structure. 基材上に反射率低減構造形成層を設け、前記反射率低減構造形成層の表面に転写箔の形状輪郭に沿った領域と、形状輪郭に沿った領域以外の領域に文字や模様状に、微細凹凸構造からなる反射率低減構造を形成し、続いて回折構造形成層を積層して、前記回折構造形成層に回折構造を形成し、さらに反射層、接着層を順次積層する、反射率低減構造形成層と回折構造形成層との界面にて剥離する転写箔の製造方法であって、反射率低減構造形成層に設けられる微細凹凸構造を、頂点間隔が200〜400nmでアスペクト比が0.25以上の微細凹凸構造を持つスタンパーを作製し、前記スタンパーの微細凹凸構造を転写させて形成することを特徴とする転写箔の製造方法。   Provide a reflectance-reducing structure forming layer on the substrate, in the region along the shape contour of the transfer foil on the surface of the reflectance-reducing structure forming layer, in a character or pattern in the region other than the region along the shape contour, Reducing the reflectivity by forming a reflectivity-reducing structure consisting of a fine concavo-convex structure, then laminating a diffractive structure-forming layer, forming a diffractive structure on the diffractive structure-forming layer, and then laminating a reflective layer and an adhesive layer sequentially A method for producing a transfer foil that peels off at an interface between a structure forming layer and a diffraction structure forming layer, wherein a fine relief structure provided on a reflectance reducing structure forming layer has a vertex interval of 200 to 400 nm and an aspect ratio of 0. A method for producing a transfer foil, comprising producing a stamper having 25 or more fine concavo-convex structures and transferring the fine concavo-convex structure of the stamper.
JP2011057577A 2011-03-16 2011-03-16 Transfer foil, transfer medium, and method of manufacturing transfer foil Withdrawn JP2012192586A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022055667A1 (en) * 2020-09-10 2022-03-17 D&K International Inc. Intrusion resistant thermal laminating film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022055667A1 (en) * 2020-09-10 2022-03-17 D&K International Inc. Intrusion resistant thermal laminating film

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