JP2012183457A5 - - Google Patents
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- JP2012183457A5 JP2012183457A5 JP2011046718A JP2011046718A JP2012183457A5 JP 2012183457 A5 JP2012183457 A5 JP 2012183457A5 JP 2011046718 A JP2011046718 A JP 2011046718A JP 2011046718 A JP2011046718 A JP 2011046718A JP 2012183457 A5 JP2012183457 A5 JP 2012183457A5
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- JP
- Japan
- Prior art keywords
- liquid
- separation method
- separation
- solid
- mixed acid
- Prior art date
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- 239000007788 liquid Substances 0.000 claims description 16
- 238000000926 separation method Methods 0.000 claims description 14
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 8
- 238000004821 distillation Methods 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 7
- LDDQLRUQCUTJBB-UHFFFAOYSA-O azanium;hydrofluoride Chemical compound [NH4+].F LDDQLRUQCUTJBB-UHFFFAOYSA-O 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 238000002425 crystallisation Methods 0.000 claims 4
- 230000008025 crystallization Effects 0.000 claims 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 3
- 229910001868 water Inorganic materials 0.000 claims 3
- 238000005530 etching Methods 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 238000001816 cooling Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000003756 stirring Methods 0.000 claims 1
- 239000002699 waste material Substances 0.000 claims 1
Description
[適用例3]
本発明の分離方法では、前記第2の液体から、前記フッ化水素アンモニウムおよび前記珪素を含む固体を晶析させ、
前記第2の液体から前記固体を分離した第4の液体を、前記混酸とともに再び前記第1の蒸留工程により処理することが好ましい。
これにより、混酸からより多くのフッ酸を分離・回収することができる。
[Application Example 3]
In the separation method of the present invention, the solid containing the ammonium hydrogen fluoride and the silicon is crystallized from the second liquid,
The fourth liquid obtained by separating the solid from the second liquid is preferably treated again with the mixed acid by the first distillation step .
Thereby, more hydrofluoric acid can be separated and recovered from the mixed acid.
Claims (9)
前記混酸を蒸留することによって、前記フッ酸および水を含む第1の液体を留出液として回収するとともに、前記フッ化水素アンモニウムおよび前記珪素を含む第2の液体を缶出液として回収する第1の蒸留工程と、
前記第1の液体を蒸留することによって、前記第1の液体から前記水を主に分離し、前記第1の液体よりも前記フッ酸の濃度の高い第3の液体を缶出液として回収する第2の蒸留工程とを有することを特徴とする分離方法。 A separation method for separating the hydrofluoric acid from a mixed acid containing at least hydrofluoric acid, ammonium hydrogen fluoride, silicon and water,
A first liquid containing the hydrofluoric acid and water is recovered as a distillate by distilling the mixed acid, and a second liquid containing the ammonium hydrogen fluoride and the silicon is recovered as a bottom liquid. 1 distillation step;
By distilling the first liquid, the water is mainly separated from the first liquid, and the third liquid having a higher concentration of hydrofluoric acid than the first liquid is recovered as a bottom liquid. And a second distillation step.
前記第2の液体から前記固体を分離した第4の液体を、前記混酸とともに再び前記第1の蒸留工程により処理する請求項1または2に記載の分離方法。 Crystallizing the ammonium hydrogen fluoride and the solid containing silicon from the second liquid,
The separation method according to claim 1 or 2, wherein the fourth liquid obtained by separating the solid from the second liquid is again treated by the first distillation step together with the mixed acid.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011046718A JP2012183457A (en) | 2011-03-03 | 2011-03-03 | Separation method and separation device |
TW101106790A TWI465280B (en) | 2011-03-03 | 2012-03-01 | Separation method and separation device |
CN201210054230.7A CN102674254B (en) | 2011-03-03 | 2012-03-02 | Separation method and separation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011046718A JP2012183457A (en) | 2011-03-03 | 2011-03-03 | Separation method and separation device |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012183457A JP2012183457A (en) | 2012-09-27 |
JP2012183457A5 true JP2012183457A5 (en) | 2014-04-10 |
Family
ID=46806899
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011046718A Withdrawn JP2012183457A (en) | 2011-03-03 | 2011-03-03 | Separation method and separation device |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2012183457A (en) |
CN (1) | CN102674254B (en) |
TW (1) | TWI465280B (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5941028B2 (en) * | 2012-11-15 | 2016-06-29 | オー・ジー株式会社 | Method for removing Si from Si-containing hydrofluoric acid waste liquid and method for recovering hydrofluoric acid from Si-containing hydrofluoric acid mixed acid waste liquid |
CN103818992B (en) * | 2012-11-15 | 2017-06-20 | Og株式会社 | The method of silicon, method and its device from siliceous hydrofluoric acid system mixed acid waste liquor recovery hydrofluoric acid are removed from siliceous hydrofluoric acid system waste liquid |
JP2014151269A (en) * | 2013-02-08 | 2014-08-25 | Seiko Epson Corp | Method for regenerating an etchant and etchant regenerating apparatus |
CN103566606B (en) * | 2013-11-04 | 2015-03-04 | 中国地质大学(武汉) | Multifunctional purification device and method for purifying ammonium bifluoride by using same |
CN110104864A (en) * | 2019-06-06 | 2019-08-09 | 盛隆资源再生(无锡)有限公司 | A kind of processing method of the fluorine-containing ammonia-containing water of acid phosphorus acid type |
CN110272159A (en) * | 2019-06-17 | 2019-09-24 | 苏州乔发环保科技股份有限公司 | The recycling processing method and device of inorganic salts in a kind of industrial wastewater |
CN113045089B (en) * | 2021-03-15 | 2023-04-18 | 盛隆资源再生(无锡)有限公司 | Method for refining and purifying etching waste liquid |
CN113358436B (en) * | 2021-06-11 | 2022-12-30 | 中国科学技术大学 | Device and method for purifying ammonium bifluoride |
CN113880048B (en) * | 2021-09-30 | 2023-06-27 | 中化蓝天霍尼韦尔新材料有限公司 | High-efficiency hydrofluoric acid recycling system and method |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4936955A (en) * | 1988-08-12 | 1990-06-26 | Alameda Instruments, Inc. | Hydrofluoric acid reprocessing for semiconductor standards |
JPH03267189A (en) * | 1990-03-16 | 1991-11-28 | Konica Corp | Evaporation concentrating device for waste photographic processing liquid |
JP3378892B2 (en) * | 1991-10-03 | 2003-02-17 | ステラケミファ株式会社 | Method for recovering calcium fluoride from fluorine-based etchant |
CN1180043A (en) * | 1997-11-10 | 1998-04-29 | 应烈荣 | Process for extracting fluorhydric acid from fluorine-containing sulphuric acid |
JP4581618B2 (en) * | 2004-10-14 | 2010-11-17 | 三菱化学エンジニアリング株式会社 | Method for recovering hydrofluoric acid |
CN101028919B (en) * | 2006-02-27 | 2011-07-20 | 三菱化学工程株式会社 | Recovery of hydrofluoric acid |
DE102006040830A1 (en) * | 2006-08-31 | 2008-03-06 | Wacker Chemie Ag | Process for working up an etching mixture obtained in the production of high-purity silicon |
JP5143440B2 (en) * | 2007-02-01 | 2013-02-13 | 森田化学工業株式会社 | Method and apparatus for separating and recovering acid components from waste liquid containing hydrofluoric acid, hydrochloric acid and silicohydrofluoric acid |
CN201253537Y (en) * | 2008-09-04 | 2009-06-10 | 常熟市胜诺环保设备有限公司 | Mixed acid waste gas treater |
JP5347664B2 (en) * | 2009-04-03 | 2013-11-20 | 栗田工業株式会社 | Method and apparatus for treating fluorine-containing wastewater |
-
2011
- 2011-03-03 JP JP2011046718A patent/JP2012183457A/en not_active Withdrawn
-
2012
- 2012-03-01 TW TW101106790A patent/TWI465280B/en not_active IP Right Cessation
- 2012-03-02 CN CN201210054230.7A patent/CN102674254B/en not_active Expired - Fee Related
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