JP2012149295A - Device for removing foreign matter in snout and method for removing the foreign matter - Google Patents

Device for removing foreign matter in snout and method for removing the foreign matter Download PDF

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JP2012149295A
JP2012149295A JP2011008080A JP2011008080A JP2012149295A JP 2012149295 A JP2012149295 A JP 2012149295A JP 2011008080 A JP2011008080 A JP 2011008080A JP 2011008080 A JP2011008080 A JP 2011008080A JP 2012149295 A JP2012149295 A JP 2012149295A
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snout
foreign matter
plating
plating bath
bath surface
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JP5609664B2 (en
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Tetsuya Iwata
哲也 岩田
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JFE Steel Corp
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JFE Steel Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a device for removing foreign matter in a snout capable of manufacturing a high-quality plated steel plate in which surface defect is suppressed by discharging the foreign matter sticking on an inner wall surface of the snout to the outside of the snout.SOLUTION: The device for removing foreign matter in a snout is used for removing the foreign matter in the snout placed in a plating tank for hot-dip-plating a to-be-plated material, and includes a snout elevating and lowering device 6, a foreign matter peeling device 7 and a foreign matter sucking device 8. The snout elevating and lowering device 6 operates the snout 2 to move up and down when cleaning the inside of the snout 2, and positions the elevating/lowering position of the snout 2 at an arbitrary position. The foreign matter peeling device 7 peels the foreign matter sticking on the inner wall surface of the snout 2 when cleaning the inside of the snout 2, to clean the inner wall surface of the snout 2. The foreign matter sucking device 8 sucks the peeled foreign matter and the floating foreign matter on the plating bath surface in the snout 2 when cleaning the inside of the snout 2.

Description

本発明は、被めっき材を溶融めっきするめっき槽内に設置されるスナウト内の異物を除去するスナウト内の異物除去装置およびその異物除去方法に関する。   The present invention relates to a foreign matter removing apparatus in a snout for removing foreign matter in a snout installed in a plating tank for hot-plating a material to be plated and a method for removing the foreign matter.

従来、この種のスナウト内の異物除去装置としては、例えば特許文献1に記載のものが知られている。
この異物除去装置は、スナウト内のめっき浴面に接し、めっき浴を攪拌させる旋回可能な案内羽根、めっき浴内に浮遊する異物であるドロスを吸引するドロス吸引手段などを備えている。
ここで、異物とは、めっき槽のめっき浴面に浮遊して被めっき材の表面に付着すると表面欠陥の原因になる金属酸化物、金属間化合物、不純物の酸化物などをいう。
このような異物除去装置では、案内羽根を旋回することによりめっき浴を攪拌して流れが起きたところで、ドロス吸引手段の吸引口にドロスが吸引されて外部に排出され、めっき浴を正常な浴面状態に回復できる。
Conventionally, as this kind of foreign substance removal apparatus in a snout, the thing of patent document 1 is known, for example.
This foreign matter removing device includes a swivelable guide vane that contacts the plating bath surface in the snout and stirs the plating bath, dross suction means for sucking dross that is a foreign matter floating in the plating bath, and the like.
Here, the foreign matter refers to metal oxides, intermetallic compounds, oxides of impurities, etc. that cause surface defects when they float on the plating bath surface of the plating tank and adhere to the surface of the material to be plated.
In such a foreign substance removing device, when the plating bath is agitated by swirling the guide vane and a flow occurs, the dross is sucked into the suction port of the dross suction means and discharged to the outside, so that the plating bath is a normal bath. It can recover to the surface state.

特開2006−274414号公報JP 2006-274414 A

ところで、従来装置では、上記のようにスナウト内のめっき浴面に浮遊する異物を除去することができるが、異物が短時間に大量発生した場合には、除去が間に合わず、めっき表面に悪影響を与える場合がある。このように異物が短時間に大量発生する場合として、めっき浴面が変動した場合があげられる。めっき浴面より上の部分に異物が付着した場合、浴面変動がなければ、一度に大量の異物が剥離することは少ないが、めっき浴面があがることにより、このような異物が一度に大量に剥離する恐れがでてくる。このような問題を避けるために、めっき槽のめっき浴面は操業時には上下に大きくは変動しないように調整される場合が多いが、この変動を全くなくすようにすることは難しい。また、浴面変動を極力抑えた場合には、かえって、一定の位置に大量に異物が付着してしまうという問題も発生する。このように浴面より上方に付着した異物は、除去が難しいという問題もあった。   By the way, in the conventional apparatus, the foreign matter floating on the plating bath surface in the snout can be removed as described above. May give. As a case where a large amount of foreign matter is generated in a short time as described above, there is a case where the plating bath surface fluctuates. If foreign matter adheres to the part above the plating bath surface, if there is no change in the bath surface, it is unlikely that a large amount of foreign matter will be peeled off at one time. There is a risk of peeling. In order to avoid such problems, the plating bath surface of the plating tank is often adjusted so as not to fluctuate up and down during operation, but it is difficult to eliminate this fluctuation at all. In addition, when the bath surface fluctuation is suppressed as much as possible, there is a problem that a large amount of foreign matter adheres to a certain position. As described above, there is a problem that the foreign matter adhering above the bath surface is difficult to remove.

このため、めっき浴面の変動時に、スナウトの内壁面に付着した異物が剥離し、スナウト内のめっき浴面上を短時間で大量に異物が浮遊し、異物の除去が間に合わずにこの浮遊する異物がめっき槽で処理される被めっき材(鋼板)に付着して表面欠陥が生じるという不具合がある。
そこで、本発明は、スナウトの内壁面に付着する異物などをスナウト外に除去するようにし、表面欠陥が抑制された高品質のめっき鋼板が製造できるようにしたスナウト内の異物除去装置などを提供することにある。
For this reason, when the plating bath surface fluctuates, the foreign matter adhering to the inner wall surface of the snout is peeled off, and a large amount of foreign matter floats on the plating bath surface in the snout in a short time. There exists a malfunction that a foreign material adheres to the to-be-plated material (steel plate) processed with a plating tank, and a surface defect arises.
Accordingly, the present invention provides a device for removing foreign matter in the snout, which can remove foreign matter adhering to the inner wall surface of the snout outside the snout and produce a high quality plated steel sheet with suppressed surface defects. There is to do.

上記の課題を解決し上記の目的を達成するために、本発明は、以下のような構成からなる。
本発明の装置は、被めっき材を溶融めっきするめっき槽内に設置されるスナウト内の異物を除去するスナウト内の異物除去装置であって、前記めっき槽のめっき浴面に対する前記スナウトの上下の高さ位置を変更させる変更手段と、前記スナウト内のめっき浴面下に配置される吐出口から不活性ガスを吐出させ、前記めっき浴面を振動させて前記スナウトの内壁面に付着する異物を剥離させる異物剥離手段と、前記スナウトの内壁面から剥離された異物と前記スナウト内のめっき浴面上に浮遊する異物とを吸引する異物吸引手段と、を備えている。
In order to solve the above problems and achieve the above object, the present invention has the following configuration.
An apparatus of the present invention is a foreign matter removing device in a snout for removing foreign matter in a snout installed in a plating bath for hot-plating a material to be plated, which is above and below the snout with respect to the plating bath surface of the plating bath. Changing means for changing the height position, and discharging an inert gas from a discharge port disposed below the plating bath surface in the snout, and vibrating the plating bath surface to remove foreign matter adhering to the inner wall surface of the snout Foreign matter peeling means for peeling off, and foreign matter suction means for sucking foreign matter peeled off from the inner wall surface of the snout and foreign matter floating on the plating bath surface in the snout.

また、前記変更手段は、前記スナウト内の清掃時に、前記スナウトを操業位置から所定の移動範囲で上下方向に移動させ、前記移動範囲は、操業時における前記めっき槽のめっき浴面の目標値の許容範囲よりも大きい。
さらに、前記変更手段は、前記スナウト内の清掃時に、前記スナウトを操業位置から前記めっき槽の深さ方向に昇降させるスナウト昇降手段からなり、前記スナウト昇降手段は、前記スナウトの上昇時に当該スナウトを第1の位置に位置決めし、前記スナウトの降下時に当該スナウトを第2の位置に位置決めするようになっている。
The changing means moves the snout up and down within a predetermined movement range from the operation position when cleaning the inside of the snout, and the movement range is a target value of the plating bath surface of the plating tank at the time of operation. It is larger than the allowable range.
Further, the changing means comprises a snout raising / lowering means for raising and lowering the snout from the operation position in the depth direction of the plating tank when cleaning the inside of the snout, and the snout raising / lowering means removes the snout when the snout is raised. The snout is positioned at the first position, and the snout is positioned at the second position when the snout is lowered.

本発明の方法は、被めっき材を溶融めっきするめっき槽内に設置されるスナウト内の異物を除去するスナウト内の異物除去方法であって、前記スナウト内のめっき浴面下において不活性ガスを吐出させ、前記めっき浴面を振動させて前記スナウトの内壁面に付着する異物を剥離させ、当該剥離された異物と前記めっき浴面上に浮遊する異物とを吸引して前記スナウト外に排出する第1工程と、前記第1工程の終了後、前記スナウトを前記めっき槽の深さ方向に移動させ、前記スナウトの設置位置を変更させる第2工程と、を含み、前記第1工程と前記第2工程とを繰り返すことで前記スナウト内の異物を除去する。   The method of the present invention is a method for removing foreign matter in a snout that removes foreign matter in a snout installed in a plating tank for hot-plating a material to be plated, wherein an inert gas is removed under the plating bath surface in the snout. Discharging, vibrating the plating bath surface to peel off foreign matter adhering to the inner wall surface of the snout, and sucking out the peeled foreign matter and foreign matter floating on the plating bath surface and discharging it out of the snout. A first step and a second step of moving the snout in the depth direction of the plating tank and changing the installation position of the snout after completion of the first step, the first step and the first step The foreign matter in the snout is removed by repeating the two steps.

以上のように本発明では、スナウトの清掃時に、例えば、スナウトをめっき槽の深さ方向に移動させて、そのスナウトの設置位置を変更できるようにした。
そして、その変更後に、スナウト内のめっき浴面下において不活性ガスを吐出させ、めっき浴面を振動させてスナウトの内壁面に付着する異物を剥離させるようにした。
さらに、その剥離された異物およびスナウト内のめっき浴面上に浮遊する異物を吸引してスナウト外に排出するようにした。
このため、本発明によれば、スナウトの内壁面に付着する異物などをスナウト外に除去することができる上に、スナウト内壁面を清浄化できるようになり、表面欠陥が抑制された高品質のめっき鋼板を製造することができる。
As described above, in the present invention, at the time of cleaning the snout, for example, the snout is moved in the depth direction of the plating tank so that the installation position of the snout can be changed.
And after the change, the inert gas was discharged under the plating bath surface in a snout, the plating bath surface was vibrated, and the foreign material adhering to the inner wall surface of a snout was peeled off.
Further, the peeled foreign matter and the foreign matter floating on the plating bath surface in the snout are sucked and discharged out of the snout.
For this reason, according to the present invention, it is possible to remove the foreign matter adhering to the inner wall surface of the snout to the outside of the snout, and also to clean the inner wall surface of the snout, and to improve the quality with suppressed surface defects. A plated steel sheet can be manufactured.

本発明の実施形態の構成を示す図である。It is a figure which shows the structure of embodiment of this invention. スナウト内に発生する異物の状態を説明する説明図である。It is explanatory drawing explaining the state of the foreign material which generate | occur | produces in a snout. スナウトの内壁面に付着した異物の除去方法を説明する説明図である。It is explanatory drawing explaining the removal method of the foreign material adhering to the inner wall face of a snout.

本発明のスナウト内の異物除去装置の実施形態について、図1を参照して説明する。
(装置の構成)
本発明装置の実施形態は、連続式の溶融めっきラインの一部に適用され、図1に示すように、溶融めっき槽1内に設置されるスナウト2内に存在する異物をスナウト2の外部に除去するものである。
An embodiment of the foreign matter removing apparatus in the snout of the present invention will be described with reference to FIG.
(Device configuration)
The embodiment of the apparatus of the present invention is applied to a part of a continuous hot dip plating line, and as shown in FIG. 1, foreign matter existing in the snout 2 installed in the hot dip plating tank 1 is placed outside the snout 2. To be removed.

この実施形態では、図1に示すように、スナウト2の一端側は焼純炉3に接続され、スナウト2の他端側はめっき槽1のめっき浴中に配置されている。スナウト2は、被めっき材aが搬送できるようにその内部は中空体からなり、例えばその断面形状は長方形である。スナウト2は、後述のスナウト昇降装置6でスナウト2を昇降動作させるために、上部側に伸縮自在な蛇腹部2aを含んでいる。
焼純炉3内にはロール4が配置され、めっき槽1にロール5が配置されている。そして、その2つのロール4、5は、焼純炉3内の被めっき材aをスナウト2内を経由させてめっき槽1内に搬送させ、その後に、めっき槽1内の外部に向けて搬送させるようになっている。
In this embodiment, as shown in FIG. 1, one end side of the snout 2 is connected to the smelting furnace 3, and the other end side of the snout 2 is disposed in the plating bath of the plating tank 1. The inside of the snout 2 is a hollow body so that the material to be plated a can be conveyed, and for example, its cross-sectional shape is rectangular. The snout 2 includes a bellows portion 2a that can be expanded and contracted on the upper side in order to move the snout 2 up and down by a snout elevating device 6 described later.
A roll 4 is disposed in the refrigeration furnace 3, and a roll 5 is disposed in the plating tank 1. And the two rolls 4 and 5 convey the to-be-plated material a in the smelting furnace 3 to the inside of the plating tank 1 through the inside of the snout 2, and then to the outside in the plating tank 1. It is supposed to let you.

また、この実施形態では、スナウト2内の清掃を行うために、図1に示すように、スナウト昇降装置6と、異物剥離装置7と、異物吸引装置8とを備えている。
スナウト昇降装置6は、スナウト2内の清掃時に、スナウト2の蛇腹部2aを伸縮させることによりスナウト2を上昇および下降の動作(上下動作)をさせ、かつ、そのスナウト2の昇降位置を任意の位置に位置決めするものである。
Moreover, in this embodiment, in order to clean the inside of the snout 2, as shown in FIG. 1, the snout raising / lowering device 6, the foreign material peeling apparatus 7, and the foreign material suction apparatus 8 are provided.
When the inside of the snout 2 is cleaned, the snout lifting / lowering device 6 raises and lowers the snout 2 by moving the bellows part 2a of the snout 2 (up and down movement), and the raising / lowering position of the snout 2 is arbitrarily set. It is positioned at a position.

異物剥離装置7は、スナウト2内の清掃時に、スナウト2の内壁面に付着する異物を剥離し、スナウト2の内壁面を清浄にさせるものである。具体的には、めっき槽1内に吐出配管9が設けられ、その吐出配管9の吐出口(ノズル)10がスナウト2内のめっき浴面下に配置されている。そして、吐出配管9の入口に不活性ガスを供給することにより、吐出配管9の吐出口10から不活性ガスを吐出(噴射)させ、この吐出によりスナウト2内のめっき浴面を振動させ、このときの振動の衝撃によってスナウト2の内壁面に付着する異物を剥離させるようになっている。   The foreign matter peeling device 7 peels foreign matter adhering to the inner wall surface of the snout 2 when cleaning the inside of the snout 2, and cleans the inner wall surface of the snout 2. Specifically, a discharge pipe 9 is provided in the plating tank 1, and a discharge port (nozzle) 10 of the discharge pipe 9 is disposed below the plating bath surface in the snout 2. Then, by supplying an inert gas to the inlet of the discharge pipe 9, the inert gas is discharged (injected) from the discharge port 10 of the discharge pipe 9, and this discharge vibrates the plating bath surface in the snout 2, The foreign matter adhering to the inner wall surface of the snout 2 is peeled off by the impact of the vibration.

異物吸引装置8は、スナウト2内の清掃時に、異物剥離装置7によってスナウト2の内壁面から剥離された異物と、スナウト2内のめっき浴面上に浮遊する異物とを吸引するものである。具体的には、めっき槽1内に吸引配管12が設けられ、その吸引配管12の吸引口11がスナウト2内のめっき浴面上に配置されている。また、吸引配管12の途中には、吸引ポンプ13が設けられている。そして、吸引ポンプ13を動作させることにより、スナウト2の内壁面から剥離された異物と、スナウト2内のめっき浴面上に浮遊する異物などを吸引配管12の吸引口11から吸引し、この吸引した異物を吸引配管12によりスナウト2の外部に排出するようになっている。
さらに、この実施形態では、めっきラインの操業時には、レベル計14でめっき槽1のめっき浴面のレベルを測定し、めっき浴面のレベルが目標値を中心に許容範囲になるように、めっき液供給装置15の供給制御が行われるようになっている。
The foreign matter suction device 8 sucks the foreign matter peeled off from the inner wall surface of the snout 2 by the foreign matter peeling device 7 and the foreign matter floating on the plating bath surface in the snout 2 when cleaning the inside of the snout 2. Specifically, the suction pipe 12 is provided in the plating tank 1, and the suction port 11 of the suction pipe 12 is disposed on the plating bath surface in the snout 2. A suction pump 13 is provided in the middle of the suction pipe 12. Then, by operating the suction pump 13, the foreign matter peeled off from the inner wall surface of the snout 2 and the foreign matter floating on the plating bath surface in the snout 2 are sucked from the suction port 11 of the suction pipe 12. The foreign matter is discharged to the outside of the snout 2 through the suction pipe 12.
Furthermore, in this embodiment, during operation of the plating line, the level of the plating bath surface of the plating tank 1 is measured with the level meter 14 so that the plating bath surface level is within an allowable range centering on the target value. Supply control of the supply device 15 is performed.

(異物の除去方法)
次に、図1に示す実施形態を使用することにより、スナウト2内に発生する異物をスナウト2外に除去する方法について説明する。
この説明に先立って、めっきラインの操業時にスナウト2内に発生する異物について、図2を参照して説明する。図2は、スナウト2の断面図である。
図2に示すように、めっきラインの操業時には、スナウト2内のめっき浴面上であって、被めっき材aの幅方向の外側部分に異物cが淀んだ状態になる。さらに、スナウト2の内壁面であって、被めっき材aの板面と対向する部分に所定の厚さの異物bが付着する状態となる。
(Foreign matter removal method)
Next, a method for removing the foreign matter generated in the snout 2 by using the embodiment shown in FIG. 1 will be described.
Prior to this description, foreign matter generated in the snout 2 during operation of the plating line will be described with reference to FIG. FIG. 2 is a sectional view of the snout 2.
As shown in FIG. 2, when the plating line is operated, the foreign matter c is in a state of being on the plating bath surface in the snout 2 and on the outer portion in the width direction of the material to be plated a. Further, a foreign substance b having a predetermined thickness adheres to a portion of the inner wall surface of the snout 2 that faces the plate surface of the material to be plated a.

また、この実施形態では、上記のように、めっきラインの操業時には、めっき槽1のめっき浴面20のレベルを目標値に制御するが、実際には、その目標値を基準に上限に変動し、上限レベルから下限レベルの範囲(許容範囲)で変動する(図3(A)参照)。このため、めっきラインの操業時には、そのめっき浴面20変動に応じてスナウト2の内壁面であってその高さ方向に比較的広い範囲で異物bが付着する。   In this embodiment, as described above, the level of the plating bath surface 20 of the plating tank 1 is controlled to the target value during the operation of the plating line, but actually, the level changes to the upper limit based on the target value. It fluctuates in the range (allowable range) from the upper limit level to the lower limit level (see FIG. 3A). For this reason, during operation of the plating line, the foreign matter b adheres to the inner wall surface of the snout 2 in a relatively wide range in the height direction according to the variation of the plating bath surface 20.

また、その後のめっきラインの操業時には、そのめっき浴面20の変動により、スナウト2の内壁面に付着する異物bが溶け出して被めっき材aの表面に付着し、これにより被めっき材aに表面欠陥を生じさせるという不具合がある。
そこで、この実施形態では、めっきラインの操業開始前にスナウト2内の清掃を実施し、このときに前回のめっきラインの操業時にスナウト2内で発生した異物を、図3に示すような手順で剥離してスナウト2外に除去するようにした。
Further, during the subsequent operation of the plating line, due to the fluctuation of the plating bath surface 20, the foreign matter b adhering to the inner wall surface of the snout 2 melts and adheres to the surface of the material to be plated a. There is a problem of causing surface defects.
Therefore, in this embodiment, the inside of the snout 2 is cleaned before the operation of the plating line is started, and the foreign matter generated in the snout 2 at the time of the previous operation of the plating line at this time is as shown in FIG. It peeled off and removed from the snout 2.

まず、スナウト2内の清掃開始時には、図3(A)に示すように、めっき槽1のめっき浴面のレベル20は目標値にあり、操業位置にあるスナウト2の内壁面には例えば図示のように異物bが付着した状態にある。
この状態で、異物剥離装置7では、吐出配管9の入口に不活性ガスを供給することにより、吐出配管9の吐出口10から不活性ガスを吐出(噴射)させる。この吐出により、メッキ浴面20が振動され、このときの振動の衝撃でスナウト2の内壁面に付着する異物bを剥離させる。異物剥離装置7の動作時間は、その剥離に十分な時間とする。
First, at the start of cleaning in the snout 2, as shown in FIG. 3A, the level 20 of the plating bath surface of the plating tank 1 is at the target value, and the inner wall surface of the snout 2 in the operation position is, for example, shown in the figure. In this way, the foreign matter b is attached.
In this state, the foreign substance peeling device 7 discharges (injects) the inert gas from the discharge port 10 of the discharge pipe 9 by supplying the inert gas to the inlet of the discharge pipe 9. By this discharge, the plating bath surface 20 is vibrated, and the foreign matter b adhering to the inner wall surface of the snout 2 is peeled off by the impact of the vibration at this time. The operation time of the foreign substance peeling device 7 is a time sufficient for the peeling.

このときには、異物吸引装置8を動作させる。このため、スナウト2の内壁面から剥離した異物bおよびスナウト2内のめっき浴面上に浮遊する異物cは、異物吸引装置8の吸引ポンプ13により吸引配管12の吸引口11に吸引されてスナウト2外に排出される。このときには、スナウト2の内壁面に付着する異物bの全部は剥離されず、例えば、異物b1、b2は残された状態になる(図2(B)参照)。   At this time, the foreign object suction device 8 is operated. For this reason, the foreign matter b peeled off from the inner wall surface of the snout 2 and the foreign matter c floating on the plating bath surface in the snout 2 are sucked into the suction port 11 of the suction pipe 12 by the suction pump 13 of the foreign matter suction device 8 and snout. 2 is discharged outside. At this time, all the foreign matter b adhering to the inner wall surface of the snout 2 is not peeled off, and, for example, the foreign matters b1 and b2 are left (see FIG. 2B).

次に、図3(B)に示すように、スナウト昇降装置6によりスナウト2を上昇させたのち、位置決めする。このときのスナウト2の基準位置である操業位置からの上昇距離(上昇値)Hは、めっき槽1のめっき浴面20のレベルの目標値の下限レベル側の許容値Bよりも大きな値とする。この理由は、上記のように、スナウト2の内壁面に付着する異物c1のスナウト2の長さ方向の幅は、めっき槽1のめっき浴面20の許容範囲の値よりも大きくなる場合があるので(図3(A)参照)、そのはみ出た部分の異物bを効果的に剥離させるためである。   Next, as shown in FIG. 3 (B), the snout 2 is raised by the snout elevating device 6 and then positioned. At this time, the ascent distance (increase value) H from the operation position which is the reference position of the snout 2 is set to a value larger than the allowable value B on the lower limit level side of the target value of the plating bath surface 20 of the plating tank 1. . This is because, as described above, the width in the length direction of the snout 2 of the foreign matter c1 adhering to the inner wall surface of the snout 2 may be larger than the allowable range of the plating bath surface 20 of the plating tank 1 in some cases. Therefore (see FIG. 3A), this is because the foreign matter b in the protruding portion is effectively peeled off.

そして、スナウト2を位置決めした状態で異物剥離装置7を所定時間だけ動作させ、このときには、スナウト2の内壁面から剥離されずに残っている異物b1を剥離させ、内壁面を清浄化させる。その剥離された異物b1およびスナウト2内のめっき浴面上に浮遊する異物は、異物吸引装置8に吸引されてスナウト2外に排出される。
引き続き、図3(C)に示すように、スナウト昇降装置6によりスナウト2を下降させたのち、位置決めする。このときのスナウト2の基準位置からの下降距離(下降値)Lは、めっき槽1のめっき浴面20のレベルの目標値の上限レベル側の許容値Aよりも大きな値とする。この理由は、スナウト2を上昇させる場合と同様である。
Then, the foreign matter peeling device 7 is operated for a predetermined time with the snout 2 positioned, and at this time, the foreign matter b1 remaining without being peeled from the inner wall surface of the snout 2 is peeled, and the inner wall surface is cleaned. The separated foreign matter b1 and the foreign matter floating on the plating bath surface in the snout 2 are sucked by the foreign matter suction device 8 and discharged out of the snout 2.
Subsequently, as shown in FIG. 3C, the snout 2 is moved down by the snout elevating device 6 and then positioned. The descending distance (falling value) L from the reference position of the snout 2 at this time is set to a value larger than the allowable value A on the upper limit level side of the target value of the level of the plating bath surface 20 of the plating tank 1. The reason for this is the same as in the case where the snout 2 is raised.

そして、スナウト2を位置決めした状態で異物剥離装置7を所定時間だけ動作させ、このときには、スナウト2の内壁面から剥離されずに残っている異物b2を剥離させ、内壁面を清浄化させる。その剥離された異物b2およびスナウト2内のめっき浴面上に浮遊する異物は、異物吸引装置8に吸引されてスナウト2外に排出される。
その後、スナウト昇降装置6によりスナウト2を図3(C)の位置から図3(D)の位置まで上昇させて所定位置である操業位置にすると、スナウト2の内壁面に付着していた異物は全て除去されるとともに、スナウト2の内壁面が広い範囲で清浄になり、この状態で新たな操業を行うことができる。
Then, the foreign matter peeling device 7 is operated for a predetermined time with the snout 2 positioned, and at this time, the foreign matter b2 remaining without being peeled from the inner wall surface of the snout 2 is peeled to clean the inner wall surface. The peeled foreign matter b2 and the foreign matter floating on the plating bath surface in the snout 2 are sucked by the foreign matter suction device 8 and discharged out of the snout 2.
Thereafter, when the snout 2 is lifted from the position shown in FIG. 3C to the position shown in FIG. 3D by the snout elevating device 6 to the operation position which is a predetermined position, the foreign matter adhered to the inner wall surface of the snout 2 is All are removed and the inner wall surface of the snout 2 is cleaned in a wide range, and a new operation can be performed in this state.

(実施形態の効果)
以上のように、この実施形態では、スナウト2内の清掃時に、スナウト昇降装置6が、スナウト2を基準位置から上昇および下降させるようにし、かつ、その昇降できる距離(移動距離)がめっき槽1のめっき浴面20のレベルの目標値の許容範囲よりも大きくなるようにした。しかも、その昇降時に、各位置においてスナウト2を位置決めできるようにした。
(Effect of embodiment)
As described above, in this embodiment, when the inside of the snout 2 is cleaned, the snout lifting device 6 raises and lowers the snout 2 from the reference position, and the distance (moving distance) that can be raised and lowered is the plating tank 1. The plating bath surface 20 was set to be larger than the allowable range of the target value of the level. In addition, the snout 2 can be positioned at each position when moving up and down.

また、この実施形態では、スナウト2内の清掃時に、この異物剥離装置7が、スナウト2内のめっき浴面下において不活性ガスを吐出させ、これによりめっき浴面を振動させてスナウト2の内壁面に付着する異物を剥離させ、スナウト2の内壁面を清浄化させるようにした。
さらに、この実施形態では、スナウト2内の清掃時に、異物吸引装置8が、スナウト2の内壁面から剥離されてスナウト2内のめっき浴面上に浮遊する異物、およびスナウト2内のめっき浴面上にすでに浮遊する異物のそれぞれを吸引してスナウト2外に排出するようにした。
In this embodiment, when cleaning the inside of the snout 2, the foreign substance peeling device 7 discharges an inert gas below the plating bath surface in the snout 2, thereby vibrating the plating bath surface to cause the inside of the snout 2. The foreign matter adhering to the wall surface was peeled off, and the inner wall surface of the snout 2 was cleaned.
Furthermore, in this embodiment, when cleaning the inside of the snout 2, the foreign matter suction device 8 is separated from the inner wall surface of the snout 2 and floats on the plating bath surface in the snout 2, and the plating bath surface in the snout 2. Each foreign substance already floating above was sucked and discharged out of the snout 2.

また、異物剥離装置7から吐出させる不活性ガスは、特に限定するものではなく、アルゴン等の希ガス族や、化学反応性の低い窒素等があげられる。
したがって、この実施形態によれば、スナウト2の内壁面に付着する異物などをスナウト2外に除去することができる上に、スナウト2の内壁面を清浄化できるようになり、表面欠陥が抑制された高品質のめっき鋼板を製造することができる。
Moreover, the inert gas discharged from the foreign material peeling apparatus 7 is not particularly limited, and examples thereof include a rare gas group such as argon, nitrogen having low chemical reactivity, and the like.
Therefore, according to this embodiment, it is possible to remove foreign matter or the like adhering to the inner wall surface of the snout 2 to the outside of the snout 2, and to clean the inner wall surface of the snout 2, thereby suppressing surface defects. High quality plated steel sheet can be manufactured.

(その他の実施形態)
(1)上記の実施形態では、スナウト2内の清掃時に、スナウト昇降装置6がスナウト2を基準位置から上昇および下降させるようにし、スナウト2の設置位置を変更するようにした。
しかし、これに代えて、スナウト2内の清掃時に、スナウト2の設置位置を基準位置のままとし、めっき槽1のめっき浴面の高さをめっき浴面の基準レベルを中心に、インゴットを用いて上昇および下降させるようにしても良い。
(Other embodiments)
(1) In the above-described embodiment, when the inside of the snout 2 is cleaned, the snout lifting / lowering device 6 raises and lowers the snout 2 from the reference position, and the installation position of the snout 2 is changed.
However, instead of this, at the time of cleaning the inside of the snout 2, the installation position of the snout 2 is left at the reference position, and the height of the plating bath surface of the plating tank 1 is used around the reference level of the plating bath surface. May be raised and lowered.

(2)上記の実施形態では、スナウト2内の清掃時に、スナウト昇降装置6がスナウト2を操業位置から昇降させて位置決めし、この位置決めした状態で異物剥離装置7と異物吸引装置8を動作させるようにした。
しかし、これに代えて、スナウト2内の清掃時に、スナウト昇降装置6がスナウト2を昇降させる過程において、異物剥離装置7と異物吸引装置8を動作させるようにしても良い。
(2) In the above embodiment, when cleaning the inside of the snout 2, the snout lifting device 6 lifts and lowers the snout 2 from the operating position, and the foreign matter peeling device 7 and the foreign matter suction device 8 are operated in this positioned state. I did it.
However, instead of this, the foreign matter peeling device 7 and the foreign matter suction device 8 may be operated in the process in which the snout lifting device 6 lifts and lowers the snout 2 when cleaning the inside of the snout 2.

a・・・被めっき材
b、b1、b2、c・・・異物
1・・・めっき槽
2・・・スナウト
3・・・焼純炉
4、5・・・ロール
6・・・スナウト昇降装置
7・・・異物剥離装置
8・・・異物吸引装置
9・・・吐出配管
10・・・吐出口
11・・・吸引口
12・・・吸引配管
13・・・吸引ポンプ
20・・・めっき浴面
a ... material to be plated b, b1, b2, c ... foreign matter 1 ... plating tank 2 ... snout 3 ... smelting furnace 4, 5 ... roll 6 ... snout lifting device 7 ... Foreign matter peeling device 8 ... Foreign matter suction device 9 ... Discharge pipe 10 ... Discharge port 11 ... Suction port 12 ... Suction pipe 13 ... Suction pump 20 ... Plating bath surface

Claims (4)

被めっき材を溶融めっきするめっき槽内に設置されるスナウト内の異物を除去するスナウト内の異物除去装置であって、
前記めっき槽のめっき浴面に対する前記スナウトの上下の高さ位置を変更させる変更手段と、
前記スナウト内のめっき浴面下に配置される吐出口から不活性ガスを吐出させ、前記めっき浴面を振動させて前記スナウトの内壁面に付着する異物を剥離させる異物剥離手段と、
前記スナウトの内壁面から剥離された異物と前記スナウト内のめっき浴面上に浮遊する異物とを吸引する異物吸引手段と、
を備えることを特徴とするスナウト内の異物除去装置。
A foreign matter removing device in a snout for removing foreign matter in a snout installed in a plating tank for hot-plating a material to be plated,
Change means for changing the vertical position of the snout with respect to the plating bath surface of the plating tank;
Foreign matter peeling means for discharging an inert gas from a discharge port disposed below the plating bath surface in the snout, and vibrating the plating bath surface to remove foreign matter adhering to the inner wall surface of the snout,
Foreign matter suction means for sucking foreign matter peeled off from the inner wall surface of the snout and foreign matter floating on the plating bath surface in the snout,
An apparatus for removing foreign matter in a snout, comprising:
前記変更手段は、前記スナウト内の清掃時に、前記スナウトを操業位置から所定の移動範囲で上下方向に移動させ、
前記移動範囲は、操業時における前記めっき槽のめっき浴面の目標値の許容範囲よりも大きいことを特徴とする請求項1に記載のスナウト内の異物除去装置。
The changing means moves the snout up and down within a predetermined movement range from the operation position when cleaning the inside of the snout,
The foreign matter removing device in a snout according to claim 1, wherein the moving range is larger than an allowable range of a target value of a plating bath surface of the plating tank during operation.
前記変更手段は、前記スナウト内の清掃時に、前記スナウトを操業位置から前記めっき槽の深さ方向に昇降させるスナウト昇降手段からなり、
前記スナウト昇降手段は、前記スナウトの上昇時に当該スナウトを第1の位置に位置決めし、前記スナウトの降下時に当該スナウトを第2の位置に位置決めするようになっていることを特徴とする請求項2に記載のスナウト内の異物除去装置。
The changing means comprises a snout raising / lowering means for raising and lowering the snout from the operation position in the depth direction of the plating tank when cleaning the inside of the snout,
3. The snout lifting / lowering means positions the snout at a first position when the snout is raised, and positions the snout at a second position when the snout is lowered. The foreign matter removing device in the snout as described in 1.
被めっき材を溶融めっきするめっき槽内に設置されるスナウト内の異物を除去するスナウト内の異物除去方法であって、
前記スナウト内のめっき浴面下において不活性ガスを吐出させ、前記めっき浴面を振動させて前記スナウトの内壁面に付着する異物を剥離させ、当該剥離された異物と前記めっき浴面上に浮遊する異物とを吸引して前記スナウト外に排出する第1工程と、
前記第1工程の終了後、前記スナウトを前記めっき槽の深さ方向に移動させ、前記スナウトの設置位置を変更させる第2工程と、を含み、
前記第1工程と前記第2工程とを繰り返すことで前記スナウト内の異物を除去することを特徴とするスナウト内の異物除去方法。
A foreign matter removal method in a snout for removing foreign matter in a snout installed in a plating tank for hot-plating a material to be plated,
An inert gas is discharged under the plating bath surface in the snout, the foreign matter adhering to the inner wall surface of the snout is peeled by vibrating the plating bath surface, and the separated foreign matter and the plating bath surface are floated on the plating bath surface. A first step of sucking out foreign matter to be discharged and discharging it out of the snout;
After the completion of the first step, the second step of moving the snout in the depth direction of the plating tank and changing the installation position of the snout,
A foreign matter removal method in a snout, wherein the foreign matter in the snout is removed by repeating the first step and the second step.
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