JP2012138631A5 - - Google Patents

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Publication number
JP2012138631A5
JP2012138631A5 JP2012088182A JP2012088182A JP2012138631A5 JP 2012138631 A5 JP2012138631 A5 JP 2012138631A5 JP 2012088182 A JP2012088182 A JP 2012088182A JP 2012088182 A JP2012088182 A JP 2012088182A JP 2012138631 A5 JP2012138631 A5 JP 2012138631A5
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JP
Japan
Prior art keywords
lithographic apparatus
projection system
bubble
confinement structure
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2012088182A
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English (en)
Japanese (ja)
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JP2012138631A (ja
JP5433045B2 (ja
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Publication of JP2012138631A publication Critical patent/JP2012138631A/ja
Publication of JP2012138631A5 publication Critical patent/JP2012138631A5/ja
Application granted granted Critical
Publication of JP5433045B2 publication Critical patent/JP5433045B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012088182A 2008-09-17 2012-04-09 リソグラフィ装置及びリソグラフィ装置を操作する方法 Expired - Fee Related JP5433045B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US9774308P 2008-09-17 2008-09-17
US61/097,743 2008-09-17
US15010609P 2009-02-05 2009-02-05
US61/150,106 2009-02-05

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2009208753A Division JP4972677B2 (ja) 2008-09-17 2009-09-10 リソグラフィ装置及びリソグラフィ装置を操作する方法

Publications (3)

Publication Number Publication Date
JP2012138631A JP2012138631A (ja) 2012-07-19
JP2012138631A5 true JP2012138631A5 (enExample) 2012-10-11
JP5433045B2 JP5433045B2 (ja) 2014-03-05

Family

ID=42029409

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2009208753A Active JP4972677B2 (ja) 2008-09-17 2009-09-10 リソグラフィ装置及びリソグラフィ装置を操作する方法
JP2012088182A Expired - Fee Related JP5433045B2 (ja) 2008-09-17 2012-04-09 リソグラフィ装置及びリソグラフィ装置を操作する方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2009208753A Active JP4972677B2 (ja) 2008-09-17 2009-09-10 リソグラフィ装置及びリソグラフィ装置を操作する方法

Country Status (4)

Country Link
JP (2) JP4972677B2 (enExample)
KR (1) KR101196358B1 (enExample)
CN (1) CN101676804B (enExample)
TW (1) TWI457714B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0647813B2 (ja) 1988-06-09 1994-06-22 動力炉・核燃料開発事業団 低水圧制御水理試験法
TWI457714B (zh) * 2008-09-17 2014-10-21 Asml Netherlands Bv 微影裝置及其操作方法
JP2017520792A (ja) * 2014-07-01 2017-07-27 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びリソグラフィ装置を製造する方法
NL2017128A (en) * 2015-07-16 2017-01-23 Asml Netherlands Bv A lithographic apparatus, a projection system, a last lens element, a liquid control member and a device manufacturing method
CN110687752A (zh) * 2018-07-05 2020-01-14 上海微电子装备（集团）股份有限公司 湿空气制备装置、湿空气制备方法以及光刻装置
CN112684668B (zh) * 2020-12-25 2024-07-23 浙江启尔机电技术有限公司 一种浸液供给回收装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6197917A (ja) * 1984-10-19 1986-05-16 Hitachi Ltd Ｘ線露光装置
JP2004095654A (ja) * 2002-08-29 2004-03-25 Nikon Corp 露光装置及びデバイス製造方法
SG121818A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN101061429B (zh) * 2003-04-10 2015-02-04 株式会社尼康 包括用于沉浸光刻装置的真空清除的环境系统
US7411653B2 (en) * 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
US7352433B2 (en) * 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4479269B2 (ja) * 2004-02-20 2010-06-09 株式会社ニコン 露光装置及びデバイス製造方法
JP2006128192A (ja) * 2004-10-26 2006-05-18 Nikon Corp 保持装置、鏡筒、及び露光装置、並びにデバイス製造方法
US7411658B2 (en) * 2005-10-06 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR20080085874A (ko) 2006-01-18 2008-09-24 캐논 가부시끼가이샤 노광장치
DE102006021797A1 (de) * 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
NL1035908A1 (nl) * 2007-09-25 2009-03-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL2003392A (en) * 2008-09-17 2010-03-18 Asml Netherlands Bv Lithographic apparatus and a method of operating the apparatus.
TWI457714B (zh) * 2008-09-17 2014-10-21 Asml Netherlands Bv 微影裝置及其操作方法

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