JP2012138155A - Method for manufacturing glass substrate for magnetic information recording medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a glass substrate for a magnetic information recording medium with less ionic contamination without causing a drying failure, and as a result, causing no head crash even if being mounted on a hard disk in which the head floating quantity is very small.SOLUTION: A method for manufacturing a glass substrate for a magnetic information recording medium comprises a step of rinsing a glass substrate 10 using an aqueous solution having an electric resistance value of 10 MΩ.cm or less and a step of drying by contacting a vapor of a water-soluble solvent having a boiling point lower than water with the rinsed glass substrate. In the drying treatment, a vapor in which the water content is 0.5 mass% or less is used. The water-soluble solvent having a low boiling point of water is preferably one or two or more selected from isopropyl alcohol, ethanol and acetone.

Description

  The present invention relates to a method for producing a glass substrate for a magnetic information recording medium.

  A magnetic information recording apparatus records information on an information recording medium by using magnetism, light, magneto-optical, and the like. A typical example is a hard disk drive device. A hard disk drive device is a device that magnetically records information on a magnetic disk as an information recording medium having a recording layer formed on a substrate by a magnetic head. As a base material of such an information recording medium, a so-called substrate, a glass substrate is preferably used.

  In addition, the hard disk drive device records information on the magnetic disk while rotating it at a high speed by only a few nanometers without contacting the magnetic head with the magnetic disk. Furthermore, in recent years, the recording density of hard disks has been further improved, and accordingly, the difference between the magnetic head and the magnetic disk (hereinafter referred to as the head flying height) has been reduced. In particular, in a hard disk having a DFH (Dynamic Flying High) mechanism, a head flying height of 3 nm or less has been developed. However, in the DFH mechanism, since the head flying height is extremely small, a problem that the head crashes due to the collision between the magnetic head and the magnetic disk frequently occurs.

  Also, recent hard disk drive devices have been required to have a high surface cleanliness of the substrate used for the hard disk due to the improved recording density. In order to improve the surface cleanliness of the substrate, the magnetic information recording medium substrate is subjected to a cleaning process including a cleaning process, a rinsing process, and a drying process after grinding and polishing. In the washing step, a water-soluble solvent having a boiling point lower than that of water, such as isopropyl alcohol, is often used particularly in the rinsing process and the drying process.

  In Patent Document 1, in a vapor method in which a liquid having a boiling point lower than that of water is dried, a foreign substance in the liquid is measured by measuring the electric resistance value of the liquid, and the substrate is cleaned by managing them. A manufacturing method for keeping the degree constant is disclosed. Patent Document 2 discloses a method for producing the vapor system while keeping the water content in isopropyl alcohol supplied to the vapor tank at 1% or less.

  However, with the recent increase in recording density of hard disks, even the presence of protrusions on minute substrates has become unacceptable, and even if manufactured by the above method, a new evaluation device and media are used. It was confirmed that linear foreign matters (drying unevenness) remained on some substrates. These drying irregularities tend to be a tendency in a hard disk having a head flying height of about 2 nm.

  In the above method, the rinsing process is performed using a solution having a relatively high electrical resistance value (for example, 10 MΩ · cm). However, when a solution having a large electrical resistance value is used in this rinsing process, organic acid components derived from the polishing liquid and salt (nitric acid) generated during the chemical strengthening process cause ionic contamination. It remains on the substrate. Further, ionic contamination enters the solution electrostatically from the air or the like, and the ionic contamination adheres to the rinsed substrate.

JP 2009-245481 A JP 2007-91478 A

  The present invention has been made in view of the above prior art, and the problem to be solved is that even if it is mounted on a hard disk with a small amount of ionic contamination and no poor drying, resulting in a slight head flying height. It is an object of the present invention to provide a method for producing a glass substrate for a magnetic information recording medium that does not cause a head crash.

  In order to solve the above-mentioned problems, the present inventors have focused on the solution used for the rinsing process during the manufacturing process of the glass substrate for magnetic information recording medium and the moisture content of the liquid vapor used for the drying process, and have made extensive studies. Went. As a result, rinsing treatment is performed using an aqueous solution having an electric resistance value of 10 MΩ · cm or less, and further, drying treatment is performed using steam having a moisture content of 0.5 mass% or less in the steam, thereby causing ionic contamination. It has been found that a glass substrate for a magnetic information recording medium with a small amount of cleaning can be produced. Further, it has been found that the above-mentioned glass substrate for magnetic information recording medium is less likely to cause head crash even when mounted on a hard disk having a head flying height of 3 nm or less.

  The method for producing a glass substrate for a magnetic information recording medium according to the present invention includes a process of rinsing the glass substrate using an aqueous solution having an electric resistance value of 10 MΩ · cm or less, and vapor of a water-soluble solvent having a boiling point lower than that of water. And a glass substrate for a magnetic information recording medium including a drying process for contacting the rinsed glass substrate, wherein the moisture content in the steam is 0.5% by mass or less in the drying process. It is characterized by using.

  According to such a configuration, it is possible to provide a method for manufacturing a glass substrate for a magnetic information recording medium having a low degree of ionic contamination and a high degree of cleaning. Further, it is possible to provide a glass substrate for a magnetic information recording medium that does not cause head crash even when mounted on a hard disk having a very small head flying height.

  The water-soluble solvent having a boiling point lower than that of the water is preferably one or more selected from isopropyl alcohol, ethanol, and acetone. By using these vapors for the drying process, it is possible to provide a glass substrate for a magnetic information recording medium in which poor drying is unlikely to occur.

  According to the present invention, a glass substrate for a magnetic information recording medium that has low ionic contamination and a high degree of cleaning, and does not cause a head crash even when mounted on a hard disk with a slight head flying height. A method for manufacturing a substrate can be provided.

It is a figure explaining the rinse process and drying process which concern on this embodiment. It is a top view which shows the glass substrate for magnetic information recording media manufactured by the manufacturing method of the glass substrate for magnetic information recording media concerning this embodiment. It is a schematic sectional drawing which shows an example of the grinding | polishing apparatus used at the rough grinding | polishing process and the precision grinding | polishing process in the manufacturing method of the glass substrate for magnetic information recording media which concerns on this embodiment. 1 is a partial cross-sectional perspective view showing a magnetic disk as an example of a magnetic recording medium using a glass substrate for magnetic information recording medium manufactured by the method for manufacturing a glass substrate for magnetic information recording medium according to the present embodiment.

  Hereinafter, although the embodiment concerning the present invention is described, the present invention is not limited to these.

  The method for manufacturing a glass substrate for a magnetic information recording medium according to this embodiment includes a process of rinsing the glass substrate using an aqueous solution having an electric resistance value of 10 MΩ · cm or less, and vapor of a water-soluble solvent having a boiling point lower than that of water. Is a method for producing a glass substrate for a magnetic information recording medium, wherein the moisture content in the steam is 0.5% by mass or less. It is characterized by using steam.

  Moreover, the manufacturing method of the glass substrate for magnetic information recording media which concerns on this embodiment will not be specifically limited if the said rinse process and the said drying process are provided in the washing | cleaning process. Specifically, there is no particular limitation except that the above-described aqueous solution used for the rinsing treatment is used, and that steam satisfying the above-described conditions is used in the drying treatment, and any known production method may be used.

  Examples of the method for producing a glass substrate for a magnetic information recording medium include a disk processing step, a lapping step, a rough polishing step (primary polishing step), a cleaning step, a chemical strengthening step, and a precision polishing step (secondary polishing step). The method of providing etc. is mentioned. The steps may be performed in this order, or the order of the chemical strengthening step and the precision polishing step (secondary polishing step) may be switched. Furthermore, a method including steps other than these may be used. For example, an end surface polishing step may be performed between the lapping step and the rough polishing step (primary polishing step).

  In particular, the cleaning process may be performed after the rough polishing process or after the precision polishing process, and may be performed once after each of the rough polishing process and the precision polishing process.

Here, the cleaning step in the production method of the present invention will be described in detail.
<Washing process>
The cleaning step is a step of cleaning the glass base plate that has been subjected to the rough polishing step or the precise polishing step. Specifically, the following washing steps including washing treatment, rinsing treatment, and drying treatment are exemplified.

FIG. 1 is a block diagram showing a cleaning process including a cleaning process, a rinsing process, and a drying process for a magnetic disk glass substrate according to the present invention.
(Cleaning process)
In this invention, as shown in FIG. 1, the glass substrate 10 after a grinding | polishing process is immersed in the washing | cleaning layer 2, and a washing process is performed. Specifically, first, the glass base plate is washed with an alkaline detergent having a pH of 13 or more, and the glass base plate is rinsed. Next, the glass base plate is washed with an acid detergent having a pH of 1 or less, and the glass base plate is rinsed. Finally, the glass base plate is cleaned using a hydrofluoric acid (HF) solution. Regarding cerium oxide, it is most efficient to perform cleaning in the order of alkali cleaning, acid cleaning, and HF cleaning. This is because the abrasive is dispersed and removed with an alkaline detergent, and then the abrasive is dissolved and removed with an acid detergent. Finally, the glass base plate is etched with HF to remove the abrasive deeply stuck in the glass base plate. .

  The alkali cleaning, acid cleaning, and HF cleaning are preferably performed in separate tanks. When these washings are performed in a single tank, efficient washing may not be possible. In particular, when the acid detergent and HF are put in the same tank, the etching rate of HF decreases at a place where there is a lot of abrasive, so that the substrate cannot be etched uniformly.

  As another cleaning treatment, for example, a glass substrate is immersed in a cleaning solution containing 1% by mass of HF and 3% by mass of sulfuric acid, and an ultrasonic vibration of 80 kHz is applied to the cleaning solution. Thereafter, the glass substrate is taken out, and the taken-out glass substrate is immersed in a neutral detergent solution. At that time, a method of applying an ultrasonic vibration of 120 kHz to the neutral detergent solution may be employed.

In addition, surfactant, a dispersing agent, a chelating agent, a reducing material, etc. may be added to the detergent used for each said washing | cleaning, and an ultrasonic wave may be applied depending on the case.
(Rinse treatment)
In this invention, as shown in FIG. 1, the glass substrate after the said washing process is immersed in the rinsing tank 3, and it rinses by ultrasonic cleaning.

  The rinsing solution used for the rinsing treatment preferably has an electric resistance value of 10 MΩ · cm or less. If a rinse solution having an electrical resistance value greater than 10 MΩ · cm is used, ionic contamination remains in the rinse solution.

The aqueous solution is not particularly limited as long as the electrical resistance value is 10 MΩ · cm or less as described above, but carbonated water, hydrogen water, and nitrogen water are preferably used, and carbonated water is more preferable.
(Drying process)
Then, the rinsed glass substrate is dried. That is, as shown in FIG. 1, the glass substrate 10 after the rinse treatment is brought into contact with the vapor of a water-soluble solvent having a boiling point lower than that of water in the vapor tank 4 to perform a dehydration treatment and dry.

  As such a water-soluble solvent having a lower boiling point than water, isopropyl alcohol (IPA), ethanol, and acetone are suitable. Among these, IPA is more preferable from the viewpoint of boiling point.

  The water content at the time of contact of the water-soluble solvent vapor in the vapor tank 4 (the amount of water contained in the water-soluble solvent vapor) is more preferably 0.5% by mass or less. If the water content is greater than 0.5% by mass, poor drying occurs.

  The amount of water contained in the water-soluble solvent vapor in the present invention means that when a gas near the region where the glass substrate is dried in the vapor tank 4 is collected and the collected gas is in contact with a 20 ° C. cooling coil. This refers to the amount of moisture in the liquid that condenses.

  The moisture content is provided with a moisture content measuring device 5 for the vapor tank 4, and the moisture content is measured using this device. As the moisture content measuring device, a titration device such as a Karl Fischer moisture meter, an infrared measuring device, a gas chromatography or the like is used.

  This is because water derived from the aqueous solution used in the rinsing step is mixed into the water-soluble solvent in the drying step, and the amount of water in the water-soluble solvent increases as the drying step is repeated. This increase in the amount of moisture causes poor drying.

  Therefore, in the moisture content measuring device 5, when the moisture content of the steam exceeds 0.5% by mass, the water-soluble solvent in the vapor tank 4 is immediately replaced with a high-purity one. If the vapor tank is replaced with argon, nitrogen, or the like, the water content of the water-soluble solvent in the vapor tank 4 at the time of contact is hardly increased, and the amount of the water-soluble solvent used is small.

  The vapor tank 4 is supplied with a water-soluble solvent from a water-soluble solvent tank 6. The water-soluble solvent which is used in the vapor tank 4 and whose water content is measured to be 0.5 mass% or more by the water content measuring device is discharged to the discharge tank 7. The IPA tank 6 is replenished with a new water-soluble solvent 8 and sent to the vapor tank 4.

Glass workpiece after more washing steps, alkaline earth metal remaining on the surface thereof, is preferably 10 ng / cm ² or less, more preferably 5 ng / cm ² or less. This is because when the remaining alkaline earth metal is 10 ng / cm ² or less, a glass substrate for a magnetic information recording medium with few deposits can be obtained. Moreover, when performing a chemical strengthening process, a chemical strengthening can be more uniformly performed with respect to the glass base plate whole surface by reducing the adhesion amount of the alkaline-earth metal which can inhibit this chemical strengthening process.

The glass substrate after the rough polishing is cleaned so that the amount of cerium oxide on the surface of the glass substrate is 0.125 ng / cm ² or less. If the amount of cerium oxide on the surface of the glass base plate is too large, the flatness of the glass base plate after precision polishing by the precision polishing step described later may not be improved.

In addition, when conveying the glass substrate which finished the precision grinding | polishing process to a washing | cleaning process, it is stored in water without drying a glass base plate (including natural drying), and it conveys to the next washing | cleaning process with a moist state. . If the glass base plate is dried with the polishing residue remaining, it may be difficult to remove the abrasive (colloidal silica) by the cleaning treatment. This cleaning is required to remove the abrasive without roughening the surface of the mirror-finished glass base plate.
<Disk processing process>
In the disk processing step, a through-hole 10a is formed at the center from a glass base plate formed from a glass material of a predetermined composition so that the inner periphery and the outer periphery are concentric circles as shown in FIG. This is a step of processing into a disk-shaped glass base plate 10. Specifically, for example, processing is performed as follows. First, a glass base plate that is formed into a plate shape and has a glass composition that will be described later and has a thickness of 0.95 mm is cut into a square having a predetermined size.

  Then, a circular cut line is formed on one surface of the cut glass base plate so as to form the inner circumference and the outer circumference described above with a glass cutter. And the glass base plate in which this cut line was formed is heated from the surface of the side in which the cut line was formed. By doing so, the said cut line becomes deep toward the other surface of a glass base plate. And it processes into the disk shaped glass base plate 10 in which the through-hole 10a was formed in the center part so that an inner periphery and an outer periphery may become a concentric circle.

  In this disk processing step, for example, the outer diameter r1 is 2.5 inches (about 64 mm), 1.8 inches (about 46 mm), 1 inch (about 25 mm), 0.8 inches (about 20 mm), etc., and the thickness is It is processed into a disk-shaped glass base plate of 2 mm, 1 mm, 0.63 mm or the like. Further, when the outer diameter r1 is 2.5 inches (about 64 mm), the inner diameter r2 is processed to 0.8 inches (about 20 mm) or the like. FIG. 1 is a top view showing a glass substrate for magnetic information recording medium manufactured by the method for manufacturing a glass substrate for magnetic information recording medium according to the present embodiment.

Moreover, the manufacturing method of the glass base plate shape | molded in plate shape is not specifically limited, For example, what was manufactured by the float glass process etc. is mentioned. The float method is, for example, a method in which a molten liquid obtained by melting a glass material is poured onto molten tin and solidified as it is. Since the obtained glass base plate is a free surface of glass and the other surface is an interface between glass and tin, the smoothness is high, for example, the arithmetic average roughness Ra is 0.001 μm. The following mirror surface is provided. And as the thickness, a 0.95 mm thing is mentioned, for example. In addition, the surface roughness, for example Ra, of a glass base plate or a glass substrate can be measured using a general surface roughness measuring machine.
<Wrapping process>
The lapping step is a step of processing the glass base plate to a predetermined plate thickness. Specifically, the process etc. which grind | polish (lapping) the both surfaces of a glass base plate are mentioned. By processing in this way, the parallelism, flatness and thickness of the glass base plate can be adjusted. Further, this lapping step may be performed once or twice or more. For example, when it is performed twice, the parallelism, flatness and thickness of the glass base plate are preliminarily adjusted in the first lapping process (first lapping process), and glass is used in the second lapping process (second lapping process). It becomes possible to finely adjust the parallelism, flatness and thickness of the base plate.

  More specifically, examples of the first lapping step include a step of making the entire surface of the glass base plate have a substantially uniform surface roughness. At that time, for example, when the arithmetic average roughness Ra of the glass base plate is measured at a plurality of locations, the difference between the minimum value and the maximum value of Ra obtained is preferably about 0.01 to 0.4 μm.

  The second lapping step may include a process of grinding the main surface of the roughened glass substrate using a fixed abrasive polishing pad. In this second wrapping step, for example, a roughened glass substrate is set in a wrapping apparatus, and a three-dimensional fixed abrasive with a surface pattern such as diamond tile is used. The surface can be wrapped.

When the second lapping step is performed, polishing performed in a rough polishing step described later can be performed efficiently. Further, the surface roughness Ra of the glass base plate used in the polishing step performed by the second lapping step is preferably 0.10 μm or less, and more preferably 0.05 μm or less.
<Rough polishing process>
The rough polishing step (primary polishing step) is a step of rough polishing the surface of the glass base plate that has been subjected to the lapping step. This rough polishing is intended to remove scratches and distortions remaining in the lapping step described above, and is performed using the following polishing method.

  The surface to be polished in the rough polishing step is a main surface and / or an end surface. The main end surface is a surface parallel to the surface direction of the glass base plate. The end surface is a surface composed of an inner peripheral end surface and an outer peripheral end surface. Moreover, an inner peripheral end surface is a surface which has an inclination with respect to the surface of an inner peripheral side perpendicular | vertical to the surface direction of a glass base plate, and the surface direction of a glass base plate. Moreover, an outer peripheral end surface is a surface which has an inclination with respect to the surface direction of the outer peripheral side perpendicular | vertical to the surface direction of a glass base plate, and the surface direction of a glass base plate.

  The polishing apparatus used in the rough polishing step is not particularly limited as long as it is a polishing apparatus used for manufacturing a glass substrate. Specifically, there is a polishing apparatus 1 as shown in FIG. FIG. 3 is a schematic cross-sectional view showing an example of the polishing apparatus 1 used in the rough polishing process and the precision polishing process in the method for manufacturing a glass substrate for a magnetic information recording medium according to the present embodiment.

  A polishing apparatus 11 as shown in FIG. 3 is an apparatus capable of simultaneous grinding on both sides. The polishing apparatus 11 includes an apparatus main body 11a and a polishing liquid supply unit 11b that supplies a polishing liquid to the apparatus main body 11a.

  The apparatus main body 11a includes a disk-shaped upper surface plate 12 and a disk-shaped lower surface plate 13, and they are arranged vertically spaced apart so that they are parallel to each other. Then, the disk-shaped upper surface plate 12 and the disk-shaped lower surface plate 13 rotate in directions opposite to each other.

  A polishing pad 15 for polishing both the front and back surfaces of the glass base plate 10 is attached to the opposing surfaces of the disk-shaped upper surface plate 12 and the disk-shaped lower surface plate 13. The polishing pad 15 used in the rough polishing step is not particularly limited as long as it is a polishing pad used in the rough polishing step. Specifically, for example, a hard polishing pad made of polyurethane or the like can be used.

  A plurality of rotatable carriers 14 are provided between the disk-shaped upper surface plate 12 and the disk-shaped lower surface plate 13. The carrier 14 is provided with a plurality of base plate holding holes 51, and the glass base plate 10 can be fitted into the base plate holding holes 51. For example, the carrier 14 may include 100 base plate holding holes 51 so that 100 glass base plates 10 can be fitted and arranged. Then, 100 glass base plates 10 can be processed by one processing (1 batch).

  The carrier 14 sandwiched between the surface plates 12 and 13 through the polishing pad is the same as the lower surface plate 13 with respect to the rotation center of the surface plates 12 and 13 while rotating while holding the plurality of glass base plates 10. Revolve in the direction. The disk-shaped upper surface plate 12 and the disk-shaped lower surface plate 13 can be operated by separate driving. In the polishing apparatus 11 operating as described above, the polishing slurry 16 is supplied between the upper surface plate 12 and the glass base plate 10 and between the lower surface plate 13 and the glass base plate 10, so that the glass base material is supplied. Rough polishing of the plate 10 can be performed.

  The polishing slurry supply unit 11b includes a liquid storage unit 110 and a liquid recovery unit 120. The liquid reservoir 110 includes a liquid reservoir main body 110a and a liquid supply pipe 110b having a discharge port 110e extending from the liquid reservoir main body 110a to the apparatus main body 11a. The liquid recovery part 120 was extended to the liquid recovery part main body 120a, the liquid recovery pipe 120b extended from the liquid recovery part main body 120a to the apparatus main body part 11a, and the polishing slurry supply part 11b from the liquid recovery part main body 120a. And a liquid return pipe 120c.

  Then, the polishing slurry 7 put in the liquid storage unit main body 110a is supplied from the discharge port 110e of the liquid supply pipe 110b to the apparatus main body part 11a, and from the apparatus main body part 11a through the liquid recovery pipe 120b, the liquid recovery part main body 120a. To be recovered. The recovered polishing slurry 16 is returned to the liquid storage part 110 via the liquid return pipe 120c and can be supplied again to the apparatus main body part 11a.

  The polishing liquid 16 used here is a liquid in which an abrasive is dispersed in water, that is, a slurry liquid.

  Further, the polishing pad 15 used here is a foam of synthetic resin such as urethane or polyester containing a cerium oxide abrasive.

Next, the polishing agent used in the polishing step performed before the chemical strengthening step uses a material containing a large amount of CeO ₂ and a small amount of alkaline earth metal, thereby increasing the polishing rate and increasing the glass element after polishing. It is considered that the smoothness of the plate can be sufficiently enhanced. As for the polishing pad, as in the case of the above-described polishing agent, the polishing rate is increased by using a material containing a large amount of CeO ₂ and a small amount of alkaline earth metal, and the smoothness of the glass base plate after polishing. Is considered to be sufficiently increased.

It is considered that the reason why the polishing agent having a high CeO ₂ content can increase the polishing rate and sufficiently increase the smoothness of the polished glass base plate is as follows. First, when the glass base plate and CeO ₂ come into contact with each other in the state where pressure is applied to the surface of the glass base plate during polishing, Si—O bonds, which are the main composition on the surface of the glass base plate, are Ce— It is thought to replace the bond of O. This bond is easily decomposed, but it is considered that the bond with Si is difficult to form again. Therefore, it is considered that when an abrasive having a high CeO ₂ content is used, the polishing rate can be increased and the smoothness of the glass base plate after polishing can be sufficiently increased.

Further, by using an abrasive and a polishing pad having a high CeO ₂ content and a low alkaline earth metal content, not only the smoothness can be sufficiently improved, but also the glass substrate after polishing is used. It is thought that adhesion of alkaline earth metal to the plate is suppressed. It is considered that uniform chemical strengthening is achieved by applying a chemical strengthening step to such a glass base plate in which adhesion of alkaline earth metal is suppressed.

  Note that when polishing with a polishing liquid in which the abrasive is dispersed in water, the alkaline earth metal is dissolved even if the alkaline earth metal is contained in the water. It is considered that the alkaline earth metal contained in the abrasive is likely to adhere to the surface of the glass base plate. Therefore, it is considered that adhesion of alkaline earth metal to the glass base plate after polishing can be sufficiently suppressed by using a polishing agent with little alkaline earth metal.

The CeO ₂ content is preferably as high as possible. Namely, rare earth oxide contained in the abrasive, it is preferred that all are CeO _2. This is considered to be because CeO ₂ has the most influence on the polishing properties of the glass base plate. Further, the lower the alkaline earth metal content, the better. If the alkaline earth metal contained in the abrasive is small, it is considered that the inhibition of the chemical strengthening process by the alkaline earth metal is suppressed.

Further, the content of CeO ₂ is, to the abrasive total amount is preferably 90 mass% or more. By doing so, the glass substrate for information recording media excellent in impact resistance can be manufactured, the polishing rate can be further increased, and the glass substrate for information recording media having higher smoothness can be manufactured. This means that the content of the alkaline earth metal that can hinder the chemical strengthening process is small, and the content of CeO ₂ that enhances the polishing property is merely large relative to the rare earth oxide contained in the abrasive. It is thought that this is also due to the large amount of the abrasive.

The polishing liquid 7 is in a state where the abrasive is dispersed in water, and the content of CeO ₂ is preferably 3 to 15% by mass with respect to the total amount of the polishing liquid. By doing so, the glass substrate for information recording media excellent in impact resistance can be manufactured, the polishing rate can be further increased, and the glass substrate for information recording media having higher smoothness can be manufactured. Further, in the case of a polishing liquid in which the abrasive is dispersed in water, as described above, since the alkaline earth metal is dissolved even if the alkaline earth metal is contained in the water, It is difficult to adhere to the surface of the plate, and it is considered that the alkaline earth metal contained in the abrasive is likely to adhere to the surface of the glass base plate. Therefore, it is considered that the use of an abrasive having a small amount of alkaline earth metal can sufficiently suppress the adhesion of alkaline earth metal to the polished glass base plate.

  The abrasive has a maximum particle size distribution of 3.5 μm or less measured by the laser diffraction scattering method, and a cumulative 50 volume% diameter D50 in the particle size distribution measured by the laser diffraction scattering method is 0.4 to 0.4. It is preferable that it is 1.6 μm.

  When the particle size of the abrasive is too small, the polishing rate tends to decrease. When the particle size of the abrasive is too large, scratches that can be formed on the glass base plate due to polishing tend to occur.

  The maximum value in the particle size distribution measured by the laser diffraction scattering method is a cumulative curve obtained by setting the total volume of the powder population obtained by measurement with a laser diffraction particle size distribution measuring apparatus as 100%. It means the particle diameter of the point that is the maximum value of the curve. D50 means the particle diameter at which the cumulative curve is 50% when the total volume of the powder population obtained by measurement with a laser diffraction particle size distribution measuring device is 100%, and the cumulative curve is 50%. To do.

  The polishing liquid 16 preferably has a fluorine content of 5% by mass or less in the rough polishing step.

  The polishing pad 15 can contain zirconium silicate, zirconium oxide, manganese oxide, iron oxide, aluminum oxide, silicon carbide, or silicon dioxide in addition to cerium oxide. Among these, zirconium silicate is used. It is more preferable to make it contain.

  The blending amount of cerium oxide in the polishing pad is preferably 10 to 30% by mass and more preferably 15 to 25% by mass with respect to the total amount of the polishing pad.

  The polishing pad according to the present embodiment is manufactured, for example, by the following method.

  First, a resin solution and abrasive grains are mixed to produce an abrasive dispersion. Next, the abrasive dispersion is cured using a molding die to form a plate-like block in which the abrasive grains are fixed inside and on the surface. Subsequently, after the block is taken out of the mold, both sides of the block are ground and processed to a predetermined thickness.

More preferably, first, the resin solution and the abrasive grains are mixed, and the mixed liquid is depressurized and defoamed to produce a foam-free abrasive dispersion. Next, the foam-free abrasive dispersion is cured using a mold to form a plate-like block in which the abrasive grains are fixed inside and on the surface of the non-foamed body. Subsequently, after the block is taken out from the mold, both sides of the block are ground and processed to a predetermined thickness.
<Chemical strengthening process>
If the chemical strengthening process in the manufacturing method of this invention is a well-known method, it will not specifically limit. Specifically, for example, a step of immersing a glass base plate in a chemical strengthening treatment liquid and the like can be mentioned. By doing so, a chemical strengthening layer can be formed in the surface of a glass base plate, for example, a 5 micrometer area | region from the glass base plate surface. And by forming a chemical strengthening layer, impact resistance, vibration resistance, heat resistance, etc. can be improved.

  More specifically, in the chemical strengthening step, by immersing the glass base plate in a heated chemical strengthening treatment liquid, alkali metal ions such as lithium ions and sodium ions contained in the glass base plate are potassium having a larger ion radius. It is carried out by an ion exchange method for substituting alkali metal ions such as ions. Due to the strain caused by the difference in ion radius, compressive stress is generated in the ion-exchanged region, and the surface of the glass base plate is strengthened.

In this embodiment, it is thought that a strengthening layer is suitably formed by this chemical strengthening process by using the glass composition as described above as a glass base plate that is a raw material of the glass substrate. Specifically, among Li ₂ O, Na ₂ O, and K ₂ O, which are alkali components of the glass base plate, the content of Na ₂ O is large, and the sodium ions of Na ₂ O are chemically strengthened. This is thought to be because it is easily exchanged for potassium ions contained in. Further, since the polishing agent used in the polishing step before the chemical strengthening step, here the rough polishing step, is an abrasive having the above composition, the alkaline earth metal adhering to the surface of the glass base plate is used. The amount is small and the chemical strengthening is considered to be uniform. Therefore, a glass substrate excellent in impact resistance can be produced by performing a precision polishing step on a glass base plate that has been subjected to suitable chemical strengthening as in this embodiment.

  The chemical strengthening treatment liquid is not particularly limited as long as it is a chemical strengthening treatment liquid used in the chemical strengthening step in the method for producing a glass substrate for a magnetic information recording medium. Specifically, for example, a melt containing potassium ions, a melt containing potassium ions and sodium ions, and the like can be given.

Examples of these melts include melts obtained by melting potassium nitrate, sodium nitrate, potassium carbonate, sodium carbonate, and the like. Among these, it is preferable to use a combination of a melt obtained by melting potassium nitrate and a melt obtained by melting sodium nitrate from the viewpoint of low melting point and preventing deformation of the glass base plate. At that time, a melt obtained by melting potassium nitrate and a melt obtained by melting sodium nitrate are preferably mixed in approximately the same amount.
<Precision polishing process (secondary polishing process)>
The precision polishing process is a mirror polishing process that finishes a smooth mirror surface having a surface roughness (Rmax) of about 6 nm or less, for example, while maintaining the flat and smooth main surface obtained in the rough polishing process. The precision polishing step is performed, for example, by using a polishing apparatus similar to that used in the rough polishing step and replacing the polishing pad from a hard polishing pad to a soft polishing pad. The surface to be polished in the precision polishing step is the main surface, similar to the surface to be polished in the rough polishing step.

  Further, as the abrasive used in the precision polishing step, an abrasive that causes fewer scratches even if the abrasiveness is lower than the abrasive used in the rough polishing step is used. Specifically, for example, a polishing agent containing silica-based abrasive grains (colloidal silica) having a particle diameter lower than that of the polishing agent used in the rough polishing step. The average particle diameter of the silica-based abrasive is preferably about 20 nm. And the polishing slurry liquid containing the said abrasive | polishing agent is supplied to a glass base plate, a polishing pad and a glass base plate are slid relatively, and the surface of a glass base plate is mirror-polished.

  FIG. 4 is a partial cross-sectional perspective view showing a magnetic disk which is an example of a magnetic recording medium using the glass substrate for magnetic information recording medium manufactured by the method for manufacturing a glass substrate for magnetic information recording medium according to the present embodiment. is there. The magnetic disk D includes a magnetic film 102 formed on the main surface of a circular glass substrate 101 for a magnetic information recording medium. For the formation of the magnetic film 102, a known method is used. For example, a formation method (spin coating method) for forming a magnetic film 102 by spin-coating a thermosetting resin in which magnetic particles are dispersed on a glass substrate 101 for a magnetic information recording medium, or a glass substrate for a magnetic information recording medium Examples include a formation method (sputtering method) for forming the magnetic film 102 on the substrate 101 by sputtering, a formation method (electroless plating method) for forming the magnetic film 102 on the glass substrate 101 for magnetic information recording medium by electroless plating, and the like. It is done.

  The thickness of the magnetic film 102 is about 0.3 to 1.2 μm when the spin coating method is used, and is about 0.04 to 0.08 μm when the sputtering method is used. In some cases, the thickness is about 0.05 to 0.1 μm. From the viewpoint of thinning and densification, film formation by sputtering is preferable, and film formation by electroless plating is preferable.

  The magnetic material used for the magnetic film 102 can be any known material and is not particularly limited. The magnetic material is preferably, for example, a Co-based alloy based on Co having high crystal anisotropy in order to obtain a high coercive force, and Ni or Cr added for the purpose of adjusting the residual magnetic flux density. More specifically, CoPt, CoCr, CoNi, CoNiCr, CoCrTa, CoPtCr, CoNiPt, CoNiCrPt, CoNiCrTa, CoCrPtTa, CoCrPtB, CoCrPtSiO, and the like whose main component is Co can be given.

The magnetic film 102 has a multilayer structure (for example, CoPtCr / CrMo / CoPtCr, CoCrPtTa / CrMo / CoCrPtTa, etc.) divided by a nonmagnetic film (for example, Cr, CrMo, CrV, etc.) in order to reduce noise. May be. Magnetic material used for the magnetic layer 102, in addition to the magnetic material, ferrite or iron - may be a rare earth, also, Fe in a non-magnetic film made of _SiO 2, BN, etc., Co, FeCo, CoNiPt and the like A granular material having a structure in which the magnetic particles are dispersed may be used. In addition, for recording on the magnetic film 102, either an inner surface type or a vertical type recording format may be used.

  In order to improve the sliding of the magnetic head, the surface of the magnetic film 102 may be thinly coated with a lubricant. Examples of the lubricant include those obtained by diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a freon-based solvent.

  Furthermore, an underlayer or a protective layer may be provided on the magnetic film 102 as necessary. The underlayer in the magnetic disk D is appropriately selected according to the magnetic film 102. Examples of the material for the underlayer include at least one material selected from nonmagnetic metals such as Cr, Mo, Ta, Ti, W, V, B, Al, and Ni. For example, in the case of the magnetic film 102 containing Co as a main component, the material of the underlayer is preferably Cr alone or a Cr alloy from the viewpoint of improving magnetic characteristics.

  Further, the underlayer is not limited to a single layer, and may have a multilayer structure in which the same or different layers are stacked. Examples of such an underlayer having a multilayer structure include multilayer underlayers such as Cr / Cr, Cr / CrMo, Cr / CrV, NiAl / Cr, NiAl / CrMo, and NiAl / CrV. Examples of the protective layer that prevents wear and corrosion of the magnetic film 102 include a Cr layer, a Cr alloy layer, a carbon layer, a hydrogenated carbon layer, a zirconia layer, and a silica layer. These protective layers can be continuously formed with the underlayer and the magnetic film 102 by an in-line sputtering apparatus. These protective layers may be a single layer, or may be a multi-layer structure composed of the same or different layers.

Note that another protective layer may be formed on the protective layer or instead of the protective layer. For example, instead of the protective layer, a SiO ₂ layer may be formed on the Cr layer. Such a SiO ₂ layer is formed by dispersing and applying colloidal silica fine particles in a tetraalkoxysilane diluted with an alcohol-based solvent on the Cr layer and further baking.

  In such a magnetic recording medium based on the glass substrate 101 for magnetic information recording medium according to this embodiment, the glass substrate 101 for magnetic information recording medium is formed with the above-described composition. It can be done with high reliability.

  In addition, although the case where the glass substrate 101 for magnetic information recording media in this embodiment was used for a magnetic recording medium was demonstrated above, it is not limited to this, The glass substrate for magnetic information recording media in this embodiment 101 can also be used for magneto-optical disks, optical disks, and the like.

  EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples.

  First, a general glass substrate, an abrasive, and a polishing pad used for manufacturing a glass substrate for an information recording medium were prepared. The composition of the polishing agent and the polishing pad includes those contained in general polishing agents and polishing pads used in the production of a glass substrate for information recording media.

Example 1
Using a glass substrate, a disk processing step, a lapping step, a rough polishing step (primary polishing step), a chemical strengthening step, and a precision polishing step (secondary polishing step) were performed by known methods. Then, carbonated water having an electric resistance value of 0.2 MΩ · cm was used for the rinsing process in the cleaning step, and dried with IPA vapor having a water content of 0.1% by mass.

  Specifically, first, the glass base plate was immersed in a cleaning solution containing 1% by mass of HF and 3% by mass of sulfuric acid for 6 minutes. At that time, an ultrasonic vibration of 80 kHz was applied to the cleaning liquid. Thereafter, the glass base plate was taken out. And the taken-out glass base plate was immersed in neutral detergent liquid for 6 minutes. At that time, 120 kHz ultrasonic vibration was applied to the neutral detergent solution. Finally, the glass base plate was taken out, rinsed with carbonated water having an electric resistance value of 0.2 MΩ · cm, and dried with IPA vapor having a water content of 0.1% by mass.

In addition, as shown in Table 1, the alkali metal (ion contamination) remaining on the surface of the glass base plate after washing in the washing step was 10 ng / cm ² or less.

  This ion contamination was measured as follows.

  First, the glass base plate after being washed in the washing step was immersed in 20 ml of ultrapure water (20 ° C.) of 18 MΩ · cm or more, and allowed to stand for 10 minutes. At this time, stirring or the like was not performed, and during the standing, the lid of the container was closed and the work was further performed in a class 100 room. After standing for 10 minutes, only the glass base plate was taken out, and the ultrapure water in which the glass base plate was immersed was contained by using an ion chromatograph (ICS-2100 manufactured by Dionex Co., Ltd.) The amount of similar metals was measured. And the quantity of the alkali metal (ion contamination) which remained on the surface of the glass base plate after wash | cleaning at the washing | cleaning process was computed from the quantity of the measured alkali metal.

  In addition, as a chemical strengthening process, specifically, first, a mixed melt obtained by melting potassium nitrate and sodium nitrate was prepared. In addition, this mixed melt is mixed so that the mixing ratio of potassium nitrate and sodium nitrate is 1: 1 by mass ratio. Then, this mixed melt was heated to 400 ° C., and the washed glass base plate was immersed in the heated mixed melt for 60 minutes.

(Comparative Example 1)
The rinse treatment is the same as in Example 1 except that 300 MΩ · cm IPA was used.

In addition, as shown in Table 1, the alkali metal (ion contamination) remaining on the surface of the glass base plate after washing in the washing step was 150 ng / cm ² or less.

(Comparative Example 2)
The drying process is the same as in Example 1 except that the IPA of 300 MΩ · cm was used in the rinsing process and the moisture content was dried with IPA vapor having a water content of 1% by mass.

In addition, as shown in Table 1, the alkali metal (ion contamination) remaining on the surface of the glass base plate after washing in the washing step was 128 ng / cm ² or less.

(Dry drying test)
The dried glass substrate was measured with OSA (Optical Surface Analyzer) Candela 7120 (manufactured by KLA tencol).

  When there was linear adhesion on the surface of the glass substrate, it was determined that the drying was poor.

  The results are shown in Table 1 together with the amount of ion contamination.

  As is clear from the results in Table 1, the glass substrate was rinsed with an aqueous solution having an electric resistance value of 10 MΩ · cm or less, and the water content in the IPA vapor was 0.5% by mass or less. In Example 1, there was very little ion contamination and the drying failure of the glass substrate was suppressed.

On the other hand, when a rinse solution having an electric resistance value of 10 MΩ · cm or more was used (Comparative Example 1), although the drying defect did not occur, the ion contamination was a very large value of 150 ng / cm ² . Moreover, when the steam whose water content in IPA steam is 0.5 mass or more was used (Comparative Example 2), the amount of ion contamination became as large as 128 ng / cm ^2, and in addition, poor drying occurred. This is thought to be because the moisture content was higher than that of Example 1 above, so that it could not be completely dried.

2 Cleaning treatment tank 3 Rinse treatment tank 4 Vapor tank 5 Moisture content measuring device 10 Glass substrate 101 Glass substrate for magnetic information recording medium

Claims (2)

Treatment of rinsing the glass substrate with an aqueous solution having an electric resistance value of 10 MΩ · cm or less;
A method for producing a glass substrate for a magnetic information recording medium, comprising: a drying treatment in which a vapor of a water-soluble solvent having a lower boiling point than water is brought into contact with the rinsed glass substrate,
A method for producing a glass substrate for a magnetic information recording medium, wherein in the drying treatment, steam having a water content in the steam of 0.5% by mass or less is used.   The method for producing a glass substrate for a magnetic information recording medium according to claim 1, wherein the water-soluble solvent having a boiling point lower than that of water is one or more selected from isopropyl alcohol, ethanol, and acetone.

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