JP2012079848A - Spin processing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a spin processing device capable of sucking and attaching a processing substrate using an air stream arising from rotation of a rotor.SOLUTION: In the spin processing device, an ejector has a funnel-like air introduction port and the rotor rotates at 600 cycles per minute.

Description

  Embodiments of the present invention relate to a flat panel display element manufacturing apparatus, and more particularly to a spin cleaning apparatus in an element substrate cleaning process and a spin coating apparatus in a resist coating process.

  In a conventional spin cleaning device or a device equipped with a mechanism for vacuum chucking a substrate with a spin coating device, the vacuum generation source is installed on a portion not on the rotating body, and the rotating body is connected via a free joint such as a rotary joint. Was supplied.

JP 2002-203829 A

However, in the prior art, adding a vacuum pipe, such as when a vacuum chuck is provided in an existing apparatus, requires a major modification, which is disadvantageous in terms of cost and modification time. In addition, vacuum leakage due to wear of the free joint is unavoidable due to the mechanism.

According to an embodiment of the present invention, a gantry, a rotating body installed on the gantry, a motor for rotating the rotating body, a vacuum pad formed on the rotating body, and connected to the vacuum pad, A spin processing apparatus comprising: an ejector installed on a rotating body; wherein the ejector has a funnel-shaped air inlet, and the rotating body rotates at least 600 times per minute. The above-mentioned problems are solved by providing.

It is the figure which showed the Example in the spin cleaning apparatus which concerns on embodiment of this invention. It is an enlarged view of the funnel-shaped air inlet of FIG.

  Hereinafter, embodiments of the present invention will be described in detail with reference to FIGS. 1 and 2.

  A spin cleaning apparatus will be described as an example.

  In the process of manufacturing a flat panel display element, cleaning for removing particles on the substrate is extremely important, and a lot of spin cleaning apparatuses that are installed in the line and can reduce the floor area of the apparatus are widely used. .

  In the spin cleaning apparatus, a rotating body 3 connected to a rotation motor 2 is provided on a gantry 1 and a substrate 4 to be cleaned is mounted thereon and rotated at a predetermined number of rotations during cleaning. On the rotating body 3, a nozzle 5 for discharging the cleaning liquid and an arm mechanism 6 for moving the nozzle 5 are provided. The nozzle 5 is connected to a pump 8 and a cleaning liquid tank 9 through a tube 7 for transporting the cleaning liquid, and supplies the cleaning liquid to the substrate 4 installed on the rotating body 3 at a necessary timing.

A vacuum pad 10 is provided on a portion of the rotating body 3 where the substrate 4 is mounted. The vacuum pad 10 is connected to an ejector 11 that is a vacuum generator. A funnel-shaped air inlet 12 is attached to the compressed air supply port of the ejector 11, and the funnel-shaped air inlet 12 is directed in the direction of rotation of the rotating body 3 and the direction along the tangent to the rotation circle. Furthermore, it is installed on the rotating body at a position farthest from the rotation center of the rotating body. In addition, for example, when the rotating body rotates 600 times or more per minute, it is easy to obtain the effect. When a plurality of vacuum pads 10 are installed and a sufficient vacuum pressure cannot be obtained with one ejector 11, a plurality of ejectors 11 are also installed. It is also possible to use a vacuum chuck plate instead of the vacuum pad.

Furthermore, if an electromagnetic valve and its control line can be provided, the ejector is connected to a vacuum pressure storage tank (reservoir tank) via an electromagnetic valve, and the rotating body rotates the electromagnetic valve so that the ejector By opening the tank only during generation and evacuating the tank to store the vacuum pressure, the vacuum pressure obtained should be used appropriately when the rotating body is stopped for chucking the substrate. Can do. In this case, an electromagnetic valve is also provided between the vacuum pad 10 and the vacuum storage tank so that a vacuum pressure is supplied to the pad only while the vacuum pad is not used.

  The effect of the invention according to the above embodiment will be described.

  When remodeling the substrate holding mechanism of the existing spin cleaning equipment to the vacuum chucking type, the ejector is used as in this embodiment, and the air pressure generated by the rotation of the rotating body is supplied to the ejector. In particular, the substrate is held by the vacuum chuck, and when the rotation is completed, the holding is automatically released, so that no external control is required, and the mechanism can be easily changed.

In addition, it is necessary to fix the substrate before the start of rotation, and even when using a reservoir tank, it is not necessary to lay a thick vacuum line on a difficult rotating body from the outside compared to normal electrical wiring, so there is an improvement. There is an effect that becomes easy.

DESCRIPTION OF SYMBOLS 1 ... Mount 2 ... Spin motor 3 ... Rotating body 4 ... Substrate 5 ... Cleaning liquid discharge nozzle 6 ... Nozzle holding arm 7 ... Cleaning liquid transport tube 8 ... Pump 9 ... Cleaning liquid tank 10 ... Vacuum pad 11 ... Ejector 12 ... Funnel-shaped air inlet

Claims (4)

A frame,
A rotating body installed on the mount;
A motor for rotating the rotating body;
A vacuum pad formed on the rotating body;
An ejector connected to the vacuum pad and installed on the rotating body;
In a spin processing apparatus comprising:
The ejector has a funnel-shaped air inlet;
The spin processing apparatus, wherein the rotating body rotates 600 times or more per minute. The spin processing apparatus according to claim 1, wherein the ejector is installed at a position away from a central portion of the rotating body. The spin processing apparatus according to claim 1, wherein the ejector includes a vacuum storage tank. A frame,
A rotating body installed on the mount;
A motor for rotating the rotating body;
A vacuum pad formed on the rotating body;
An ejector connected to the vacuum pad, installed on the rotating body and having a funnel-shaped air inlet;
In a spin processing apparatus comprising:
Preparing a processing substrate on the rotating body;
The rotating body rotates 600 times or more per minute,
The spin processing method, wherein the ejector takes outside air from the funnel-shaped air inlet and sucks the processing substrate.

Images