JP2012074552A - Substrate processing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate processing method capable of stably controlling the concentration of a processing liquid and preventing the processing efficiency of a substrate processing device from deteriorating.SOLUTION: If the concentration measured by concentration measurement means 37 is not within a normal concentration range, the substrate processing method determines that the concentration is abnormal and replaces the whole processing liquid. If the concentration is within the normal concentration range: when the concentration is within a target concentration range, the method processes the substrate with a processing liquid of measured concentration; when the concentration is within a first concentration range, the method replenishes a processing liquid only by a predetermined amount and corrects the concentration; and when the concentration is within a second concentration range, the method drains the processing liquid only by the predetermined amount and then replenishes a new processing liquid only by the predetermined amount. Having a plurality of concentration correction ranges provides stable concentration control.

Description

  The present invention includes, for example, a semiconductor wafer, a liquid crystal display substrate, a plasma display substrate, an organic EL substrate, an FED (Field Emission Display) substrate, an optical disk substrate, a magnetic disk substrate, a magneto-optical disk substrate, and a photomask. BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing method for performing processing such as cleaning, etching, and peeling with a processing liquid on a substrate such as a processing substrate or a solar cell substrate, and particularly relates to a technique for stably controlling the concentration of the processing liquid.

Conventionally, there is a substrate processing method for processing a substrate by immersing the substrate in a processing tank in which a processing solution is stored. In this substrate processing method, a technique for extending the service life of the processing liquid and improving the processing efficiency of the substrate processing apparatus is required.
Therefore, in the substrate processing method in which the substrate is immersed, after a part of the processing liquid stored in the processing tank is drained, a new processing liquid of the same amount as the drained processing liquid is replenished. As a result, the processing life of the processing liquid in the processing tank is extended and the number of times that the entire amount of the liquid in the processing tank is replaced is reduced.

JP-A-10-261610

  However, when a part of the processing liquid stored in the processing tank is drained as in the prior art and then the same amount of new processing liquid as the drained processing liquid is replenished, the concentration may change suddenly depending on the processing liquid. , It becomes a disturbance, and the concentration of the processing liquid in the processing tank temporarily reaches a concentration of abnormal concentration, or the processing liquid in the processing tank reaches a concentration at which the entire amount of liquid must be replaced. was there. Therefore, there has been a problem that the substrate processing of the apparatus is temporarily stopped and the processing efficiency of the substrate processing apparatus is lowered.

  The present invention has been made in view of such circumstances, and an object of the present invention is to provide a substrate processing method capable of stably controlling the concentration of a processing solution and preventing a decrease in processing efficiency of a substrate processing apparatus. And

  In order to solve the above-mentioned problems, the invention of claim 1 is a substrate processing method for processing a substrate with a processing liquid, wherein the concentration of a predetermined component contained in the processing liquid generated by mixing a plurality of liquids is determined. The measurement means measures and determines whether or not the measured concentration is a concentration in a normal concentration range that allows substrate processing, and the normal concentration range does not require concentration correction of the processing liquid, and processing When the concentration of a predetermined component contained in the treatment liquid obtained by the concentration measuring means is within the target concentration range, divided into a first concentration range and a second concentration range that require liquid concentration correction The substrate is allowed to be subjected to predetermined processing using the processing liquid having this concentration, and the concentration of the predetermined component contained in the processing liquid obtained by the concentration measuring means is within the first concentration range. Is a predetermined liquid constituting the processing liquid When the concentration of the processing liquid is corrected by supplying a predetermined amount to the processing tank, and the concentration of the predetermined component contained in the processing liquid obtained by the concentration measuring means is within the second concentration range, After draining a predetermined amount of the processing liquid stored in the processing tank, the concentration of the processing liquid is corrected by supplying a predetermined amount of the predetermined liquid constituting the processing liquid to the processing tank, and the concentration When the concentration of the predetermined component contained in the treatment liquid obtained by the measuring means is not within the normal concentration range, the entire amount of the treatment liquid in the treatment tank is exchanged.

  [Operation / Effect] According to the first aspect of the present invention, the concentration measuring means measures the concentration of a predetermined component contained in the treatment liquid produced by mixing a plurality of liquids. Then, it is determined whether or not the measured density is in a normal density range that allows substrate processing. This normal concentration range is divided into a target concentration range that does not require correction of the concentration of the processing liquid, and a first concentration range and a second concentration range that require correction of the concentration of the processing liquid.

  When it is within the target concentration range, it is allowed to perform a predetermined process on the substrate using the processing liquid having this concentration. When the concentration of the predetermined component contained in the processing liquid obtained by the concentration measuring means is within the first concentration range, the processing liquid is supplied by supplying a predetermined amount of the predetermined liquid constituting the processing liquid to the processing tank. Correct the concentration of the solution. When the concentration of the predetermined component contained in the processing liquid obtained by the concentration measuring means is within the second concentration range, the processing liquid stored in the processing tank is drained by a predetermined amount, and then the processing liquid is The concentration of the processing liquid is corrected by supplying a predetermined amount of the configured liquid to the processing tank. Finally, when the concentration of the predetermined component contained in the treatment liquid obtained by the concentration measuring means is not within the normal concentration range, the entire amount of the treatment liquid in the treatment tank is exchanged.

  The correction in the first concentration range is performed by supplying a predetermined amount of the predetermined liquid constituting the processing liquid to the processing tank, so that it is not necessary to drain the processing liquid, and the liquid is discharged after the predetermined amount is discharged. Compared with the method of quantitative replenishment, the amount of replacement of the treatment liquid is small, and the concentration correction can be performed gently. Further, the correction in the second concentration range is performed by discharging a predetermined amount of the processing liquid from the processing tank and then supplying a predetermined amount of the predetermined liquid constituting the processing liquid to the processing tank. A large amount of liquid can be replaced, and concentration correction can be performed more quickly. Furthermore, if it is determined that the concentration is not within the normal concentration range, the substrate processing is not allowed in the concentration range (abnormal concentration range). By supplying the liquid and exchanging the liquid, the entire liquid in the treatment tank is replaced, so that the substrate processing can be performed at a stable concentration after the liquid exchange.

  As described above, in the first aspect of the invention, the normal concentration range includes the target concentration range that does not require the concentration correction of the treatment liquid, and the first concentration range and the second concentration range that require the concentration correction of the treatment liquid. Since the concentration is corrected by dividing into two, the concentration of the treatment liquid can be controlled stably.

  According to a second aspect of the present invention, in the first aspect of the present invention, in the second concentration range, a predetermined drainage amount of the processing liquid drained and a predetermined supply amount of the predetermined liquid to be supplied However, the liquid which comprises the said process liquid is supplied to a process tank so that it may become the same quantity.

  [Operation / Effect] According to the invention described in claim 2, the predetermined drainage amount of the processing liquid discharged from the processing tank in the second concentration range and the predetermined amount supplied to the processing tank in the second concentration range. Since the predetermined supply amount of the liquid is the same liquid amount, there is no increase in the amount of the processing liquid accompanying the concentration correction, and the total liquid amount stored in the processing tank does not increase. Therefore, there is an advantage that concentration correction can be performed quickly, an increase in the liquid level of the processing tank accompanying the liquid supply operation can be suppressed, and overflow from the processing tank can be prevented in advance.

  According to a third aspect of the present invention, in the first or second aspect of the present invention, an alarm is issued when the concentration obtained by the concentration measuring means is in the first concentration range and the second concentration range. In addition to issuing a report, the processing of the substrate is continued.

  [Operation / Effect] According to the invention described in claim 3, since the operator can be alerted in advance to the concentration of the processing solution, the apparatus is suddenly stopped due to an abnormal concentration during substrate processing. Can be prevented.

  According to the present invention, the normal concentration range is divided into the target concentration range that does not require the concentration correction of the processing liquid, and the first concentration range and the second concentration range that require the concentration correction of the processing liquid, Since the correction is performed, there is an effect that the concentration of the processing liquid can be stably controlled.

It is a block diagram which shows schematic structure of the substrate processing apparatus for enforcing the substrate processing method which concerns on this invention. It is a flowchart showing the processing operation for implementing the substrate processing method which concerns on this invention, and is a processing flow before completion of preparation. It is a flowchart showing the processing operation for enforcing the substrate processing method concerning the present invention, and is the processing flow at the time of lot processing after preparation completion and lot waiting. The processing flow for judging the density | concentration state and correcting the density | concentration of the component of the chemical | medical solution contained in a process liquid represents an example of the concept of the density | concentration correction | amendment operation | movement for implementing the substrate processing method which concerns on this invention. It is. The concept of the density | concentration range in the substrate processing method which concerns on this invention is shown.

  Hereinafter, specific embodiments of a substrate processing apparatus according to the present invention will be described with reference to the drawings.

  This substrate processing apparatus includes a processing tank 1 having an inner tank 2 for immersing and processing a substrate, an outer tank 3 for receiving a processing liquid overflowing from the inner tank 2, and a chemical solution and pure water to the inner tank 2. The liquid supply means 5 for supplying the liquid, the liquid replenishment means 6 for replenishing the outer tank 2 with the chemical and pure water, and the plurality of liquids supplied by the liquid supply means 5 and the liquid replenishment means 6 are supplied to the outer tank 2. And a control unit 100 for controlling the entire substrate processing apparatus including control of equipment such as valves, and the like, and a processing liquid circulating means 8 for generating a processing liquid by circulating between the inner tank 2 and mixing and stirring. Alarm display means 104 for reporting an abnormality of the apparatus and notifying the operator of the abnormality of the apparatus.

  The liquid supply means 5 includes a chemical liquid supply pipe 50 connected to the chemical liquid supply source 10, a pure water supply pipe 52 connected to the pure water supply source 11, a chemical liquid supply valve 14 provided in the chemical liquid supply pipe 50, And a pure water supply valve 15 provided in the pure water supply pipe 52. Supply / stop of the chemical solution from the chemical solution supply source 10 to the inner tank 2 is performed by opening and closing the chemical solution supply valve 14 via the chemical solution supply pipe 50. Supply / stop of pure water from the pure water supply source 11 to the inner tank 2 is performed by opening and closing the pure water supply valve 15 via the pure water supply pipe 52.

  The liquid replenishing means 6 includes a chemical liquid replenishment pipe 51 connected to the chemical liquid supply source 10 via a chemical liquid supply pipe 50, a chemical liquid replenishment flow meter 22 and a chemical liquid replenishment valve 18 provided in the chemical liquid replenishment pipe 51, and a pure water supply. A pure water replenishment pipe 53 connected to the source 11 via a pure water supply pipe 52, and a pure water replenishment flow meter 23 and a pure water replenishment valve 19 provided in the pure water replenishment pipe 53 are provided. The chemical solution replenishment start / stop is performed by opening and closing the chemical solution replenishing valve 18 with the chemical solution supplied from the chemical solution supply source 10 through the chemical solution supply pipe 50 and the chemical solution supply pipe 51. Pure water replenishment start / stop is performed by opening and closing the pure water replenishment valve 19 with pure water supplied from the pure water supply source 11 through the pure water supply pipe 52 and the pure water replenishment pipe 53.

  The chemical solution replenishment amount is measured as an integrated flow rate by the chemical solution replenishment flow meter 22, and the pure water replenishment amount is measured as an integrated flow rate by the pure water replenishment flow meter 23. The integrated flow rate data measured by the chemical solution replenishment flow meter 22 and the pure water replenishment flow meter 23 is sent to the calculation unit 101 of the control unit 100 in real time as analog or digital data.

  The processing liquid circulation means 8 includes a circulation pipe 54 whose upstream side is connected to the bottom of the outer tank 3 and whose downstream side is connected to the inner tank 2. The circulation pipe 54 includes, from the upstream side, an outer tank drain valve 40 for draining the processing liquid stored in the outer tank 3, a pump 31, a circulation switching valve 42, a temperature adjusting means 32, and a filter 36. And a densitometer 37. When the processing liquid is circulated through the processing liquid circulation means 8, after opening the outer tank drain valve 40 and the circulation switching valve 42, the pump 31 is driven to overflow the processing liquid from the inner tank 2 to the outer tank 3. Is returned to the inner tank 2 through the circulation pipe 54 and through the filter 36 for removing impurities in the processing liquid. Note that. At this time, the inner tank drain valve 41 and the drain valve 43 described later are in a closed state.

  The temperature adjusting means 32 is a means for adjusting the temperature of the processing liquid. Specifically, it includes a temperature measuring means (not shown) such as a resistance temperature detector, a heating means such as a heater, and a cooling means such as a cooling pipe, and the heating means and the cooling means according to the operating temperature of the processing liquid. Are used as appropriate. In addition, the temperature data of the processing liquid measured by the temperature measuring unit of the temperature adjusting unit 32 is sent to the arithmetic unit 101 of the control unit 100 in real time as analog or digital data.

  The densitometer 37 measures the concentration of a predetermined component of the chemical liquid contained in the treatment liquid in the treatment tank 1. The concentration measured by the densitometer 37 is sent to the calculation unit 101 of the control unit 100 in real time as analog or digital data.

  The upstream side of the inner tank drainage pipe 55 is connected to the bottom of the inner tank 2. The downstream side of the inner tank drain pipe 55 is connected to a position between the outer tank drain valve 40 and the pump 31 of the circulation pipe 54. The inner tank drain pipe 55 is provided with an inner tank drain valve 41.

An upstream side of the drain pipe 56 is connected to a position between the pump 31 provided in the circulation pipe 54 and the circulation switching valve 42. The drain pipe 56 is provided with a drain valve 43 for draining the processing liquid drained from the inner tank 2 and the outer tank 3 to the outside of the apparatus.

The control unit 100 includes a density range memory 102, a current density memory 103, and a calculation unit 101.
The concentration range memory 102 is not normal because the target concentration of a predetermined component of the chemical solution contained in the processing solution, a plurality of concentration ranges that divide the normal concentration range that allows substrate processing, and substrate processing are not allowed. A memory area for individually setting the density range (abnormal density range) is provided.
The current concentration memory 103 is a buffer memory for temporarily buffering the concentration of a predetermined component of the chemical solution received from the concentration meter 37 as the current component concentration.

  The calculation unit 101 controls each flow meter, the temperature adjusting unit 32, the concentration meter 37, and each valve, and also has a concentration range of a predetermined component of the chemical liquid included in the processing solution set in the concentration range memory 102 in advance. Are compared with the current component concentration stored in the current concentration memory 103 to determine which concentration range the current concentration is in. Further, when it is necessary to issue an alarm according to the concentration range of the measured concentration, the alarm display unit 104 is instructed to output an alarm.

  The alarm display means 104 is a display means for prompting the apparatus operator to call attention, and an indicator such as a display, an indicator light such as an LED, or the like is used.

  Next, the processing operation of the substrate processing method according to the present invention will be described. 2, 3 and 4 are flowcharts showing the processing operation of the substrate processing apparatus. Specifically, FIG. 2 is a processing flow before the completion of preparation, FIG. 3 is a processing flow for lot processing and waiting for the lot after preparation is completed, and FIG. 4 is a processing liquid after judging the concentration state. It is a processing flow for correct | amending the density | concentration of the component of the chemical | medical solution contained. FIG. 5 shows the concept of the density range in the substrate processing method.

  First, the pure water supply valve 15 is opened, and the supply of pure water to the inner tank 2 is started (step S1). The pure water supply amount is measured by pure water supply amount measuring means (not shown). When the supply amount reaches a predetermined amount, the pure water supply valve 15 is closed to supply pure water to the inner tank 2. And the supply of pure water is completed (step S2).

  After the completion of the supply of pure water, the chemical solution supply valve 14 is subsequently opened, and the supply of the chemical solution to the inner tank 2 is started (step S3). The supply amount of the chemical solution is measured by a chemical solution supply amount measuring unit (not shown).

  When a predetermined amount is reached before the chemical liquid is supplied and the mixing ratio of the chemical liquid and pure water reaches the target mixing ratio, the processing liquid circulation and temperature control operations are started by the processing liquid circulation means ( Step S4). The amount of liquid that can start the circulation and temperature adjustment operation here is the minimum amount of liquid necessary for operating the pump and the temperature adjustment heating means.

  The supply of the chemical solution is continued while performing the circulation and temperature control operation, and the chemical solution supply valve 14 is closed when the mixing ratio between the supply amount of pure water and the supply amount of the chemical solution reaches a target predetermined mixture ratio. The supply of the chemical solution to the inner tank 2 is stopped (step S5). Thereafter, it is determined whether or not the temperature of the processing liquid in the inner tank 2 and the concentration of a predetermined component of the chemical liquid contained in the processing liquid are values that allow substrate processing (step S6). When the temperature of the processing liquid in the inner tank 2 and the concentration of the predetermined component of the chemical liquid contained in the processing liquid are stabilized at an acceptable value, the preparation is completed (step S7). Acceptance is possible.

  After completion of the preparation in step S7, it is confirmed whether or not a processing lot has been input (step S8). When the processing lot is immediately put in, the processing lot is carried into the inner tank 2 by a lifter (not shown) (Step 9), the substrate is immersed in the processing liquid in the inner tank 2 (Step S10), and processed for a predetermined time. After (step S11), the substrate is unloaded from the inner tank 2 by a lifter (not shown) (step S12). In step S8, when the processing lot is not input, waiting for the processing lot to be input (step S13).

  Subsequent to step S12 and step S13, it is confirmed whether or not the concentration of the predetermined component of the chemical liquid contained in the treatment liquid measured by the concentration meter 37 is in the normal concentration range (abnormal concentration range) (step S14). . The normal density range is divided into three density ranges of a target density range, a first density range, and a second density range, and different processes are performed according to the classification. In step S14, in the state after the substrate processing in step S12, the concentration of the component of the chemical solution contained in the processing liquid changes due to the reaction with the deposit on the substrate surface or the film constituting the substrate surface, or in step S13. When the processing lot is waiting to be charged, the concentration of the chemical component contained in the processing solution changes due to evaporation of the component contained in the processing solution or deterioration of a predetermined component of the chemical solution due to a chemical reaction. Is going to.

  As a result of the concentration confirmation in step S14, when it is determined that the concentration of the predetermined component of the chemical liquid contained in the processing liquid is not in the normal concentration range (abnormal concentration range), the entire liquid replacement is performed (step S15). When the entire liquid replacement is completed, the substrate processing operation ends.

As a result of the concentration confirmation in step S14, when it is determined that the concentration of the predetermined component of the chemical liquid contained in the processing liquid is within the normal concentration range, this concentration is within the target concentration range (S0 +, S0−). Whether or not (step S16). The concentration range S0 + is a concentration range in which the predetermined component concentration of the chemical liquid contained in the processing liquid is slightly higher than the target concentration in the target concentration range, and the substrate processing is performed without requiring concentration correction. The concentration range that can be used.
S0- is a concentration range in which a predetermined component concentration of the chemical liquid contained in the processing liquid is slightly lower than the target concentration in the target concentration range, and the substrate processing is performed without requiring concentration correction. The concentration range that can be used.

  If it is determined in step S16 that the concentration of the predetermined component of the chemical liquid contained in the processing liquid is within the target concentration range (S0 +, S0−), the concentration of the processing liquid is not corrected, and this measurement is performed. The processing with the processing solution having the concentration is permitted (step S17).

  If it is determined in step S16 that the concentration of the predetermined component of the chemical contained in the processing liquid is not within the target concentration range (S0 +, S0−), whether or not this concentration is within the first concentration range is determined. Judgment is made (step S18).

  If it is determined in step S18 that the concentration of the predetermined component of the chemical liquid contained in the processing liquid is within the first concentration range, it is determined whether or not this concentration is within the range of S1 + (step S19). The concentration range S1 + is a concentration range in which the predetermined component concentration of the chemical liquid contained in the treatment liquid is slightly higher than the target concentration range S0 + in the first concentration range. A range that requires concentration correction to bring the concentration of a predetermined component of a chemical solution contained in the processing liquid closer to the target concentration range (S0 +, S0−) by diluting the processing liquid by replenishing the predetermined amount.

  In step S19, when it is determined that the concentration of the predetermined component of the chemical liquid included in the processing liquid is within the range of S1 +, the pure water is used to reduce the mixing ratio of the predetermined component of the chemical liquid included in the processing liquid. The replenishing valve 19 is opened to replenish a predetermined amount of pure water (step S20).

  In step S19, when it is determined that the concentration of the predetermined component of the chemical liquid contained in the processing liquid is not within the range of S1 +, this concentration is considered to be within the range of S1- and the predetermined concentration of the chemical liquid contained in the processing liquid is determined. In order to increase the mixing ratio of these components, the chemical solution replenishing valve 18 is opened to replenish a predetermined amount of chemical solution (step S21). The concentration range S1- is a concentration range in which the predetermined component concentration of the chemical liquid contained in the treatment liquid is slightly lower than the target concentration range S0- in the first concentration range, and the chemical liquid constituting the treatment liquid. Alternatively, concentration correction is performed to bring the concentration of the predetermined component of the chemical liquid contained in the processing liquid closer to the target concentration range (S0 +, S0−) by replenishing the predetermined amount of the chemical liquid component and concentrating the processing liquid. The required range.

  If it is determined in step 18 that the concentration of the predetermined component of the chemical contained in the processing liquid is not within the first concentration range, it is considered to be within the second concentration range (step S22), and the concentration range of the processing liquid Is in the range of S2 + (step S23). Note that the concentration range S2 + is a concentration range in which the predetermined component concentration of the chemical liquid contained in the treatment liquid is higher than the concentration range S1 + in the second concentration range, and if it is left as it is, it may become an abnormal concentration range. And draining the processing liquid stored in the processing tank, replenishing a predetermined amount of pure water constituting the processing liquid, and diluting the processing liquid, whereby a predetermined amount of the chemical liquid contained in the processing liquid is obtained. This is a range that requires density correction to bring the component density close to the target density range (S0 +, S0-).

  In step S23, when it is determined that the concentration of the predetermined component of the chemical liquid included in the processing liquid is within the range of S2 +, the predetermined ratio of the predetermined component of the chemical liquid included in the processing liquid is decreased. After draining the amount of treatment liquid, the pure water replenishing valve 19 is opened to replenish a predetermined amount of pure water (step S24). In step S23, when it is determined that the concentration of the predetermined component of the chemical liquid included in the processing liquid is not within the range of S2 +, the concentration is considered to be within the range of S2- and the concentration of the chemical liquid component included in the processing liquid is In order to increase the mixing ratio, after draining a predetermined amount of processing liquid, the chemical liquid replenishing valve 18 is opened to replenish the predetermined amount of chemical liquid (step S25). Note that the concentration range S2- is a concentration range in which the predetermined component concentration of the chemical liquid contained in the treatment liquid is lower than the concentration range S1- in the second concentration range. After the treatment liquid stored in the treatment tank is drained, a predetermined amount of chemical liquid or chemical liquid component constituting the treatment liquid is replenished, and the treatment liquid is concentrated to be contained in the treatment liquid. A range that requires concentration correction to bring the concentration of a predetermined component of the chemical solution closer to the target concentration range (S0 +, S0−).

  The processing liquid is drained in steps S24 and S25 through the circulation pipe 54 and the drain pipe 56 by opening the outer tank drain valve 40 and the drain valve 43 and operating the pump 31. Further, the drainage amount at this time is measured by a flow rate measuring means of a pump (not shown) and monitored by the control unit 100, and the drainage valve 43 is closed when the drainage amount reaches a predetermined amount.

  After performing the processing in the normal concentration range of the processing liquid in step S17, step S20, step S21, step S24, and step S25, the process returns to step S8 shown in FIG.

  In step S24, it is desirable that the drainage amount of the processing liquid and the replenishment amount of pure water are the same amount. In addition, it is desirable that the amount of drainage of the processing liquid and the amount of replenishment of the chemical liquid in step S25 be the same amount. Since the drained liquid amount and the supplied liquid amount are the same, the concentration correction can be performed without increasing the total amount of the processing liquid. In addition, since the replacement amount of the treatment liquid is large, the concentration of the treatment liquid can be corrected quickly. Furthermore, there is an advantage that the liquid level rise in the inner tub 2 and the outer tub 3 can be suppressed, and overflow from the inner tub 2 and the outer tub 3 can be prevented in advance.

  In step S18, when the concentration of the chemical component contained in the processing liquid is within the first concentration range or the second concentration range, an alarm is displayed on the alarm display means 104, and the substrate processing may be continued. desirable. When a substrate is processed in a new process, since the chemical life cannot be determined in advance, the chemical life is often derived from actual results obtained by processing a plurality of lots. For this reason, there is a problem that a concentration abnormality suddenly occurs during the substrate processing and the substrate processing is stopped. However, according to the present invention, since the alarm is displayed in a state where the concentration of the processing liquid is normal, the apparatus is not stopped due to a sudden concentration abnormality. Therefore, it is possible to alert the operator of the substrate processing apparatus that the processing life of the processing liquid is approaching, and it is possible to prevent substrate processing defects.

DESCRIPTION OF SYMBOLS 1 Treatment tank 2 Inner tank 3 Outer tank 5 Liquid supply means 6 Liquid replenishment means 8 Process liquid circulation means 10 Chemical liquid supply source 11 Pure water supply source 14 Chemical liquid supply valve 15 Pure water supply valve 18 Chemical liquid replenishment valve 19 Pure water replenishment valve 22 Chemical liquid replenishment flow meter 23 Pure water replenishment flow meter 31 Pump 32 Temperature control means 36 Filter 37 Concentration meter 40 Outer tank drain valve 41 Inner tank drain valve 42 Circulation switching valve 43 Drain valve 50 Chemical liquid supply pipe 51 Chemical liquid supplement pipe 52 Pure water supply piping 53 Pure water replenishment piping 54 Circulation piping 55 Inner tank drain piping 100 Control unit 101 Calculation unit 102 Concentration range memory 103 Current concentration memory 104 Alarm display means

Claims (3)

A substrate processing method for processing a substrate with a processing liquid,
A concentration measuring unit measures the concentration of a predetermined component contained in a processing solution generated by mixing a plurality of solutions, and whether the measured concentration is within a normal concentration range that allows substrate processing. Judgment
The normal concentration range is divided into a target concentration range that does not require correction of the concentration of the processing liquid, and a first concentration range and a second concentration range that require correction of the concentration of the processing liquid,
When the concentration of the predetermined component contained in the processing liquid obtained by the concentration measuring means is within the target concentration range, it is allowed to perform predetermined processing on the substrate using the processing liquid of this concentration,
When the concentration of the predetermined component contained in the processing liquid obtained by the concentration measuring means is within the first concentration range, a predetermined amount of the predetermined liquid constituting the processing liquid is supplied to the processing tank. To correct the concentration of the processing solution,
When the concentration of the predetermined component contained in the processing liquid obtained by the concentration measuring means is within the second concentration range, after draining the processing liquid stored in the processing tank by a predetermined amount, Correcting the concentration of the processing liquid by supplying a predetermined amount of the predetermined liquid constituting the processing liquid to the processing tank,
A substrate processing method characterized in that when the concentration of a predetermined component contained in the processing liquid obtained by the concentration measuring means is not within the normal concentration range, the entire amount of the processing liquid in the processing tank is replaced.   In the second concentration range, the liquid constituting the processing liquid is set so that the predetermined drainage amount of the processing liquid to be drained and the predetermined supply amount of the predetermined liquid to be supplied are the same amount. The substrate processing method according to claim 1, wherein the substrate processing method is supplied to a processing tank.   The alarm is issued and the substrate processing is continued when the concentration obtained by the concentration measuring means is in the first concentration range and the second concentration range. 2. Substrate processing method.

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