JP2012067059A - Method for producing mono(meth)acrylates of divalent phenols - Google Patents
Method for producing mono(meth)acrylates of divalent phenols Download PDFInfo
- Publication number
- JP2012067059A JP2012067059A JP2010215570A JP2010215570A JP2012067059A JP 2012067059 A JP2012067059 A JP 2012067059A JP 2010215570 A JP2010215570 A JP 2010215570A JP 2010215570 A JP2010215570 A JP 2010215570A JP 2012067059 A JP2012067059 A JP 2012067059A
- Authority
- JP
- Japan
- Prior art keywords
- meth
- acrylate
- dihydric phenol
- mono
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 26
- 150000001252 acrylic acid derivatives Chemical class 0.000 title claims abstract description 6
- 150000002989 phenols Chemical class 0.000 title abstract description 32
- 238000006243 chemical reaction Methods 0.000 claims abstract description 55
- 238000005886 esterification reaction Methods 0.000 claims abstract description 32
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims abstract description 29
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000003456 ion exchange resin Substances 0.000 claims abstract description 24
- 229920003303 ion-exchange polymer Polymers 0.000 claims abstract description 24
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- 230000002378 acidificating effect Effects 0.000 claims abstract description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 93
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 72
- 239000002904 solvent Substances 0.000 claims description 51
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 50
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 24
- 230000002209 hydrophobic effect Effects 0.000 claims description 19
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 claims description 9
- 238000006460 hydrolysis reaction Methods 0.000 claims description 3
- -1 2-ethyl resorcin Chemical compound 0.000 description 33
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 27
- 239000013078 crystal Substances 0.000 description 22
- 229960001755 resorcinol Drugs 0.000 description 20
- 239000000203 mixture Substances 0.000 description 19
- 238000005406 washing Methods 0.000 description 19
- 229920000642 polymer Polymers 0.000 description 16
- OTTZHAVKAVGASB-UHFFFAOYSA-N hept-2-ene Chemical compound CCCCC=CC OTTZHAVKAVGASB-UHFFFAOYSA-N 0.000 description 12
- 238000006116 polymerization reaction Methods 0.000 description 12
- HZBSQYSUONRRMW-UHFFFAOYSA-N (2-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1O HZBSQYSUONRRMW-UHFFFAOYSA-N 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 11
- 238000003756 stirring Methods 0.000 description 9
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 8
- PJMXUSNWBKGQEZ-UHFFFAOYSA-N (4-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(O)C=C1 PJMXUSNWBKGQEZ-UHFFFAOYSA-N 0.000 description 7
- 239000006227 byproduct Substances 0.000 description 7
- 238000004821 distillation Methods 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 6
- 125000000962 organic group Chemical group 0.000 description 6
- ARJOQCYCJMAIFR-UHFFFAOYSA-N prop-2-enoyl prop-2-enoate Chemical compound C=CC(=O)OC(=O)C=C ARJOQCYCJMAIFR-UHFFFAOYSA-N 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 238000010992 reflux Methods 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 6
- 230000032050 esterification Effects 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 238000004040 coloring Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- PYEUVNUNSJUYRP-UHFFFAOYSA-N [2-(2-methylprop-2-enoyloxy)phenyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1OC(=O)C(C)=C PYEUVNUNSJUYRP-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000001879 gelation Methods 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 2
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- CBKJLMZJKHOGEQ-UHFFFAOYSA-N 2-(oxiran-2-yl)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCC1CO1 CBKJLMZJKHOGEQ-UHFFFAOYSA-N 0.000 description 2
- VJIDDJAKLVOBSE-UHFFFAOYSA-N 2-ethylbenzene-1,4-diol Chemical compound CCC1=CC(O)=CC=C1O VJIDDJAKLVOBSE-UHFFFAOYSA-N 0.000 description 2
- LAQYHRQFABOIFD-UHFFFAOYSA-N 2-methoxyhydroquinone Chemical compound COC1=CC(O)=CC=C1O LAQYHRQFABOIFD-UHFFFAOYSA-N 0.000 description 2
- QOXOZONBQWIKDA-UHFFFAOYSA-N 3-hydroxypropyl Chemical group [CH2]CCO QOXOZONBQWIKDA-UHFFFAOYSA-N 0.000 description 2
- PGSWEKYNAOWQDF-UHFFFAOYSA-N 3-methylcatechol Chemical compound CC1=CC=CC(O)=C1O PGSWEKYNAOWQDF-UHFFFAOYSA-N 0.000 description 2
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 2
- HFLGBNBLMBSXEM-UHFFFAOYSA-N 4-Ethyl-1,2-benzenediol Chemical compound CCC1=CC=C(O)C(O)=C1 HFLGBNBLMBSXEM-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229920001429 chelating resin Polymers 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- MIHINWMALJZIBX-UHFFFAOYSA-N cyclohexa-2,4-dien-1-ol Chemical compound OC1CC=CC=C1 MIHINWMALJZIBX-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- IIEWJVIFRVWJOD-UHFFFAOYSA-N ethylcyclohexane Chemical compound CCC1CCCCC1 IIEWJVIFRVWJOD-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- OIPPWFOQEKKFEE-UHFFFAOYSA-N orcinol Chemical compound CC1=CC(O)=CC(O)=C1 OIPPWFOQEKKFEE-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- IUSXXDHQFMPZQX-UHFFFAOYSA-N (2-hydroxyphenyl) prop-2-enoate Chemical compound OC1=CC=CC=C1OC(=O)C=C IUSXXDHQFMPZQX-UHFFFAOYSA-N 0.000 description 1
- WNHHRXSVKWWRJY-UHFFFAOYSA-N (5-methyl-5-bicyclo[2.2.1]hept-2-enyl)methanol Chemical compound C1C2C(C)(CO)CC1C=C2 WNHHRXSVKWWRJY-UHFFFAOYSA-N 0.000 description 1
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 description 1
- PECUPOXPPBBFLU-UHFFFAOYSA-N 1-ethenyl-3-methoxybenzene Chemical compound COC1=CC=CC(C=C)=C1 PECUPOXPPBBFLU-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- CZYVCAJKUNEWLC-UHFFFAOYSA-N 2-(5-bicyclo[2.2.1]hept-2-enyl)ethanol Chemical compound C1C2C(CCO)CC1C=C2 CZYVCAJKUNEWLC-UHFFFAOYSA-N 0.000 description 1
- JJRUAPNVLBABCN-UHFFFAOYSA-N 2-(ethenoxymethyl)oxirane Chemical compound C=COCC1CO1 JJRUAPNVLBABCN-UHFFFAOYSA-N 0.000 description 1
- PTBAHIRKWPUZAM-UHFFFAOYSA-N 2-(oxiran-2-yl)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1CO1 PTBAHIRKWPUZAM-UHFFFAOYSA-N 0.000 description 1
- VJRVYLRYHDIJAX-UHFFFAOYSA-N 2-(prop-1-en-2-yloxymethyl)oxirane Chemical compound CC(=C)OCC1CO1 VJRVYLRYHDIJAX-UHFFFAOYSA-N 0.000 description 1
- HIGSPBFIOSHWQG-UHFFFAOYSA-N 2-Isopropyl-1,4-benzenediol Chemical compound CC(C)C1=CC(O)=CC=C1O HIGSPBFIOSHWQG-UHFFFAOYSA-N 0.000 description 1
- JFWFAUHHNYTWOO-UHFFFAOYSA-N 2-[(2-ethenylphenyl)methoxymethyl]oxirane Chemical compound C=CC1=CC=CC=C1COCC1OC1 JFWFAUHHNYTWOO-UHFFFAOYSA-N 0.000 description 1
- ZADXFVHUPXKZBJ-UHFFFAOYSA-N 2-[(4-ethenylphenyl)methoxymethyl]oxirane Chemical compound C1=CC(C=C)=CC=C1COCC1OC1 ZADXFVHUPXKZBJ-UHFFFAOYSA-N 0.000 description 1
- CWMLFHKGLMSMPE-UHFFFAOYSA-N 2-[2-(3-ethenylphenyl)-1-[2-(3-ethenylphenyl)-1-(oxiran-2-yl)ethoxy]ethyl]oxirane Chemical compound C=CC1=CC=CC(CC(OC(CC=2C=C(C=C)C=CC=2)C2OC2)C2OC2)=C1 CWMLFHKGLMSMPE-UHFFFAOYSA-N 0.000 description 1
- FVUAMBRGAQSGFR-UHFFFAOYSA-N 2-butan-2-ylbenzene-1,4-diol Chemical compound CCC(C)C1=CC(O)=CC=C1O FVUAMBRGAQSGFR-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- XRCRJFOGPCJKPF-UHFFFAOYSA-N 2-butylbenzene-1,4-diol Chemical compound CCCCC1=CC(O)=CC=C1O XRCRJFOGPCJKPF-UHFFFAOYSA-N 0.000 description 1
- XUDBVJCTLZTSDC-UHFFFAOYSA-N 2-ethenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=C XUDBVJCTLZTSDC-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- JGIHBNAOWIOPJC-UHFFFAOYSA-N 2-ethylbicyclo[2.2.1]hept-5-ene-3-carboxylic acid Chemical compound C1C2C=CC1C(CC)C2C(O)=O JGIHBNAOWIOPJC-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- ZTMADXFOCUXMJE-UHFFFAOYSA-N 2-methylbenzene-1,3-diol Chemical compound CC1=C(O)C=CC=C1O ZTMADXFOCUXMJE-UHFFFAOYSA-N 0.000 description 1
- SSVKYZDOIWXDIO-UHFFFAOYSA-N 2-methylbicyclo[2.2.1]hept-5-ene-3-carboxylic acid Chemical compound C1C2C=CC1C(C)C2C(O)=O SSVKYZDOIWXDIO-UHFFFAOYSA-N 0.000 description 1
- NJRNUAVVFBHIPT-UHFFFAOYSA-N 2-propylbenzene-1,4-diol Chemical compound CCCC1=CC(O)=CC=C1O NJRNUAVVFBHIPT-UHFFFAOYSA-N 0.000 description 1
- 229940044119 2-tert-butylhydroquinone Drugs 0.000 description 1
- GTYRFVGHYNRSKT-UHFFFAOYSA-N 3-benzylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(CC=2C=CC=CC=2)=C1 GTYRFVGHYNRSKT-UHFFFAOYSA-N 0.000 description 1
- BVTFYXCUXKHNRR-UHFFFAOYSA-N 3-butan-2-ylbenzene-1,2-diol Chemical compound CCC(C)C1=CC=CC(O)=C1O BVTFYXCUXKHNRR-UHFFFAOYSA-N 0.000 description 1
- UJTRCPVECIHPBG-UHFFFAOYSA-N 3-cyclohexylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C2CCCCC2)=C1 UJTRCPVECIHPBG-UHFFFAOYSA-N 0.000 description 1
- UUCQGNWZASKXNN-UHFFFAOYSA-N 3-ethylcatechol Chemical compound CCC1=CC=CC(O)=C1O UUCQGNWZASKXNN-UHFFFAOYSA-N 0.000 description 1
- VISOTGQYFFULBK-UHFFFAOYSA-N 3-hydroxy-4-phenylpyrrole-2,5-dione Chemical compound O=C1C(=O)NC(O)=C1C1=CC=CC=C1 VISOTGQYFFULBK-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
本発明は、着色、溶剤不溶解分が少なく、高純度の二価フェノール類モノ(メタ)アクリレートを得る方法であって、経済的に有利な製造方法に関する。 The present invention relates to a method for obtaining a highly pure dihydric phenol mono (meth) acrylate with little coloring and solvent insolubles, and an economically advantageous production method.
二価フェノール類モノ(メタ)アクリレートを製造する方法としては、二価フェノール類と(メタ)アクリル酸無水物又は(メタ)アクリル酸クロライドを反応させる方法が知られている(例えば、特許文献1を参照)。
また、高純度の二価フェノール類モノ(メタ)アクリレートを得る方法として、二価フェノール類と(メタ)アクリル酸無水物とを反応させて、二価フェノール類モノ(メタ)アクリレートと副生成物である二価フェノール類ジ(メタ)アクリレートとを含有する反応液を調製する工程、前記反応溶液中の未反応二価フェノール類を水洗浄により除去して粗結晶を調製する工程、前記粗結晶を溶媒で溶解させて溶解液を調製する工程、及び前記溶解液を貧溶媒と接触させることにより前記溶解液中の前記二価フェノール類ジ(メタ)アクリレートを除去する工程を含む、高純度の二価フェノール類モノ(メタ)アクリレートを得る方法が報告されている(特許文献2)。
さらに、二価フェノール類を、疎水性溶媒中強酸触媒存在下(メタ)アクリル酸と加熱還流させ、溜出水を除去し、除去水の量が二価フェノール類のモル数の40〜100%に達したとき終了する二価フェノール類モノ(メタ)アクリレートの製造方法が報告されている(特許文献3)。
As a method for producing a dihydric phenol mono (meth) acrylate, a method of reacting a dihydric phenol with (meth) acrylic anhydride or (meth) acrylic acid chloride is known (for example, Patent Document 1). See).
In addition, as a method of obtaining a high-purity dihydric phenol mono (meth) acrylate, a dihydric phenol and a (meth) acrylic anhydride are reacted to obtain a dihydric phenol mono (meth) acrylate and a by-product. A step of preparing a reaction solution containing di (meth) acrylates which are: a step of preparing crude crystals by removing unreacted dihydric phenols in the reaction solution by washing with water, the crude crystals A step of preparing a solution by dissolving the solvent with a solvent, and a step of removing the dihydric phenol di (meth) acrylate in the solution by contacting the solution with a poor solvent. A method for obtaining dihydric phenol mono (meth) acrylate has been reported (Patent Document 2).
Furthermore, dihydric phenols are heated to reflux with (meth) acrylic acid in the presence of a strong acid catalyst in a hydrophobic solvent, the distilled water is removed, and the amount of removed water is 40 to 100% of the number of moles of dihydric phenols. A method for producing a dihydric phenol mono (meth) acrylate, which is completed when it is reached, has been reported (Patent Document 3).
しかしながら、上記特許文献1の方法において(メタ)アクリル酸クロライドを使用する場合、反応容器を腐食する問題があり、また、ハロゲン化物を含有する廃液が大量に発生するので工業的に有利でないばかりか、ハロゲン化物を使用しているため、得られた二価フェノール類モノ(メタ)アクリレート組成物は電気、電子部品の用途にはふさわしくない。一方、上記特許文献1の方法において(メタ)アクリル酸無水物を使用する場合、上記のような問題は起こらないが、副生する二価フェノール類ジ(メタ)アクリレートを比較的多く含む純度の低い二価フェノール類モノ(メタ)アクリレート組成物しか得ることができない。この二価フェノール類ジ(メタ)アクリレートは、重合時には架橋成分となることから、重合物の溶剤溶解性を低下させたり、場合によっては重合時にゲル化を引き起こしたりするという問題がある。
However, when (meth) acrylic acid chloride is used in the method of
この問題は特許文献2の方法により解決されているが、高価な(メタ)アクリル酸無水物を使用するため、工業レベルでの生産を考えた時に、経済的に有利な方法とは云えない。経済的に有利な方法として、特許文献3の方法が報告されているが、この方法で得られる二価フェノール類モノ(メタ)アクリレートは特許文献2記載の方法で得られる物に比べて着色し、また溶剤不溶解分が発生する傾向にあり、純度の面で満足できるものではない。特に、合成した二価フェノール類モノ(メタ)アクリレートをポリマー化して、フォトレジスト等に使用する際には、溶剤不溶解分が発生することは致命的である。
This problem has been solved by the method of
従って、本発明は、(メタ)アクリル酸クロライドを使用せず、経済的でかつ着色、溶剤不溶解分が少ない高純度の二価フェノール類モノ(メタ)アクリレート提供することを目的とする。 Accordingly, an object of the present invention is to provide a high-purity dihydric phenol mono (meth) acrylate that does not use (meth) acrylic acid chloride, is economical, is colored, and has little solvent-insoluble content.
そこで、本発明者らは、鋭意研究、開発を遂行した結果、二価フェノール類および(メタ)アクリル酸を、強酸性イオン交換樹脂存在下に、エステル化反応させて二価フェノール類モノ(メタアクリレート)を製造するにあたり、反応系内の水分を加熱減圧により除去しながらエステル化反応させることにより、上記のような課題を解決できることを見出した。 Accordingly, as a result of diligent research and development, the present inventors have carried out an esterification reaction of dihydric phenols and (meth) acrylic acid in the presence of a strongly acidic ion exchange resin to produce a monohydric phenol (meta). In the production of (acrylate), it has been found that the above-mentioned problems can be solved by carrying out an esterification reaction while removing water in the reaction system by heating under reduced pressure.
本発明により、着色、溶剤不溶解分が少なく、高純度の二価フェノール類モノ(メタ)アクリレートが、経済的に有利に製造可能となる。これにより、(メタ)アクリル酸クロライドを使用する場合に発生する、反応容器を腐食する問題、ハロゲン化物を含有する廃液の処理の問題を解決できる。また、(メタ)アクリル酸無水物を使用した際に多く副生する、二価フェノール類ジ(メタ)アクリレートの発生を抑制できる。不純物としての二価フェノール類ジ(メタ)アクリレートは、重合物の溶剤溶解性の低下、場合によっては重合時にゲル化を引き起こす問題となる。また、本発明は、高価な(メタ)アクリル酸無水物を使用しなくとも二価フェノール類モノ(メタ)アクリレートを得ることができ、経済的にも有利な製造方法である。 According to the present invention, a highly pure dihydric phenol mono (meth) acrylate with little coloring and solvent insoluble components can be produced economically advantageously. Thereby, the problem of corroding the reaction vessel and the treatment of the waste liquid containing halide, which are generated when (meth) acrylic acid chloride is used, can be solved. Moreover, generation | occurrence | production of the dihydric phenol di (meth) acrylate which byproduces a lot when (meth) acrylic anhydride is used can be suppressed. The dihydric phenol di (meth) acrylate as an impurity causes a problem in that the solvent solubility of the polymer is lowered, and in some cases, gelation occurs during polymerization. In addition, the present invention is an economically advantageous production method that can obtain a dihydric phenol mono (meth) acrylate without using an expensive (meth) acrylic anhydride.
以下、本発明の実施の形態について詳細に説明する。
本発明による二価フェノール類モノ(メタ)アクリレートの製造方法は、二価フェノール類および(メタ)アクリル酸を、強酸性イオン交換樹脂存在下に、反応系内の水分を加熱減圧により除去しながらエステル化反応させることを特徴とする。
Hereinafter, embodiments of the present invention will be described in detail.
The method for producing a dihydric phenol mono (meth) acrylate according to the present invention is to remove dihydric phenols and (meth) acrylic acid in the presence of a strongly acidic ion exchange resin by heating and reducing pressure in the reaction system. Esterification reaction is performed.
本発明の方法において使用する「二価フェノール」は、1つのベンゼン環に2個のヒドロキシル基を有する化合物をいう。具体的にはドロキノン、レゾルシン、カテコールである。また、これらの化合物について、炭素数1〜4のアルキル基やアルコキシ基等の置換基を有していてもよい。具体的には、2−メチルヒドロキノン、2−エチルヒドロキノン、2−n−プロピルヒドロキノン、2−イソプロピルヒドロキノン、2−n−ブチルヒドロキノン、2−sec−ブチルヒドロキノン、2−tert−ブチルヒドロキノン、2−メチルレゾルシン、2−エチルレゾルシン、2−n−プロピルレゾルシン、2−イソプロピルレゾルシン、2−n−ブチルレゾルシン、2−sec−ブチルレゾルシン、2−tert−ブチルレゾルシン、4−メチルレゾルシン、4−エチルレゾルシン、4−n−プロピルレゾルシン、4−イソプロピルレゾルシン、4−n−ブチルレゾルシン、4−sec−ブチルレゾルシン、4−tert−ブチルレゾルシン、5−メチルレゾルシン、5−エチルレゾルシン、5−n−プロピルレゾルシン、5−イソプロピルレゾルシン、5−n−ブチルレゾルシン、5−sec−ブチルレゾルシン、5−tert−ブチルレゾルシン、3−メチルカテコール、3−エチルカテコール、3−n−プロピルカテコール、3−イソプロピルカテコール、3−n−ブチルカテコール、3−sec−ブチルカテコール、3−tert−ブチルカテコール、4−メチルカテコール、4−エチルカテコール、4−n−プロピルカテコール、4−イソプロピルカテコール、4−n−ブチルカテコール、4−tert−ブチルカテコール、メトキシカテコール、メトキシレゾルシン、メトキシハイドロキノン等が例示される。 The “dihydric phenol” used in the method of the present invention refers to a compound having two hydroxyl groups in one benzene ring. Specifically, droquinone, resorcin, and catechol. Moreover, about these compounds, you may have substituents, such as a C1-C4 alkyl group and an alkoxy group. Specifically, 2-methylhydroquinone, 2-ethylhydroquinone, 2-n-propylhydroquinone, 2-isopropylhydroquinone, 2-n-butylhydroquinone, 2-sec-butylhydroquinone, 2-tert-butylhydroquinone, 2- Methyl resorcin, 2-ethyl resorcin, 2-n-propyl resorcin, 2-isopropyl resorcin, 2-n-butyl resorcin, 2-sec-butyl resorcin, 2-tert-butyl resorcin, 4-methyl resorcin, 4-ethyl resorcin 4-n-propyl resorcin, 4-isopropyl resorcin, 4-n-butyl resorcin, 4-sec-butyl resorcin, 4-tert-butyl resorcin, 5-methyl resorcin, 5-ethyl resorcin, 5-n-propyl resorcin , 5- Sopropyl resorcin, 5-n-butyl resorcin, 5-sec-butyl resorcin, 5-tert-butyl resorcin, 3-methyl catechol, 3-ethyl catechol, 3-n-propyl catechol, 3-isopropyl catechol, 3-n -Butyl catechol, 3-sec-butyl catechol, 3-tert-butyl catechol, 4-methyl catechol, 4-ethyl catechol, 4-n-propyl catechol, 4-isopropyl catechol, 4-n-butyl catechol, 4-tert -Butyl catechol, methoxy catechol, methoxy resorcin, methoxy hydroquinone, etc. are illustrated.
本発明において用いられる(メタ)アクリル酸とは、アクリル酸またはメタクリル酸である。 (Meth) acrylic acid used in the present invention is acrylic acid or methacrylic acid.
本発明において、二価フェノール類と(メタ)アクリル酸とを反応させる際のモル比は、二価フェノール類1.0モルに対し、(メタ)アクリル酸が1.0〜10.0モル、好ましくは2.0〜5.5モルである。更に好ましくは3.0〜4.0モルである。二価フェノール類1.0モルに対し、(メタ)アクリル酸が1.0モル未満では、原料である二価フェノールの溶解性が乏しく、攪拌を均一に行う上で好ましくない。また、二価フェノール類の溶解性が乏しい状態で反応を行うと副生成物の二価フェノール類ジ(メタ)アクリレートの発生量が多くなる傾向があり、不純物を除去した後の収量が低下して好ましくない。逆に(メタ)アクリル酸が10.0モルを超える場合は、仕込み量に対する収量の割合が低下し、生産効率が良くない。これらの観点から3.0〜4.0モルで反応させることが最適である。 In this invention, the molar ratio at the time of making bihydric phenol and (meth) acrylic acid react is (meth) acrylic acid 1.0-10.0 mol with respect to 1.0 mol of dihydric phenols, Preferably it is 2.0-5.5 mol. More preferably, it is 3.0-4.0 mol. When the amount of (meth) acrylic acid is less than 1.0 mol with respect to 1.0 mol of the dihydric phenol, the solubility of the dihydric phenol as the raw material is poor, which is not preferable for uniform stirring. Also, if the reaction is carried out with poor solubility of dihydric phenols, the amount of by-product dihydric phenol di (meth) acrylate tends to increase, resulting in a decrease in yield after removing impurities. It is not preferable. On the contrary, when (meth) acrylic acid exceeds 10.0 mol, the ratio of the yield with respect to the preparation amount falls and production efficiency is not good. From these viewpoints, it is optimal to react at 3.0 to 4.0 moles.
反応の際には、ジオキサン、テトラヒドロフラン等の非プロトン極性有機溶媒を使用することができる。溶媒の使用量は二価フェノール類100質量部に対して0〜500質量部程度、原料の二価フェノール類の溶解性を向上する目的、又は反応温度の制御をし易くする目的で添加することが出来る。但し、トルエン、キシレン等の疎水性溶媒は使用しない方がよい。疎水性溶媒は、縮合水を除去する目的では有効であるが、二価フェノール類の溶解性を低下させ、その結果、副生成物の二価フェノール類ジ(メタ)アクリレートの発生を増加させる傾向がある。また、最終的に得られる二価フェノール類モノ(メタ)アクリレートに、溶剤不溶解分が発生する傾向がある。溶剤不溶解分は比較的分子量の大きい成分で、重合物である。 In the reaction, an aprotic polar organic solvent such as dioxane or tetrahydrofuran can be used. The amount of the solvent used is about 0 to 500 parts by mass with respect to 100 parts by mass of the dihydric phenols, and is added for the purpose of improving the solubility of the raw dihydric phenols or for easily controlling the reaction temperature. I can do it. However, it is better not to use hydrophobic solvents such as toluene and xylene. Hydrophobic solvents are effective for the purpose of removing condensed water, but tend to reduce the solubility of dihydric phenols and consequently increase the generation of by-product dihydric phenol di (meth) acrylates There is. Moreover, there exists a tendency for a solvent insoluble matter to generate | occur | produce in the dihydric phenol mono (meth) acrylate finally obtained. The solvent-insoluble component is a component having a relatively large molecular weight and is a polymer.
本発明において用いられる強酸性イオン交換樹脂は、例えばスルホン酸基を官能基としたスチレン・ジビニルベンゼン共重合体が挙げられる。具体的には三菱化学株式会社製ダイヤイオン、オルガノ株式会社製アンバーリストの各種触媒用グレードが使用できる。イオン交換樹脂の使用量は(メタ)アクリル酸100質量部に対して1〜20質量部が好ましい。イオン交換樹脂の使用量が1質量部未満では、反応の進行が遅く好ましくない。イオン交換樹脂は溶液中で膨潤するため、20質量部を超えると均一に混合することが困難となり好ましくない。また、経済的な面から3〜15質量部で反応を行うことが更に好ましい。イオン交換樹脂は反応後、濾別することにより除去するのが好ましい。反応は強酸性イオン交換樹脂存在下に、100〜120℃で1〜24時間程度で行うことができる。この際の反応温度の上限はイオン交換樹脂の耐熱温度に依るもので、イオン交換樹脂の耐熱温度がより高い場合は反応温度を上げることが出来る。 Examples of the strongly acidic ion exchange resin used in the present invention include a styrene / divinylbenzene copolymer having a sulfonic acid group as a functional group. Specifically, various catalyst grades such as Diaion manufactured by Mitsubishi Chemical Corporation and Amberlyst manufactured by Organo Corporation can be used. As for the usage-amount of an ion exchange resin, 1-20 mass parts is preferable with respect to 100 mass parts of (meth) acrylic acid. When the amount of ion exchange resin used is less than 1 part by mass, the progress of the reaction is slow, which is not preferable. Since the ion exchange resin swells in the solution, when it exceeds 20 parts by mass, it is difficult to mix uniformly, which is not preferable. Moreover, it is further more preferable to react at 3-15 mass parts from an economical surface. The ion exchange resin is preferably removed by filtration after the reaction. The reaction can be carried out in the presence of a strongly acidic ion exchange resin at 100 to 120 ° C. for about 1 to 24 hours. The upper limit of the reaction temperature at this time depends on the heat resistance temperature of the ion exchange resin, and the reaction temperature can be increased when the heat resistance temperature of the ion exchange resin is higher.
一般的なエステル化反応で使用される硫酸、p−トルエンスルホン酸などの酸触媒を使用した場合にもエステル化反応は進行するが、二価フェノール類と(メタ)アクリル酸とのエステル化の場合、トルエン等の疎水性溶媒中で加熱還流させ、溜出水を除去しながら反応を進行させる一般的な方法では、溶剤不溶解分が発生する問題がある。また、沸点以下、無溶媒で反応すると溶剤不溶解分の問題は解決されるものの、得られた二価フェノール類モノ(メタ)アクリレートは着色する。 Even when an acid catalyst such as sulfuric acid or p-toluenesulfonic acid used in general esterification reaction is used, the esterification reaction proceeds. However, esterification of dihydric phenols with (meth) acrylic acid is not possible. In such a case, a general method of heating and refluxing in a hydrophobic solvent such as toluene and advancing the reaction while removing distilled water has a problem that a solvent-insoluble component is generated. In addition, when the reaction is carried out in the absence of a solvent below the boiling point, the problem of insoluble solvent is solved, but the obtained dihydric phenol mono (meth) acrylate is colored.
二価フェノール類と(メタ)アクリル酸とを強酸性イオン交換樹脂存在下でエステル化反応を行うと縮合水が発生し、エステル化反応と加水分解反応で平衡状態となる。エステル化反応を優先させる、すなわち二価フェノール類モノ(メタ)アクリレートの収率を向上させるためには、反応で発生した縮合水を除去する必要がある。そのためには、反応系内を減圧して縮合水を除去する必要がある。また、トルエン等の疎水性溶媒を用いて、縮合水と共に共沸させて縮合水を系外に除去する方法が一般的に知られているが、上述の通り溶剤不溶解分が発生する問題に加えて、副生成物の二価フェノール類ジ(メタ)アクリレートの発生を増加させる傾向があるため、加熱減圧して縮合水を除去する方法が好ましい。反応系内の水分は、エステル化の反応率により異なるが、例えばエステル化が30%進行している場合、1.3質量%を超えると加水分解が優先する。反応系内の水分は0.5質量%以下に保つことが好ましい。なおこの場合の水分の濃度は、測定時の反応系内に存在する物質の総質量に対する濃度であり、反応に溶媒を用いた場合はその溶媒の質量は考慮しない。 When an esterification reaction is performed between dihydric phenols and (meth) acrylic acid in the presence of a strongly acidic ion exchange resin, condensed water is generated, and the esterification reaction and the hydrolysis reaction reach an equilibrium state. In order to prioritize the esterification reaction, that is, to improve the yield of the dihydric phenol mono (meth) acrylate, it is necessary to remove the condensed water generated in the reaction. For that purpose, it is necessary to remove the condensed water by reducing the pressure in the reaction system. In addition, a method is generally known in which a condensed solvent is removed from the system by azeotroping with condensed water using a hydrophobic solvent such as toluene. In addition, since there is a tendency to increase the generation of by-product dihydric phenol di (meth) acrylate, a method of removing condensed water by heating under reduced pressure is preferable. The moisture in the reaction system varies depending on the reaction rate of esterification. For example, when esterification proceeds 30%, hydrolysis is preferential when it exceeds 1.3% by mass. It is preferable to keep the water in the reaction system at 0.5% by mass or less. The concentration of water in this case is the concentration with respect to the total mass of substances present in the reaction system at the time of measurement, and when a solvent is used for the reaction, the mass of the solvent is not considered.
加熱減圧による縮合水の除去を開始する時期は特に限定はしないが、エステル化反応の開始と共に加熱減圧蒸留を行うと、溜出液の主成分は原料の(メタ)アクリル酸であり経済的ではない。その点で、エステル化が最初の平衡に達した後に開始するのが好ましい。 The timing for starting the removal of condensed water by heating under reduced pressure is not particularly limited. However, when distillation under heating under reduced pressure is performed at the same time as the esterification reaction is started, the main component of the distillate is (meth) acrylic acid as a raw material. Absent. In that respect, it is preferred to start after the esterification has reached the initial equilibrium.
エステル化反応の初期段階は未反応の二価フェノール類が大量に存在し、エステル化反応を継続して進行させると、副生成物として二価フェノール類ジ(メタ)アクリレートの発生量が増加する。未反応の二価フェノール類、及び副生成物の二価フェノール類ジ(メタ)アクリレートは最終的には精製により除去することが必要である。この観点から、仕込みの二価フェノール類に対する、二価フェノール類モノ(メタ)アクリレートの生成率が40〜70モル%になった時点で反応を終えることが好ましい。 In the initial stage of the esterification reaction, a large amount of unreacted dihydric phenols are present. If the esterification reaction is continued, the amount of di (meth) acrylate generated as a by-product increases. . Unreacted dihydric phenols and by-product dihydric phenols di (meth) acrylate must be finally removed by purification. From this viewpoint, it is preferable to finish the reaction when the production rate of the dihydric phenol mono (meth) acrylate with respect to the charged dihydric phenol is 40 to 70 mol%.
エステル化の反応中は重合を防止する目的で、空気を吹き込む、重合禁止剤を適宜使用することが出来る。 During the esterification reaction, a polymerization inhibitor that blows air can be used as appropriate for the purpose of preventing polymerization.
エステル化反応を終了した後は、イオン交換樹脂を濾別により除去することが好ましい。イオン交換樹脂を除去した反応溶液には、未反応の二価フェノール類、二価フェノール類モノ(メタ)アクリレート、及び副生成物である二価フェノール類ジ(メタ)アクリレートが含まれている。この反応溶液を水洗浄することで、未反応の二価フェノール類の含有量を低減させることができる。充分に水洗浄を行って未反応二価フェノール類を除去すると、水中では粗結晶が析出する。ここで、未反応二価フェノール類、二価フェノール類モノ(メタ)アクリレート及び二価フェノール類ジ(メタ)アクリレートの合計100モル%に対し、未反応の二価フェノール類が1.0モル%以下になるまで水洗浄を繰り返すことが好ましい。未反応二価フェノール類が1.0モル%を越えて残存した場合、最終的に得られる二価フェノール類モノ(メタ)アクリレートの純度が低下し、これを原料として重合を行う際に、二価フェノール類は重合禁止剤として作用することから好ましくない。 After completion of the esterification reaction, the ion exchange resin is preferably removed by filtration. The reaction solution from which the ion exchange resin has been removed contains unreacted dihydric phenols, dihydric phenols mono (meth) acrylate, and dihydric phenols di (meth) acrylate as a by-product. By washing this reaction solution with water, the content of unreacted dihydric phenols can be reduced. When the unreacted dihydric phenols are removed by sufficiently washing with water, crude crystals are precipitated in water. Here, unreacted dihydric phenols are 1.0 mol% with respect to a total of 100 mol% of unreacted dihydric phenols, dihydric phenols mono (meth) acrylate and dihydric phenols di (meth) acrylate. It is preferable to repeat the water washing until it becomes the following. When the unreacted dihydric phenol exceeds 1.0 mol%, the purity of the finally obtained dihydric phenol mono (meth) acrylate is lowered. Monohydric phenols are not preferred because they act as polymerization inhibitors.
また、反応溶液を疎水性溶剤で洗浄することで二価フェノール類ジ(メタ)アクリレートを除去することができる。洗浄に用いる疎水性溶剤としては、具体的には、ヘキサン、シクロヘキサン、メチルシクロヘキサン、エチルシクロヘキサン、ヘプタン等が挙げられ、これらの少なくとも1種を使用することができる。ここでの疎水性溶剤は、二価フェノール類ジ(メタ)アクリレートに対しては溶媒であり、二価フェノール類モノ(メタ)アクリレートに対する貧溶媒となる。従って、疎水性溶剤を加えることで二価フェノール類モノ(メタ)アクリレートが粗結晶として析出して、これを採取する。また、未反応二価フェノール類、二価フェノール類モノ(メタ)アクリレート及び二価フェノール類ジ(メタ)アクリレートの合計100モル%に対し、二価フェノール類ジ(メタ)アクリレートを1.0モル%以下になるまで疎水性溶剤で洗浄を繰り返すことが好ましい。二価フェノール類ジ(メタ)アクリレートが1.0モル%を越えて残存した場合、最終的に得られる二価フェノール類モノ(メタ)アクリレートの純度が低下し、これを原料として重合を行うと二価フェノール類ジ(メタ)アクリレートが架橋成分であるため、ポリマーの分子量が異常に大きくなったり、場合によってはゲル化を起こしたり、溶剤溶解性が悪くなる恐れがあるため好ましくない。 In addition, the dihydric phenol di (meth) acrylate can be removed by washing the reaction solution with a hydrophobic solvent. Specific examples of the hydrophobic solvent used for washing include hexane, cyclohexane, methylcyclohexane, ethylcyclohexane, heptane, and the like, and at least one of them can be used. The hydrophobic solvent here is a solvent for the dihydric phenol di (meth) acrylate and a poor solvent for the dihydric phenol mono (meth) acrylate. Therefore, by adding a hydrophobic solvent, the dihydric phenol mono (meth) acrylate is precipitated as crude crystals and collected. Moreover, 1.0 mol of dihydric phenol di (meth) acrylate is added to 100 mol% of the total of unreacted dihydric phenol, dihydric phenol mono (meth) acrylate and dihydric phenol di (meth) acrylate. It is preferable to repeat the washing with a hydrophobic solvent until it becomes less than or equal to%. When the dihydric phenol di (meth) acrylate remains in excess of 1.0 mol%, the purity of the finally obtained dihydric phenol mono (meth) acrylate decreases, and this is used as a raw material for polymerization. Since the dihydric phenol di (meth) acrylate is a cross-linking component, the molecular weight of the polymer may be abnormally increased, or in some cases, gelation may occur, or solvent solubility may be deteriorated.
洗浄の順番は水洗浄、疎水性溶剤での洗浄のどちらを先に行ってもよいが、反応を終了した時の組成により最適な方法を選択できる。水洗浄を先に行った場合は、水洗浄終了後に、水中に析出した粗結晶を溶媒で溶解させることが好ましい。溶解に用いる溶媒としては、トルエン、キシレン又はこれらの混合物が挙げられる。これらは原料の二価フェノール類に対しては貧溶媒であるが、水洗浄終了後の粗結晶に対しては溶媒となる。このような溶媒を使用することで、最終的に得られる二価フェノール類モノ(メタ)アクリレート組成物の収率が向上する。粗結晶を溶媒で溶解させる際は、粗結晶100質量部に対して、好ましくは溶媒50〜300質量部、更に好ましくは100〜200質量部を使用して、必要により加熱して溶解させるのがよい。その際、粗結晶に含まれる水は、粗結晶を含む溶媒層と分離除去しておくことが好ましい。その後、溶媒層を前記疎水性溶剤で洗浄する。具体的な方法としては、粗結晶が溶解された溶媒層を前記疎水性溶剤中へ投入する方法、又は粗結晶が溶解された溶媒層に前記疎水性溶剤を添加する方法が挙げられる。このように、溶媒により粗結晶を溶解させ、この粗結晶が溶解した溶媒に疎水性溶剤を接触させることで二価フェノール類モノ(メタ)アクリレートの結晶を析出させる。この方法により、最終的に得られる二価フェノール類モノ(メタ)アクリレートの純度が向上する。
また、疎水性溶剤での洗浄を先に行った場合は、反応溶液と疎水性溶剤を接触させて、二価フェノール類モノ(メタ)アクリレートおよび未反応の二価フェノール類を含む粗結晶を生成させて、この粗結晶を水で洗浄することで、二価フェノール類モノ(メタ)アクリレートの結晶を得る。
Either washing with water or washing with a hydrophobic solvent may be performed first as the washing order, but an optimum method can be selected depending on the composition when the reaction is completed. When the water washing is performed first, it is preferable to dissolve the crude crystals precipitated in water with a solvent after the water washing is completed. Examples of the solvent used for dissolution include toluene, xylene, or a mixture thereof. These are poor solvents for the raw material dihydric phenols, but they are solvents for the crude crystals after the completion of water washing. By using such a solvent, the yield of the finally obtained dihydric phenol mono (meth) acrylate composition is improved. When dissolving the crude crystal with a solvent, it is preferable to use 50 to 300 parts by mass, more preferably 100 to 200 parts by mass of the solvent with respect to 100 parts by mass of the crude crystal, and dissolve by heating if necessary. Good. At that time, the water contained in the crude crystals is preferably separated and removed from the solvent layer containing the crude crystals. Thereafter, the solvent layer is washed with the hydrophobic solvent. As a specific method, a method in which the solvent layer in which the crude crystals are dissolved is put into the hydrophobic solvent, or a method in which the hydrophobic solvent is added to the solvent layer in which the crude crystals are dissolved. Thus, the crystal | crystallization of a bihydric phenol mono (meth) acrylate is precipitated by dissolving a crude crystal with a solvent and making a hydrophobic solvent contact the solvent in which this crude crystal dissolved. By this method, the purity of the finally obtained dihydric phenol mono (meth) acrylate is improved.
In addition, when washing with a hydrophobic solvent is performed first, the reaction solution and the hydrophobic solvent are brought into contact with each other to produce a crude crystal containing a dihydric phenol mono (meth) acrylate and an unreacted dihydric phenol. The crude crystals are washed with water to obtain dihydric phenol mono (meth) acrylate crystals.
水洗浄、及び疎水性溶剤による洗浄を終了した後、脱液、乾燥させることで、着色、溶剤不溶解分が少なく、高純度の二価フェノール類モノ(メタ)アクリレートが得られる。 After washing with water and washing with a hydrophobic solvent, liquid removal and drying are performed to obtain a high-purity dihydric phenol mono (meth) acrylate with little coloring and solvent insoluble matter.
本発明の製造方法で得られた二価フェノール類モノ(メタ)アクリレートは、常温では固体であり、熱や光に対して比較的安定であるにも係わらず、重合性は一般的な(メタ)アクリル酸エステルと同等であるという特長を有する。 Although the dihydric phenol mono (meth) acrylate obtained by the production method of the present invention is solid at room temperature and is relatively stable to heat and light, the polymerization property is general (meta). ) Equivalent to acrylic ester.
本発明の製造方法で得られた二価フェノール類モノ(メタ)アクリレートを使用してポリマーを合成すると、溶剤溶解性、アルカリ溶解性、透明性、耐熱変色性等に優れ、高Tg、高熱分解温度、高屈折率のポリマーが得られる。従って、半導体製造用、ディスプレイ部材、印刷製版材料等に使用するアルカリ現像型のフォトレジスト、透明性及び耐熱変色性が要求される保護膜等に応用することができる。また、エポキシ樹脂等の硬化剤としても有用である。 When a polymer is synthesized using the dihydric phenol mono (meth) acrylate obtained by the production method of the present invention, it has excellent solvent solubility, alkali solubility, transparency, heat discoloration, etc., high Tg, and high thermal decomposition. A polymer with a high refractive index is obtained. Therefore, it can be applied to alkali developing type photoresists used for semiconductor manufacturing, display members, printing plate making materials, and the like, and protective films requiring transparency and heat discoloration. It is also useful as a curing agent such as an epoxy resin.
また、本発明の製造方法で得られた二価フェノール類モノ(メタ)アクリレートは、単独重合体だけでなく、その他の不飽和基含有重合性化合物との共重合性も良好である。このような不飽和基含有重合性化合物の具体例としては、例えば、アクリル酸、メタクリル酸、クロトン酸、マレイン酸、フマル酸、シトラコン酸、メサコン酸、イタコン酸、無水マレイン酸、無水フマル酸、無水シトラコン酸、無水メサコン酸、無水イタコン酸、ビニル安息香酸、o−カルボキシフェニル(メタ)アクリレート、m−カルボキシフェニル(メタ)アクリレート、p−カルボキシフェニル(メタ)アクリレート、o−カルボキシフェニル(メタ)アクリルアミド、m−カルボキシフェニル(メタ)アクリルアミド、p−カルボキシフェニル(メタ)アクリルアミド、コハク酸モノ〔2−(メタ)アクリロイロキシエチル〕、フタル酸モノ〔2−(メタ)アクリロイロキシエチル〕、ω−カルボキシポリカプロラクトンモノ(メタ)アクリレート、5−カルボキシビシクロ[2.2.1]ヘプト−2−エン、5,6−ジカルボキシビシクロ[2.2.1]ヘプト−2−エン、5−カルボキシ−5−メチルビシクロ[2.2.1]ヘプト−2−エン、5−カルボキシ−5−エチルビシクロ[2.2.1]ヘプト−2−エン、5−カルボキシ−6−メチルビシクロ[2.2.1]ヘプト−2−エン、5−カルボキシ−6−エチルビシクロ[2.2.1]ヘプト−2−エン、5,6−ジカルボキシビシクロ[2.2.1]ヘプト−2−エン無水物、トリシクロ[5.2.1.02,6]デカン−8−イル(メタ)アクリレート、トリシクロ[5.2.1.02,6]デカン−8−イルオキシエチル(メタ)アクリレート、 In addition, the dihydric phenol mono (meth) acrylate obtained by the production method of the present invention has good copolymerizability with not only a homopolymer but also other unsaturated group-containing polymerizable compound. Specific examples of such unsaturated group-containing polymerizable compounds include, for example, acrylic acid, methacrylic acid, crotonic acid, maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, maleic anhydride, fumaric anhydride, Citraconic anhydride, mesaconic anhydride, itaconic anhydride, vinyl benzoic acid, o-carboxyphenyl (meth) acrylate, m-carboxyphenyl (meth) acrylate, p-carboxyphenyl (meth) acrylate, o-carboxyphenyl (meth) Acrylamide, m-carboxyphenyl (meth) acrylamide, p-carboxyphenyl (meth) acrylamide, succinic acid mono [2- (meth) acryloyloxyethyl], phthalic acid mono [2- (meth) acryloyloxyethyl], ω-carboxypolycaprolactone mono ( ) Acrylate, 5-carboxybicyclo [2.2.1] hept-2-ene, 5,6-dicarboxybicyclo [2.2.1] hept-2-ene, 5-carboxy-5-methylbicyclo [ 2.2.1] Hept-2-ene, 5-carboxy-5-ethylbicyclo [2.2.1] hept-2-ene, 5-carboxy-6-methylbicyclo [2.2.1] hept- 2-ene, 5-carboxy-6-ethylbicyclo [2.2.1] hept-2-ene, 5,6-dicarboxybicyclo [2.2.1] hept-2-ene anhydride, tricyclo [5 .2.1.02,6] decan-8-yl (meth) acrylate, tricyclo [5.2.1.02,6] decan-8-yloxyethyl (meth) acrylate,
メチル(メタ)アクリレート、エチル(メタ)アクリレート、n−ブチル(メタ)アクリレート、sec−ブチル(メタ)アクリレート、t−ブチル(メタ)アクリレート、2−エチルヘキシル(メタ)アクリレート、イソデシル(メタ)アクリレート、n−ラウリル(メタ)アクリレート、トリデシル(メタ)アクリレート、n−ステアリル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、2−メチルシクロヘキシル(メタ)アクリレート、イソボルニル(メタ)アクリレート、ヒドロキシメチル(メタ)アクリレート、2−ヒドロキシエチル(メタ)アクリレート、3−ヒドロキシプロピル(メタ)アクリレート、4−ヒドロキシブチル(メタ)アクリレート、ジエチレングリコールモノ(メタ)アクリレート、2,3−ジヒドロキシプロピル(メタ)アクリレート、2−(メタ)アクリロイロキシエチルグリコサイド、 Methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, sec-butyl (meth) acrylate, t-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, isodecyl (meth) acrylate, n-lauryl (meth) acrylate, tridecyl (meth) acrylate, n-stearyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-methylcyclohexyl (meth) acrylate, isobornyl (meth) acrylate, hydroxymethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, diethylene glycol mono (meth) acrylate, 2,3- Hydroxypropyl (meth) acrylate, 2- (meth) acryloyloxyethyl glycoside,
フェニル(メタ)アクリレート、ベンジル(メタ)アクリレート、o−メトキシフェニル(メタ)アクリレート、m−メトキシフェニル(メタ)アクリレート、p−メトキシフェニル(メタ)アクリレート、 Phenyl (meth) acrylate, benzyl (meth) acrylate, o-methoxyphenyl (meth) acrylate, m-methoxyphenyl (meth) acrylate, p-methoxyphenyl (meth) acrylate,
マレイン酸ジエチル、フマル酸ジエチル、イタコン酸ジエチル、ビシクロ[2.2.1]ヘプト−2−エン、5−メチルビシクロ[2.2.1]ヘプト−2−エン、5−エチルビシクロ[2.2.1]ヘプト−2−エン、5−メトキシビシクロ[2.2.1]ヘプト−2−エン、5−エトキシビシクロ[2.2.1]ヘプト−2−エン、5,6−ジメトキシビシクロ[2.2.1]ヘプト−2−エン、5,6−ジエトキシビシクロ[2.2.1]ヘプト−2−エン、5−t−ブトキシカルボニルビシクロ[2.2.1]ヘプト−2−エン、5−シクロヘキシルオキシカルボニルビシクロ[2.2.1]ヘプト−2−エン、5−フェノキシカルボニルビシクロ[2.2.1]ヘプト−2−エン、5,6−ジ(t−ブトキシカルボニル)ビシクロ[2.2.1]ヘプト−2−エン、5,6−ジ(シクロヘキシルオキシカルボニル)ビシクロ[2.2.1]ヘプト−2−エン、5−(2’−ヒドロキシエチル)ビシクロ[2.2.1]ヘプト−2−エン、5,6−ジヒドロキシビシクロ[2.2.1]ヘプト−2−エン、5,6−ジ(ヒドロキシメチル)ビシクロ[2.2.1]ヘプト−2−エン、5,6−ジ(2’−ヒドロキシエチル)ビシクロ[2.2.1]ヘプト−2−エン、5−ヒドロキシ−5−メチルビシクロ[2.2.1]ヘプト−2−エン、5−ヒドロキシ−5−エチルビシクロ[2.2.1]ヘプト−2−エン、5−ヒドロキシメチル−5−メチルビシクロ[2.2.1]ヘプト−2−エン、 Diethyl maleate, diethyl fumarate, diethyl itaconate, bicyclo [2.2.1] hept-2-ene, 5-methylbicyclo [2.2.1] hept-2-ene, 5-ethylbicyclo [2. 2.1] hept-2-ene, 5-methoxybicyclo [2.2.1] hept-2-ene, 5-ethoxybicyclo [2.2.1] hept-2-ene, 5,6-dimethoxybicyclo [2.2.1] hept-2-ene, 5,6-diethoxybicyclo [2.2.1] hept-2-ene, 5-t-butoxycarbonylbicyclo [2.2.1] hept-2 -Ene, 5-cyclohexyloxycarbonylbicyclo [2.2.1] hept-2-ene, 5-phenoxycarbonylbicyclo [2.2.1] hept-2-ene, 5,6-di (t-butoxycarbonyl ) Bicyclo 2.2.1] Hept-2-ene, 5,6-di (cyclohexyloxycarbonyl) bicyclo [2.2.1] hept-2-ene, 5- (2′-hydroxyethyl) bicyclo [2.2 .1] Hept-2-ene, 5,6-dihydroxybicyclo [2.2.1] hept-2-ene, 5,6-di (hydroxymethyl) bicyclo [2.2.1] hept-2-ene 5,6-di (2′-hydroxyethyl) bicyclo [2.2.1] hept-2-ene, 5-hydroxy-5-methylbicyclo [2.2.1] hept-2-ene, 5- Hydroxy-5-ethylbicyclo [2.2.1] hept-2-ene, 5-hydroxymethyl-5-methylbicyclo [2.2.1] hept-2-ene,
スチレン、α−メチルスチレン、o−メチルスチレン、m−メチルスチレン、p−メチルスチレン、o−メトキシスチレン、m−メトキシスチレン、p−メトキシスチレン、1,3−ブタジエン、イソプレン、2,3−ジメチル−1,3−ブタジエン、アクリロニトリル、メタクリロニトリル、塩化ビニル、塩化ビニリデン、アクリルアミド、メタクリルアミド、酢酸ビニル、o−ヒドロキシフェニル(メタ)アクリルアミド、m−ヒドロキシフェニル(メタ)アクリルアミド、p−ヒドロキシフェニル(メタ)アクリルアミド、3,5−ジメチル−4−ヒドロキシベンジル(メタ)アクリルアミド、フェニルマレイミド、ヒドロキシフェニルマレイミド、シクロヘキシルマレイミド、ベンジルマレイミド、トリフルオロメチル(メタ)アクリレート、アクリル酸グリシジル、メタクリル酸グリシジル、α−エチルアクリル酸グリシジル、アクリル酸−3,4−エポキシブチル、メタクリル酸−3,4−エポキシブチル、α−エチルアクリル酸−3,4−エポキシブチル、アクリル酸−6,7−エポキシヘプチル、メタクリル酸−6,7−エポキシヘプチル、α−エチルアクリル酸−6,7−エポキシヘプチル、ビニルグリシジルエーテル、アリルグリシジルエーテル、イソプロペニルグリシジルエーテル、o−ビニルベンジルグリシジルエーテル、m−ビニルベンジルグリシジルエーテル、p−ビニルベンジルグリシジルエーテル、ビニルシクロヘキセンモノオキサイド、3,4−エポキシシクロヘキシルメチルアクリレート、3,4−エポキシシクロヘキシルメチルメタクリレートなどを挙げることができる。 Styrene, α-methylstyrene, o-methylstyrene, m-methylstyrene, p-methylstyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, 1,3-butadiene, isoprene, 2,3-dimethyl -1,3-butadiene, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl acetate, o-hydroxyphenyl (meth) acrylamide, m-hydroxyphenyl (meth) acrylamide, p-hydroxyphenyl ( (Meth) acrylamide, 3,5-dimethyl-4-hydroxybenzyl (meth) acrylamide, phenylmaleimide, hydroxyphenylmaleimide, cyclohexylmaleimide, benzylmaleimide, trifluoromethyl (meth) acyl Rate, glycidyl acrylate, glycidyl methacrylate, glycidyl α-ethyl acrylate, 3,4-epoxybutyl acrylate, 3,4-epoxybutyl methacrylate, 3,4-epoxybutyl acrylate, Acrylic acid-6,7-epoxyheptyl, methacrylic acid-6,7-epoxyheptyl, α-ethylacrylic acid-6,7-epoxyheptyl, vinyl glycidyl ether, allyl glycidyl ether, isopropenyl glycidyl ether, o-vinyl benzyl Glycidyl ether, m-vinylbenzylglycidyl ether, p-vinylbenzylglycidyl ether, vinylcyclohexene monooxide, 3,4-epoxycyclohexylmethyl acrylate, 3,4-epoxycyclohexylmethyl methacrylate And so on.
重合は、アゾビスイソブチロニトリルを代表とするアゾ系開始剤、ベンゾイルパーオキシドを代表とする有機過酸化物等を使用して、メタノール、エタノール、1−プロパノール、イソプロピルアルコール、ブタノール、エチレングリコール、アセトン、メチルエチルケトン、メチルイソブチルケトン、テトラヒドロフラン、ジオキサン、トルエン、キシレン、エチルアセテート、イソプロピルアセテート、ノルマルプロピルアセテート、ブチルアセテート、エチレングリコールモノメチルエーテルアセテート、プロピレングリコールモノメチルエーテルアセテート、エチレングリコールモノエチルエーテルアセテート、酢酸3−メトキシブチル、エチレングリコールモノブチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノブチルエーテルアセテート、プロピレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、3−メトキシブタノール、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル、ジメチルスルホキシド、ジメチルホルムアミド、ジメチルアセトアミド、乳酸エチルなどの有機溶媒中で行なうことができる。 Polymerization uses azo initiators typified by azobisisobutyronitrile, organic peroxides typified by benzoyl peroxide, etc., methanol, ethanol, 1-propanol, isopropyl alcohol, butanol, ethylene glycol , Acetone, methyl ethyl ketone, methyl isobutyl ketone, tetrahydrofuran, dioxane, toluene, xylene, ethyl acetate, isopropyl acetate, normal propyl acetate, butyl acetate, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, acetic acid 3-methoxybutyl, ethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether Conducted in an organic solvent such as acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether, ethylene glycol monoethyl ether, 3-methoxybutanol, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, dimethyl sulfoxide, dimethylformamide, dimethylacetamide, ethyl lactate be able to.
以下に実施例、比較例、参考例及び比較参考例を示して、本発明をさらに具体的に説明するが、本発明は以下の例に限定されるものではない。また、実施例、比較例、参考例における組成比、色相、濁度は以下の方法で調査した。 EXAMPLES Hereinafter, the present invention will be described more specifically with reference to Examples, Comparative Examples, Reference Examples and Comparative Reference Examples, but the present invention is not limited to the following examples. Moreover, the composition ratio, hue, and turbidity in Examples, Comparative Examples, and Reference Examples were investigated by the following methods.
(組成比)
1H−NMR測定により、二価フェノール類、二価フェノール類モノ(メタ)アクリレート、及び二価フェノール類ジ(メタ)アクリレートの合計を100モル%として、各成分を算出した。
(色相)
反応終了時点での着色具合を目視で観察した。
○:殆ど着色なし、△:僅かに着色、×:着色
(濁度)
反応終了時点の反応液をプロピレングリコールモノメチルエーテルアセテートにより4質量倍に希釈して目視で観察した。
○:透明、△:僅かに濁り、×:濁り
(Composition ratio)
By 1 H-NMR measurement, each component was calculated with the total of dihydric phenols, dihydric phenols mono (meth) acrylate, and dihydric phenols di (meth) acrylate being 100 mol%.
(Hue)
The degree of coloring at the end of the reaction was visually observed.
○: Almost not colored, Δ: Slightly colored, ×: Colored (turbidity)
The reaction solution at the end of the reaction was diluted 4 times by mass with propylene glycol monomethyl ether acetate and visually observed.
○: Transparent, △: Slightly cloudy, ×: Cloudy
[実施例1]
4−ヒドロキシフェニルメタクリレートの合成
冷却器、温度計、攪拌羽を取り付けた1Lセパラブルフラスコにヒドロキノン100質量部、メタクリル酸235質量部、イオン交換樹脂としてオルガノ(株)製強酸性イオン交換樹脂アンバーリスト15.DRY10質量部を仕込み、120℃で反応を開始した。反応が平衡に達し、生成物の組成が一定になったところで系内の水分を測定したところ1.2質量%であった。その後、120℃で系内の水が0.2質量%未満を維持するように減圧留去しながら反応を継続した。ヒドロキシフェニルメタクリレートの割合がヒドロキノンを仕込んだモル数の56.8%になったところでエステル化反応を終了した。組成比、色相、濁度は表1に示すとおりである。
[Example 1]
Synthesis of 4-
[実施例2]
冷却器、温度計、攪拌羽を取り付けた1Lセパラブルフラスコにヒドロキノン100質量部、メタクリル酸86質量部、イオン交換樹脂としてオルガノ(株)製強酸性イオン交換樹脂アンバーリスト15.DRY10質量部を仕込み、120℃で1.5時間反応したところ、反応生成物の割合が一定になったため、減圧蒸留して系内の水分を除去した。再び、120℃で1.5時間反応したところ、反応生成物の割合が一定になったため、減圧蒸留して系内の水分を除去した。この操作を繰り返し行い、ヒドロキシフェニルメタクリレートの割合がヒドロキノンを仕込んだモル数の38.9%になったところでエステル化反応を終了した。組成比、色相、濁度は表1に示すとおりである。
[Example 2]
15. A 1 L separable flask equipped with a cooler, thermometer, and stirring blade, 100 parts by weight of hydroquinone, 86 parts by weight of methacrylic acid, and strongly acidic ion exchange resin Amberlyst manufactured by Organo Corporation as an ion exchange resin. When 10 parts by mass of DRY was charged and reacted at 120 ° C. for 1.5 hours, the ratio of the reaction product became constant, and thus the water in the system was removed by distillation under reduced pressure. When the reaction was again carried out at 120 ° C. for 1.5 hours, the ratio of the reaction product became constant, and thus the water in the system was removed by distillation under reduced pressure. This operation was repeated, and the esterification reaction was terminated when the proportion of hydroxyphenyl methacrylate reached 38.9% of the number of moles charged with hydroquinone. The composition ratio, hue, and turbidity are as shown in Table 1.
[実施例3]
4−ヒドロキシフェニルメタクリレートの合成
冷却器、温度計、攪拌羽を取り付けた1Lセパラブルフラスコにヒドロキノン100質量部、メタクリル酸235質量部、イオン交換樹脂としてオルガノ(株)製強酸性イオン交換樹脂アンバーリスト15.DRY10質量部を仕込み、120℃で反応を開始した。反応が平衡に達し、生成物の組成が一定になったところで系内の水分を測定したところ1.2%であった。その後、120℃で系内の水が0.5〜1.0%を維持するように減圧留去しながら反応を継続した。ヒドロキシフェニルメタクリレートの割合がヒドロキノンを仕込んだモル数の37.1%になったところでエステル化反応を終了した。この場合、37%で平衡に達し、これ以上、エステル化は進行しなかった。組成比、色相、濁度は表1に示すとおりである。
[Example 3]
Synthesis of 4-
[実施例4]
2−ヒドロキシフェニルアクリレートの合成
冷却器、温度計、攪拌羽を取り付けた1Lセパラブルフラスコにカテコール100質量部、メタクリル酸235質量部、イオン交換樹脂としてオルガノ(株)製強酸性イオン交換樹脂アンバーリスト15.DRY10質量部を仕込み、120℃で反応を開始した。反応が平衡に達し、生成物の組成が一定になったところで系内の水分を測定したところ1.3%であった。その後、120℃で系内の水が0.2質量%未満を維持するように減圧留去しながら反応を継続した。ヒドロキシフェニルメタクリレートの割合がカテコールを仕込んだモル数の49.5%になったところでエステル化反応を終了した。組成比、色相、濁度は表1に示すとおりである。
[Example 4]
Synthesis of 2-hydroxyphenyl acrylate 100L part of catechol, 235 parts by weight of methacrylic acid in a 1L separable flask equipped with a condenser, thermometer and stirring blades, strongly acidic ion exchange resin amber list manufactured by Organo Corporation as ion exchange resin 15. 10 parts by mass of DRY was charged and the reaction was started at 120 ° C. When the reaction reached equilibrium and the product composition became constant, the water content in the system was measured and found to be 1.3%. Thereafter, the reaction was continued while distilling off under reduced pressure so that the water in the system was kept at less than 0.2% by mass at 120 ° C. The esterification reaction was terminated when the proportion of hydroxyphenyl methacrylate reached 49.5% of the number of moles charged with catechol. The composition ratio, hue, and turbidity are as shown in Table 1.
[比較例1]
4−ヒドロキシフェニルメタクリレートの合成
還流冷却器、水分離器、温度計及び撹拌羽を取り付けた1Lセパラブルフラスコに、ヒドロキノン100質量部、メタクリル酸85質量部、p−トルエンスルホン酸4.0質量部、トルエン100質量部を仕込み、還流させながら反応を行った。120℃でトルエンと水の共沸混合物の留出が始まり、水分離器で分離した水を系外へ除去しながら、120℃で5時間反応させた。ヒドロキシフェニルメタクリレートの割合がヒドロキノンを仕込んだモル数の37.0%になったところでエステル化反応を終了した。組成比、色相、濁度は表1に示すとおりである。
[Comparative Example 1]
Synthesis of 4-hydroxyphenyl methacrylate In a 1 L separable flask equipped with a reflux condenser, a water separator, a thermometer and a stirring blade, 100 parts by mass of hydroquinone, 85 parts by mass of methacrylic acid, 4.0 parts by mass of p-toluenesulfonic acid Then, 100 parts by mass of toluene was charged, and the reaction was performed while refluxing. Distillation of an azeotropic mixture of toluene and water started at 120 ° C., and the reaction was carried out at 120 ° C. for 5 hours while removing the water separated by the water separator from the system. The esterification reaction was terminated when the proportion of hydroxyphenyl methacrylate reached 37.0% of the number of moles charged with hydroquinone. The composition ratio, hue, and turbidity are as shown in Table 1.
[比較例2]
4−ヒドロキシフェニルメタクリレートの合成
冷却器、温度計、攪拌羽を取り付けた1Lセパラブルフラスコにヒドロキノン100質量部、メタクリル酸86質量部、p−トルエンスルホン酸4.0質量部を仕込み、145℃で1.5時間反応したところ、反応生成物の割合が一定になったため、減圧蒸留して系内の水分を除去した。再び、145℃で1.5時間反応したところ、反応生成物の割合が一定になったため、減圧蒸留して系内の水分を除去した。この操作を繰り返し行い、ヒドロキシフェニルメタクリレートの割合がヒドロキノンを仕込んだモル数の35.1%になったところでエステル化反応を終了した。組成比、色相、濁度は表1に示すとおりである。
[Comparative Example 2]
Synthesis of 4-hydroxyphenyl methacrylate A 1 L separable flask equipped with a condenser, a thermometer, and a stirring blade was charged with 100 parts by mass of hydroquinone, 86 parts by mass of methacrylic acid, and 4.0 parts by mass of p-toluenesulfonic acid at 145 ° C. When the reaction was carried out for 1.5 hours, the ratio of the reaction product became constant, and thus water in the system was removed by distillation under reduced pressure. When the reaction was again carried out at 145 ° C. for 1.5 hours, the ratio of the reaction product became constant, and thus the water in the system was removed by distillation under reduced pressure. This operation was repeated, and the esterification reaction was terminated when the proportion of hydroxyphenyl methacrylate reached 35.1% of the number of moles charged with hydroquinone. The composition ratio, hue, and turbidity are as shown in Table 1.
[比較例3]
4−ヒドロキシフェニルメタクリレートの合成
還流冷却器、水分離器、温度計及び撹拌羽を取り付けた1Lセパラブルフラスコに、ヒドロキノン100質量部、メタクリル酸86質量部、イオン交換樹脂としてオルガノ(株)製強酸性イオン交換樹脂アンバーリスト15.DRY10質量部、トルエン100質量部を仕込み、還流させながら反応を行った。120℃でトルエンと水の共沸混合物の留出が始まり、水分離器で分離した水を系外へ除去しながら、120℃で16時間反応させた。ヒドロキシフェニルメタクリレートの割合がヒドロキノンを仕込んだモル数の51.3%になったところでエステル化反応を終了した。組成比、色相、濁度は表1に示すとおりである。
[Comparative Example 3]
Synthesis of 4-hydroxyphenyl methacrylate A 1 L separable flask equipped with a reflux condenser, a water separator, a thermometer, and a stirring blade, 100 parts by weight of hydroquinone, 86 parts by weight of methacrylic acid, and strong acid manufactured by Organo Corporation as an ion exchange resin Ion exchange resin amber list 15. 10 parts by mass of DRY and 100 parts by mass of toluene were charged, and the reaction was carried out while refluxing. Distillation of an azeotropic mixture of toluene and water started at 120 ° C., and the reaction was carried out at 120 ° C. for 16 hours while removing the water separated by the water separator out of the system. The esterification reaction was terminated when the proportion of hydroxyphenyl methacrylate reached 51.3% of the number of moles charged with hydroquinone. The composition ratio, hue, and turbidity are as shown in Table 1.
[参考例1]
4−ヒドロキシフェニルメタクリレートの精製
実施例1で得た反応液からイオン交換樹脂を濾別して、メチルシクロヘキサンでの洗浄を繰り返し行い、フェニレンジメタクリレートのモル分率が0.1になったところで、メチルシクロヘキサンでの洗浄を終了した。ここで、フェニレンジメタクリレートが除去された粗結晶が得られた。次に、水によるこの粗結晶の洗浄を繰り返し行い、未反応の二価フェノールのモル分率が0.5になったところで、水洗浄を終了した。引き続き脱液、乾燥することで65.7質量部(収率:40.6%)の白色結晶を得た。
ヒドロキノン:ヒドロキシフェニルメタクリレート:フェニレンジメタクリレートのモル分率は、0.2:99.2:0.6であった。
[Reference Example 1]
Purification of 4-hydroxyphenyl methacrylate The ion exchange resin was filtered off from the reaction solution obtained in Example 1 and washed repeatedly with methylcyclohexane. When the molar fraction of phenylene dimethacrylate became 0.1, methylcyclohexane was obtained. The washing with was finished. Here, a crude crystal from which phenylene dimethacrylate was removed was obtained. Next, this washing of the crude crystals with water was repeated, and the water washing was terminated when the molar fraction of unreacted dihydric phenol reached 0.5. Subsequently, the solution was drained and dried to obtain 65.7 parts by mass (yield: 40.6%) of white crystals.
The molar fraction of hydroquinone: hydroxyphenyl methacrylate: phenylene dimethacrylate was 0.2: 99.2: 0.6.
4−ヒドロキシフェニルメタクリレートの重合
冷却器、温度計、攪拌羽を取り付けた1Lセパラブルフラスコに、得られた白色結晶100質量部、プロピレングリコールモノエチルエーテルアセテート300質量部、アゾビスイソブチロニトリル4.0質量部を仕込み、70℃で6時間反応し、ポリマー溶液を得た。
Polymerization of 4-hydroxyphenyl methacrylate In a 1 L separable flask equipped with a condenser, thermometer, and stirring blade, 100 parts by mass of the obtained white crystals, 300 parts by mass of propylene glycol monoethyl ether acetate, azobisisobutyronitrile 4 Then, 0.0 part by mass was charged and reacted at 70 ° C. for 6 hours to obtain a polymer solution.
ポリマーの透過率測定
得られたポリマー溶液を0.1μmのテフロン(登録商標)フィルターで濾過を行った。ガラス板に50μmのアプリケーターで塗布し、110℃のホットプレートで90秒、乾燥して膜厚3μmの塗膜を得た。更に230℃のオーブンで0、1、2、3時間加熱処理したときの波長400nmでの透過率を紫外可視分光光度計でそれぞれ測定した。結果を図1に示す。着色のないヒドロキシフェニルメタクリレートを原料に使用したポリマーは、加熱しても透過率の変化が少なく良好である。
Measurement of polymer permeability The obtained polymer solution was filtered through a 0.1 μm Teflon (registered trademark) filter. The film was applied to a glass plate with a 50 μm applicator and dried on a 110 ° C. hot plate for 90 seconds to obtain a coating film having a thickness of 3 μm. Furthermore, the transmittance | permeability in wavelength 400nm when it heat-processes in 230 degreeC oven for 0, 1, 2, 3 hours was measured with the ultraviolet visible spectrophotometer, respectively. The results are shown in FIG. A polymer using uncolored hydroxyphenyl methacrylate as a raw material is good with little change in transmittance even when heated.
[比較参考例1]
比較例1で得られた反応液を参考例1と同様に処理して精製を行い、褐色粉末を得た。得られた褐色粉末を用いて参考例1と同様に重合を行い、ポリマー溶液を得た。引き続き、得られたポリマー溶液を0.1μmのテフロン(登録商標)フィルターで濾過を試みたが、目詰まりのため濾過が出来なかった。これは、濁度が高いためと考えられる。
[Comparative Reference Example 1]
The reaction solution obtained in Comparative Example 1 was purified in the same manner as in Reference Example 1 to obtain a brown powder. Polymerization was performed in the same manner as in Reference Example 1 using the obtained brown powder to obtain a polymer solution. Subsequently, the obtained polymer solution was filtered with a 0.1 μm Teflon (registered trademark) filter, but could not be filtered due to clogging. This is considered due to the high turbidity.
[比較参考例2]
比較例2で得られた反応液を参考例1と同様に処理して精製を行い、褐色粉末を得た。得られた褐色粉末を用いて参考例1と同様に重合を行い、ポリマー溶液を得た。引き続き、得られたポリマー溶液を用いて参考例1と同様に塗膜の透過率を測定した。結果を図1に示す。着色のあるヒドロキシフェニルメタクリレートを原料に使用したポリマーは、加熱すると透過率の変化が大きく、透明性を必要とする用途への適用が出来ない。
[Comparative Reference Example 2]
The reaction solution obtained in Comparative Example 2 was purified in the same manner as in Reference Example 1 to obtain a brown powder. Polymerization was performed in the same manner as in Reference Example 1 using the obtained brown powder to obtain a polymer solution. Subsequently, the transmittance of the coating film was measured in the same manner as in Reference Example 1 using the obtained polymer solution. The results are shown in FIG. A polymer using colored hydroxyphenyl methacrylate as a raw material has a large change in transmittance when heated, and cannot be applied to uses requiring transparency.
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WO2013015055A1 (en) * | 2011-07-25 | 2013-01-31 | 昭和電工株式会社 | Method for producing aromatic diol mono(meth)acrylate |
KR20140128360A (en) * | 2012-03-29 | 2014-11-05 | 디아이씨 가부시끼가이샤 | Curable resin composition, cured product thereof, resin composition for printed circuit board and printed circuit board |
WO2020240993A1 (en) * | 2019-05-30 | 2020-12-03 | 昭和電工株式会社 | Resin composition and resin film |
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WO2013015055A1 (en) * | 2011-07-25 | 2013-01-31 | 昭和電工株式会社 | Method for producing aromatic diol mono(meth)acrylate |
CN103702969A (en) * | 2011-07-25 | 2014-04-02 | 昭和电工株式会社 | Method for producing aromatic diol mono(meth)acrylate |
KR20140128360A (en) * | 2012-03-29 | 2014-11-05 | 디아이씨 가부시끼가이샤 | Curable resin composition, cured product thereof, resin composition for printed circuit board and printed circuit board |
KR101597746B1 (en) | 2012-03-29 | 2016-02-25 | 디아이씨 가부시끼가이샤 | Curable resin composition, cured product thereof, resin composition for printed circuit board and printed circuit board |
WO2020240993A1 (en) * | 2019-05-30 | 2020-12-03 | 昭和電工株式会社 | Resin composition and resin film |
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