JP2012060165A5 - - Google Patents

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JP2012060165A5
JP2012060165A5 JP2011273243A JP2011273243A JP2012060165A5 JP 2012060165 A5 JP2012060165 A5 JP 2012060165A5 JP 2011273243 A JP2011273243 A JP 2011273243A JP 2011273243 A JP2011273243 A JP 2011273243A JP 2012060165 A5 JP2012060165 A5 JP 2012060165A5
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所定の光を放出させる結晶成長時の基板が除去された第1の半導体発光層と、
前記第1の半導体発光層とは異なる結晶系からなる半導体層から構成され前記第1の半導体発光層からの光によって励起されて光を放出する第2の半導体発光層を有し、
前記第1の半導体発光層からの発光波長と前記第2の半導体発光層からの発光波長が異なる、
ことを特徴とする半導体発光素子。
A first semiconductor light emitting layer from which a substrate during crystal growth for emitting predetermined light is removed;
A second semiconductor light-emitting layer that is composed of a semiconductor layer made of a different crystal system from the first semiconductor light-emitting layer and emits light when excited by light from the first semiconductor light-emitting layer;
The emission wavelength from the first semiconductor light emitting layer is different from the emission wavelength from the second semiconductor light emitting layer,
A semiconductor light emitting element characterized by the above.
前記第1の半導体発光層はウルツ鉱型結晶構造を有し、第2の半導体発光層は閃亜鉛鉱型結晶構造を有することを特徴とする請求項1記載の半導体発光素子。   2. The semiconductor light emitting device according to claim 1, wherein the first semiconductor light emitting layer has a wurtzite crystal structure, and the second semiconductor light emitting layer has a zinc blende crystal structure. 前記第1の半導体発光層は窒化ガリウム系半導体層からなることを特徴とする請求項1記載の半導体発光素子。   2. The semiconductor light emitting device according to claim 1, wherein the first semiconductor light emitting layer comprises a gallium nitride based semiconductor layer. 前記第2の半導体発光層はAlGaInP系半導体層、AlGaInAs系半導体層、GaInNAs系半導体層、GaInAsP系半導体層から選ばれた半導体層からなることを特徴とする請求項1記載の半導体発光素子。   2. The semiconductor light emitting element according to claim 1, wherein the second semiconductor light emitting layer comprises a semiconductor layer selected from an AlGaInP semiconductor layer, an AlGaInAs semiconductor layer, a GaInNAs semiconductor layer, and a GaInAsP semiconductor layer. 前記第1の半導体発光層は選択成長により形成された尖頭状の成長層からなる前記半導体構造部に形成されることを特徴とする請求項1記載の半導体発光素子。   2. The semiconductor light emitting device according to claim 1, wherein the first semiconductor light emitting layer is formed in the semiconductor structure portion including a pointed growth layer formed by selective growth. 前記第1の半導体発光層と前記第2の半導体発光層は異なる発光波長を有することを特徴とする請求項1記載の半導体発光素子。   2. The semiconductor light emitting device according to claim 1, wherein the first semiconductor light emitting layer and the second semiconductor light emitting layer have different emission wavelengths. 前記第2の半導体発光層は成長基板上で形成され、アブレーション若しくはエッチングによって該成長基板を剥離してなることを特徴とする請求項1記載の半導体発光素子。   2. The semiconductor light emitting element according to claim 1, wherein the second semiconductor light emitting layer is formed on a growth substrate, and the growth substrate is peeled off by ablation or etching. 前記第2の半導体発光層側を、接着層を介して前記第1の半導体発光層に貼り合わせることと特徴とする請求項1記載の半導体発光素子。 The second semiconductor light-emitting layer side, the semiconductor light-emitting device according to claim 1, that the feature via the adhesive layer bonded to the first semiconductor light-emitting layer side. 樹脂パッケージ内に形成され所定の光を放出させる結晶成長時の基板が除去された第1の半導体発光層と、
前記第1の半導体発光層とは異なる結晶系からなる半導体層から構成され、前記第1の半導体発光層からの光によって励起されて光を放出する第2の半導体発光層を有し、
前記第1の半導体発光層からの発光波長と前記第2の半導体発光層からの発光波長が異なる、ことを特徴とする半導体発光素子。
A first semiconductor light emitting layer formed in a resin package, from which a substrate for crystal growth that emits predetermined light is removed;
A second semiconductor light-emitting layer that is composed of a semiconductor layer made of a different crystal system from the first semiconductor light-emitting layer, is excited by light from the first semiconductor light-emitting layer, and emits light;
A semiconductor light emitting element, wherein an emission wavelength from the first semiconductor light emitting layer is different from an emission wavelength from the second semiconductor light emitting layer.
前記第1の半導体発光層と前記第2の半導体発光層は、互いに異なる結晶系からなる半導体層から構成されることを特徴とする請求項9記載の半導体発光素子。   10. The semiconductor light emitting device according to claim 9, wherein the first semiconductor light emitting layer and the second semiconductor light emitting layer are composed of semiconductor layers made of different crystal systems. 前記第1の半導体発光層はウルツ鉱型結晶構造を有し、第2の半導体発光層は閃亜鉛鉱型結晶構造を有することを特徴とする請求項9記載の半導体発光素子。   10. The semiconductor light emitting device according to claim 9, wherein the first semiconductor light emitting layer has a wurtzite crystal structure, and the second semiconductor light emitting layer has a zinc blende crystal structure. 前記第1の半導体発光層は窒化ガリウム系半導体層からなることを特徴とする請求項9記載の半導体発光素子。   The semiconductor light emitting element according to claim 9, wherein the first semiconductor light emitting layer is made of a gallium nitride based semiconductor layer. 前記第2の半導体発光層はAlGaInP系半導体層、AlGaInAs系半導体層、GaInNAs系半導体層、GaInAsP系半導体層から選ばれた半導体層からなることを特徴とする請求項9記載の半導体発光素子。   10. The semiconductor light emitting element according to claim 9, wherein the second semiconductor light emitting layer comprises a semiconductor layer selected from an AlGaInP based semiconductor layer, an AlGaInAs based semiconductor layer, a GaInNAs based semiconductor layer, and a GaInAsP based semiconductor layer. 前記第1の半導体発光層は選択成長により形成された尖頭状の成長層に形成されることを特徴とする請求項9記載の半導体発光素子。   10. The semiconductor light emitting device according to claim 9, wherein the first semiconductor light emitting layer is formed in a pointed growth layer formed by selective growth. 前記第1の半導体発光層と前記第2の半導体発光層は異なる発光波長を有することを特徴とする請求項9記載の半導体発光素子。   The semiconductor light emitting device according to claim 9, wherein the first semiconductor light emitting layer and the second semiconductor light emitting layer have different emission wavelengths. 前記第2の半導体発光層は成長基板上で形成され、アブレーション若しくはエッチングによって該成長基板を剥離してなることを特徴とする請求項9記載の半導体発光素子。   10. The semiconductor light emitting device according to claim 9, wherein the second semiconductor light emitting layer is formed on a growth substrate, and the growth substrate is peeled off by ablation or etching. 前記第2の半導体発光層側を、接着層を介して前記第1の半導体発光層に貼り合わせることを特徴とする請求項9記載の半導体発光素子。 The second semiconductor light-emitting layer side, the semiconductor light emitting device according to claim 9, wherein Rukoto bonded to the first semiconductor light-emitting layer side via the adhesive layer. 所定の光を放出させる結晶成長時の基板が除去された第1の半導体発光層を形成し、
前記第1の半導体発光層とは異なる結晶系からなる半導体層から構成され、前記第1の半導体発光層からの光によって励起されて光を放出する第2の半導体発光層を形成し、
前記第1の半導体発光層からの発光波長と前記第2の半導体発光層からの発光波長が異なる、ことを特徴とする半導体発光素子の製造方法。
Forming a first semiconductor light emitting layer from which a substrate during crystal growth for emitting predetermined light is removed;
Forming a second semiconductor light emitting layer that is composed of a semiconductor layer made of a different crystal system from the first semiconductor light emitting layer, and is excited by light from the first semiconductor light emitting layer to emit light;
A method of manufacturing a semiconductor light emitting element, wherein an emission wavelength from the first semiconductor light emitting layer and an emission wavelength from the second semiconductor light emitting layer are different.
前記第2の半導体発光層は基板上に積層されて形成され、
前記第2の半導体発光層側を前記第1の半導体発光層側に貼り合わせる際に前記第2の半導体発光層は前記基板から剥離されることを特徴とする請求項18記載の半導体発光素子の製造方法。
The second semiconductor light emitting layer is formed by being laminated on a substrate,
19. The semiconductor light emitting element according to claim 18 , wherein the second semiconductor light emitting layer is peeled off from the substrate when the second semiconductor light emitting layer side is bonded to the first semiconductor light emitting layer side. Manufacturing method.
前記第2の半導体発光層の前記基板からの剥離は、レーザーアブレーションによって行われることを特徴とする請求項18記載の半導体発光素子の製造方法。   The method of manufacturing a semiconductor light emitting element according to claim 18, wherein the second semiconductor light emitting layer is peeled off from the substrate by laser ablation. 前記第2の半導体発光層の前記基板からの剥離は、エッチングによって前記基板を除去することで行われることを特徴とする請求項18記載の半導体発光素子の製造方法。   The method of manufacturing a semiconductor light emitting element according to claim 18, wherein the second semiconductor light emitting layer is peeled off from the substrate by removing the substrate by etching. 樹脂パッケージ内に形成され所定の光を放出させる結晶成長時の基板が除去された第1の半導体発光層を形成し、
前記第1の半導体発光層とは異なる結晶系からなる半導体層から構成され、前記第1の半導体発光層からの光によって励起されて光を放出する第2の半導体発光層を形成し、
前記第1の半導体発光層からの発光波長と前記第2の半導体発光層からの発光波長が異なる、
ことを特徴とする半導体発光素子の製造方法。
Forming a first semiconductor light emitting layer formed in a resin package, from which a substrate during crystal growth that emits predetermined light is removed;
Forming a second semiconductor light emitting layer that is composed of a semiconductor layer made of a different crystal system from the first semiconductor light emitting layer, and is excited by light from the first semiconductor light emitting layer to emit light;
The emission wavelength from the first semiconductor light emitting layer is different from the emission wavelength from the second semiconductor light emitting layer,
A method for manufacturing a semiconductor light emitting device.
前記第2の半導体発光層は基板上に積層されて形成され、前記第2の半導体発光層側を前記第1の半導体発光層側に貼り合わせる際に前記第2の半導体発光層は前記基板から剥離されることを特徴とする請求項22記載の半導体発光素子の製造方法。 The second semiconductor light-emitting layer is formed by stacking on a substrate, the second semiconductor light-emitting layer side when bonding the first semiconductor light-emitting layer side, the second semiconductor light-emitting layer is the The method for manufacturing a semiconductor light emitting device according to claim 22, wherein the method is peeled off from the substrate. 前記第2の半導体発光層の前記基板からの剥離は、レーザーアブレーションによって行われることを特徴とする請求項22記載の半導体発光素子の製造方法。   23. The method of manufacturing a semiconductor light emitting element according to claim 22, wherein the second semiconductor light emitting layer is peeled off from the substrate by laser ablation. 前記第2の半導体発光層の前記基板からの剥離は、エッチングによって前記基板を除去することで行われることを特徴とする請求項21記載の半導体発光素子の製造方法。   The method of manufacturing a semiconductor light emitting element according to claim 21, wherein the peeling of the second semiconductor light emitting layer from the substrate is performed by removing the substrate by etching. 所定の光を放出させる結晶成長時の基板が除去された第1の半導体発光層を有する半導体構造部を複数形成し、
その複数個の半導体構造部のうちの一部に、前記第1の半導体発光層からの光によって励起されて光を放出する前記第1の半導体発光層とは異なる結晶系からなる半導体層から構成される第2の半導体発光層を貼り合わせてなり、
前記第1の半導体発光層からの発光波長と前記第2の半導体発光層からの発光波長が異なる、ことを特徴とする半導体発光装置。
Forming a plurality of semiconductor structures having a first semiconductor light emitting layer from which a substrate during crystal growth for emitting predetermined light is removed;
A part of the plurality of semiconductor structure portions includes a semiconductor layer made of a crystal system different from that of the first semiconductor light emitting layer that is excited by light from the first semiconductor light emitting layer and emits light. The second semiconductor light emitting layer side to be bonded,
A semiconductor light emitting device, wherein an emission wavelength from the first semiconductor light emitting layer is different from an emission wavelength from the second semiconductor light emitting layer.
所定の光を放出させる第1の半導体発光層と、
前記第1の半導体発光層とは異なる結晶系からなる半導体層から構成され前記第1の半導体発光層からの光によって励起されて光を放出する第2の半導体発光層を有し、
前記第1の半導体発光層側に前記第2の半導体発光層側が貼り合わされ、
前記第1の半導体発光層からの発光波長と前記第2の半導体発光層からの発光波長が異なる、
ことを特徴とする半導体発光素子
A first semiconductor light emitting layer that emits predetermined light;
A second semiconductor light-emitting layer that is composed of a semiconductor layer made of a different crystal system from the first semiconductor light-emitting layer and emits light when excited by light from the first semiconductor light-emitting layer;
The second semiconductor light emitting layer side is bonded to the first semiconductor light emitting layer side,
The emission wavelength from the first semiconductor light emitting layer is different from the emission wavelength from the second semiconductor light emitting layer,
A semiconductor light emitting element characterized by the above .
前記第1の半導体発光層はウルツ鉱型結晶構造を有し、第2の半導体発光層は閃亜鉛鉱型結晶構造を有することを特徴とする請求項27記載の半導体発光素子。28. The semiconductor light emitting device according to claim 27, wherein the first semiconductor light emitting layer has a wurtzite crystal structure, and the second semiconductor light emitting layer has a zinc blende crystal structure. 前記第1の半導体発光層は窒化ガリウム系半導体層からなることを特徴とする請求項1記載の半導体発光素子。2. The semiconductor light emitting device according to claim 1, wherein the first semiconductor light emitting layer comprises a gallium nitride based semiconductor layer. 前記第2の半導体発光層はAlGaInP系半導体層、AlGaInAs系半導体層、GaInNAs系半導体層、GaInAsP系半導体層から選ばれた半導体層からなることを特徴とする請求項27記載の半導体発光素子。28. The semiconductor light emitting element according to claim 27, wherein the second semiconductor light emitting layer comprises a semiconductor layer selected from an AlGaInP based semiconductor layer, an AlGaInAs based semiconductor layer, a GaInNAs based semiconductor layer, and a GaInAsP based semiconductor layer. 前記第1の半導体発光層は選択成長により形成された尖頭状の成長層からなる前記半導体構造部に形成されることを特徴とする請求項1記載の半導体発光素子。2. The semiconductor light emitting device according to claim 1, wherein the first semiconductor light emitting layer is formed in the semiconductor structure portion including a pointed growth layer formed by selective growth. 前記第1の半導体発光層と前記第2の半導体発光層は異なる発光波長を有することを特徴とする請求項27記載の半導体発光素子。28. The semiconductor light emitting element according to claim 27, wherein the first semiconductor light emitting layer and the second semiconductor light emitting layer have different emission wavelengths. 前記第2の半導体発光層は成長基板上で形成され、アブレーション若しくはエッチングによって該成長基板を剥離してなることを特徴とする請求項27記載の半導体発光素子。28. The semiconductor light emitting element according to claim 27, wherein the second semiconductor light emitting layer is formed on a growth substrate, and the growth substrate is peeled off by ablation or etching. 前記第2の半導体発光層は、接着層を介して前記第1の半導体発光層に貼り付けられることと特徴とする請求項27記載の半導体発光素子。28. The semiconductor light emitting element according to claim 27, wherein the second semiconductor light emitting layer is attached to the first semiconductor light emitting layer through an adhesive layer. 所定の光を放出させる第1の半導体発光層を形成し、Forming a first semiconductor light emitting layer that emits predetermined light;
前記第1の半導体発光層とは異なる結晶系からなる半導体層から構成され、前記第1の半導体発光層からの光によって励起されて光を放出するための第2の半導体発光層を形成し、A second semiconductor light-emitting layer that is formed of a semiconductor layer made of a different crystal system from the first semiconductor light-emitting layer and is excited by light from the first semiconductor light-emitting layer to emit light;
前記第2の半導体発光層側を前記第1の半導体発光層側に貼り合わせ、Bonding the second semiconductor light emitting layer side to the first semiconductor light emitting layer side,
前記第1の半導体発光層からの発光波長と前記第2の半導体発光層からの発光波長が異なる、ことを特徴とする半導体発光素子の製造方法。A method of manufacturing a semiconductor light emitting element, wherein an emission wavelength from the first semiconductor light emitting layer and an emission wavelength from the second semiconductor light emitting layer are different.
前記第2の半導体発光層は基板上に積層されて形成され、前記半導体構造部に貼り合わせる際に前記第2の半導体発光層は前記基板から剥離されることを特徴とする請求項35記載の半導体発光素子の製造方法。The said 2nd semiconductor light emitting layer is laminated | stacked and formed on a board | substrate, and when bonding together to the said semiconductor structure part, the said 2nd semiconductor light emitting layer is peeled from the said board | substrate, 36. A method for manufacturing a semiconductor light emitting device. 前記第2の半導体発光層の前記基板からの剥離は、レーザーアブレーションによって行われることを特徴とする請求項35記載の半導体発光素子の製造方法。36. The method of manufacturing a semiconductor light emitting element according to claim 35, wherein the second semiconductor light emitting layer is peeled from the substrate by laser ablation. 前記第2の半導体発光層の前記基板からの剥離は、エッチングによって前記基板を除去することで行われることを特徴とする請求項35記載の半導体発光素子の製造方法。36. The method of manufacturing a semiconductor light emitting element according to claim 35, wherein the second semiconductor light emitting layer is peeled off from the substrate by removing the substrate by etching. 所定の光を放出させる第1の半導体発光層を有する半導体構造部を複数形成し、Forming a plurality of semiconductor structure portions having a first semiconductor light emitting layer for emitting predetermined light;
その複数個の半導体構造部のうちの一部に、前記第1の半導体発光層からの光によって励起されて光を放出する前記第1の半導体発光層とは異なる結晶系からなる半導体層から構成される第2の半導体発光層側を、前記第1の半導体発光層側に貼り合わせてなり、A part of the plurality of semiconductor structure portions includes a semiconductor layer made of a crystal system different from that of the first semiconductor light emitting layer that is excited by light from the first semiconductor light emitting layer and emits light. The second semiconductor light emitting layer side to be bonded to the first semiconductor light emitting layer side,
前記第1の半導体発光層からの発光波長と前記第2の半導体発光層からの発光波長が異なる、ことを特徴とする半導体発光装置。A semiconductor light emitting device, wherein an emission wavelength from the first semiconductor light emitting layer is different from an emission wavelength from the second semiconductor light emitting layer.
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WO2000076005A1 (en) * 1999-06-04 2000-12-14 Trustees Of Boston University Photon recycling semiconductor multi-wavelength light-emitting diodes
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