JP2012054045A - X-ray irradiation device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an X-ray irradiation device, which is operable to stably apply X rays to an object to be irradiated while suppressing the change of the distance between a focal point of the X rays and the object to be irradiated.SOLUTION: An X-ray irradiation device 1 includes: an electron-emission part 2; a target part T including a base plate 21 and a target body 23 buried in the base plate 21 and made of a material which generates X rays in response to incidence of electrons; a bellows BE; a top plate 20; and a holding part 30. The electron-emission part 2 has an electron gun 3, and a cylindrical part 5 which houses the electron gun 3 and includes an electron path 11, the inside of which is to be kept in a vacuum condition in operation. The bellows BE connects between the target part T and the electron-emission part 2, has elasticity, and defines a space which communicates with the electron path 11 and is to be kept in a vacuum condition. In the bellows, at least a part facing the space has electrical conductivity. The holding part 30 serves to hold an object to be irradiated with X rays generated by the target body. The top plate 20 has a reference plane on which the target part T and the holding part 30 are provided.

Description

  The present invention relates to an X-ray irradiation apparatus.

  As an X-ray irradiation apparatus, an electron gun unit that emits electrons, and a housing that contains the electron gun unit and includes an electron passage through which electrons emitted from the electron gun unit pass and that maintains a vacuum state It is known to have an electron emitting portion, a target portion including a substrate and a target body made of a material that is embedded in the substrate and generates X-rays upon incidence of electrons, and a holding portion that holds an irradiated object. (For example, refer to Patent Document 1).

JP 2004-028845 A Japanese Utility Model Publication No. 06-035953 JP 2002-286900 A JP 2002-323462 A (Patent No. 4484412) JP 2005-276760 A

  In the X-ray irradiation apparatus, electrons emitted from the electron gun unit are incident on the target body, X-rays are emitted from the target body, and the irradiated object is irradiated with the X-rays. The distance to the object to be irradiated may change. As a factor, there is an influence of thermal expansion of constituent members of the apparatus. For example, since the target body is held in the casing of the electron emission unit, when the casing is thermally expanded, the target body is moved correspondingly to move the focal point of the X-ray, and the irradiated object is held. The influence such as the movement of the irradiated object may be considered due to the thermal expansion of the holding portion. If the distance between the X-ray focal point and the object to be irradiated changes, the resolution at the time of capturing an X-ray image by X-ray irradiation is significantly deteriorated.

  The present invention provides an X-ray irradiation apparatus capable of stably irradiating an object to be irradiated with X-rays by suppressing a change in the distance between the focal point of the X-ray and the object to be irradiated. With the goal.

  An X-ray irradiation apparatus according to the present invention includes an electron gun part that emits electrons, an electron gun part that accommodates the electron gun part, and an electron passage through which electrons emitted from the electron gun part pass, and a vacuum state is maintained. A target unit including a substrate and a target body made of a material that is embedded in the substrate and generates X-rays upon incidence of electrons, and a coupling that couples the target unit and the electron emission unit. A holding part that holds the irradiated object that is disposed to face the target body and is irradiated with X-rays generated from the target body, and an installation part that has a reference surface on which the target part and the holding part are provided. The coupling portion defines a space that is continuous with the electron path and is maintained in a vacuum state and has elasticity, and at least a portion facing the space has conductivity. To do.

  In the X-ray irradiation apparatus according to the present invention, the target unit and the holding unit are provided on the same reference plane, and the change in the distance between the target unit and the holding unit is suppressed. For this reason, it can suppress that the distance between the focus of X-rays and a to-be-irradiated object changes, and can irradiate a to-be-irradiated object stably.

  In the present invention, the coupling unit that couples the target unit and the electron emission unit defines a space that is continuous with the electron path and maintains a vacuum state, and at least a portion facing the space has conductivity. Therefore, the irradiation of electrons to the target portion (target body) is not hindered. In addition, since the coupling portion has elasticity, even if the distance between the electron emitting portion and the target portion changes due to thermal expansion of the electron emitting portion (for example, a housing), the change in this distance. Can be absorbed by the joint.

  The installation unit may include a movement mechanism that moves the target unit relative to the reference plane, and the target unit may be provided in the installation unit via the movement mechanism. In this case, the position of the target unit with respect to the reference surface is adjusted by the moving mechanism, and the distance between the focal point of the X-ray and the irradiated object can be finely adjusted. As a result, the object can be irradiated with X-rays more stably.

  The coupling portion may have flexibility. In this case, the coupling portion does not hinder the movement of the target portion in the direction intersecting the electron incident axis, and the positional relationship between the electron beam and the target portion can be adjusted appropriately. For this reason, it is possible to irradiate the irradiated object with X-rays more stably.

  The installation unit may include a plate-like member fixed to the electron emission unit, and one main surface of the plate-like member may be a reference surface. In this case, the electron emission portion and the plate-like member are integrated, and fluctuations in the positional relationship between the electron emission portion and the plate-like member are suppressed. For this reason, it is possible to irradiate the irradiated object with X-rays more stably.

  The installation portion may include a support member that is separated from the electron emission portion, and a plate-like member that is fixed to the support member, and one main surface of the plate-like member may be a reference surface. In this case, since the electron emission portion and the support member are separated from each other, the heat of the electron emission portion is suppressed from being transmitted to the support member and the plate-like member. For this reason, the change of the distance between the focus of X-rays and the irradiated object is further suppressed, and the irradiated object can be irradiated with X-rays more stably.

  The installation part may be arrange | positioned at the side of the target part. In this case, the reference plane (installation part) is positioned in the vicinity of the target part and the holding part, and the target part and the holding part can be stably provided on the installation part. For this reason, it is possible to irradiate the irradiated object with X-rays more stably.

  ADVANTAGE OF THE INVENTION According to this invention, the X-ray irradiation apparatus which suppresses that the distance between the focus of X-rays and a to-be-irradiated object changes, and can irradiate a to-be-irradiated object stably is provided. can do.

It is a schematic block diagram which shows the X-ray irradiation apparatus which concerns on this embodiment. It is a figure which shows the structure of a target part. It is a schematic block diagram which shows the X-ray irradiation apparatus which concerns on the modification of this embodiment.

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the description, the same reference numerals are used for the same elements or elements having the same function, and redundant description is omitted.

  First, the configuration of the X-ray irradiation apparatus according to the present embodiment will be described with reference to FIG. FIG. 1 is a schematic configuration diagram illustrating an X-ray irradiation apparatus according to the present embodiment.

  The X-ray irradiation apparatus 1 includes a target unit T, an electron gun unit 3, a cylindrical unit 5 (housing), a top plate 20, a bellows BE, and a holding unit 30. The X-ray irradiation apparatus 1 is an open type. Unlike the sealed type for disposable use, the open type can arbitrarily create a vacuum state, and the target unit T, the cathode of the electron gun unit 3 and the like can be exchanged. The electron gun unit 3 emits electrons. An electron beam EB is formed by electrons emitted from the electron gun unit 3.

  The cylindrical portion 5 has a cylindrical shape and is made of stainless steel. The inside of the cylindrical part 5 is kept in a vacuum state during operation. In the X-ray irradiation apparatus 1, the electron gun part 3 and the cylindrical part 5 that accommodates the electron gun part 3 in the inside constitute the electron emission part 2. The cylindrical portion 5 includes a fixed portion 5a located on the lower side and an attaching / detaching portion 5b located on the upper side. The detachable part 5b is attached to the fixed part 5a via a hinge (not shown). Therefore, the upper part of the fixed part 5a can be opened by rotating the detachable part 5b so as to lie down through the hinge. Thereby, access to the electron gun part 3 (cathode) accommodated in the fixed part 5a becomes possible.

  In the detachable portion 5b, a cylindrical coil portion 7 that functions as a focusing lens and a cylindrical coil portion 9 that functions as a deflection coil (electron beam deflection portion) are provided. An electron passage 11 extends in the longitudinal direction of the cylindrical portion 5 so as to pass through the centers of the coil portions 7 and 9 in the detachable portion 5b. The electron passage 11 is surrounded by the coil portions 7 and 9. The disk plate 13 is fixed to the lower end of the detachable portion 5b so as to cover it. At the center of the disk plate 13, an electron introduction hole 13 a that matches the lower end side of the electron passage 11 is formed. The upper end of the detachable part 5b is formed in a truncated cone.

  A vacuum pump 17 is fixed to the fixing portion 5a. The vacuum pump 17 makes the whole cylindrical part 5 a high vacuum state. When the X-ray irradiation apparatus 1 is equipped with the vacuum pump 17, the target unit T, the cathode, and the like can be exchanged.

  A mold power supply unit 19 that is integrated with the electron gun unit 3 is fixed to the base end side of the cylindrical unit 5. The mold power supply unit 19 is molded with an electrically insulating resin (for example, epoxy resin) and is housed in a metal case.

  In the mold power supply unit 19, a high voltage generation unit (not shown) is enclosed. The high voltage generator includes a transformer that generates a high voltage (for example, a maximum of −160 kV when the target unit T is grounded). The mold power supply unit 19 includes a block-shaped power supply main body portion 19a that is located on the lower side and forms a rectangular parallelepiped shape, and a columnar neck portion 19b that protrudes upward from the power supply main body portion 19a into the fixed portion 5a. Become.

  The high voltage generator is enclosed in the power supply main body 19a. An electron gun unit 3 arranged so as to face the target unit T so as to sandwich the electron path 11 is attached to the tip of the neck portion 19b. An electron emission control unit (not shown) electrically connected to the high voltage generation unit is enclosed in the power supply main body 19a of the mold power supply unit 19. The electron emission control unit is connected to the electron gun unit 3 and controls electron emission timing, tube current, and the like.

  A top plate 20 as an installation part is provided at the top of the detachable part 5b of the cylindrical part 5 (the tip part of the electron emission part 2). The top plate 20 is a plate-like member, and has a first main surface 20a and a second main surface 20b facing each other. The top plate 20 is fixed to the detachable portion 5b by screwing or the like with the second main surface 20b as the detachable portion 5b (electron emitting portion 2) side. The top plate 20 is disposed on the side of the target unit T. In the top plate 20, an opening 20 c is formed at a position corresponding to the electron passage 11 to accommodate the bellows BE that passes electrons toward the target portion T. The first major surface 20a functions as a reference surface.

  The first main surface 20a of the top plate 20 is provided with a first XYZ stage ST1 as a moving mechanism. The first XYZ stage ST1 is not only in the electron emission direction of the electron gun unit 3, that is, in the Z-axis direction, but also in the X-axis direction orthogonal to the Z-axis direction, and the Y-axis direction orthogonal to the Z-axis direction and the X-axis direction. Move the movable base. A target portion T is fixed to the movable base of the first XYZ stage ST1 via a fixing jig FX. Thereby, the target part T will be provided in the top plate 20 via 1st XYZ stage ST1. The position of the target portion T (target body 23 described later) can be adjusted by the first XYZ stage ST1. The fixing jig FX is made of stainless steel, alumina, or the like.

  As shown in FIG. 2, the target unit T includes a substrate 21 and a target body 23 embedded in the substrate 21. The target body 23 is made of a material that generates X-rays upon incidence of electrons. The substrate 21 is made of a material excellent in X-ray transparency and heat dissipation, such as diamond, and has a plate shape. The substrate 21 has first and second main surfaces 21a and 21b facing each other. The diameter of the substrate 21 is set to about 3 mm, for example. The thickness of the substrate 21 is set to about 100 μm, for example.

  The target body 23 is located on the first main surface 21 a side of the substrate 21. The target body 23 is formed in a cylindrical shape with a metal (for example, tungsten, gold, platinum, or the like) made of a material different from that of the substrate 21 and has a nano size (for example, an outer diameter of about 100 nm). In the present embodiment, tungsten (W) is adopted as the metal of the target body 23. The length (height) of the target body 23 is set to about 1000 nm, for example, and does not penetrate the substrate 21 on the second main surface 21b side. The target body 23 is arranged so that the first main surface 21 a faces the electron gun unit 3.

  The target portion T and the cylindrical portion 5 (detachable portion 5b) are coupled by a bellows BE as a coupling portion. The bellows BE defines a space that is continuous with the electron passage 11 and is maintained in a vacuum state, and has elasticity with respect to the electron emission direction (Z-axis direction) of the electron gun unit 3. The bellows BE also has flexibility. As a result, the bellows BE can move not only in the Z-axis direction but also in a direction orthogonal to the Z-axis direction.

  The bellows BE is made of stainless steel, and a portion that continues to the electron passage 11 and faces a space in which a vacuum state is maintained has conductivity. Thereby, it is possible to prevent the bellows BE from being charged by scattered electrons or the like. The bellows BE does not need to have conductivity as a whole, and at least a portion facing the space only needs to have conductivity. The bellows BE is preferably made of a nonmagnetic material so as not to affect the magnetic field lens formed by the coil portion 7. The bellows BE and the target portion T (substrate 21) are joined by brazing or the like. The bellows BE and the cylindrical portion 5 (detachable portion 5b) are joined so as to be replaceable (detachable) by a joining member such as a screw, with a sealing member such as an O-ring interposed therebetween. The total length of the bellows BE is set to about 10 mm, for example. As described above, in the X-ray irradiation apparatus 1, the electron gun unit 3, the cylindrical unit 5, the target unit T, the bellows BE, and the like constitute an X-ray generation unit.

  A second XYZ stage ST <b> 2 is provided on the first main surface 20 a of the top plate 20. Similarly to the first XYZ stage ST1, the second XYZ stage ST2 includes not only the electron emission direction of the electron gun unit 3, that is, the Z-axis direction, the X-axis direction orthogonal to the Z-axis direction, and the Z-axis direction and the X-axis direction. The movable table is also moved in the Y-axis direction that is orthogonal. A holding unit 30 is fixed to the movable stage of the second XYZ stage ST2. As a result, the position of the holding unit 30 (object to be irradiated SM) can be adjusted by the second XYZ stage ST2. The first and second XYZ stages ST1, ST2 are known to those skilled in the art, and a detailed description of their configurations is omitted.

  The holding unit 30 holds the irradiated object SM to which X-rays generated from the target body 23 are irradiated. The irradiated object SM is arranged so as to face the target body 23 by being held by the holding unit 30.

  Subsequently, an observation procedure of the irradiation object SM using the X-ray irradiation apparatus 1 will be described.

  First, the coil unit 7 and the electron gun unit 3 are operated, and the coil unit 7 is adjusted so that the diameter of the irradiation field of the electron beam EB is about 10 μm. Then, the movable base is moved by the first XYZ stage ST1, and the target body 23 is moved into the irradiation field of the electron beam EB. In this embodiment, a target body 23 made of tungsten is embedded in a substrate 21 made of diamond. Tungsten has a higher mass number than diamond. For this reason, the position of the target body 23 can be determined by a change in the secondary electron emission ratio, the absorbed current amount, the target current, or the like. In addition, a mark (for example, an arrow or a double or triple circle) indicating the position of the target body 23 may be formed on the substrate 21 with a material such as tungsten.

  Next, the diameter of the irradiation field of the electron beam EB is reduced to about 100 nm by the coil unit 7. Thereafter, the coil unit 9 is operated to determine the position of the target body 23, and the target body 23 is irradiated with the electron beam EB. As a result, X-rays are output. The procedure for obtaining the position of the target body 23 can be performed based on the change in the secondary electron emission ratio, the absorption current amount, the target current, or the like described above.

  On the other hand, the irradiated object SM is fixed to the holding unit 30. Then, by using the second XYZ stage ST2, the distance between the electron emission unit 2 and the irradiation object SM is set to 10 mm, for example, and an observation site in the irradiation object SM is searched. Thereafter, the distance between the electron emission unit 2 and the object SM is set to 0.5 mm, for example, and the object SM is observed.

  By the way, the electron beam EB is focused by a focusing lens (electron lens) formed by the coil unit 7 so that the beam diameter is about 100 nm on the substrate 21. In order to reliably irradiate the nano-sized target body 23 with the fine electron beam EB and generate X-rays, it is necessary to precisely match the center of the coil portion 7 and the position of the target body 23. The position of the electron beam EB on the substrate 21 is adjusted by the coil unit 9, but the adjustment range by the coil unit 9 is about ± 50 μm. For this reason, in order to set the position of the target body 23 within the adjustment range by the coil unit 9, that is, to place the target body 23 on the central axis of the focusing lens, a position adjusting mechanism is required. Further, when the electron passes through the central axis of the focusing lens by the adjustment by the position adjusting mechanism, it is difficult to be influenced by the aberration of the focusing lens, so that the beam diameter on the target body 23 can be easily reduced. The first XYZ stage ST1 functions as this position adjustment mechanism.

  The position of the irradiation object SM is set by moving the irradiation object SM in the X-axis and Y-axis directions by the second XYZ stage ST2. The magnification M (= x1 / x2) is determined by moving the irradiation object SM in the Z-axis direction by the second XYZ stage ST2. Here, x1 is the distance between the focus of X-rays (target body 23) and the imaging device (not shown). x2 is the distance between the X-ray focal point (target body 23) and the irradiation object SM.

  The resolution of the X-ray irradiation apparatus 1 is determined by the focal size of the X-ray when the magnification factor M can be arbitrarily set. For example, in order to obtain a resolution of about 100 nm, it is necessary to set the X-ray focal spot size to 100 nm. Further, during observation, the distance between the focus of the X-ray and the object SM needs to be fixed with an accuracy of 100 nm. In the present embodiment, the target portion T (target body 23) is provided on the first main surface 20a of the top plate 20 via the first XYZ stage ST1, and the holding portion 30 is provided via the second XYZ stage ST2. Yes. Thus, since the target part T (target body 23) and the holding part 30 are indirectly integrated, the distance between the focal point of the X-ray and the irradiated object SM is fixed with an accuracy of 100 nm or less. It becomes. If the positional relationship between the focal point of the X-ray and the irradiation object SM is fixed, the position resolution of the X-ray image can be obtained even if the absolute position of the first main surface 20a of the top plate 20, that is, the reference surface is fluctuated. Is maintained.

  As described above, according to the present embodiment, the target portion T and the holding portion 30 are provided on the same first main surface 20a, and a change in the interval between the target portion T and the holding portion 30 is suppressed. The For this reason, it can suppress that the space | interval of the focus of X-ray | X_line and the to-be-irradiated object SM changes, and can irradiate the to-be-irradiated object SM stably.

  Moreover, the bellows BE has elasticity. For this reason, even if the interval between the cylindrical portion 5 and the target portion T changes due to thermal expansion of the electron emitting portion 2 (for example, the cylindrical portion 5), the bellows BE absorbs the change in the interval. Can do. Moreover, when the space | interval of the cylindrical part 5 and the target part T changes by the thermal expansion etc. of the top plate 20 (in other words, the 1st main surface 20a (namely, reference surface) of the cylindrical part 5 and the top plate 20). In the case where the distance between the bellows BE is changed), the bellows BE can absorb the change in the distance.

  Note that when the absolute position of the reference plane changes, the absolute position of the target portion T also changes, so the distance x1 changes, and it can be said that the enlargement ratio M changes. However, since the distance x1 is actually very large compared to the distance x2, its influence is small. For example, when the distance x1 is 500 mm and the distance x2 is 0.5 mm and the enlargement ratio is 1000 times, even if the distance x1 is changed to be 50 μm larger, the enlargement ratio is only 1000.1 times. Can be ignored.

  In general, when the absolute position of the target portion changes, the incident condition of the electron beam on the target body, in particular, the beam diameter of the electron beam incident on the target body changes. For this reason, the focal diameter of X-rays may also change. On the other hand, in the present embodiment, since the target body 23 formed in a columnar shape is embedded in the substrate 21, the diameter of the target body 23 directly reflects the diameter of the X-ray focal point. Therefore, if the electron beam EB is incident on the target body 23, even if the absolute position of the target portion T changes, the possibility that the focal diameter of the X-rays changes is low.

  Further, the bellows BE defines a space that is continuous with the electron path and is maintained in a vacuum state, and at least a portion facing the space has conductivity, so that the target portion T (target body 23) is connected to the bellows BE. It does not interfere with electron irradiation.

  In the present embodiment, the target portion T is provided on the first main surface 20a of the top plate 20 via the first XYZ stage ST1. As a result, the position of the target portion T with respect to the first main surface 20a is adjusted, and fine adjustment of the distance between the focal point of the X-rays and the irradiated object SM becomes possible. As a result, the irradiated object SM can be irradiated with X-rays more stably. Furthermore, the position of the target portion T can be adjusted so that the target body 23 is disposed on the central axis of the focusing lens of the electron beam EB. For this reason, electrons can be focused on a small focal diameter without being affected by the aberration of the focusing lens.

  The bellows BE has not only stretchability but also flexibility. Accordingly, the bellows BE does not hinder the movement of the target portion T in the direction intersecting the electron beam EB, and the electron beam EB is appropriately incident on the minute target body 23 in particular. As described above, the positional relationship between the electron beam EB and the target portion T can be adjusted appropriately. Therefore, the object SM can be irradiated with X-rays more stably.

  The top plate 20 is fixed to the cylindrical portion 5. Thereby, the cylindrical part 5 and the top plate 20 become united, and it is suppressed that the positional relationship of the cylindrical part 5 and the top plate 20 fluctuates. In this embodiment, since the top plate 20 is fixed to the tip of the cylindrical portion 5, the change in the interval between the cylindrical portion 5 and the target portion T due to the thermal expansion of the cylindrical portion 5 is minimized. And the change in the incident state of the electron beam EB on the target body 23 can be suppressed. Therefore, the object SM can be irradiated with X-rays more stably. Moreover, the whole apparatus of the X-ray irradiation apparatus 1 can also be reduced in size.

  The top plate 20 is disposed on the side of the target unit T. Thereby, the 1st main surface 20a will be located in the vicinity of the target part T and the holding | maintenance part 30, and the target part T and the holding | maintenance part 30 can be provided in the top plate 20 stably. Furthermore, since the top plate 20 can be reduced in size, the change of the space | interval of the cylindrical part 5 and the target part T by the thermal expansion of the top plate 20 can be suppressed. As a result, the irradiated object SM can be irradiated with X-rays more stably.

  In the X-ray fluoroscopic apparatus described in Patent Document 4, even if the sample moves due to thermal expansion / contraction of the sample stage by driving the heater, the sample stage is moved so as to cancel the movement. Has been. In this case, means for detecting thermal expansion / contraction of the sample stage and means for driving the sample stage based on the detection result by the means are required. On the other hand, in this embodiment, the top plate 20 is provided, and a very simple configuration in which the target portion T and the holding portion 30 are provided on the same first main surface 20a of the top plate 20 is adopted. Yes. Therefore, in this embodiment, without requiring complicated control or the like, the distance between the focal point of the X-rays and the object SM is suppressed, and the X-ray is stably applied to the object SM. Can be irradiated.

  Next, with reference to FIG. 3, the structure of the X-ray irradiation apparatus which concerns on the modification of this embodiment is demonstrated. FIG. 3 is a schematic configuration diagram illustrating an X-ray irradiation apparatus according to a modification of the present embodiment. The modification shown in FIG. 3 is different from the above-described embodiment in that the top plate 20 is fixed to the electron emitting portion 2 (tubular portion 5) and a separate support member.

  The top plate 20 is fixed to a support member 40 separated from the electron emitting portion 2 by screwing or the like. The support member 40 is separate from the electron emission unit 2 and is erected on a pedestal on which the electron emission unit 2 is installed. In the top plate 20, an opening 20d is formed at a position corresponding to the irradiation object SM to allow X-rays that pass through the irradiation object SM and go to the imaging device (not shown). The fixing jig FX is provided on the movable base of the first XYZ stage ST1 via the spacer SP. The spacer SP is not always necessary, and the fixing jig FX may be directly provided on the movable base of the first XYZ stage ST1.

  Also in this modified example, since the target portion T (target body 23) and the holding portion 30 are indirectly integrated, the distance between the X-ray focal point and the irradiation object SM is fixed with an accuracy of 100 nm or less. The Rukoto.

  In this modification, since the cylindrical part 5 which comprises the electron emission part 2 and the support member 40 are spaced apart, it is suppressed that the heat of the cylindrical part 5 is transmitted to the support member 40 and the top plate 20. That is, while the thermal expansion in the cylindrical part 5 is absorbed by the bellows BE, the heat of the cylindrical part 5 is suppressed from being transmitted to the support member 40 and the top plate 20, so that the focal point of X-rays and the irradiation are performed. The change in the distance to the object SM is further suppressed, and the object SM can be irradiated with X-rays more stably. Furthermore, since the absolute position of the target portion T can be maintained, a change in the incident state of the electron beam EB on the target body 23 can be suppressed.

  The preferred embodiments of the present invention have been described above. However, the present invention is not necessarily limited to the above-described embodiments, and various modifications can be made without departing from the scope of the present invention.

  Normally, once the position of the target body 23 adjusted by the first XYZ stage ST1 is aligned with the center of the coil portion 7, that state is maintained. Accordingly, the moving mechanism for moving the target portion T has four horizontally opposed screws instead of the first XYZ stage ST1, and uses a mechanism for adjusting the position of the target portion T by pushing and pulling these screws. May be.

  DESCRIPTION OF SYMBOLS 1 ... X-ray irradiation apparatus, 2 ... Electron emission part, 3 ... Electron gun part, 5 ... Cylindrical part, 7 ... Coil part, 9 ... Coil part, 11 ... Electron passage, 17 ... Vacuum pump, 19 ... Mold power supply part 20 ... top plate, 20a ... first main surface, 20b ... second main surface, 21 ... substrate, 23 ... target body, 30 ... holding portion, 40 ... support member, BE ... bellows, SM ... irradiated object, ST1 ... 1st XYZ stage, ST2 ... 2nd XYZ stage, T ... Target part.

Claims (6)

An electron gun unit that emits electrons, and a housing that contains the electron gun unit and includes an electron passage through which electrons emitted from the electron gun unit pass and that maintains a vacuum state; ,
A target unit including a substrate and a target body embedded in the substrate and made of a material that generates X-rays upon incidence of electrons;
A coupling unit coupling the target unit and the electron emitting unit;
A holding unit that is disposed to face the target body and holds an object to be irradiated with X-rays generated from the target body;
An installation part having a reference surface on which the target part and the holding part are provided;
The coupling portion defines a space that is continuous with the electron passage and is maintained in a vacuum state, and has elasticity, and at least a portion facing the space has conductivity. X-ray irradiation apparatus. The installation part has a moving mechanism for moving the target part relative to the reference plane,
The X-ray irradiation apparatus according to claim 1, wherein the target unit is provided in the installation unit via the moving mechanism.   The X-ray irradiation apparatus according to claim 1, wherein the coupling portion has flexibility. The installation part has a plate-like member fixed to the electron emission part,
The X-ray irradiation apparatus according to claim 1, wherein one main surface of the plate-shaped member is the reference surface. The installation portion has a support member spaced from the electron emission portion, and a plate-like member fixed to the support member,
The X-ray irradiation apparatus according to claim 1, wherein one main surface of the plate-shaped member is the reference surface.   The X-ray irradiation apparatus according to claim 1, wherein the installation unit is arranged on a side of the target unit.

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