JP2012036478A - Substrate coating material for forming metallic film by electroless plating method, method for making coating film layer for plating substrate, method for manufacturing plated product - Google Patents

Substrate coating material for forming metallic film by electroless plating method, method for making coating film layer for plating substrate, method for manufacturing plated product Download PDF

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JP2012036478A
JP2012036478A JP2010179623A JP2010179623A JP2012036478A JP 2012036478 A JP2012036478 A JP 2012036478A JP 2010179623 A JP2010179623 A JP 2010179623A JP 2010179623 A JP2010179623 A JP 2010179623A JP 2012036478 A JP2012036478 A JP 2012036478A
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fine particles
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Tadashi Ishiguro
正 石黒
Miho Sekiya
美穂 関谷
Junichi Harasawa
純一 原澤
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Achilles Corp
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Abstract

PROBLEM TO BE SOLVED: To solve the following problem: conventional coating material into which polymer fine particles are dispersed, has been difficult to be applied to a printing method used as a printing method originally using water-based ink such as ink jet printing, offset printing, gravure offset printing and flexographic printing, since the conventional coating material uses an organic solvent as a solvent, and the development of a coating material using water as a solvent is therefore desired from a viewpoint of reduction in an environmental load.SOLUTION: The substrate coating material is used for forming a metallic film on a base material by an electroless plating method. The substrate coating material contains: polymer fine particles having a π-conjugated double bond; a binder; and a water solvent.

Description

本発明は、無電解めっき法により金属膜を形成するための下地塗料、めっき下地用塗膜層の製造方法、めっき物の製造方法に関するものである。   The present invention relates to a base coating for forming a metal film by an electroless plating method, a method for manufacturing a coating layer for a plating base, and a method for manufacturing a plated article.

近年、環境問題の観点から金属膜のパターニング法として、エッチングにより必要な部分を除去するサブトラクティブ方式から、必要な部分にのみ金属膜を形成するフルアディティブ方式が検討されるようになった。そして、フルアディティブ方式として、例えば特許文献1に記載の方法が提案されている。
特開2007−270180号公報
In recent years, as a method for patterning a metal film from the viewpoint of environmental problems, a full additive method in which a metal film is formed only on a necessary portion has been studied from a subtractive method in which a necessary portion is removed by etching. As a full additive system, for example, a method described in Patent Document 1 has been proposed.
JP 2007-270180 A

ところが、特許文献1におけるポリマー微粒子が分散された塗料は、溶媒としては有機溶媒が使用されている。そのため、元来水系インクの印刷法として用いられてきた印刷法、例えば、インクジェット印刷、オフセット印刷、グラビアオフセット印刷、フレキソ印刷などへは適用し難いものであった。また、環境負荷の低減から溶媒として水を用いた該塗料の開発が望まれている。   However, an organic solvent is used as a solvent in the coating material in which polymer fine particles are dispersed in Patent Document 1. For this reason, it has been difficult to apply to printing methods that have been originally used as printing methods for water-based inks, such as inkjet printing, offset printing, gravure offset printing, flexographic printing, and the like. In addition, development of the paint using water as a solvent is desired in order to reduce environmental burden.

そこで本発明は、上記課題に鑑みてなされたものであり、具体的には、
(1)基材上に無電解めっき法により金属膜を形成するための下地塗料であって、前記下地塗料は、π−共役二重結合を有する高分子微粒子、バインダー、水溶媒を含んでなることを特徴とする下地塗料、
(2)前記高分子微粒子が、導電性高分子微粒子である前記(1)記載の下地塗料、
(3)前記高分子微粒子が、還元性高分子微粒子である前記(1)記載の下地塗料、
(4)前記還元性高分子微粒子が、導電性高分子微粒子とバインダーとが水溶媒に分散している分散液中の導電性高分子微粒子を脱ドープ処理して還元性としたことを特徴とする前記(3)記載の下地塗料、
(5)基材上に、前記(2)記載の下地塗料を塗工し、これにより形成された塗膜層中の導電性高分子微粒子を脱ドープ処理して還元性としたことを特徴とするめっき下地用塗膜層の製造方法、
(6)基材上に、前記(3)または(4)記載の下地塗料を塗工し、これにより形成されたことを特徴とするめっき下地用塗膜層の製造方法、
(7)前記(5)または(6)記載のめっき下地用塗膜層上に、無電解めっき液から金属膜を化学めっきすることを特徴とするめっき物の製造方法に関するものである。
Therefore, the present invention has been made in view of the above problems, and specifically,
(1) A base coating for forming a metal film on a substrate by an electroless plating method, the base coating comprising polymer fine particles having a π-conjugated double bond, a binder, and an aqueous solvent. Base paint, characterized by
(2) The base coating material according to (1), wherein the polymer fine particles are conductive polymer fine particles,
(3) The base coating material according to (1), wherein the polymer fine particles are reducing polymer fine particles,
(4) The reducing polymer fine particle is characterized in that the conductive polymer fine particle in the dispersion in which the conductive polymer fine particle and the binder are dispersed in an aqueous solvent is dedoped to be reduced. The base paint according to (3),
(5) The substrate paint described in the above (2) is applied on a substrate, and the conductive polymer fine particles in the coating layer formed thereby are dedoped to be reduced. A method for producing a coating layer for a plating base,
(6) A method for producing a coating layer for a plating base, which is formed by applying the base paint according to (3) or (4) above on a substrate,
(7) The present invention relates to a method for producing a plated product, characterized in that a metal film is chemically plated from an electroless plating solution on the coating layer for plating base described in (5) or (6).

本発明により、元来水系インクの印刷法として用いられてきた印刷法、例えば、インクジェット印刷、オフセット印刷、グラビアオフセット印刷、フレキソ印刷などへの適用を可能にした塗料を得ることが出来た。また、環境負荷の低減から溶媒として水を用いた塗料を得る事が出来た。   According to the present invention, it is possible to obtain a paint that can be applied to a printing method that has been originally used as a printing method for water-based ink, for example, inkjet printing, offset printing, gravure offset printing, flexographic printing, and the like. Moreover, the paint which used water as a solvent was able to be obtained from the reduction of environmental impact.

更に詳細に本発明を説明する。
本発明の下地塗料は、π−共役二重結合を有する高分子微粒子、バインダー、水溶媒を含でなるものである。
The present invention will be described in more detail.
The undercoat of the present invention comprises polymer fine particles having a π-conjugated double bond, a binder, and an aqueous solvent.

本発明に使用するπ−共役二重結合を有する高分子微粒子としては、導電性高分子微粒子、或いは還元性高分子微粒子が挙げられる。   Examples of the polymer fine particles having a π-conjugated double bond used in the present invention include conductive polymer fine particles or reducing polymer fine particles.

前記導電性高分子微粒子とは、π−共役二重結合を有する高分子であり、かつπ−共役二重結合を有するモノマーを重合させてπ−共役二重結合を有する高分子を得る際、その重合液中にドーパントを添加して得られる高分子、或いは重合後にドーパントを添加して得られる高分子である。つまり、π共役二重結合を有するモノマーの重合液中、或いは重合後にドーパントを添加して得られるπ−共役二重結合を有する高分子であれば特に限定されないが、例えば、ポリアセチレン、ポリアセン、ポリパラフェニレン、ポリパラフェニレンビニレン、ポリピロール、ポリアニリン、ポリチオフェン及びそれらの各種誘導体が挙げられ、好ましくは、ポリピロールが挙げられる。
導電性高分子微粒子は、π−共役二重結合を有するモノマーから合成して使用する事ができるが、市販で入手できる導電性高分子微粒子を使用することもできる。また、導電性高分子微粒子を製造するための具体的な方法は、例えば特開2004−256686号に記載されている方法で導電性高分子微粒子を製造することが出来る。
The conductive polymer fine particle is a polymer having a π-conjugated double bond, and when a polymer having a π-conjugated double bond is obtained by polymerizing a monomer having a π-conjugated double bond, A polymer obtained by adding a dopant to the polymerization solution, or a polymer obtained by adding a dopant after polymerization. In other words, the polymer is not particularly limited as long as it is a polymer having a π-conjugated double bond obtained by adding a dopant in a polymerization solution of a monomer having a π-conjugated double bond or after polymerization, for example, polyacetylene, polyacene, poly Examples include paraphenylene, polyparaphenylene vinylene, polypyrrole, polyaniline, polythiophene, and various derivatives thereof, preferably polypyrrole.
The conductive polymer fine particles can be synthesized and used from a monomer having a π-conjugated double bond, but commercially available conductive polymer fine particles can also be used. Moreover, the specific method for manufacturing electroconductive polymer microparticles | fine-particles can manufacture electroconductive polymer microparticles, for example by the method described in Unexamined-Japanese-Patent No. 2004-256686.

前記還元性高分子微粒子とは、α)前記導電性高分子微粒子を脱ドープ処理することにより得られるものと、β)π−共役二重結合を有するモノマーを重合させてπ−共役二重結合を有する高分子を得る際、その重合液中にドーパントを添加しないで得られるものとがある。
先ず、α)の還元性高分子微粒子について、例えば、前記導電性高分子微粒子とバインダーとが水溶媒に分散している分散液中の導電性高分子微粒子を脱ドープ処理して得ることが出来る。この脱ドープ処理としては、アルカリ性水溶液、或いは還元剤で処理する方法が挙げられる。なお、アルカリ性水溶液としては、例えば水酸化ナトリウム等が挙げられ、還元剤としては、例えば水素化ホウ素ナトリウム、水素化ホウ素カリウム等の水素化ホウ素化合物、ジメチルアミンボラン、ジエチルアミンボラン、トリメチルアミンボラン、トリエチルアミンボラン等のアルキルアミンボラン、及び、ヒドラジン等を含む溶液が挙げられる。
続いて、β)の還元性高分子微粒子について、π共役二重結合を有するモノマーの重合液中にドーパントを添加しないで得られるπ−共役二重結合を有する高分子である。つまり、前記ドーパントを添加しないで得られるπ−共役二重結合を有する高分子であれば特に限定されないが、例えば、ポリアセチレン、ポリアセン、ポリパラフェニレン、ポリパラフェニレンビニレン、ポリピロール、ポリアニリン、ポリチオフェン及びそれらの各種誘導体が挙げられ、好ましくは、ポリピロールが挙げられる。
なお、還元性高分子微粒子としては、0.01S/cm以下、好ましくは0.005S/cm以下の導電率を有する高分子微粒子が好ましい。
The reducing polymer fine particles are α) obtained by dedoping the conductive polymer fine particles, and β) a monomer having a π-conjugated double bond is polymerized to form a π-conjugated double bond. In some cases, a polymer having the above can be obtained without adding a dopant to the polymerization solution.
First, the reducing polymer fine particles α) can be obtained by, for example, dedoping the conductive polymer fine particles in a dispersion in which the conductive polymer fine particles and the binder are dispersed in an aqueous solvent. . Examples of the dedoping treatment include a treatment with an alkaline aqueous solution or a reducing agent. Examples of the alkaline aqueous solution include sodium hydroxide, and examples of the reducing agent include borohydride compounds such as sodium borohydride and potassium borohydride, dimethylamine borane, diethylamine borane, trimethylamine borane, and triethylamine borane. And a solution containing alkylamine borane such as hydrazine and the like.
Subsequently, the reducing polymer fine particle β) is a polymer having a π-conjugated double bond obtained without adding a dopant to the polymerization liquid of the monomer having a π conjugated double bond. In other words, it is not particularly limited as long as it is a polymer having a π-conjugated double bond obtained without adding the dopant, for example, polyacetylene, polyacene, polyparaphenylene, polyparaphenylene vinylene, polypyrrole, polyaniline, polythiophene and the like. These are various derivatives, and polypyrrole is preferable.
The reducing polymer fine particles are preferably polymer fine particles having a conductivity of 0.01 S / cm or less, preferably 0.005 S / cm or less.

本発明に使用するバインダーとしては、特に限定されるものではないが、例えば、ポリアクリルアミド、ポリビニルアルコール、ポリエチレンオキシド、ポリカルボン酸、ポリアニオン等の水溶性ポリマー、エポキシ樹脂、ウレタン樹脂、メラミン樹脂等の水溶性硬化樹脂、アクリル樹脂、ポリエーテル系ウレタン樹脂、ポリエステル系ウレタン樹脂等のエマルジョンが挙げられる。
使用するバインダー量は、π−共役二重結合を有する高分子微粒子1質量部に対して0.1質量部以上使用することができ、具体的には、π−共役二重結合を有する高分子微粒子1質量部に対して0.1質量部ないし60質量部の範囲である。バインダーが60質量部を超えると金属めっきが析出しにくくなる場合があり、バインダーが0.1質量部未満であると、基材と塗膜層間の密着性が劣る傾向にある。
The binder used in the present invention is not particularly limited, but examples thereof include water-soluble polymers such as polyacrylamide, polyvinyl alcohol, polyethylene oxide, polycarboxylic acid, and polyanion, epoxy resins, urethane resins, melamine resins, and the like. Examples include water-soluble curable resins, acrylic resins, polyether-based urethane resins, and polyester-based urethane resins.
The amount of binder used can be 0.1 parts by mass or more per 1 part by mass of polymer fine particles having π-conjugated double bonds, specifically, a polymer having π-conjugated double bonds. The range is 0.1 to 60 parts by mass with respect to 1 part by mass of the fine particles. If the binder exceeds 60 parts by mass, metal plating may be difficult to precipitate, and if the binder is less than 0.1 parts by mass, the adhesion between the substrate and the coating layer layer tends to be inferior.

本発明の下地塗料は、上記成分に加えて溶媒として水を含んでなる。   The base paint of the present invention comprises water as a solvent in addition to the above components.

更に、前記塗料は用途や塗布対象物等の必要に応じて、分散安定剤、増粘剤、インキバインダ等の樹脂を加えることも可能である。   Furthermore, the coating material can be added with a resin such as a dispersion stabilizer, a thickener, and an ink binder, depending on the application and the application target.

本発明はまた、基材上に、π−共役二重結合を有する高分子微粒子を用いた下地塗料を塗工し、これによりめっき下地用塗膜層を製造することができる。具体的には、π−共役二重結合を有する高分子微粒子として導電性高分子微粒子用いた場合、導電性高分子微粒子を含む下地塗料を塗工し、これにより形成された塗膜層中の導電性高分子微粒子を脱ドープ処理して還元性とし、めっき下地用塗膜層を製造することができる。また、π−共役二重結合を有する高分子微粒子として還元性高分子微粒子用いた場合、還元性高分子微粒子を含む下地塗料を塗工して、めっき下地用塗膜層を製造することができる。   In the present invention, a base coating using polymer fine particles having a π-conjugated double bond can be applied on a substrate, whereby a coating layer for plating base can be produced. Specifically, when conductive polymer fine particles are used as polymer fine particles having a π-conjugated double bond, a base coating material containing conductive polymer fine particles is applied, and the coating layer formed thereby The conductive polymer fine particles can be dedoped to be reducible to produce a coating layer for plating base. In addition, when reducing polymer fine particles are used as the polymer fine particles having a π-conjugated double bond, a coating layer for plating base can be produced by applying a base coating containing the reducing polymer fine particles. .

本発明に使用することができる基材としては、特に限定されないが、例えば、ポリエチレンテレフタレート等のポリエステル樹脂、ポリメチルメタクリレート等のアクリル樹脂、ポリプロピレン樹脂、ポリカーボネート樹脂、ポリスチレン樹脂、ポリ塩化ビニル樹脂、ポリアミド樹脂、ポリイミド樹脂、ガラス、金属等が挙げられる。
また、基材の形状は特に限定されないが、例えば、板状、フィルム状が挙げられる。 他にも、基材として、例えば、射出成形などにより樹脂を成形した樹脂成形品が挙げられる。そして、この樹脂成形品に本発明のめっき物を設けることにより、例えば、自動車向けの装飾めっき品を作成することができ、或いは、ポリイミド樹脂やポリエチレンテレフタレート樹脂からなるフィルム上に本発明のめっき物をパターン状で設けることにより、例えば、電気回路等を作成することができる。
Although it does not specifically limit as a base material which can be used for this invention, For example, polyester resins, such as a polyethylene terephthalate, acrylic resins, such as a polymethylmethacrylate, a polypropylene resin, a polycarbonate resin, a polystyrene resin, a polyvinyl chloride resin, polyamide Resin, polyimide resin, glass, metal, etc. are mentioned.
Moreover, although the shape of a base material is not specifically limited, For example, plate shape and a film form are mentioned. In addition, examples of the base material include a resin molded product obtained by molding a resin by injection molding or the like. And by providing the plated product of the present invention on the resin molded product, for example, a decorative plated product for automobiles can be prepared, or the plated product of the present invention on a film made of polyimide resin or polyethylene terephthalate resin. By providing the pattern in a pattern, for example, an electric circuit or the like can be created.

本発明のπ−共役二重結合を有する高分子微粒子、バインダー、水溶媒を含んでなる下地塗料の塗工としては、基材の全面に塗工してもよく、或いは基材の一部に塗工、つまりパターン印刷してもよい。そして、パターン印刷としては、例えば、インクジェット印刷、オフセット印刷、グラビアオフセット印刷、フレキソ印刷に適用することが出来る。その他にもグラビア印刷、スクリーン印刷、ドライオフセット印刷、パッド印刷にも適用できる。印刷方法は、各印刷機を用いる通常の印刷法によって行うことができる。また、該下地塗料を基材の全面に塗工する手段としては、上記印刷方法でもよいし、スプレー塗工、ディップ塗工によって塗工してもよい。   As the coating of the base coating comprising the polymer fine particles having a π-conjugated double bond of the present invention, a binder, and an aqueous solvent, it may be applied to the entire surface of the base material, or may be applied to a part of the base material. Coating, that is, pattern printing may be performed. And as pattern printing, it can apply to inkjet printing, offset printing, gravure offset printing, and flexographic printing, for example. In addition, it can be applied to gravure printing, screen printing, dry offset printing, and pad printing. The printing method can be performed by a normal printing method using each printing machine. In addition, as a means for applying the base paint to the entire surface of the base material, the above-described printing method may be used, or spray coating or dip coating may be used.

また、π−共役二重結合を有する高分子微粒子として導電性高分子微粒子用いた場合、導電性高分子微粒子を含む下地塗料を塗工した後、脱ドープ処理するが、この脱ドープ処理としては、還元剤、例えば、水素化ホウ素ナトリウム、水素化ホウ素カリウム等の水素化ホウ素化合物、ジメチルアミンボラン、ジエチルアミンボラン、トリメチルアミンボラン、トリエチルアミンボラン等のアルキルアミンボラン、及び、ヒドラジン等を含む溶液で処理して還元する方法、又は、水酸化ナトリウム等のアルカリ性溶液で処理する方法が挙げられる。なお、操作性及び経済性の観点からアルカリ性溶液で処理するのが好ましい。特に、導電性高分子微粒子を含む塗膜層は薄くできるため、緩和な条件下で短時間のアルカリ処理により脱ドープを達成することが可能である。例えば、1M 水酸化ナトリウム水溶液中で、20ないし50℃、好ましくは30ないし40℃の温度で、1ないし30分間、好ましくは3ないし10分間処理される。   In addition, when conductive polymer fine particles are used as polymer fine particles having a π-conjugated double bond, after applying a base coating containing conductive polymer fine particles, de-doping is performed. Treatment with a solution containing a reducing agent, for example, borohydride compounds such as sodium borohydride and potassium borohydride, alkylamine boranes such as dimethylamine borane, diethylamine borane, trimethylamine borane and triethylamine borane, and hydrazine. And a method of treating with an alkaline solution such as sodium hydroxide. In addition, it is preferable to process with an alkaline solution from a viewpoint of operativity and economical efficiency. In particular, since the coating layer containing the conductive polymer fine particles can be thinned, it is possible to achieve dedoping by mild alkali treatment under mild conditions. For example, it is treated in a 1M aqueous sodium hydroxide solution at a temperature of 20 to 50 ° C., preferably 30 to 40 ° C., for 1 to 30 minutes, preferably 3 to 10 minutes.

上記のようにして製造された、めっき下地用塗膜層が形成された基材を無電解めっき法によりめっき物とするが、該無電解めっき法は、通常知られた方法に従って行うことができる。即ち、前記基材を塩化パラジウム等の触媒金属を付着させるための触媒液に浸漬した後、水洗等を行い、無電解めっき浴に浸漬することによりめっき物を得ることができる。   Although the base material with the coating layer for plating base formed as described above is plated by an electroless plating method, the electroless plating method can be performed according to a generally known method. . That is, after the substrate is immersed in a catalyst solution for attaching a catalytic metal such as palladium chloride, the substrate is washed with water and immersed in an electroless plating bath to obtain a plated product.

触媒液は、無電解めっきに対する触媒活性を有する貴金属(触媒金属)を含む溶液であり、触媒金属としては、パラジウム、金、白金、ロジウム等が挙げられ、これら金属は単体でも化合物でもよく、触媒金属を含む安定性の点からパラジウム化合物が好ましく、その中でも塩化パラジウムが特に好ましい。好ましい、具体的な触媒液としては、0.05%塩化パラジウム−0.005%塩酸水溶液(pH3)が挙げられる。処理温度は、20ないし50℃、好ましくは30ないし40℃であり、処理時間は、0.1ないし20分、好ましくは、1ないし10分である。   The catalyst solution is a solution containing a noble metal (catalyst metal) having catalytic activity for electroless plating. Examples of the catalyst metal include palladium, gold, platinum, rhodium, etc. These metals may be simple substances or compounds. A palladium compound is preferable from the viewpoint of stability including a metal, and palladium chloride is particularly preferable among them. A preferred specific catalyst solution includes 0.05% palladium chloride-0.005% hydrochloric acid aqueous solution (pH 3). The treatment temperature is 20 to 50 ° C., preferably 30 to 40 ° C., and the treatment time is 0.1 to 20 minutes, preferably 1 to 10 minutes.

上記で処理された基材は、金属を析出させるためのめっき液に浸され、これにより無電解めっき膜が形成される。めっき液としては、通常、無電解めっきに使用されるめっき液であれば、特に限定されない。即ち、無電解めっきに使用できる金属、銅、金、銀、ニッケル等、全て適用することができるが、銅が好ましい。無電解銅めっき浴の具体例としては、例えば、ATSアドカッパーIW浴(奥野製薬工業(株)社製)等が挙げられる。処理温度は、20ないし50℃、好ましくは30ないし40℃であり、処理時間は、1ないし30分、好ましくは、5ないし15分である。得られためっき物は、使用した基材のTgより低い温度範囲において、数時間以上、例えば、2時間以上養生するのが好ましい。   The base material treated as described above is immersed in a plating solution for depositing metal, thereby forming an electroless plating film. The plating solution is not particularly limited as long as it is a plating solution usually used for electroless plating. That is, metal, copper, gold, silver, nickel, etc. that can be used for electroless plating can all be applied, but copper is preferred. Specific examples of the electroless copper plating bath include, for example, an ATS add copper IW bath (Okuno Pharmaceutical Co., Ltd.). The treatment temperature is 20 to 50 ° C., preferably 30 to 40 ° C., and the treatment time is 1 to 30 minutes, preferably 5 to 15 minutes. The obtained plated product is preferably cured for several hours or more, for example, 2 hours or more in a temperature range lower than the Tg of the used substrate.

尚、上記めっき物は、形成された無電解めっき膜上に、電解めっきにより、同一又は異なる金属を更にめっきすることもできる。また、金属めっき膜は、基材の両面に形成されてもよい。   The plated product can be further plated with the same or different metal on the formed electroless plating film by electrolytic plating. Moreover, a metal plating film may be formed on both surfaces of a base material.

次に、本発明を実施例により更に詳細に説明するが、本発明は実施例に限定されるものではない。
製造例1:π−共役二重結合を有する高分子微粒子である導電性ポリピロール微粒子分散液の調製
ポリスチレンスルホン酸30%水溶液(分子量約7万)50部、およびピロールモノマー10部をイオン交換水350部に添加して攪拌した。十分に混合した後、この溶液に、常温かつ空気中で、過硫酸アンモニウム15%水溶液60部を2時間かけて滴下した。滴下終了後、さらに6時間攪拌を継続して水に分散した導電性能を有する導電性ポリピロール微粒子を得た。尚、得られた水分散液中の導電性ポリピロール微粒子の固形分は、1%であった。
EXAMPLES Next, although an Example demonstrates this invention still in detail, this invention is not limited to an Example.
Production Example 1: Preparation of Dispersion of Conductive Polypyrrole Fine Particles as Polymer Fine Particles Having π-Conjugated Double Bond 50 parts of a 30% aqueous solution of polystyrene sulfonic acid (molecular weight of about 70,000) and 10 parts of pyrrole monomer are ion-exchanged water 350 To the part and stirred. After thorough mixing, 60 parts of a 15% aqueous solution of ammonium persulfate was dropped into this solution over 2 hours at room temperature and in air. After completion of the dropping, stirring was further continued for 6 hours to obtain conductive polypyrrole fine particles having conductive performance dispersed in water. The solid content of the conductive polypyrrole fine particles in the obtained aqueous dispersion was 1%.

実施例1:下地塗料の調製
製造例1で調製した導電性ポリピロール微粒子分散液に、バインダー:ウォーターゾールS695:水系メラミン樹脂:固形分65%:DIC社製を、導電性微粒子:バインダーの固形分比が2:1となるように加え、さらに最終固形分が2%となるように水を混合し、下地塗料を得た。
Example 1: Preparation of base coating material In the conductive polypyrrole fine particle dispersion prepared in Production Example 1, binder: watersol S695: aqueous melamine resin: solid content 65%: manufactured by DIC Corporation, conductive fine particle: solid content of binder The mixture was added so that the ratio was 2: 1, and water was further mixed so that the final solid content was 2% to obtain a base coating material.

実施例2:下地塗料の調製
導電性ポリピロール分散液として、PPy−12:固形分8%:丸菱油化工業社製を用いた以外は、実施例1と同様の方法にて下地塗料を得た。
Example 2: Preparation of base coating The base coating was obtained in the same manner as in Example 1 except that PPy-12: solid content 8%: manufactured by Maruhishi Oil Chemical Co., Ltd. was used as the conductive polypyrrole dispersion. It was.

実施例3:下地塗料の調製
導電性ポリピロール分散液として、SSPy:固形分5%:化研産業社製を用いた以外は、実施例1と同様の方法にて下地塗料を得た。
Example 3 Preparation of Base Coating A base coating was obtained in the same manner as in Example 1 except that SSPy: solid content 5%: manufactured by Kaken Sangyo Co., Ltd. was used as the conductive polypyrrole dispersion.

実施例4:下地塗料の調製
導電性ポリピロール分散液の代わりに、導電性ポリアニリン分散液:ORMECON:固形分2.5%:日産化学工業社製を用いた以外は、実施例1と同様の方法にて下地塗料を得た。
Example 4: Preparation of base coating The same method as in Example 1 except that instead of the conductive polypyrrole dispersion, conductive polyaniline dispersion: ORMECON: solid content 2.5%: manufactured by Nissan Chemical Industries, Ltd. was used. A base paint was obtained.

実施例5:下地塗料の調製
導電性ポリピロール分散液の代わりに、導電性ポリアニリン分散液:製品名aqua PASS:固形分3%:化研産業社製を用いた以外は、実施例1と同様の方法にて下地塗料を得た。
Example 5: Preparation of base coating material Instead of conductive polypyrrole dispersion, conductive polyaniline dispersion: product name aqua PASS: solid content 3%: the same as in Example 1 except that Kaken Sangyo Co., Ltd. was used. The base paint was obtained by the method.

実施例6:下地塗料の調製
導電性ポリピロール分散液の代わりに、導電性ポリチオフェン分散液:Clevios P:固形分1.2%:純正化学社製を用いた以外は、実施例1と同様の方法にて下地塗料を得た。
Example 6: Preparation of base coating The same method as in Example 1 except that instead of the conductive polypyrrole dispersion, a conductive polythiophene dispersion: Clevios P: solid content 1.2%: manufactured by Junsei Chemical Co., Ltd. was used. A base paint was obtained.

実施例7:下地塗料の調製
導電性ポリピロール分散液の代わりに、導電性ポリチオフェン分散液:デナトロンP−502S(固形分3%):ナガセケムテックス社製を用いた以外は、実施例1と同様の方法にて下地塗料を得た。
Example 7: Preparation of base coating The same procedure as in Example 1 except that instead of the conductive polypyrrole dispersion, a conductive polythiophene dispersion: Denatron P-502S (solid content 3%): manufactured by Nagase ChemteX Corporation was used. The base paint was obtained by the method.

実施例8:下地塗料の調製
導電性ポリピロール分散液の代わりに、導電性ポリチオフェン分散液:エノコートBP−105:固形分1%:化研産業社製を用いた以外は、実施例1と同様の方法にて下地塗料を得た。
Example 8: Preparation of base coating The same procedure as in Example 1 except that instead of the conductive polypyrrole dispersion, a conductive polythiophene dispersion: Enocoat BP-105: solid content 1%: manufactured by Kaken Sangyo Co., Ltd. was used. The base paint was obtained by the method.

実施例9:下地塗料の調製
導電性ポリピロール分散液の代わりに、導電性ポリチオフェン分散液:導電コートQ−171:固形分9%:中京油脂社製を用いた以外は、実施例1と同様の方法にて下地塗料を得た。
Example 9: Preparation of base coating The same procedure as in Example 1 except that instead of the conductive polypyrrole dispersion, a conductive polythiophene dispersion: conductive coating Q-171: solid content 9%: manufactured by Chukyo Yushi Co., Ltd. was used. The base paint was obtained by the method.

実施例10:下地塗料の調製
導電性ポリピロール分散液の代わりに、導電性ポリチオフェン分散液:ELコート:固形分1%:出光テクノファイン社製を用いた以外は、実施例1と同様の方法にて下地塗料を得た。
Example 10: Preparation of base coating In the same manner as in Example 1 except that conductive polythiophene dispersion: EL coating: solid content 1%: manufactured by Idemitsu Technofine Co., Ltd. was used instead of conductive polypyrrole dispersion. The base paint was obtained.

実施例11:下地塗料の調製
バインダーとして、プラスコートZ−687:水溶性ポリエステルポリマー:固形分25%:互応化学社製を用いた以外は、実施例1と同様の方法にて下地塗料を得た。
Example 11: Preparation of base coating material As a binder, a base coating material was obtained in the same manner as in Example 1 except that Pluscoat Z-687: Water-soluble polyester polymer: Solid content 25%: manufactured by Kyoyo Chemical Co., Ltd. was used. It was.

実施例12:下地塗料の調製
バインダーとして、WE−304:アクリルエマルジョン:固形分45%:DIC社製を用いた以外は、実施例1と同様の方法にて下地塗料を得た。
Example 12: Preparation of base paint A base paint was obtained in the same manner as in Example 1 except that WE-304: acrylic emulsion: solid content 45%: manufactured by DIC Corporation was used as a binder.

実施例13:下地塗料の調製
製造例1で調製した導電性ポリピロール微粒子分散液5g対して、10%水酸化ナトリウム水溶液0.2gを添加し、脱ドープ処理をして導電性ポリピロール微粒子を還元性とした。すなわち、還元性ポリピロール微粒子が水溶媒に分散している分散液(固形分1%)を得た。
続いて、得られた還元性ポリピロール微粒子分散液に、バインダー:ウォーターゾールS695:水系メラミン樹脂:固形分65%:DIC社製を、還元性微粒子:バインダーの固形分比が2:1となるように加え、さらに最終固形分が1.4%となるように水を混合し、下地塗料を得た。
Example 13: Preparation of base coating To 5 g of the conductive polypyrrole fine particle dispersion prepared in Production Example 1, 0.2 g of 10% aqueous sodium hydroxide solution was added, followed by dedoping treatment to reduce the conductive polypyrrole fine particles. It was. That is, a dispersion (solid content 1%) in which reducing polypyrrole fine particles are dispersed in an aqueous solvent was obtained.
Subsequently, binder: water sol S695: water-based melamine resin: solid content 65%: made by DIC Corporation, and the solid content ratio of reducing fine particles: binder is 2: 1 in the obtained reducible polypyrrole fine particle dispersion. In addition, water was mixed so that the final solid content was 1.4% to obtain a base paint.

めっき下地用塗膜層の製造
基材として、厚み50μmの易接着処理ポリエステルフィルム:A4100:東洋紡社製を用い、該基材上に、実施例1ないし12で調製した下地塗料をインクジェット印刷機により、L/S=1.0mm/1.0mmのストレートラインを形成するようにパターン印刷し、120℃で10分間の乾燥を行って、導電性高分子微粒子とバインダーとからなるパターン状の塗膜層を得た。
続いて、上記方法で得られた塗膜層を有する基材を、1M水酸化ナトリウム水溶液中に35℃で5分間浸漬し、脱ドープ処理をして導電性ポリピロール微粒子を還元性とした。その結果、基材上に還元性高分子微粒子とバインダーとからなるパターン状のめっき下地用塗膜層を得た。
Manufacture of coating film layer for plating base As a base material, an easy-adhesion-treated polyester film having a thickness of 50 μm: A4100: manufactured by Toyobo Co., Ltd. On the base material, the base paint prepared in Examples 1 to 12 was applied by an inkjet printer. , L / S = 1.0mm / 1.0mm pattern printed to form a straight line, dried at 120 ° C. for 10 minutes, patterned coating film composed of conductive polymer fine particles and binder A layer was obtained.
Subsequently, the base material having the coating layer obtained by the above method was immersed in a 1M aqueous sodium hydroxide solution at 35 ° C. for 5 minutes, and subjected to dedoping treatment to make the conductive polypyrrole fine particles reducible. As a result, a patterned coating layer for plating base composed of reducing fine polymer particles and a binder was obtained on the substrate.

また、基材として、厚み50μmの易接着処理ポリエステルフィルム:A4100:東洋紡社製を用い、該基材上に実施例13で調整した下地塗料をインクジェット印刷機により、L/S=1.0mm/1.0mmのストレートラインを形成するようにパターン印刷し、120℃で10分間の乾燥を行って、基材上に還元性高分子微粒子とバインダーとからなるパターン状のめっき下地用塗膜層を得た。   Further, as a base material, an easy-adhesion-treated polyester film having a thickness of 50 μm: A4100: manufactured by Toyobo Co., Ltd., the base coating material prepared in Example 13 was applied to the base material using an ink jet printer and L / S = 1.0 mm / A pattern is printed so as to form a 1.0 mm straight line, dried at 120 ° C. for 10 minutes, and a coating layer for a plating base made of a reducing polymer fine particle and a binder is formed on a substrate. Obtained.

無電解めっき法によりめっき物の製造
実施例1ないし13で作成されたパターン状のめっき下地用塗膜層を有する基材を0.05%塩化パラジウム−0.005%塩酸水溶液中に35℃で5分間浸漬後、洗浄水で水洗した。次に、該フィルムを無電解銅めっき浴 ATSアドカッパーIW浴(奥野製薬工業(株)製)に35℃で20分間浸漬することにより、印刷膜(めっき下地用塗膜層)が形成された部分にのみ銅めっきが施されたポリエステルフィルムが得られた。
Manufacture of plated product by electroless plating method A substrate having a coating layer for a plating base prepared in Examples 1 to 13 in a 0.05% palladium chloride-0.005% hydrochloric acid aqueous solution at 35 ° C. After soaking for 5 minutes, it was washed with washing water. Next, the printed film (coating layer for plating base) was formed by immersing the film in an electroless copper plating bath ATS add copper IW bath (Okuno Pharmaceutical Co., Ltd.) at 35 ° C. for 20 minutes. A polyester film having copper plating only on the portion was obtained.

結果
実施例1〜13で作成しためっき下地塗料を用いて得られた無電解めっきによるめっき物は、めっき下地用塗膜層が完全に金属めっき膜に被覆された上、JIS H 8504に基づき、無電解めっきが施されたパターン印刷基材にセロハンテープを貼り付け、剥離することによりめっき膜の密着性を評価したところ、テープで剥離するものはなかった。すなわち、実施例1〜13で作成した下地塗料用いて得られた無電解めっきによるめっき物は、めっき析出性及びめっき物の密着性について優れるものであった。
Results The plated product obtained by electroless plating obtained using the plating base paint prepared in Examples 1 to 13 is based on JIS H 8504 after the coating layer for plating base is completely covered with a metal plating film. When the cellophane tape was applied to the pattern printing substrate on which electroless plating was applied and peeled to evaluate the adhesion of the plating film, there was no tape peeling. That is, the plated product by electroless plating obtained using the base paint prepared in Examples 1 to 13 was excellent in terms of plating deposition and adhesion of the plated product.

Claims (7)

基材上に無電解めっき法により金属膜を形成するための下地塗料であって、
前記下地塗料は、π−共役二重結合を有する高分子微粒子、バインダー、水溶媒を含んでなることを特徴とする下地塗料。
A base paint for forming a metal film on a substrate by electroless plating,
The base coating material comprises polymer fine particles having a π-conjugated double bond, a binder, and an aqueous solvent.
前記高分子微粒子が、導電性高分子微粒子である請求項1記載の下地塗料。   The base coating material according to claim 1, wherein the polymer fine particles are conductive polymer fine particles. 前記高分子微粒子が、還元性高分子微粒子である請求項1記載の下地塗料。   The base coating material according to claim 1, wherein the polymer fine particles are reducible polymer fine particles. 前記還元性高分子微粒子が、導電性高分子微粒子とバインダーとが水溶媒に分散している分散液中の導電性高分子微粒子を脱ドープ処理して還元性としたことを特徴とする請求項3に記載の下地塗料。   2. The reducing polymer fine particles are made reducible by dedoping the conductive polymer fine particles in a dispersion in which conductive polymer fine particles and a binder are dispersed in an aqueous solvent. 3. The base paint as described in 3. 基材上に、前記請求項2記載の下地塗料を塗工し、これにより形成された塗膜層中の導電性高分子微粒子を脱ドープ処理して還元性としたことを特徴とするめっき下地用塗膜層の製造方法。   3. A plating base characterized in that the base coating material according to claim 2 is applied onto a substrate, and the conductive polymer fine particles in the coating layer formed thereby are dedoped to be reduced. For producing a paint film layer for use. 基材上に、前記請求項3または4記載の下地塗料を塗工し、これにより形成されたことを特徴とするめっき下地用塗膜層の製造方法。   A method for producing a coating layer for a plating base, which is formed by applying the base paint according to claim 3 or 4 on a base material. 前記請求項5または6記載のめっき下地用塗膜層上に、無電解めっき液から金属膜を化学めっきすることを特徴とするめっき物の製造方法。   A method for producing a plated product, comprising: chemically plating a metal film from an electroless plating solution on the coating layer for a plating base according to claim 5 or 6.
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JP2015054976A (en) * 2013-09-10 2015-03-23 アキレス株式会社 Plated article excellent in adhesiveness, and method for manufacturing the same
JP2016004623A (en) * 2014-06-13 2016-01-12 アキレス株式会社 Method for manufacturing plated article with good pattern property
JP2016098429A (en) * 2014-11-26 2016-05-30 アキレス株式会社 Plating base layer used in manufacturing of plated product having thin line pattern by using photolithography method
JP2016216770A (en) * 2015-05-18 2016-12-22 アキレス株式会社 Method of manufacturing plated article having patterned metal plating film formed
JP2017197848A (en) * 2017-07-28 2017-11-02 アキレス株式会社 Plated article excellent in adhesion, and production method thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015054976A (en) * 2013-09-10 2015-03-23 アキレス株式会社 Plated article excellent in adhesiveness, and method for manufacturing the same
JP2016004623A (en) * 2014-06-13 2016-01-12 アキレス株式会社 Method for manufacturing plated article with good pattern property
JP2016098429A (en) * 2014-11-26 2016-05-30 アキレス株式会社 Plating base layer used in manufacturing of plated product having thin line pattern by using photolithography method
JP2016216770A (en) * 2015-05-18 2016-12-22 アキレス株式会社 Method of manufacturing plated article having patterned metal plating film formed
JP2017197848A (en) * 2017-07-28 2017-11-02 アキレス株式会社 Plated article excellent in adhesion, and production method thereof

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