JP2012031504A5 - - Google Patents
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- JP2012031504A5 JP2012031504A5 JP2011045872A JP2011045872A JP2012031504A5 JP 2012031504 A5 JP2012031504 A5 JP 2012031504A5 JP 2011045872 A JP2011045872 A JP 2011045872A JP 2011045872 A JP2011045872 A JP 2011045872A JP 2012031504 A5 JP2012031504 A5 JP 2012031504A5
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- JP
- Japan
- Prior art keywords
- cooling
- unit
- enclosure
- substrate
- cooling means
- Prior art date
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- 238000001816 cooling Methods 0.000 claims description 57
- 239000000758 substrate Substances 0.000 claims description 21
- 210000003027 Ear, Inner Anatomy 0.000 claims 1
Description
本発明の冷却装置は、チャンバと、前記チャンバ内に設けられ、基板を冷却するように構成された第1冷却手段と、前記チャンバ内において前記第1冷却手段と対向配置され、前記基板を冷却するように構成された第2冷却手段と、前記第1冷却手段と前記第2冷却手段との間の配置領域に、基板を保持している基板保持部を配置するように構成された配置手段と、前記第1冷却手段および第2冷却手段のうち少なくとも一方に設けられ、基板冷却に寄与するガスを放出するガス放出口と、前記ガス放出口に前記ガスを供給するガス供給手段と、前記配置領域に配置された前記基板保持部に近接するように、前記第1冷却手段及び第2冷却手段を移動する移動手段と、前記移動手段により、前記第1冷却手段と第2冷却手段とが前記基板に接近した際、前記基板を囲む空間を形成する囲い部とを備えることを特徴とする。 The cooling device of the present invention is provided with a chamber, a first cooling means provided in the chamber and configured to cool the substrate, and disposed opposite to the first cooling means in the chamber to cool the substrate. A second cooling unit configured to perform the arrangement, and an arrangement unit configured to arrange a substrate holding unit that holds the substrate in an arrangement region between the first cooling unit and the second cooling unit. A gas outlet that is provided in at least one of the first cooling means and the second cooling means and discharges a gas that contributes to substrate cooling; a gas supply means that supplies the gas to the gas outlet; and so as to be close to the substrate holder, which is arranged in the arrangement region, and moving means for moving the first cooling means and the second cooling means, by said moving means and said first cooling means and the second cooling means In contact with the substrate When the, characterized in that it comprises a surrounding portion forming a space surrounding the substrate.
具体的には、上述の冷却装置の囲い部は、前記第1冷却手段を支持する支持部と前記第2冷却手段を支持する支持部との少なくとも一方に設けられ、自身が設けられた支持部に支持された冷却手段の周囲を囲み、かつ対向する冷却手段の方に延在し、さらに前記自身が設けられた支持部に支持された冷却手段と前記対向する冷却手段とを連通させるように開口されていると好適である。Specifically, the enclosure of the cooling device described above is provided on at least one of the support part that supports the first cooling means and the support part that supports the second cooling means, and the support part provided with the enclosure. Surrounding the cooling means supported by and extending toward the opposing cooling means, and further, the cooling means supported by the support portion provided with the cooling means and the opposing cooling means are communicated with each other It is preferable that it is opened.
Claims (5)
前記チャンバ内に設けられ、基板を冷却するように構成された第1冷却手段と、
前記チャンバ内において前記第1冷却手段と対向配置され、前記基板を冷却するように構成された第2冷却手段と、
前記第1冷却手段と前記第2冷却手段との間の配置領域に、基板を保持している基板保持部を配置するように構成された配置手段と、
前記第1冷却手段および第2冷却手段のうち少なくとも一方に設けられ、基板冷却に寄与するガスを放出するガス放出口と、
前記ガス放出口に前記ガスを供給するガス供給手段と、
前記配置領域に配置された前記基板保持部に近接するように、前記第1冷却手段及び第2冷却手段を移動する移動手段と、
前記移動手段により、前記第1冷却手段と第2冷却手段とが前記基板に接近した際、前記基板を囲む空間を形成する囲い部とを備えることを特徴とする冷却装置。 A chamber;
First cooling means provided in the chamber and configured to cool the substrate;
A second cooling means disposed opposite to the first cooling means in the chamber and configured to cool the substrate;
An arrangement unit configured to arrange a substrate holding unit holding a substrate in an arrangement region between the first cooling unit and the second cooling unit;
A gas discharge port that is provided in at least one of the first cooling unit and the second cooling unit and discharges a gas that contributes to substrate cooling;
Gas supply means for supplying the gas to the gas discharge port;
Moving means for moving the first cooling means and the second cooling means so as to be close to the substrate holding part arranged in the arrangement region;
A cooling device comprising: an enclosure that forms a space surrounding the substrate when the first cooling unit and the second cooling unit approach the substrate by the moving unit .
前記第1囲い部および前記第2囲い部は、前記移動手段により前記第1冷却手段及び第2冷却手段が前記配置領域に配置された前記基板保持部に接近した際、前記第1囲い部と前記第2囲い部との間の領域がラビリンス形状となるように構成されていることを特徴とする請求項1に記載の冷却装置。 The enclosure is provided around the first cooling unit, and includes a first enclosure that surrounds at least a part of a space between the first cooling unit and the second cooling unit, and the second cooling unit. A second enclosure that surrounds at least a portion of the space between the second cooling means and the first cooling means ,
When the first cooling unit and the second cooling unit approach the substrate holding unit arranged in the arrangement region by the moving unit, the first enclosure unit and the second enclosure unit The cooling device according to claim 1, wherein a region between the second enclosure and the second enclosure is configured to have a labyrinth shape.
前記ガス放出口は、前記配置手段に保持された前記基板のセンター開口部に前記ガスを放出し、The gas discharge port discharges the gas to the center opening of the substrate held by the arrangement means,
前記第1囲い部および前記第2囲い部は、前記移動手段により前記第1冷却手段及び第2冷却手段が前記配置領域に配置された前記基板保持部に接近した際、前記第1囲い部と前記第2囲い部との間の領域内に、前記基板を閉じ込める空間を形成することを特徴とする請求項3に記載の冷却装置。When the first cooling unit and the second cooling unit approach the substrate holding unit arranged in the arrangement region by the moving unit, the first enclosure unit and the second enclosure unit The cooling device according to claim 3, wherein a space for confining the substrate is formed in a region between the second enclosure and the second enclosure.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011045872A JP5220147B2 (en) | 2010-06-29 | 2011-03-03 | Cooling device and heating device |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010147748 | 2010-06-29 | ||
JP2010147748 | 2010-06-29 | ||
JP2011045872A JP5220147B2 (en) | 2010-06-29 | 2011-03-03 | Cooling device and heating device |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012031504A JP2012031504A (en) | 2012-02-16 |
JP2012031504A5 true JP2012031504A5 (en) | 2012-11-29 |
JP5220147B2 JP5220147B2 (en) | 2013-06-26 |
Family
ID=45351410
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011045872A Active JP5220147B2 (en) | 2010-06-29 | 2011-03-03 | Cooling device and heating device |
Country Status (2)
Country | Link |
---|---|
US (1) | US20110315346A1 (en) |
JP (1) | JP5220147B2 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101988014B1 (en) * | 2012-04-18 | 2019-06-13 | 삼성디스플레이 주식회사 | Method for fabricating array subtrate and fabrication apparatus used therefor |
CN102670255B (en) * | 2012-05-10 | 2013-12-04 | 中国科学院合肥物质科学研究院 | Self-help ultrasonic bone strength detecting system and application method thereof |
KR101358805B1 (en) * | 2012-08-22 | 2014-02-07 | 에이피시스템 주식회사 | Apparatus for draining coolant and method for operating the same and apparatus for processing substrate |
JP5849934B2 (en) * | 2012-11-16 | 2016-02-03 | 住友金属鉱山株式会社 | Vacuum film forming apparatus and vacuum film forming method |
US20140151360A1 (en) * | 2012-11-30 | 2014-06-05 | Wd Media, Inc. | Heater assembly for disk processing system |
JP6231399B2 (en) * | 2014-02-17 | 2017-11-15 | キヤノンアネルバ株式会社 | Processing equipment |
JP7027057B2 (en) * | 2017-07-18 | 2022-03-01 | 株式会社アルバック | Board transfer device |
CN108203812B (en) * | 2018-01-25 | 2020-02-07 | 京东方科技集团股份有限公司 | Substrate fixing carrier, evaporation equipment and evaporation method |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3021016B2 (en) * | 1990-10-04 | 2000-03-15 | 日本真空技術株式会社 | Substrate cooling mechanism |
US5181556A (en) * | 1991-09-20 | 1993-01-26 | Intevac, Inc. | System for substrate cooling in an evacuated environment |
JP3793273B2 (en) * | 1996-02-19 | 2006-07-05 | 株式会社ルネサステクノロジ | Manufacturing method of semiconductor integrated circuit device |
US5753092A (en) * | 1996-08-26 | 1998-05-19 | Velocidata, Inc. | Cylindrical carriage sputtering system |
JP2953395B2 (en) * | 1996-09-05 | 1999-09-27 | 日本電気株式会社 | Sputtering equipment |
US20060179848A1 (en) * | 2005-02-14 | 2006-08-17 | Asia Vital Component Co., Ltd. | Radiator unit |
US20070283709A1 (en) * | 2006-06-09 | 2007-12-13 | Veeco Instruments Inc. | Apparatus and methods for managing the temperature of a substrate in a high vacuum processing system |
JP2010093293A (en) * | 2010-01-14 | 2010-04-22 | Canon Anelva Corp | Insulating film etching apparatus |
-
2011
- 2011-03-03 JP JP2011045872A patent/JP5220147B2/en active Active
- 2011-04-26 US US13/093,954 patent/US20110315346A1/en not_active Abandoned
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