JP2011511436A5 - - Google Patents

Download PDF

Info

Publication number
JP2011511436A5
JP2011511436A5 JP2010543474A JP2010543474A JP2011511436A5 JP 2011511436 A5 JP2011511436 A5 JP 2011511436A5 JP 2010543474 A JP2010543474 A JP 2010543474A JP 2010543474 A JP2010543474 A JP 2010543474A JP 2011511436 A5 JP2011511436 A5 JP 2011511436A5
Authority
JP
Japan
Prior art keywords
disk
suppression
substrate
restraining
generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010543474A
Other languages
Japanese (ja)
Other versions
JP2011511436A (en
JP5182827B2 (en
Filing date
Publication date
Priority claimed from US12/020,561 external-priority patent/US20090189289A1/en
Application filed filed Critical
Publication of JP2011511436A publication Critical patent/JP2011511436A/en
Publication of JP2011511436A5 publication Critical patent/JP2011511436A5/ja
Application granted granted Critical
Publication of JP5182827B2 publication Critical patent/JP5182827B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (12)

基板を含む基板ビア構造体であって、
前記基板は、
各ビアがランド内に配置された複数の積層されたビアと、
前記複数の積層されたビアの少なくとも一つを取り巻く少なくとも一つの抑制ディスクであって、前記基板ビア構造体の面内変形を抑制する、前記抑制ディスクとを含み
前記抑制ディスクと前記ビアとの間に絶縁ギャップを含む、基板ビア構造体
A substrate via structure including a substrate,
The substrate is
A plurality of stacked vias, each via located in the land;
Wherein a plurality of at least one of suppression disk surrounding at least one of the stacked vias, suppresses plane deformation of the front Stories substrate via structure, and a said suppression disc,
A substrate via structure including an insulating gap between the suppression disk and the via .
前記抑制ディスクは、前記抑制ディスクが2つの樹脂層の間に配置されるように組み込まれる、請求項1に記載の構造体。   The structure according to claim 1, wherein the restraining disk is incorporated such that the restraining disk is disposed between two resin layers. 前記抑制ディスクは銅である、請求項2に記載の構造体。   The structure of claim 2, wherein the restraining disk is copper. 前記抑制ディスクはほぼ円環状である、請求項3に記載の構造体。   The structure of claim 3, wherein the restraining disk is generally annular. 前記抑制ディスクは方形状である、請求項3に記載の構造体。   The structure of claim 3, wherein the restraining disk is rectangular. 前記抑制ディスクの形状は、設計パラメータと接続回路がかける抑制とに応じて変えられる、請求項2に記載の構造体。   The structure of claim 2, wherein the shape of the restraining disk is varied according to design parameters and restraints applied by the connection circuit. 前記積層されたビアは銅ビアである、請求項1に記載の構造体。   The structure of claim 1, wherein the stacked via is a copper via. ビア積層の面内変形を抑制する方法であって、
基板中に、各ビアがランド内に配置されたビア積層を生成するステップと、
抑制ディスクを生成するステップと、
前記ビア積層の面内変形を抑制するため、前記ビアのランドを取り巻くように、前記抑制ディスクを組み込むステップとを含
前記組み込むステップは、前記抑制ディスクの内径と前記ビアのランドとの間に絶縁ギャップを生成するステップを含む、方法。
A method for suppressing in-plane deformation of via lamination,
Creating a via stack in the substrate with each via disposed within the land;
Generating a suppression disk; and
To suppress the in-plane deformation of the via stack, so as to surround the land pre SL via, seen including a step of incorporating the suppression disc,
The incorporating step includes creating an insulating gap between an inner diameter of the constraining disk and a land of the via .
前記組み込むステップは、2つの樹脂層の間に前記抑制ディスクを配置するステップを含む、請求項に記載の方法。 9. The method of claim 8 , wherein the incorporating step includes placing the constraining disk between two resin layers. 前記抑制ディスクを生成するステップは、前記抑制ディスクを銅で生成するステップを含む、請求項に記載の方法。 9. The method of claim 8 , wherein generating the suppression disk comprises generating the suppression disk with copper. 前記抑制ディスクを生成するステップは、円環状ディスクを生成するステップをさらに含む、請求項10に記載の方法。 The method of claim 10 , wherein generating the constraining disk further comprises generating an annular disk. 前記抑制ディスクを生成するステップは、前記基板中の利用可能なスペースに適合するように、前記抑制ディスクの形状を調整するステップをさらに含む、請求項10に記載の方法。 The method of claim 10 , wherein generating the constraining disk further comprises adjusting the shape of the constraining disk to fit an available space in the substrate.
JP2010543474A 2008-01-27 2009-01-20 Built-in suppression disk for reliable stacked vias in electronic substrates Expired - Fee Related JP5182827B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/020,561 US20090189289A1 (en) 2008-01-27 2008-01-27 Embedded constrainer discs for reliable stacked vias in electronic substrates
US12/020,561 2008-01-27
PCT/EP2009/050585 WO2009124785A1 (en) 2008-01-27 2009-01-20 Embedded constrainer discs for reliable stacked vias in electronic substrates

Publications (3)

Publication Number Publication Date
JP2011511436A JP2011511436A (en) 2011-04-07
JP2011511436A5 true JP2011511436A5 (en) 2012-08-23
JP5182827B2 JP5182827B2 (en) 2013-04-17

Family

ID=40898382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010543474A Expired - Fee Related JP5182827B2 (en) 2008-01-27 2009-01-20 Built-in suppression disk for reliable stacked vias in electronic substrates

Country Status (8)

Country Link
US (1) US20090189289A1 (en)
EP (1) EP2238620B1 (en)
JP (1) JP5182827B2 (en)
KR (1) KR101285030B1 (en)
CN (1) CN101926000A (en)
AT (1) ATE521989T1 (en)
TW (1) TW200947657A (en)
WO (1) WO2009124785A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI449152B (en) * 2011-12-21 2014-08-11 Ind Tech Res Inst Semiconductor device stacked structure
US11270955B2 (en) * 2018-11-30 2022-03-08 Texas Instruments Incorporated Package substrate with CTE matching barrier ring around microvias

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08172264A (en) * 1994-12-20 1996-07-02 Hitachi Chem Co Ltd Multilayer wiring board and manufacture of metal-foil-clad laminated board
JP4204150B2 (en) * 1998-10-16 2009-01-07 パナソニック株式会社 Multilayer circuit board
TW430935B (en) * 1999-03-19 2001-04-21 Ind Tech Res Inst Frame type bonding pad structure having a low parasitic capacitance
JP4052434B2 (en) * 2001-02-05 2008-02-27 Tdk株式会社 Multilayer substrate and manufacturing method thereof
JP2003163453A (en) * 2001-11-27 2003-06-06 Matsushita Electric Works Ltd Multilayer wiring board and method for manufacturing the same
JP2005011883A (en) 2003-06-17 2005-01-13 Shinko Electric Ind Co Ltd Wiring board, manufacturing method thereof and semiconductor device
JP2005019730A (en) * 2003-06-26 2005-01-20 Kyocera Corp Wiring substrate and electronic device using it
KR20050072881A (en) * 2004-01-07 2005-07-12 삼성전자주식회사 Multi layer substrate with impedance matched via hole
JP2005251792A (en) * 2004-03-01 2005-09-15 Fujitsu Ltd Wiring board and its manufacturing method
US7523545B2 (en) 2006-04-19 2009-04-28 Dynamic Details, Inc. Methods of manufacturing printed circuit boards with stacked micro vias
JP2008124398A (en) * 2006-11-15 2008-05-29 Shinko Electric Ind Co Ltd Semiconductor package and its manufacturing method

Similar Documents

Publication Publication Date Title
WO2013016264A3 (en) Semiconductor die assemblies, semiconductor devices including same, and methods of fabrication
WO2012027075A3 (en) Bumpless build-up layer package with a pre-stacked microelectronic devices
JP2012134500A5 (en)
US20140239490A1 (en) Packaging substrate and fabrication method thereof
SG192320A1 (en) Semiconductor devices with copper interconnects and methods for fabricating same
JP2012038996A5 (en)
WO2013003695A3 (en) Bumpless build-up layer package warpage reduction
JP2012129505A5 (en)
JP2016511542A5 (en)
JP2014049476A5 (en)
JP2016513364A5 (en)
JP2014022465A5 (en)
JP2011249574A5 (en)
JP2018538697A5 (en)
JP2014049477A5 (en)
JP2013042180A5 (en)
JP2012134329A5 (en)
JP2014501448A5 (en)
WO2013137710A8 (en) Microelectronic device attachment on a reverse microelectronic package
JP2013069807A5 (en)
JP2013247353A5 (en)
JP2010205849A5 (en)
JP2011192973A5 (en) Method of manufacturing transistor
JP2011009723A5 (en)
JP2010287883A5 (en) Substrate and method of manufacturing substrate