JP2011222559A - Mold manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a mold using a metal mold having a small-area of fine concave and convex structure on its surface, capable of manufacturing a large-area mold with a high surface flatness by batch-type impartation and transfer.SOLUTION: The method includes: a first transfer step for forming a fine concave and convex structure part 36 by making a center of a fine concave and convex part 33 approximately coincide with a center of an opening 37a, using a mask 37 having the opening 37a similarly smaller than an area of the fine concave and convex part, after the fine concave and convex part 33 of a metal mold 32 is filled with a photo-curing resin, and exposing and hardening them; and a second transfer step for forming a fine concave and convex structure part 43 by making a center of the fine concave and convex part 33 approximately coincide with a center of an opening 42a, using a mask 42 having the opening 42a similarly smaller than an area of the fine concave and convex part 33, after the metal mold 32 is arranged so that a boundary 33a of the fine concave and convex part 33 is adjacent to an end of the fine concave and convex structure part 36 formed in the previous step, and exposing and hardening them.

Description

  The present invention relates to a method for manufacturing a mold for transferring a fine concavo-convex structure on a mold surface using a photocurable resin, and more particularly to a method for manufacturing a mold suitably used as a large area mold for nanoimprint lithography.

  Nanoimprint lithography technology has attracted attention as a technology that replaces electron beam lithography with low productivity and expensive optical lithography. In particular, UV nanoimprint using UV light has recently attracted attention as a technology capable of overcoming productivity problems such as electron beam lithography due to its high productivity.

  As an example of the nanoimprint lithography technique, a method of transferring a fine uneven structure using a mold produced by using electron beam lithography or another method has been proposed (for example, see Patent Document 1). In such a method, a mold having a nanoscale fine concavo-convex structure is manufactured, and the nanoscale structure is transferred by pressing the fine concavo-convex structure of the mold against a UV curable resin film on a substrate and curing the mold. By repeating the above steps a plurality of times, it is possible to easily produce a fine concavo-convex structure that is inverted from the fine concavo-convex structure of a plurality of molds on one substrate.

  FIG. 6A to FIG. 6C schematically show a transfer process of a fine concavo-convex structure using a nanoimprint lithography technique. As shown in FIGS. 6A to 6C, in the nanoimprint, the mold 63 is pressed against the resist layer 62 provided on the substrate 61, exposed and cured, and then the mold 63 is removed from the resist layer 62. The fine uneven structure is transferred to the resist layer 62 by peeling. As described above, by using the nanoimprint lithography technique, it is possible to easily transfer and duplicate the nanoscale fine concavo-convex structure.

  When manufacturing a product using the nanoimprint lithography technique, the substrate 61 is etched using the resist layer 62 to which the fine concavo-convex structure is transferred as a mask. In the etching step, etching is performed after removing the resist on the concave bottom portion 62a of the fine concavo-convex structure transferred to the resist layer 62. For this reason, the film thickness L1 (hereinafter referred to as the remaining film L1) between the recess bottom 62a of the resist layer 62 after the fine concavo-convex structure transfer and the surface of the substrate 61 is very small in the range of several nanometers to several tens of nanometers. It needs to be small. In order to make the remaining film L1 thin, it is necessary to control the thickness of the resist layer 62 applied on the substrate 61 to be thin on a submicron scale, particularly when transferring a large uneven structure. The smoothness of the mold 63 is important.

  In order to transfer a fine concavo-convex structure having a large area by the nanoimprint lithography technique, a cylindrical mold, a large area flat plate mold, or the like is required. As a method of using such a mold, a method of continuously transferring a fine concavo-convex structure onto a reel using a cylinder having a fine concavo-convex structure formed on an outer peripheral surface as a mold (for example, Non-Patent Document 1). And a method in which a reel having a fine concavo-convex structure with a large area on its surface is used as a mold and the fine concavo-convex structure is transferred continuously from reel to reel (for example, see Patent Document 2).

  However, in the method described in Non-Patent Document 1, it is necessary to form a fine concavo-convex structure on a cylindrical surface with a large area by electron beam lithography or the like. For this reason, there is a problem that the productivity is rather lowered when the production of the mold is included. Further, when changing the fine concavo-convex structure, it is necessary to newly produce a fine concavo-convex structure by a method such as electron beam lithography that is low in productivity and high in cost.

  On the other hand, the method described in Patent Document 2 requires a cylindrical mold having a fine concavo-convex structure on the surface for producing a reel-shaped mold. For this reason, in addition to the need to form a reel by multiple times of transfer from a small area mold, it is necessary to affix the fine uneven structure transferred from the mold onto the reel.

  When using a small-area mold produced by electron beam lithography or the like, the mold has low durability and the mold is expensive. Therefore, a replica of the mold is produced by electroforming or the like. It is used as a mold (for example, see Patent Document 3). When producing a replica, as shown in FIG. 7A, both ends of a mold 72 having a concavo-convex structure on the surface are fixed on a base material 71 with a fixing tape 73. Next, Ni electroforming is performed to produce a molded body 74 shown in FIG. In the molded body 74, a micron-scale height difference L 2 derived from the mold 72 and the fixing tape 73 is generated in the fine concavo-convex structure portion 75. In order to eliminate the height difference L2, a molded body 74 obtained by cutting out both end sides of the fine concavo-convex structure portion 75 is used as a replica.

  In this way, when manufacturing a large area mold by transferring the micro concavo-convex structure of a small mold, it is not possible to efficiently utilize the area of the micro concavo-convex structure portion of the small mold, or even a submicron scale step. There was a problem of being transferred. And, using the mold with such a step, the process of transfer and exposure curing by the nanoimprint lithography method, the uniformity of the degree of curing of the photosensitive resin at the stepped part can not be maintained As a result, a further process such as a washing process for washing away the uncured resin is required, and a complicated process must be taken. Furthermore, when a mold is manufactured by using nanoimprint lithography methods such as continuous transfer and exposure curing using such a small mold, naturally a step is also generated at the boundary between the mold parts that are repeatedly transferred. This will cause the same problem as described above. From the above, there is a demand for a method for producing a continuous mold having a large area and high surface flatness that can be efficiently produced by continuous transfer even using a small mold.

JP 2005-203697 A JP 2009-158731 A JP 2009-218616 A

Journal of Photopolymer Science and Technology Vol. 20, no. 4 (2007) 559-562

  The present invention has been made in view of the above points, and in a method for manufacturing a mold using a mold having a fine concavo-convex structure with a small area on the surface, the surface flatness is high by batch-type molding / transfer. It aims at providing the manufacturing method of the mold which can manufacture a large area mold.

  The mold manufacturing method of the present invention uses a mask having an opening that is similar in size to the region of the fine irregularities after the photo-curable resin is filled in the fine irregularities of the mold. A first transfer step in which the center of the opening and the center of the opening are approximately matched, and the photocurable resin is exposed and cured to form a fine concavo-convex structure portion, and an end of the fine concavo-convex structure portion formed in the previous step After the mold is arranged so that the end of the fine concavo-convex part is adjacent to the part, using a mask having an opening that is similar in size to the area of the fine concavo-convex part, And a second transfer step of forming a fine concavo-convex structure portion by exposing and curing the photo-curing resin so as to substantially coincide with the center of the opening.

  In the mold manufacturing method of the present invention, the mask has a similar shape to the fine concavo-convex structure portion of the mold, and the similarity is reduced by 2 mm or more and 4 mm or less inside the outer periphery of the fine concavo-convex structure portion of the mold. The shape is preferred.

  In the mold manufacturing method of the present invention, it is preferable that the fine structure forming portion has a substantially rectangular shape in plan view.

  According to the present invention, in a mold manufacturing method using a mold having a small concavo-convex structure with a small area on the surface, a mold capable of manufacturing a large area mold with high surface flatness by batch molding and transfer. A manufacturing method can be provided.

It is a figure which shows an example of the mold manufactured with the manufacturing method of the mold which concerns on embodiment of this invention. (A), (b) is a cross-sectional schematic diagram of the mold manufactured with the manufacturing method of the mold concerning embodiment of this invention. (A)-(d) is the schematic of the 1st transcription | transfer process of the manufacturing method of the mold which concerns on embodiment of this invention. (A)-(d) is the schematic of the 2nd transcription | transfer process of the manufacturing method of the mold which concerns on embodiment of this invention. (A), (b) is a figure which shows an example of the mold manufactured with the manufacturing method of the mold which concerns on embodiment of this invention. (A)-(c) is a figure which shows the outline of the transcription | transfer process of the fine concavo-convex structure using nanoimprint lithography technology. (A), (b) is a conceptual diagram which shows the height difference produced when producing a replica by Ni electroforming.

Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.
The number, shape, dimensional ratio, etc. of the mold, mold, mask, fine concavo-convex structure portion, etc. in the following description are not particularly limited.

  The mold manufacturing method according to the present embodiment includes a first transfer step of forming a first fine concavo-convex structure by transferring a fine concavo-convex structure formed on the surface of a mold onto a substrate, and a first fine structure. A second transfer step of transferring the fine concavo-convex structure of the mold to an adjacent position to form a second fine concavo-convex structure portion. In the first transfer process and the second transfer process, a mask having an opening smaller than the area of the fine unevenness of the mold is used, and the center of the opening of the mask and the center of the fine unevenness of the mold are approximately matched. After providing the mask, the photocurable resin is exposed and cured. By providing a mask in this way, it is possible to appropriately control the polymerization of the photocurable resin by utilizing light leakage from the mask opening to the outside of the mask opening at the time of exposure, and the resin can be transferred by multiple times of transfer. Even in the case of forming a mold, a flat resin mold can be formed. For this reason, it is possible to manufacture a mold for large-area optical nanoimprint even when a small-area mold is used. First, an example of a mold manufactured by the mold manufacturing method according to the present embodiment will be described with reference to FIG.

  FIG. 1 is a diagram showing an example of a mold manufactured by the mold manufacturing method according to the present embodiment. As shown in FIG. 1, the mold 1 includes a base material 11 and a fine concavo-convex structure portion 12 having a substantially rectangular shape in plan view provided so as to protrude from the surface of the base material 11 at a central portion of the base material 11. The fine concavo-convex structure portion 12 is formed by two times of transfer using a mold having a fine concavo-convex structure, and is provided on the base material 11 and is formed by a first transfer step. And the second fine concavo-convex structure portion 14 provided adjacent to the first fine concavo-convex structure portion 13 and below the base material 11 and formed by the second transfer process. A boundary 12 a is formed between the first fine uneven structure portion 13 and the second fine uneven structure portion 14. FIG. 1 shows an example in which the fine concavo-convex structure 12 is formed by transferring twice using the same mold, but the fine concavo-convex structure 12 transfers the fine concavo-convex structure of the mold twice or more. May be formed.

  The first fine concavo-convex structure portion 13 includes a concavo-convex portion 13a formed in the center portion, and inclined portions 13b to 13d that are provided on the outer edge portion of the concavo-convex portion 13a and fill a step between the concavo-convex portion 13a and the substrate 11. It is composed of The second fine concavo-convex structure portion 14 includes a concavo-convex portion 14a formed in the center portion, and inclined portions 14b to 14d that are provided on the outer edge portion of the concavo-convex portion 14a and fill a step between the concavo-convex portion 14a and the substrate 11. It is composed of

  2A is a schematic diagram of a cross section taken along the line AA in FIG. 1, and FIG. 2B is a schematic diagram of a cross section taken along the line BB in FIG. 2A and 2B, the width and height dimensions of the first fine concavo-convex structure portion 13 and the second fine concavo-convex structure portion 14 are shown enlarged.

  As shown in FIG. 2A and FIG. 2B, the concavo-convex portion 13a and the concavo-convex portion 14a have substantially the same height and are provided adjacent to each other via the boundary 12a. The inclined portions 13b to 13d provided on the outer edge portion of the uneven portion 13a have an inclined structure in which the height continuously decreases from the upper surface side of the uneven portion 13a toward the surface of the base material 11 as the distance from the uneven portion 13a increases. is doing. Further, the inclined portions 14b to 14d provided on the outer edge portion of the uneven portion 14a are inclined structures in which the height continuously decreases from the upper surface side of the uneven portion 14a toward the surface of the base material 11 as the distance from the uneven portion 14a increases. have. The inclined portions 13b to 13d and the inclined portions 14b to 14d can be arbitrarily formed according to the exposure conditions during transfer of the fine concavo-convex structure of the mold, which will be described later, and are necessarily provided on all the outer edge portions of the concavo-convex portion 13a and the concavo-convex portion 14a. There is no need. In the mold manufacturing method according to the present embodiment, the height difference between the adjacent first fine concavo-convex structure portion 13 and the second fine concavo-convex structure portion 14 is 2 μm or less, and the fine concavo-convex structure portion 12 and the substrate 11 are the same. It becomes possible to manufacture a mold including the fine concavo-convex structure portion 12 having a height difference of 2 μm or less from the surface.

  Next, an embodiment of a mold manufacturing method according to the present embodiment will be described. As described above, the mold manufacturing method according to the present embodiment uses the UV curable resin as the photocurable resin, transfers the fine concavo-convex structure of the mold onto the base material, and forms the first fine concavo-convex structure. A first transfer step of forming, and a second transfer step of transferring the fine concavo-convex structure of the mold to a position adjacent to the first fine concavo-convex structure on the substrate to form a second fine concavo-convex structure portion.

  3A to 3D show an outline of the first transfer process. First, as shown in FIG. 3A, the mold 32 is arranged at the first fine uneven structure forming portion on the base material 31. The mold 32 is provided on the outer periphery of the fine uneven portion 33 via a boundary 33a and the fine uneven portion 33 having a substantially rectangular shape in plan view provided so as to protrude from a mold substrate (not shown). A stepped portion 34 is provided between the portion 33 and the mold substrate. FIG. 3A shows an example in which the mold 32 is arranged so that the fine concavo-convex portion 33 and the surface of the base material 31 face each other after filling the fine concavo-convex portion 33 with a photocurable resin (not shown). Yes. Note that the mold 32 may be disposed on the base material 31 with at least the photocurable resin existing between the fine uneven portion 33 and the surface of the base material 31. For example, as shown in FIG. In addition, after the UV curable resin film 35 is formed on the entire surface of the base material 31, the fine uneven portion 33 may be disposed so as to face the surface of the base material 31.

  Next, as shown in FIG. 3C, an exposure mask 37 is provided on the opposite surface side of the mold 32 through the base material 31. The mask 37 has an opening 37 a whose area is reduced in a similar manner to the area of the fine uneven portion 33 of the mold 32, and the center of the opening 37 a and the fine uneven portion 33 of the mold 32 are formed. The center of the formed region is provided so as to substantially match. The arrangement of the mask 37 is not particularly limited as long as the UV curable resin can be exposed and cured using light leakage described later, and the mask 37 is provided on the same side as the mold 32 with respect to the base material 31. May be.

  Next, exposure is performed through the mask 37 to cure the UV curable resin. In the first transfer process, since the mask 37 having the opening 37a whose area is similarly reduced from the fine uneven portion 33 is used, the UV light leaked from the opening 37a of the mask 37 is exposed to gold when the UV light is exposed. It slightly enters the boundary 33a side of the mold 32 (outside the opening 37a). Therefore, a part of the UV curable resin is cured in the range R1 between the opening 37a and the boundary 33a of the mold 32. In this range R1, the UV light entering from the opening 37a side toward the boundary 33a side gradually decreases. For this reason, the UV curable resin that is polymerized and cured by UV light gradually decreases from the opening 37a side toward the boundary 33a side.

  Next, as shown in FIG. 3D, the mask 37 is removed, the mold 32 is peeled off from the cured UV curable resin, and then the unexposed UV curable resin is washed, whereby the first fine concavo-convex structure is obtained. A portion 36 is formed. Here, in the range R1 between the opening 37a and the boundary 33a of the mold 32, the concentration of the polymerized UV curable resin decreases from the opening 37a toward the boundary 33a. The amount of UV curable resin that is removed by washing increases toward the boundary 33a. For this reason, the first fine concavo-convex structure portion 36 manufactured in the first transfer step has a height at the central portion, similar to the first fine concavo-convex structure portion 13 shown in FIGS. A flat uneven portion 36a is formed, and inclined portions 36b to 36e whose height continuously decreases as the distance from the uneven portion 36a increases on the outer edge of the uneven portion 36a. In the case where some of the inclined portions 36b to 36e of the first fine concavo-convex structure portion 36 are not provided, the mask 37 is provided so that the step portion 34 of the fine concavo-convex portion 33 of the mold 32 is exposed from the opening 37a. What is necessary is just to provide.

  Next, the second transfer process will be described with reference to FIGS. 4 (a) to 4 (d). In the second transfer step, the fine concavo-convex structure of the mold 32 is transferred to the upper portion of the base material 31 adjacent to the first fine concavo-convex structure portion 36. First, as shown in FIG. 4 (a), the fine unevenness is such that the boundary between the uneven portion 36a and the inclined portion 36e of the first fine uneven structure portion 36 and the boundary 33a of the mold 32 substantially coincide. A mold 32 filled with a photocurable resin is disposed in the portion 33. As shown in FIG. 4B, the mold 32 may be arranged after the UV curable resin film 41 is formed on the entire surface of the base material 31, as in the first transfer step.

  Next, as shown in FIG. 4C, an exposure mask 42 is provided on the opposite surface side of the mold 32 through the base material 31. Like the mask 37, the mask 42 has an opening 42 a that is similarly reduced with respect to the region of the fine uneven portion 33 of the mold 32, and the center of the opening 42 a and the fine uneven portion 33 of the mold 32. Is provided so that the center of the region where the is formed substantially coincides. Note that the mask 42 may be provided on the same surface as the mold 32 with respect to the base material 31 in the same manner as the mask 37.

  Next, exposure is performed through the mask 42 to cure the UV curable resin. In the second transfer step, since the mask 42 having the opening 42a whose area is reduced in size similar to the fine uneven portion 33 is used, the UV light leaked from the opening 42a when the UV light is exposed is the opening of the mask 42. 42a slightly enters the boundary 33a side of the mold 32 (outside the opening 42a). Therefore, a part of the UV curable resin is cured in the range R2 between the opening 42a and the boundary 33a of the mold 32. In this range R2, the UV light entering from the opening 42a side toward the boundary 33a side (outside the opening 42a) gradually decreases. For this reason, the UV curable resin that is polymerized and cured by the UV light gradually decreases from the opening 42a side toward the boundary 33a side.

  Next, as shown in FIG. 4 (d), the UV curable resin is exposed and cured, and then the mask 42 and the mold 32 are peeled off and the substrate 31 is washed, whereby the second fine concavo-convex structure portion 43 is formed. It is formed. Here, in the range R2 between the opening 42a and the boundary 33a of the mold 32, the concentration of the polymerized UV curable resin decreases from the opening 42a toward the boundary 33a. The UV curable resin removed by cleaning increases toward the boundary 33a. For this reason, the second fine concavo-convex structure portion 43 manufactured in the second transfer step has a height at the central portion, like the second fine concavo-convex structure portion 14 shown in FIGS. A flat uneven portion 43a is formed, and inclined portions 43b to 43e whose height continuously decreases as the distance from the uneven portion 43a is formed on the outer edge portion of the uneven portion 43a. In the case where some of the inclined portions 43b to 43e of the second fine concavo-convex structure portion 43 are not provided, the mask 42 is provided so that the stepped portion 34 of the fine concavo-convex portion 33 of the mold 32 is exposed from the opening 42a. What is necessary is just to provide.

  Through the first transfer process and the second transfer process described above, the mold 44 including the first fine uneven structure part 36 and the second fine uneven structure part 43 can be manufactured. When transferring two or more times, the mold 32 is arranged so that the outer edge portion of the fine uneven structure portion formed in the previous step and the boundary 33a of the fine uneven portion 33 of the mold 32 are approximately coincident. To do.

  Next, the mold manufactured by the mold manufacturing method according to the present embodiment will be described in detail with reference to FIGS. 5 (a) and 5 (b). FIG. 5A is a schematic cross-sectional view of the mold 44 formed by the first transfer process and the second transfer process described above. As shown in FIG. 5A, the range R3 (the range R1 and the range R2 overlap each other) between the uneven portion 36a of the first fine uneven structure portion 36 of the mold 44 and the uneven portion 43a of the second fine uneven structure portion 43. Range), the amount of the UV curable resin that is exposed and cured in the first transfer process decreases from the concavo-convex part 36a toward the concavo-convex part 43a as shown by a dotted line 36f, and the UV exposure property that cures in the second transfer process. The amount of resin increases from the uneven portion 36a toward the uneven portion 43a as indicated by a dotted line 43f. Therefore, within the range R3, the amount of UV curable resin that is exposed and cured through the first transfer process and the second transfer process is substantially constant, and the first fine concavo-convex structure part 36 and the second fine concavo-convex structure part 43 The boundary 44a can be flat. Thus, in the mold manufacturing method according to the present embodiment, the boundary 44a between the concavo-convex portion 36a and the concavo-convex portion 43a is continuous, the height difference is 2 μm or less, and the concavo-convex portion 36a and the concavo-convex portion The mold 44 in which the space between the portion 43a and the surface of the base material 31 is continuous and the height difference is 2 μm or less can be manufactured.

  Further, as shown in FIG. 5B, by transferring the first fine concavo-convex structure portion 36 and the second fine concavo-convex structure portion 43 of the mold 44 onto the base material 51 via the UV curable resin, A complementary mold 52 can also be formed. The mold 52 is provided on both ends of the base material 51, and is provided between the inclined portions 52a and 52b inclined toward the base material 51 side toward the central portion of the base material 51, and between the inclined portions 52a and 52b. Flat fine concavo-convex structure portions 53a and 53b. The mold 52 can be transferred by irradiating UV light from the mold 44 side and / or the base material 51 side when a UV transmissive material is used as the base material 51, and does not transmit the UV light as the base material 51. When a material is used, transfer can be performed by irradiating UV light from the mold 44 side.

  In the above-described embodiment, in the second transfer step, the boundary between the uneven portion 36a and the inclined portion 36e of the first fine uneven structure portion 36 and the end portion of the boundary 33a of the mold 32 are roughly shown. Although the example of transferring the second fine concavo-convex structure portion 43 so as to coincide with each other has been described, the boundary 44a between the first fine concavo-convex structure portion 36 and the second fine concavo-convex structure portion 43 can be provided flat. For example, the arrangement of the mold 32 in the second transfer process is not particularly limited. For example, the second fine concavo-convex structure portion 43 may be transferred such that the end portion of the inclined portion 36e of the first fine concavo-convex structure portion 36 and the end portion of the boundary 33a of the mold 32 substantially coincide with each other. In the above-described embodiment, the example in which the second fine concavo-convex structure portion 43 is formed above the first fine concavo-convex structure portion 36 has been described. However, the second fine concavo-convex structure portion 43 has the first fine concavo-convex structure portion 43. Even if it is formed in the left-right direction of the portion 36, the fine concavo-convex structure portion can be formed in the same manner.

  In the mold manufacturing method according to the present embodiment, the base material 31 is not particularly limited as long as it is compatible with nanoimprint lithography, but is particularly a kind of acrylic resin, polyester resin, or polyester resin that transmits UV light. A base material made of polyethylene terephthalate (PET) or polycarbonate (PC) resin with little molecular orientation can be used.

  In the mold manufacturing method according to the present embodiment, the fine concavo-convex structure of the mold 32 is not particularly limited as long as it is compatible with nanoimprint lithography. For example, nanoscale cylinders, cones, hemispheres, etc. are regularly formed. Examples include a structure in which nanoscale wires are arranged almost in parallel, a structure in which nanoscale circles, holes such as triangles and squares are regularly arranged, and a structure in which nanoscale bent wires are arranged. It is done.

  In the mold manufacturing method according to the present embodiment, the UV curable resin is not particularly limited as long as it is compatible with nanoimprint lithography. For example, EO-modified glycerol tri (meth) acrylate, ECH-modified glycerol tri (meta) ) Acrylate, PO modified glycerol tri (meth) acrylate, pentaerythritol triacrylate, EO modified phosphoric acid triacrylate, trimethylolpropane tri (meth) acrylate, caprolactone modified trimethylolpropane tri (meth) acrylate, PO modified trimethylolpropane tri (Meth) acrylate, tris (acryloxyethyl) isocyanurate, EO-modified trimethylolpropane tri (meth) acrylate, dipentaerythritol hexa (meth) a Lilate, caprolactone-modified dipentaerythritol hexa (meth) acrylate, dipentaerythritol hydroxypenta (meth) acrylate, alkyl-modified dipentaerythritol penta (meth) acrylate, dipentaerythritol poly (meth) acrylate, ditrimethylolpropane tetra (meth) Acrylate, alkyl-modified dipentaerythritol tri (meth) acrylate, pentaerythritol ethoxytetra (meth) acrylate, pentaerythritol tetra (meth) acrylate diethylene glycol monoethyl ether (meth) acrylate, dimethylol dicyclopentane di (meth) acrylate, di (Meth) acrylated isocyanurate, 1,3-butylene glycol di (meth) acrylate, 1 4-butanediol di (meth) acrylate, EO-modified 1,6-hexanediol di (meth) acrylate, ECH-modified 1,6-hexanediol di (meth) acrylate, allyloxypolyethylene glycol acrylate, 1,9-nonanediol Di (meth) acrylate, EO modified bisphenol A di (meth) acrylate, PO modified bisphenol A di (meth) acrylate, modified bisphenol A di (meth) acrylate, EO modified bisphenol F di (meth) acrylate, ECH modified hexahydrophthal Acid diacrylate, neopentyl glycol di (meth) acrylate, hydroxypivalate neopentyl glycol di (meth) acrylate, EO modified neopentyl glycol diacrylate, PO modified neopentylglyco Diacrylate, caprolactone-modified hydroxypivalate ester neopentyl glycol, stearic acid-modified pentaerythritol di (meth) acrylate, ECH-modified propylene glycol di (meth) acrylate, ECH-modified phthalic acid di (meth) acrylate, poly (ethylene glycol- Tetramethylene glycol) di (meth) acrylate, poly (propylene glycol-tetramethylene glycol) di (meth) acrylate, polypropylene glycol di (meth) acrylate, silicone di (meth) acrylate, tetraethylene glycol di (meth) acrylate, tri Ethylene glycol di (meth) acrylate, polyester (di) acrylate, polyethylene glycol di (meth) acrylate, dimethylol Licyclodecane di (meth) acrylate, neopentyl glycol modified trimethylolpropane di (meth) acrylate, dipropylene glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, triglycerol di (meth) acrylate, EO modified tripropylene glycol Di (meth) acrylate, divinylethyleneurea, divinylpropyleneurea, 2-ethyl-2-butylpropanediol acrylate, 2-ethylhexyl (meth) acrylate, 2-ethylhexyl carbitol (meth) acrylate, 2-hydroxyethyl (meth) Acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-methoxyethyl (meth) acrylate, 3-methyl Xylbutyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, acrylic acid dimer, benzyl (meth) acrylate, butanediol mono (meth) acrylate, butoxyethyl (meth) acrylate, butyl (meth) acrylate, cetyl (meth) Acrylate, EO-modified cresol (meth) acrylate, ethoxylated phenyl (meth) acrylate, ethyl (meth) acrylate, dipropylene glycol (meth) acrylate, isoamyl (meth) acrylate, isobutyl (meth) acrylate, isooctyl (meth) acrylate, Cyclohexyl (meth) acrylate, dicyclohentanyl (meth) acrylate, isobornyl (meth) acrylate, dicyclopentanyloxyethyl (meth) acrylate , Isomyristyl (meth) acrylate, lauryl (meth) acrylate, methoxydipropylene glycol (meth) acrylate, methoxypolyethylene glycol (meth) acrylate, methoxytriethylene glycol (meth) acrylate, methyl (meth) acrylate, methoxytripropylene glycol (Meth) acrylate, neopentyl glycol benzoate (meth) acrylate, nonylphenoxypolyethylene glycol (meth) acrylate, nonylphenoxypolypropylene glycol (meth) acrylate, octyl (meth) acrylate, paracumylphenoxyethylene glycol (meth) acrylate, ECH modified Phenoxy acrylate, phenoxy diethylene glycol (meth) acrylate, pheno Cihexaethylene glycol (meth) acrylate, phenoxytetraethylene glycol (meth) acrylate, phenoxyethyl (meth) acrylate, polyethylene glycol (meth) acrylate, polyethylene glycol-polypropylene glycol (meth) acrylate, polypropylene glycol (meth) acrylate, stearyl (Meth) acrylate, EO-modified succinic acid (meth) acrylate, tert-butyl (meth) acrylate, tribromophenyl (meth) acrylate, EO-modified tribromophenyl (meth) acrylate, tridodecyl (meth) acrylate, p-isopropenyl Examples thereof include phenol, styrene, α-methylstyrene, acrylonitrile, vinyl carbazole and the like. Here, EO modification means ethylene oxide modification, ECH modification means epichlorohydrin modification, and PO modification means propylene oxide modification.

  Moreover, it is preferable that UV curable resin contains a photoinitiator. The photopolymerization initiator is not particularly limited as long as it is compatible with nanoimprint lithography. For example, Irgacure (registered trademark) 184 (1-hydroxycyclohexyl phenyl ketone), Irgacure (registered trademark) 2959 (1) manufactured by Ciba. -[4- (2-hydroxyethoxy) phenyl] -2-hydroxy-2-methyl-1-propan-1-one, Irgacure® 500 (1-hydroxycyclohexyl phenyl ketone, benzophenone), Irgacure® 369 (2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butanone-1), Irgacure® 907 (2-methyl-1 [4-methylthiophenyl] -2-morpholinopropane -1-one, Ir acure® 651 (2,2-dimethoxy-1,2-diphenylethane-1-one), Irgacure® 819 (bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, Irgacure (Registered trademark) 1800 (bis (2,6-dimethoxybenzoyl) -2,4,4-trimethyl-pentylphosphine oxide, 2-hydroxy-2-methyl-1-phenyl-1-propan-1-one), Irgacure® OXE01 (1,2-octanedione, 1- [4- (phenylthio) phenyl] -2- (O-benzoyloxime), Irgacure® 1800 (bis (2,6-dimethoxybenzoyl) -2,4,4-trimethyl-pentylphosphine oxide, -Hydroxy-cyclohexyl-phenyl-ketone), Darocur® 1173 (2-hydroxy-2-methyl-1-phenyl-1-propan-1-one), Darocur® 1174, Darocur® 1116, Darocure (registered trademark) 1020 and Darocure (registered trademark) 1398, Lucirin TPO (2,4,6-trimethylbenzoyldiphenylphosphine oxide) manufactured by BASF, Lucirin TPO-L (2,4,6-trimethylbenzoylethoxy) Phenylphosphine oxide), Sanwa Chemical's MP-triazine (2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -1,3,5-triazine), Sanwa Chemical's TFE- Thoria (2- [2- (furan-2-yl) vinyl] -4,6-bis (trichloromethyl) -1,3,5-triazine), TME-triazine (2- [2 -(5-methylfuran-2-yl) vinyl] -4,6-bis (trichloromethyl) -1,3,5-triazine), TAZ-113 (2- [2- (3 4-dimethoxyphenyl) ethenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine), TAZ-108 (2- (3,4-dimethoxyphenyl) -4,6 manufactured by Midori Chemical Co., Ltd. -Bis (trichloromethyl) -1,3,5-triazine), benzophenone, methyl-2-benzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 4,4'-bisdiethylaminobenzophenone, ethyl Lumihillers ketone, 2-chlorothioxanthone, 4-phenylbenzophenone, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 1-chloro-4-propoxythioxanthone, 2-methylthioxanthone, 2-methylthioxanthone Thioxanthone ammonium salt, benzoin, benzoin methyl ether, benzoin ethyl ether, 4,4'-dimethoxybenzoin, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, 1,1,1-trichloroacetophenone, diethoxyacetophenone and dibenzos Beron, methyl o-benzoylbenzoate, 4-benzoylbiphenyl, 4-benzoyldiphenyl ether, 1,4-benzo Rubenzene, benzyl, 2-benzoylnaphthalene, 2-ethylanthraquinone, 2,2-bis (2-chlorophenyl) 4,4 ′, 5,5′-tetrakis (3,4,5-trimethoxyphenyl) 1,2 ′ -Biimidazole, 2,2-bis (o-chlorophenyl) 4,4 ', 5,5'-tetraphenyl-1,2'-biimidazole, 10-butyl-2-chloroacridone, [4- (methyl Phenylthio) phenyl] phenylmethane), tris (4-dimethylaminophenyl) methane, ethyl-4- (dimethylamino) benzoate, 2- (dimethylamino) ethylbenzoate, butoxyethyl-4- (dimethylamino) benzoate Can be mentioned.

  In the first transfer process, a UV curable resin is provided between the fine irregularities 33 of the mold 32 and the substrate 31 by applying a gravure mesh, a spin coater or the like on the fine irregularities 33 of the mold 32. A method in which the base material 31 is pasted after it is uniformly applied (filled) using an instrument, or a base material 31 is pasted after a UV curable resin is dropped (filled) onto the fine irregularities 33 of the mold 32. Examples thereof include a method of stretching a UV curable resin, and a method of uniformly applying (filling) the substrate 31 using a coating tool such as a gravure mesh or a spin coater and then bonding it to the mold 32.

  In the first transfer step, the film thickness of the UV curable resin provided between the fine irregularities 33 of the mold 32 and the base material 31 is not particularly limited, but the manufactured mold is used as a mold for nanoimprint lithography. Therefore, it is preferable to adjust the thickness of the UV curable resin film to 2 μm or less in order to reduce the environmental load.

  In the second transfer step, a method similar to that in the first transfer step can be used as a method for forming the UV curable resin on the substrate 31. In the second transfer step, when the UV curable resin film 41 is formed on the base material 31 on which the first fine concavo-convex structure portion 36 is already provided (see FIG. 4B), the mold 32 After uniformly applying the fine concavo-convex portion 33 using a coating tool such as a gravure mesh or a spin coater, the base material 31 having the first fine concavo-convex structure portion 36 is disposed on the mold 32 from the fine concavo-convex portion 33 side. A method, a method in which a UV curable resin is dropped on the fine concavo-convex portion 33 of the mold 32 and the base material 31 having the first fine concavo-convex structure portion 36 is laminated, and the UV curable resin is stretched. Examples thereof include a method in which the fine uneven structure portion 36 surface of the base material 31 having the structure portion 36 is uniformly applied using an application tool such as a gravure mesh or a spin coater and then bonded to the mold 32. In particular, it is more preferable to apply the UV curable resin film 41 so as to completely cover the fine uneven portion 33 of the mold 32 in order to reduce the environmental load.

  In the second transfer step, the film thickness of the UV curable resin provided between the fine uneven portion 33 of the mold 32 and the base material 31 is newly formed with the first fine uneven structure portion 36 on the base material 31. In order to improve the bonding state between the second fine concavo-convex structure portion 43, the thickness is preferably 2 μm or less. In the second transfer step, it is preferable to form a film thickness approximately equal to the film thickness of the UV curable resin used when the first fine concavo-convex structure portion 36 is produced.

  In the second transfer step, in order to make the bonding state between the first fine uneven structure portion 36 already formed on the substrate 31 and the newly formed second fine uneven structure portion 43 good (flat). When the mold 32 is placed on the base material 31 on which the first fine concavo-convex structure portion 36 is formed, the boundary 33a between the fine concavo-convex portion 33 and the step portion 34 of the mold 32 and the base material 31 are already present. It is preferable to match the end portion of the inclined portion 36e of the formed first fine concavo-convex structure portion 36 with an accuracy of 500 μm or less. By arranging in this way, the continuity and flatness of the boundary 44a between the first fine concavo-convex structure portion 36 and the second fine concavo-convex structure portion 43 are improved.

  In the first transfer step and the second transfer step, the openings 37a and 42a are positioned at a position of 5 mm or less from the boundary 33a between the fine uneven portion 33 and the step portion 34 of the mold 32 to the fine uneven portion 33 side. It is preferable to provide masks 37 and 42. By providing the masks 37 and 42 as described above, the leakage of UV light from the opening 37a can be effectively used, and the area of the fine uneven portion 33 of the mold 32 used for transfer can be maximized. can do. Further, it is more preferable that the mask 37 is provided on the basis of a position of 2 mm or less from the boundary 33a of the mold 32 disposed on the base material 31 toward the fine uneven portion 33 side.

  The masks 37 and 42 used in the first transfer process and the second transfer process preferably have an opening 37a having a substantially rectangular shape in plan view. In addition, the shape of the openings 37a and 42a is preferably a shape that is similarly reduced to 2 mm or more and 10 mm or less with respect to the fine uneven portion 33 of the mold 32. In particular, by utilizing the leakage of UV light from the openings 37a and 42a and utilizing the area of the fine uneven portion 33 to be transferred to the maximum, 2 mm or more and 4 mm or less from the boundary 33a of the mold 32 to the fine uneven portion 33 side. It is more preferable to use the masks 37 and 42 having the openings 37a and 42a having a shape reduced in size.

  The material of the masks 37 and 42 is not particularly limited as long as the material does not transmit UV light. For example, Al, Cu, Ag, Fe, Pb, Cr, Ti, Zn, and oxides thereof And UV-absorbing resins such as triacetyl cellulose and polyimide, and resins containing benzotriazole, benzoate, benzophenone, and triazine-based ultraviolet absorbers. Examples of the UV absorber include TINUVIN P, TINUVIN P FL, TINUVIN 326, TINUVIN 326 FL, TINUVIN 328, TINUVIN 329FL, TINUVIN 213FL, TINUVIN 571 SS, TINUVIN 157 SS, TINUVIN 157 B Examples include Eversorb 10, Eversorb 11, Eversorb 12, Eversorb 70, Eversorb 71, Eversorb 72, Eversorb 73, Eversorb 74, Eversorb 75 and the like available from Eiko Chemical Industries Ltd.

  In the first transfer process and the second transfer process, the UV curable resin is used for cleaning after exposure / curing, and uncured portions of the UV curable resin are removed by the cleaning, and the mold support substrate is swollen or dissolved. Is not particularly limited, for example, ethanol, propylene glycol monomethyl ether (PGME), ethyl acetate, isobutyl acetate, butyl acetate, methyl ethyl ketone, methyl isobutyl ketone, 1-propanol, 2-propanol, 2-butanol, N-butanol Use of ethanol or the like can be mentioned. Moreover, you may wash | clean with a pure water after wash | cleaning with these washing | cleaning liquids.

  In the mold manufacturing method according to the present embodiment, the base material 51 of the mold 52 produced by transfer from the mold 44 via the UV curable resin is not particularly limited. Polyester resin, a type of polyester resin that has little molecular orientation, such as polyethylene terephthalate (PET), polycarbonate (PC) resin, etc., base material made of triacetyl cellulose or polyimide that does not transmit UV, Fe, Cu, Examples thereof include Cr, Si, Ni, oxides thereof, quartz, glass, and stainless steel.

  When manufacturing the mold 52 from the mold 44, the method of providing the UV curable resin between the first fine concavo-convex structure portion 36 and the second fine concavo-convex structure portion 43 of the mold 44 and the substrate 51 is not particularly limited. For example, a UV curable resin film may be formed. As a method of forming a UV curable resin film between the first fine concavo-convex structure portion 36 of the mold 44 and the substrate 51, a gravure mesh is formed on the fine concavo-convex structure portions 53a and 53b of the mold 52. A UV curable resin is dropped onto the first fine concavo-convex structure portion 36 and the second fine concavo-convex structure portion 43 of the mold 44 by applying the substrate 51 after uniformly applying using a coating device such as a spin coater or the like. Then, the first fine concavo-convex structure portion of the mold 44 is applied after the base material 51 is pasted and the UV curable resin is stretched at the same time, and the base material 51 is uniformly coated using a coating tool such as a gravure mesh or a spin coater. 36 and a method of bonding to the second fine concavo-convex structure portion 43. The UV curable resin film is preferably adjusted to have a thickness of 2 μm or less in order to use the manufactured mold 52 as a mold for nanoimprint lithography and to reduce the environmental load.

  As described above, according to the present embodiment, exposure / curing is performed using a mold having a fine concavo-convex structure portion on the surface and using a mask having an opening smaller than the region of the fine concavo-convex portion of the mold. Thus, the difference between the height of the first fine concavo-convex structure portion and the height of the second fine concavo-convex structure portion produced in the first transfer step can be reduced. In particular, in the present embodiment, exposure and curing are performed with the center of the opening of the mask and the center of the fine concavo-convex structure of the mold approximately matched, thereby using light leakage from the mask opening. Since exposure and curing are performed, the inclined structure of the inclined portion of the first fine concavo-convex structure portion and the inclined portion of the boundary of the second fine concavo-convex structure portion can be used, and the boundary can be flattened. For this reason, in the case of manufacturing a mold particularly used for nanoimprinting, a large area nanoimprinting mold can be manufactured even when a small area mold is used.

(Example)
Next, examples performed for clarifying the effects of the present invention will be described. In addition, this invention is not limited at all by the following examples.

(Example 1)
A nickel mold having a fine concavo-convex structure (fine concavo-convex portion) having a size (height) of 150 nm and a pitch of 140 nm on the surface was subjected to a mold release treatment using Durasurf 2101Z manufactured by Harves. Next, a UV curable resin containing trimethylolpropane triacrylate (M350, manufactured by Toagosei Co., Ltd.) as a main component is dropped on the fine irregularities of the mold, and a polyethylene terephthalate (PET) film having a thickness of 100 μm is bonded to the hand roller. Was used to stretch the UV curable resin. Subsequently, an aluminum mask was fixed on the PET film with a tape made of polyimide so that an opening was provided on the basis of a position of 2 mm from the outer peripheral edge of the fine uneven portion of the mold to the inside of the fine uneven portion. Next, a UV irradiation source having a light amount of 100 mJ / cm ² was set to 1 mm / sec. The film was exposed through a PET film at a speed of After the exposure, the mask and the PET film were peeled off, and the fine uneven structure-formed surface of the PET film was sufficiently washed with ethanol, and then washed with pure water. Finally, by drying by air blow, the fine uneven structure of the nickel mold was transferred onto the PET film to form the first fine uneven structure portion.

Next, a UV curable resin containing trimethylolpropane triacrylate (M350, manufactured by Toagosei Co., Ltd.) as a main component is dropped into the nickel mold, and the fine concavo-convex structure of the PET film onto which the first fine concavo-convex structure portion is transferred. The formed surfaces were bonded together, and the UV curable resin was stretched using a hand roller. At this time, the fine concavo-convex part of the mold and the first fine concavo-convex part on the PET film so that the end of the first fine concavo-convex structure part already formed coincides with the outer peripheral edge of the fine concavo-convex part of the mold. Alignment was performed so that the structure did not overlap. Subsequently, an aluminum mask was fixed on the PET film with a tape made of polyimide so that an opening was provided on the basis of a position of 2 mm from the outer peripheral edge of the fine uneven portion of the mold to the inside of the fine uneven portion. Next, a UV irradiation source having a light amount of 100 mJ / cm ² was set to 1 mm / sec. The film was exposed through a PET film at a speed of After the exposure, the mask and the PET film were peeled off, and the fine uneven structure-formed surface of the PET film was sufficiently washed with ethanol, and then washed with pure water. Finally, by drying by air blow, the fine concavo-convex structure of the nickel mold was transferred onto the PET film to form a second fine concavo-convex structure portion. Through the above steps, a mold having a first fine concavo-convex structure portion and a second fine concavo-convex structure portion in which two fine concavo-convex structures of a nickel mold were transferred onto a PET film was produced.

  About the obtained mold, using an atomic force microscope and a contact-type step meter, the boundary between the first fine concavo-convex structure portion and the second fine concavo-convex structure portion, the first fine concavo-convex structure portion, and the second fine concavo-convex structure The boundary between the part and the PET film surface was evaluated. As a result, a replica of the fine concavo-convex structure of the nickel mold is formed on the first fine concavo-convex structure portion and the second fine concavo-convex structure portion, and the boundary between the first fine structure portion and the second fine structure portion is formed. The maximum height difference was 1 μm and was continuous. In addition, an inclined structure having a maximum height difference of 2 μm was formed at the boundary between the first fine concavo-convex portion and the second fine concavo-convex structure portion and the PET film surface.

Next, on a triacetylcellulose (TAC) film, 3 wt. A trimethylolpropane triacrylate solution (M350, manufactured by Toagosei Co., Ltd.) diluted to% was spin-coated at 1000 rpm for 10 seconds and 500 rpm for 20 seconds to form a trimethylolpropane triacrylate film having a thickness of 100 nm. Next, the trimethylolpropane triacrylate film-forming surface of the TAC film and the surface of the mold on which the first fine concavo-convex structure portion and the second fine concavo-convex structure portion are formed are bonded together, and UV having a light amount of 100 mJ / cm ^2. The irradiation source was 1 mm / sec. And passed through a PET film at a speed of After the exposure, the PET film and the TAC film were peeled off, and the fine concavo-convex structure transfer surface of the TAC film was sufficiently washed with ethanol, and then washed with pure water. Finally, the mold was dried by air blow to produce a mold in which the first fine uneven structure portion and the second fine uneven structure portion of the mold were transferred onto the TAC film.

  About the obtained TAC film, the boundary between the aspect of a film whole surface, a fine uneven structure part, and a fine uneven structure part was evaluated using the monochromatic light source, the atomic force microscope, and the contact-type level difference meter. As a result, there are no visible defects on the entire surface of the film, a fine uneven structure similar to the fine uneven part of the nickel mold is formed, and the maximum height difference of the boundary between the adjacent fine structure part and the fine structure part is It was 1 μm and was continuous.

(Comparative Example 1)
A mold made of nickel having a size (height) of 150 nm and a pitch of 140 nm on the surface thereof was subjected to mold release using Durasurf 2101Z manufactured by Harves. Next, a UV curable resin mainly composed of trimethylolpropane triacrylate (M350, manufactured by Toagosei Co., Ltd.) is dropped, and a 100 μm-thick polyethylene terephthalate (PET) film is bonded to the UV curable resin using a hand roller. Was postponed. Thereafter, a UV irradiation source having a light quantity of 100 mJ / cm ² was set to 1 mm / sec. The film was exposed through a PET film at a speed of After the exposure, the mask and the PET film were peeled off, and the fine uneven structure-formed surface of the PET film was sufficiently washed with ethanol, and then washed with pure water. Finally, it was dried by air blow, and the fine uneven structure of the nickel mold was transferred onto the PET film to form a fine uneven structure portion.

  About the obtained PET film including one fine concavo-convex structure part, an atomic force microscope, a contact-type step gauge, and a digital caliper were used to evaluate the fine concavo-convex structure part and the boundary between the fine concavo-convex structure part and the PET film surface. did. As a result, a replica of the fine concavo-convex structure of the nickel mold was formed, and the boundary between the fine concavo-convex structure portion and the PET film surface had a maximum height difference of 80 μm, and a structure in which the boundary was close to a right angle was formed. .

Next, on a triacetylcellulose (TAC) film, 3 wt. A trimethylolpropane triacrylate film having a thickness of 100 nm was formed by spin-coating a film composed of a solution containing trimethylolpropane triacrylate diluted to% as a main component for 10 seconds at 1000 rpm and 20 seconds at 500 rpm. The trimethylolpropane triacrylate film-shaped surface of the TAC film and the fine concavo-convex structure forming surface of the PET film including one fine concavo-convex structure portion are bonded together, followed by a UV irradiation source having a light amount of 100 mJ / cm ² , 1 mm / sec. And passed through a PET film at a speed of After the exposure, the PET film and the TAC film were peeled off, and the surface on which the fine uneven structure of the TAC film was sufficiently formed was washed with ethanol, and then washed with pure water. Finally, it was dried by air blow to produce a structure in which the structure of the fine concavo-convex structure surface of the PET film including one fine concavo-convex structure portion on the TAC film was transferred.

  About the obtained TAC film, it evaluated using the monochromatic light source, the atomic force microscope, and the contact-type level difference meter. As a result, no resin is applied to the step corresponding to the step portion of the nickel mold, and defects can be visually recognized in the peripheral portion of the fine concavo-convex structure portion, while the same as the nickel mold near the center of the fine concavo-convex structure portion. A fine concavo-convex structure was formed.

(Comparative Example 2)
A mold made of nickel having a size (height) of 150 nm and a pitch of 140 nm on the surface thereof was subjected to mold release using Durasurf 2101Z manufactured by Harves. Next, a small amount of a UV curable resin mainly composed of trimethylolpropane triacrylate was dropped, and a polyethylene terephthalate (PET) film having a thickness of 100 μm was bonded, and at the same time, the UV curable resin was stretched using a hand roller. At this time, the resin amount was adjusted so that the UV curable resin was stretched only in the fine uneven structure portion of the mold. Subsequently, a UV irradiation source having a light quantity of 100 mJ / cm ² was set to 1 mm / sec. And passed through a PET film at a speed of After the exposure, the PET film was peeled off, and the surface on which the fine uneven structure of the PET film was sufficiently formed was washed with ethanol, and then washed with pure water. Finally, it was dried by air blow to prepare a structure in which one fine uneven structure of a nickel mold was transferred onto a PET film.

  The obtained PET film was evaluated using an atomic force microscope. As a result, the outer peripheral shape of the transferred fine concavo-convex structure was elliptical, while the fine concavo-convex structure portion was formed with a structure serving as a replica of the fine concavo-convex structure of the nickel mold.

Next, a small amount of a UV curable resin containing trimethylolpropane triacrylate (M350, manufactured by Toagosei Co., Ltd.) as a main component is dropped into the nickel mold, and the fineness of the PET film on which one of the fine concavo-convex structures is transferred. The UV curable resin was stretched in the direction of the fine concavo-convex structure of the nickel mold at the same time as the surfaces on which the concavo-convex structure portion was formed were bonded together. At this time, the resin amount was adjusted so that the UV curable resin was stretched only on the fine irregularities of the nickel mold. Further, the end of the fine uneven portion of the mold and the end of the fine uneven portion of the nickel mold are matched as much as possible, and the end of the fine uneven portion of the mold and the fine uneven portion Alignment was made so as not to overlap the end of the. Subsequently, an aluminum mask is fixed on the PET film with a tape made of polyimide based on a position of 2 mm from the outer periphery of the fine uneven part of the mold to the inside of the fine uneven part, and then has a light quantity of 100 mJ / cm ^2. The UV irradiation source was 1 mm / sec. And passed through a PET film at a speed of After the exposure, the mask and the PET film are peeled off, and the surface of the PET film where the fine concavo-convex structure is sufficiently formed is washed with ethanol, followed by washing with pure water, and finally drying with air blow, PET A mold in which two fine concavo-convex structure portions of a nickel mold were transferred onto a film was produced.

  About the obtained mold, the boundary between the fine concavo-convex structure part and the fine concavo-convex structure part and the boundary between the fine concavo-convex structure part and the PET film surface were evaluated using an atomic force microscope and a contact-type step meter. As a result, a replica of the fine concavo-convex structure of the mold is formed, and the maximum height difference of the boundary between the fine structure part and the fine structure part is continuous at 1 μm. The first fine concavo-convex structure part and the second fine concavo-convex part An inclined structure having a maximum height difference of 2 μm at the boundary between the structure portion and the PET film surface was formed. However, the shape of the outer periphery of the first fine concavo-convex structure portion and the second fine concavo-convex structure portion has a shape in which two ellipses are connected, and the boundary between the first fine concavo-convex structure portion and the second fine concavo-convex structure portion. The length was about 16% as compared with the case of Example 1, and the fine irregularities of the original nickel mold were not fully utilized.

  The mold manufacturing method of the present invention can easily apply a large area mold from a small area mold to nanoimprint lithography with high accuracy.

11, 31, 61, 71 Base material 12, 13, 14, 36, 43, 53a, 53b Fine uneven structure portion 12a, 33a, 44a Border 13a, 14a, 36a, 43a Uneven portion 13b-13d, 14b-14d, 36b -36e, 43b-43e, 51a, 51b Inclined portion 32 Mold 33 Fine uneven portion 34 Stepped portion 37, 42 Mask 37a, 42a Open portion 44, 52 Mold 62 Resist layer 62a Recess bottom portion 63, 72 Mold 73 Fixing tape

Claims (3)

After filling the micro concavo-convex portion of the mold with a photocurable resin, using a mask having an opening that is similarly reduced in size than the region of the micro concavo-convex portion, the center of the micro concavo-convex portion and the center of the opening A first transfer step in which the photo-curing resin is exposed and cured to form a fine concavo-convex structure,
After the mold is disposed so that the end of the fine uneven portion is adjacent to the end of the fine uneven structure portion formed in the previous step, an opening that is similar in size to the region of the fine uneven portion is provided. And a second transfer step of forming a fine concavo-convex structure portion by exposing and curing the photocurable resin so that the center of the fine concavo-convex portion and the center of the opening portion are approximately matched using a mask. A method for producing a mold, characterized in that:   The mask has a similar shape to the fine concavo-convex structure portion of the mold, and has a similar shape reduced by 2 mm or more and 4 mm or less inward from the outer periphery of the fine concavo-convex structure portion of the mold. A method for producing the mold according to 1.   The mold manufacturing method according to claim 1, wherein the fine structure forming portion has a substantially rectangular shape in a plan view.

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