JP2011203291A - Ultraviolet-ray irradiation device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an ultraviolet-ray irradiation device enabling reliable voltage application to a liquid crystal panel in a manufacturing process of the liquid crystal panel using PSVA technology and capable of performing reliable ultraviolet ray irradiation processing.SOLUTION: In the ultraviolet-ray irradiation device provided with a stage for conveying a processed substrate sealing a liquid crystal containing a photoreaction material in the inside, a voltage probe for applying voltage on the processed substrate conveyed to the stage, an ultraviolet ray source for irradiating the processed substrate with an ultraviolet ray, and an ultraviolet ray irradiator arranged with the ultraviolet ray source, the stage has a water cooling mechanism, and is provided with a determination ray source on the face of a side where the processed substratem is installed, and a detection mechanism for detecting a ray from the determination ray source is provided on the side of the ultraviolet ray irradiator for the stage.

Description

  The present invention relates to an apparatus used for manufacturing a liquid crystal panel. In particular, the present invention relates to an ultraviolet light irradiation device used in a manufacturing process of a liquid crystal panel.

  In the conventional liquid crystal panel manufacturing process, the liquid crystal is aligned in a predetermined direction when a voltage is applied to the liquid crystal panel. Therefore, the alignment film is formed with a cloth as a process for forming a fine groove in the same direction on the alignment film formed on the liquid crystal substrate. The rubbing “rubbing method” was widely used. However, fine dust generated by rubbing the surface of the alignment film with a cloth causes poor wiring for a circuit for each pixel having a wiring pattern of several nm or a semiconductor element such as a transistor formed on the same panel. This causes problems such as malfunction of the liquid crystal element. There is also a problem that static electricity generated by friction with the cloth destroys a transistor or the like formed on the same panel.

  Development of a technique for solving such a problem has been advanced, and a photo-alignment technique has been developed as a manufacturing method capable of controlling the alignment of liquid crystal without performing mechanical treatment on the alignment film of the liquid crystal substrate. As a photo-alignment technique, a photo-alignment processing method using a light polarization memory film is known, and for example, JP-A-9-318946 (Patent Document 1) is known. However, in this method, 1) the viewing angle of the manufactured liquid crystal panel cannot be sufficiently widened, and 2) since a uniform alignment process cannot be obtained, the liquid crystal molecules are tilted when a voltage is applied (disclination). There was a problem that occurred.

  Recently, there has been a demand for the development of a liquid crystal panel that solves such problems and has a high reaction rate when a voltage is applied, and imparts alignment characteristics to the liquid crystal near the alignment film using a photopolymerizable monomer. As a technique, a polymer stabilized vertically aligned nematic (PSVA) technique has been developed. As such a technique, for example, Japanese Patent Laid-Open No. 2008-116673 (Patent Document 2) is known.

  A configuration of a conventional liquid crystal panel manufacturing apparatus using the PSVA technology will be described with reference to the drawings. FIG. 9 shows an example of a conventional liquid crystal panel manufacturing apparatus 501. The configuration includes a loading unit 502 that can store a plurality of workpieces W (liquid crystal panels), a reversing unit 503 that reverses the vertical direction of the workpieces W stored in the loading unit 502, and a conveyance robot 507 that conveys the reversing unit 503 from the reversing unit 503. Inspection unit 504 for inspecting the workpiece W, an ultraviolet light irradiation unit 505 for irradiating the workpiece W conveyed from the inspection unit 504 with ultraviolet light, and a workpiece after the ultraviolet light irradiation processing conveyed from the ultraviolet light irradiation unit 505 And an inversion unit 506 for inverting W. In the inspection unit 504, a voltage is applied to the work W, and the liquid crystal in the work W is inspected by applying a voltage to the liquid crystal in the work W to check whether the formed transistor operates or the circuit pattern is defective. Then, it is conveyed to the ultraviolet light irradiation part 505, and an ultraviolet light irradiation process is performed.

  A detailed configuration of the ultraviolet light irradiation unit 505 is shown in FIG. In the ultraviolet light irradiation unit 505, a plurality of lamps 512 that emit ultraviolet light are arranged in parallel inside the housing 511. Each lamp 512 is provided with a reflecting mirror 513, which reflects the light radiated behind the lamp with respect to the work W and uses the light effectively. Further, a filter 514 that cuts heat rays is disposed between the lamp 512 and the workpiece W. Furthermore, the workpiece W is placed on the stage 515, and is irradiated with ultraviolet light while being in contact with the voltage probe 516 and applied with a voltage.

JP 9-318946 A JP 2008-116673 A

  Here, as a method of manufacturing a liquid crystal panel using the PSVA technology, a voltage is applied to a liquid crystal panel sandwiching a liquid crystal in which a photopolymerizable monomer is blended with a glass substrate to tilt the liquid crystal molecules, and in this state, ultraviolet light is irradiated. Is irradiated. This irradiation process is usually performed after the liquid crystal drop bonding (ODF) process in the production process of the liquid crystal panel, and a terminal for applying voltage and a substrate are not yet connected to the liquid crystal panel. Done in state. In such a case, electrical connection with the liquid crystal panel is performed by bringing a metal terminal called a contact probe (also called a voltage probe) into contact with an electrode pad portion provided on the surface of the liquid crystal panel. As described above, in the liquid crystal panel manufacturing method using the PSVA technology, it is very important to control the pretilt angle of the liquid crystal by surely applying the voltage. However, there is a problem that the pretilt angle of the liquid crystal cannot be controlled and a defective process occurs due to poor conduction between the contact probe and the liquid crystal panel or a decrease in applied voltage due to an increase in contact resistance.

  Accordingly, an object of the present invention is to provide an ultraviolet light irradiation apparatus that enables reliable application of voltage to the liquid crystal panel and can perform reliable ultraviolet light irradiation processing in the manufacturing process of the liquid crystal panel using PSVA technology. There is.

  The present invention has been made in view of the above problems, and by embedding a determination light source in the stage and turning it on, a voltage is reliably applied in the ultraviolet light irradiation processing step, and a predetermined pretilt angle is applied to the liquid crystal. An ultraviolet light irradiation apparatus that can be provided is provided. In the present invention, the light source for determination is a light source for determining whether or not voltage application for applying a voltage to a workpiece (liquid crystal panel) transported to a stage and irradiating ultraviolet light is made accurately. Specifically, it refers to a light source such as an LED embedded in a stage.

  That is, the ultraviolet light irradiation apparatus according to claim 1 applies a voltage to the stage on which the substrate to be processed encapsulating a liquid crystal containing a photoreactive substance is transferred, and to the substrate to be processed transferred to the stage. In the ultraviolet light irradiation apparatus, the stage includes a water cooling mechanism. The ultraviolet light irradiation apparatus includes: a voltage probe for performing the processing; an ultraviolet light source that irradiates the target substrate with ultraviolet light; and an ultraviolet light irradiator provided with the ultraviolet light source. And a detection light source is provided on the surface on which the substrate to be processed is installed, and a detection mechanism for detecting light from the determination light source is provided on the ultraviolet light irradiator side with respect to the stage. It is characterized by being.

  According to a second aspect of the present invention, the determination light source is a white LED or a white EL.

  According to the invention of claim 3, the light source for determination includes the first polarizing plate on the light emission side, and detects light from the light source for determination through the substrate to be processed. On the detection mechanism side, a second polarizing plate is provided in which the polarization direction is rotated by 90 degrees (crossed Nicols) with respect to the polarization direction of the first polarizing plate.

  According to a fourth aspect of the present invention, a plurality of the determination light sources are arranged on the stage.

  In the ultraviolet light irradiation apparatus according to the first aspect of the present invention, since the determination light source is provided on the stage and a detection mechanism for detecting light from the determination light source is provided, a liquid crystal that performs ultraviolet light irradiation processing is provided. It is possible to detect the ON / OFF state of the voltage applied to the panel and the detection of the applied voltage too low. As a result, there is an advantage that problems such as poor conduction between the voltage probe and the liquid crystal panel and a decrease in applied voltage due to an increase in contact resistance can be avoided.

  Moreover, since the ultraviolet light irradiation apparatus of Claim 2 of this invention uses white LED and white EL for the light source for determination, the thermal radiation from the light source for determination decreases, and an excessive heat | fever is applied to a liquid crystal panel. There is an advantage that it is possible to detect a conduction failure between the voltage probe and the liquid crystal panel and a decrease in the applied voltage due to an increase in contact resistance without adding a voltage. Further, since the light source is white, there is an advantage that it can be simultaneously confirmed whether or not the voltages applied to the respective pixels corresponding to all the RGB colors of the liquid crystal panel are normally applied.

  Furthermore, the ultraviolet light irradiation apparatus according to claim 3 of the present invention is provided with a first polarizing plate on the light emitting side of the light source for determination, and for determination in a state where a liquid crystal panel as a substrate to be processed is sandwiched between them. The voltage applied to the liquid crystal is normal because the polarization direction of the first change plate is rotated 90 degrees (crossed Nicols) on the detection mechanism side that detects the light emitted from the light source. There is an advantage that it can be easily determined whether or not the voltage is applied.

  Furthermore, in the ultraviolet light irradiation apparatus according to claim 4 of the present invention, since a plurality of determination light sources are arranged on the stage, even when a plurality of liquid crystal panels are formed on a large mother glass, There is an advantage that a predetermined voltage can be applied to the liquid crystal panel and a reliable ultraviolet light irradiation treatment can be performed.

The figure which shows the ultraviolet light irradiation apparatus concerning this invention. The figure which shows the structure of the mount frame concerning this invention. The figure which shows the outline | summary of the light source for determination concerning this invention. The figure explaining the site | part where the voltage probe concerning this invention contacts a workpiece | work. The figure which shows the flow of a voltage application test process. The figure explaining the intensity | strength of the detection light detected with the detector in voltage application determination. An example when a plurality of light sources for determination are installed on the stage. The figure which shows the example of installation of a reference light source. The figure which shows the outline of the liquid crystal panel manufacturing apparatus which has arrange | positioned the conventional ultraviolet light irradiation apparatus. The figure which shows the structure of the conventional ultraviolet light irradiation apparatus.

  The ultraviolet light irradiation apparatus of the present invention is an apparatus used in a process of forming alignment characteristics on a liquid crystal panel using PSVA technology, and a light source for determination is provided on a stage that conveys and delivers the liquid crystal panel. A detection mechanism for detecting light from the light source for determination is provided. In this determination light source, a first polarizing plate arranged in crossed Nicols with the detection mechanism side is arranged on the light emitting side, and a second polarizing plate is arranged on the detection mechanism side with a liquid crystal panel interposed therebetween. . For example, a white LED is used as the light source. With the ultraviolet light irradiation device having such a configuration, when the liquid crystal panel is irradiated with ultraviolet light, it is possible to reliably apply a voltage to the liquid crystal panel and perform processing. Specific examples will be described below with reference to the drawings.

FIG. 1 is a schematic diagram showing the configuration of an ultraviolet light irradiation apparatus 10 according to the present invention. Reference numeral 1 denotes an ultraviolet light irradiator, and an ultraviolet light lamp 11 is installed therein. The ultraviolet light radiated from the ultraviolet light lamp 11 suppresses the light quantity attenuation on the side surface and the end surface side of the ultraviolet light lamp 11 by the reflector 12 provided between the ultraviolet light irradiator 1 and the gantry 2, thereby improving efficiency. The irradiated surface is often irradiated with ultraviolet light. Although not shown in detail, a metal halide lamp, a high-pressure mercury lamp, an ultraviolet fluorescent lamp, an excimer lamp, an electrodeless lamp, or the like is used as the ultraviolet lamp 11, and an appropriate lighting power source (not shown) is connected to each other to operate the lamp. To do. The ultraviolet light irradiator 1 is installed on a gantry 2, and a stage 3, an alignment mechanism 8, and a voltage probe 6 for voltage application are installed on the gantry 2. The stage 3 has a double structure in which a surface plate 32 and a water cooling plate 33 are stacked. A determination light source 31 is provided on the surface plate 32. A cooling pipe 34 is disposed on the water cooling plate 33, and cooling water is injected from the connection port 34a and discharged from the connection port 34b. A liquid crystal panel (hereinafter also simply referred to as a workpiece W) that is an object to be irradiated is placed on the stage 3 of the ultraviolet light irradiation apparatus 10 having the above-described structure. The light source for determination 31 is turned on to confirm the connection state with the probe 6, and a voltage is applied from the voltage probe 6 to the workpiece W to change the alignment state of the liquid crystal. Since the light emitted from the light source 31 for determination does not pass through the workpiece W at first, the light is not detected by the detector 7 (for example, a photodiode) arranged as a detection mechanism. Next, if the contact of the voltage probe 6 is normal and a predetermined voltage is applied, the light emitted from the determination light source 31 passes through the workpiece W and is detected by the detector 7.
For example, a white LED or the like is used as the light source 31 for determination, so that the amount of heat generated due to light emission is small, and the work W is sufficiently cooled by the stage 3, so that excessive heat is applied to the liquid crystal. Without applying the UV light irradiation treatment, it is possible to perform the ultraviolet light irradiation treatment in a state where the voltage is reliably applied.

  FIG. 2 is a diagram showing the configuration of the gantry 2 of the ultraviolet light irradiation apparatus 10 according to the present invention. In order to install the workpiece W on the stage 3, first, the delivery pin 35 installed on the delivery pin mounting base 36 is operated in the upper direction, and the workpiece W delivered by the robot arm (not shown) of the transfer robot is delivered. 35. When the workpiece W is arranged on the delivery pin 35, the robot arm is pulled, the delivery pin 35 is lowered, and the workpiece W is placed on the stage 3. When the work W is placed on the stage 3, air is passed through a plurality of fine holes (not shown) provided in the stage 3 to slightly float the work W in an air blow state. In this state, the alignment mechanism 8 holds the edge of the workpiece W and installs it at a predetermined location, and then stops the air blow state. Next, the work W is sucked and fixed on the stage 3 using a suction hole (not shown). Here, the stage 3 has a size slightly smaller than the workpiece W, and is installed so that the electrode pad portion provided on the edge of the workpiece protrudes from the stage 3. In this state, the probe pin moving mechanism 9 is raised so that the electrode pad portion of the workpiece W and the voltage probe 6 for voltage application come into contact with each other to establish conduction.

  FIG. 3 is a schematic diagram showing the configuration of the light source 31 for determination. An LED 311 is disposed in the light source 31 for determination, and a first polarizing plate 312 is disposed on the LED 311. At the upper part of the first polarizing plate 312, for example, there is a translucent window 313 using sapphire. The substrate of the LED 311 is cooled by the cooling unit 314, and slight heat generated by the LED 311 is also removed. The cooling unit 314 may be the same body as the stage 3. Although not particularly illustrated, the second polarizing plate paired with the first polarizing plate 312 is, for example, a detection in which the light emitted from the determination light source 31 is arranged on the ultraviolet light irradiator 1 side with the workpiece W interposed therebetween. It is arranged in front of the vessel 7.

  FIG. 4 is a schematic diagram for explaining a portion where the voltage probe 6 for voltage application according to the present invention contacts the workpiece W. The work W is a liquid crystal panel in which a substrate W (TFT) on which a TFT pattern is formed and a substrate W (CF) on which a color filter is formed are bonded together and filled with a mixture in which liquid crystal and a photo-synthetic monomer are added. is there. The substrate on the TFT side is slightly larger than the substrate on the CF side. An electrode pad P for applying a voltage from the outside is formed on the surface of the protruding portion. The workpiece W is installed on the surface plate 32 of the stage 3 so that the liquid crystal filling portion is cooled. After the workpiece W is placed at a predetermined location by the alignment mechanism 8, the voltage probe 6 is raised by the probe moving mechanism 9 that receives the control signal from the control unit 5. The voltage probe 6 is generally called a contact probe. The tip of the voltage probe 6 has a shape that ensures contact with the electrode pad P, and the tip is rounded so as not to damage the substrate. Although details are not shown in FIG. 4, for example, a spring member is disposed at the base of the tip part of the voltage probe 6, and after the probe tip and the workpiece W are in contact, the voltage probe 6 is slightly pressed by the probe moving mechanism. Moved. At this time, the tip of the probe sinks and is pressed with an appropriate pressure by an internal spring member to realize reliable contact. The other end of the voltage probe 6 is connected to a voltage application power source, and supplies a voltage to the workpiece W.

  When the voltage probe 6 is used repeatedly, there are problems such as a decrease in spring pressure and a problem that the tip shape is deformed and reliable contact cannot be maintained. There is also a problem that the contact is not stabilized due to a decrease in alignment accuracy, for example, a displacement due to deformation of the positioning pad or deterioration in operation accuracy. In most cases, these problems are caused by realignment of the workpiece W, or by bringing the voltage probe 6 into re-contact with the workpiece W so that conduction can be established with a correct voltage, and a predetermined pretilt angle is given to the liquid crystal. It becomes possible. As described above, after the voltage can be reliably applied to the workpiece W, the ultraviolet light irradiation device 10 emits light from the determination light source 31 installed on the stage 3 and irradiates the workpiece W with ultraviolet light. The light is detected by the photodetector 7 arranged on the side of the device 1. There is an advantage that the conduction state to the substrate is determined based on the intensity of the detection light, and a processing failure due to a decrease in applied voltage or a contact failure can be avoided.

FIG. 5 is a diagram showing a flow of a voltage application inspection process using the ultraviolet light irradiation apparatus of the present invention.
This process is composed of the following 16 steps.
1) A substrate installation process in which a work W, which is a liquid crystal panel, is conveyed and installed on a stage.
2) An air blowing process in which air is flown from a plurality of fine holes provided on the stage and the workpiece W is slightly floated in an air blowing state after the substrate is installed.
3) A substrate alignment step of adjusting the installation position of the work W that has been levitated in the air blowing step.
4) A suction process in which the workpiece W whose position has been adjusted in the substrate alignment process is sucked and fixed on the stage.

5) A probe stage moving step of moving the probe stage in order to bring the probe for applying a voltage into contact with the fixed workpiece W.
6) A probe contact process in which a voltage probe that applies a voltage to the fixed workpiece W is contacted.

7) An inspection illumination ON process in which light for confirming the contact state between the workpiece W and the voltage probe is turned on from the light source for determination arranged on the stage.
8) A voltage application step of applying a voltage to the workpiece W via a voltage probe and tilting the liquid crystal to a predetermined pretilt angle.
9) A light amount detection step of detecting light emitted from the light source for determination with a photodetector arranged on the ultraviolet light irradiator side through the workpiece W to which a voltage is applied.
10) A voltage application determination step of determining a voltage application state to the workpiece W based on the amount of light detected by the photodetector.

11) An ultraviolet irradiation process in which, when the determination result of the voltage application process is OK, an ultraviolet light irradiation process is performed with the voltage applied.
12) A probe stand down step for lowering the voltage probe after the ultraviolet light irradiation treatment.
13) A suction OFF process for releasing the workpiece W from being fixed.
14) An air blowing step for floating the workpiece W by air blowing.
15) A substrate unloading step of lifting the transfer pin to the slightly lifted workpiece W by air blow, transferring the workpiece W to the transfer robot, and unloading the workpiece W from the ultraviolet light irradiation device.

  16) A probe stand down step for temporarily lowering a voltage probe to apply a voltage to the workpiece W in the case of a determination result that voltage application is insufficient in the voltage application determination step shown in 10), that is, in the case of NG. Note that, after the probe stand down process of 16), the process returns to the air blow process shown in 2). In the air blowing process, the workpiece W is slightly lifted again, and the substrate alignment is performed again. Thereafter, the voltage application determination process is sequentially continued.

  In such a voltage application inspection process, if a voltage is normally applied to the liquid crystal panel as the workpiece W, the liquid crystal is tilted at a predetermined pretilt angle. At this time, the change direction of the first polarizing plate arranged on the light emission side of the light source for determination and the second polarizing plate on the photodetector side arranged via the liquid crystal panel is a crossed Nicols arrangement. If the liquid crystal is tilted normally, the light emitted from the determination light source is transmitted, and the light from the determination light source is detected by the photodetector 7. However, if the liquid crystal is not tilted correctly due to insufficient voltage application to the liquid crystal or poor contact with the voltage probe, the light from the light source for judgment can be transmitted only partially or completely. Yes, it can be determined by detecting the brightness from the light source for determination detected by the photodetector 7. Thereby, the contact of the voltage probe or the like can be performed without any problem, and it can be reliably determined whether or not a predetermined voltage is applied to the workpiece W.

  FIG. 6 is a diagram for explaining the intensity of the detection light when the light emitted from the light source for determination according to the present invention is detected by the detector. The vertical axis indicates the intensity I of the detection light, and the horizontal axis is a time axis according to the inspection process. Even if light is emitted from the light source for determination, if no voltage is applied to the liquid crystal panel, which is the workpiece W, the output of the detector is not displayed and the output is low. Next, when a voltage is applied to the workpiece W, if the contact of the voltage probe is normal, the output of the detector shows a high Ih output. However, there is a problem in the contact of the voltage probe with the workpiece W. For example, when the contact resistance increases, the pretilt angle of the liquid crystal does not become a predetermined inclination, and the detection light has a level (Ie) lower than Ih. When the voltage probe is not in contact at all, the level of the detection light becomes Ib level, and in any case, the determination fails. In that case, the probe base is once lowered and air blown, and the substrate alignment process is repeated. Since this operation can be performed before the ultraviolet irradiation step, it is possible to perform a reliable ultraviolet light irradiation process and achieve a high yield.

  FIG. 7 shows an embodiment in which a plurality of determination light sources 31 are installed on the stage 3. In this embodiment, an example in which six 40-inch class television substrates are taken out from the same mother glass is shown. Each liquid crystal panel is provided with a corresponding voltage application electrode pad P. For this workpiece W, the stage 3 is slightly reduced in size so that the electrode pads P protrude outside the stage 3. In the present embodiment, the determination light source 31 is provided on the stage 3 corresponding to each liquid crystal panel with respect to the mother glass. In the present embodiment, determination light sources 31 are provided at a total of six locations on the surface of the stage 3 that faces the workpiece W. As described above, when a plurality of 40 to 60 inch class television substrates are manufactured simultaneously on a large mother glass (multiple-sided), the voltage application electrode pad P also independently supplies a voltage to each panel. In general, the determination light source 31 is preferably located at a position corresponding to each panel. Further, in the present invention, the determination light source 31 is made of, for example, a white LED and is sufficiently cooled, so that there is an advantage that the ultraviolet light irradiation process to the liquid crystal is not thermally affected. .

  FIG. 8 shows an example in which a reference light source 31 </ b> R is installed in the vicinity of the light source 31 for determination provided in the surface plate 32 of the stage 3. Similar to the light source 31 for determination, the reference light source 31R is provided with a transmission window 313 using LEDs 311 and sapphire. However, since the polarizing plate 312 is not included in the reference light source 31R, reference light that does not depend on the voltage application state can be obtained. Therefore, there is an advantage that it is easy to determine whether the liquid crystal is normally tilted by voltage application and no light is detected by the photodetector, or whether the light source for determination itself is in the ON state. The determination light source 31 and the reference light source 31R are also provided with cooling units 314 and 314R for cooling the light source. Thereby, even if slight heat is generated by lighting, inspection or the like can be performed without affecting the temperature uniformity of the workpiece W.

DESCRIPTION OF SYMBOLS 1 Ultraviolet light irradiation device 2 Base part 3 Stage 5 Control part 6 Voltage probe 7 Photo detector 8 Alignment mechanism 9 Probe moving mechanism 10 Ultraviolet light irradiation apparatus 11 Ultraviolet light lamp 12 Reflector 31 Determination light source 31R Reference light source 32 Surface plate 33 Water cooling plate 34 Cooling pipe 34a Connection port 34b Connection port 35 Delivery pin 36 Delivery pin mount 311 LED
312 First polarizing plate 313 Translucent window 314 Cooling unit W Work P Electrode pad 501 Liquid crystal panel manufacturing apparatus 502 Carry-in unit 503 Inversion unit 504 Inspection unit 505 Ultraviolet light irradiation unit 506 Inversion unit 507 Transport robot 511 Housing 512 Lamp 513 Reflector 514 Filter 515 Stage 516 Voltage probe

Claims (4)

A stage on which a substrate to be processed enclosing a liquid crystal containing a photoreactive substance is transported, a voltage probe for applying a voltage to the substrate to be processed transported to the stage, and ultraviolet light on the substrate to be processed In an ultraviolet light irradiation apparatus comprising: an ultraviolet light source that irradiates the ultraviolet light; and an ultraviolet light irradiator in which the ultraviolet light source is disposed.
The stage has a water cooling mechanism, and includes a light source for determination on a surface on which the substrate to be processed is installed,
An ultraviolet light irradiation apparatus comprising a detection mechanism for detecting light from the light source for determination on the ultraviolet light irradiator side with respect to the stage.       The ultraviolet light irradiation apparatus according to claim 1, wherein the light source for determination is a white LED or a white EL.       The light source for determination includes a first polarizing plate on a light emitting side, and the polarization of the first polarizing plate is detected on the detection mechanism side that detects light from the light source for determination through a substrate to be processed. The ultraviolet light irradiation apparatus according to claim 1, further comprising a second polarizing plate disposed by rotating the polarization direction by 90 degrees with respect to the direction.       The ultraviolet light irradiation apparatus according to claim 1, wherein a plurality of the determination light sources are arranged on the stage.

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