JP2011184591A - Antistatic agent composition - Google Patents
Antistatic agent composition Download PDFInfo
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- JP2011184591A JP2011184591A JP2010052014A JP2010052014A JP2011184591A JP 2011184591 A JP2011184591 A JP 2011184591A JP 2010052014 A JP2010052014 A JP 2010052014A JP 2010052014 A JP2010052014 A JP 2010052014A JP 2011184591 A JP2011184591 A JP 2011184591A
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- Prior art keywords
- compound
- antistatic agent
- coating film
- agent composition
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000203 mixture Substances 0.000 title claims abstract description 42
- 239000002216 antistatic agent Substances 0.000 title claims description 39
- 238000000576 coating method Methods 0.000 claims abstract description 54
- 239000011248 coating agent Substances 0.000 claims abstract description 53
- 150000001875 compounds Chemical class 0.000 claims abstract description 52
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims abstract description 6
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 5
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 5
- 125000005702 oxyalkylene group Chemical group 0.000 claims abstract description 5
- 239000011347 resin Substances 0.000 claims description 37
- 229920005989 resin Polymers 0.000 claims description 37
- 239000000178 monomer Substances 0.000 claims description 18
- 125000004432 carbon atom Chemical group C* 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 15
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 13
- 239000001257 hydrogen Substances 0.000 claims description 13
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 5
- 239000002585 base Substances 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 150000002430 hydrocarbons Chemical class 0.000 abstract description 10
- 239000004215 Carbon black (E152) Substances 0.000 abstract 2
- 229930195733 hydrocarbon Natural products 0.000 abstract 2
- 239000012528 membrane Substances 0.000 abstract 1
- 230000002265 prevention Effects 0.000 abstract 1
- 230000003068 static effect Effects 0.000 abstract 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 18
- 238000000034 method Methods 0.000 description 13
- 239000003960 organic solvent Substances 0.000 description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- -1 methoxycarbitol Chemical compound 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000003999 initiator Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000011324 bead Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical compound NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 2
- XTHPWXDJESJLNJ-UHFFFAOYSA-N sulfurochloridic acid Chemical compound OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- HZSAZNPWHKCGKO-UHFFFAOYSA-N 1,3-dimethylpyrrole-2,5-dione Chemical compound CN1C(=O)C=C(C)C1=O HZSAZNPWHKCGKO-UHFFFAOYSA-N 0.000 description 1
- MLKIVXXYTZKNMI-UHFFFAOYSA-N 1-(4-dodecylphenyl)-2-hydroxy-2-methylpropan-1-one Chemical compound CCCCCCCCCCCCC1=CC=C(C(=O)C(C)(C)O)C=C1 MLKIVXXYTZKNMI-UHFFFAOYSA-N 0.000 description 1
- CMCBDXRRFKYBDG-UHFFFAOYSA-N 1-dodecoxydodecane Chemical compound CCCCCCCCCCCCOCCCCCCCCCCCC CMCBDXRRFKYBDG-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- CSHOPPGMNYULAD-UHFFFAOYSA-N 1-tridecoxytridecane Chemical compound CCCCCCCCCCCCCOCCCCCCCCCCCCC CSHOPPGMNYULAD-UHFFFAOYSA-N 0.000 description 1
- TXYKVMGAIGVXFY-UHFFFAOYSA-N 1-undecoxyundecane Chemical compound CCCCCCCCCCCOCCCCCCCCCCC TXYKVMGAIGVXFY-UHFFFAOYSA-N 0.000 description 1
- MFGALGYVFGDXIX-UHFFFAOYSA-N 2,3-Dimethylmaleic anhydride Chemical compound CC1=C(C)C(=O)OC1=O MFGALGYVFGDXIX-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- QPXVRLXJHPTCPW-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-propan-2-ylphenyl)propan-1-one Chemical compound CC(C)C1=CC=C(C(=O)C(C)(C)O)C=C1 QPXVRLXJHPTCPW-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- MXVZVCCKUVRGQC-UHFFFAOYSA-N 3-hexylpyrrole-2,5-dione Chemical compound CCCCCCC1=CC(=O)NC1=O MXVZVCCKUVRGQC-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- LPFJFXRQANKTRA-UHFFFAOYSA-N 3-propylfuran-2,5-dione Chemical compound CCCC1=CC(=O)OC1=O LPFJFXRQANKTRA-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-O Methylammonium ion Chemical compound [NH3+]C BAVYZALUXZFZLV-UHFFFAOYSA-O 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- GHAZCVNUKKZTLG-UHFFFAOYSA-N N-ethyl-succinimide Natural products CCN1C(=O)CCC1=O GHAZCVNUKKZTLG-UHFFFAOYSA-N 0.000 description 1
- HDFGOPSGAURCEO-UHFFFAOYSA-N N-ethylmaleimide Chemical compound CCN1C(=O)C=CC1=O HDFGOPSGAURCEO-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- UGZICOVULPINFH-UHFFFAOYSA-N acetic acid;butanoic acid Chemical compound CC(O)=O.CCCC(O)=O UGZICOVULPINFH-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 229920005994 diacetyl cellulose Polymers 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 150000002019 disulfides Chemical class 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- SFNALCNOMXIBKG-UHFFFAOYSA-N ethylene glycol monododecyl ether Chemical compound CCCCCCCCCCCCOCCO SFNALCNOMXIBKG-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000000855 fermentation Methods 0.000 description 1
- 230000004151 fermentation Effects 0.000 description 1
- MDQRDWAGHRLBPA-UHFFFAOYSA-N fluoroamine Chemical class FN MDQRDWAGHRLBPA-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000000813 microbial effect Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000006353 oxyethylene group Chemical group 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 150000003839 salts Chemical group 0.000 description 1
- 238000007767 slide coating Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- DZXBHDRHRFLQCJ-UHFFFAOYSA-M sodium;methyl sulfate Chemical compound [Na+].COS([O-])(=O)=O DZXBHDRHRFLQCJ-UHFFFAOYSA-M 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical class CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-O triethanolammonium Chemical compound OCC[NH+](CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-O 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Abstract
Description
本発明は、帯電防止剤組成物、該帯電防止剤組成物を用いたコーティング膜の製造方法、及び、該製造方法により得られるコーティング膜に関する。 The present invention relates to an antistatic agent composition, a method for producing a coating film using the antistatic agent composition, and a coating film obtained by the producing method.
従来、帯電防止剤としては、様々な種類のものが存在する(例えば、特許文献1参照)。しかしながら、帯電防止剤を添加して形成されるコーティング膜は、透明性に劣ることが多い。 Conventionally, various types of antistatic agents exist (see, for example, Patent Document 1). However, a coating film formed by adding an antistatic agent is often inferior in transparency.
そこで、従来、コーティング膜の透明性の低下を防止することを目的とした帯電防止剤として、特定のアニオン型帯電防止剤(例えば、特許文献2参照)や、高分子型4級アンモニウム塩(例えば、特許文献3参照)が開示されている。 Therefore, as a conventional antistatic agent for the purpose of preventing a decrease in the transparency of the coating film, a specific anionic antistatic agent (for example, see Patent Document 2) or a polymer type quaternary ammonium salt (for example, Patent Document 3) is disclosed.
しかしながら、特許文献2及び特許文献3に記載の帯電防止剤は、水洗浄すると帯電防止性能が低下し、耐水性に劣るといった問題があった。 However, the antistatic agents described in Patent Document 2 and Patent Document 3 have a problem that when washed with water, the antistatic performance decreases and the water resistance is poor.
本発明は、帯電防止性、透明性、及び、耐水性を兼ね備えたコーティング膜を得ることができる帯電防止剤組成物、該帯電防止剤組成物を用いたコーティング膜の製造方法、及び、該製造方法により得られるコーティング膜を提供する。 The present invention relates to an antistatic agent composition capable of obtaining a coating film having antistatic properties, transparency and water resistance, a method for producing a coating film using the antistatic agent composition, and the production A coating film obtained by the method is provided.
本発明の帯電防止剤組成物は、下記式(I)の化合物と下記式(II)の化合物とを、重量比((下記式(I)の化合物の重量)/(下記式(II)の化合物の重量))が90/10〜40/60の割合で含有してなる帯電防止剤組成物である。
本発明のコーティング膜の製造方法は、前記帯電防止剤組成物を基材にコーティングした後、活性エネルギー線を照射して、前記基材上にコーティング膜を形成するコーティング膜の製造方法である。 The method for producing a coating film of the present invention is a method for producing a coating film in which a coating film is formed on the substrate by irradiating active energy rays after coating the antistatic agent composition on the substrate.
本発明のコーティング膜は、前記製造方法により得られるコーティング膜である。 The coating film of this invention is a coating film obtained by the said manufacturing method.
本発明の帯電防止剤組成物、及び、該帯電防止剤組成物を用いたコーティング膜の製造方法によれば、帯電防止性、透明性、及び、耐水性を兼ね備えたコーティング膜を得ることができる。また、本発明のコーティング膜によれば、優れた帯電防止性、透明性、及び、耐水性を兼ね備える。 According to the antistatic agent composition of the present invention and the coating film manufacturing method using the antistatic agent composition, a coating film having antistatic properties, transparency, and water resistance can be obtained. . Moreover, according to the coating film of this invention, it has the outstanding antistatic property, transparency, and water resistance.
[帯電防止剤組成物]
本発明の帯電防止剤組成物は、前記式(I)の化合物(以下、「化合物(I)」ともいう)と前記式(II)の化合物(以下、「化合物(II)」ともいう)とを、重量比((前記式(I)の化合物の重量)/(前記式(II)の化合物の重量))が90/10〜40/60の割合で含有してなる帯電防止剤組成物である。
[Antistatic agent composition]
The antistatic agent composition of the present invention comprises a compound of the formula (I) (hereinafter also referred to as “compound (I)”) and a compound of the formula (II) (hereinafter also referred to as “compound (II)”). In a ratio of 90/10 to 40/60 by weight ratio ((weight of the compound of the formula (I)) / (weight of the compound of the formula (II))) is there.
前記式(I)において、化合物(I)の有機溶媒に対する溶解性、工業的入手性及びコーティング膜の透明性の観点から、R1は炭素数4〜20の炭化水素基を示すが、炭素数6〜16の炭化水素基が好ましく、炭素数6〜14の炭化水素基がより好ましく、炭素8〜12の炭化水素基がさらに好ましい。同様の観点から、R2は水素又はCH3であるが、水素が好ましい。また、化合物(I)の有機溶媒に対する溶解性、工業的入手性及びコーティング膜の透明性の観点から、XはCH2又はOであるが、CH2が好ましい。帯電防止能、化合物(I)の有機溶媒への溶解性の観点から、AOは炭素数2〜4のオキシアルキレン基であるが、炭素数2のオキシアルキレン基が好ましい。帯電防止能の観点から、nは0〜30であり、1〜20が好ましく、3〜15がより好ましく、5〜15がさらに好ましく、7〜15がよりさらに好ましい。化合物(I)の有機溶媒に対する溶解性、工業的入手性及びコーティング膜の透明性の観点から、Mはアルカリ金属又はアンモニウムであるが、アンモニウムが好ましい。 In the formula (I), R 1 represents a hydrocarbon group having 4 to 20 carbon atoms from the viewpoint of solubility of the compound (I) in an organic solvent, industrial availability, and transparency of the coating film. A hydrocarbon group having 6 to 16 carbon atoms is preferable, a hydrocarbon group having 6 to 14 carbon atoms is more preferable, and a hydrocarbon group having 8 to 12 carbon atoms is further preferable. From the same point of view, R 2 is hydrogen or CH 3 , preferably hydrogen. Further, X is CH 2 or O from the viewpoint of solubility of the compound (I) in an organic solvent, industrial availability, and transparency of the coating film, but CH 2 is preferable. From the viewpoint of antistatic ability and solubility of the compound (I) in an organic solvent, AO is an oxyalkylene group having 2 to 4 carbon atoms, preferably an oxyalkylene group having 2 carbon atoms. From the viewpoint of antistatic ability, n is 0 to 30, preferably 1 to 20, more preferably 3 to 15, still more preferably 5 to 15, and still more preferably 7 to 15. From the viewpoints of solubility of the compound (I) in an organic solvent, industrial availability, and transparency of the coating film, M is an alkali metal or ammonium, but is preferably ammonium.
前記式(II)において、コーティング膜の耐水性の観点から、R3、R4はそれぞれ独立して水素又はCH3であるが、水素が好ましい。コーティング膜の耐水性の観点から、YはO又はNR5であるが、Oが好ましい。帯電防止能の観点から、R5は水素又は炭素数1〜6の炭化水素基を示すが、水素又は炭素数1〜3の炭化水素基が好ましく、水素又は炭素数1〜2の炭化水素基がより好ましい。 In the formula (II), from the viewpoint of water resistance of the coating film, R 3 and R 4 are each independently hydrogen or CH 3 , but hydrogen is preferable. From the viewpoint of the water resistance of the coating film, Y is O or NR 5 but O is preferred. From the viewpoint of antistatic ability, R 5 represents hydrogen or a hydrocarbon group having 1 to 6 carbon atoms, preferably hydrogen or a hydrocarbon group having 1 to 3 carbon atoms, and hydrogen or a hydrocarbon group having 1 to 2 carbon atoms. Is more preferable.
コーティング膜の耐水性の観点から、前記重量比は、90/10〜40/60であり、90/10〜50/50が好ましく、85/15〜50/50がより好ましい。前記重量比が90/10を超えると、すなわち、前記式(I)の化合物の含有量が多くなると、透明性、耐水性が低下し、又、前記重量比が40/60未満となると、すなわち、前記式(II)の化合物の含有量が多くなると、帯電防止性が低くなる。本発明の前記重量比はかかる見地より求められたものである。 From the viewpoint of water resistance of the coating film, the weight ratio is 90/10 to 40/60, preferably 90/10 to 50/50, and more preferably 85/15 to 50/50. When the weight ratio exceeds 90/10, that is, when the content of the compound of the formula (I) increases, transparency and water resistance decrease, and when the weight ratio becomes less than 40/60, When the content of the compound of the formula (II) is increased, the antistatic property is lowered. The said weight ratio of this invention is calculated | required from this viewpoint.
前記帯電防止剤組成物は、活性エネルギー線硬化性を有することが好ましい。活性エネルギー線硬化性とは紫外線、電子線、放射線、X線等の活性エネルギーの照射により、又は補助的に開始剤との併用により硬化が生じる性質を意味する。 The antistatic agent composition preferably has active energy ray curability. The active energy ray curability means a property in which hardening is caused by irradiation with active energy such as ultraviolet rays, electron beams, radiation, X-rays, or in combination with an auxiliary agent.
本発明において、帯電防止剤組成物は、化合物(I)及び化合物(II)とは異なる構造を有する、帯電防止性、透明性、耐水性等を有する他の帯電防止剤を含有してもよい。ただし、帯電防止性及び透明性の観点から、帯電防止剤組成物の総量に対して、化合物(I)及び化合物(II)の合計は50重量%以上が好ましく、70重量%以上がより好ましく、90重量%以上がさらに好ましく、95重量%以上がさらにより好ましく、実質100重量%であることがさらに好ましい。 In the present invention, the antistatic agent composition may contain other antistatic agents having a structure different from that of the compound (I) and the compound (II) and having antistatic properties, transparency, water resistance and the like. . However, from the viewpoint of antistatic properties and transparency, the total amount of the compound (I) and the compound (II) is preferably 50% by weight or more, more preferably 70% by weight or more based on the total amount of the antistatic agent composition. It is more preferably 90% by weight or more, still more preferably 95% by weight or more, and still more preferably substantially 100% by weight.
前記帯電防止剤組成物は、必要に応じて、有機溶媒を含有してもよい。前記有機溶媒としては、特に限定されないが、ヘキサンなどの脂肪族炭化水素類、メタノール、エタノール、イソプロピルアルコール、メトキシエタノール、エトキシエタノール、メトキシカルビトール、ベンジルアルコールなどのアルコール類、アセトン、メチルエチルケトン、メチルイソブチルケトンなどのケトン類、塩化メチレン、クロロホルムなどのハロゲン溶媒、ジエチルエーテルなどのエーテル類、トルエン、キシレンなどの芳香族類、酢酸n−ブチル、酢酸n−エチルなどのエステル類、メチルピロリドン、ジメチルスルフォキシドなどが挙げられるが、化合物(I)及び化合物(II)の有機溶媒に対する溶解性及びコーティング膜の透明性の観点からケトン類、エステル類のような極性溶媒が好ましい。なお、後ほど述べる帯電防止剤組成物の他の成分(例えば樹脂単量体)が液状でかつ、化合物(I)及び化合物(II)と相互溶解する場合、樹脂単量体を有機溶媒として用いてもよい。 The antistatic agent composition may contain an organic solvent, if necessary. Examples of the organic solvent include, but are not limited to, aliphatic hydrocarbons such as hexane, alcohols such as methanol, ethanol, isopropyl alcohol, methoxyethanol, ethoxyethanol, methoxycarbitol, and benzyl alcohol, acetone, methyl ethyl ketone, and methyl isobutyl. Ketones such as ketones, halogen solvents such as methylene chloride and chloroform, ethers such as diethyl ether, aromatics such as toluene and xylene, esters such as n-butyl acetate and n-ethyl acetate, methylpyrrolidone, dimethylsulfate Examples thereof include foxides, but polar solvents such as ketones and esters are preferred from the viewpoints of solubility of compound (I) and compound (II) in an organic solvent and transparency of a coating film. In addition, when the other component (for example, resin monomer) described later is in a liquid state and is mutually dissolved with compound (I) and compound (II), the resin monomer is used as an organic solvent. Also good.
前記帯電防止剤組成物は、コーティング膜の透明性及び硬度の観点から、樹脂又は樹脂単量体を含有することが好ましい。前記樹脂又は樹脂単量体としては、有機溶媒で溶液状にして、基材へのコーティングに用いるのに好適な樹脂又は樹脂単量体であれば特に限定されず、例えば、活性エネルギー線により反応し得る樹脂又は樹脂単量体である。なかでも、透明性を保持する観点から、アクリル系樹脂又はその単量体が好ましい。また、コーティング膜の透明性及び硬度を向上させる観点では樹脂又は単量体は重合性官能基を2つ以上有する樹脂又は樹脂単量体であることが好ましい。両者を加味した場合の例としてはエチレングリコール(メタ)アクリレート、ポリエチレンクリコール(メタ)アクリレート、ペンタエリスリトールジ(メタ)アクリレート、ペンタエリスリトールジ(メタ)アクリレートモノアルキルエステルなどのジ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレートなどのトリ(メタ)アクリレート類、ペンタエリスリトールテトラ(メタ)アクリレートやジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスルトールEO付加物のペンタ(メタ)アクリレートなどの多官能(メタ)アクリレートやこれらの単量体が重合し生成した樹脂が挙げられる。
前記樹脂又は樹脂単量体の含有量としては、前記帯電防止剤組成物中における、化合物(I)及び化合物(II)の合計含有量が、前記樹脂又は樹脂単量体100重量部に対し、1〜40重量部となる量が好ましく、5〜40重量部となる量がより好ましく、10〜30重量部となる量がさらに好ましく、15〜30重量部となる量がさらにより好ましい。
なお、活性エネルギー線の照射により反応し得る樹脂又は樹脂単量体とは、紫外線や電子線のような活性エネルギーの照射により直接、又は補助的に開始剤の作用で間接的に硬化反応を生じる官能基を有する樹脂または樹脂単量体を示す。
The antistatic agent composition preferably contains a resin or a resin monomer from the viewpoint of the transparency and hardness of the coating film. The resin or resin monomer is not particularly limited as long as it is a resin or resin monomer suitable for use in coating on a substrate after being made into a solution with an organic solvent. Resin or resin monomer. Among these, from the viewpoint of maintaining transparency, an acrylic resin or a monomer thereof is preferable. From the viewpoint of improving the transparency and hardness of the coating film, the resin or monomer is preferably a resin or resin monomer having two or more polymerizable functional groups. Examples when both are taken into account include di (meth) acrylates such as ethylene glycol (meth) acrylate, polyethylene glycol (meth) acrylate, pentaerythritol di (meth) acrylate, pentaerythritol di (meth) acrylate monoalkyl ester, Tri (meth) acrylates such as trimethylolpropane tri (meth) acrylate and pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol EO adduct And polyfunctional (meth) acrylates such as penta (meth) acrylate and resins formed by polymerization of these monomers.
As the content of the resin or resin monomer, the total content of the compound (I) and the compound (II) in the antistatic agent composition is based on 100 parts by weight of the resin or resin monomer. The amount of 1 to 40 parts by weight is preferred, the amount of 5 to 40 parts by weight is more preferred, the amount of 10 to 30 parts by weight is more preferred, and the amount of 15 to 30 parts by weight is even more preferred.
The resin or resin monomer that can react by irradiation of active energy rays causes a curing reaction directly by irradiation of active energy such as ultraviolet rays or electron beams or indirectly by the action of an initiator. A resin or resin monomer having a functional group is shown.
前記帯電防止剤組成物には、前記成分以外に、通常使われる開始剤、ジイソシアネート化合物等の硬化剤、顔料・染料、あるいはガラスビーズ、ポリマービーズ、無機ビーズ等のビーズ類や、炭酸カルシウム、タルク等の無機充填材類、レベリング剤などの表面調整剤、安定剤、紫外線吸収剤、分散剤などの添加剤を配合できる。
前記帯電防止剤組成物には、硬化促進の観点からUV開始剤、光カチオン開始剤などの開始剤を含むことが好ましい。例えばアセトフェノン類、ゲンゾフェノン類、ケタール類、アントラキノン類、チオキサントン類、アゾ化合物、過酸化物、2,3−ジアルキルシオン類化合物類、ジスルフィド化合物、チウラム化合物類、フルオロアミン化合物などが用いられる。より具体的には1−ヒドロキシシクロヘキシルフェニルケトン、2−メチル−1[4−(メチルチオ)フェニル]−2−モルフォリノプロパン−1−オン、ベンジルジメチルケトン、1−(4−ドデシルフェニル)−2−ヒドロキシ-2−メチルプロパン−1−オン、1−(4−イソプロピルフェニル)−2−ヒドロキシ−2−メチルプロパン−1−オン、ベンゾフェノンなどが挙げられる。
In addition to the above components, the antistatic agent composition includes commonly used initiators, curing agents such as diisocyanate compounds, pigments / dyes, or beads such as glass beads, polymer beads, inorganic beads, calcium carbonate, talc. Additives such as inorganic fillers such as, surface conditioners such as leveling agents, stabilizers, UV absorbers, and dispersants can be blended.
The antistatic agent composition preferably contains an initiator such as a UV initiator or a photocationic initiator from the viewpoint of curing acceleration. For example, acetophenones, genzophenones, ketals, anthraquinones, thioxanthones, azo compounds, peroxides, 2,3-dialkylcion compounds, disulfide compounds, thiuram compounds, fluoroamine compounds and the like are used. More specifically, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one, benzyldimethylketone, 1- (4-dodecylphenyl) -2 -Hydroxy-2-methylpropan-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, benzophenone and the like can be mentioned.
[帯電防止剤組成物の製造方法]
帯電防止剤組成物は、化合物(I)と化合物(II)とを有機溶媒に溶解し、必要に応じて前記樹脂又は樹脂単量体や前記添加剤を添加することにより得ることができる。
[Production Method of Antistatic Agent Composition]
The antistatic agent composition can be obtained by dissolving the compound (I) and the compound (II) in an organic solvent and adding the resin or resin monomer or the additive as necessary.
化合物(I)は、下記の水酸基含有化合物をSO3ガスやクロル硫酸などにより硫酸化したのちに中和剤により中和する方法、下記の水酸基含有化合物をアミド硫酸やメチル硫酸ナトリウムにより直接硫酸塩を得る方法、得られた硫酸塩を更に塩交換する方法などにより得られる。前記水酸基含有化合物の具体例としては、ポリ(0〜30)オキシエチレン−1−(アリルオキシメチル)−2−ラウリルオキシエチルエーテル、ポリ(0〜30)オキシエチレン−1−(イソプロペニルオキシメチル)−2−ラウリルオキシエチルエーテル、ポリ(0〜30)オキシエチレン−1−(アリルオキシメチル)−2−オクチルオキシエチルエーテル、ポリ(0〜30)オキシエチレン−1−(アリルオキシメチル)−2−ステアリルオキシエチルエーテル、ポリ(0〜30)オキシエチレン−1−(アリルオキシメチル)−2−オレイルオキシエチルエーテル、ポリ(0〜30)オキシエチレン−1−(アリルオキシメチル)−2−ベヘニルオキシエチルエーテル、ポリ(0〜30)オキシエチレン−1−(アリルオキシメチル)ウンデシルエーテル、ポリ(0〜30)オキシエチレン−1−(アリルオキシメチル)ラウリルエーテル、ポリ(0〜30)オキシエチレン−1−(アリルオキシメチル)トリデシルエーテルを挙げることができる。
化合物(I)のMとしては、Na、K、Liなどのアルカリ金属や、NH4、トリエタノールアンモニウム、モノメチルアンモニウム、ジメチルアンモニウム、トリメチルアンモニウム、テトラメチルアンモニウムなどのアンモニウム挙げることができる。
Compound (I) is a method in which the following hydroxyl group-containing compound is sulfated with SO 3 gas or chlorosulfuric acid and then neutralized with a neutralizing agent, and the following hydroxyl group-containing compound is directly sulfated with amidosulfuric acid or sodium methylsulfate. And a method in which the obtained sulfate is further subjected to salt exchange. Specific examples of the hydroxyl group-containing compound include poly (0-30) oxyethylene-1- (allyloxymethyl) -2-lauryloxyethyl ether, poly (0-30) oxyethylene-1- (isopropenyloxymethyl). ) -2-lauryloxyethyl ether, poly (0-30) oxyethylene-1- (allyloxymethyl) -2-octyloxyethyl ether, poly (0-30) oxyethylene-1- (allyloxymethyl)- 2-stearyloxyethyl ether, poly (0-30) oxyethylene-1- (allyloxymethyl) -2-oleyloxyethyl ether, poly (0-30) oxyethylene-1- (allyloxymethyl) -2- Behenyloxyethyl ether, poly (0-30) oxyethylene-1- (allyloxymethyl) ) Undecyl ether, poly (0-30) oxyethylene-1- (allyloxymethyl) lauryl ether, poly (0-30) can be mentioned oxyethylene-1- (allyloxymethyl) tridecyl ether.
Examples of M of the compound (I) include alkali metals such as Na, K, and Li, and ammonium such as NH 4 , triethanolammonium, monomethylammonium, dimethylammonium, trimethylammonium, and tetramethylammonium.
化合物(II)としては、具体的には、無水マレイン酸、無水シトラコン酸、2−3−ジメチル無水マレイン酸、2−プロピル無水マレイン酸、マレイミド、N−メチルマレイミド、N−エチルマレイミド、N−ヘキシルマレイミド、2−メチル−N−メチルマレイミド、2−3−ジメチルマレイミドなどを挙げることができる。これらは、ブタンの酸化や微生物発酵などにより得ることができる。
また、化合物(I)及び化合物(II)は、市販品を用いることができる。
Specific examples of the compound (II) include maleic anhydride, citraconic anhydride, 2-3-dimethylmaleic anhydride, 2-propylmaleic anhydride, maleimide, N-methylmaleimide, N-ethylmaleimide, N- Examples include hexylmaleimide, 2-methyl-N-methylmaleimide, 2-3-dimethylmaleimide, and the like. These can be obtained by butane oxidation or microbial fermentation.
Moreover, a commercial item can be used for compound (I) and compound (II).
[コーティング膜の製造方法]
本発明のコーティング膜は、前述した本発明の帯電防止剤組成物を基材にコーティングし、必要に応じて乾燥などを行った後、活性エネルギー線を照射することにより得られる。なお、帯電防止剤組成物は、取り扱い性の観点から有機溶媒に化合物(I)及び化合物(II)を溶解させたものを使用することが好ましい。また、コーティング膜の帯電防止性、透明性、耐水性、硬度及びコストの観点から、活性エネルギー線の照射により反応し得る樹脂又は樹脂単量体を含有することが好ましい。
[Method for producing coating film]
The coating film of the present invention can be obtained by coating the base material with the antistatic agent composition of the present invention described above, drying it as necessary, and then irradiating with active energy rays. In addition, it is preferable to use what dissolved compound (I) and compound (II) in the organic solvent from a viewpoint of handleability as an antistatic agent composition. Moreover, it is preferable to contain the resin or resin monomer which can react by irradiation of an active energy ray from a viewpoint of the antistatic property of a coating film, transparency, water resistance, hardness, and cost.
前記帯電防止剤組成物を塗布する基材は特に制限されない。例えばガラス類、トリアセテートセルロース(TAC)ジアセチルセルロース、アセテートブチレートセルロースなどのセルロース系樹脂、ポリエチレンテレフタレート(PET)などのポリエステル樹脂、アクリル樹脂、ポリウレタン樹脂、ポリカーボネート樹脂、ポリスルフォン樹脂、ポリエーテル樹脂、ポリオレフィン樹脂、ニトリル樹脂、ポリエーテルケトン樹脂、ポリアミド樹脂などが挙げられる。
前記コーティング方法としては、特に限定されないが、例えば、バーコート法、ロールコーター法、スクリーン法、フレキソ法、スピンコート法、ディップ法、スプレー法、スライドコート法等が挙げられる。また、コーティング後の乾燥条件としては、例えば、乾燥温度50〜150℃、乾燥時間0.5〜5分間の範囲内で行われる。
The substrate on which the antistatic agent composition is applied is not particularly limited. For example, glass, cellulose resin such as triacetate cellulose (TAC) diacetyl cellulose, acetate butyrate cellulose, polyester resin such as polyethylene terephthalate (PET), acrylic resin, polyurethane resin, polycarbonate resin, polysulfone resin, polyether resin, polyolefin Resins, nitrile resins, polyether ketone resins, polyamide resins and the like can be mentioned.
The coating method is not particularly limited, and examples thereof include a bar coating method, a roll coater method, a screen method, a flexo method, a spin coating method, a dip method, a spray method, and a slide coating method. Moreover, as drying conditions after coating, for example, the drying temperature is 50 to 150 ° C., and the drying time is 0.5 to 5 minutes.
前記活性エネルギー線の照射量としては、前記帯電防止剤組成物を塗布する基材(例えば、樹脂基材)の損傷を抑制する観点から、活性エネルギー線として紫外線を用いる場合には、10〜500mJとすることが好ましい。 The irradiation amount of the active energy ray is 10 to 500 mJ when ultraviolet rays are used as the active energy ray from the viewpoint of suppressing damage to the base material (for example, resin base material) on which the antistatic agent composition is applied. It is preferable that
本発明のコーティング膜の表面固有抵抗値は、コーティング膜の帯電防止性を維持する観点から、好ましくは5×1012Ω以下であり、より好ましくは1×1012Ω以下である。なお、表面固有抵抗値は実施例記載の方法に従って測定することができる。 The surface specific resistance value of the coating film of the present invention is preferably 5 × 10 12 Ω or less, more preferably 1 × 10 12 Ω or less, from the viewpoint of maintaining the antistatic property of the coating film. The surface resistivity can be measured according to the method described in the examples.
また、本発明のコーティング膜の水洗後の表面固有抵抗値は、コーティング膜の耐水性を維持する観点から、好ましくは5×1012Ω以下であり、より好ましくは1×1012Ω以下である。 Further, the surface specific resistance value after washing of the coating film of the present invention is preferably 5 × 10 12 Ω or less, more preferably 1 × 10 12 Ω or less, from the viewpoint of maintaining the water resistance of the coating film. .
また、本発明のコーティング膜のヘイズ値は、透明性の観点から、好ましくは1%以下である。尚、ヘイズ値は実施例記載の方法に従って測定することができる。 The haze value of the coating film of the present invention is preferably 1% or less from the viewpoint of transparency. The haze value can be measured according to the method described in the examples.
以下、本発明を具体的に示す実施例等について説明する。なお、実施例等における評価項目は下記のようにして測定を行った。 Examples and the like specifically showing the present invention will be described below. In addition, the evaluation item in an Example etc. measured as follows.
[化合物(I)の製造]
<ポリ(10)オキシエチレン−1−(アリルオキシメチル)−2−ラウリルオキシエチルエーテル硫酸エステルアンモニウム塩の製造>
炭素数12の脂肪族アルコール(花王社製カルコール2098)2077gを5Lのコック付き4つ口フラスコに仕込み、窒素置換しながら30℃にて攪拌を行った。三フッ化ホウ素のジエチルエーテル錯体(和光純薬工業社製試薬)を1.6g加え、さらに、アリルグリシジルエーテル255gを2.5時間かけて滴下した。その後、4時間30℃にて攪拌を行った。4%水酸化ナトリウム水溶液500gを添加し、10分間攪拌を行ったのちに、底部のコックから水層のみを除去し、さらにイオン交換水1kgにて3回(合計3kg)水洗を行った。得られたサンプルを5Lの4つ口フラスコに移し、130℃のシリコンバスで加熱しながら、50Pasにて未反応のアルコールの除去を5時間かけて行い、1−アリルオキシメチル2−ラウリルオキシエタノール組成物を503g得た。
得られた1−アリルオキシメチル−2−ラウリルオキシエタノール組成物238g、及び、KOH0.22gを攪拌装置、温度制御装置、自動導入装置を備えたオートクレーブに仕込み、110℃、13hPaにて30分間脱水反応を行った。脱水後窒素置換を行い、120℃まで昇温した後、エチレンオキサイド(EO)を339g仕込んだ。120℃にて付加反応・熟成を4時間かけて行った後、80℃まで冷却し、40hPaで未反応のEOを30分間除去した。未反応のEOを除去後、0.23gの酢酸をオートクレーブ内に加え、80℃で30分間攪拌した後、抜き出しを行い、平均EO付加モル数が10モルのアルコキシレート組成物を得た。
得られたアルコシレート組成物100gを攪拌装置付きの300mlの4つ口フラスコに仕込み、窒素気流下、シリコンバスにて100℃に加温した。尿素(和光純薬)0.6gとアミド硫酸(和光純薬工業社製試薬)17gを添加し、100℃にて5時間反応を行ったのちにろ過を行い、目的のポリ(10)オキシエチレン−1−(アリルオキシメチル)−2−ラウリルオキシエチルエーテル硫酸エステルアンモニウム塩113gを得た。
[帯電防止剤組成物の調製]
活性エネルギー線により反応し得る樹脂としてのアクリル系樹脂(ダイセル・サイテック社製、DPHA[ジペンタエリスリトールヘキサアクリレート])と、硬化剤(チバ・スペシャルティ・ケミカルズ社製、イルガキュア184)と、有機溶媒としてメチルエチルケトンと、表1に示す化合物(I)と、化合物(II)とを混合して、実施例1〜7、及び、比較例1〜4の帯電防止剤組成物を調整した。各配合量は、表1に示す通りとした。なお、表1に示す各配合量は、活性エネルギー線により反応し得る樹脂と硬化剤と化合物(I)と化合物(II)との合計重量を100重量部としたときの各重量部数を示す。
[Production of Compound (I)]
<Production of poly (10) oxyethylene-1- (allyloxymethyl) -2-lauryloxyethyl ether sulfate ammonium salt>
2077 g of aliphatic alcohol having 12 carbon atoms (Calcoal 2098 manufactured by Kao Co., Ltd.) was charged into a 5 L four-necked flask with a cock, and stirred at 30 ° C. while purging with nitrogen. 1.6 g of diethyl ether complex of boron trifluoride (a reagent manufactured by Wako Pure Chemical Industries, Ltd.) was added, and 255 g of allyl glycidyl ether was added dropwise over 2.5 hours. Then, it stirred at 30 degreeC for 4 hours. After adding 500 g of 4% sodium hydroxide aqueous solution and stirring for 10 minutes, only the aqueous layer was removed from the bottom cock, and further washed with 1 kg of ion-exchanged water 3 times (total 3 kg). The obtained sample was transferred to a 5 L four-necked flask and unreacted alcohol was removed at 50 Pas over 5 hours while heating in a silicon bath at 130 ° C. to give 1-allyloxymethyl 2-lauryloxyethanol. 503 g of composition was obtained.
238 g of the obtained 1-allyloxymethyl-2-lauryloxyethanol composition and 0.22 g of KOH were charged into an autoclave equipped with a stirrer, a temperature controller, and an automatic introduction device, and dehydrated at 110 ° C. and 13 hPa for 30 minutes. Reaction was performed. After dehydration, nitrogen substitution was performed, and after raising the temperature to 120 ° C., 339 g of ethylene oxide (EO) was charged. After addition reaction and ripening at 120 ° C. for 4 hours, the mixture was cooled to 80 ° C., and unreacted EO was removed at 40 hPa for 30 minutes. After removing unreacted EO, 0.23 g of acetic acid was added to the autoclave, and the mixture was stirred for 30 minutes at 80 ° C., and then extracted to obtain an alkoxylate composition having an average EO addition mole number of 10 moles.
100 g of the obtained alkoxylate composition was charged into a 300 ml four-necked flask equipped with a stirrer, and heated to 100 ° C. in a silicon bath under a nitrogen stream. Add 0.6 g of urea (Wako Pure Chemical Industries) and 17 g of amidosulfuric acid (reagent manufactured by Wako Pure Chemical Industries, Ltd.), react at 100 ° C. for 5 hours, and filter to obtain the desired poly (10) oxyethylene. 113 g of -1- (allyloxymethyl) -2-lauryloxyethyl ether sulfate ammonium salt was obtained.
[Preparation of antistatic agent composition]
Acrylic resin (Daicel Cytec, DPHA [dipentaerythritol hexaacrylate]) as a resin that can react with active energy rays, a curing agent (Ciba Specialty Chemicals, Irgacure 184), and an organic solvent Methyl ethyl ketone, compound (I) shown in Table 1 and compound (II) were mixed to prepare antistatic agent compositions of Examples 1 to 7 and Comparative Examples 1 to 4. Each blending amount was as shown in Table 1. In addition, each compounding quantity shown in Table 1 shows each weight part number when the total weight of resin, hardening | curing agent, compound (I), and compound (II) which can react with an active energy ray is 100 weight part.
[コーティング膜の作製]
得られた各帯電防止剤組成物を、セルローストリアセテート(TAC)フィルム(幅10cm×長さ12cm×厚み80μm)に紫外線照射後のコーティング膜が厚み4μmになるように、バーコーター(ギャップ:9〜13μm)を用いてほぼ一面に塗布し、表1に示す乾燥条件で乾燥させた。乾燥後のフィルムを、UV照射装置(ハイテック社製HTE−505HA、紫外線ランプはUSH−500MB)にて、窒素気流下、紫外線照射(200mJ)し、コーティング膜(厚み4μm)を得た。なお、塗工厚は塗工面の幅の中央線上の1点、及び中央線から左右に幅をとった2点を測定し、その3点の平均値を用いた。
[Production of coating film]
Each antistatic agent composition obtained was applied to a cellulose triacetate (TAC) film (width 10 cm × length 12 cm × thickness 80 μm) so that the coating film after UV irradiation had a thickness of 4 μm (gap: 9 to 13 μm) was applied to almost one surface and dried under the drying conditions shown in Table 1. The dried film was irradiated with ultraviolet rays (200 mJ) in a nitrogen stream with a UV irradiation device (HTE-505HA manufactured by Hitec Co., Ltd., an ultraviolet lamp is USH-500 MB) to obtain a coating film (thickness 4 μm). In addition, the coating thickness measured 1 point on the center line of the width | variety of the coating surface, and 2 points | pieces which took the width | variety to the left and right from the center line, and used the average value of the 3 points | pieces.
[帯電防止性(コーティング膜の表面固有抵抗値)試験]
コーティング膜(実施例1〜7、及び、比較例1〜4)について、温度25℃、相対湿度50%に調整した室内で、A−4329型ハイレジスタンスメータ(横河YHP社製)により、膜の中央部の表面固有抵抗値を測定した。なお、表面固有抵抗値は、数値が小さいほど帯電防止性が優れることを示す。
結果を表1に示す。
[Antistatic property (surface resistivity of coating film) test]
The coating films (Examples 1 to 7 and Comparative Examples 1 to 4) were subjected to the A-4329 type high resistance meter (manufactured by Yokogawa YHP) in a room adjusted to a temperature of 25 ° C. and a relative humidity of 50%. The surface specific resistance value at the center of each was measured. The surface specific resistance value indicates that the smaller the value, the better the antistatic property.
The results are shown in Table 1.
[耐水性(コーティング膜の水洗後の表面固有抵抗値)試験]
コーティング膜(実施例1〜7、及び、比較例1〜4)について、水洗し、その後、表面固有抵抗値を測定した。水洗の条件は、水道水を内径14mmの水道の蛇口から流速10L/minの流量で流しつつ、その蛇口の直下10cmの位置に試験フィルムを水道水が垂直に当たるように設置し、30秒間コーティング面に均一にかかるように動かしながら行った。その後、日本製紙クレシア社製ハイパードライペーパータオルにてコーティング面の水分を除去し、温度25℃、相対湿度50%にて3分間送風乾燥し、水滴がなくなることを確認した。なお、表面固有抵抗値は、数値が小さいほど耐水性が優れることを示す。
結果を表1に示す。
[Water resistance (surface resistivity after washing coating film) test]
The coating films (Examples 1 to 7 and Comparative Examples 1 to 4) were washed with water, and then the surface resistivity was measured. The water washing conditions were as follows: tap water was run from a tap with an inner diameter of 14 mm at a flow rate of 10 L / min, and the test film was placed vertically 10 cm below the tap so that the tap water hits vertically, and coated for 30 seconds. It was carried out while moving so as to apply evenly. Thereafter, the moisture on the coated surface was removed with a hyper dry paper towel manufactured by Nippon Paper Crecia Co., Ltd., and air-dried for 3 minutes at a temperature of 25 ° C. and a relative humidity of 50%, and it was confirmed that there were no water droplets. In addition, a surface specific resistance value shows that water resistance is excellent, so that a numerical value is small.
The results are shown in Table 1.
[透明性(コーティング膜のヘイズ値)試験]
コーティング膜(実施例1〜7、及び、比較例1〜4)について、JIS K 7105 プラスチックの光学的特性試験法(5.5及び6.4)に従い、ムラカミカラーリサーチラボラトリー製ヘイズメーターHM−150にてヘイズ値を求めた。具体的には、積分球式光線透過率測定装置を用いて、拡散透過率及び全光線透過率をJIS K7105に基づいて測定し、その比によって表した。なお、ヘイズ値は、数値が小さい方ほど透明性があることを示す。
結果を表1に示す。
[Transparency (coating film haze value) test]
For coating films (Examples 1 to 7 and Comparative Examples 1 to 4), in accordance with JIS K 7105 Plastic Optical Properties Test Method (5.5 and 6.4), Haze Meter HM-150 manufactured by Murakami Color Research Laboratory. The haze value was obtained. Specifically, the diffuse transmittance and the total light transmittance were measured based on JIS K7105 using an integrating sphere light transmittance measuring device, and expressed by the ratio. In addition, a haze value shows that it is transparent, so that a numerical value is small.
The results are shown in Table 1.
Claims (5)
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JP2002322390A (en) * | 2001-04-24 | 2002-11-08 | Toagosei Co Ltd | Water-based coating composition for plastic curable with actinic ray |
JP2005298560A (en) * | 2004-04-07 | 2005-10-27 | Daiwa Kagaku Kogyo Kk | Antistatic agent and method for antistatic treatment |
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