JP2011174117A - Film deposition apparatus and film deposition method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of producing a film of uniform structure and characteristics by suppressing occurrence of cooling irregularities in a film deposited on a base material, and as a result, providing products of consistent quality. <P>SOLUTION: The invention relates to the film deposition apparatus for depositing a thin film by executing vapor deposition of a film deposition material on a surface of a base material 2. The film deposition apparatus includes a base material holder 3 for holding the base material, and a cooling block 4 which comes in contact with the base material holder to cool the base material holder. A magnet is built in at least any one of the base material holder and the cooling block. The base material is constituted of a magnetic material. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a film forming apparatus and a film forming method for forming a thin film using a physical vapor deposition method such as a vacuum vapor deposition method or a sputtering method.

  Conventionally, in the manufacture of nonaqueous electrolyte batteries, thin films such as electrodes and solid electrolytes are formed on a substrate using a physical vapor deposition method such as vacuum vapor deposition or sputtering.

  In this type of film forming apparatus, a vapor deposition source is evaporated by heating in a vacuum chamber, and sublimated vapor deposition particles are deposited on a substrate to form a film. The formed thin film is altered by heat. In order to prevent this, the substrate is cooled through the substrate holder by pressing a cooling block against the substrate holder on which the substrate is set after film formation. (Patent Document 1).

JP 2002-129324 A

  However, since the surfaces of the substrate holder and the cooling block are generally uneven, even if the cooling block is pressed against the substrate holder, the cooling block and the substrate holder cannot be sufficiently adhered.

  As described above, when sufficient adhesion cannot be obtained between the cooling block and the base material holder, heat transfer from the cooling block to the base material holder cannot be maintained uniformly. The film formed on the film is also cooled unevenly, resulting in uneven cooling on the film.

  As described above, when film formation is performed using a film forming apparatus in which uneven cooling occurs, a film having a uniform structure and characteristics cannot be obtained, and a product with stable quality cannot be provided.

  For example, in the production of a sulfide solid electrolyte membrane used in a nonaqueous electrolyte battery, if a membrane with a non-uniform structure or characteristics is produced, the battery performance of the nonaqueous electrolyte battery is greatly affected and the quality is degraded. .

  In view of solving the above problems, the present invention can suppress the occurrence of cooling unevenness in a film formed on a substrate, and can produce a film having a uniform structure and characteristics. It is an object of the present invention to provide a film forming apparatus and a film forming method capable of providing a product of stable quality.

A film forming apparatus according to the present invention includes:
A film forming apparatus for forming a thin film by depositing a film forming material on the surface of a substrate,
A substrate holder for holding the substrate;
A cooling block for cooling the substrate holder in contact with the substrate holder,
A magnet is incorporated in at least one of the substrate holder and the cooling block.

  In the invention of this claim, since the magnet is built in at least one of the base material holder and the cooling block, even if the surface of the base material holder and the cooling block is uneven, the magnet's magnetic force is sufficient for both. Can be adhered to. For this reason, variation in heat transfer from the cooling block to the base material holder can be suppressed. As a result, it is possible to provide a film having a uniform structure and characteristics by suppressing the occurrence of cooling unevenness in the film formed on the substrate held by the substrate holder, and having a stable quality product. Can be provided.

  If magnets are built in both the base holder and cooling block, the base holder and cooling block can be separated by placing magnets so that different poles face each other. Adhesion can be exerted between them.

  Moreover, when the magnet is incorporated only in one of the substrate holder and the cooling block, the other needs to be formed of a magnetic material.

  The magnet can be appropriately used in consideration of the film forming environment (atmosphere, temperature, target type, etc.), the size of the base material, etc., regardless of the type such as a ferrite magnet or a metal magnet. As for the size of the magnet, one magnet may be built in over the entire inner surface of the substrate holder and the cooling block, but a plurality of small magnets corresponding to the size of the substrate may be arranged.

And the said film-forming apparatus is
The magnet is an electromagnet.

  In the present invention, since an electromagnet is used as a magnet and the generation of magnetic force is controlled in accordance with the presence / absence of energization, the substrate holder and the cooling block can be easily adhered or released. Thus, the work in the film forming apparatus can be performed smoothly. Specifically, for example, when the base material holder and the cooling block are brought into close contact with each other and the base material is cooled, when the cooling block is separated from the base material holder, the energization to the electromagnet is stopped to smoothly perform the separation. Can do.

Next, the film forming method of the present invention comprises:
A film forming method using the film forming apparatus,
A base material made of a magnetic material is used as the base material.

  In the invention of this claim, since a base material composed of a magnetic material is used as the base material, the base material holder and the base material are sufficiently separated by the magnetic force of the magnet built in the base material holder and the cooling block. The heat transfer from the substrate holder to the substrate can be suppressed, and the cooling rate can be increased. In addition, when the magnet is not incorporated in the substrate holder, it is necessary to incorporate a magnet in which the magnetic lines of force penetrate the substrate holder in the cooling block.

  Examples of the magnetic material include SUS430, SUS420, SUS403, and the like.

  According to the present invention, it is possible to suppress the occurrence of uneven cooling on the film formed on the substrate, and to produce a film having a uniform structure and characteristics. A film forming apparatus and a film forming method that can be provided can be provided.

It is sectional drawing which shows the principal part of the film-forming apparatus which concerns on this invention typically, (a) shows the state which the cooling block has left | separated from the base material holder, (b) has contacted the base material holder with the cooling block It shows the state. It is a top view which shows the base material arrange | positioned at the cooling block of the film-forming apparatus which concerns on this invention, a base material holder, and a base material holder.

  Hereinafter, the present invention will be specifically described based on embodiments. In this embodiment, vacuum deposition is adopted as a film forming method.

1. Film Forming Apparatus First, the structure of the film forming apparatus in this embodiment will be described with reference to FIG. FIG. 1 is a cross-sectional view schematically showing a main part of a film forming apparatus in the present embodiment, in which (a) shows a state where the cooling block is separated from the substrate holder, and (b) shows the cooling block. The state which is contacting the base-material holder is shown.

  In FIG. 1, 1 is a vacuum chamber. In the vacuum chamber 1, a base material holder 3 that holds the base material 2 and a cooling block 4 are disposed at the top. And the target 6 which is a vapor deposition source is arrange | positioned at the bottom part on the support stand 5 which incorporated the heater.

  The cooling block 4 includes a cooling block main body 4a, a flow path 4b disposed in the cooling block main body 4a, and an electromagnet 9 for circulating the refrigerant. And this cooling block 4 is arrange | positioned by the raising / lowering means outside a figure so that raising / lowering is possible.

  Specifically, until the film formation is completed, the cooling block 4 is separated from the substrate holder 3 as shown in FIG. 1A, and as shown in FIG. It is set so that the cooling block 4 descends and comes into contact with the upper surface of the substrate holder 3.

  In the case of the film forming apparatus in the present embodiment, the substrate holder 3 is configured to hold nine substrates 2. Therefore, nine electromagnets 9 are arranged in the cooling block 4 corresponding to the holding positions of the base material 2.

  In addition, nine electromagnets 9 are also arranged in the base material holder 3 corresponding to the holding positions of the base material 2.

  The electromagnet 9 is built in the base material holder 3 and the cooling block 4, and is formed in a size slightly larger than the base material 2. The number of electromagnets 9 in the film forming apparatus is appropriately changed in design according to the change in the number of substrates 2 held.

  The substrate holder 3 is supported by a support material (not shown). And the base material 2 is fixed to the base material holder 3 using a locking tool (not shown) etc. As a locking method, for example, a method of forming a frame shape and fixing the entire periphery of the substrate 2 and a method of fixing a plurality of locations on the periphery of the substrate 2 are conceivable.

  On the other hand, since the base material 2 is generally thin, when the base material 2 is fixed to the base material holder 3 using a locking tool or the like, the central portion of the base material 2 is lifted from the surface of the base material holder 3 and a gap is likely to occur. . For this reason, in this Embodiment, the base material 2 is formed with the magnetic material.

  If the base material 2 is made of a magnetic material, the base material holder 3 and the base material 2 are sufficiently brought into close contact with each other by preventing the floating by the magnetic force of the magnet built in the cooling block 4 or the base material holder 3. Therefore, uneven cooling of the base material 2 can be prevented, and handling properties for fixing the base material 2 to the base material holder 3 are also improved.

  The general thickness of the substrate 2 is preferably about 10 to 500 μm.

  The relationship among the sizes of the cooling block 4, the substrate holder 3, and the substrate 2 will be described with reference to FIG. FIG. 2 is a plan view showing the cooling block 4, the substrate holder 3, and the substrate 2 placed on the substrate holder 3 of the film forming apparatus according to the present embodiment.

  As shown in FIGS. 2A and 2B, the size of the cooling block 4 is set to be slightly larger than the size of the base material holder 3. Thereby, when descending, the entire surface of the substrate holder 3 can be covered and sufficiently cooled.

  Then, as shown in FIG. 2C, the plurality of base materials 2 are fixed in contact with the lower surface of the base material holder 3. The electromagnets built in the substrate holder 3 and the cooling block 4 are arranged at positions corresponding to the respective substrates 2.

2. Film Formation Next, an example of a film formation method using the film formation apparatus in this embodiment described above will be described.

  First, a plurality of base materials 2 are temporarily fixed to the base material holder 3 and set in the vacuum chamber 1. Then, the electromagnet 9 built in the base material holder 3 is energized to generate a magnetic force. Fix to the substrate holder. Thereby, the base material 2 and the base material holder 3 adhere | attach well favorably without a gap. At this time, the cooling block 4 is separated from the base material holder 3 as shown in FIG.

  Next, the target 6 is heated and evaporated by a heater built in the support 5 and deposited on the surface of the substrate 2 held by the substrate holder 3 to form a film.

  Simultaneously with completion of film formation of a predetermined thickness, heating in the vacuum chamber 1 is stopped, and the electromagnet 9 built in the cooling block 4 is energized. Thereafter, the cooling block 4 is lowered by the lifting means (not shown) and brought into contact with the substrate holder 3. Thereby, the cooling block 4 adheres well to the base material holder 3 by the magnetic force of the respective electromagnets 9 built in the base material holder 3 and the cooling block 4.

  Then, the refrigerant is circulated through the flow path 4b of the cooling block 4 to cool the cooling block body 4a.

  At this time, since the film-formed substrate 2 and the substrate holder 3 and between the substrate holder 3 and the cooling block 4 are sufficiently adhered, the substrate 2 is uniformly cooled at a high speed. .

  After the base material 2 is cooled to a predetermined temperature, energization of each electromagnet 9 is stopped, the cooling block 4 is raised, and separated from the base material holder 3.

  Thereafter, the substrate holder 3 is taken out from the vacuum chamber 1, the temporary fixing of the formed substrate 2 is released, and the formed substrate 2 is removed from the substrate holder 3.

3. Example
(Example)
A sulfide solid electrolyte layer was formed on the substrate using the film forming apparatus.

  As the base material in this example, nine SUS430 foils having a thickness of 500 μm were prepared in a size of 50 × 30 mm, and set in a base material holder having a size of 30 × 20 cm (thickness 6 mm). Thereafter, an electromagnet built in the base material holder was energized to generate a magnetic force so that the base material was brought into close contact with the base material holder.

  After that, film formation is performed, and at the same time as film formation is completed, the cooling block is lowered, and a magnetic force is generated by energizing the base magnet holder cooled by the circulation of the refrigerant and the electromagnet built in the cooling block. Adhered to the material holder.

  Then, after cooling the substrate holder, the cooling block was raised and separated from the substrate holder.

  Finally, the substrate was taken out of the vacuum chamber and examined for the presence or absence of discoloration. As a result, it was confirmed that a uniform sulfide solid electrolyte membrane having a thickness of 10 μm and no discoloration was formed over the entire surface. .

(Comparative example)
Using a conventional film forming apparatus that does not contain an electromagnet, the same film was formed and the presence or absence of discoloration was examined. As a result, discoloration was observed at the center of the film, and the center was not sufficiently cooled. confirmed.

  As mentioned above, although embodiment of this invention was described, this invention is not limited to the above embodiment. Various modifications can be made to the above embodiments within the same and equivalent scope as the present invention.

DESCRIPTION OF SYMBOLS 1 Vacuum chamber 2 Base material 3 Base material holder 4 Cooling block 4a Block main body 4b Flow path 5 Support stand 6 Target 9 Electromagnet

Claims (3)

A film forming apparatus for forming a thin film by depositing a film forming material on the surface of a substrate,
A substrate holder for holding the substrate;
A cooling block for cooling the substrate holder in contact with the substrate holder,
A film forming apparatus, wherein a magnet is incorporated in at least one of the substrate holder and the cooling block.   The film forming apparatus according to claim 1, wherein the magnet is an electromagnet. A film forming method using the film forming apparatus according to claim 1 or 2,
A film forming method comprising using a base material made of a magnetic material as a base material.

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