JP2011168810A - Vacuum processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus which keeps an electrode for vacuum processing at a fixed temperature range by balancing heating and cooling and ensures the efficient maintainability thereof. <P>SOLUTION: A heating part for heating a substrate 5 to be treated is arranged inside an anode electrode 7. The heating part comprises bar-shaped heaters 31 arranged in parallel to one another. A tubular cooling part 32 for cooling the anode electrode 7 is also arranged inside the anode electrode 7. The cooling part 32 comprises cooling tubes 32 which are arranged adjacently in parallel to one another along the outside of each heater 31 and in each of which a cooling medium introduced thereinto can be circulated therethrough and then discharged to the outside. An introduction part 32a of the cooling medium and a discharge part 32b thereof are arranged biasedly on one end side of the anode electrode 7. The flow directions of the cooling medium in the adjacent cooling tubes 32 are made opposite to each other. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a vacuum processing apparatus, and more particularly to a vacuum processing apparatus such as a plasma processing apparatus including a heating unit and a cooling unit for controlling the temperature of an object to be processed in a vacuum processing chamber. is there.

  Conventionally, as a plasma processing apparatus, for example, those described in Patent Document 1 and Patent Document 2 are known.

U.S. Pat. No. 4,264,393 International Publication WO2006 / 95575

  In the plasma processing apparatus disclosed in Patent Document 1, there is a risk that the temperature of the substrate, which is an object to be processed, rises above the set temperature due to plasma heating under prolonged film formation.

  That is, when plasma is generated by supplying high-frequency power or direct current power to the plasma processing apparatus, most of the power is used for decomposition of the plasma processing reaction gas. Joule heat for a minute is generated. This Joule heat raises the temperature of the substrate at about 0.1-1 ° C./min. When the process time with plasma discharge is, for example, 20 minutes, the temperature of the substrate is increased by about 20 ° C. at the maximum. For this reason, when performing film formation for a long time, not only a heating mechanism but also a heat dissipation mechanism is required.

  Moreover, according to the cooling method in the plasma processing apparatus of patent document 2, the structure for cooling is provided in the both sides of a heater. For this reason, such a cooling method is not suitable for a plasma processing chamber in which a load lock chamber or a transfer chamber of the plasma processing apparatus is adjacent because maintenance is limited to one side.

  That is, the maintenance of such a chamber is substantially limited from the opposite side of the load lock chamber and the transfer chamber. For this reason, as in Patent Document 2, if the air-cooling gas flow pipes overhang the both sides of the heater, it becomes difficult to maintain the piping on the side close to the load lock chamber and the transfer chamber.

  The present invention has been made in consideration of the circumstances as described above, and its problem is to balance heating and cooling to maintain the electrodes used for vacuum processing in a certain temperature range, and also to load load chambers. Another object of the present invention is to provide a vacuum processing apparatus capable of ensuring efficient maintainability in a vacuum processing chamber adjacent to a transfer chamber.

  According to this invention, a vacuum processing chamber for performing vacuum processing on an object to be processed and at least one pair of counter electrodes provided in the vacuum processing chamber are provided, and at least one of the counter electrodes is provided. However, it includes a heating unit and a cooling unit for controlling the temperature of the workpiece, the heating unit is composed of a plurality of bar heaters, and the cooling unit is composed of a plurality of folded cooling members through which a cooling medium is circulated. The heating part and the cooling part are provided in parallel with each other, and the introduction part and the discharge part of the cooling medium are provided unevenly on one side of the at least one electrode and the other side, The cooling member enters the inside of the electrode from the introduction portion on one side of the at least one electrode, extends to the other side of the electrode, is folded on the other side, and then extends again to the discharge portion along the electrode. Or The electrode extends through the groove provided larger than the cross-sectional shape of the cooling member to the discharge portion again, and the portion extending again to the discharge portion is provided so as not to directly contact the electrode. Each of the cooling members is further configured such that a cooling medium flows between the adjacent cooling members so as to face each other.

  In the vacuum processing apparatus of the present invention, as described above, the heating part and the cooling part are provided in parallel with each other, and the introduction part and the discharge part for the cooling medium are provided on one side of the processing electrode on one side and the other side. Each of the cooling members is provided unevenly, and each cooling member enters the inside of the electrode from the introduction portion on one side of the electrode, extends to the other side of the electrode, is folded on the other side, and then extends to the discharge portion again. However, the cooling medium is provided so as not to be in direct contact with the electrode, and the cooling medium is circulated opposite to each other between adjacent cooling members.

  Therefore, according to the vacuum processing apparatus of the present invention, the heating unit and the cooling unit configured as described above can maintain the temperature of the electrode uniformly and within a set temperature range even in a long-time vacuum processing. . As a result, in-plane variation and deterioration of the workpiece can be suppressed, and deformation of the workpiece due to overheating of the heater can be prevented. Further, even in a vacuum processing apparatus having a vacuum processing chamber adjacent to a load lock chamber, a transfer chamber, etc., it is possible to ensure efficient maintainability.

  In one embodiment of the vacuum processing apparatus of the present invention, each cooling member includes a first cooling pipe and a second cooling pipe, and the first cooling pipe and the second cooling pipe are arranged adjacent to each other. It is installed. Here, the first cooling pipe enters the inside of the electrode from the introduction portion, extends to the other side of the electrode, is folded on the other side and extends to the discharge portion, and at least a part of a portion along the electrode is at least partially It is comprised so that it may not contact with the electrode. The second cooling pipe extends from one side to the other side of the electrode so that at least a part of the portion along the electrode does not come into contact with the electrode, is folded on the other side of the electrode, and is folded from the other side. It is configured to enter the electrode and extend to one side.

  In this specification and claims, “one side of the electrode” means one end side or one side edge side of the electrode, and “the other side of the electrode” means the other end side of the electrode or The other side edge side shall be pointed out.

  The rod-shaped heater that constitutes the heating unit includes, for example, a U-shaped sheathed heater that enters the electrode from one side of the electrode, is folded on the other side of the electrode, and extends to one side.

  Each bar heater can be controlled in heating temperature independently from the other bar heaters, and each cooling member can preferably be controlled in cooling temperature from the other cooling members.

  In one embodiment of the vacuum processing apparatus according to the present invention, the cooling member is disposed in a groove larger than the cross-sectional shape of the cooling member provided in the electrode with a length up to half of the total length of the electrode. It can be arranged to pass through.

  The rod heater is preferably configured so that the heating performance is smaller at the central portion of the electrode and larger at the side edge portion. When configured in this way, the heating of the electrode is more effectively controlled according to the general characteristics of the electrode, such that the electrode is more heatable at the center and smaller at the side edges. be able to.

  It is preferable that the cooling pipe is configured so that the cooling performance is larger at the center portion of the electrode and smaller at the side edge portion. When configured in this manner, the cooling control of the electrode is more effectively performed according to the general characteristics of the electrode, such that the cooling performance of the electrode is smaller at the center and larger at the side edge. be able to.

  In an embodiment of the present invention, in order to eliminate the difference in the heatability between the central portion and the side edge portion of the electrode, the bar heater has a number density of the electrodes per plane unit area of the electrode. It can be configured to be smaller at the center and larger at the side edge.

  In one embodiment of the present invention, in order to eliminate the difference in cooling performance between the central portion and the side edge portion of the electrode, the cooling pipe has a number density of installation per unit area of the electrode of the electrode. It can be configured to be larger at the center and smaller at the side edge.

  The cooling pipe is preferably made of a material whose thermal conductivity is lower than the thermal conductivity of the material constituting the electrode. When configured in this way, since a rapid increase in the temperature of the cooling medium in the cooling pipe can be suppressed, the electrode surface can be uniformly cooled even in a large heater, and the electrode can be made more uniform. Heating / cooling control can be performed.

  In order to increase the cooling efficiency of the electrodes, it is preferable that the cooling medium is always circulated without stagnation inside the cooling pipe.

  For example, the heating temperature of the rod-shaped heater is controlled based on the temperature measured by a thermocouple disposed inside the electrode so that its tip is located at a depth of 5.0 mm or more from the side or surface of the electrode. This is because it has been found by a heating test that when the thermocouple disposed at such a depth is used, the heating temperature of the rod heater can be controlled satisfactorily.

1 is a schematic front view of a plasma processing apparatus as a vacuum processing apparatus according to Embodiment 1 of the present invention. FIG. 2 is a plan view of an anode electrode which is one component of the plasma processing apparatus shown in FIG. FIG. 3 is a side view of the anode electrode of FIG. 4 is a cross-sectional view taken along the line AA of the anode electrode of FIG. FIG. 5 is a plan view of an anode electrode that is one component of a plasma processing apparatus as a vacuum processing apparatus according to Embodiment 2 of the present invention. FIG. 6 is a side view of the anode electrode of FIG. FIG. 7 is a cross-sectional view taken along line BB of the anode electrode of FIG. FIG. 8 is a plan view of an anode electrode that is one component of a plasma processing apparatus as a vacuum processing apparatus according to Embodiment 3 of the present invention. FIG. 9 is a side view of the anode electrode of FIG. FIG. 10 is a plan view of an anode electrode that is one component of a plasma processing apparatus as a vacuum processing apparatus according to Embodiment 4 of the present invention. FIG. 11 is a side view of the anode electrode of FIG.

  Hereinafter, four preferred embodiments of the present invention will be described with reference to FIGS. Note that the present invention is not limited by these.

Embodiment 1
As shown in FIG. 1, the plasma processing apparatus D as the vacuum processing apparatus according to the first embodiment includes a first vacuum processing chamber 1 and a second vacuum processing chamber 2 that are provided adjacently from the transport upstream side to the transport downstream side. A vacuum processing chamber 2 and a third vacuum processing chamber 3 are provided. These three vacuum processing chambers 1 to 3 are configured by dividing one casing that extends linearly in the longitudinal direction into three by two isolation gate valves 4 and 4 that can be opened and closed. The three vacuum processing chambers 1 to 3 are made of stainless steel, and the inner surface is mirror-finished. The gate valves 4 and 4 are configured to be openable and closable, and can connect or isolate two adjacent vacuum processing chambers 1, 2, 2, and 3.

  The 1st vacuum processing chamber 1 is made into the carrying-in chamber for carrying in the board | substrate 5 which is a plate-shaped to-be-processed object. The first vacuum processing chamber 1 is provided with a heater 101 for heating the substrate 5. The second vacuum processing chamber 2 is a plasma processing chamber connected to the carry-in chamber 1 for performing plasma processing on the substrate 5. The third vacuum processing chamber 3 is a carry-out chamber for carrying out the substrate 5 connected to the plasma processing chamber 2.

  Further, the carry-in chamber 1, the plasma processing chamber 2, and the carry-out chamber 3 are each connected to an external vacuum pump 14 via an opening / closing valve 16a in order to evacuate the chamber. The loading chamber 1 is provided with a loading door 15 on the entrance side. The plasma processing chamber 2 is connected to a vacuum pump 14 via a pressure adjusting valve 16b, and is connected to a reaction gas introduction pipe 19 for introducing a plasma processing reaction gas. The carry-out chamber 3 is provided with a carry-out door 17 on the exit side. Furthermore, the carry-in chamber 1 and the carry-out chamber 3 are each connected to a leak gas introduction pipe 20.

  In the plasma processing chamber 2, a square plate-like anode electrode 7 is disposed horizontally. A plasma processing cathode electrode 18 is provided at a position facing the anode electrode 7 in the plasma processing chamber 2. The cathode electrode 18 is electrically connected to a high frequency power source 23 via a capacitor 21 and a matching circuit 22 outside the plasma processing chamber 2.

  As shown in FIGS. 2 to 4, the anode electrode 7 is further provided with heating units 31,..., 31 for heating the substrate 5 to be plasma-treated. The heating sections 31,..., 31 are composed of seven rod heaters (here, sheathed heaters) 31,..., 31 that are U-shaped in plan and are provided adjacent to each other in parallel. Each bar heater 31 is connected to a heater wire 33 as shown in FIG.

  Inside the anode electrode 7, tubular cooling portions 32,..., 32 for cooling the anode electrode 7 are also provided. The cooling parts 32,..., 32 are formed in an elongated ring shape, are provided adjacent to each other in parallel along the outside of the respective bar heaters 31,..., 31 and are introduced into the inside. It consists of 14 cooling pipes 32,..., 32 that can be discharged to the outside after circulating the working medium (nitrogen gas).

  These cooling pipes 32,..., 32 can be made of the same material as the material constituting the anode electrode 7 (here, an aluminum alloy), but here, the material having the thermal conductivity constituting the anode electrode 7 is used. It is comprised from the material (here stainless steel) whose thermal conductivity is lower.

  Each cooling pipe 32 is provided as shown in FIGS. That is, the cooling pipe 32 is provided with a cooling medium introduction portion 32 a and a discharge portion 32 b that are unevenly distributed on one end side of the anode electrode 7. And the main-body part 32c of the cooling pipe 32 enters the inside of the anode electrode 7 from the introduction part 32a on the one end side of the anode electrode 7, extends to the other end side of the anode electrode 7, and goes to the outside on the other end side. After exiting and folded downward, it extends again to the discharge portion 32b along the lower surface of the anode electrode 7. The main body portion 32 c along the lower surface of the anode electrode 7 is disposed so as not to directly contact the lower surface of the anode electrode 7.

  These rod-shaped heaters 31,..., 31 can be controlled independently of the heating temperature, and these cooling pipes 32,..., 32 can be controlled independently of the cooling temperature. is there.

  Next, with reference to FIG. 4, the structure and manufacturing method of the anode electrode 7 are demonstrated. The anode electrode 7 has a structure in which two plates 7a and 7b are bonded together. On each of the opposing surfaces of the plates 7a and 7b, a groove for inserting the rod-shaped heater 31 (cross-sectional shape is a semicircle) and a groove for inserting the cooling pipe 32 (cross-sectional shape is a semicircle) are formed. These plates 7a and 7b can be integrated by caulking by cold rolling or by screwing. In the present embodiment, the plates 7a and 7b are integrated by screwing to produce the anode electrode 7.

  The anode electrode 7 according to the present invention requires a plurality of heaters 31,..., 31 and cooling pipes 32,. However, as described above, the anode electrode 7 is divided into two in the thickness direction, and a plurality of heaters 31,..., 31 and cooling pipes 32,. Can do.

  In the first embodiment, almost half of the cooling pipe 32 is provided outside the back surface side of the anode electrode 7. The flow direction of the cooling medium is reversed between the adjacent cooling pipes 32.

  In the first embodiment, since the heaters 31,..., 31 and the cooling pipes 32,..., 32 are configured as described above, specific portions of the substrate 5 and the anode electrode 7 that are objects to be processed are selected. Thus, the heating / cooling control can be performed, and the heating efficiency of the substrate 5 and the cooling efficiency of the anode electrode 7 can be further improved.

  In the first embodiment, the cooling medium flowing outside the anode electrode 7 is not in contact with the anode electrode 7, and therefore hardly exchanges heat with the anode electrode 7. That is, since the unwarmed cooling medium can be alternately introduced from both sides of the anode electrode 7, the surface of the anode electrode 7 can be uniformly cooled in the plane. Further, since each cooling pipe 32 is branched only on one side of the anode electrode 7, for example, when performing electrode replacement maintenance, the cooling pipe 32 may be removed only on one side of the anode electrode 7.

  In addition, the heating part of the heater 31 can also be made into the structure which is not provided in a U-shaped part. Thereby, the space | interval of the heating part of the heater 31 and the cooling part of the cooling pipe 32 becomes the same anywhere in a surface, and also in-plane temperature distribution improves.

  As an actual operation method, the heaters 31,..., 31 are turned on with a certain amount of cooling gas flowing through the cooling pipes 32,. By outputting the SSR, the temperature of the anode electrode 7 is adjusted to the set value. Here, the reason for controlling the heater output rather than the cooling gas flow rate is that the SSR circuit is superior in responsiveness and repeated durability to the flow rate adjustment valve.

The flow rate of the cooling gas is set so that the SSR output of the heater operates effectively even during film formation (= the heater output repeats on and off alternately). Specifically, for an RF power density of 0.6 W / cm ² , 750 liter / min is mentioned, and for 0.8 W / cm ² , 1250 liter / min is mentioned. However, in order to prevent an increase in pressure in the piping due to the heated cooling gas, it is necessary to flow at least about 1 liter / min and circulate.

  The cooling gas may be hydrogen from the viewpoint of thermal conductivity, but in view of safety and cost, an inert gas such as nitrogen or a rare gas is desirable.

Embodiment 2
As shown in FIGS. 5 to 7, in the plasma processing apparatus as the vacuum processing apparatus according to the second embodiment, the embodiment is provided inside the anode electrode 27 having a configuration in which two upper and lower plates 27 a and 27 b are bonded together. Seven rod heaters (seeds heaters) 31,..., 31 as the same heating unit as 1 are provided. The lower plate 27b of the anode electrode 27 is provided with eight longitudinal grooves 27c,..., 27c opened downward along the entire length in the longitudinal direction of the plate 27b.

  Inside the anode electrode 27, tubular cooling portions 42,..., 42 for cooling the anode electrode 27 are also provided. The cooling portions 42,..., 42 are side-by-side elongated rings, and are provided adjacent to each other in parallel along the outside of the respective bar heaters 31,. It consists of eight cooling pipes 42,..., 42 that can be discharged to the outside after circulating the working medium (nitrogen gas).

  As shown in FIGS. 5 to 7, each cooling pipe 42 is provided with a cooling medium introducing portion 42 a and a discharging portion 42 b that are unevenly distributed on one end side of the anode electrode 27. Then, the main body portion 42c of the cooling pipe 42 enters the inside of the plate 27a on the upper side of the anode electrode 27 from the introduction portion 42a on the one end side of the anode electrode 27 and extends to the other end side of the anode electrode 27. After exiting to the outside on the part side and being folded downward, it enters the inside of the groove 27c of the lower plate 27b of the anode electrode 27 and extends again to the discharge part 42b. The main body portion 42c along the groove 27c of the lower plate 27b of the anode electrode 27 is disposed so as not to be in direct contact with the groove 27c.

  In the second embodiment, each cooling pipe 42 enters the inside of the electrode 27 from the introduction portion on one side of the anode electrode 27, extends to the other side of the electrode 27, is folded back on the other side, and then the same. The electrode 27 passes through a groove 27c provided larger than the cross section of the cooling pipe 42 and extends again to the discharge portion. The main body portion 42c extending again to the discharge portion is provided so as not to be in direct contact with the electrode 27, and each cooling pipe 42 further has a cooling medium facing each other between the adjacent cooling pipes 42. It is configured to circulate.

  Accordingly, the cooling medium flowing outside the anode electrode 27 is not in contact with the anode electrode 27 and therefore hardly exchanges heat with the anode electrode 27. That is, since the unwarmed cooling medium can be alternately introduced from both sides of the anode electrode 27, the surface of the anode electrode 27 can be uniformly cooled in the plane. Furthermore, since the cooling pipe 42 is branched only on one side of the anode electrode 27, for example, when performing electrode replacement maintenance, the cooling pipe 42 may be removed only on one side of the anode electrode 27.

Embodiment 3
As shown in FIGS. 8 and 9, in the plasma processing apparatus as the vacuum processing apparatus in the third embodiment, seven pieces as the heating unit in the same manner as in the first embodiment are provided in the plate-shaped anode electrode 37. Bar heaters (seeds heaters) 31,..., 31 are provided.

  Inside the anode electrode 37, tubular cooling parts 52,..., 52 for cooling the anode electrode 37 are also provided. The cooling parts 52,..., 52 are side-by-side elongated rings, and are provided adjacent to each other in parallel along the outside of the respective bar heaters 31,. It consists of eight cooling pipes 52,..., 52 that can be discharged to the outside after circulating the working medium (nitrogen gas).

  As shown in FIG. 8 and FIG. 9, each cooling pipe 52 is provided with a cooling medium introduction portion 52 a and a discharge portion 52 b that are unevenly distributed on one end side of the anode electrode 37. The main body portion 52c of the cooling pipe 52 enters the anode electrode 37 from the introduction portion 52a on the one end side of the anode electrode 37, extends to the other end side of the anode electrode 37, and goes to the outside on the other end side. After exiting and folding downward, it extends again to the discharge portion 52b along the lower surface of the anode electrode 37. The main body 52 c along the lower surface of the anode electrode 37 is disposed so as not to directly contact the lower surface of the anode electrode 37.

  The rod heaters 31,..., 31 and the cooling pipes 52,.

  In the third embodiment, the cooling medium flowing outside the anode electrode 37 is not in contact with the anode electrode 37 and therefore hardly exchanges heat with the anode electrode 37. That is, since the unwarmed cooling medium can be alternately introduced from both sides of the anode electrode 37, the surface of the anode electrode 37 can be uniformly cooled in the plane. Furthermore, since each cooling pipe 52 is branched only on one side of the anode electrode 37, for example, when performing electrode replacement maintenance, the cooling pipe 52 may be removed only on one side of the anode electrode 7.

Embodiment 4
As shown in FIGS. 10 and 11, in the plasma processing apparatus as the vacuum processing apparatus in the fourth embodiment, seven pieces as the heating unit in the same manner as in the first embodiment are provided in the plate-shaped anode electrode 47. Bar heaters (seeds heaters) 31,..., 31 are provided.

  Inside the anode electrode 47, tubular cooling sections 62,..., 62 for cooling the anode electrode 47 are also provided. The cooling parts 62,..., 62 are formed in an elongated ring shape and are provided adjacent to each other in parallel along the outside of the respective bar heaters 31,. It consists of eight cooling pipes 62,..., 62 that can be discharged to the outside after circulating the working medium (nitrogen gas).

  As shown in FIGS. 10 and 11, each cooling pipe 62 is provided with a cooling medium introduction portion 62 a and a discharge portion 62 b that are unevenly distributed on one end side of the anode electrode 47. The main body portion 42c of the cooling pipe 62 enters the anode electrode 47 from the introduction portion 62a on one end side of the anode electrode 47, extends to the other end side of the anode electrode 47, and is folded back on the other end side. After that, it extends again to the discharge part 62b.

  The rod-shaped heaters 31, ..., and the cooling pipes 62, ..., 62 are provided by a casting method.

1 ... 1st vacuum processing chamber (workpiece carrying-in chamber)
2 ... Second vacuum processing chamber (plasma processing chamber)
3 ... Third vacuum processing chamber (unloading chamber)
4 ... Gate valve 5 ... Workpiece (substrate)
7 ... Anode electrode 18 ... Cathode electrode 27 ... Anode electrode 27c..Groove 31 ... Heating section (bar heater)
32 ... Cooling section (cooling pipe)
32a..Introduction section 32b..Discharge section 32c..Main body section 42 ... Cooling section (cooling pipe)
42a..Introducing section 42b..Discharging section 42c..Main body 52 ... Cooling section (cooling pipe)
52a..Introduction section 52b..Discharge section 52c..Main body section 62 ... Cooling section (cooling pipe)
62a ... Introduction part 62b ... Discharge part 62c ... Main body part

Claims (13)

A vacuum processing chamber for performing vacuum processing on a workpiece, and at least a pair of counter electrodes provided in the vacuum processing chamber;
At least one of the counter electrodes includes a heating unit and a cooling unit for controlling the temperature of the workpiece,
The heating unit is composed of a plurality of rod heaters, the cooling unit is composed of a plurality of folded cooling members through which the cooling medium is circulated, and the heating unit and the cooling unit are provided in parallel with each other, and the cooling medium introduction unit And the discharge part is provided unevenly on one side of the one side and the other side of the at least one electrode,
Each cooling member enters the inside of the electrode from the introduction portion on one side of the at least one electrode, extends to the other side of the electrode, is folded back on the other side, and then again reaches the discharge portion along the electrode. It extends to the discharge part again through a groove provided inside the electrode larger than the cross-sectional shape of the cooling member, and the part extending to the discharge part is in direct contact with the electrode. Not to be provided,
Each of the cooling members is further configured so that the cooling medium flows between the adjacent cooling members so as to face each other. Each cooling member enters the inside of the electrode from the introduction portion, extends to the other side of the electrode, is folded back on the other side and extends to the discharge portion, and at least a part of a portion along the electrode is the same as the electrode. A first cooling pipe configured not to contact and extending from one side to the other side of the electrode so that at least a part of a portion along the electrode does not contact the electrode, and the other side of the electrode The second cooling pipe is configured to be folded at the other side to enter the inside of the electrode and extend to the one side,
The vacuum processing apparatus according to claim 1, wherein the first cooling pipe and the second cooling pipe are disposed adjacent to each other.   2. The vacuum processing apparatus according to claim 1, wherein the bar heater is a U-shaped sheathed heater that enters the electrode from one side of the electrode, is folded back on the other side of the electrode, and extends to one side.   The vacuum according to claim 1, wherein each bar heater can be controlled in heating temperature independently from the other bar heaters, and each cooling member can be controlled in cooling temperature independently from the other cooling members. Processing equipment.   The cooling member is disposed so as to pass through a groove having a length from the introduction portion to a half of the entire length of the electrode and being larger than the cross section of the cooling member. The vacuum processing apparatus as described in.   The vacuum processing apparatus according to claim 1, wherein the bar heater is configured such that the heating performance is smaller at a central portion of the electrode and larger at a side edge portion.   The vacuum processing apparatus according to claim 2, wherein the cooling pipe is configured such that the cooling performance is larger at a central portion of the electrode and smaller at a side edge portion.   2. The vacuum processing apparatus according to claim 1, wherein the rod-shaped heater is configured such that the number density of the electrodes per plane unit area is smaller at a central portion of the electrode and larger at a side edge portion. .   The vacuum processing apparatus according to claim 2, wherein the cooling pipe is configured such that the number density of the electrodes per planar unit area of the electrode is larger at a central portion of the electrode and smaller at a side edge portion. .   The vacuum processing apparatus according to claim 2, wherein the cooling pipe is made of a material having a thermal conductivity lower than that of a material constituting the electrode.   The vacuum processing apparatus according to claim 2, wherein the cooling medium is constantly circulated without stagnation inside the cooling pipe.   The heating temperature of the bar heater is controlled based on a temperature measured by a thermocouple disposed inside the electrode so that a tip of the rod heater is located at a depth of 5.0 mm or more from a side surface or a surface of the electrode. 2. The vacuum processing apparatus according to 1.   A vacuum processing apparatus in which the cooling member according to claim 2 is disposed on each of the counter electrodes.

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