JP2011136985A - Thioether-containing alkoxysilane derivative and use thereof - Google Patents
Thioether-containing alkoxysilane derivative and use thereof Download PDFInfo
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本発明は、密着性向上剤等に好適に用いられる新規なチオエーテル含有アルコキシシラン誘導体および当該チオエーテル含有アルコキシシラン誘導体の用途に関する。 The present invention relates to a novel thioether-containing alkoxysilane derivative suitably used for an adhesion improver and the like and uses of the thioether-containing alkoxysilane derivative.
従来より、各種塗料をガラス等の無機基材に塗工する際に、密着性を向上させる目的でシランカップリング剤が塗料に添加されている(例えば、特許文献1を参照)。しかしながら、シランカップリング剤の多くは沸点が低く、高温塗工が必要な塗料に対しては多量に添加する必要があった。また、密着性向上効果も充分とは言えず、例えばチタン、ジルコニウム等の塩や、イミダゾール等のアミン、リン酸エステル、ウレタン樹脂、チオール化合物等の密着性助剤も同時に添加することによって初めて密着性を達成できる場合も多かった。しかしながら、これら密着性助剤の配合は工程数が増加するだけではなく、塗料特性を損なわない密着性助剤種や添加量の最適化作業が必要であった。 Conventionally, when various paints are applied to an inorganic base material such as glass, a silane coupling agent has been added to the paint for the purpose of improving adhesion (see, for example, Patent Document 1). However, many of the silane coupling agents have a low boiling point, and it was necessary to add a large amount to a paint that requires high-temperature coating. In addition, it cannot be said that the effect of improving the adhesion is sufficient, for example, by adding simultaneously an adhesion assistant such as a salt such as titanium or zirconium, an amine such as imidazole, a phosphate ester, a urethane resin, or a thiol compound. In many cases, gender was achieved. However, the formulation of these adhesion assistants not only increases the number of steps, but also requires an optimization operation of the adhesion assistant species and addition amount that do not impair the coating properties.
本発明は上記実状に鑑みて成し遂げられたものであり、その第一の目的は、密着性向上効果に優れるチオエーテル含有アルコキシシラン誘導体を提供することにある。
さらに、本発明の第二の目的は、上記のチオエーテル含有アルコキシシラン誘導体の用途を提供することにある。
The present invention has been accomplished in view of the above circumstances, and a first object thereof is to provide a thioether-containing alkoxysilane derivative that is excellent in the effect of improving adhesion.
Furthermore, the second object of the present invention is to provide the use of the above thioether-containing alkoxysilane derivative.
本発明者らは前記の課題を解決するために鋭意検討を重ねた結果、特定の構造を有するチオエーテル含有アルコキシシラン誘導体が優れた密着性向上効果を有することを見出し発明を完成するに至った。 As a result of intensive studies to solve the above-mentioned problems, the present inventors have found that a thioether-containing alkoxysilane derivative having a specific structure has an excellent adhesion improving effect, and have completed the invention.
すなわち、本発明は次の〔1〕から〔5〕である。
〔1〕下記式1で表されるチオエーテル含有アルコキシシラン誘導体。
That is, the present invention includes the following [1] to [5].
[1] A thioether-containing alkoxysilane derivative represented by the following formula 1.
〔2〕下記式2で表されるチオエーテル含有アルコキシシラン誘導体。
[2] A thioether-containing alkoxysilane derivative represented by the following formula 2.
〔4〕下記式4で表されるアルコキシシリル基含有化合物と下記式6で表される多価チオール化合物とを反応させてなる、前記〔2〕に記載のチオエーテル含有アルコキシシラン誘導体。
[4] The thioether-containing alkoxysilane derivative according to the above [2], obtained by reacting an alkoxysilyl group-containing compound represented by the following formula 4 with a polyvalent thiol compound represented by the following formula 6.
本発明のチオエーテル含有アルコキシシラン誘導体は、優れた密着性向上効果を有しており、塗料に例えば0.1〜10質量%という比較的少量添加することで、密着性助剤の添加を必要とすることなく塗料に高い密着性を付与することが可能である。 The thioether-containing alkoxysilane derivative of the present invention has an excellent adhesion improving effect, and it is necessary to add an adhesion aid by adding a relatively small amount of, for example, 0.1 to 10% by mass to the paint. It is possible to impart high adhesion to the paint without having to do so.
また、チオエーテル含有アルコキシシラン誘導体は密着性の付与効果に優れているため、塗料などに密着性を付与する密着性向上剤として有用である。 Further, since the thioether-containing alkoxysilane derivative is excellent in the adhesion imparting effect, it is useful as an adhesion improver that imparts adhesion to paints and the like.
以下に本発明を具体化した実施形態について詳細に説明する。
<チオエーテル含有アルコキシシラン誘導体>
本実施形態のチオエーテル含有アルコキシシラン誘導体は、下記式1で表される化合物である。
Embodiments that embody the present invention will be described in detail below.
<Thioether-containing alkoxysilane derivative>
The thioether-containing alkoxysilane derivative of this embodiment is a compound represented by the following formula 1.
また、本実施形態のチオエーテル含有アルコキシシラン誘導体は、下記式2で表される化合物である。 Moreover, the thioether containing alkoxysilane derivative of this embodiment is a compound represented by the following formula 2.
<チオエーテル含有アルコキシシラン誘導体の製造方法>
前記式1または式2で表されるチオエーテル含有アルコキシシラン誘導体は、例えばアルコキシシリル基〔−Si(OR2)3〕と二重結合を有する化合物(以降、A成分という)と、チオール基(−SH)を有する多価チオール化合物(以降、B成分という)とを反応させることによって得ることができる。この2成分は、A成分の二重結合と、B成分のチオール基とが下記式7で表される反応式で反応する。なお、Xは水素原子またはメチル基、YはA成分の二重結合に結合するX以外の残基を表し、ZはB成分のチオール基に結合する残基を表す。
<Method for producing thioether-containing alkoxysilane derivative>
The thioether-containing alkoxysilane derivative represented by Formula 1 or Formula 2 includes, for example, an alkoxysilyl group [—Si (OR 2 ) 3 ] and a compound having a double bond (hereinafter referred to as A component), a thiol group (— SH) can be obtained by reacting with a polyvalent thiol compound (hereinafter referred to as B component). In these two components, the double bond of the A component and the thiol group of the B component react by the reaction formula represented by the following formula 7. X represents a hydrogen atom or a methyl group, Y represents a residue other than X bonded to the double bond of the A component, and Z represents a residue bonded to the thiol group of the B component.
また、チオエーテル含有アルコキシシラン誘導体を製造するにあたり、B成分はチオール基を3〜6個有しているため、式8のようにB成分のチオール基のうち一部がA成分と反応した生成物を得ることができる。なお、VはB成分のチオール基に結合する残基を表す。 Moreover, in producing a thioether-containing alkoxysilane derivative, since the B component has 3 to 6 thiol groups, a product in which a part of the thiol groups of the B component reacts with the A component as shown in Formula 8. Can be obtained. V represents a residue bonded to the thiol group of the B component.
チオエーテル含有アルコキシシラン誘導体の製造方法においては、5℃以上の温度で反応させることができるが、5時間以内といった短時間で反応させるためには、60〜80℃で反応させることがより好ましい。塩基触媒やラジカル発生剤を添加すれば、より短時間で高収率にて反応させることができる。 In the method for producing a thioether-containing alkoxysilane derivative, the reaction can be carried out at a temperature of 5 ° C. or higher. However, in order to react in a short time such as within 5 hours, the reaction is more preferably carried out at 60 to 80 ° C. If a base catalyst and a radical generator are added, it can be made to react in a high yield in a shorter time.
チオエーテル含有アルコキシシラン誘導体の製造方法においては、無溶剤でも反応を進行させることができるが、低温で反応させる場合など、粘度を下げたい場合には溶剤を加えて反応させることもできる。その際には、アルコキシシリル基、二重結合、チオール基と反応しない溶剤、例えばアルコール類、ケトン類、エステル類または芳香族類が好ましい。 In the method for producing a thioether-containing alkoxysilane derivative, the reaction can be allowed to proceed even without a solvent, but when the viscosity is to be lowered, for example, when the reaction is carried out at a low temperature, the reaction can be carried out by adding a solvent. In that case, a solvent that does not react with an alkoxysilyl group, a double bond, or a thiol group, for example, alcohols, ketones, esters, or aromatics is preferable.
チオエーテル含有アルコキシシラン誘導体のうち、式1で表される化合物は、下記式4で表されるアルコキシシリル基含有化合物と下記式5で表される多価チオール化合物とを反応させることにより得ることができる。 Of the thioether-containing alkoxysilane derivatives, the compound represented by Formula 1 can be obtained by reacting an alkoxysilyl group-containing compound represented by Formula 4 below with a polyvalent thiol compound represented by Formula 5 below. it can.
チオエーテル含有アルコキシシラン誘導体のうち、式2で表される化合物は、前記式4で表されるアルコキシシリル基含有化合物と下記式6で表される多価チオール化合物とを反応させることにより得ることができる。
Among the thioether-containing alkoxysilane derivatives, the compound represented by the formula 2 can be obtained by reacting the alkoxysilyl group-containing compound represented by the formula 4 with a polyvalent thiol compound represented by the following formula 6. it can.
チオエーテル含有アルコキシシラン誘導体は、特にガラスや金属等の無機基材に対して高い密着性向上性能を有していることから、密着性向上剤として用いることができる。チオエーテル含有アルコキシシラン誘導体を有効成分とする密着性向上剤は、エポキシ樹脂、ウレタン樹脂、アクリル樹脂、ポリイミド樹脂、二重結合を有する化合物等に配合することによって、高い密着性向上効果を発揮することができる。
The thioether-containing alkoxysilane derivative can be used as an adhesion improver because it has a high adhesion improving performance particularly for inorganic substrates such as glass and metal. Adhesion improver comprising thioether-containing alkoxysilane derivative as an active ingredient should exhibit high adhesion improvement effect by blending with epoxy resin, urethane resin, acrylic resin, polyimide resin, compound having double bond, etc. Can do.
さらに、式1で表される化合物であり、aが0でないチオエーテル含有アルコキシシラン誘導体、あるいは式2で表される化合物であり、dが0でないチオエーテル含有アルコキシシラン誘導体はチオール基を有し、エポキシ基、二重結合、イソシアネート基と反応する。このため、チオエーテル含有アルコキシシラン誘導体をエポキシ樹脂、アクリル樹脂、ウレタン樹脂、二重結合を有する化合物に添加することにより、さらに高い密着性効果を発揮することができる。 Further, the thioether-containing alkoxysilane derivative represented by the formula 1 in which a is not 0 or the thioether-containing alkoxysilane derivative in which d is not 0 has a thiol group, Reacts with groups, double bonds and isocyanate groups. For this reason, by adding a thioether-containing alkoxysilane derivative to an epoxy resin, an acrylic resin, a urethane resin, or a compound having a double bond, an even higher adhesion effect can be exhibited.
チオエーテル含有アルコキシシラン誘導体を有効成分とする密着性向上剤は、有効成分として樹脂に対し好ましくは0.1〜30質量%、さらに好ましくは0.1〜10質量%添加すると高い密着性を発揮することができる。 The adhesion improver comprising a thioether-containing alkoxysilane derivative as an active ingredient preferably exhibits 0.1 to 30% by mass, more preferably 0.1 to 10% by mass of the resin as an active ingredient, and exhibits high adhesion. be able to.
以下に、合成例、実施例および比較例を挙げて前記実施形態をさらに具体的に説明する。各実施例および比較例で用いた測定方法と評価方法を下記に示す。
<赤外線吸収スペクトル分析(IR)>
機種;日本分光(株)製 FT/IR-600
セル;KBr上に展開、分解;4cm−1、積算回数;16回
<核磁気共鳴スペクトル分析(NMR)>
機種;日本ブルカー(株)製、400MHz−Advance400、条件;積算回数16回、溶媒;重クロロホルム
<粘度>
機種;東機産業(株)製(R型粘度計)、温度;25℃
<密着性評価>
硬化膜を形成したサンプルを温度121℃、相対湿度(RH)100%で8時間処理した後、JIS K5600−5−6に規定される塗膜の機械的性質−付着性(クロスカット法)試験法で評価を行った。そして、全く剥離の無いものを合格とした。
Hereinafter, the embodiment will be described more specifically with reference to synthesis examples, examples, and comparative examples. The measurement methods and evaluation methods used in each example and comparative example are shown below.
<Infrared absorption spectrum analysis (IR)>
Model: JASCO Corporation FT / IR-600
Cell: Expanded on KBr, decomposed; 4 cm −1 , integration number: 16 times <Nuclear magnetic resonance spectrum analysis (NMR)>
Model: Nippon Bruker Co., Ltd., 400 MHz-Advanced 400, conditions: 16 times of accumulation, solvent: heavy chloroform <viscosity>
Model: Toki Sangyo Co., Ltd. (R type viscometer), temperature: 25 ° C
<Adhesion evaluation>
A sample with a cured film formed thereon was treated at a temperature of 121 ° C. and a relative humidity (RH) of 100% for 8 hours, and then the mechanical properties-adhesiveness (cross-cut method) test of the coating film defined in JIS K5600-5-6 Evaluation was performed by the law. And what did not peel at all was set as the pass.
以下に、本実施例および比較例で用いた試薬を示す。
<アルコキシシリル基を有する化合物:A成分>
3−メタクリロキシプロピルトリメトキシシラン(以降、A−1という)。その構造を下記式9に示す。
The reagents used in the examples and comparative examples are shown below.
<Compound having alkoxysilyl group: Component A>
3-methacryloxypropyltrimethoxysilane (hereinafter referred to as A-1). The structure is shown in the following formula 9.
トリメチロールプロパントリス(3-メルカプトプロピオネート)(以降、B−1という)。その構造を下記式12に示す(粘度0.1Pa・s)。
Trimethylolpropane tris (3-mercaptopropionate) (hereinafter referred to as B-1). The structure is shown in the following formula 12 (viscosity 0.1 Pa · s).
セパラブルの4つ口フラスコに温度計と還流管を備え、内部を窒素雰囲気にした。この4つ口フラスコに、下記表1に従いA成分とB成分を仕込み、90℃で6時間反応させた。6時間反応後の粘度を表1に示す。また、IRとNMRの結果を表1に従い下記に示すと共に、図1〜図7に示す。
(合成例1および2)
セパラブルの4つ口フラスコに温度計と還流管を備え、内部を窒素雰囲気にした。この4つ口フラスコに下記表1に従いA成分とB成分を仕込み、90℃で6時間反応させた。
A separable four-necked flask was equipped with a thermometer and a reflux tube, and the inside was made a nitrogen atmosphere. Into this four-necked flask, A component and B component were charged according to the following Table 1, and reacted at 90 ° C. for 6 hours. Table 1 shows the viscosity after the reaction for 6 hours. In addition, IR and NMR results are shown below according to Table 1 and shown in FIGS.
(Synthesis Examples 1 and 2)
A separable four-necked flask was equipped with a thermometer and a reflux tube, and the inside was made a nitrogen atmosphere. In accordance with the following Table 1, A and B components were charged into this four-necked flask and reacted at 90 ° C. for 6 hours.
(結果I1)
2945cm−1:57%T、2841cm−1:64%T、1736cm−1:41%T、1464cm−1:72%T、1414cm−1:70%T、1388cm−1:78%T、1352cm−1:76%T、1192cm−1:49%T、1086cm−1:41%T、820cm−1:57%T
(結果I2)
2945cm−1:44%T、2841cm−1:50%T、1736cm−1:26%T、1466cm−1:61%T、1414cm−1:70%T、1388cm−1:66%T、1352cm−1:63%T、1192cm−1:31%T、1086cm−1:25%T、982cm−1:70%T、820cm−1:57%T
(結果I3)
2945cm−1:47%T、2841cm−1:52%T、1736cm−1:30%T、1464cm−1:62%T、1414cm−1:71%T、1388cm−1:67%T、1352cm−1:64%T、1192cm−1:35%T、1086cm−1:30%T、982cm−1:70%T、820cm−1:45%T
(結果I4)
2945cm−1:46%T、2841cm−1:54%T、2569cm−1:94%T、1736cm−1:22%T、1464cm−1:60%T、1414cm−1:63%T、1388cm−1:60%T、1354cm−1:54%T、1192cm−1:30%T、1086cm−1:27%T、822cm−1:45%T
(結果I5)
2945cm−1:57%T、2841cm−1:68%T、2569cm−1:92%T、1738cm−1:24%T、1464cm−1:67%T、1390cm−1:62%T、1356cm−1:56%T、1153cm−1:33%T、1084cm−1:36%T、822cm−1:59%T
(結果I6)
2945cm−1:60%T、2841cm−1:67%T、1737cm−1:29%T、1465cm−1:79%T、1414cm−1:78%T、1389cm−1:77%T、1355cm−1:73%T、1193cm−1:39%T、1086cm−1:30%T、821cm−1:53%T
(結果I7)
2974cm−1:52%T、2927cm−1:63%T、1738cm−1:36%T、1460cm−1:76%T、1389cm−1:67%T、1353cm−1:74%T、1166cm−1:42%T、1079cm−1:39%T、958cm−1:59%T、791cm−1:66%T
上記結果I4およびI5における2569cm−1のピークはチオール基によるものである。結果I1〜I7において、C=Cに由来する1600〜1700cm−1のピークが観測されないことから、A−1、A−2およびA−3が反応していることがわかる。
<NMRの結果>
表1に示した結果N1のNMRスペクトルを図1、結果N2のNMRスペクトルを図2、結果N3のNMRスペクトルを図3、結果N4のNMRスペクトルを図4、結果N5のNMRスペクトルを図5、結果N6のNMRスペクトルを図6および結果N7のNMRスペクトルを図7に示した。
(Result I1)
2945 cm −1 : 57% T, 2841 cm −1 : 64% T, 1736 cm −1 : 41% T, 1464 cm −1 : 72% T, 1414 cm −1 : 70% T, 1388 cm −1 : 78% T, 1352 cm − 1 : 76% T, 1192 cm −1 : 49% T, 1086 cm −1 : 41% T, 820 cm −1 : 57% T
(Result I2)
2945 cm −1 : 44% T, 2841 cm −1 : 50% T, 1736 cm −1 : 26% T, 1466 cm −1 : 61% T, 1414 cm −1 : 70% T, 1388 cm −1 : 66% T, 1352 cm − 1 : 63% T, 1192 cm −1 : 31% T, 1086 cm −1 : 25% T, 982 cm −1 : 70% T, 820 cm −1 : 57% T
(Result I3)
2945 cm −1 : 47% T, 2841 cm −1 : 52% T, 1736 cm −1 : 30% T, 1464 cm −1 : 62% T, 1414 cm −1 : 71% T, 1388 cm −1 : 67% T, 1352 cm − 1 : 64% T, 1192 cm −1 : 35% T, 1086 cm −1 : 30% T, 982 cm −1 : 70% T, 820 cm −1 : 45% T
(Result I4)
2945cm -1: 46% T, 2841cm -1: 54% T, 2569cm -1: 94% T, 1736cm -1: 22% T, 1464cm -1: 60% T, 1414cm -1: 63% T, 1388cm - 1 : 60% T, 1354 cm −1 : 54% T, 1192 cm −1 : 30% T, 1086 cm −1 : 27% T, 822 cm −1 : 45% T
(Result I5)
2945cm -1: 57% T, 2841cm -1: 68% T, 2569cm -1: 92% T, 1738cm -1: 24% T, 1464cm -1: 67% T, 1390cm -1: 62% T, 1356cm - 1 : 56% T, 1153 cm −1 : 33% T, 1084 cm −1 : 36% T, 822 cm −1 : 59% T
(Result I6)
2945 cm −1 : 60% T, 2841 cm −1 : 67% T, 1737 cm −1 : 29% T, 1465 cm −1 : 79% T, 1414 cm −1 : 78% T, 1389 cm −1 : 77% T, 1355 cm − 1 : 73% T, 1193 cm −1 : 39% T, 1086 cm −1 : 30% T, 821 cm −1 : 53% T
(Result I7)
2974cm -1: 52% T, 2927cm -1: 63% T, 1738cm -1: 36% T, 1460cm -1: 76% T, 1389cm -1: 67% T, 1353cm -1: 74% T, 1166cm - 1 : 42% T, 1079 cm −1 : 39% T, 958 cm −1 : 59% T, 791 cm −1 : 66% T
As a result, the peak at 2569 cm −1 in I4 and I5 is attributed to the thiol group. In the results I1 to I7, since a peak of 1600 to 1700 cm −1 derived from C═C is not observed, it is understood that A-1, A-2, and A-3 are reacted.
<Results of NMR>
1 shows the NMR spectrum of the result N1 shown in Table 1, FIG. 2 shows the NMR spectrum of the result N2, FIG. 3 shows the NMR spectrum of the result N3, FIG. 4 shows the NMR spectrum of the result N4, and FIG. The NMR spectrum of the result N6 is shown in FIG. 6 and the NMR spectrum of the result N7 is shown in FIG.
各NMRスペクトルにおけるピークの帰属を下記の式15に示す。 The assignment of peaks in each NMR spectrum is shown in the following formula 15.
結果N4および結果N5はチオールに由来するピークが確認されたが、結果N1〜結果N3および結果N6、結果N7においてはチオール基由来のピークは観測されなかった。また、結果N1〜結果N7より、CH2=Cに由来するピークが観測されないことから、A−1、A−2およびA−3は反応していることがわかった。
(実施例6〜10および13、14)
エポキシ樹脂として、98質量%のYDPN638〔フェノールノボラック型エポキシ樹脂:東都化成(株)製、商品名〕と、2質量%のEH−4344S〔イミダゾール型触媒:(株)アデカ製、商品名〕の混合物を選択した(以降、E−1という)。このE−1と実施例1〜5および実施例11、12で得られた密着性向上剤とを表2の配合量に従って配合した。配合したサンプルをOA−10〔無アルカリガラス:日本電気硝子(株)製、商品名〕にバーコーターで塗布し、150℃、1時間の条件で硬化させて樹脂成形物としての硬化膜を得た。得られた硬化膜の密着性を評価し、それらの結果を表2に示す。
(比較例1〜3)
E−1と合成例1または2で得られたサンプルあるいはA−1を表2の配合量に従って配合した。配合したサンプルをOA−10〔無アルカリガラス:日本電気硝子(株)製、商品名〕にバーコーターで塗布し、150℃、1時間の条件で硬化させて樹脂成形物としての硬化膜を得た。得られた硬化膜の密着性を評価し、それらの結果を表2に示す。
Peaks derived from thiol were confirmed in results N4 and N5, but no peaks derived from thiol groups were observed in results N1 to N3, results N6, and results N7. Further, from the results N1~ result N7, since the peak derived from CH 2 = C is not observed, A-1, A-2 and A-3 were found to react.
(Examples 6 to 10 and 13, 14)
As an epoxy resin, 98% by mass of YDPN638 [phenol novolac type epoxy resin: manufactured by Toto Kasei Co., Ltd., product name] and 2% by mass of EH-4344S [imidazole type catalyst: manufactured by Adeka Co., Ltd., product name] A mixture was selected (hereinafter referred to as E-1). This E-1 and the adhesion improvers obtained in Examples 1 to 5 and Examples 11 and 12 were blended according to the blending amounts in Table 2. The blended sample is applied to OA-10 [non-alkali glass: product name, manufactured by Nippon Denki Glass Co., Ltd.] with a bar coater, and cured at 150 ° C. for 1 hour to obtain a cured film as a resin molded product. It was. The adhesion of the obtained cured film was evaluated, and the results are shown in Table 2.
(Comparative Examples 1-3)
E-1 and the sample obtained in Synthesis Example 1 or 2 or A-1 were blended according to the blending amounts in Table 2. The blended sample is applied to OA-10 [non-alkali glass: product name, manufactured by Nippon Denki Glass Co., Ltd.] with a bar coater, and cured at 150 ° C. for 1 hour to obtain a cured film as a resin molded product. It was. The adhesion of the obtained cured film was evaluated, and the results are shown in Table 2.
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