JP2011076303A - Transparent conductive laminate, touch panel formed using the same, and method of producing the laminate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide: a transparent conductive laminate suppressing lowering of the responsiveness and operability of a material including a touch panel formed using the transparent conductive laminate; and a method of producing the transparent conductive laminate. <P>SOLUTION: The transparent conductive laminate 1 includes: a transparent base material 2 as a transparent film; a conductive function layer 4 having conductivity formed on one side of the transparent base material 2; a wiring electrode 6 formed on the conductive function layer 4; and an adhesive layer 8 formed on the wiring electrode 6, the total thickness of the wiring electrode 6 and the adhesive layer 8 being 260 μm or less. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a transparent conductive laminate, a touch panel formed using the transparent conductive laminate, and a method for producing the transparent conductive laminate, which are useful as a transparent electrode, a touch panel, an electromagnetic shielding film, and the like.

A transparent conductive film, which is one of the transparent conductive laminates, has the characteristics of having both conductivity and optical transparency, so industrially, transparent electrodes, electromagnetic wave shielding films, planar shapes It is used as a heat generating film, an antireflection film and the like. In particular, in recent years, it is frequently used as an electrode used for a touch panel.
By the way, there are various types of touch panels such as a capacitive coupling type and an optical type. Among these methods, the transparent conductive film is used because of, for example, a resistive film type that specifies the input position by contacting the upper and lower electrodes, or an electrostatic that specifies the input position from the change in capacitance. This is a capacitive coupling method.

The touch panel is also used as an input device, for example, on the front surface of a display such as a portable terminal or a portable game machine. For this reason, the touch panel used in these applications particularly needs transmission / reflection characteristics that do not impair the display on the display.
Moreover, high durability is calculated | required by the touchscreen integrated in a display by the thin frame of a liquid crystal panel and diversification of use environment.

Conventionally, as a technique for improving the durability of the touch panel, there are techniques as described in Patent Document 1 and Patent Document 2, for example.
The technique described in Patent Document 1 is a transparent conductive laminate in which a transparent conductive thin film is provided on one surface of a film substrate and a transparent substrate is bonded to the other surface of the film substrate. It is.

  Further, the technique described in Patent Document 2 has a surface of a composition and shape different from that of the metal oxide thin film after the metal oxide thin film is provided when forming the transparent conductive film of the upper electrode. It is a transparent conductive film in which a metal oxide thin film is formed. With such a transparent conductive film, it is possible to suppress peeling of the transparent conductive film from the electrode and suppress fusion with the lower electrode, thereby improving sliding resistance and durability. It becomes possible.

Japanese Patent No. 2667686 Japanese Patent No. 4086132

  However, with the techniques described in Patent Literature 1 and Patent Literature 2, the durability of the portion of the touch panel having the function of the input device, such as the numeric keys arranged on the screen and the display area of the options, is improved. There is a possibility that the problem that it is difficult to occur. In addition, durability of the part which has a function of an input device among touch panels, for example, when the member which presses a touch panel is a pen type, durability with respect to the press of the part which has the function of an input device by a pen front-end | tip part And durability against sliding between the pen tip and the touch panel.

If the durability of the part of the touch panel that has the function of the input device is reduced, the linearity (linearity error) that is the difference between the position actually pressed by the member that presses the touch panel and the position at which the touch is detected is detected. There is a possibility that the problem that the responsiveness and operability of the equipment equipped with the touch panel will decrease will increase.
The present invention improves the durability of a transparent conductive laminate that forms a touch panel, and can improve the durability of a portion having a function of an input device in the touch panel, and the transparent conductive laminate and its It is an object to provide a manufacturing method.

In order to solve the above-mentioned problems, the invention described in claim 1 is a transparent base material which is a transparent film, and a conductive function having conductivity formed on one surface of the transparent base material. A transparent conductive laminate comprising a layer, a wiring electrode formed on the conductive functional layer, and an adhesive layer formed on the wiring electrode,
The total thickness of the wiring electrode and the adhesive layer is 260 μm or less.

According to the present invention, the total thickness of the wiring electrode formed on the conductive functional layer and the adhesive layer formed on the wiring electrode is 260 μm or less.
For this reason, it becomes possible to improve durability of a transparent conductive laminated body compared with the case where the total thickness of the electrode for wiring and the adhesion layer is made into thickness exceeding 260 micrometers.

Next, of the present invention, the invention described in claim 2 is the invention described in claim 1, wherein the conductive functional layer is formed of at least indium tin oxide and has conductivity. It is characterized by including a layer.
According to the present invention, the conductive functional layer is formed using at least indium tin oxide and includes an electrically conductive ITO layer.
For this reason, since it becomes possible to improve the durability of a conductive functional layer compared with the case where a conductive functional layer does not contain an ITO layer, it is possible to improve the durability of a transparent conductive laminate. It becomes.

Next, among the present inventions, the invention described in claim 3 is a touch panel formed by using the transparent conductive laminate described in claim 1 or 2.
According to the present invention, a touch panel is formed using a transparent conductive laminate having a total thickness of wiring electrodes and an adhesive layer of 260 μm or less. Alternatively, a transparent conductive laminate in which the total thickness of the wiring electrode and the adhesive layer is 260 μm or less, and the conductive functional layer is formed using at least indium tin oxide and includes an electrically conductive ITO layer. Is used to form a touch panel.
Therefore, a touch panel formed using a transparent conductive laminate in which the total thickness of the wiring electrode and the adhesive layer exceeds 260 μm, or a transparent conductive laminate in which the conductive functional layer does not include the ITO layer. Compared to the above, it becomes possible to obtain a touch panel with improved durability.

Next, among the present inventions, the invention described in claim 4 is a conductive functional layer forming step of forming a conductive functional layer having conductivity on one surface of a transparent substrate that is a transparent film, and the conductive function. A method for producing a transparent conductive laminate comprising: a wiring electrode forming step of forming a wiring electrode on the layer; and an adhesive layer forming step of forming an adhesive layer on the wiring electrode,
The total thickness of the wiring electrode and the adhesive layer is 260 μm or less.

According to the present invention, the transparent conductive laminate is manufactured by setting the total thickness of the wiring electrode formed on the conductive functional layer and the adhesive layer formed on the wiring electrode to 260 μm or less.
For this reason, it becomes possible to manufacture a transparent conductive laminate having improved durability as compared with the case where the total thickness of the wiring electrode and the adhesive layer exceeds 260 μm.

Next, among the present inventions, the invention described in claim 5 is a conductive functional layer forming step of forming a conductive functional layer having conductivity on one surface of a transparent substrate that is a transparent film, and the conductive function. A method for producing a transparent conductive laminate comprising: a wiring electrode forming step of forming a wiring electrode on the layer; and an adhesive layer forming step of forming an adhesive layer on the wiring electrode,
In the conductive functional layer forming step, the conductive functional layer is formed using at least indium tin oxide and including an ITO layer having conductivity,
The total thickness of the wiring electrode and the adhesive layer is 260 μm or less.

According to the present invention, the transparent conductive laminate is manufactured by setting the total thickness of the wiring electrode formed on the conductive functional layer and the adhesive layer formed on the wiring electrode to 260 μm or less. In addition, in the conductive functional layer forming step, the conductive functional layer is formed using at least indium tin oxide and including an ITO layer having conductivity.
For this reason, the total thickness of the wiring electrode and the adhesive layer is set to a thickness exceeding 260 μm, and further, the transparent conductive material having improved durability as compared with the case where the conductive functional layer is formed without including the ITO layer. A laminated body can be manufactured.

  According to the present invention, the durability of the transparent conductive laminate forming the touch panel can be improved, and the durability of the part of the touch panel having the function of the input device can be improved. It becomes possible to make it. Thereby, it becomes possible to suppress the fall of the responsiveness and operability of the equipment provided with a touch panel.

It is sectional drawing which shows schematic structure of the transparent conductive laminated body of 1st embodiment of this invention. It is sectional drawing which shows schematic structure of the transparent conductive laminated body of 2nd embodiment of this invention. It is sectional drawing which shows schematic structure of the transparent conductive laminated body which forms the touchscreen used by an evaluation test.

(First embodiment)
Hereinafter, a first embodiment of the present invention (hereinafter referred to as “the present embodiment”) will be described with reference to the drawings.
(Constitution)
First, the structure of the transparent conductive laminated body 1 of this embodiment is demonstrated using FIG.

FIG. 1 is a cross-sectional view showing a schematic configuration of the transparent conductive laminate 1.
As shown in FIG. 1, the transparent conductive laminate 1 includes a transparent substrate 2, a conductive functional layer 4, a wiring electrode 6, and an adhesive layer 8, and includes a transparent electrode, a touch panel, and an electromagnetic shielding film. Used as a component such as
In addition, in this embodiment, the case where the transparent conductive laminated body 1 is used as a component of a touch panel is demonstrated as an example.

The transparent substrate 2 is a transparent film, and the thickness thereof is about 10 to 200 [μm] in consideration of flexibility.
The transparent substrate 2 is preferably one in which a primer layer such as a hard coat is laminated on one or both surfaces. However, the configuration of the transparent substrate 2 is not limited to this.

Further, the transparent substrate 2 may be subjected to surface treatment such as easy adhesion treatment, plasma treatment, corona treatment on one or both surfaces.
As the material of the transparent substrate 2, glass, polyolefin (polyethylene, polypropylene, etc.), polyester (polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, etc.) can be used.

As the material for the transparent substrate 2, polyamide (nylon 6, nylon 66, etc.), polyimide, polyarylate, polycarbonate, polyacrylate, polyethersulfone, polysulfone can be used.
Furthermore, as a material for the transparent substrate 2, it is also possible to use a plastic film obtained by unstretching or stretching a copolymer of the above-described material.

Moreover, as a material of the transparent base material 2, besides the material mentioned above. It is also possible to use other plastic films with high transparency.
In the present embodiment, as an example, a case where the material of the transparent substrate 2 is polyethylene terephthalate (PET), which is advantageous in terms of cost, will be described.
The conductive functional layer 4 is formed on one surface (the upper surface in FIG. 1) of the transparent substrate 2, and has conductivity.

In the present embodiment, as an example, a case where a method of applying a conductive polymer is used as a method of forming the conductive functional layer 4 will be described. Note that the method of forming the conductive functional layer 4 is not limited to this method.
The wiring electrode 6 is formed on the conductive functional layer 4, specifically, on the surface of the conductive functional layer 4 opposite to the transparent substrate 2 (upper surface in FIG. 1). It is formed using what melt | dissolved in the solvent. The method for forming the wiring electrode 6 is not limited to this method.

  The adhesive layer 8 is formed on the wiring electrode 6, specifically on the surface opposite to the conductive functional layer 4 of the wiring electrode 6 (upper surface in FIG. 1). It is formed using an adhesive such as urethane. In addition, the method of forming the adhesion layer 8 is not limited to this method, For example, you may form using the double-sided tape with which adhesives, such as an acrylic type and a urethane type, were apply | coated.

  The thickness of the wiring electrode 6 and the thickness of the adhesive layer 8 are set so that the total thickness of the wiring electrode 6 and the adhesive layer 8 is 260 μm or less, respectively.

(Method for producing transparent conductive laminate)
Hereinafter, with reference to FIG. 1, the manufacturing method of the transparent conductive laminated body which is the method of manufacturing the transparent conductive laminated body 1 of this embodiment is demonstrated.
The manufacturing method of the transparent conductive laminated body of this embodiment is a method including a conductive functional layer forming step, a wiring electrode forming step, and an adhesive layer forming step.

  The conductive functional layer forming step is a step of forming the conductive functional layer 4 having conductivity on one surface (the upper surface in FIG. 1) of the transparent substrate 2 which is a transparent film. The method described above is used as a method for forming the conductive functional layer 4.

In the wiring electrode formation step, the wiring electrode 6 is formed on the conductive functional layer 4, specifically, on the surface of the conductive functional layer 4 opposite to the transparent substrate 2 (upper surface in FIG. 1). It is a process. In addition, the method mentioned above is used for the method of forming the electrode 6 for wiring.
The adhesive layer forming step is a step of forming the adhesive layer 8 on the wiring electrode 6, specifically, on the surface opposite to the conductive functional layer 4 of the wiring electrode 6 (upper surface in FIG. 1). is there. In addition, the method mentioned above is used for the method of forming the adhesion layer 8. FIG.

  Moreover, in the manufacturing method of the transparent conductive laminated body of this embodiment, the thickness of the electrode 6 for wiring and the thickness of the adhesion layer 8 are respectively the sum total thickness of the electrode 6 for wiring and the adhesion layer 8 being 260 micrometers or less. The above-described steps are performed by setting so as to be.

(Effects of the first embodiment)
The effects of this embodiment are listed below.
(1) In the transparent conductive laminate 1 of the present embodiment, the total thickness of the wiring electrode 6 formed on the conductive functional layer 4 and the adhesive layer 8 formed on the wiring electrode 6 is 260 μm or less.
For this reason, compared with the case where the total thickness of the electrode 6 for wiring and the adhesion layer 8 is made into thickness exceeding 260 micrometers, it becomes possible to improve the durability of the transparent conductive laminated body 1, and forms a touch panel. The durability of the transparent conductive laminate 1 can be improved.
As a result, it becomes possible to improve the durability of the part of the touch panel that has the function of the input device, so it is possible to reduce the linearity and suppress the deterioration of the responsiveness and operability of the equipment equipped with the touch panel. It becomes possible to do.

(2) The touch panel formed using the transparent conductive laminate 1 of the present embodiment is formed using the transparent conductive laminate 1 in which the total thickness of the wiring electrode 6 and the adhesive layer 8 is 260 μm or less. Has been.
For this reason, it is possible to obtain a touch panel with improved durability as compared with a touch panel formed using the transparent conductive laminate 1 in which the total thickness of the wiring electrode 6 and the adhesive layer 8 is greater than 260 μm. It becomes possible.
As a result, it becomes possible to improve the durability of the part of the touch panel that has the function of the input device, so it is possible to reduce the linearity and suppress the deterioration of the responsiveness and operability of the equipment equipped with the touch panel. It becomes possible to do.

(3) In the manufacturing method of the transparent conductive laminate of the present embodiment, the total thickness of the wiring electrode 6 formed on the conductive functional layer 4 and the adhesive layer 8 formed on the wiring electrode 6 The transparent conductive laminate 1 is manufactured with a thickness of 260 μm or less.
For this reason, it becomes possible to manufacture the transparent conductive laminate 1 with improved durability as compared with the case where the total thickness of the wiring electrode 6 and the adhesive layer 8 exceeds 260 μm, and the touch panel It becomes possible to improve the durability of the transparent conductive laminate 1 to be formed.
As a result, it becomes possible to improve the durability of the part of the touch panel that has the function of the input device, so it is possible to reduce the linearity and suppress the deterioration of the responsiveness and operability of the equipment equipped with the touch panel. It becomes possible to do.

(Second embodiment)
Hereinafter, a second embodiment of the present invention (hereinafter referred to as “the present embodiment”) will be described with reference to the drawings.
(Constitution)
First, the configuration of the transparent conductive laminate 1 of the present embodiment will be described with reference to FIG. 1 and FIG. 2.
FIG. 2 is a cross-sectional view showing a schematic configuration of the transparent conductive laminate 1. In FIG. 2, the same reference numerals are assigned to the same components as those of the transparent conductive laminate 1 shown in FIG.
Since the transparent conductive laminate 1 of the present embodiment is the same as the transparent conductive laminate 1 of the first embodiment described above except for the configuration of the conductive functional layer 4, the following description of the conductive functional layer 4 The configuration is mainly described.

The conductive functional layer 4 is formed on one surface (the upper surface in FIG. 2) of the transparent substrate 2 and has conductivity.
The conductive functional layer 4 is formed by laminating two layers, and the two layers include an ITO layer 10.
The ITO layer 10 is formed using at least indium tin oxide, and seems to have conductivity. “ITO” is an abbreviation that stands for Indium Tin Oxide.

In the present embodiment, a case where a sputtering method using an indium tin oxide target is used as a method for forming the conductive functional layer 4 will be described.
Further, the two layers included in the conductive functional layer 4 include a nonconductive layer 12 in addition to the ITO layer 10.
Unlike the ITO layer 10, the nonconductive layer 12 is a layer that does not have conductivity. In the present embodiment, as an example, a case where the nonconductive layer 12 is an optical adjustment layer capable of improving optical characteristics will be described. However, the configuration of the nonconductive layer 12 is not limited to this.

In the present embodiment, as an example, the non-conductive layer 12 is continuous with one surface of the transparent substrate 2, and the ITO layer 10 sandwiches the non-conductive layer 12 between the transparent substrate and the transparent substrate. The case where it opposes one side of 2 is demonstrated. However, the positional relationship between the ITO layer 10 and the nonconductive layer 12 is not limited to this.
Other configurations are the same as those of the first embodiment described above.

(Method for producing transparent conductive laminate)
Hereinafter, with reference to FIG. 2, the manufacturing method of the transparent conductive laminated body which is the method of manufacturing the transparent conductive laminated body 1 of this embodiment is demonstrated.
The manufacturing method of the transparent conductive laminated body of this embodiment is a method including a conductive functional layer forming step, a wiring electrode forming step, and an adhesive layer forming step, as in the first embodiment. Note that the wiring electrode forming step and the adhesive layer forming step are the same as those in the first embodiment described above, and thus the description thereof is omitted.
The conductive functional layer forming step is a step of forming the conductive functional layer 4 having conductivity on one surface (the upper surface in FIG. 2) of the transparent substrate 2 which is a transparent film. The method described above is used as a method for forming the conductive functional layer 4.

Moreover, in the manufacturing method of the transparent conductive laminated body of this embodiment, in the conductive functional layer formation process, the conductive functional layer 4 is formed using at least indium tin oxide and includes the ITO layer 10 having conductivity. Form.
Similarly to the first embodiment described above, in the method for manufacturing the transparent conductive laminate according to this embodiment, the thickness of the wiring electrode 6 and the thickness of the adhesive layer 8 are respectively set to the wiring electrode 6 and the adhesive. The above steps are performed by setting the total thickness of the layer 8 to be 260 μm or less.

(Effect of the second embodiment)
The effects of this embodiment are listed below.
(1) In the transparent conductive laminate 1 of the present embodiment, the conductive functional layer 4 includes an ITO layer 10 that is formed using at least indium tin oxide and has conductivity.
For this reason, compared with the case where the conductive functional layer 4 does not include the ITO layer 10, it becomes possible to improve the durability of the transparent conductive laminate 1, and the transparent conductive laminate 1 forming the touch panel can be improved. Durability can be improved.
As a result, it becomes possible to improve the durability of the part of the touch panel that has the function of the input device, so it is possible to reduce the linearity and suppress the deterioration of the responsiveness and operability of the equipment equipped with the touch panel. It becomes possible to do.

(2) In the touch panel formed using the transparent conductive laminate 1 of the present embodiment, the total thickness of the wiring electrode 6 and the adhesive layer 8 is 260 μm or less, and the conductive functional layer 4 is at least indium oxide. It is formed using the transparent conductive laminated body 1 formed using tin and including the ITO layer 10 having conductivity.
For this reason, the transparent conductive laminate 1 in which the total thickness of the wiring electrode 6 and the adhesive layer 8 exceeds 260 μm, or the transparent conductive laminate 1 in which the conductive functional layer 4 does not include the ITO layer 10. Compared with the touch panel formed using the material, it is possible to obtain a touch panel with improved durability.
As a result, it becomes possible to improve the durability of the part of the touch panel that has the function of the input device, so it is possible to reduce the linearity and suppress the deterioration of the responsiveness and operability of the equipment equipped with the touch panel. It becomes possible to do.

(3) In the manufacturing method of the transparent conductive laminate of the present embodiment, the total thickness of the wiring electrode 6 formed on the conductive functional layer 4 and the adhesive layer 8 formed on the wiring electrode 6 The transparent conductive laminate 1 is manufactured with a thickness of 260 μm or less. In addition, in the conductive functional layer forming step, the conductive functional layer 4 is formed by using at least indium tin oxide and including the ITO layer 10 having conductivity.

Therefore, the total thickness of the wiring electrode 6 and the adhesive layer 8 is set to a thickness exceeding 260 μm, and further, the durability is improved as compared with the case where the conductive functional layer 4 is formed without including the ITO layer 10. It becomes possible to manufacture the transparent conductive laminated body 1 which was made, and it becomes possible to improve the durability of the transparent conductive laminated body 1 which forms a touch panel.
As a result, it becomes possible to improve the durability of the part of the touch panel that has the function of the input device, so it is possible to reduce the linearity and suppress the deterioration of the responsiveness and operability of the equipment equipped with the touch panel. It becomes possible to do.

(Example)
Hereinafter, referring to FIG. 1 and FIG. 2, the results of evaluation tests based on linearity are compared with respect to three types of touch panels formed using transparent conductive laminates having different configurations using FIG. .

Since the touch panel is used by pressing and sliding a finger, a pen, or the like with respect to a portion having the function of the input device, the upper electrode and the lower electrode are damaged as they are repeatedly used. Therefore, as a performance evaluation, the pen is reciprocated with a constant load on the touch panel, and the linearity is measured.
In addition, as a comparison object, the touch panel formed using the three types (I, II, III) of transparent conductive laminated bodies shown below is used.

Here, a configuration common to the three types of transparent conductive laminates 1 will be described with reference to FIG. In FIG. 3, the same reference numerals are given to the same configurations as those of the transparent conductive laminate 1 shown in FIGS. 1 and 2.
FIG. 3 is a cross-sectional view showing a schematic configuration of the transparent conductive laminate 1 forming a touch panel used in the evaluation test.

As shown in FIG. 3, the transparent conductive laminate 1 includes a transparent substrate 2, a conductive functional layer 4, a glass layer 14, a dot spacer 16, a wiring electrode 6, and an adhesive layer 8. It is used for a resistive film type touch panel.
The transparent substrate 2 is a transparent polyethylene terephthalate (PET) film in which a hard coat is applied to both surfaces, and the thickness thereof is 188 [μm].

The conductive functional layer 4 is formed on one surface (the lower surface in FIG. 3) of the transparent substrate 2, and is formed by DC magnetron sputtering and has a thickness of 20 [μm] ITO (Indium Tin Oxide). ) A membrane.
The transparent base material 2 on which the conductive functional layer 4 is formed is cut to a width of 7 [cm] and 10 [cm].

The glass layer 14 is formed with an ITO film and has a width of 7 [cm] and a width of 10 [cm] as in the transparent substrate 2 on which the conductive functional layer 4 is formed.
In addition, the transparent base material 2 in which the glass layer 14 and the conductive functional layer 4 are formed are arranged such that their short sides and long sides are overlapped with each other with a space therebetween.
Here, as shown in FIG. 3, the transparent conductive laminate 1 that forms the touch panel used in the evaluation test is composed of the glass layer 14 on which the ITO film is formed and the transparent base material 2 on which the conductive functional layer 4 is formed. It is arranged below. For this reason, the transparent base material 2 on which the conductive functional layer 4 is formed forms an upper electrode, and the glass layer 14 on which the ITO film is formed forms a lower electrode.

  The dot spacer 16 is a protrusion having a semicircular cross section with a height of about 10 [μm], and its plane is attached to the surface (the upper surface in FIG. 3) facing the transparent substrate 2 of the glass layer 14. These are disposed between the glass layer 14 and the transparent substrate 2 on which the conductive functional layer 4 is formed. A plurality of dot spacers 16 are arranged in a lattice between the glass layer 14 and the transparent substrate 2 on which the conductive functional layer 4 is formed, and the interval between adjacent dot spacers 16 is 2 [mm. ].

  Thereby, the dot spacer 16 constitutes a stopper that prevents the electrodes from touching each other in the absence of pen input. In FIG. 3, the dot spacer 16 is attached only to the glass layer 14 (lower electrode), that is, only one electrode. However, the present invention is not limited to this, and the dot spacer 16 is attached to the glass layer 14 ( You may attach to only the transparent base material 2 (upper electrode) in which the lower electrode) and the electroconductive functional layer 4 were formed, ie, both electrodes.

  The wiring electrode 6 is formed on the conductive functional layer 4, specifically on the surface of the conductive functional layer 4 opposite to the transparent substrate 2 (the lower surface in FIG. 3) and on the glass layer 14. Are formed on the surface of the glass layer 14 facing the transparent substrate 2 (upper surface in FIG. 3). In FIG. 3 and the following description, the wiring electrode 6 formed on the conductive functional layer 4 is indicated as “wiring electrode 6 a” and is formed on the glass layer 14. The wiring electrode 6 is shown as “wiring electrode 6b”.

The wiring electrode 6 a is formed on the conductive functional layer 4 at an end portion having a side length of 7 [cm].
On the other hand, the wiring electrode 6b is formed on the glass layer 14 at an end portion having a side length of 10 [cm].
The thicknesses of the wiring electrodes 6a and 6b will be described later because the three types (I, II, III) of the transparent conductive laminate 1 have different thicknesses.

The pressure-sensitive adhesive layer 8 is formed using a double-sided tape to which an acrylic or urethane adhesive is applied.
Further, the adhesive layer 8 is formed on the wiring electrode 6a, specifically on the surface of the wiring electrode 6a opposite to the conductive functional layer 4 (the lower surface in FIG. 3) and on the wiring electrode 6b. Specifically, the wiring electrode 6b is formed on the surface opposite to the glass layer 14 (upper surface in FIG. 3). In FIG. 3 and the following description, the adhesive layer 8 formed on the wiring electrode 6a is indicated as “adhesive layer 8a”, and the adhesive layer 8 formed on the wiring electrode 6b. Layer 8 is referred to as “adhesive layer 8b”.

The adhesive layer 8a is bonded to the wiring electrode 6a and the glass layer 14, and the adhesive layer 8b is bonded to the wiring electrode 6b and the conductive functional layer 4. Thereby, the transparent conductive laminated body 1 for forming a touch panel is created.
The thicknesses of the adhesive layers 8a and 8b will be described later because the three types (I, II, III) of the transparent conductive laminate 1 have different thicknesses.

Next, regarding the three types (I, II, III) of transparent conductive laminates, the differences in the respective configurations are described in I.S. First invention example Wiring electrode thickness: 100 [μm]
Adhesive layer thickness: 160 [μm]
Adhesive layer material: Double-sided tape (Teraoka Seisakusho, No.751)
Total thickness of wiring electrode and adhesive layer: 260 [μm]

II. Second Invention Example Wiring electrode thickness: 10 [μm]
Adhesive layer thickness: 40 [μm]
Adhesive layer material: Double-sided tape (Kikusui tape, trade name: Kiku double tape No. 192T)
Total thickness of wiring electrode and adhesive layer: 50 [μm]

III. Comparative Example Wiring electrode thickness: 100 [μm]
Adhesive layer thickness: 320 [μm]
Adhesive layer material: 160 [μm] double-sided tape (Teraoka Seisakusho, No. 751) is used by overlapping two layers Wiring electrode and adhesive layer total thickness: 320 [μm]
Moreover, the method at the time of performing the evaluation test based on linearity with respect to a touch panel is shown below.

First, a voltage (applied voltage) is applied between a pair of wiring electrodes, the input portion of the touch panel is pressed with a pen, and the voltage is detected by another set of wiring electrodes different from the one to which the applied voltage is applied.
At this time, the ideal voltage Vn can be obtained by the following formula (1) using the distance x0 between the wiring electrodes and the distance xn between the ground side electrode and the input portion.
Vn = applied voltage × xn ÷ x0 (1)
The detected voltage is vn, and the linearity is defined by the following equation (2).
(Vn−vn) ÷ Vn × 100 [%] (2)

In an apparatus including a touch panel, a value calculated from vn is regarded as an input position. Therefore, if the linearity value increases, the possibility of malfunction increases. Therefore, in this evaluation test, the test is performed with reference to the above formulas (1) and (2).
Specifically, for touch panels formed using three types of transparent conductive laminates, initial (unused state) linearity and after testing (using a polyacetal pen with a pen tip of R0.8 mm, Linearity was measured after reciprocating 100,000 times with a load of 250 g.

  The results of performing an evaluation test based on linearity on the touch panel formed using the above-described three types of transparent conductive laminates are shown in the following table.

  As is apparent from the table, the total thickness of the wiring electrode and the adhesive layer is compared with the comparative example in which the total thickness of the wiring electrode and the adhesive layer exceeds 320 [μm], that is, 260 [μm]. It was confirmed that the durability of the transparent electroconductive laminate was high in the first invention example and the second invention example having a thickness of 260 [μm], that is, 260 [μm] or less.

  From the above results, the transparent conductive laminate was compared with the comparative example by setting the total thickness of the wiring electrode and the adhesive layer to 260 [μm] or less as in the first invention example and the second invention example. It was confirmed that it was possible to improve the durability.

  The transparent conductive laminate and the method for producing the transparent conductive laminate of the present invention can be used as a touch panel electrode, in particular, a resistance film type touch panel electrode and a resistance film type touch panel electrode manufacturing method. .

DESCRIPTION OF SYMBOLS 1 Transparent electroconductive laminated body 2 Transparent base material 4 Conductive functional layer 6 Wiring electrode 8 Adhesive layer 10 ITO layer 12 Nonconductive layer 14 Glass layer 16 Dot spacer

Claims (5)

A transparent base material which is a transparent film, a conductive functional layer having conductivity formed on one surface of the transparent base, a wiring electrode formed on the conductive functional layer, and the wiring electrode An adhesive layer formed on the transparent conductive laminate,
The transparent conductive laminate, wherein the total thickness of the wiring electrode and the adhesive layer is 260 μm or less.   The transparent conductive laminate according to claim 1, wherein the conductive functional layer includes an ITO layer that is formed using at least indium tin oxide and has conductivity.   A touch panel formed using the transparent conductive laminate according to claim 1. A conductive functional layer forming step of forming a conductive functional layer having conductivity on one surface of a transparent substrate that is a transparent film; a wiring electrode forming step of forming a wiring electrode on the conductive functional layer; An adhesive layer forming step of forming an adhesive layer on the wiring electrode, and a method for producing a transparent conductive laminate,
The manufacturing method of the transparent conductive laminated body characterized by the total thickness of the said electrode for wiring and the said adhesion layer having been 260 micrometers or less. A conductive functional layer forming step of forming a conductive functional layer having conductivity on one surface of a transparent substrate that is a transparent film; a wiring electrode forming step of forming a wiring electrode on the conductive functional layer; An adhesive layer forming step of forming an adhesive layer on the wiring electrode, and a method for producing a transparent conductive laminate,
In the conductive functional layer forming step, the conductive functional layer is formed using at least indium tin oxide and including an ITO layer having conductivity,
The manufacturing method of the transparent conductive laminated body characterized by the total thickness of the said electrode for wiring and the said adhesion layer having been 260 micrometers or less.

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