JP2011069938A5 - - Google Patents

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Publication number
JP2011069938A5
JP2011069938A5 JP2009219938A JP2009219938A JP2011069938A5 JP 2011069938 A5 JP2011069938 A5 JP 2011069938A5 JP 2009219938 A JP2009219938 A JP 2009219938A JP 2009219938 A JP2009219938 A JP 2009219938A JP 2011069938 A5 JP2011069938 A5 JP 2011069938A5
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JP
Japan
Prior art keywords
solder resist
low
edge portion
viscosity
solder
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JP2009219938A
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Japanese (ja)
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JP5249890B2 (en
JP2011069938A (en
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Priority to JP2009219938A priority Critical patent/JP5249890B2/en
Priority claimed from JP2009219938A external-priority patent/JP5249890B2/en
Publication of JP2011069938A publication Critical patent/JP2011069938A/en
Publication of JP2011069938A5 publication Critical patent/JP2011069938A5/ja
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Publication of JP5249890B2 publication Critical patent/JP5249890B2/en
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Description

気泡が残らないようにするために、低粘度のソルダーレジストを使用する方法が考えられる。しかし、はんだ付けする部分20及びはんだ付けが不要な配線パターン21からなる導体配線を形成した絶縁性基板1(図3(a))の基板全面を覆うように、低粘度のソルダーレジスト3の膜を形成すると、はんだ付けが不要な配線パターン21のエッジ部4をソルダーレジスト3で十分に覆うことができない場合がある(図3(b))。その結果、フォトマスク11を介して、パターン露光を実施し(図3(c))、現像及びポストキュアした後、本来はんだが付着すべきではないエッジ部4が露出し(図3(d))、はんだが付着してしまうという問題が生じる。このエッジ部4が露出する問題は、粘度のソルダーレジストを使用して、導体配線の厚みが35μm以上と厚くなった場合にも生じる。
In order to prevent bubbles from remaining, a method using a low-viscosity solder resist can be considered. However, the film of the low-viscosity solder resist 3 is formed so as to cover the entire surface of the insulating substrate 1 (FIG. 3A) on which the conductor wiring composed of the soldering portion 20 and the wiring pattern 21 that does not require soldering is formed. In some cases, the edge portion 4 of the wiring pattern 21 that does not require soldering cannot be sufficiently covered with the solder resist 3 (FIG. 3B). As a result, pattern exposure is performed through the photomask 11 (FIG. 3C), and after development and post-curing, the edge portion 4 where the solder should not adhere is exposed (FIG. 3D). ), A problem that solder adheres occurs. The problem that the edge portion 4 is exposed also occurs when a low- viscosity solder resist is used and the thickness of the conductor wiring is as thick as 35 μm or more.

JP2009219938A 2009-09-25 2009-09-25 Method for forming solder resist Active JP5249890B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009219938A JP5249890B2 (en) 2009-09-25 2009-09-25 Method for forming solder resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009219938A JP5249890B2 (en) 2009-09-25 2009-09-25 Method for forming solder resist

Publications (3)

Publication Number Publication Date
JP2011069938A JP2011069938A (en) 2011-04-07
JP2011069938A5 true JP2011069938A5 (en) 2012-02-09
JP5249890B2 JP5249890B2 (en) 2013-07-31

Family

ID=44015299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009219938A Active JP5249890B2 (en) 2009-09-25 2009-09-25 Method for forming solder resist

Country Status (1)

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JP (1) JP5249890B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5723259B2 (en) * 2011-11-17 2015-05-27 三菱製紙株式会社 Dry film resist thinning method
JP6434328B2 (en) * 2015-02-04 2018-12-05 新光電気工業株式会社 WIRING BOARD, ELECTRONIC COMPONENT DEVICE, AND ITS MANUFACTURING METHOD

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0562894A (en) * 1991-09-03 1993-03-12 Sharp Corp Forming method for fine pattern
JPH05273766A (en) * 1992-03-26 1993-10-22 Matsushita Electric Works Ltd Circuit board
JP2004214253A (en) * 2002-12-27 2004-07-29 Mitsubishi Paper Mills Ltd Method of forming metal pattern
EP2247170B1 (en) * 2008-01-30 2014-10-22 Mitsubishi Paper Mills Limited Method for electroconductive pattern formation

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