JP2011035300A - Cleaning apparatus and method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a cleaning apparatus and method, capable of reducing undesirable effects on a cleaning object. <P>SOLUTION: The cleaning apparatus includes a first jetting means (11a, 12a, 13a) for jetting ozone water including ozone gas dissolved into the pure water to a cleaning object 15, a second jetting means (11b, 12b, 13b) for jetting hydrogen water including hydrogen gas dissolved into the pure water to the cleaning object 15, and a control means 12c for controlling jetting profiles of the ozone water and hydrogen water by controlling the first and second jetting means. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a cleaning apparatus and a cleaning method.

  Conventionally, a semiconductor is supplied while supplying any one of electrolyzed ion water (reduced water, oxygen, etc.), dissolved gas control water (ozone water, carbon dioxide gas, hydrogen water, etc.) and dilute ammonia water. A cleaning method for brush cleaning the end face of a substrate is known (for example, see Patent Document 1).

JP 2008-84934 A

  However, the above-described cleaning method performs brush cleaning, and depending on the object to be cleaned, there is a possibility that the brush may adversely affect the object to be cleaned.

  The present invention has been completed based on the above-described circumstances, and an object thereof is to provide a cleaning apparatus and a cleaning method that can reduce an undesirable influence on an object to be cleaned.

1st invention is a washing | cleaning apparatus, Comprising: The 1st injection means which injects the ozone water which melt | dissolved ozone gas in the pure water toward the washing | cleaning target, and the hydrogen water which melt | dissolved hydrogen gas in the pure water Control for controlling the injection mode of the ozone water and the hydrogen water by controlling the second injection means for injecting the cleaning object, the first injection means, and the second injection means. Means.
According to the present invention, the object to be cleaned is cleaned with the momentum of the injected ozone water and hydrogen water, so that it can be cleaned without using a brush. Thereby, the unfavorable influence on the cleaning object can be reduced as compared with the brush cleaning.

  By the way, ozone water may excessively oxidize (corrode) the object to be cleaned, and may adversely affect the object to be cleaned. However, ozone water has a high cleaning effect not found in hydrogen water for specific deposits such as organic substances and metals, and therefore ozone water must be used in many cases.

  According to the present invention, it is possible to neutralize the ozone water and the hydrogen water by reacting them on the object to be cleaned by controlling the injection mode of the ozone water and the hydrogen water. As a result, the surface of the object to be cleaned can be neutralized, and undesirable effects on the object to be cleaned can be reduced.

A second invention is the cleaning apparatus according to the first invention, wherein the control means controls the first injection means and the second injection means, and supplies the ozone water and the hydrogen water. Inject alternately.
According to this invention, since ozone water and hydrogen water are alternately injected, ozone water and hydrogen water react and neutralize in a short time, and excessive oxidation of the object to be cleaned by ozone water can be reduced. . Thereby, it is possible to reduce an unfavorable influence on the object to be cleaned while obtaining a high cleaning effect on specific deposits that are not included in the hydrogen water of ozone water.

3rd invention is the washing | cleaning apparatus of 1st invention, Comprising: The said control means controls the said 1st injection means and the said 2nd injection means, The said ozone water and the said hydrogen water are carried out Inject at the same time.
According to the present invention, the ozone water and the hydrogen water react and neutralize on the object to be cleaned, so that the surface of the object to be cleaned can be neutralized and the undesirable influence on the object to be cleaned is reduced. it can.

4th invention is a washing | cleaning apparatus, Comprising: The injection means which injects the ozone water which melt | dissolved ozone gas in the pure water toward the washing | cleaning target object is provided.
According to the present invention, the object to be cleaned is cleaned by the momentum of the injected ozone water, so that it can be cleaned without using a brush. Thereby, the unfavorable influence on the cleaning object can be reduced as compared with the brush cleaning.
Moreover, since ozone water is used, it is possible to obtain a high cleaning effect that is not found in alkaline cleaning water for specific deposits such as organic substances and metals.

5th invention is a washing | cleaning apparatus, Comprising: The injection means which injects the hydrogen water which melt | dissolved hydrogen gas in the pure water toward the washing | cleaning target object is provided.
According to the present invention, the object to be cleaned is cleaned by the momentum of the injected hydrogen water, so that it can be cleaned without using a brush. Thereby, the unfavorable influence on the cleaning object can be reduced as compared with the brush cleaning.
Further, since hydrogen water is used, acidic cleaning water is suitable for cleaning an object to be cleaned that is not desirable.

6th invention is a washing | cleaning apparatus, Comprising: The injection means which prevents the damage of the said washing | cleaning target object by static electricity by injecting the ozone water which melt | dissolved ozone gas in the pure water toward the washing | cleaning target object is provided.
According to the present invention, the object to be cleaned is cleaned by the momentum of the injected ozone water, so that it can be cleaned without using a brush. Thereby, the unfavorable influence on the cleaning object can be reduced as compared with the brush cleaning.

By the way, it is known that when pure water is injected as cleaning water instead of ozone water, the cleaning water is charged due to the following factors.
1) When the pure water moves in the high-pressure micro jet pump unit, the flow charge between the pure water and the piping of the system, etc. 2) The split charge when the injected flying water droplet is atomized 3) The split charge Frictional charging of flying water droplets with air 4) Frictional charging by flying water droplets and the flow of flying water droplets on the surface of electronic devices For example, when a semiconductor is cleaned with charged cleaning water, wiring is destroyed by static electricity, The semiconductor may be damaged.
On the other hand, since ozone water has an antistatic function, damage to the object to be cleaned due to static electricity can be reduced.

7th invention is a washing | cleaning apparatus, Comprising: The injection means which prevents the damage to the said washing | cleaning target object by static electricity by injecting the hydrogen water which melt | dissolved hydrogen gas in the pure water toward the washing | cleaning target object is provided.
According to the present invention, the object to be cleaned is cleaned by the momentum of the injected hydrogen water, so that it can be cleaned without using a brush. Thereby, the unfavorable influence on the cleaning object can be reduced as compared with the brush cleaning.
Further, since hydrogen water has an antistatic function, damage to the object to be cleaned due to static electricity can be reduced.

The eighth invention is a cleaning method, wherein ozone water in which ozone gas is dissolved in pure water and hydrogen water in which hydrogen gas is dissolved in pure water are alternately jetted toward the same object to be cleaned.
According to the present invention, the object to be cleaned is cleaned with the momentum of the injected ozone water and hydrogen water, so that it can be cleaned without using a brush. Thereby, the unfavorable influence on the cleaning object can be reduced as compared with the brush cleaning.
Furthermore, according to the present invention, it is possible to reduce an unfavorable influence on the object to be cleaned while obtaining a high cleaning effect that the ozone water does not have in the hydrogen water.

9th invention is a washing | cleaning method, Comprising: The ozone water which melt | dissolved ozone gas in the pure water, and the hydrogen water which melt | dissolved hydrogen gas in the pure water are simultaneously injected toward the same washing | cleaning target object.
According to the present invention, the object to be cleaned is cleaned with the momentum of the injected ozone water and hydrogen water, so that it can be cleaned without using a brush. Thereby, the unfavorable influence on the cleaning object can be reduced as compared with the brush cleaning.
Furthermore, according to the present invention, the surface of the object to be cleaned can be neutralized, and undesirable effects on the object to be cleaned can be reduced.

  According to the present invention, it is possible to reduce an undesirable influence on an object to be cleaned.

The schematic diagram of the washing | cleaning apparatus which concerns on Embodiment 1 of this invention. The schematic diagram which shows the structure of a functional water production | generation apparatus. The graph which shows the generated charge amount with respect to the injection pressure of ammonia hydrogen water. The schematic diagram which shows the structure of a high pressure micro jet pump unit. The schematic diagram which simplifies and shows the structure of one fluid nozzle. The wave form diagram which shows the waveform of the electric current supplied to an air operated valve. The wave form diagram which concerns on Embodiment 2 of this invention. The wave form diagram which concerns on the other example of Embodiment 2 of this invention.

<Embodiment 1>
A first embodiment of the present invention will be described with reference to FIGS.
(1) Configuration of Cleaning Device FIG. 1 is a schematic diagram of a cleaning device 1 according to Embodiment 1 of the present invention. The cleaning device 1 is a device that cleans an object to be cleaned 15 such as a liquid crystal panel, a semiconductor substrate, an electric circuit, etc. by jetting ammonia hydrogen water (an example of hydrogen water) and ozone water at a high pressure. In the following description, ammonia hydrogen water and ozone water are collectively referred to as functional water.

  The cleaning device 1 includes a functional water generation device 10, a high-pressure micro jet pump unit 11 (11a, 11b), an injection timing control device 12, and a single fluid nozzle 13 (13a, 13b).

The functional water generator 10 is a device that generates ammonia hydrogen water and ozone water.
FIG. 2 is a schematic diagram illustrating the configuration of the functional water generating device 10. However, in FIG. 2, only the part which concerns on the production | generation of ammonia hydrogen water in the functional water production | generation apparatus 10 is shown. The functional water generator 10 includes a deaeration unit 10a, a mixer 10b, a mixer 10c, and the like. Ammonia hydrogen water is generated by dissolving hydrogen gas in the pure water deaerated in the deaeration unit 10a by the mixer 10b, and further mixing the ammonia liquid for tilting the water quality by the mixer 10c.

  Ammonia hydrogen water has an effect of removing minute dust (so-called particles). For example, when about 1 ppm of ammonia is added to about 1.5 ppm of saturated hydrogen water, it is said that fine particle removal performance higher than SC-1 (hydrogen peroxide solution) can be obtained.

Ammonia hydrogen water has a reducing action and is effective in preventing corrosion of the substrate surface and substrate surface material of the semiconductor substrate (an example of an object to be cleaned).
Ammonia hydrogen water also has an effect of preventing particles detached from the cleaning object 15 from reattaching to the cleaning object 15.

Further, the inventors have experimentally confirmed that ammonia hydrogen water has an antistatic function.
FIG. 3 is a graph showing the generated charge amount with respect to the injection pressure when the pH of the ammonia hydrogen water is varied in order to confirm the antistatic function of the ammonia hydrogen water. The generated charge amount is a result of measurement using a Faraday cage, and is a method of calculating the generated charge amount (static electricity) from the charge accumulated in the Faraday cage per unit time. As the amount of charge per unit time increases, static electricity is more likely to occur, and the device is more likely to be damaged. The amount of generated charges was about 1/10 or less compared to the injection of pure water. Compared with carbon dioxide injection conditions, the charge amount was almost the same. In other words, if the ammonia hydrogen water is used for injection, the generation of static electricity can be suppressed to the same extent as when carbon dioxide gas is injected.

  When the injection pressure was varied from 5 MPa to 12 MPa in the pH value range of 6.7 to 8.3, the charge amount was changed from 0.6 μC / s to 1 μC / s. However, the charge amount decreased from 0.4 μC / s to 0.29 μC / s when the injection pressure was raised only at pH 9.5.

  The mechanism by which the charge amount decreased due to the injection of ammonia hydrogen water is not yet clear, but it is because hydrogen ions are generated in pure water by injecting hydrogen into pure water, and pure water has conductivity. Guessed. When hydrogen is dissolved in pure water, hydrogen is ionized, and when ammonia is dissolved therein, ammonia hydrogen water is obtained.

First, the aqueous ammonia solution is represented by Formula 1.
_{NH 3 + H 2 O ⇔ NH} 4 + + OH - ··· Formula 1
Further, when hydrogen is injected into ammonia, Equation 2 is obtained.
NH ₄ ⁺ + OH ⁻ + H ₂ ＮＨ NH ₄ ⁺ + H ₂ O + H ⁺ ... Formula 2
That is, the generated charge is determined by the amount of ions dissolved in the pure water according to the ratio of ammonia ions to hydrogen ions in the pure water.

  Returning to FIG. 1, ozone water is generated by dissolving ozone gas in pure water. In the functional water generator 10, the configuration related to the generation of ozone water is substantially the same as the configuration related to the generation of ammonia hydrogen water except that ozone gas is dissolved instead of hydrogen gas or ammonia liquid. Therefore, the illustration is omitted. As the concentration of ozone water, about 20 ppm is widespread, but high concentration ozone water of 100 ppm or more may be used.

Ozone water has the effect of removing particles as well as ammonia hydrogen water, and has the effect of removing organic substances and metal ions (so-called metal contamination) adhering to the surface of the object to be cleaned 15.
Specifically, ozone gas releases oxygen of one atom (active oxygen) having extremely high reactivity when it gradually decomposes into oxygen. The released active oxygen oxidizes organic matter and metal, so that organic matter and metal contamination that cannot be removed with aqueous ammonia hydrogen can be removed.

Moreover, since ozone water returns to water when the dissolved ozone gas decomposes gradually, the burden on the environment can be reduced.
However, if ozone water stays on the cleaning object 15 for a long time, there is a possibility that the cleaning object 15 may be adversely affected, such as excessively oxidizing the cleaning object 15.

  By the way, since ozone gas cannot exist stably for a long time, when generating ozone water, it is desirable to generate in the immediate vicinity of the functional water generator 10. As a method for generating ozone gas, for example, an electrolysis method for generating ozone gas by electrolyzing pure water and a discharge method for changing part of oxygen gas to ozone gas by discharging in oxygen gas are known. Yes.

  In the electrolysis type, hydrogen is generated from the counter electrode as a by-product. Therefore, when hydrogen gas for generating ammonia hydrogen water and ozone gas for generating ozone water are required as in this embodiment, electrolysis is performed. It is convenient to use a formula. In addition, you may provide the structure for electrolyzing a pure water in the functional water production | generation apparatus 10. FIG.

The high pressure micro jet pump unit 11 (11 a, 11 b) is a device that pressurizes the functional water supplied from the functional water generating device 10.
FIG. 4 is a schematic diagram showing the configuration of the high-pressure micro jet pump unit 11a (second injection means, an example of injection means for injecting hydrogen water in which hydrogen gas is dissolved in pure water). The high pressure micro jet pump unit 11a removes the pressure pulsation of the ammonia hydrogen water pressurized by the high pressure pump 20 and the high pressure pump 20 that pressurizes the ammonia hydrogen water supplied from the functional water generator 10 to a high pressure such as 3 to 15 MPa. The accumulator 21, the high-pressure filter 22 that removes fine particles in the ammonia hydrogen water supplied from the accumulator 21, and the like. The configuration of the high-pressure microjet pump unit 11b (first injection means, an example of injection means for injecting ozone water in which ozone gas is dissolved in pure water) is also the same.

  Returning to FIG. 1, the injection timing control device 12 includes an air operated valve 12a (second injection means, an example of injection means for injecting hydrogen water in which hydrogen gas is dissolved in pure water), and an air operated valve 12b (first operation means). 1 injection means, an example of injection means for injecting ozone water in which ozone gas is dissolved in pure water), and a control circuit 12c for controlling current supply to the air operated valves 12a and 12b.

  The air operated valves 12a and 12b are provided in the flow path 14 (14a and 14b) that supplies the functional water pressurized by the high-pressure micro jet pump unit 11 to the one-fluid nozzle 13 (13a and 13b).

The control circuit 12c (an example of a control means) is a circuit that controls the current supply to the air operated valve 12a and the air operated valve 12b to control the injection mode of ozone water and ammonia hydrogen water.
When no current is supplied from the control circuit 12c to the air operated valve 12a, the air operated valve 12a is closed and the flow path 14a is shut off. On the other hand, when current is supplied from the control circuit 12c to the air operated valve 12a, the air operated valve 12a is opened, the flow path 14a is opened, and ammonia hydrogen water is supplied to the one fluid nozzle 13a. The same applies to the air operated valve 12b. An electromagnetic valve may be used instead of the air operated valve.

  The one-fluid nozzle 13 (13a, 13b) is an injection nozzle that atomizes the functional water supplied from the high-pressure microjet pump unit 11 (11a, 11b) and injects it into a mist. One fluid nozzle 13a (second injection means, an example of injection means for injecting hydrogen water in which hydrogen gas is dissolved in pure water), and one fluid nozzle 13b (first injection means, in which ozone gas is dissolved in pure water) In the example of the injection means for injecting ozone water, the injection direction is set so as to inject the functional water toward the same portion of the cleaning object 15.

  FIG. 5 is a schematic diagram showing a simplified configuration of the one-fluid nozzle 13a. Since the one-fluid nozzle 13a and the one-fluid nozzle 13b have the same structure, the one-fluid nozzle 13a will be described as an example here. The single fluid nozzle 13a includes a nozzle body 16 formed in a substantially cylindrical shape. In the inner peripheral wall 17 of the nozzle body 16, an orifice 18 for restricting the flow path is provided on the outlet side of the ammonia hydrogen water. The shape of the orifice 18 is adjusted so that the high-pressure ammonia hydrogen water introduced into the inner peripheral portion of the nozzle body 16 is jetted as flying droplets having an optimum speed and droplet diameter to the cleaning object 15.

  Note that the one-fluid nozzle 13a and the one-fluid nozzle 13b do not necessarily eject functional water toward the same portion of the object to be cleaned, for example, inject functional water toward different portions of the same object to be cleaned. May be. In this case, for example, the ozone water and the ammonia hydrogen water may be sprayed uniformly on the surface of the cleaning object by placing the cleaning object on the turntable and rotating it.

  Moreover, although the case where the one fluid nozzle 13 is used for every functional water is shown in this embodiment, the number of the 1 fluid nozzle 13 can be selected suitably, and two or three one about one kind of functional water. A fluid nozzle 13 may be used.

(2) Operation of Cleaning Device FIG. 6 is a waveform diagram showing waveforms of currents supplied from the control circuit 12c to the air operated valves 12a and 12b. The illustrated example shows a case where current is alternately supplied to the air operated valve 12a and the air operated valve 12b.
In the illustrated example, the ratio (duty ratio) of the energization time per one time to the air operated valve 12a and the energization time per one time to the air operated valve 12b is 5: 1. The duty ratio may be other than 5 to 1, and can be appropriately selected according to the property of the cleaning object 15 and the concentration of functional water.

  Specifically, the energization time per time to the air operated valve 12a is, for example, 10 milliseconds [ms] to 1 second [s]. It should be noted that the energization time per time for the air operated valve 12a and the air operated valve 12b can also be appropriately selected according to the property of the cleaning object 15 and the concentration of functional water.

  For example, assuming that the duty ratio is 5 to 1 and the energization time per one time to the air operated valve 12a is 500 ms, the control circuit 12c energizes the air operated valve 12a for 500 ms (ON in the figure). Energization of the operating valve 12b is stopped (OFF in the figure). Then, the control circuit 12c energizes the air operated valve 12b for 100 ms and stops energizing the air operated valve 12a during that time. Thereby, ammonia hydrogen water and ozone water are alternately injected toward the cleaning object 15 at a time ratio of 5: 1.

  When ozone water is injected, particles, organic matter, and metal contamination adhering to the surface of the cleaning target 15 are removed by the ozone water. On the other hand, when the ammonia hydrogen water is injected, particles adhering to the surface of the cleaning object 15 are removed by the ammonia hydrogen water, and the ozone water and the ammonia hydrogen water react to be neutralized.

  In addition, as described above, ammonia hydrogen water has the effect of preventing the reattachment of particles, so the particles removed by the ozone water and the particles removed by the ammonia hydrogen water itself are reattached by the ammonia hydrogen water. Is prevented.

(3) Effects of the Embodiment According to the cleaning device 1 according to the first embodiment of the present invention described above, the cleaning object 15 is cleaned by the momentum of the injected ozone water and ammonia hydrogen water, so that a brush is not used. Can be washed. Thereby, the unfavorable influence on the cleaning object 15 can be reduced as compared with the brush cleaning.

  Furthermore, according to the cleaning apparatus 1, it is possible to react and neutralize ozone water and ammonia hydrogen water on the cleaning object 15 by controlling the injection mode of ozone water and ammonia hydrogen water. become. As a result, the surface of the cleaning object 15 can be neutralized, and undesirable effects on the cleaning object 15 such as excessive oxidation of the cleaning object 15 can be reduced.

  Furthermore, according to the cleaning apparatus 1, since ozone water and ammonia hydrogen water are alternately jetted, the ozone water and ammonia hydrogen water react and neutralize within a short time, and the object 15 to be cleaned with ozone water is neutralized. Excessive oxidation can be reduced. Thereby, the unfavorable influence on the cleaning object 15 can be reduced while obtaining a high cleaning effect on specific deposits that are not in the ammonia hydrogen water contained in the ozone water.

  Further, when ozone water and ammonia hydrogen water are alternately sprayed, the adhered matter adhering to the cleaning target object 15 is vibrated and easily separated from the cleaning target object 15. In addition, since the direction in which the functional water is jetted is alternately changed, the deposits are more easily peeled off. Thereby, a cleaning effect can be improved more.

  Furthermore, according to the cleaning apparatus 1, there is an effect that the process of waste water treatment can be simplified. For example, when only ammonia hydrogen water is used, the wastewater treatment is performed by neutralizing with an acidic liquid. In the cleaning apparatus 1, ozone water and ammonia hydrogen water react and neutralize on the object to be cleaned. Therefore, the wastewater treatment process can be simplified.

<Embodiment 2>
Next, a second embodiment of the present invention will be described with reference to FIGS.
In the second embodiment, ozone water and ammonia hydrogen water are injected simultaneously.

  FIG. 7 is a waveform diagram showing a current waveform according to the second embodiment. As illustrated, in the second embodiment, current is simultaneously supplied to the air operated valve 12a and the air operated valve 12b. Thereby, ozone water and ammonia hydrogen water are simultaneously jetted onto the cleaning object 15.

  FIG. 8 is a waveform diagram showing another example according to the second embodiment. In the example shown in FIG. 8, current is supplied simultaneously to the air operated valve 12a and the air operated valve 12b. However, unlike the example shown in FIG. 7, current is supplied intermittently. When the current is intermittently supplied, the functional water is intermittently ejected, so that the deposits are easily peeled off from the cleaning target 15, and the cleaning effect can be further improved.

According to the cleaning apparatus according to the second embodiment of the present invention described above, ozone water and ammonia hydrogen water are simultaneously jetted, so that ozone water and ammonia hydrogen water react and are neutralized on the object to be cleaned 15. . Thereby, the surface of the cleaning object 15 can be made neutral, and an undesirable influence on the cleaning object 15 can be reduced.
Further, since ozone water and ammonia hydrogen water have an antistatic function, damage to the object to be cleaned due to charged static electricity can be reduced.

<Other embodiments>
The present invention is not limited to the embodiments described with reference to the above description and drawings. For example, the following embodiments are also included in the technical scope of the present invention.

(1) In the above embodiment, ozone water in which ozone gas is dissolved in pure water has been described as an example of functional water. However, the functional water may be other than ozone water, for example, carbon dioxide water.
For example, carbon dioxide water can be generated by dissolving carbon dioxide in pure water. Carbon dioxide water has an effect of removing particles. Carbon dioxide water also has an antistatic function, and has an effect of preventing damage to the cleaning target 15 due to static electricity. The carbon dioxide water also has an effect of preventing particles peeled from the cleaning object 15 from reattaching to the cleaning object 15.
The same applies to alkaline functional water, and other than ammonia hydrogen water may be used.

  (2) In the above embodiment, hydrogen water in which hydrogen gas is dissolved in pure water has been described as an example of functional water, but the functional water may be other than hydrogen water, such as helium water, nitrogen water, oxygen water, Argon water may be used. These functional waters also have high cleaning ability and antistatic function.

(3) In the above embodiment, the cleaning apparatus that injects ozone water and ammonia hydrogen water at high pressure has been described as an example. However, only one of ozone water and ammonia hydrogen water may be injected at high pressure. As described above, in brush cleaning, there is a possibility that the brush may have an undesirable effect such as damaging the object to be cleaned. However, if the cleaning is performed by jetting functional water, such an undesirable effect can be reduced.
Further, since ozone water and ammonia hydrogen water have an antistatic function, damage to the object to be cleaned due to charged static electricity can be reduced.
For example, in the cleaning apparatus 1 according to the first embodiment, only one of ozone water and ammonia hydrogen water may be injected and the other may not be injected depending on the object to be cleaned.

(4) In the above embodiment, the high-pressure microjet cleaning method has been described as an example. However, the cleaning method is not limited to this, and an internal mixing type two-fluid spray cleaning method, a rotary spray type two-fluid spray cleaning method, an ultrasonic wave Other cleaning methods such as a spray cleaning method may be used.
The internal mixing type two-fluid spray cleaning method is a method using a two-fluid nozzle to which two fluids, functional water and compressed air, are supplied, and a method in which compressed air and functional water are mixed and injected inside the nozzle It is.
The rotary spray type two-fluid spray cleaning method is a method that includes a turntable for rotating a cleaning object and jets functional water to the cleaning object that rotates at high speed using a two-fluid nozzle. In addition, the structure which inject | pours functional water using the 1 fluid nozzle 13 to the rotating cleaning target object may be sufficient.
The ultrasonic spray cleaning method is a method of atomizing by irradiating the functional water jetted from the jet nozzle with ultrasonic waves.

DESCRIPTION OF SYMBOLS 1 ... Cleaning apparatus 10 ... Functional water production | generation apparatus 11a ... High pressure micro jet pump unit (1st injection means)
11b... High pressure micro jet pump unit (second injection means)
12a ... Air operated valve (first injection means)
12b ... Air operated valve (second injection means)
12c ... Control circuit (control means)
13a... One fluid nozzle (first injection means)
13b ... One fluid nozzle (second injection means)
15 ... Object to be cleaned

Claims (9)

First injection means for injecting ozone water, in which ozone gas is dissolved in pure water, toward the object to be cleaned;
Second injection means for injecting hydrogen water, in which hydrogen gas is dissolved in pure water, toward the object to be cleaned;
Control means for controlling the first jetting means and the second jetting means to control the jetting mode of the ozone water and the hydrogen water;
A cleaning apparatus comprising: The cleaning apparatus according to claim 1,
The said control means is a washing | cleaning apparatus which controls the said 1st injection means and the said 2nd injection means, and injects the said ozone water and the said hydrogen water alternately. The cleaning device according to claim 1,
The said control means is a washing | cleaning apparatus which controls the said 1st injection means and the said 2nd injection means, and injects the said ozone water and the said hydrogen water simultaneously.   A cleaning apparatus including an injection unit that injects ozone water in which ozone gas is dissolved in pure water toward an object to be cleaned.   A cleaning apparatus including an injection unit that injects hydrogen water obtained by dissolving hydrogen gas in pure water toward an object to be cleaned.   A cleaning apparatus including an injection unit that prevents damage to the cleaning object due to static electricity by spraying ozone water in which ozone gas is dissolved in pure water toward the cleaning object.   A cleaning apparatus comprising an injection unit that prevents damage to the cleaning object due to static electricity by injecting hydrogen water in which hydrogen gas is dissolved in pure water toward the cleaning object.   A cleaning method in which ozone water in which ozone gas is dissolved in pure water and hydrogen water in which hydrogen gas is dissolved in pure water are alternately jetted toward the same object to be cleaned. A cleaning method in which ozone water in which ozone gas is dissolved in pure water and hydrogen water in which hydrogen gas is dissolved in pure water are simultaneously jetted toward the same object to be cleaned.

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