JP2011017011A - Method of temporal pressure bonding of anisotropic conductive adhesive film - Google Patents

Method of temporal pressure bonding of anisotropic conductive adhesive film Download PDF

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Publication number
JP2011017011A
JP2011017011A JP2010189292A JP2010189292A JP2011017011A JP 2011017011 A JP2011017011 A JP 2011017011A JP 2010189292 A JP2010189292 A JP 2010189292A JP 2010189292 A JP2010189292 A JP 2010189292A JP 2011017011 A JP2011017011 A JP 2011017011A
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conductive adhesive
adhesive film
anisotropic conductive
temporarily
circuit member
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Gyorei To
暁黎 杜
Kazuya Sato
和也 佐藤
Gentaro Seki
源太郎 関
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Showa Denko Materials Co Ltd
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Hitachi Chemical Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a method of temporal pressure bonding of an anisotropic conductive adhesive film to a circuit member, which method suppresses foaming.SOLUTION: In the method of temporal pressure bonding of an anisotropic conductive adhesive film, an anisotropic conductive adhesive film 1 is temporally pressure bonded to a circuit member 2 while being applied with ultrasonic waves or microwaves.

Description

本発明は、異方導電性接着フィルムの回路部材への仮圧着方法に関する。   The present invention relates to a method for temporarily pressing an anisotropic conductive adhesive film to a circuit member.

異方導電性接着フィルムを用いて半導体素子を基板に接続する技術は、熱及び圧力を加えるのみで狭ピッチ電極の接続が容易に得られるため、近年広く用いられるようになった。特に液晶表示装置における液晶パネルへの駆動LSIの接続は、透明電極と金属という異種材料間の接続のため、LSIがボンディングされたテープキャリアを異方導電性接着フィルムを用いて熱圧着接続する方法が一般的である。また、液晶表示用ガラスパネルへの液晶駆動用ICの実装方法として、液晶駆動用ICを直接ガラスパネル上に熱硬化型接着剤で接合するCOG(Chip On Glass)実装方法が用いられている。
次に、従来の液晶パネルと駆動LSIの接続方法を説明する。駆動LSIは、ポリイミド等のフィルムテープ上に形成した銅箔のリードに半導体チップをボンディングしたいわゆるテープキャリアパッケージ(以後TCPと略す)の形状をしたものを用いる。図3(a)に示すように、液晶パネル20の端子21上に異方導電性接着フィルム22を仮圧着する。その後、図3(b)に示すように、TCP23の端子と液晶パネル端子との位置整合を行い、異方導電性接着フィルム22の粘着性を利用して仮固定する。
次に、液晶パネル20をステージ上に配置し、高温の加圧装置にてTCP23の端子上を加圧し異方導電性接着フィルム22に圧力及び熱を与えることにより、異方導電性接着フィルム22中の導電粒子が液晶パネル20とTCP23の両電極間に挟持された状態で接着剤が硬化し機械的かつ電気的な接続を得る(図示せず)。
A technique for connecting a semiconductor element to a substrate using an anisotropic conductive adhesive film has been widely used in recent years because a connection of a narrow pitch electrode can be easily obtained only by applying heat and pressure. In particular, the connection of the driving LSI to the liquid crystal panel in the liquid crystal display device is a method of thermocompression-bonding the tape carrier to which the LSI is bonded using an anisotropic conductive adhesive film to connect between different materials such as transparent electrodes and metal Is common. In addition, as a method for mounting a liquid crystal driving IC on a liquid crystal display glass panel, a COG (Chip On Glass) mounting method in which the liquid crystal driving IC is directly bonded to the glass panel with a thermosetting adhesive is used.
Next, a conventional method for connecting a liquid crystal panel and a driving LSI will be described. The drive LSI uses a so-called tape carrier package (hereinafter abbreviated as TCP) in which a semiconductor chip is bonded to a copper foil lead formed on a film tape such as polyimide. As shown in FIG. 3A, an anisotropic conductive adhesive film 22 is temporarily pressure-bonded onto the terminal 21 of the liquid crystal panel 20. After that, as shown in FIG. 3B, the TCP 23 terminal and the liquid crystal panel terminal are aligned and temporarily fixed using the adhesive property of the anisotropic conductive adhesive film 22.
Next, the liquid crystal panel 20 is placed on the stage, and the terminal of the TCP 23 is pressed with a high-temperature pressurizing device to apply pressure and heat to the anisotropic conductive adhesive film 22, thereby providing the anisotropic conductive adhesive film 22. The adhesive is cured in a state where the conductive particles inside are sandwiched between both electrodes of the liquid crystal panel 20 and the TCP 23 to obtain mechanical and electrical connection (not shown).

しかしながら、図3(a)に示す仮圧着の際に、図4に示すように、異方導電性接着フィルムと液晶パネルの間に大きな気泡が存在することが避けられなかった。このような気泡が存在すると、温度変化によりその隙間に結露が生じ、マイグレーション(電食)が発生するという問題があった。
本発明の目的は、気泡の発生を抑制する異方導電性接着フィルムの仮圧着方法を提供することである。
However, at the time of the temporary pressure bonding shown in FIG. 3A, it is inevitable that large bubbles exist between the anisotropic conductive adhesive film and the liquid crystal panel as shown in FIG. When such bubbles exist, there is a problem that condensation occurs in the gap due to a temperature change and migration (electric corrosion) occurs.
An object of the present invention is to provide a method for temporarily pressing an anisotropic conductive adhesive film that suppresses the generation of bubbles.

本発明によれば、以下の異方導電性接着フィルムの仮圧着方法が提供される。
1.ラミネーターを用いて異方導電性接着フィルムを回路部材に仮圧着することを特徴とする異方導電性接着フィルムの仮圧着方法。
2.超音波又はマイクロウェーブをかけながら、異方導電性接着フィルムを回路部材に仮圧着することを特徴とする異方導電性接着フィルムの仮圧着方法。
3.回路部材の仮圧着部位を真空にしながら、異方導電性接着フィルムを回路部材に仮圧着することを特徴とする異方導電性接着フィルムの仮圧着方法。
4.異方導電性接着フィルムと回路部材の間にできる気泡の総面積が、異方導電性接着フィルムと回路部材との接触面積の5%以下であることを特徴とする1〜3のいずれか記載の異方導電性接着フィルムの仮圧着方法。
According to the present invention, the following method for temporarily pressing an anisotropic conductive adhesive film is provided.
1. A method for temporary pressure bonding of an anisotropic conductive adhesive film, characterized in that the anisotropic conductive adhesive film is temporarily bonded to a circuit member using a laminator.
2. A method for temporarily pressing an anisotropic conductive adhesive film, wherein the anisotropic conductive adhesive film is temporarily bonded to a circuit member while applying ultrasonic waves or microwaves.
3. A method for temporarily crimping an anisotropic conductive adhesive film, wherein the anisotropic conductive adhesive film is temporarily crimped to a circuit member while a temporary crimping portion of the circuit member is evacuated.
4). 4. The total area of bubbles formed between the anisotropic conductive adhesive film and the circuit member is 5% or less of the contact area between the anisotropic conductive adhesive film and the circuit member, Temporary pressure bonding method of anisotropic conductive adhesive film.

本発明によれば、気泡の発生を抑制する異方導電性接着フィルムの仮圧着方法が提供できる。   ADVANTAGE OF THE INVENTION According to this invention, the temporary crimping | compression-bonding method of the anisotropically conductive adhesive film which suppresses bubble generation can be provided.

本発明にかかる一実施形態である異方導電性接着フィルムの仮圧着方法を示す図である。It is a figure which shows the temporary crimping | compression-bonding method of the anisotropically conductive adhesive film which is one Embodiment concerning this invention. 本発明にかかる他の実施形態である異方導電性接着フィルムの仮圧着方法を示す図であり、(a)は各部材の位置合わせを示す断面図であり、(b)は超音波をかけながらの加圧を示す断面図である。It is a figure which shows the temporary crimping | compression-bonding method of the anisotropically conductive adhesive film which is other embodiment concerning this invention, (a) is sectional drawing which shows position alignment of each member, (b) applies an ultrasonic wave. It is sectional drawing which shows pressurizing. (a)は液晶パネルへの異方導電性接着フィルムの仮圧着を示す斜視図であり、(b)は異方導電性接着フィルムを介した液晶パネルと半導体素子の仮固定を示す斜視図である。(A) is a perspective view which shows the temporary crimping | compression-bonding of the anisotropic conductive adhesive film to a liquid crystal panel, (b) is a perspective view which shows temporary fixation of the liquid crystal panel and a semiconductor element through an anisotropic conductive adhesive film. is there. 従来の液晶パネルへの異方導電性接着フィルムの仮圧着を示す断面図である。It is sectional drawing which shows the temporary crimping | compression-bonding of the anisotropically conductive adhesive film to the conventional liquid crystal panel.

実施形態1
図1は本発明にかかる一実施形態である異方導電性接着フィルムの仮圧着方法を示す図である。
この実施形態では、異方導電性接着フィルム1は、ラミネーター10を用いてガラス基板2に仮圧着される。ラミネーター10は通常のものが使用できる。
まず、異方導電性接着フィルム1が巻き取りロール3から引き出され搬送される。連続した異方導電性接着フィルム1は、ラミネーター10の圧着ローラ11に送り出される。一方、圧着ローラ11には、ガラス基板2が矢印方向に搬送される。センサ(図示せず)等により異方導電性接着フィルム1とガラス基板2の位置決めがされた状態で、異方導電性接着フィルム1とガラス基板2が上下の圧着ローラ11の間に導入される。圧着ローラ11により異方導電性接着フィルム1がガラス基板2に仮圧着されて、送り出される。異方導電性接着フィルム1は、ラミネーター10のカッター12により必要な部位で切断さ
れる。
また、剥離紙(図示せず)を剥がしながら、異方導電性接着フィルム1を圧着ローラ11に搬送する場合は、適当な搬送経路の途中において、剥離紙を持ち上げつつ剥離する粘着テープ等を設けてもよい。
本実施形態では、圧着ローラ11により、異方導電性接着フィルム1が端から徐々にガラス基板2に仮圧着されるため、気泡が発生し難く、また、発生しても外へ押出される。従って、接着部位において大きな気泡の発生を防ぐことができる。
Embodiment 1
FIG. 1 is a diagram showing a method for temporarily pressing an anisotropic conductive adhesive film according to an embodiment of the present invention.
In this embodiment, the anisotropic conductive adhesive film 1 is temporarily pressure-bonded to the glass substrate 2 using a laminator 10. A normal laminator 10 can be used.
First, the anisotropic conductive adhesive film 1 is drawn out from the take-up roll 3 and conveyed. The continuous anisotropic conductive adhesive film 1 is sent out to the pressure roller 11 of the laminator 10. On the other hand, the glass substrate 2 is conveyed to the pressure roller 11 in the arrow direction. The anisotropic conductive adhesive film 1 and the glass substrate 2 are introduced between the upper and lower pressure rollers 11 in a state where the anisotropic conductive adhesive film 1 and the glass substrate 2 are positioned by a sensor (not shown) or the like. . The anisotropic conductive adhesive film 1 is temporarily pressure-bonded to the glass substrate 2 by the pressure roller 11 and sent out. The anisotropic conductive adhesive film 1 is cut at a necessary site by a cutter 12 of a laminator 10.
Also, when the anisotropic conductive adhesive film 1 is transported to the pressure roller 11 while peeling the release paper (not shown), an adhesive tape or the like is provided in the middle of an appropriate transport path to lift the release paper. May be.
In the present embodiment, since the anisotropic conductive adhesive film 1 is temporarily pressure-bonded to the glass substrate 2 from the end by the pressure roller 11, bubbles are hardly generated, and even if they are generated, they are pushed out. Accordingly, generation of large bubbles at the adhesion site can be prevented.

実施形態2
図2は本発明にかかる他の実施形態である異方導電性接着フィルムの仮圧着方法を示す図である。
この実施形態では、超音波をかけながら、異方導電性接着フィルムを回路部材に仮圧着する。
超音波をかけながら仮圧着をするためには、まず図2(a)に示すように回路部材2をワークプレート4に載置し、その上に異方導電性接着フィルム1を配置する。超音波振動と加熱加圧を一緒に行える装置30を用いるのが好ましく、市販のもので、SH50MP(アルテクス株式会社製)がある。図2(b)に示すように、この装置30を用いて、異方導電性接着フィルム1の上から圧力をかけ、圧力方向と直行する方向に超音波をかける。超音波をかけながら接着すると大きな気泡が生じにくい。
接続時の条件は、加熱加圧時間は1〜5秒が好ましく、より好ましくは2〜3秒である。加熱加圧時間が1秒未満であると気泡の発生を十分に抑制できない場合があり、5秒を超えると生産性に劣る場合がある。
加熱温度は40〜80℃であることが好ましい。加熱温度が40℃未満であると、良好な仮圧着が困難な場合があり、80℃を超えると接着フィルムが硬化してしまい、その後の本圧着時に良好な回路接続を得ることが困難な場合がある。
圧力は0.3〜2.0MPaが好ましく、より好ましくは、0.5〜1.5MPaである。圧力が0.3MPa未満であると、気泡の発生を十分に抑制できない場合があり、圧力が2.0MPaを超えると、回路部材の電極等が破壊される場合がある。
超音波の周波数は10〜50kHzが好ましい。超音波の印加時間は1〜5秒が好ましく、より好ましくは2〜3秒である。超音波の印加時間が1秒未満であると気泡の発生を十分に抑制できない場合があり、5秒を超えると生産性に劣る場合がある。
超音波と加熱加圧のタイミングは、加圧時間内に超音波の印加を開始し、加圧時間内に印加が終了すればよい。
尚、本実施形態では、超音波をかけながら仮圧着したが、マイクロウェーブをかけて気泡の発生を防ぐこともできる。
Embodiment 2
FIG. 2 is a view showing a method for temporarily pressing an anisotropic conductive adhesive film according to another embodiment of the present invention.
In this embodiment, the anisotropic conductive adhesive film is temporarily bonded to the circuit member while applying ultrasonic waves.
In order to perform temporary pressure bonding while applying ultrasonic waves, first, the circuit member 2 is placed on the work plate 4 as shown in FIG. 2A, and the anisotropic conductive adhesive film 1 is placed thereon. It is preferable to use an apparatus 30 that can perform ultrasonic vibration and heating and pressurization together, which is a commercially available product, such as SH50MP (manufactured by Artex Co., Ltd.). As shown in FIG. 2B, using this apparatus 30, pressure is applied from above the anisotropic conductive adhesive film 1, and ultrasonic waves are applied in a direction perpendicular to the pressure direction. Large bubbles are unlikely to form when bonded while applying ultrasonic waves.
As for the conditions at the time of connection, the heating and pressing time is preferably 1 to 5 seconds, more preferably 2 to 3 seconds. If the heating and pressing time is less than 1 second, the generation of bubbles may not be sufficiently suppressed, and if it exceeds 5 seconds, the productivity may be inferior.
The heating temperature is preferably 40 to 80 ° C. When the heating temperature is less than 40 ° C, good temporary pressure bonding may be difficult, and when it exceeds 80 ° C, the adhesive film is cured, and it is difficult to obtain good circuit connection at the time of subsequent main pressure bonding There is.
The pressure is preferably 0.3 to 2.0 MPa, more preferably 0.5 to 1.5 MPa. When the pressure is less than 0.3 MPa, the generation of bubbles may not be sufficiently suppressed, and when the pressure exceeds 2.0 MPa, the electrode of the circuit member may be destroyed.
The frequency of the ultrasonic wave is preferably 10 to 50 kHz. The application time of ultrasonic waves is preferably 1 to 5 seconds, and more preferably 2 to 3 seconds. If the application time of the ultrasonic wave is less than 1 second, the generation of bubbles may not be sufficiently suppressed, and if it exceeds 5 seconds, the productivity may be inferior.
As for the timing of the ultrasonic wave and heating and pressurization, the application of the ultrasonic wave may be started within the pressurization time and the application may be completed within the pressurization time.
In this embodiment, provisional pressure bonding is performed while applying ultrasonic waves, but generation of bubbles can also be prevented by applying microwaves.

実施形態3
この実施形態では、回路部材の仮圧着部位を真空にしながら、異方導電性接着フィルムを回路部材に仮圧着する。
本実施形態では仮圧着部位を真空にするので、気泡が発生を防ぐことができる。
Embodiment 3
In this embodiment, the anisotropic conductive adhesive film is temporarily bonded to the circuit member while the temporary bonding portion of the circuit member is evacuated.
In the present embodiment, since the temporary press-bonding portion is evacuated, it is possible to prevent the generation of bubbles.

以下、本発明を実施例により具体的に説明する。
製造例[異方導電性接着フィルムの製造]
(1)フェノキシ樹脂(Ph−1)の合成
4,4−(9−フルオレニリデン)−ジフェノール45g、3,3’,5,5’−テトラメチルビフェノールジグリシジルエーテル50gをN−メチルピロリジオン1000mlに溶解し、これに炭酸カリウム21gを加え、110℃で攪拌した。3時間攪拌後、多量のメタノールに滴下し、生成した沈殿物をろ過してフェノキシ樹脂(Ph−1)を75g得た。Ph−1の分子量を東ソー製GPC8020(カラムは東ソー製TSKgelG3000HXLとTSKgelG4000HXL、流速1.0ml/min)で測定した結果、ポリスチレン換算でMn=12,500、Mw=30,300、Mw/Mn=2.
42であった。
Hereinafter, the present invention will be specifically described by way of examples.
Production example [Manufacture of anisotropic conductive adhesive film]
(1) Synthesis of phenoxy resin (Ph-1) 45 g of 4,4- (9-fluorenylidene) -diphenol, 50 g of 3,3 ′, 5,5′-tetramethylbiphenol diglycidyl ether were added to 1000 ml of N-methylpyrrolidione. Into this, 21 g of potassium carbonate was added and stirred at 110 ° C. After stirring for 3 hours, the solution was added dropwise to a large amount of methanol, and the generated precipitate was filtered to obtain 75 g of phenoxy resin (Ph-1). As a result of measuring the molecular weight of Ph-1 with Tosoh GPC8020 (columns are Tosoh TSKgel G3000H XL and TSKgel G4000H XL , flow rate 1.0 ml / min), Mn = 12,500, Mw = 30,300, Mw / Mn in terms of polystyrene = 2.
42.

(2)フェノキシ樹脂(Ph−2)の合成
窒素導入管、温度計、冷却管及びメカニカルスターラーを取り付けた2リットルの四つ口フラスコに、テトラブロモビスフェノールA(帝人化成株式会社製、FG−2000)333.83g、ビスフェノールA型エポキシ樹脂(東都化成株式会社製、YD−8125、分子蒸留品、エポキシ当量172g/当量)205.56g及びN,N−ジメチルアセトアミド1257gを入れ、窒素雰囲気下、均一になるまで撹拌混合した。次に、水酸化リチウム0.94gを添加し、温度を徐々に上げながら120℃で9時間反応させた。反応の追跡は、一定時間ごとに反応溶液の粘度を測定し、粘度が増加しなくなるまで反応
を行った。反応終了後、反応溶液を放冷し、これに活性アルミナ(200メッシュ)約420gを加えて一晩放置した。活性アルミナを濾過して、フェノキシ樹脂のN,N−ジメチルアセトアミド溶液を得た。次いで、窒素導入管、温度計、冷却管及びメカニカルスターラーを取り付けた1リットルの四つ口フラスコに、得られたフェノキシ樹脂のN,N−ジメチルアセトアミド溶液807.62g、末端カルボキシル基含有ブタジエン−アクリロニトリル共重合体(宇部興産株式会社製、Hycar CTBNX1009−SP)50.88gを入れ、撹拌混合しながら十分に窒素置換した。次に、窒素雰囲気下で撹拌混合し、温度を徐々に上げながら溶剤が還流する状態で8.5時間加熱した。冷却後、多量のメタノールに滴下し、生成した沈殿物をろ過してフェノキシ樹脂(Ph−2)を470g得た。
(2) Synthesis of phenoxy resin (Ph-2) Tetrabromobisphenol A (manufactured by Teijin Chemicals Ltd., FG-2000) was added to a 2-liter four-necked flask equipped with a nitrogen introduction tube, a thermometer, a cooling tube and a mechanical stirrer. ) 33.83 g, bisphenol A type epoxy resin (manufactured by Tohto Kasei Co., Ltd., YD-8125, molecularly distilled product, epoxy equivalent 172 g / equivalent) 205.56 g and N, N-dimethylacetamide 1257 g were put in a uniform nitrogen atmosphere. Stir until mixed. Next, 0.94 g of lithium hydroxide was added and reacted at 120 ° C. for 9 hours while gradually raising the temperature. The reaction was monitored by measuring the viscosity of the reaction solution at regular time intervals until the viscosity did not increase. After completion of the reaction, the reaction solution was allowed to cool, and about 420 g of activated alumina (200 mesh) was added thereto and left overnight. The activated alumina was filtered to obtain an N, N-dimethylacetamide solution of phenoxy resin. Next, in a 1 liter four-necked flask equipped with a nitrogen introduction tube, a thermometer, a cooling tube, and a mechanical stirrer, 807.62 g of the obtained phenoxy resin in N, N-dimethylacetamide solution, terminal carboxyl group-containing butadiene-acrylonitrile 50.88 g of a copolymer (manufactured by Ube Industries, Ltd., Hycar CTBNX1009-SP) was added, and thoroughly purged with nitrogen while stirring and mixing. Next, the mixture was stirred and mixed in a nitrogen atmosphere, and heated for 8.5 hours in a state where the solvent was refluxed while gradually raising the temperature. After cooling, it was added dropwise to a large amount of methanol, and the produced precipitate was filtered to obtain 470 g of phenoxy resin (Ph-2).

(3)回路接続材料組成物の作製
上記(1)(2)で合成したフェノキシ樹脂(Ph−1)(Ph−1/トルエン/酢酸エチル=40/30/30重量部)溶液100重量部と、フェノキシ樹脂(Ph−2)(Ph−2/トルエン/酢酸エチル=50/25/25重量部)溶液20重量部と、ラジカル重合性化合物として、イソシアヌル酸エチレンオキサイド変性ジアクリレート(東亞合成株式会社製、M−313)10重量部、ウレタンアクリレート(新中村化学工業株式会社製、NKオリゴU−108)40重量部、ラジカル発生剤として1,1−ビス(t−ヘキシルパーオキシ)−3,5,5−トリメチルシクロヘキサン(日本油脂株式会社製、パーヘキサTMH)5重量部、導電性粒子としてNi/Auめっきポリスチレン粒子(平均粒径4μm)10重量部、さらにシランカップリング剤(東レ・ダウコーニング・シリコーン株式会社製、SZ6030)10重量部を混合し回路接続材料組成物を作製した。
(3) Production of circuit connection material composition Phenoxy resin (Ph-1) (Ph-1 / toluene / ethyl acetate = 40/30/30 parts by weight) synthesized in the above (1) and (2) 100 parts by weight 20 parts by weight of a phenoxy resin (Ph-2) (Ph-2 / toluene / ethyl acetate = 50/25/25 parts by weight) solution and as a radical polymerizable compound, isocyanuric acid ethylene oxide-modified diacrylate (Toagosei Co., Ltd.) M-313) 10 parts by weight, urethane acrylate (Shin Nakamura Chemical Co., Ltd., NK Oligo U-108) 40 parts by weight, 1,1-bis (t-hexylperoxy) -3 as a radical generator, 5,5-trimethylcyclohexane (Nippon Yushi Co., Ltd., Perhexa TMH) 5 parts by weight, Ni / Au plated polystyrene particles (flat A circuit connecting material composition was prepared by mixing 10 parts by weight of a uniform particle size of 4 μm and 10 parts by weight of a silane coupling agent (manufactured by Toray Dow Corning Silicone Co., Ltd., SZ6030).

(4)異方導電性接着フィルムの作製
上記(3)で作製した回路接続材料組成物を支持体として厚み40μmのシリコーン処理ポリエチレンテレフタレートフィルムを用い、回路接続材料組成物をその上にロールコータで塗布し、70℃、5分間乾燥させて、膜厚30μmの回路接続材料層を支持体上に形成した異方導電性接着フィルムを作製した。
(4) Production of anisotropic conductive adhesive film Using a circuit connection material composition produced in (3) above as a support, a 40 μm thick silicone-treated polyethylene terephthalate film was used, and the circuit connection material composition was formed thereon with a roll coater. The anisotropic conductive adhesive film which apply | coated and dried for 5 minutes at 70 degreeC formed the circuit connection material layer with a film thickness of 30 micrometers on the support body was produced.

参考例1、2
ITO(IndiumTinOxide)くし型電極パタンを有するガラス基板に、製造例で作製した異方導電性接着フィルム(参考例1)及び市販の異方導電フィルムAC−8604(日立化成工業株式会社製)(参考例2)を、ラミネーター(DuPont社製)を用いて40℃、0.5m/min、加圧なしでラミネートし、その後、さらに、65℃、1MPaの加熱加圧により仮固定をし、フィルムの支持体を除去した。
さらに、フィルム上にシリコーン防湿剤をポッティング(GE東芝シリコーン製、TSE3996ホワイト)した。作製したサンプルを顕微鏡にて観察した。電極とフィルムの間に直径10μm以下の気泡しか存在しないものを○で、直径10を超え25μm未満までの気泡が存在するものを△で、25μm以上の気泡が存在するものを×として評価し、その結果を表1に示した。その後、0V〜5Vの周波数1KHzのパルス電圧をかけながら、温度60℃、湿度90%RHの恒温恒湿槽に300時間放置した。その後、ガラス基板を取り出し、顕微鏡にて観察した。電極が腐食したものを×で、腐食の見られなかった
ものを○として評価し、その結果を表1に示した。
Reference examples 1 and 2
An anisotropic conductive adhesive film produced in Production Example ( Reference Example 1 ) and a commercially available anisotropic conductive film AC-8604 (manufactured by Hitachi Chemical Co., Ltd.) ( reference ) on a glass substrate having an ITO (Indium Tin Oxide) comb electrode pattern Example 2 ) was laminated using a laminator (manufactured by DuPont) at 40 ° C., 0.5 m / min without pressure, and then temporarily fixed at 65 ° C. and 1 MPa by heating and pressurization. The support was removed.
Further, a silicone moisture-proofing agent was potted on the film (GE Toshiba Silicone, TSE3996 White). The prepared sample was observed with a microscope. The case where only bubbles having a diameter of 10 μm or less exist between the electrode and the film is evaluated as ◯, the case where bubbles exceeding 10 μm in diameter are present as Δ, and the case where bubbles of 25 μm or more are present is evaluated as ×, The results are shown in Table 1. Then, it was left to stand for 300 hours in a constant temperature and humidity chamber having a temperature of 60 ° C. and a humidity of 90% RH while applying a pulse voltage of 0 V to 5 V and a frequency of 1 kHz. Thereafter, the glass substrate was taken out and observed with a microscope. The case where the electrode was corroded was evaluated as x, and the case where no corrosion was observed was evaluated as ◯. The results are shown in Table 1.

実施例1、2
ITO(IndiumTinOxide)くし型電極パタンを有するガラス基板に、製造例で作製した異方導電性接着フィルム(実施例)及び市販の異方導電フィルムAC−8604(日立化成工業株式会社製)(実施例)を、超音波印加及び加熱加圧装置SH50MP(アルテクス株式会社製)を用いて3秒間、超音波(20KHz)をかけながら、65℃、1MPaの加熱加圧により仮圧着をし、フィルムの支持体を除去した。参考例1と同様に評価し結果を表1に示す。
Examples 1 and 2
An anisotropic conductive adhesive film (Example 1 ) produced in the production example and a commercially available anisotropic conductive film AC-8604 (manufactured by Hitachi Chemical Co., Ltd.) (implemented) on a glass substrate having an ITO (Indium Tin Oxide) comb electrode pattern Example 2 ) was temporarily pressure-bonded by heating and pressurizing at 65 ° C. and 1 MPa while applying ultrasonic waves (20 KHz) for 3 seconds using an ultrasonic wave application and heating and pressing device SH50MP (manufactured by Altex Co., Ltd.). The support was removed. Evaluation was performed in the same manner as in Reference Example 1, and the results are shown in Table 1.

比較例1、2
ITO(IndiumTinOxide)くし型電極パタンを有するガラス基板に、製造例で作製した異方導電性接着フィルム(比較例1)及び市販の異方導電フィルムAC−8604(日立化成工業株式会社製)(比較例2)を65℃、1MPaの加熱加圧により仮固定をし、フィルムの支持体を除去した。参考例1と同様に評価し結果を表1に示す。
Comparative Examples 1 and 2
An anisotropic conductive adhesive film produced in Production Example (Comparative Example 1) and a commercially available anisotropic conductive film AC-8604 (manufactured by Hitachi Chemical Co., Ltd.) (compared to a glass substrate having an ITO (Indium Tin Oxide) comb electrode pattern) Example 2) was temporarily fixed by heating and pressing at 65 ° C. and 1 MPa, and the film support was removed. Evaluation was performed in the same manner as in Reference Example 1, and the results are shown in Table 1.

[表1]
参考例1 参考例2 実施例1 実施例2 比較例1 比較例2
気泡 ○ ○ △ △ × ×
腐食 ○ ○ ○ ○ × ×
[Table 1]
Reference Example 1 Reference Example 2 Example 1 Example 2 Comparative Example 1 Comparative Example 2
Air bubbles ○ ○ △ △ × ×
Corrosion ○ ○ ○ ○ × ×

本発明の異方導電性接着フィルムの仮圧着方法によれば、接着部において気泡の発生が抑制された回路部材が得られ、マイグレーションの恐れが少ない液晶パネル等の回路部材の製造を可能にする。
また、本発明は液晶パネルだけでなく異方導電性接着シートを用いた接続工法において広く適用できる。
According to the method for temporarily bonding an anisotropic conductive adhesive film of the present invention, a circuit member in which the generation of bubbles is suppressed in the bonded portion can be obtained, and manufacturing of a circuit member such as a liquid crystal panel with a low risk of migration is enabled. .
The present invention can be widely applied not only to a liquid crystal panel but also to a connection method using an anisotropic conductive adhesive sheet.

1 異方導電性接着フィルム
2 ガラス基板(回路部材)
3 巻き取りロール
4 ワークプレート
10 ラミネーター
11 圧着ローラ
12 カッター
30 超音波振動及び加熱加圧装置
1 Anisotropic conductive adhesive film 2 Glass substrate (circuit member)
3 Winding roll 4 Work plate 10 Laminator 11 Pressure roller 12 Cutter 30 Ultrasonic vibration and heating and pressurizing device

Claims (2)

超音波又はマイクロウェーブをかけながら、異方導電性接着フィルムを回路部材に仮圧着することを特徴とする異方導電性接着フィルムの仮圧着方法。   A method for temporarily pressing an anisotropic conductive adhesive film, wherein the anisotropic conductive adhesive film is temporarily bonded to a circuit member while applying ultrasonic waves or microwaves. 異方導電性接着フィルムと回路部材の間にできる気泡の総面積が、異方導電性接着フィルムと回路部材との接触面積の5%以下であることを特徴とする請求項1記載の異方導電性接着フィルムの仮圧着方法。   2. The anisotropic structure according to claim 1, wherein the total area of bubbles formed between the anisotropic conductive adhesive film and the circuit member is 5% or less of the contact area between the anisotropic conductive adhesive film and the circuit member. A method for temporarily bonding a conductive adhesive film.
JP2010189292A 2010-08-26 2010-08-26 Method of temporal pressure bonding of anisotropic conductive adhesive film Pending JP2011017011A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018093055A (en) * 2016-12-02 2018-06-14 デクセリアルズ株式会社 Temporarily crimping method of anisotropic conductive film, temporarily crimping device of anisotropic conductive film, and anisotropic conductive connection structure
KR20210034019A (en) 2018-09-07 2021-03-29 데쿠세리아루즈 가부시키가이샤 Connection structure manufacturing method and connection film

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04322492A (en) * 1991-04-23 1992-11-12 Hitachi Ltd Tab connecting apparatus
JPH1187892A (en) * 1997-09-11 1999-03-30 Hitachi Chem Co Ltd Production of circuit board
JP2001127416A (en) * 1999-10-29 2001-05-11 Toppan Forms Co Ltd Mounting method for ic chip
JP2004006793A (en) * 2003-04-07 2004-01-08 Sony Chem Corp Anisotropic conductive adhesive

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04322492A (en) * 1991-04-23 1992-11-12 Hitachi Ltd Tab connecting apparatus
JPH1187892A (en) * 1997-09-11 1999-03-30 Hitachi Chem Co Ltd Production of circuit board
JP2001127416A (en) * 1999-10-29 2001-05-11 Toppan Forms Co Ltd Mounting method for ic chip
JP2004006793A (en) * 2003-04-07 2004-01-08 Sony Chem Corp Anisotropic conductive adhesive

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018093055A (en) * 2016-12-02 2018-06-14 デクセリアルズ株式会社 Temporarily crimping method of anisotropic conductive film, temporarily crimping device of anisotropic conductive film, and anisotropic conductive connection structure
KR20210034019A (en) 2018-09-07 2021-03-29 데쿠세리아루즈 가부시키가이샤 Connection structure manufacturing method and connection film

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