JP2010533964A5 - - Google Patents

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Publication number
JP2010533964A5
JP2010533964A5 JP2010502411A JP2010502411A JP2010533964A5 JP 2010533964 A5 JP2010533964 A5 JP 2010533964A5 JP 2010502411 A JP2010502411 A JP 2010502411A JP 2010502411 A JP2010502411 A JP 2010502411A JP 2010533964 A5 JP2010533964 A5 JP 2010533964A5
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JP
Japan
Prior art keywords
independent
well
main
dependent
relating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2010502411A
Other languages
English (en)
Japanese (ja)
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JP2010533964A (ja
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Publication date
Priority claimed from DE102007017212A external-priority patent/DE102007017212A1/de
Application filed filed Critical
Publication of JP2010533964A publication Critical patent/JP2010533964A/ja
Publication of JP2010533964A5 publication Critical patent/JP2010533964A5/ja
Withdrawn legal-status Critical Current

Links

JP2010502411A 2007-04-12 2008-04-02 ガスの冷却のための方法および装置 Withdrawn JP2010533964A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007017212A DE102007017212A1 (de) 2007-04-12 2007-04-12 Verfahren und Vorrichtung zur Kühlung eines Gases
PCT/DE2008/000557 WO2008125078A2 (de) 2007-04-12 2008-04-02 Verfahren und vorrichtung zur kühlung eines gases

Publications (2)

Publication Number Publication Date
JP2010533964A JP2010533964A (ja) 2010-10-28
JP2010533964A5 true JP2010533964A5 (de) 2011-05-26

Family

ID=39744194

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010502411A Withdrawn JP2010533964A (ja) 2007-04-12 2008-04-02 ガスの冷却のための方法および装置

Country Status (6)

Country Link
US (1) US20100140510A1 (de)
EP (1) EP2132507A2 (de)
JP (1) JP2010533964A (de)
CN (1) CN102066860A (de)
DE (2) DE102007017212A1 (de)
WO (1) WO2008125078A2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9336915B2 (en) 2011-06-17 2016-05-10 General Electric Company Target apparatus and isotope production systems and methods using the same
JP5864165B2 (ja) * 2011-08-31 2016-02-17 ギガフォトン株式会社 ターゲット供給装置
WO2015086258A1 (en) 2013-12-13 2015-06-18 Asml Netherlands B.V. Radiation source, metrology apparatus, lithographic system and device manufacturing method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB912478A (en) * 1962-12-04 1962-12-05 Petrocarbon Dev Ltd Improvements in methods and apparatus for liquefying gases
CH527398A (fr) * 1966-04-01 1972-08-31 Nautchno Izsledovatelski Sekto Procédé de liquéfaction de néon, installation pour sa mise en oeuvre et application du procédé
US4765813A (en) * 1987-01-07 1988-08-23 Air Products And Chemicals, Inc. Hydrogen liquefaction using a dense fluid expander and neon as a precoolant refrigerant
US5105305A (en) * 1991-01-10 1992-04-14 At&T Bell Laboratories Near-field scanning optical microscope using a fluorescent probe
US5249424A (en) * 1992-06-05 1993-10-05 Astronautics Corporation Of America Active magnetic regenerator method and apparatus
US5512106A (en) * 1993-01-27 1996-04-30 Sumitomo Heavy Industries, Ltd. Surface cleaning with argon
JPH0882413A (ja) * 1994-09-13 1996-03-26 Toshiba Corp 凝縮装置
US6835944B2 (en) * 2002-10-11 2004-12-28 University Of Central Florida Research Foundation Low vapor pressure, low debris solid target for EUV production
GB0406615D0 (en) * 2004-03-24 2004-04-28 Air Prod & Chem Process and apparatus for liquefying hydrogen
JP5100990B2 (ja) * 2004-10-07 2012-12-19 ギガフォトン株式会社 極端紫外光源装置用ドライバーレーザ及びlpp型極端紫外光源装置

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