JP2010520044A - 静電的に堆積するエアロゾル粒子のための装置および方法 - Google Patents
静電的に堆積するエアロゾル粒子のための装置および方法 Download PDFInfo
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- JP2010520044A JP2010520044A JP2009551688A JP2009551688A JP2010520044A JP 2010520044 A JP2010520044 A JP 2010520044A JP 2009551688 A JP2009551688 A JP 2009551688A JP 2009551688 A JP2009551688 A JP 2009551688A JP 2010520044 A JP2010520044 A JP 2010520044A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/34—Constructional details or accessories or operation thereof
- B03C3/38—Particle charging or ionising stations, e.g. using electric discharge, radioactive radiation or flames
- B03C3/383—Particle charging or ionising stations, e.g. using electric discharge, radioactive radiation or flames using radiation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
- C23C24/04—Impact or kinetic deposition of particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/251—Al, Cu, Mg or noble metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/268—Other specific metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/27—Mixtures of metals, alloys
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/115—Deposition methods from solutions or suspensions electro-enhanced deposition
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Toxicology (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Electrostatic Spraying Apparatus (AREA)
- Electrostatic Separation (AREA)
Abstract
Description
ここで、Vdriftは電界の作用下におけるエアロゾル粒子の流速、bpは粒子移動係数、Eは堆積電極間の局所的電界強度ベクトルである。
12 エアロゾル
14 中心軸
16 分岐部
18 流出経路
20 粒子堆積経路
22 湾曲部
24 帯電領域
26 静電沈着領域
30 流出経路
32、34 堆積電極
36、38 コロナ放電電極
40 直流電流
42 粒子生成部
58 オン/オフスイッチ
64 グラウンド
66 電圧期
68 マイクロ電流計
70 リレー
74 高電圧同軸ケーブル
76 帯電部
80 コロナ金属線
82、84、92、94 外表面
86 基板
88、90 ダンパ
100、200、300、400、500 装置
Claims (5)
- 自身の中心軸方向にエアロゾルの流れを運ぶ流入経路と、
該流入経路に接続され、流出経路および前記流入経路の中心軸に対して湾曲部を形成する粒子堆積経路を備えた分岐部とを備え、
前記粒子堆積経路は前記流入経路からのエアロゾルの流れを受ける帯電部を備えた帯電領域と、前記帯電部からのエアロゾルの流れを受ける静電沈着領域と、前記粒子堆積経路の終端に配された他の流出経路を備えたものであり、
前記静電沈着領域が、互いに離間して対向するように設けられた一対の堆積電極を備えたものである
ことを特徴とする静電的にエアロゾル粒子を堆積する装置。 - 前記流入経路にエアロゾルの流れを発生させるための、前記流入経路に接続された粒子生成部をさらに備えたことを特徴とする請求項1記載の静電的にエアロゾル粒子を堆積する装置。
- 前記粒子生成部が、誘導粒子生成部、火炎噴霧熱分解生成部、超音波粒子生成部、およびこれらの組み合わせから選択されたものであることを特徴とする請求項2記載の静電的にエアロゾル粒子を堆積する装置。
- 前記粒子堆積経路が、前記流入経路の中心軸に対して90度から170度の角度(α)をなしていることを特徴とする請求項1記載の静電的にエアロゾル粒子を堆積する装置。
- エアロゾルの初期流れを生成し、
前記エアロゾルの初期流れを、前記エアロゾルの初期流れを粒子堆積流と流出流に分岐する分岐部を通過させ、ここで少なくとも前記堆積流における粒子が前記エアロゾルの初期流れに対して、所定の角度で、かつより減速した速度で流れるようになし、
前記粒子堆積流を、帯電部を備えた帯電領域を通して通過させ、
前記帯電部の間を通過するエアロゾル粒子を帯電して、帯電したエアロゾル粒子を生成するように前記帯電部に直流電流を印加し、
少なくとも一方に一つの基板が配置された一対の堆積電極の間に、前記帯電したエアロゾル粒子を通過させ、
基板上に前記帯電したエアロゾル粒子を堆積する電界を前記堆積電極間に生成するように該堆積電極に直流電流を印加することを特徴とするエアロゾル粒子を基板上に静電的に堆積する方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/712,149 | 2007-02-28 | ||
US11/712,149 US7393385B1 (en) | 2007-02-28 | 2007-02-28 | Apparatus and method for electrostatically depositing aerosol particles |
PCT/US2008/002416 WO2008106066A1 (en) | 2007-02-28 | 2008-02-25 | Apparatus and method for electrostatically depositing aerosol particles |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010520044A true JP2010520044A (ja) | 2010-06-10 |
JP5388866B2 JP5388866B2 (ja) | 2014-01-15 |
Family
ID=39488359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2009551688A Expired - Fee Related JP5388866B2 (ja) | 2007-02-28 | 2008-02-25 | 静電的に堆積するエアロゾル粒子のための装置および方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7393385B1 (ja) |
EP (1) | EP2063997B1 (ja) |
JP (1) | JP5388866B2 (ja) |
DE (1) | DE602008001480D1 (ja) |
WO (1) | WO2008106066A1 (ja) |
Cited By (1)
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WO2013105445A1 (ja) * | 2012-01-11 | 2013-07-18 | コニカミノルタ株式会社 | 静電スプレー装置 |
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US20100126227A1 (en) * | 2008-11-24 | 2010-05-27 | Curtis Robert Fekety | Electrostatically depositing conductive films during glass draw |
US8960575B2 (en) * | 2009-01-13 | 2015-02-24 | Finishing Brands Holdings Inc. | Electrostatic spray system and method |
JP2010225640A (ja) * | 2009-03-19 | 2010-10-07 | Tokyo Electron Ltd | 基板処理装置及び排気方法 |
US7959883B2 (en) * | 2009-08-28 | 2011-06-14 | Corning Incorporated | Engine exhaust gas reactors and methods |
US8893990B2 (en) * | 2010-02-26 | 2014-11-25 | Finishing Brands Holdings Inc. | Electrostatic spray system |
US8317901B2 (en) * | 2010-02-26 | 2012-11-27 | Empire Technology Development Llc | Nanoparticle filtration |
US9140653B2 (en) * | 2010-10-08 | 2015-09-22 | Tsi Incorporated | Spark emission particle detector |
US8833679B2 (en) | 2010-11-24 | 2014-09-16 | Finishing Brands Holdings, Inc. | Electrostatic spray system with grounding teeth |
US8861167B2 (en) | 2011-05-12 | 2014-10-14 | Global Plasma Solutions, Llc | Bipolar ionization device |
EP2855384B1 (en) | 2012-05-29 | 2020-12-09 | Corning Incorporated | Method for texturing a glass surface |
ES2687272T3 (es) * | 2014-04-14 | 2018-10-24 | Philip Morris Products S.A. | Sistema y método de transmisión de datos y energía |
EP3268716A4 (en) * | 2015-03-12 | 2018-12-05 | Provtagaren AB | Method for passive or active sampling of particles and gas phase components in a fluid flow |
WO2017143255A1 (en) * | 2016-02-19 | 2017-08-24 | Washington University | Systems and methods for gas cleaning using electrostatic precipitation and photoionization |
US10882053B2 (en) | 2016-06-14 | 2021-01-05 | Agentis Air Llc | Electrostatic air filter |
US20170354980A1 (en) | 2016-06-14 | 2017-12-14 | Pacific Air Filtration Holdings, LLC | Collecting electrode |
US10828646B2 (en) | 2016-07-18 | 2020-11-10 | Agentis Air Llc | Electrostatic air filter |
GB201701292D0 (en) * | 2017-01-26 | 2017-03-15 | Univ Ulster | Method and apparatus for producing nanoscale materials |
US10875034B2 (en) | 2018-12-13 | 2020-12-29 | Agentis Air Llc | Electrostatic precipitator |
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Also Published As
Publication number | Publication date |
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EP2063997A1 (en) | 2009-06-03 |
JP5388866B2 (ja) | 2014-01-15 |
DE602008001480D1 (de) | 2010-07-22 |
WO2008106066A1 (en) | 2008-09-04 |
EP2063997B1 (en) | 2010-06-09 |
US7393385B1 (en) | 2008-07-01 |
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