JP2010511914A5 - - Google Patents
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- Publication number
- JP2010511914A5 JP2010511914A5 JP2009540235A JP2009540235A JP2010511914A5 JP 2010511914 A5 JP2010511914 A5 JP 2010511914A5 JP 2009540235 A JP2009540235 A JP 2009540235A JP 2009540235 A JP2009540235 A JP 2009540235A JP 2010511914 A5 JP2010511914 A5 JP 2010511914A5
- Authority
- JP
- Japan
- Prior art keywords
- cation
- boron
- repeating unit
- salt
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 150000001768 cations Chemical class 0.000 claims 4
- 150000001450 anions Chemical class 0.000 claims 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 3
- 229910052796 boron Inorganic materials 0.000 claims 3
- 150000003839 salts Chemical class 0.000 claims 3
- 239000011780 sodium chloride Substances 0.000 claims 3
- 230000002209 hydrophobic Effects 0.000 claims 2
- 229920005596 polymer binder Polymers 0.000 claims 2
- 239000002491 polymer binding agent Substances 0.000 claims 2
- HFSRCEJMTLMDLI-UHFFFAOYSA-N Sodium tetraphenylborate Chemical compound [Na+].C1=CC=CC=C1[B-](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 HFSRCEJMTLMDLI-UHFFFAOYSA-N 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- 239000003999 initiator Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/567,782 US7883826B2 (en) | 2006-12-07 | 2006-12-07 | Negative-working radiation-sensitive compositions and imageable materials |
| PCT/US2007/024386 WO2008073223A2 (en) | 2006-12-07 | 2007-11-27 | Negative-working radiation-sensitive compositions and imageable materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010511914A JP2010511914A (ja) | 2010-04-15 |
| JP2010511914A5 true JP2010511914A5 (US20080242721A1-20081002-C00053.png) | 2010-10-28 |
Family
ID=39339879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009540235A Pending JP2010511914A (ja) | 2006-12-07 | 2007-11-27 | ネガ型輻射線感受性組成物及び画像形成材料 |
Country Status (5)
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009057436A (ja) * | 2007-08-31 | 2009-03-19 | Toyo Ink Mfg Co Ltd | 帯電防止ポリマーおよびその用途 |
| US8623586B2 (en) * | 2009-02-25 | 2014-01-07 | Gary Ganghui Teng | Method for on-press developable lithographic plate utilizing light-blocking material |
| JP5263560B2 (ja) * | 2009-08-25 | 2013-08-14 | 日産化学工業株式会社 | 高硬度インプリント材料 |
| JP2012068357A (ja) * | 2010-09-22 | 2012-04-05 | Eastman Kodak Co | 平版印刷版原版 |
| US8939080B2 (en) * | 2010-11-18 | 2015-01-27 | Eastman Kodak Company | Methods of processing using silicate-free developer compositions |
| JP5829177B2 (ja) * | 2011-07-12 | 2015-12-09 | 富士フイルム株式会社 | インプリント用硬化性組成物、パターン形成方法およびパターン |
| EP2762973B1 (en) * | 2011-09-26 | 2017-11-29 | Fujifilm Corporation | Method for producing lithographic printing plate |
| JP5690696B2 (ja) * | 2011-09-28 | 2015-03-25 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| US20150053103A1 (en) * | 2013-03-06 | 2015-02-26 | Anocoil Corporation | Method of Developing a Lithographic Printing Plate Including Post Treatment |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60173543A (ja) * | 1984-02-20 | 1985-09-06 | Toray Ind Inc | 感光性樹脂組成物 |
| JPH0766186B2 (ja) * | 1985-07-02 | 1995-07-19 | 富士写真フイルム株式会社 | 感光性組成物 |
| JPH08190197A (ja) * | 1995-01-10 | 1996-07-23 | Konica Corp | 感光性平版印刷版 |
| US5629354A (en) * | 1995-02-28 | 1997-05-13 | Eastman Kodak Company | Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator |
| JPH09239943A (ja) * | 1996-03-08 | 1997-09-16 | Fuji Photo Film Co Ltd | 湿し水不要平版原版 |
| JP3824285B2 (ja) * | 1997-03-14 | 2006-09-20 | 富士写真フイルム株式会社 | 感放射線性着色組成物 |
| JP2001527565A (ja) * | 1997-05-23 | 2001-12-25 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 光重合のためのポリボラート共開始剤 |
| JP4202589B2 (ja) | 2000-10-11 | 2008-12-24 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP2002229203A (ja) * | 2001-02-01 | 2002-08-14 | Fuji Photo Film Co Ltd | 光重合性組成物、記録材料およびボレート化合物 |
| JP4190158B2 (ja) * | 2001-03-28 | 2008-12-03 | 三菱製紙株式会社 | 感光性組成物および感光性平版印刷版材料 |
| US7261998B2 (en) * | 2001-04-04 | 2007-08-28 | Eastman Kodak Company | Imageable element with solvent-resistant polymeric binder |
| US6599676B2 (en) * | 2002-01-03 | 2003-07-29 | Kodak Polychrome Graphics Llc | Process for making thermal negative printing plate |
| US6936384B2 (en) | 2002-08-01 | 2005-08-30 | Kodak Polychrome Graphics Llc | Infrared-sensitive composition containing a metallocene derivative |
| US7056642B2 (en) * | 2002-09-18 | 2006-06-06 | Fuji Photo Film Co., Ltd. | Method of graft polymerization and variety of materials utilizing the same as well as producing method thereof |
| CN1771465B (zh) * | 2003-04-07 | 2011-02-09 | 东洋纺织株式会社 | 感光性树脂组合物、使用该组合物的感光层及感光性树脂印刷用原版 |
| JP2005062482A (ja) | 2003-08-12 | 2005-03-10 | Fuji Photo Film Co Ltd | 重合性組成物及びそれを用いた記録材料 |
| US7250245B2 (en) * | 2004-05-24 | 2007-07-31 | Eastman Kodak Company | Switchable polymer printing plates with carbon bearing ionic and steric stabilizing groups |
| US7189494B2 (en) * | 2005-05-26 | 2007-03-13 | Eastman Kodak Company | On-press developable imageable element comprising a tetraarylborate salt |
| JP2007256445A (ja) * | 2006-03-22 | 2007-10-04 | Mitsubishi Paper Mills Ltd | 光重合性組成物および感光性平版印刷版材料 |
| US7452638B2 (en) * | 2006-09-18 | 2008-11-18 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
| US7429445B1 (en) * | 2007-03-07 | 2008-09-30 | Eastman Kodak Company | Negative-working imageable elements and methods of use |
-
2006
- 2006-12-07 US US11/567,782 patent/US7883826B2/en not_active Expired - Fee Related
-
2007
- 2007-11-27 JP JP2009540235A patent/JP2010511914A/ja active Pending
- 2007-11-27 WO PCT/US2007/024386 patent/WO2008073223A2/en active Application Filing
- 2007-11-27 CN CN200780044806.9A patent/CN101548239B/zh active Active
- 2007-11-27 EP EP07862226A patent/EP2089771A2/en not_active Withdrawn
