JP2010500271A - Quenchable solar control layer system and manufacturing method thereof - Google Patents
Quenchable solar control layer system and manufacturing method thereof Download PDFInfo
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- JP2010500271A JP2010500271A JP2009523303A JP2009523303A JP2010500271A JP 2010500271 A JP2010500271 A JP 2010500271A JP 2009523303 A JP2009523303 A JP 2009523303A JP 2009523303 A JP2009523303 A JP 2009523303A JP 2010500271 A JP2010500271 A JP 2010500271A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 22
- 239000002184 metal Substances 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 238000010521 absorption reaction Methods 0.000 claims abstract description 7
- 238000000576 coating method Methods 0.000 claims abstract description 6
- 239000011248 coating agent Substances 0.000 claims abstract description 5
- 239000010410 layer Substances 0.000 claims description 160
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 26
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims description 13
- 239000004065 semiconductor Substances 0.000 claims description 12
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 8
- 229910045601 alloy Inorganic materials 0.000 claims description 7
- 239000000956 alloy Substances 0.000 claims description 7
- 229910000838 Al alloy Inorganic materials 0.000 claims description 6
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 229910001120 nichrome Inorganic materials 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 5
- -1 NiCr compound Chemical class 0.000 claims description 5
- 230000004888 barrier function Effects 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 239000011651 chromium Substances 0.000 claims description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 239000012790 adhesive layer Substances 0.000 claims description 4
- 239000012298 atmosphere Substances 0.000 claims description 4
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910020286 SiOxNy Inorganic materials 0.000 claims description 3
- 230000007423 decrease Effects 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 229910010421 TiNx Inorganic materials 0.000 claims description 2
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 239000012300 argon atmosphere Substances 0.000 claims description 2
- 150000001845 chromium compounds Chemical class 0.000 claims description 2
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 238000004544 sputter deposition Methods 0.000 claims description 2
- 150000003609 titanium compounds Chemical class 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 abstract description 16
- 239000011521 glass Substances 0.000 abstract description 13
- 239000000126 substance Substances 0.000 abstract description 8
- 238000002834 transmittance Methods 0.000 abstract description 8
- 238000001771 vacuum deposition Methods 0.000 abstract description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 238000009792 diffusion process Methods 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- 238000002310 reflectometry Methods 0.000 description 6
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- 238000013508 migration Methods 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 230000000171 quenching effect Effects 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
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- 230000001419 dependent effect Effects 0.000 description 2
- 238000005121 nitriding Methods 0.000 description 2
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- 239000011247 coating layer Substances 0.000 description 1
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- 150000001875 compounds Chemical class 0.000 description 1
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- 239000007789 gas Substances 0.000 description 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
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- Surface Treatment Of Glass (AREA)
Abstract
本発明は、調整可能な反射色および透過率を有する透明基板上の焼入れ可能なソーラーコントロール層系、およびその製造方法に関する。本発明の課題は、様々な熱処理が可能で、且つその際に化学的および機械的耐久性を維持しつつ目に見えるカラーシフトがない、真空コーティングによってガラス上に形成できる遮光層系の製造であり、これは誘電基板Ｓ０をコーティングするための焼入れ可能で可視光線反射性と吸収性がある層系によって解決され、本層系は、基板Ｓ０上に次の順序で、少なくとも１つの透明な高屈折率誘電体層Ｓ２、１つの機能性金属反射および吸収層Ｓ４、および１つの透明な高屈折率誘電体層Ｓ６を含む。本発明によるソーラーコントロール層系は、反射色および透過率の調整を可能にする。 The present invention relates to a quenchable solar control layer system on a transparent substrate having adjustable reflection color and transmittance, and a method for manufacturing the same. The object of the present invention is the production of a light-shielding layer system that can be formed on glass by vacuum coating, capable of various heat treatments and without any visible color shift while maintaining chemical and mechanical durability. This is solved by a hardenable, visible light reflective and absorptive layer system for coating the dielectric substrate S0, which layer system has at least one transparent high layer on the substrate S0 in the following order: It includes a refractive index dielectric layer S2, one functional metal reflection and absorption layer S4, and one transparent high refractive index dielectric layer S6. The solar control layer system according to the invention makes it possible to adjust the reflection color and the transmittance.
Description
本発明は、調整可能な反射色と透過率を有する透明基板上の焼入れ可能なソーラーコントロール層系およびその製造方法に関する。 The present invention relates to a quenchable solar control layer system on a transparent substrate having an adjustable reflection color and transmittance and a method for manufacturing the same.
このような層系は、ガラス上に真空成膜によって形成され、主に建築で窓やファサードの構成に、および自動車産業で使用される。これらの両使用分野では、層系は化学的耐久性と機械的堅牢性がなければならず、ここで、これらの特性を比較して評価できるように、例えば、５％の塩酸中での煮沸や様々な磨耗試験のような標準化された試験がある。 Such layer systems are formed by vacuum film formation on glass and are used primarily in architecture, in the construction of windows and facades, and in the automotive industry. In both of these fields of use, the layer system must be chemically and mechanically robust, where it can be boiled in eg 5% hydrochloric acid so that these properties can be compared and evaluated. And standardized tests such as various wear tests.
同時に、層系は、可視光線に対する高い透過性（透過率）、好ましくは約７５％〜８０％の透過率の値と、低μｍの波長域、いわゆる近赤外域の光線に対する高い反射性を有していなければならない。この特殊な波長依存の透過性および反射性は、優先的に遮光に役立つ層系、即ち、公知のソーラーマネージメント（ソーラーコントロール）システムの特徴である。しかし、特殊な用途では、より長波長側の赤外域における高い反射性も必要であり、それは層系の放射挙動に反映される。 At the same time, the layer system has a high transmittance (transmittance) for visible light, preferably a transmittance value of about 75% to 80% and a high reflectivity for light in the low μm wavelength range, the so-called near infrared range. Must be. This special wavelength-dependent transparency and reflectivity is a characteristic of a layer system that is preferentially useful for light shielding, ie a known solar management (solar control) system. However, for special applications, high reflectivity in the infrared region on the longer wavelength side is also required, which is reflected in the radiation behavior of the layer system.
ガラス上に成膜される当該遮光層系の他の本質的な特徴は、例えば、建築および自動車産業用の安全ガラスを製造するための焼入れ時に、又はウインドシールドガラス用のガラスを成形する時に使用されるような熱処理が可能なことである。低コストで製造し、均質な層を達成するために熱処理前にコーティングを実施することが様々な用途で必要であるため、層系は、用途に応じて異なる温度および時間で様々な熱処理を行っても低下しないか、又は本質的に低下しない機械的、化学的、および光学的特性を有していなければならない。 Other essential features of the light-shielding layer system deposited on glass are used, for example, during quenching to produce safety glass for the architectural and automotive industries, or when forming glass for windshield glass It is possible to perform such heat treatment. The layer system performs various heat treatments at different temperatures and times depending on the application, as it is necessary to perform coatings prior to heat treatment to achieve low cost and achieve a homogeneous layer. Must have mechanical, chemical, and optical properties that do not degrade or essentially degrade.
特許文献１には、これらの要求を実質的に満たす層系が記載されている。それによれば、必要な赤外線反射性を有するニッケル又はその合金からなる金属層は化学量論組成の窒化ケイ素層（Ｓｉ３Ｎ４）で被覆され、それはまた層系に機械的および化学的耐久性を付与する。 Patent Document 1 describes a layer system that substantially satisfies these requirements. According to it, a metal layer made of nickel or an alloy thereof with the necessary infrared reflectivity is coated with a stoichiometric silicon nitride layer (Si 3 N 4 ), which also provides mechanical and chemical durability to the layer system. Is granted.
前記ニッケル含有金属層は、熱処理による放射性の悪化がない。しかし、熱処理中、拡散プロセス、特に、窒化ケイ素層から金属層への窒素の拡散プロセスおよび逆方向でのニッケルの拡散プロセスが起こることが確認された。 The nickel-containing metal layer does not deteriorate in radioactivity due to heat treatment. However, it was confirmed that during the heat treatment, a diffusion process occurred, in particular, a diffusion process of nitrogen from the silicon nitride layer to the metal layer and a diffusion process of nickel in the reverse direction.
このプロセスのため、熱処理されていない層系と比較して、熱処理の温度および持続時間に応じて層系のカラーシフトが起こり、これは特に建築に使用するのに望ましくない。ファサードの構成ではコスト上の理由から、事故防止のために実際に必要な場合だけ熱処理された安全ガラスが使用されるため、熱処理されていないものと熱処理されたものが常に一緒に使用されており、従って、生じ得る色の差が特に明らかになる。 This process results in a color shift of the layer system depending on the temperature and duration of the heat treatment compared to an unheated layer system, which is particularly undesirable for use in architecture. In the construction of the facade, for safety reasons, safety glass that has been heat-treated is used only when it is actually necessary to prevent accidents. Therefore, unheated and heat-treated glass are always used together. Thus, the color differences that can occur are particularly evident.
このような色の差は、約１０μｍの波長のより長波長側の赤外域の赤外線反射層系でも望ましくないため、特許文献２に記載されているこのような層系では、反射層と、その上に配置されており、窒化ケイ素からなってもよい誘電体層との間にいわゆる移動防止層、好ましくは酸化ニッケルクロムを含有する移動防止層が挿入された。この移動防止層は、熱処理中および熱処理後に色の差を生じさせる拡散現象をなくす。しかし、実際には、それがある特定の熱処理プロセスにしか有効でないことが明らかになった。 Such a color difference is not desirable even in the infrared reflection layer system in the longer infrared region having a wavelength of about 10 μm. In such a layer system described in Patent Document 2, the reflection layer and its A so-called anti-migration layer, preferably a nickel-chromium-containing anti-migration layer, was inserted between the dielectric layer, which is arranged above and may consist of silicon nitride. This migration preventing layer eliminates the diffusion phenomenon that causes a color difference during and after heat treatment. However, in practice, it has been found that it is only effective for certain specific heat treatment processes.
一緒に使用される熱処理されたガラスと熱処理されていないガラスの色の差を回避する別の可能性が、特許文献３に記載されている。それによれば、赤外線反射金属層の下の別の窒化ケイ素層で、並びに、一方又は両方の窒化ケイ素層の厚さを変化させることによって、層系は、機械的および化学的特性の他に、特に光学的特性が的確に調整され、それによって、合目的的な僅かな色の差を正確に生じさせることができ、熱処理後に目に見える色の差がもはや存在せず、このコーティングされたガラスをファサード内に使用できる。しかし、そのためには、互いにおよび熱処理に対して正確に調整された２つの異なる層系を作り出さなければならない。この層系の調整は、使用される色のそれぞれに対して必要であり、そのため非常に費用がかかり、融通がきかず、各層系の必要な機械的および化学的耐久性を可能にする範囲内でしか行うことができない。 Another possibility of avoiding the color difference between the heat treated glass used together and the unheat treated glass is described in US Pat. According to it, by changing the thickness of one or both silicon nitride layers, with another silicon nitride layer under the infrared reflective metal layer, the layer system, in addition to mechanical and chemical properties, In particular, the optical properties are precisely adjusted, so that the desired slight color difference can be accurately produced, and there is no longer any visible color difference after heat treatment, this coated glass Can be used in the facade. To do so, however, two different layer systems must be created that are precisely tuned to each other and to the heat treatment. This adjustment of the layer system is necessary for each of the colors used, so that it is very expensive, inflexible and within the range that allows the required mechanical and chemical durability of each layer system. Can only be done.
互いに同調された異なる層系をある用途に使用することは、時間および処理温度に関して、様々なプロセスで通常の範囲を使用することができると同時に両方のパラメータを柔軟に選択することができる熱処理を行った場合でも光学的特性が本質的に変化しない層系でしか避けられない。この目的のために、特許文献４には、既知のニッケル含有反射層の代わりに少なくとも部分的に窒素化された金属層、好ましくはニッケル又はクロム含有金属窒化物を使用する層系が記載されている。この場合、金属の窒素化の程度は、金属が成膜されるコーティング部分の作用ガス中の窒素の割合で調整される。 Using different layer systems tuned to each other in one application can be a heat treatment that allows normal ranges to be used in various processes with respect to time and processing temperature while at the same time allowing flexible selection of both parameters. Even when done, it is unavoidable only in layer systems in which the optical properties are essentially unchanged. For this purpose, U.S. Pat. No. 6,057,051 describes a layer system that uses at least partially nitrided metal layers, preferably nickel or chromium containing metal nitrides, instead of known nickel-containing reflective layers. Yes. In this case, the degree of metal nitriding is adjusted by the ratio of nitrogen in the working gas of the coating portion where the metal is deposited.
反射金属層の窒素化により、層系での前述の拡散プロセス、特に窒素の拡散プロセス、および従ってそのカラーシフトは、少なくとも、６２５℃で１０分の前述の熱処理では減少する。そのとき、比較として、同じであるが窒化物を含有しない金属層を含み、同じ熱処理を受けた層系が使用されている。 By nitriding the reflective metal layer, the aforementioned diffusion process in the layer system, in particular the diffusion process of nitrogen, and thus its color shift, is reduced at least by the aforementioned heat treatment at 625 ° C. for 10 minutes. Then, as a comparison, a layer system comprising the same but not containing nitride metal layer and subjected to the same heat treatment is used.
しかし、金属の窒素化は、機械的および化学的耐久性の低下の他に、反射性、特に赤外域における反射性の悪化を伴う。耐久性の低下は、確かに窒化ケイ素層の改良によって調整できるが、どの場合も、それはまた光学的特性の変化を伴うため、カラーシフトと耐久性との間の妥協点を見出さなければならない。 However, the nitrogenation of metals is accompanied by a deterioration in reflectivity, particularly in the infrared region, in addition to a decrease in mechanical and chemical durability. Durability degradation can certainly be tuned by improving the silicon nitride layer, but in any case it also involves changes in optical properties, so a compromise between color shift and durability must be found.
更に、このような反射層系を融通性のある熱処理プロセスに付し、そのとき、機械的、化学的および光学的特性に関する要求を満たすことが必要である。 Furthermore, it is necessary to subject such reflective layer systems to a flexible heat treatment process, at which time the requirements for mechanical, chemical and optical properties must be met.
従って、本発明の課題は、様々な熱処理が可能であり、そのとき化学的および機械的耐久性を維持しつつ目に見えるカラーシフトがない、真空コーティングによってガラス上に形成できる遮光層系（Ｓｏｎｎｅｎｓｃｈｕｔｚｓｃｈｉｃｈｔｓｙｓｔｅｍ）とその製造方法を提供することである。 Accordingly, the object of the present invention is to provide a light-shielding layer system that can be formed on glass by vacuum coating, capable of various heat treatments, while maintaining no chemical or mechanical durability and without any visible color shift. ) And its manufacturing method.
本発明の課題は、請求項１に記載の特徴を有する層系および請求項２３に記載の特徴を有する方法によって解決される。本発明の有利な実施形態は、従属項の対象である。 The object of the present invention is solved by a layer system having the features of claim 1 and a method having the features of claim 23. Advantageous embodiments of the invention are the subject of the dependent claims.
誘電基板Ｓ０をコーティングするための焼入れ可能で可視光線反射性と吸収性を有する層系は、基板Ｓ０上に次の順序で、少なくとも１つの透明な高屈折率誘電体層Ｓ２、１つの機能性金属反射および吸収層Ｓ４、および１つの透明な高屈折率誘電体層Ｓ６を含む。 A hardenable, visible light reflective and absorptive layer system for coating the dielectric substrate S0 is formed on the substrate S0 in the following order, at least one transparent high-index dielectric layer S2, one functionality: It includes a metallic reflective and absorbing layer S4 and one transparent high index dielectric layer S6.
本発明によるソーラーコントロール層系は、反射色および透過率の調整を可能にする。 The solar control layer system according to the invention makes it possible to adjust the reflection color and the transmittance.
そのとき、層Ｓ２とＳ６のうちの少なくとも１つの屈折率は、５５０ｎｍの波長の光では、２．０〜２．５であることができる。 At that time, the refractive index of at least one of the layers S2 and S6 can be 2.0 to 2.5 for light having a wavelength of 550 nm.
本発明の一実施形態によれば、層Ｓ２は、金属、半導体、又は半導体合金の酸化物又は窒化物からなる。本発明の別の実施形態では、層Ｓ６はケイ素を含む。 According to one embodiment of the present invention, the layer S2 is made of an oxide or nitride of a metal, a semiconductor, or a semiconductor alloy. In another embodiment of the invention, layer S6 comprises silicon.
有利には、本発明による層系は、層Ｓ２とＳ６のうちの少なくとも１つが異なる材料の少なくとも２つの部分層（Ｔｅｉｌｓｃｈｉｃｈｔｅｎ）からなるように実施することができる。 Advantageously, the layer system according to the invention can be implemented such that at least one of the layers S2 and S6 consists of at least two sublayers (Teilschten) of different materials.
このとき、層Ｓ２とＳ６のうちの少なくとも１つは、金属、半導体、又は半導体合金の酸化物又は窒化物を含んでもよい。本発明の別の実施形態では、層６はケイ素を含む。 At this time, at least one of the layers S2 and S6 may include a metal, a semiconductor, or an oxide or nitride of a semiconductor alloy. In another embodiment of the invention, layer 6 comprises silicon.
例えば、層Ｓ２とＳ６のうちの少なくとも１つは、ＳｎＯ２およびＳｉ３Ｎ４を含んでもよい。 For example, at least one of the layers S2 and S6 may include SnO2 and Si3N4.
本発明の別の実施形態によれば、層Ｓ４は、クロム又はクロム化合物、例えば、ＣｒＮｘからなる。 According to another embodiment of the invention, the layer S4 consists of chromium or a chromium compound, for example CrNx.
或いは、層Ｓ４は、チタン又はチタン化合物、例えば、ＴｉＮｘからなることができる。 Alternatively, the layer S4 can be made of titanium or a titanium compound, such as TiNx.
代替法では、層Ｓ４は、ＮｉＣｒ又はＮｉＣｒ化合物からなることができる。 In the alternative, the layer S4 can consist of NiCr or a NiCr compound.
本発明の別の形態によれば、基板Ｓ０と層Ｓ２との間に透明な中〜低屈折率の誘電バリアおよび／又は接着層Ｓ１が配置されている。 According to another aspect of the invention, a transparent medium to low refractive index dielectric barrier and / or adhesive layer S1 is disposed between the substrate S0 and the layer S2.
有利には、層Ｓ１の屈折率は、５５０ｎｍの波長の光では、１．６０〜１．７５である。 Advantageously, the refractive index of the layer S1 is 1.60 to 1.75 for light with a wavelength of 550 nm.
本発明の更に別の形態によれば、層Ｓ６上に、透明な中〜低屈折率の誘電バリアおよび／又は接着層Ｓ７が配置されている。 According to yet another aspect of the invention, a transparent medium to low refractive index dielectric barrier and / or adhesive layer S7 is disposed on the layer S6.
有利には、層Ｓ７の屈折率は、５５０ｎｍの波長の光では、１．６０〜１．８５である。 Advantageously, the refractive index of the layer S7 is 1.60 to 1.85 for light with a wavelength of 550 nm.
本発明の一実施形態によれば、層Ｓ１とＳ７のうちの少なくとも１つは、金属、半導体、又は半導体合金の酸窒化物を含む。 According to one embodiment of the present invention, at least one of the layers S1 and S7 comprises a metal, semiconductor, or semiconductor alloy oxynitride.
有利には、層Ｓ２とＳ４との間に遮蔽層Ｓ３が挿入されていてもよい。 Advantageously, a shielding layer S3 may be inserted between the layers S2 and S4.
更に有利には、層Ｓ４とＳ６との間に遮蔽層Ｓ５が挿入されていてもよい。 More advantageously, a shielding layer S5 may be inserted between the layers S4 and S6.
そのとき、層Ｓ３とＳ５のうちの少なくとも１つはＳｉＯｘＮｙ、化学量論組成未満の（ｓｕｂｓｔｏｅｃｈｉｏｍｅｔｒｉｓｃｈｅｓ）ＮｉＣｒＯｘ又はＮｉＣｒＮｘを含んでもよい。 At least one of layers S3 and S5 may then include SiOxNy, substoichiometric NiCrOx or NiCrNx.
本発明の別の実施形態によれば、少なくとも１つの他の金属反射および吸収層が設けられている。 According to another embodiment of the invention, at least one other metallic reflective and absorbing layer is provided.
有利には、少なくとも１つの他の金属反射および吸収層は、クロム又はチタンを含む。 Advantageously, the at least one other metallic reflective and absorbing layer comprises chromium or titanium.
更に、少なくとも１つの他の金属反射および吸収層は、窒素を含んでもよい。 Furthermore, the at least one other metallic reflective and absorbing layer may comprise nitrogen.
本発明の他の好ましい形態では、少なくとも１つの他の金属反射および吸収層は、濃度勾配のある窒素含有クロム化合物であり、窒素含有量は層の少なくとも１つの周縁領域で最大であり、内部に向かって減少する。 In another preferred form of the invention, the at least one other metallic reflective and absorbing layer is a concentration-graded nitrogen-containing chromium compound, the nitrogen content being greatest in at least one peripheral region of the layer, and internally It decreases toward.
このようなものの本発明による製造方法は、少なくとも１つの層をスパッタリング、好ましくはＤＣ−又はＭＦ−マグネトロンスパッタリングによって形成することを特徴とする。 The production method according to the invention of such is characterized in that at least one layer is formed by sputtering, preferably by DC- or MF-magnetron sputtering.
有利には、層Ｓ１とＳ７のうちの少なくとも１つは、ＣＶＤ−又はプラズマを用いたＣＶＤ−プロセスによって形成される。 Advantageously, at least one of the layers S1 and S7 is formed by CVD- or a CVD-process using plasma.
好ましくは、層Ｓ１とＳ７のうちの少なくとも１つは、酸素および／又は窒素を含有する雰囲気中でのケイ素又はケイ素アルミニウム合金の反応性マグネトロンスパッタリングによって形成される。 Preferably, at least one of the layers S1 and S7 is formed by reactive magnetron sputtering of silicon or a silicon aluminum alloy in an atmosphere containing oxygen and / or nitrogen.
特に好ましくは、層Ｓ１とＳ７のうちの少なくとも１つは、酸素および／又は窒素を含有するアルゴン雰囲気中でのケイ素又はケイ素アルミニウム合金の反応性マグネトロンスパッタリングによって形成される。 Particularly preferably, at least one of the layers S1 and S7 is formed by reactive magnetron sputtering of silicon or a silicon aluminum alloy in an argon atmosphere containing oxygen and / or nitrogen.
更に、本発明によれば、層Ｓ１とＳ７のうちの少なくとも１つは、酸素および／又は窒素および／又はアルゴンを含有する雰囲気中でのケイ素又はケイ素アルミニウム合金の反応性マグネトロンスパッタリングによって、異なる化学量論組成を有する勾配層として形成される。 Furthermore, according to the present invention, at least one of the layers S1 and S7 has a different chemistry by reactive magnetron sputtering of silicon or silicon aluminum alloy in an atmosphere containing oxygen and / or nitrogen and / or argon. It is formed as a gradient layer having a stoichiometric composition.
可能な本発明による層系の例は、次の通りである：
Ｓ０／Ｓ１／Ｓｉ３Ｎ４／ＣｒＮｘ／Ｓｉ３Ｎ４／Ｓ７
Ｓ０／Ｓ１／ＳｎＯ２／Ｓｉ３Ｎ４／ＣｒＮｘ／Ｓｉ３Ｎ４／Ｓ７
Ｓ０／Ｓ１／ＳｎＯ２／ＮｉＣｒＮｘ／ＣｒＮｘ／Ｓｉ３Ｎ４／Ｓ７
Ｓ０／Ｓ１／ＳｎＯ２／ＳｉＯｘＮｙ／ＣｒＮｘ／Ｓｉ３Ｎ４／Ｓ７
Examples of possible layer systems according to the invention are as follows:
S0 / S1 / Si3N4 / CrNx / Si3N4 / S7
S0 / S1 / SnO2 / Si3N4 / CrNx / Si3N4 / S7
S0 / S1 / SnO2 / NiCrNx / CrNx / Si3N4 / S7
S0 / S1 / SnO2 / SiOxNy / CrNx / Si3N4 / S7
吸収性と反射性を有する層Ｓ４の厚さを変えることによって、層系の透過率を調整することができる。所望の透過率を達成するための異なる厚さのＣｒＮｘ化合物の使用、および焼入れ性を達成するための特定の化学量論組成の使用によって、焼入れ後のカラーシフトを非常に小さく保つことができる。ＣｒＮｘは優れた吸収層である。典型的に使用されるＮｉＣｒ又はＮｉＣｒ化合物（ＮｉＣｒＯｘ）の代わりにＣｒＮｘを使用する場合の他の利点は、焼入れ後のヘーズの増加がほんの僅かであることであり、そうでない場合、とりわけニッケルが隣接する層の中に拡散することによってヘーズの増加が起こる。 The transmittance of the layer system can be adjusted by changing the thickness of the layer S4 having absorptivity and reflectivity. By using different thicknesses of CrNx compounds to achieve the desired transmission and using a specific stoichiometric composition to achieve hardenability, the color shift after quenching can be kept very small. CrNx is an excellent absorption layer. Another advantage of using CrNx instead of the typically used NiCr or NiCr compound (NiCrOx) is that there is only a slight increase in haze after quenching, otherwise nickel is adjacent. The haze increases by diffusing into the layer.
更に、吸収層の下にあり（基板側にあり）、所望の反射色に応じた適切な厚さの高屈折率層は、Ｓｉ３Ｎ４からだけでなく、追加的に金属酸化物層からも構成されていてもよい。そのとき、酸化物層と吸収層との間に、薄い遮蔽層が必要である。このように追加の材料を使用できるため、所与のコーター構成およびターゲット装備でサイクル時間を明らかに減少させることができる。 Furthermore, the high refractive index layer under the absorption layer (on the substrate side) and having an appropriate thickness depending on the desired reflection color is composed not only of Si3N4 but also of an additional metal oxide layer. It may be. At that time, a thin shielding layer is required between the oxide layer and the absorption layer. This additional material can be used to significantly reduce cycle time for a given coater configuration and target equipment.
任意の層Ｓ１は、Ｎａ＋がガラス基板から層系の中に拡散すること、および、層の特性に対するガラスの影響（腐食又は吸引手段の跡（Ｓａｕｇｅｒａｂｄｒｕｅｃｋｅ）など）を防止するバリア層である。更に、層Ｓ１を堆積することによって、ガラス基板から一緒にコーティング装置の中に持ち込まれた水が基板から取り除かれる。 Optional layer S1 is a barrier layer that prevents Na + from diffusing from the glass substrate into the layer system and the influence of the glass on the properties of the layer (such as corrosion or suction means traces). Furthermore, by depositing layer S1, the water brought into the coating apparatus together from the glass substrate is removed from the substrate.
同様に任意の層Ｓ７は、通常の被覆層Ｓ６に対してより低いそれの屈折率によって反射防止層となり、これは、高い屈折率が望まれる場合に、層系の透過率を更に明らかに高める。 Similarly, the optional layer S7 becomes an antireflective layer due to its refractive index lower than that of the normal coating layer S6, which further clearly increases the transmission of the layer system when a high refractive index is desired. .
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006037912.8A DE102006037912B4 (en) | 2006-08-11 | 2006-08-11 | Temperable solar control layer system and method for its production |
| DE102006037912.8 | 2006-08-11 | ||
| PCT/EP2007/058328 WO2008017723A1 (en) | 2006-08-11 | 2007-08-10 | Temperable solar control layer system and method for the production thereof |
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| JP2010500271A true JP2010500271A (en) | 2010-01-07 |
| JP5328650B2 JP5328650B2 (en) | 2013-10-30 |
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| JP2009523303A Expired - Fee Related JP5328650B2 (en) | 2006-08-11 | 2007-08-10 | Quenchable solar control layer system and manufacturing method thereof |
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| JP (1) | JP5328650B2 (en) |
| CN (1) | CN101535193B (en) |
| DE (1) | DE102006037912B4 (en) |
| WO (1) | WO2008017723A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20180097003A (en) * | 2017-02-22 | 2018-08-30 | (주)엘지하우시스 | Coating glass having low-transmittance and low-reflection |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9796619B2 (en) * | 2010-09-03 | 2017-10-24 | Guardian Glass, LLC | Temperable three layer antirefrlective coating, coated article including temperable three layer antirefrlective coating, and/or method of making the same |
| DE102012109691B4 (en) * | 2012-10-11 | 2014-08-07 | Von Ardenne Anlagentechnik Gmbh | Graded-layer solar absorber layer system and method for its production |
| FR3004710B1 (en) * | 2013-04-19 | 2017-01-27 | Saint Gobain | SOLAR CONTROL GLAZING COMPRISING TWO NICKEL-BASED METAL LAYERS |
| DE102014002965A1 (en) * | 2013-07-30 | 2015-02-05 | Leybold Optics Gmbh | Layer system of a transparent substrate and method for producing a layer system |
| US10294147B2 (en) | 2017-01-05 | 2019-05-21 | Guardian Glass, LLC | Heat treatable coated article having titanium nitride based IR reflecting layer(s) |
| CN106995281A (en) * | 2017-04-01 | 2017-08-01 | 佛山市翔硕宇玻璃科技有限公司 | One kind can tempering oxidation and corrosion color metallized glass |
| FR3118440B1 (en) | 2020-12-31 | 2022-12-23 | Saint Gobain | Solar protection glazing comprising a thin layer based on titanium nitride and a layer of silicon nitride sub-stoichiometric in nitrogen. |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02225346A (en) * | 1989-02-27 | 1990-09-07 | Central Glass Co Ltd | Heat-reflective glass |
| JPH05124839A (en) * | 1991-10-31 | 1993-05-21 | Central Glass Co Ltd | Heat insulating glass which can be thermally worked |
| JPH11302037A (en) * | 1998-04-23 | 1999-11-02 | Central Glass Co Ltd | Low reflectance and low transmittance glass |
| JP2002507248A (en) * | 1997-06-20 | 2002-03-05 | ピーピージー インダストリーズ オハイオ，インコーポレイテッド | Silicon oxynitride protective coating |
| JP2003002691A (en) * | 2001-06-19 | 2003-01-08 | Central Glass Co Ltd | Low reflective substrate and method for producing the same |
| JP2004514636A (en) * | 2000-11-25 | 2004-05-20 | サン−ゴバン グラス フランス | Transparent substrate with multilayer coating including thin layer for metal reflection |
| US6974630B1 (en) * | 2003-05-20 | 2005-12-13 | Guardian Industries Corp. | Coated article with niobium chromium inclusive barrier layer(s) and method of making same |
| JP2007530402A (en) * | 2004-04-03 | 2007-11-01 | アプライド マテリアルズ ゲーエムベーハー アンド コンパニー カーゲー | Glass coating |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5188887A (en) * | 1989-03-09 | 1993-02-23 | Guardian Industries Corp. | Heat treatable sputter-coated glass |
| US5229194A (en) * | 1991-12-09 | 1993-07-20 | Guardian Industries Corp. | Heat treatable sputter-coated glass systems |
| DE4211363A1 (en) * | 1992-04-04 | 1993-10-07 | Leybold Ag | Coating transparent substrate by cathode sputtering - to produce disks of high transmission behaviour in the visible region and giving high reflection to heat radiation |
| US5688585A (en) * | 1993-08-05 | 1997-11-18 | Guardian Industries Corp. | Matchable, heat treatable, durable, IR-reflecting sputter-coated glasses and method of making same |
| US5376455A (en) * | 1993-10-05 | 1994-12-27 | Guardian Industries Corp. | Heat-treatment convertible coated glass and method of converting same |
| FR2728559B1 (en) * | 1994-12-23 | 1997-01-31 | Saint Gobain Vitrage | GLASS SUBSTRATES COATED WITH A STACK OF THIN LAYERS WITH INFRARED REFLECTION PROPERTIES AND / OR IN THE FIELD OF SOLAR RADIATION |
| US7153577B2 (en) * | 2000-07-10 | 2006-12-26 | Guardian Industries Corp. | Heat treatable coated article with dual layer overcoat |
| US7267879B2 (en) * | 2001-02-28 | 2007-09-11 | Guardian Industries Corp. | Coated article with silicon oxynitride adjacent glass |
| US6524714B1 (en) * | 2001-05-03 | 2003-02-25 | Guardian Industries Corp. | Heat treatable coated articles with metal nitride layer and methods of making same |
| US6627317B2 (en) * | 2001-05-17 | 2003-09-30 | Guardian Industries Corp. | Heat treatable coated articles with anti-migration barrier layer between dielectric and solar control layers, and methods of making same |
| FR2858975B1 (en) * | 2003-08-20 | 2006-01-27 | Saint Gobain | TRANSPARENT SUBSTRATE COATED WITH A STACK OF THIN LAYERS WITH INFRARED REFLECTION PROPERTIES AND / OR IN THE FIELD OF SOLAR RADIATION |
| DE10356357B4 (en) * | 2003-11-28 | 2010-05-06 | Von Ardenne Anlagentechnik Gmbh | Heat-treatable solar and thermal insulation layer system and method for its production |
| WO2005073428A1 (en) * | 2004-01-23 | 2005-08-11 | Arkema Inc. | Method of depositing film stacks on a substrate |
| DE102004047135B4 (en) * | 2004-09-27 | 2011-08-18 | VON ARDENNE Anlagentechnik GmbH, 01324 | High-temperature layer system and method for its production |
-
2006
- 2006-08-11 DE DE102006037912.8A patent/DE102006037912B4/en not_active Expired - Fee Related
-
2007
- 2007-08-10 WO PCT/EP2007/058328 patent/WO2008017723A1/en active Application Filing
- 2007-08-10 JP JP2009523303A patent/JP5328650B2/en not_active Expired - Fee Related
- 2007-08-10 CN CN2007800295701A patent/CN101535193B/en not_active Expired - Fee Related
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02225346A (en) * | 1989-02-27 | 1990-09-07 | Central Glass Co Ltd | Heat-reflective glass |
| JPH05124839A (en) * | 1991-10-31 | 1993-05-21 | Central Glass Co Ltd | Heat insulating glass which can be thermally worked |
| JP2002507248A (en) * | 1997-06-20 | 2002-03-05 | ピーピージー インダストリーズ オハイオ，インコーポレイテッド | Silicon oxynitride protective coating |
| JPH11302037A (en) * | 1998-04-23 | 1999-11-02 | Central Glass Co Ltd | Low reflectance and low transmittance glass |
| JP2004514636A (en) * | 2000-11-25 | 2004-05-20 | サン−ゴバン グラス フランス | Transparent substrate with multilayer coating including thin layer for metal reflection |
| JP2003002691A (en) * | 2001-06-19 | 2003-01-08 | Central Glass Co Ltd | Low reflective substrate and method for producing the same |
| US6974630B1 (en) * | 2003-05-20 | 2005-12-13 | Guardian Industries Corp. | Coated article with niobium chromium inclusive barrier layer(s) and method of making same |
| JP2007530402A (en) * | 2004-04-03 | 2007-11-01 | アプライド マテリアルズ ゲーエムベーハー アンド コンパニー カーゲー | Glass coating |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20180097003A (en) * | 2017-02-22 | 2018-08-30 | (주)엘지하우시스 | Coating glass having low-transmittance and low-reflection |
| KR102075076B1 (en) * | 2017-02-22 | 2020-02-07 | (주)엘지하우시스 | Coating glass having low-transmittance and low-reflection |
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| JP5328650B2 (en) | 2013-10-30 |
| CN101535193A (en) | 2009-09-16 |
| CN101535193B (en) | 2012-07-04 |
| DE102006037912B4 (en) | 2017-07-27 |
| DE102006037912A1 (en) | 2008-02-14 |
| WO2008017723A1 (en) | 2008-02-14 |
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