JP2010199124A5 - - Google Patents
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- JP2010199124A5 JP2010199124A5 JP2009039144A JP2009039144A JP2010199124A5 JP 2010199124 A5 JP2010199124 A5 JP 2010199124A5 JP 2009039144 A JP2009039144 A JP 2009039144A JP 2009039144 A JP2009039144 A JP 2009039144A JP 2010199124 A5 JP2010199124 A5 JP 2010199124A5
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- ozone
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- ozone water
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- ozone gas
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Description
このような用途に使用されるオゾン水は、オゾナイザーで発生させたオゾンガスを、超純水中に、バブリング方式、エジェクタ方式、マイクロバブル方式等の公知の気液混合手段を用いて溶解させ、一旦オゾン水タンクに収容してから、送水ポンプによりオゾン水供給配管を介してユースポイントに送水されている。
しかし、この方法では、オゾン水タンク内が常圧であるため、長時間貯留するとオゾン水表面からオゾンガスが放出されてオゾン水中のオゾン濃度が低くなってしまうという問題があった。
The ozone water used for such applications is obtained by dissolving ozone gas generated by an ozonizer in ultrapure water using a known gas-liquid mixing means such as a bubbling method, an ejector method, or a microbubble method. After being accommodated in the ozone water tank, the water is pumped to the use point via the ozone water supply pipe.
However, in this method, since the inside of the ozone water tank is at a normal pressure, there is a problem that ozone gas is released from the surface of the ozone water and the ozone concentration in the ozone water decreases when stored for a long time.
本発明のオゾン水供給装置の一つの実施形態は、オゾン水流入口、オゾンガス流入口、オゾンガス排出口及びオゾン水排出口を備えた計量槽と；前記計量槽のオゾン水流入口へ、自動弁を備えたオゾン水供給配管を介してオゾン水を供給するオゾン水供給手段と；前記計量槽のオゾンガス流入口へ、オゾンガス供給配管を介して少なくとも大気圧以上の一定圧でオゾンガスを供給するオゾンガス供給手段と；前記計量槽のオゾンガス排出口から、オゾンガスを放出して前記計量槽の内圧を前記オゾンガス供給圧より低い所定の圧力に保つオゾンガス放出手段と；前記計量槽からオゾン水を排出するオゾン水排出手段と；を有することを特徴とする。
本発明のオゾン水供給装置には、計量槽のオゾン水の水位を検知するレベルセンサと、このレベルセンサの信号により前記オゾン水供給配管の自動弁を開閉して計量槽の水位を所定の範囲に維持する水位制御手段を設けることもできる。
One embodiment of the ozone water supply apparatus of the present invention comprises an ozone water inlet, an ozone gas inlet, an ozone gas outlet and an ozone water outlet; and an automatic valve to the ozone water inlet of the metering tank. ozone water supplied through a pipe ozone water supplying means and for supplying ozone water; the ozone inlet of the measuring tank, the ozone gas supply for supplying ozone gas in at least atmospheric pressure over a certain pressure through the ozone gas feed pipe Means; ozone gas discharge means for discharging ozone gas from the ozone gas discharge port of the metering tank to keep the internal pressure of the metering tank at a predetermined pressure lower than the ozone gas supply pressure; ozone water for discharging ozone water from the metering tank And a discharging means.
In the ozone water supply device of the present invention, a level sensor for detecting the level of ozone water in the measuring tank, and an automatic valve of the ozone water supply pipe is opened / closed by a signal from the level sensor to set the water level in the measuring tank within a predetermined range It is also possible to provide water level control means for maintaining
超純水としては、抵抗が１５ＭΩ・ｃｍ以上の超純水を使用することが好ましい。
本実施形態では、計量槽のオゾンガス流入口に、オゾナイザーで製造されたオゾンガスを供給するオゾンガス供給配管が直接接続されて、オゾナイザーのガス圧が計量槽内のオゾン水に直接加えられ、したがって、計量槽内に供給されたオゾン水は計量槽内でオゾン濃度がさらに上昇する。
As ultrapure water, it is preferable to use ultrapure water having a resistance of 15 MΩ · cm or more.
In the present embodiment, the ozone gas inlet of the measuring tank, the ozone gas supply pipe for supplying the produced ozone gas directly connected with the ozonizer, the gas pressure of the ozonizer is applied directly to the ozone water in the measuring tank, therefore, The ozone concentration of ozone water supplied into the measuring tank further increases in the measuring tank.
本発明によれば、オゾンガス供給手段のガス圧で、オゾン水がユースポイントに供給されるので、枚葉式洗浄装置にオゾン水を断続的に繰り返し供給する場合でも安定した濃度のオゾン水を常時一定圧力、一定流量で供給することができる。
また、計量槽内に直接オゾンガス供給手段のガス圧が加えられて液面からオゾンガスが溶解するため、液面からの蒸散によるオゾン濃度の低下がなく、高いオゾン濃度を維持することができ、常に一定した濃度のオゾン水を供給することができる。
さらに、オゾン水の供給に給水ポンプを使用しないので設備費用を低減することも可能である。
According to the present invention, a gas pressure of the ozone gas supplying means, since the ozone water is supplied to the use point, the ozonated water of a stable density even when intermittently repeated supplying ozone water into single wafer cleaning apparatus It can be supplied at a constant pressure and a constant flow rate.
Further, for dissolving ozone gas from the gas pressure is applied the liquid level of ozone directly gas supply means to the metering chamber, without a decrease in ozone concentration due to evaporation from the liquid surface, it is possible to maintain a high ozone concentration, A constant concentration of ozone water can always be supplied.
Furthermore, since a water supply pump is not used to supply ozone water, the equipment cost can be reduced.
オゾナイザー２は、ＧＲ−ＲＧ（住友精密工業社商品名）であり、ガス圧０．２ＭＰａ、ガス流量１４Ｌ／ｍｉｎ（Ｎ）、オゾン濃度２１０ｇ／ｍ３（Ｎ），（１４ｗｔ％）の性能を備えている。オゾナイザー２のオゾンガス供給配管２ａは分岐され、一方の分岐管２ａ１は継手４に接続され、他方の分岐管２ａ２は計量槽５のオゾンガス流入口に接続されている。Ｖ−１、Ｖ−２は、それぞれ分岐管２ａ１、２ａ２に設けたオゾンガスの開閉弁である。
計量槽のレベルは、Ｈレベルが下部から２００ｍｍ上、Ｌレベルが下部から２５０ｍｍとされ（有効量１０Ｌ）、この範囲でオゾン水のレベルが調節されている。
The ozonizer 2 is GR-RG (trade name of Sumitomo Precision Industries, Ltd.), and has the performance of gas pressure 0.2 MPa, gas flow rate 14 L / min (N), ozone concentration 210 g / m 3 (N), (14 wt%). I have. Ozone gas supply piping 2a of ozonizer 2 is branched, one branch pipe 2a1 is connected to the joint 4 and the other branch pipe 2a2 is connected to the ozone gas inlet of the measuring tank 5. V-1 and V-2 are ozone gas on-off valves provided in the branch pipes 2a1 and 2a2, respectively.
As for the level of the measuring tank, the H level is 200 mm above the bottom and the L level is 250 mm below the bottom (effective amount 10 L), and the level of the ozone water is adjusted within this range.
超純水供給装置３は、半導体工場で一般に使用されている標準的な超純水供給装置であり、電気抵抗率が１５ＭΩ・ｃｍ以上の超純水を、例えば１Ｌ／分で超純水配管３ａを介して継手４に供給し、この超純水は継手４で分岐管２ａ１から供給されるオゾンガスを微細気泡状に取り込んで、オゾン濃度１４０ｐｐｍ程度のオゾン水が生成される。
Ｖ−３は超純水配管３ａの開閉弁である。このオゾン水はオゾン水配管４ａを介して計量槽５のオゾン水流入口から計量槽５に注入される。Ｖ−４は、オゾン水配管に設けた自動弁である。
Ultrapure water feeder 3, a standard ultra pure water supply system is generally used in semiconductor factories, the electric resistivity is at least 15MΩ · cm ultrapure water, for example, ultrapure water pipe in 1L / min This ultrapure water is supplied to the joint 4 through 3a, and the ozone gas supplied from the branch pipe 2a1 is taken in the form of fine bubbles by the joint 4 to generate ozone water having an ozone concentration of about 140 ppm.
V-3 is an on-off valve for the ultrapure water pipe 3a. This ozone water is injected into the measuring tank 5 from the ozone water inlet of the measuring tank 5 through the ozone water pipe 4a. V-4 is an automatic valve provided in the ozone water pipe.
本実施例によれば、オゾナイザー２のガス圧で、オゾン水がユースポイントに供給されるので、枚葉式洗浄装置にオゾン水を断続的に繰り返し供給する場合でも安定した濃度のオゾン水を常時一定圧力で供給することができる。
また、計量槽５内に直接オゾンガス供給手段のガス圧が加えられて液面からオゾンガスが溶解するため、内圧を管理することにより、一定濃度のオゾン水を供給することができる。
According to the present embodiment, ozone water is supplied to the use point at the gas pressure of the ozonizer 2, so even when ozone water is intermittently repeatedly supplied to the single wafer cleaning device, the ozone water having a stable concentration is always supplied. It can be supplied at a constant pressure.
Further, for dissolving ozone gas from the gas pressure is applied the liquid level of ozone directly gas supply means to the measuring tank 5, by managing the internal pressure can be supplied to the ozonated water of a constant concentration.
１……オゾン水供給装置
２……オゾナイザー
２ａ…オゾンガス供給配管
３……超純水供給装置
４……継手
５……計量槽
６……オゾン水供給配管
８……循環配管
９……熱交換器
１０……放圧配管
1 ...... ozone water supply device 2 ...... ozonizer 2a ... ozone gas supply piping 3 ...... ultrapure water feeder 4 ...... joint 5 ...... measuring tank 6 ...... ozone water supply pipe 8 ...... circulation piping 9 ...... Heat exchanger 10 ... Pressure relief piping
Claims (1)
前記計量槽のオゾン水流入口へ、オゾン水供給配管を介してオゾン水を供給するオゾン水供給手段と；
前記計量槽のオゾンガス流入口へ、オゾンガス供給配管を介して少なくとも大気圧以上の一定圧でオゾンガスを供給するオゾンガス供給手段と；
前記計量槽のオゾンガス排出口からオゾンガスを放出して、前記計量槽の内圧を前記オゾンガス供給圧より低い所定の圧力に保つオゾンガス放出手段と；
前記計量槽からオゾン水を排出するオゾン水排出手段とを有することを特徴とするオゾン水供給装置。 A measuring tank equipped with an ozone water inlet, an ozone gas inlet, an ozone gas outlet and an ozone water outlet;
Ozone water supply means for supplying ozone water to the ozone water inlet of the measuring tank via an ozone water supply pipe;
To ozone inlet of the measuring tank, and ozone gas supply means for supplying ozone gas in at least atmospheric pressure over a certain pressure through the ozone gas feed pipe;
Ozone gas releasing means for releasing ozone gas from the ozone gas outlet of the metering tank and maintaining the internal pressure of the metering tank at a predetermined pressure lower than the ozone gas supply pressure;
An ozone water supply device comprising ozone water discharging means for discharging ozone water from the measuring tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009039144A JP5412135B2 (en) | 2009-02-23 | 2009-02-23 | Ozone water supply device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009039144A JP5412135B2 (en) | 2009-02-23 | 2009-02-23 | Ozone water supply device |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010199124A JP2010199124A (en) | 2010-09-09 |
| JP2010199124A5 true JP2010199124A5 (en) | 2012-03-29 |
| JP5412135B2 JP5412135B2 (en) | 2014-02-12 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009039144A Active JP5412135B2 (en) | 2009-02-23 | 2009-02-23 | Ozone water supply device |
Country Status (1)
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| JP (1) | JP5412135B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6059871B2 (en) * | 2011-12-20 | 2017-01-11 | 野村マイクロ・サイエンス株式会社 | Gas dissolved water manufacturing apparatus and gas dissolved water manufacturing method |
| KR101818048B1 (en) * | 2015-11-19 | 2018-02-22 | 에스케이하이닉스 주식회사 | Circulated Ozonate Water Generator |
| JP6640630B2 (en) * | 2016-03-25 | 2020-02-05 | 株式会社Ｓｃｒｅｅｎホールディングス | Substrate processing apparatus and substrate processing method |
| US11219868B2 (en) | 2017-06-07 | 2022-01-11 | Mitsubishi Electric Corporation | Device for cleaning and method for cleaning water treatment membrane, and water treatment system |
| CN112601720A (en) | 2018-08-29 | 2021-04-02 | Mks仪器公司 | Ozone water delivery system and method of use |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3332323B2 (en) * | 1996-10-29 | 2002-10-07 | オルガノ株式会社 | Cleaning method and cleaning device for electronic component members |
| JP2002066475A (en) * | 2000-08-25 | 2002-03-05 | Dainippon Screen Mfg Co Ltd | Substrate washing apparatus |
| JP2003236481A (en) * | 2002-02-14 | 2003-08-26 | Toshiba Corp | Washing method, washing apparatus, manufacturing method for semiconductor device, and manufacturing method for active matrix type display device |
| JP4077845B2 (en) * | 2005-03-18 | 2008-04-23 | セメス株式会社 | Functional water supply system and functional water supply method |
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2009
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