JP2010181601A - Filter for display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a filter for a display in which three items of transmittance, light-place contrast and a viewing angle can be made compatible while maintaining characteristics required as a display filter (electromagnetic wave shielding or the like) by a simple constitution as possible. <P>SOLUTION: In the filter for a display with a structure where a light gathering part having a plurality of convex lenses is formed at either face of an electromagnetic wave shielding member, and a light absorbing part in which an opening is formed at the optical axis position of each convex lens, and the part other than the opening part is provided with a light shielding part is formed at the other side of the electromagnetic wave shielding member, the filter for a display includes only one transparent base material, and lamination is performed in the order of the reflection prevention part, a light gathering part, an electromagnetic wave shielding member, a light absorbing part and an adhesion part in this order. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention is installed in front of the display and has the function of preventing the deterioration of the image quality due to the performance of the display, especially the contrast when the display is exposed to external light, and also prevents the reflection (antiglare property), the electromagnetic wave The present invention relates to a display filter having functions such as shielding, antifouling, scratch resistance, and near infrared light shielding.

  In recent years, thin and large-screen displays have rapidly expanded the market. Thin, large-screen displays include liquid crystal displays, plasma displays, rear projection televisions, and the like. Further, as next-generation displays, research on organic EL displays or FEDs (Field Emission Displays) is also progressing. Both displays have made remarkable progress in technology, and the drawbacks of each method have been resolved year by year, but the disadvantage of low contrast in bright rooms (light contrast) has much room for improvement in plasma displays. . Contrast is represented by the ratio of the brightness of white display to black display. The contrast in the absence of external light (dark place contrast) is high in displays such as self-luminous plasma displays, organic EL, and FED. This is because complete black display is possible by stopping the light emission.

  On the other hand, the photopic contrast is higher for liquid crystal displays. This is because an optical member that absorbs light, such as a color filter and a polarizing plate, is provided inside the display, and external light incident on the display is hardly emitted from the display surface again. In plasma displays, organic EL, and FED, there is generally no color filter or polarizing plate inside the display, and incident external light enters the display, is reflected by internal electrodes, and is emitted from the display surface again. Since the black display cannot be made, the bright place contrast is lowered.

  In recent years, a member called a light control member that suppresses the decrease in contrast caused by external light or has a function of controlling the viewing angle is combined with a member in which a plurality of light absorption parts are arranged in a stripe shape, or a combination of a light shielding part and a lens part. In addition, a display filter including the same or a display using the same is also proposed. (Patent Documents 1, 2, and 3)

JP 2003-0666206 A JP 2006-171712 A JP 2006-253332 A

  However, in the case of using the above-described light beam control member, there has been a problem of luminance reduction due to a decrease in light transmittance from the light emitting source side. Further, in order to suppress a decrease in contrast due to external light, it is necessary that the wide viewing angle of a display panel such as a plasma display is not impaired as much as possible. Further, while the display filter is required to be reduced in cost, the light control member of the prior art requires a high aspect ratio such that the aspect ratio exceeds 2, and thus requires a complicated manufacturing process. Therefore, the problems of the present invention are summarized in the following two points. The first problem is to increase the contrast in a bright place without reducing the brightness of the display panel and reducing the viewing angle. The second problem is to achieve the above-mentioned problem while maintaining the characteristics (such as electromagnetic wave shielding) necessary for a display filter with a simple configuration. The following measures have been taken in the prior art for these problems.

  In the proposal of Patent Document 1, the stripe-shaped two light control members are combined so that the stripes are perpendicular to increase the contrast in a bright place, and a part of the emitted light from the light emitting source side is put on the surface of the light absorbing portion. However, the effect is insufficient and the viewing angle is greatly limited. Further, the idea of the present invention has not been conceived. In the proposal of Patent Document 2, the present inventors have confirmed that the method described in the patent specification is effective in improving the contrast, but is insufficient for the light transmittance. Moreover, the idea of the present invention has not been conceived. Regarding the proposal of Patent Document 3, the inventors have confirmed that the method described in the patent specification is effective in improving the contrast, but is insufficient for the light transmittance. Moreover, the idea of the present invention has not been conceived.

The above object can be achieved by the present invention. That is:
(1) A condensing part having a plurality of convex lenses is formed on one surface of the electromagnetic wave shielding member, and an opening is formed on the other surface of the electromagnetic wave shielding member at the optical axis position of the convex lens, and light is shielded except for the opening. A filter for display including a structure in which a light absorbing portion having a portion is formed, having only one transparent base material, and an antireflection layer, a light collecting portion, an electromagnetic wave shielding member, a light absorbing portion, and an adhesive portion. A display filter characterized by being laminated in order.
(2) The display filter according to (1), wherein the antireflection layer has a convex shape that follows the shape of the convex lens.
(3) The display filter according to (2), wherein the convex shape is in the following range.

_{0.05 <(Z 1 / Y 1} ) <0.15
Here, the convex shape refers to a shape following the shape of the convex lens on the surface of the display filter, and Y ₁ is a direction orthogonal to the maximum length (X ₁ ) of the convex shape in a direction parallel to the transparent substrate surface. shows the maximum length of the convex shape, Z ₁ represents the total thickness of the thickness of the antireflection layer and the maximum thickness of the convex lens.
(4) The display filter according to (2) or (3), wherein the convex shape is in the following range.

1.0 ≦ (X ₁ / Y ₁ ) ≦ 1.5
Wherein, X ₁ is the maximum length in the direction of the convex shape parallel to the transparent substrate surface, Y ₁ indicates the maximum length in the direction of the convex shape which is orthogonal to X _1.
(5) The display filter according to any one of (1) to (4), wherein an area ratio of the opening to 100% of the area of the light absorbing portion is 40% to 70%.
(6) The display filter according to any one of (1) to (5), wherein the shape of the opening is in the following range.

1.3 ≦ (X ₂ / Y ₂ )
Here, X ₂ is the maximum length of the opening in a direction parallel to the transparent substrate surface, Y ₂ is shows the length of the opening in the direction perpendicular to the parallel and X ₂ in the transparent substrate surface.
(7) The display filter according to any one of (2) to (6), wherein the shape of the convex portion and the shape of the opening are in the following range.
1.3 ≦ (X ₂ / Y ₂ ) / (X ₁ / Y ₁ )
Wherein, X ₁ is the maximum length of the parallel direction of the convex shape on the transparent substrate surface, Y ₁ is the maximum length in the direction of the convex shape which is orthogonal to X _1, X ₂ parallel to the transparent substrate surface The maximum length of the opening in one direction, Y ₂ indicates the length of the opening in the direction parallel to the transparent substrate surface and perpendicular to X ₂ .
(8) the maximum length X ₁ in the direction parallel to the convex shape on the transparent substrate surface, the display filter according to any one of the at 40μm or 75μm or less (2) to (7).
(9) A condensing part having a plurality of convex lenses is formed on one surface of the electromagnetic wave shielding member, and an opening is formed on the other surface of the electromagnetic wave shielding member at the optical axis position of the convex lens, and light is shielded except for the opening. A method for manufacturing a display filter comprising a structure in which a light-absorbing part having a portion is formed, wherein an antireflection layer is formed on the light collecting part by wet coating.

  While maintaining the characteristics necessary for a display filter such as electromagnetic wave shielding and reflection prevention, the brightness of the display panel can be lowered and the contrast in a bright place can be increased without reducing the viewing angle with a simple configuration.

Example of sectional view of filter for display of the present invention Examples of the shape of the light collecting portion of the display filter of the present invention viewed from the viewing side, and the cross-sectional view of the antireflection layer and the light collecting portion The shape of the light absorption part of the display filter of the present invention viewed from the light source side Example of sectional view of filter for display of the present invention Examples of the shape of the condensing part of the display filter of the present invention viewed from the viewing side and the shape of the light absorption part viewed from the light emitting source side Example of manufacturing method of display filter of the present invention Example of manufacturing method of display filter of the present invention Example of the shape of the mold for forming the condensing part used in the examples Conceptual diagram of the exposure method used in the present invention Cross-sectional view of a display filter of a comparative example Cross-sectional view of a display filter of a comparative example Cross-sectional view of a display filter of a comparative example Cross-sectional view of a display filter of a comparative example Cross-sectional view of a display filter of a comparative example Cross-sectional view of a display filter of a comparative example Surface shape of light control member of display filter of comparative example Cross-sectional shape of light control member of display filter of comparative example Cross-sectional shape of display filter of comparative example

  Before describing specific embodiments, the mechanism of the present invention will be described. First, the reason why the above-mentioned first to second problems cannot be achieved with respect to the known technology will be considered.

  The light beam control member of Patent Document 1 is provided with a thick light absorption part along the light transmission direction, so that a light absorption part (external light) incident at a certain angle from the viewing side passes through the light transmission part. It is considered that the light is absorbed by entering the light absorbing portion when it enters the surface of the light control member. On the other hand, light emitted from a display panel such as a plasma panel display is emitted radially with a Lambertian distribution having a substantially uniform light amount distribution (light emission pattern). In the light beam control member of Patent Document 1, if there is a light absorbing portion along the transmission direction of light from the light source, the incident angle of light that can enter the light beam control member from the light source is limited, resulting in a significant loss. At the same time, the viewing angle on the viewer side is also limited. For this reason, if it is attempted to increase the contrast in a bright place, the light transmittance is reduced and the viewing angle is reduced, and the first problem described above cannot be achieved. Further, since it is necessary to provide a light absorbing portion along the light transmission direction, a molded body having a high aspect ratio is required, and in order to function as a display filter, an antireflection member, an electromagnetic wave shielding member, Since an infrared light shielding member is required, bonding is required, and the second problem cannot be achieved.

  In Patent Document 2 and Patent Document 3, the principle of expressing a light beam control function that shields external light incident from the viewing side is based on the use of a lens as a condensing unit on the light-emitting source side, and condensing light by the lens. By providing a light absorbing portion at a portion other than the portion where the optical path is narrowed, both absorption of external light and light transmission from the light source are attempted. Certainly, this structure can focus light well when the incident light from the emission source side is almost parallel (the incident light traveling direction is almost equal to the normal direction of the light control member), and has high light transmittance. And the outside light can be shielded by the light absorbing portion. However, as described above, the light emitted from a light source such as a plasma panel display has a Lambertian distribution in which the light amount distribution (light emission pattern) is substantially uniform. Difficult to do. Therefore, in the techniques of Patent Document 2 and Patent Document 3, most of the light incident on the light beam control member from the light source side is absorbed by the light absorption layer or scattered by the lens surface. The amount of light emitted from the member decreases, and as a result, the transmittance of the light beam control member decreases, and the first problem cannot be achieved. As a result, all of the first and second problems cannot be achieved by the known technology.

  Next, the reason why the present invention can solve the above first and second problems will be described. In the present invention, in order to adapt to the characteristics of light emitted from a display panel such as a plasma panel display, that is, radiant light, by providing a condensing part having a convex lens on the viewing side of the display, luminance in the front side of the viewing side is provided. And a wide incident angle was obtained by flattening the light source side. Next, on the opposite surface of the convex lens, an opening whose center coincides with the optical axis position of the convex lens is formed, and a light absorbing part having a light shielding part is formed on the other side, thereby shielding outside light while ensuring a wide viewing angle. Achieved. Further, an antireflection layer was formed on the surface of the convex lens of the light collecting portion, and the function of the antireflection member was integrated into the light collecting portion by using it on the surface of the display filter. Furthermore, a light collecting part having an antireflection layer formed on the surface of the convex lens is provided on one surface of the electromagnetic wave shielding member, and the light absorbing part is provided on the other surface, and the antireflection layer, the light collecting part, the electromagnetic wave shielding member, and the light absorption are provided. By laminating in the order of the part and the adhesive part, a function requiring three sheets of an antireflection or antireflection film, an electromagnetic wave shielding film, and a light beam control member can be formed on a single transparent substrate. Thereby, a significant reduction in cost due to the reduction of the transparent substrate, absorption by a plurality of transparent substrates, and a decrease in light transmittance due to reflection at the substrate interface can be reduced. The second task was achieved at the same time. The single transparent substrate may be used for any member such as an antireflection layer, a light collecting part, an electromagnetic wave shielding member, or a light absorbing part, but an electromagnetic wave shielding member is preferred.

Hereinafter, embodiments of the present invention will be specifically described. FIG. 1 shows an example of the display filter of the present invention. Therefore, it is not necessarily limited to this. FIG. 1 shows a state in which the display filter 1 is stuck on the glass 12 of the display panel via one surface of the adhesive portion 10. In the sectional view, the upper side is installed on the viewing side (viewed from the light collecting unit side with respect to the electromagnetic wave shielding member), and the lower side is installed on the light emitting source side (viewed from the adhesive unit side with respect to the electromagnetic wave shielding member). .
Here, the display filter is affixed to the glass surface of a display panel such as a plasma panel display or the glass surface installed with a space in front of it, shielding electromagnetic waves, shielding near infrared light, adjusting hue, reflecting It refers to a filter that has functions such as prevention, antifouling, scratch resistance, antistatic, in addition to improving contrast in bright places and controlling viewing angle. The display filter 1 includes an electromagnetic wave shielding member 6 in which an electrically conductive portion 4 is formed in a mesh shape on one surface of a transparent substrate 5, and a condensing portion 3 having a plurality of convex lenses 11 thereon, and a surface of the convex lens 11. Further, the antireflection layer 2 is formed following the concave-convex shape of the convex lens. The surface having this condensing part is on the viewing side of the display. Here, the antireflection layer follows the shape of the convex lens. The surface on the outermost layer side of the antireflection layer (the surface opposite to the side having the condensing part of the antireflection layer) follows the shape of the convex lens. As a result, the antireflection layer has a convex shape that follows the shape of the convex lens. When the thickness of the antireflection layer is sufficiently larger than the size of the convex lens, the surface on the outermost layer side of the antireflection layer (the surface opposite to the side having the condensing portion of the antireflection layer) is flat. The convex shape is no longer recognized.

  In addition, an opening 7 is formed at the optical axis position of the convex lens 11 on the other surface of the electromagnetic wave shielding member 6, and a light absorbing portion 8 having a light shielding portion 8 other than the opening is formed. 10 touches. Here, the convex lens is a lens having a positive focal length, and indicates a range in which a continuous curved surface is formed. Convex lenses include single-convex and bi-convex types, but single-convex lenses are preferable from the viewpoint of manufacturing suitability. Further, the shape includes a spherical surface, or an aspherical surface such as a hyperbolic surface, an elliptical surface, and a sinusoidal surface, and any of them may be used, and a spherical surface or an elliptical surface is preferable from the viewpoint of molding a convex lens. Moreover, a condensing part refers to the molded object containing the convex lens formed in the surface of the electromagnetic wave shielding member. Next, the electromagnetic wave shielding member means a member for shielding electromagnetic waves generated from the light emission source of the display panel, and refers to a member having an electrically conductive portion on a transparent substrate. Furthermore, the optical axis is a virtual light beam that is representative of the light beam passing through the convex lens, and indicates the rotationally symmetric axis of the convex lens.

FIG. 2 is a schematic diagram of the display filter 1 of the present invention shown in FIG. 1 as viewed from the observation direction 1 in FIG. 1, and a direction perpendicular to the maximum length (X ₁ ) of the convex shape. It is a figure of the cross section (aa 'cross section) in the position which shows the maximum length of a shape. In the schematic diagram, the condensing part 3 in which a plurality of convex lenses 11 are plane-filled is formed, and the electric conductive part 4 of the electromagnetic wave shielding member can be seen through the condensing part 3. In the cross-sectional view, the antireflection layer 2 is formed on the surfaces of the plurality of convex lenses 11. Here, the convex shape refers to irregularities caused by the convex lens on the surface of the display filter, and the irregularities are composed of a convex lens and an antireflection layer formed on the surface following the convex lens. Since the thickness of the antireflection layer is sufficiently smaller than the size of the convex lens, the size of the convex shape and the size of the convex lens are substantially the same. Further, plane filling is a kind of filling and refers to an operation of filling a plane with a polygon or the like without a gap. Although a slight gap can be provided between the convex lens 11 and the convex lens 11, the convex portion with respect to the area of the transparent substrate on the surface where the condensing portion is present from the viewpoint of securing the light transmittance from the light emitting source side. The proportion of the shape is preferably 75% or more, and more preferably 80% or more.

  The condensing unit 3 efficiently emits incident light that enters the display filter from the light source side to the viewer side, makes the in-plane contrast uniform, and eliminates periodic unevenness and patterns that occur on the screen surface. It is necessary to make the size of the opening formed on the source side uniform. For this reason, it is preferable that the shape of the several convex lens 11 formed in the condensing part 3 is a single shape. Here, the single shape means one kind of polygon having the same dimensions.

  The size of the convex lens constituting the light condensing unit is preferably as large as possible from the viewpoint of increasing the luminance, and as small as possible from the viewpoint of moire. Therefore, the maximum length of the convex lens in the direction parallel to the transparent substrate is desirably larger than 40 μm, and more desirably larger than 45 μm. Further, it is desirably smaller than 75 μm, and more desirably smaller than 70 μm.

The cross-sectional shape of the convex shape is preferably in the following range from the viewpoint of brightness, bright contrast, viewing angle, and prevention of reflection.
_{0.05 <(Z 1 / Y 1} ) <0.15
Here, Y ₁ represents the maximum length of the convex shape in the direction parallel to the transparent substrate in the section aa ′ in FIG. 2, and Z ₁ is the total thickness of the maximum thickness of the convex lens and the thickness of the antireflection layer. 2 and corresponds to the maximum length of the convex lens and the antireflection layer in the direction perpendicular to Y ₁ in the section aa ′ in FIG. When Z ₁ / Y ₁ is less than 0.05, the luminance, the contrast in the bright place, and the anti-reflection function are reduced, and when it is greater than 0.15, the viewing angle is reduced and the glare is deteriorated. Occurs.

The shape of the convex shape viewed from the viewing side is preferably a regular polygon or a shape obtained by slightly flattening the regular polygon from the viewpoint of the viewing angle, and the following range is desirable.
1.0 ≦ (X ₁ / Y ₁ ) ≦ 1.5
Wherein, X ₁ is the maximum length of the convex shape in a direction parallel to the transparent substrate, Y ₁ in the a-a 'cross section in FIG. 2, the largest direction of the convex shape parallel to the transparent substrate Indicates the length. The display filter of the present invention uses paste to be parallel to the direction in which the direction of the X ₁ is level at the time of installation of the display panel. Since X ₁ is the maximum length of the convex lens, the minimum value of (X ₁ / Y ₁ ) is 1. In addition, when (X ₁ / Y ₁ ) is larger than 1.5, moire tends to occur. The electrically conductive portion 4 is preferably formed in a mesh-like shape on the surface of the transparent base material 5. The thickness of this mesh is preferably smaller, and the mesh thickness is preferably 10 μm or less, more preferably 6 μm or less, Particularly preferred is 3 μm or less. When the thickness of the mesh exceeds the above range, the unevenness on the surface of the electrically conductive portion increases and the smoothness decreases, so the moldability of the light collecting portion deteriorates. The lower limit of the mesh thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more, from the viewpoint of electromagnetic shielding performance. The mesh line width and line interval (pitch) are preferably designed so that the aperture ratio is 70% or more, but the line width is preferably 5 to 40 μm, and the line interval (pitch) is 100 to 500 μm. A range is preferred.

FIG. 3 is a schematic view of the light absorbing portion 9 in the display filter of the present invention shown in FIG. 1 as viewed from the observation direction 2 in FIG. An opening 7 is formed at the optical axis position of the convex lens, and a light-shielding portion 8 is formed at other portions. Further, the mesh of the electromagnetic wave shielding part 4 is visible through the transparent base material 5 from the opening part 7. There is a preferred range for the optical density of the light-shielding part, preferably 1.0 or more, and more preferably 1.5 or more. When the optical density is lower than 1.0, the shielding of outside light becomes insufficient and the contrast ratio is lowered. Although there is no problem with the optical density being high, the upper limit is about 3 for realization. Here, the optical density is a reflection density or a reflection absolute density. This is a non-dimensional number representing the ratio of outgoing and incident light fluxes in the transmission of light energy inside and outside the object, and is expressed by the following equation.
D = −log ₁₀ R, R = (I ′ / I)
D: absolute reflection density, R: reflectivity I: intensity of incident light, I ′: intensity of reflected light In the present invention, the measurement is performed by an optical system based on the reflection optical density measurement of JIS B9622: 2000.

There is a preferable range in the area ratio of the light-shielding part to the opening part in the light absorption part, and the area ratio of the opening part in 100% of the area of the light absorption part is preferably 40% or more and less than 70%, 45% More than 65% is more preferable. When the area ratio of the opening is lower than this, the contrast ratio is improved, but the luminance is lowered. When the opening ratio is higher than this, the luminance is improved, but the contrast ratio is lowered.
There is a desirable range for the shape of the opening, and the following range is desirable.
1.3 ≦ (X ₂ / Y ₂ )
Here, X ₂ denotes the maximum length, Y ₂ is the length of the opening in the direction perpendicular to the parallel X ₂ a transparent substrate surface of the opening in a direction parallel to the transparent substrate surface. When (X ₂ / Y ₂ ) is smaller than 1.3, the viewing angle is reduced.

Further, the shape of the opening is more preferably in the following range.
1.3 ≦ (X ₂ / Y ₂ ) ≦ 5
When (X ₂ / Y ₂ ) is larger than 5, deterioration of moire, reduction of the viewing angle in the vertical direction, and reduction of luminance occur.

  FIG. 4 is a cross-sectional view of another example of the display filter of the present invention. In this configuration, the direction of the electromagnetic shielding member is reversed with respect to FIG. 1, and the light absorbing portion 9 is formed on the mesh of the electrically conductive portion 4 of the electromagnetic shielding member 6.

  FIG. 5 is another example of the display filter of the present invention, and is a schematic view of the display filter 1 of the present invention shown in FIG. 1 as viewed from the observation direction 1 and the observation direction 2 in FIG. A convex lens 11 and an opening 7 are formed at the optical axis position of the convex lens, and a light absorbing part having a light shielding part 8 is formed in the other part. “Different shapes” here means that the shape of the convex lens and the opening are not similar, that is, translation, mirroring around the origin, rotation around the origin, and enlargement / reduction around the origin. By combining the finite times, it means that the shapes cannot be matched.

As a combination of the shape of the convex lens and the shape of the opening, the values of (X ₂ / Y ₂ ) and (X ₁ / Y ₁ ) may be the same, but more preferably within the following range.
1.3 ≦ (X ₂ / Y ₂ ) / (X ₁ / Y ₁ )
Wherein, X ₁ is the maximum length of the parallel direction of the convex shape on the transparent substrate surface, Y ₁ is the maximum length in the direction of the convex shape perpendicular to the parallel X ₁ on the transparent substrate surface, X ₂ maximum length of the opening in a direction parallel to the transparent substrate surface, Y ₂ is shows the length of the opening in the direction perpendicular to the parallel X ₁ on the transparent substrate surface.
When the value of (X ₂ / Y ₂ ) / (X ₁ / Y ₁ ) is smaller than 1.3, the viewing angle is reduced.
Furthermore, the combination of the shape of the convex lens and the shape of the opening is preferably in the following range.
1.3 ≦ (X ₂ / Y ₂ ) / (X ₁ / Y ₁ ) ≦ 2.5
If the value of (X ₂ / Y ₂ ) / (X ₁ / Y ₁ ) is greater than 2.5, moire deteriorates.
The invention will be described element by element.

(1) Condensing part The condensing part can be made of a curable resin such as a resin, oligomer, monomer and mixture thereof, or a thermosetting composition that is cured by ionizing radiation such as ultraviolet rays or electron beams. . In particular, the ionizing radiation curable composition is preferable because it has a high curing rate and excellent productivity, and is excellent in durability to a coating composition and a solvent used for coating. The ionizing radiation curable composition may include, for example, an ionizing radiation curable resin, oligomer, monomer, and a mixture thereof. The above resin, oligomer, and monomer may include ethylenically unsaturated diene in the molecule. Those having a double bond are preferred. As the compound having an ethylenically unsaturated double bond in the molecule, preferably used as an ionizing radiation curable composition, specifically, a compound having 1 to 3 ethylenically unsaturated double bonds, 4 Although the compound etc. which have the above ethylenically unsaturated double bond can be mentioned, when the precision of a molded object, scratch resistance, etc. are considered, it is preferable to use polyfunctional acrylate as the main component.

  As such a polyfunctional acrylate, a monomer, oligomer, or prepolymer having 3 (more preferably 4, more preferably 5) or more (meth) acryloyloxy groups in one molecule is preferably used (however, In this specification, “... (Meth) acryl ...” is an abbreviation of “... acrie ... or ... metaacryl ...”.) Examples of such compounds include compounds in which the hydroxyl group of a polyhydric alcohol having 3 or more alcoholic hydroxyl groups in one molecule is an esterified product of 3 or more (meth) acrylic acids. it can.

  Specific examples include pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol tri (meth) acrylate, dipentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, di Use pentaerythritol hexa (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol triacrylate hexamethylene diisocyanate urethane prepolymer, pentaerythritol triacrylate toluene diisocyanate urethane prepolymer, pentaerythritol triacrylate isophorone diisocyanate urethane prepolymer, etc. be able to. These may be used alone or in combination of two or more. The use ratio of the monomer, oligomer or prepolymer having 3 or more (meth) acryloyloxy groups in one molecule is preferably 50 to 90% by mass, more preferably 50%, based on the light condensing part forming material. -80 mass%.

  As the light condensing part forming material, in addition to the above compounds, 1 to 2 ethylenic monomers per molecule are used for the purpose of relaxing the rigidity, relaxing the shrinkage during curing, or adjusting the viscosity of the coating liquid. It is preferable to use a monomer having an unsaturated double bond in combination. The monomer having 1 to 2 ethylenically unsaturated double bonds in one molecule can be used without particular limitation as long as it is a normal monomer having radical polymerizability. As the monomer having two ethylenically unsaturated double bonds in one molecule, the following (a) to (f) (meth) acrylates and the like can be used.

(A) (meth) acrylic acid diesters of alkylene glycol having 2 to 12 carbon atoms: ethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, Neopentyl glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, etc.
(B) (Meth) acrylate diesters of polyoxyalkylene glycol: diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, Polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, etc.
(C) Polyhydric alcohol (meth) acrylic acid diesters: pentaerythritol di (meth) acrylate, etc.
(D) (Meth) acrylic acid diesters of ethylene oxide and propylene oxide adducts of bisphenol A or bisphenol A hydride: 2,2′-bis (4-acryloxyethoxyphenyl) propane, 2,2′-bis ( 4-acryloxypropoxyphenyl) propane, etc.
(E) Two or more in a molecule obtained by reacting a terminal isocyanate group-containing compound obtained by reacting a diisocyanate compound and two or more alcoholic hydroxyl group-containing compounds in advance with an alcoholic hydroxyl group-containing (meth) acrylate. Urethane (meth) acrylates having a (meth) acryloyloxy group, and the like, and
(F) Epoxy (meth) acrylates having two or more (meth) acryloyloxy groups in the molecule obtained by reacting a compound having two or more epoxy groups in the molecule with acrylic acid or methacrylic acid.

  Monomers having one ethylenically unsaturated double bond in the molecule include methyl (meth) acrylate, ethyl (meth) acrylate, n- and i-propyl (meth) acrylate, n-, sec-, And t-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, methoxyethyl (meth) acrylate, ethoxyethyl (meth) acrylate, hydroxyethyl (meth) acrylate, Polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, glycidyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, N-hydroxyethyl (meth) acrylamide, N-vinylpyrrolidone, - vinyl-3-methylpyrrolidone, or the like can be used N- vinyl-5-methyl pyrrolidone. These monomers may be used alone or in combination of two or more. The use ratio of the monomer having 1 to 2 ethylenically unsaturated double bonds in one molecule is preferably 10 to 40% by mass, more preferably 20 to 40% with respect to the light condensing part forming material. % By mass.

  As the ionizing radiation used for curing the ionizing radiation curable composition preferably used for the light condensing part forming material, for example, when ultraviolet rays are used, the ionizing radiation curable composition contains a conventionally known photopolymerization initiator. Is preferred. The photopolymerization initiator is selected from those that generate radical species. As photopolymerization initiators, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyldimethyl ketal, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropane- 1-one, 4- (2-hydroxyethoxy) phenyl- (2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexyl-phenylketone, 1-phenyl-1,2-propanedione-2- (o-ethoxy) Carbonyl) oxime, 2-methyl- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1, Benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl Ether, benzoin isobutyl ether, benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4,4-dichlorobenzophenone, hydroxybenzophenone, 4-benzoyl-4'-methyl-diphenyl sulfide, alkylated benzophenone, 3,3 ' , 4,4′-tetra (t-butylperoxycarbonyl) benzophenone, 4-benzoyl-N, N-dimethyl-N- [2- (1-oxo-2-propenyloxy) ethyl] benzenemethananium bromide, (4-Benzoylbenzyl) trimethylammonium chloride, 2-hydroxy-3- (4-benzoylphenoxy) -N, N, N-trimethyl-1-propenaminium chloride monohydrate, 2-isopropylthioxanthone, 2,4- Dimethyl Oxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 2-hydroxy-3- (3,4-dimethyl-9-oxo-9H-thioxanthen-2-yloxy) -N, N, N-trimethyl- 1-propanaminium chloride, 2,4,6-trimethylbenzoylphenylphosphine oxide, 2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-tetraphenyl-1,2-bi Imidazole, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, methylphenylglyoxyester, η5-cyclopentadienyl-η6-cumenyl-iron (1 +)-hexafluorophosphate (1-), diphenyl sulfide derivative, bi (Η5-2,4-cyclopentadien-1-yl) -bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, thioxanthone, 2-methylthioxanthone, 2-chlorothioxanthone, 4-benzoyl-4-methylphenylketone, dibenzylketone, fluorenone, 2,3-diethoxyacetophenone, 2,2- Dimethoxy-2-phenyl-2-phenylacetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyldichloroacetophenone, benzylmethoxyethyl acetal, anthraquinone, 2-t-butylanthraquinone, 2-aminoanthraquinone, β -Chloranthra Non, anthrone, benzanthrone, dibenzsuberone, methyleneanthrone, 4-azidobenzalacetophenone, 2,6-bis (p-azidobenzylidene) cyclohexane, 2,6-bis (p-azidobenzylidene) -4-methylcyclohexanone, 2 -Phenyl-1,2-butadion-2- (o-methoxycarbonyl) oxime, 1,3-diphenylpropanetrione-2- (o-ethoxycarbonyl) oxime, naphthalenesulfonyl chloride, quinolinesulfonyl chloride, N-phenylthioacrylate Photoreductive properties such as Don, 4,4-azobisisobutyronitrile, benzthiazole disulfide, triphenylphosphine, carbon tetrabrominated, tribromophenylsulfone, benzoyl peroxide and eosin, methylene blue A combination of a coloring agent and a reducing agent such as ascorbic acid or triethanolamine can be used. In the present invention, one or more of these can be used. The photopolymerization initiator is preferably 0.05 to 20% by mass, more preferably 0.1 to 20% by mass in the total amount of the organic components excluding the solvent. By setting the addition amount of the photopolymerization initiator within this range, good photosensitivity can be obtained.

  A sensitizer can be used together with a photopolymerization initiator to improve sensitivity and to expand the effective wavelength range for the reaction. Specific examples of the sensitizer include 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2-isopropylthioxanthone, 2,3-bis (4-diethylaminobenzal) cyclopentanone, 2,6-bis ( 4-dimethylaminobenzal) cyclohexanone, 2,6-bis (4-dimethylaminobenzal) -4-methylcyclohexanone, Michler's ketone, 4,4-bis (diethylamino) benzophenone, 4,4-bis (dimethylamino) chalcone 4,4-bis (diethylamino) chalcone, p-dimethylaminocinnamylidene indanone, p-dimethylaminobenzylidene indanone, 2- (p-dimethylaminophenylvinylene) isonaphthothiazole, 1,3-bis (4 -Dimethylaminophenylvinylene) Isonaphtho Sol, 1,3-bis (4-dimethylaminobenzal) acetone, 1,3-carbonylbis (4-diethylaminobenzal) acetone, 3,3-carbonylbis (7-diethylaminocoumarin), triethanolamine, methyl Diethanolamine, triisopropanolamine, N-phenyl-N-ethylethanolamine, N-phenylethanolamine, N-tolyldiethanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl dimethylaminobenzoate, diethylamino Isoamyl benzoate, (2-dimethylamino) ethyl benzoate, ethyl 4-dimethylaminobenzoate (n-butoxy), 2-ethylhexyl 4-dimethylaminobenzoate, 3-phenyl-5-benzoylthiotetrazo Le, such as 1-phenyl-5-ethoxycarbonyl-thiotetrazole the like. In the present invention, one or more of these can be used. Some sensitizers can also be used as photopolymerization initiators. When adding a sensitizer, the addition amount is preferably 0.05 to 20% by mass, more preferably 0.1 to 20% by mass in the total amount of organic components excluding the solvent. By setting the addition amount of the sensitizer within this range, good photosensitivity can be obtained while maintaining the remaining ratio of the exposed portion.

  Further, the light condensing part forming material can contain a modifier. As modifiers, coatability improvers, antifoaming agents, thickeners, antistatic agents, inorganic particles, organic particles, organic lubricants, organic polymer compounds, UV absorbers, light stabilizers, dyes, Pigments, refractive index modifiers, stabilizers, and the like can be used, and these are used as composition components for coating layers that do not impair the reaction caused by actinic radiation or heat, and improve properties according to the application. be able to. As the light condensing part forming material of the present invention, a commercially available polyfunctional acrylic cured paint can be used. Such cured paints include Mitsubishi Rayon Co., Ltd. (trade name “Diabeam” series, etc.), Nagase Sangyo Co., Ltd. (trade name “Denacol” series, etc.), Shin Nakamura Co., Ltd. (trade name “NK Ester” series, etc.) ), Dainippon Ink and Chemicals Co., Ltd. (trade name “UNIDIC” series, etc.), Toa Synthetic Chemical Industries Co., Ltd. (trade name “Aronix” series, etc.), Nippon Oil & Fats Co., Ltd. (trade name “Blemmer” series, etc.) ), Nippon Kayaku Co., Ltd .; (trade name “KAYARAD” series, etc.), Kyoeisha Chemical Co., Ltd. (trade names “light ester” series, “light acrylate” series, etc.), JSR Corporation; (trade name “Desolite”) Series) and other products can be used.

(2) Light Absorbing Part The light absorbing part of the present invention is made by forming an opening and a light shielding part. As a method for forming the light shielding part, a method using a photocurable adhesive, a toner, a transfer film, or a method using a light solubilizing type photosensitive agent can be used. Is preferable because it is excellent in controlling the shape and forming a fine structure. The method of manufacturing the light-shielding portion using a light-solubilizing type photosensitizer includes a method of creating a light-soluble photosensitizer by adding a light-shielding material, and a method of forming a light-shielding portion from a non-light-shielding layer and a light-shielding layer. Although there are two types, the latter is preferable from the viewpoint of the shape of the light shielding part and the optical density of the light shielding part. Hereinafter, a method of forming the light shielding part from two layers, a non-light shielding layer and a light shielding layer, will be described.

  The non-light-shielding layer is a light-transmitting resin layer, and a photo-solubilizing type photosensitive agent (resin component) can be used. As a photo-solubilizing type photosensitizer, a mixture of a polymer as a main component and a substance that has an action of suppressing the solubility of the polymer in a solvent, and further loses the dissolution-inhibiting effect when irradiated with light, or Both conjugates can be used. For example, a mixture of o-naphthoquinonediazide and an alkali-soluble resin and those obtained by ester-bonding both can be used as a photo-solubilizing type photosensitizer. Among them, a system using a phenol novolac resin as an alkali-soluble resin is very suitable for the above purpose. In addition, a mixture of diazomel drum acid and phenol novolac resin, a mixture of diazomedone and polyvinylphenol, a mixture of o-nitrobenzyl carboxylic acid ester and acrylic acid-methyl methacrylate copolymer, and poly o-nitrobenzyl methacrylate Is suitable. Among the photosensitive polyimides, photosoluble polyimides include those obtained by introducing a photodegradable photosensitive group into a polyamic acid by an ester bond (for example, JP-A-1-61747), and a naphthoquinone diazide compound added to the polyamic acid. (For example, Proceedings of the Society of Polymer Science, Vol. 40, No. 3, 821 (1991)).

As the light shielding layer, a thin film in which a black coloring material is dispersed in a resin or the resin itself is dyed with a dye can be used. The black colorant dispersed in the resin has a wide wavelength range as a whole by mixing carbon powder with high light absorption ability, fine particles of metal oxide such as Ti, Cr, Ni, and pigments of R, G, B colors. What was prepared so that light shielding can be performed can be used. It is also possible to disperse a black dye in the resin.
The resin contained in the light-shielding layer is not particularly limited, but preferably includes an acrylic resin, a melamine resin, an epoxy resin, a polyimide resin known as a heat resistant resin, an aromatic polyamide resin, etc. that do not soften even at 200 ° C. or higher. Is suitable. As an acrylic resin, for example, as a main resin component, a low molecular weight polymer or oligomer such as polyester, epoxy, polyurethane, alkyd resin, spirane resin, or silicone resin is crosslinked with a so-called prepolymer in which acrylic acid, methacrylic acid or an ester group thereof is introduced. Examples of the agent include a system in which a polyfunctional reactant having two or more acrylic acid groups, methacrylic acid groups or ester groups thereof in a single molecule is added. In this case, it is effective to add a radical generator that generates radicals by heat or light as a reaction initiator as necessary. As a melamine resin, a system in which methylolated melamine is added as a crosslinking agent to a polymer having an OH group such as a phenol resin or an alkyd resin, and an acid generator by light or heat is added as an initiator is also effective.

  The thickness of the light shielding layer is preferably from 0.3 to 30 μm, and the optimum value can be determined from the applicability, pattern resolution, optical density, and the like. In addition to resins, dispersants, thixotropic agents, antifoaming agents, leveling agents, diluents, plasticizers, antioxidants, metal deactivators, coupling agents, fillers, conductivity You may mix | blend additives, such as particle | grains and a liquid repellency provision material.

(3) Transparent substrate A plastic film is used as the transparent substrate used in the display filter of the present invention. The plastic film is not particularly limited, and a plastic film composed of polyester, polyolefin, cyclic polyolefin, polyamide, triacetyl cellulose, acrylic, polyurethane, or the like can be preferably used, and a polyester film is particularly preferable. Although it does not specifically limit as polyester of a polyester film, A polyethylene terephthalate, a polyethylene naphthalate, a polypropylene terephthalate, a polybutylene terephthalate, a polypropylene naphthalate, etc. are mentioned, These 2 types or more may be mixed. In addition, polyesters obtained by copolymerizing these with other dicarboxylic acid components or diol components may be used. In this case, in a film in which crystal orientation is completed, the crystallinity is preferably 25% or more and 60% or less. More preferably, it is a plastic film of 30% to 60%, more preferably 35% to 55%. When the degree of crystallinity is less than 25%, dimensional stability and mechanical strength tend to be insufficient, and when it exceeds 60%, flexibility is insufficient and handling is difficult. The crystallinity can be obtained by a density gradient method (JIS-K7112 (1980)) or a Raman spectrum analysis method.

  When the above-described polyester is used as the plastic film, its intrinsic viscosity (measured in o-chlorophenol at 25 ° C. according to JIS K7367-5 (2000)) is 0.4 to 1.2 dl / g is preferable, and more preferably 0.5 to 0.8 dl / g. The plastic film used in the present invention may be a composite film having a laminated structure of two or more layers. As the composite film, for example, a composite film that is substantially free of particles in the inner layer portion and provided with a layer containing particles in the surface layer portion can be exemplified, and the inner layer portion and the surface layer portion are chemically separated. Different polymers or the same kind of polymers may be used. When used for a display which is the intended use of the present invention, it is preferable that the plastic film does not contain particles or the like from the viewpoint of optical properties such as transparency without internal scattering. The thickness of the plastic film is not particularly limited, but is preferably 10 to 500 μm, more preferably 20 to 300 μm, and particularly preferably 50 to 200 μm from the viewpoint of mechanical strength and handling properties.

  Furthermore, the plastic film as a transparent substrate is provided with a laminate of two or three layers by coextrusion as a composite film, or a coating layer such as slipperiness or antistatic property, particularly a transparent coating layer. May be.

  The plastic film may contain various additives, resin compositions, cross-linking agents and the like within a range that does not impair the effects of the present invention. For example, antioxidants, heat stabilizers, ultraviolet absorbers, organic and inorganic particles (for example, silica, colloidal silica, alumina, alumina sol, kaolin, talc, mica, calcium carbonate, barium sulfate, carbon black, zeolite, titanium oxide, Metal fine powders), pigments, dyes, antistatic agents, nucleating agents, acrylic resins, polyester resins, urethane resins, polyolefin resins, polycarbonate resins, alkyd resins, epoxy resins, urea resins, phenol resins, silicone resins, rubber resins , Wax composition, melamine crosslinking agent, oxazoline crosslinking agent, methylolated, alkylolized urea crosslinking agent, acrylamide, polyamide, epoxy resin, isocyanate compound, aziridine compound, various silane coupling agents, various titanates And the like can be mentioned system coupling agent.

  The plastic film used in the present invention has an undercoat layer (primer layer) for enhancing the adhesion (adhesion strength) with the above-described light absorbing portion, optical functional layer, electrical conductive portion, and near infrared shielding layer described later. It is preferable to provide it. The undercoating layer is preferably an in-line coating method applied during the formation of a plastic film from the viewpoint of economy, and may be selected from polyester copolymers, acrylic copolymers, various urethanes, melamines, polyamides, epoxies, etc. These can be added with a crosslinking agent or the like to impart properties such as improved adhesion and improved solvent resistance.

  In particular, when the display filter of the present invention is used for a plasma display, the plastic film preferably has an ultraviolet cut function in order to use a dye having a color correction function or a near infrared cut function. It is preferable to contain. Preferred examples of the ultraviolet absorber include salicylic acid compounds, benzophenone compounds, benzotriazole compounds, cyanoacrylate compounds, benzoxazinone compounds, cyclic imino ester compounds, triazine compounds, and the like. A benzoxazinone-based compound is most preferable from the viewpoints of ultraviolet cut ability at 380 nm to 390 nm, hue, and the like. These compounds may be used alone or in combination of two or more. Moreover, combined use of stabilizers, such as HALS (hindered amine light stabilizer) and antioxidant, is more preferable. Examples of the benzoxazinone-based compound which is a preferable material as an ultraviolet absorber include 2-p-nitrophenyl-3,1-benzoxazin-4-one and 2- (p-bezoylphenyl) -3,1- Benzoxazin-4-one, 2- (2-naphthyl) -3,1-benzoxazin-4-one, 2-2'-p-phenylenebis (3,1-benzoxazin-4-one), 2, Examples thereof include 2 ′-(2,6-naphthylene) bis (3,1-benzoxazin-4-one). The content of the compound acting as an ultraviolet absorber is preferably 0.5 to 5% by mass, more preferably 1 to 5% by mass in the plastic film.

  Moreover, in order to give further excellent light resistance to the display filter of the present invention, it is preferable to use a cyanoacrylate-based tetramer compound together with an ultraviolet absorber in the plastic film. The cyanoacrylate tetramer compound is preferably contained in the plastic film in an amount of 0.05 to 2% by mass. The cyanoacrylate-based tetramer compound is a compound based on a tetramer of cyanoacrylate, such as 1,3-bis (2′cyano-3,3-diphenylacryloyloxy) -2, 2-bis-. (2 ′ cyano-3,3-diphenylacryloyloxymethylpropane) and the like can be exemplified. When the cyanoacrylate-based tetramer compound and the ultraviolet absorber are used in combination, the aforementioned ultraviolet absorber is preferably contained in the plastic film in an amount of 0.3 to 3% by mass. The plastic film used for the display filter according to the present invention with the addition of the above-mentioned ultraviolet absorber preferably has a transmittance at a wavelength of 380 nm of 5% or less, more preferably 3% or less, whereby the display of the present invention. In particular, when the filter is applied to a member for a plasma display, a plastic film or a dye pigment can be protected from ultraviolet rays.

(4) Adhesive part The filter for display of this invention has an adhesive part in the outermost part by the side of this light absorption part with respect to a transparent base material. The adhesive portion can be provided with a near-infrared shielding function, a hue adjustment function, a refractive index adjustment function, a refractive index adjustment function, and a visible light transmittance adjustment function. An adhesive or an adhesive can be used for the adhesive part. Examples of the adhesive material include acrylic, silicone, urethane, polyvinyl butyral, and ethylene-vinyl acetate. Adhesives include bisphenol A type epoxy resins, tetrahydroxyphenylmethane type epoxy resins, novolac type epoxy resins, resorcin type epoxy resins, polyolefin type epoxy resins and other epoxy resins, natural rubber, polyisoprene, poly-1, 2- (Di) enes such as butadiene, polyisobutene, polybutene, poly-2-heptyl-1,3-butadiene, poly-1,3-butadiene, polyoxyethylene, polyoxypropylene, polyvinyl ethyl ether, polyvinyl hexyl ether, etc. Polyesters such as polyethers, polyvinyl acetate, polyvinyl propionate, polyurethane, ethyl cellulose, polyvinyl chloride, polyacrylonitrile, polymethacrylonitrile, polysulfone, phenoxy resin Etc.

  It is a preferred embodiment to impart an impact mitigating function for protecting the display from impact to the adhesive part A for attaching the display filter to the display. In order to impart an impact relaxation function to the adhesive part A, the thickness of the adhesive part A is preferably 50 μm or more, and more preferably 100 μm or more. The upper limit thickness is preferably 2000 μm or less in consideration of the coating suitability of the adhesive part A.

  The near-infrared shielding function is preferably adjusted so that the maximum value of light transmittance in the wavelength range of 800 to 1100 nm is 15% or less. The near-infrared shielding function may be imparted by kneading a near-infrared absorbing dye or pigment into a plastic film, or a near-infrared shielding layer may be newly provided. Or you may give a near-infrared shielding function to an adhesion part. The near-infrared shielding function can be imparted by using a near-infrared absorbing dye or pigment, or by providing a layer that reflects near-infrared light by metal free electrons such as a conductive thin film. In the present invention, a near-infrared shielding layer formed by applying and drying a paint in which a near-infrared absorbing dye or pigment is dispersed or dissolved in a resin binder is used, or the above-mentioned near-infrared absorbing dye or pigment is contained in the adhesive portion. Embodiments are preferably used. Examples of the near infrared absorbing dye include dyes such as phthalocyanine compounds, anthraquinone compounds, dithiol compounds, and diimonium compounds.

  The hue adjustment function is a function for improving color purity and whiteness by absorbing light of a specific wavelength emitted from the display. In particular, it is preferable to shield orange light that reduces the color purity of red light emission, and it is preferable to include a dye having an absorption maximum in a wavelength range of 580 to 620 nm. Furthermore, it is preferable to contain a dye having an absorption maximum at a wavelength of 480 to 500 nm in order to improve whiteness. For the hue adjustment function, a layer containing a dye that absorbs light having the above-described wavelength may be newly provided, or a dye may be contained in the above-described near-infrared shielding layer or adhesive portion.

The refractive index adjustment function is used to reduce optical loss due to light scattering between members when the display filter is bonded to the display glass, or to adjust the refraction angle at the surface of the condensing part. It is a function to adjust appropriately. The material used for this can be composed of an organic material such as a fluorine-containing polymer, a partially fluorinated alkyl ester of (meth) acrylic acid, a fully fluorinated alkyl ester, or a fluorine-containing silicone on the low refractive index side. On the high refractive index side, organic materials such as those obtained by polymerizing and curing urethane (meth) acrylate, polyester (meth) acrylate, etc., or those obtained by crosslinking and curing silicone-based, melamine-based, and epoxy-based crosslinkable resin materials It can be made of a system material, indium oxide as a main component and containing a small amount of titanium dioxide or the like, or Al ₂ O ₃ , MgO, TiO ₂ or the like. The visible light transmittance adjusting function is a function for adjusting the visible light transmittance, and can be adjusted by containing a dye or a pigment.

(5) Antireflection layer The antireflection layer refers to a layer having an antireflection function provided on a convex lens, and prevents reflection or reflection of external light such as a fluorescent lamp that affects display image display. Is. The antireflection layer may also have a layer having antiglare, scratch resistance and antifouling functions. These layers may be a single layer having these functions or a plurality of layers. The antireflection layer preferably has a surface luminous reflectance of 5% or less, more preferably 4% or less, and particularly preferably 3% or less. The luminous reflectance has no particular lower limit, and is most preferably 0%, but the luminous reflectance is about 0.05%. Here, the luminous reflectance is a luminous reflectance (Y) calculated according to the CIE1931 system by measuring the reflectance in the visible region wavelength (380 to 780 nm) using a spectrophotometer or the like.

As such an antireflection layer, it is preferable to use a layer in which two or more layers of a high refractive index layer and a low refractive index layer are laminated so that the low refractive index layer is on the viewing side. In such a configuration, the high refractive index layer and the low refractive index layer may be laminated by multiple coatings, but the low refractive index layer derived from the silica particles that have undergone the fluorine treatment step and the high refractive index layer are mixed. You may use the method of isolate | separating into 2 layers in the drying process after apply | coating 1 liquid coating composition once. The refractive index of the high refractive index layer is preferably in the range of 1.5 to 1.7, particularly preferably in the range of 1.55 to 1.69. The refractive index of the low refractive index layer is preferably in the range of 1.25 to 1.49, particularly preferably in the range of 1.3 to 1.45. Materials for forming the high refractive index layer include those obtained by polymerizing and curing urethane (meth) acrylate, polyester (meth) acrylate, etc., or those obtained by crosslinking and curing a silicone-based, melamine-based, or epoxy-based crosslinkable resin material. And organic materials such as indium oxide containing titanium oxide as a main component, or inorganic materials such as Al ₂ O ₃ , MgO, and TiO ₂ . Among these, organic materials are preferably used.

  Hereinafter, preferred embodiments of the high refractive index layer of the present invention will be described. In the present invention, the high refractive index layer is a single or mixed resin component such as acrylic resin, urethane resin, melamine resin, organic silicate compound, silicone resin, phosphorus-containing resin, sulfide-containing resin, halogen-containing resin. Although it can be used in a system, it is particularly preferable to use a silicone resin or an acrylic resin from the viewpoint of hardness and durability. Furthermore, from the viewpoint of curability, flexibility, and productivity, an active energy ray-curable acrylic resin or a thermosetting acrylic resin is preferable. In particular, a (meth) acrylate-based resin is preferable because radical polymerization easily occurs upon irradiation with active energy rays and the solvent resistance and hardness of the formed film are improved. Examples of such (meth) acrylate resins include pentaerythritol tri (meth) acrylate, trimethylolpropane tri (meth) acrylate, glycerol tri (meth) acrylate, ethylene-modified trimethylolpropane tri (meth) acrylate, and tris- (2- 4 such as trifunctional (meth) acrylate such as hydroxyethyl) -isocyanuric acid ester tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, etc. Examples include functional (meth) acrylates and the like.

  In the high refractive index layer, a (meth) acrylate compound (monomer) having an acidic functional group such as a carboxyl group, a phosphoric acid group, or a sulfonic acid group can be used. Specifically, unsaturated functional carboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, 2- (meth) acryloyloxyethyl succinic acid, 2- (meth) acryloyloxyethylphthalic acid, mono Examples include (2- (meth) acryloyloxyethyl) acid phosphate, diphenyl-2- (meth) acryloyloxyethyl phosphate, phosphoric acid (meth) acrylic acid ester, 2-sulfoester (meth) acrylate, and the like. In addition, a (meth) acrylate compound having a polar bond such as an amide bond, a urethane bond, or an ether bond can be used.

  The high refractive index layer may contain an initiator in order to advance curing of the applied resin component. As the initiator, the applied resin component initiates or accelerates polymerization and / or crosslinking reaction by radical reaction, anion reaction, cation reaction, etc., and various photopolymerization initiators can be used. Specific examples of such photopolymerization initiators include sulfides such as sodium methyldithiocarbamate sulfide, diphenyl monosulfide, dibenzothiazoyl monosulfide and disulfide, thioxanthone, 2-ethylthioxanthone, 2-chlorothioxanthone, Thioxanthone derivatives such as 2,4-diethylthioxanthone, azo compounds such as hydrazone and azobisisobutyronitrile, diazo compounds such as benzenediazonium salt, benzoin, benzoin methyl ether, benzoin ethyl ether, benzophenone, dimethylaminobenzophenone Michler's ketone, benzylanthraquinone, t-butylanthraquinone, 2-methylanthraquinone, 2-ethylanthraquinone, 2-aminoanthraquinone, Aromatic carbonyl compounds such as -chloroanthraquinone, dialkylaminobenzoic acid esters such as methyl p-dimethylaminobenzoate, ethyl p-dimethylaminobenzoate, butyl D-dimethylaminobenzoate, isopropyl p-diethylaminobenzoate, Peroxides such as benzoyl peroxide, di-t-butyl peroxide, dicumyl peroxide, cumene hydroperoxide, 9-phenylacridine, 9-p-methoxyphenylacridine, 9-acetylaminoacridine, benzacridine, etc. Acridine derivatives, phenazine derivatives such as 9,10-dimethylbenzphenazine, 9-methylbenzphenazine, 10-methoxybenzphenazine, and 6,4 ′, 4 ″ -trimethoxy-2,3-diphenylquinoxaline Quinoxaline derivatives, 2,4,5-triphenylimidazolyl dimer, 2-nitrofluorene, 2,4,6-triphenylpyrylium tetrafluoride boron salt, 2,4,6-tris (trichloromethyl) ) -1,3,5-triazine, 3,3′-carbonylbiscoumarin, thiomichler ketone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, oligo (2-hydroxy-2-methyl-1- ( 4- (1-methylvinyl) phenyl) propanone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone, and the like.

In the high refractive index layer, an amine compound may coexist in the photopolymerization initiator in order to prevent a decrease in sensitivity due to oxygen inhibition of the initiator. Such an amine compound is not particularly limited as long as it is a non-volatile compound such as an aliphatic amine compound or an aromatic amine compound. For example, triethanolamine, methyldiethanolamine and the like are suitable. The high refractive index layer may contain metal oxide fine particles. This provides an antistatic effect. As the metal oxide fine particles, tin-containing antimony oxide (ATO) particles, zinc-containing antimony oxide particles, tin-containing indium oxide (ITO) particles, zinc oxide / aluminum oxide particles, antimony oxide particles, and the like are preferable, and tin-containing oxidation is more preferable. Indium (ITO) particles and tin-containing antimony oxide (ATO) particles.
Such metal oxide particles have an average particle size (JIS Z8819-1: 1999 and Z8819) calculated from a sphere equivalent diameter distribution based on a non-surface area (JIS R1626: 1996) measured by a BET method. −2: 2001)) is preferably 0.5 μm or less, more preferably 0.001 to 0.3 μm, still more preferably 0.005 to 0.2 μm. It is done. When the average particle diameter exceeds 0.5 μm, the transparency of the high refractive index layer may be lowered. Further, although the average particle system is preferably as small as possible, when it is less than 0.001 μm, the particles are likely to aggregate and the haze value may increase. The content of the metal oxide particles is preferably in the range of 0.1 to 20% by mass with respect to 100% by mass of the resin component constituting the high refractive index layer. Furthermore, the high refractive index layer can contain various additives such as a polymerization inhibitor, a curing catalyst, an antioxidant, and a dispersant. The thickness of the high refractive index layer is preferably in the range of 0.01 to 20 μm, and more preferably in the range of 0.01 to 10 μm.

The low refractive index layer constituting the antireflection layer is made of a fluorine-containing polymer, a partially fluorinated alkyl ester of (meth) acrylic acid or a fully fluorinated alkyl ester, an organic material such as fluorine-containing silicone, MgF ₂ , CaF ₂ , SiO It can be composed of an inorganic material such as ₂ . Hereinafter, preferred embodiments of the low refractive index layer will be exemplified. As one preferred embodiment of the low refractive index layer, a method of forming a thin film such as MgF ₂ or SiO ₂ by a vapor phase method such as vacuum deposition, sputtering, or plasma CVD, or a sol solution containing a SiO ₂ sol from SiO ₂ Examples thereof include a method for forming a gel film. As another preferred embodiment of the low refractive index layer, a constitution mainly composed of a siloxane polymer bonded to silica-based fine particles can be employed. The term “bond” as used herein means a state in which the silica component of the silica-based fine particles and the siloxane polymer in the matrix are reacted and homogenized. A siloxane polymer formed by combining with silica-based fine particles forms a silanol compound once by a hydrolysis reaction with an acid catalyst in a solvent in the presence of the silica-based fine particles, using a known condensation reaction. It can be obtained by using it. The polyfunctional silane compound preferably includes a polyfunctional fluorine-containing silane compound from the viewpoint of low refractive index and antifouling properties, and includes trifluoromethylmethoxysilane, trifluoromethylethoxysilane, and trifluoropropyltrimethoxy. Trifunctional fluorine-containing silane compounds such as silane, trifluoropropyltriethoxysilane, heptadecafluorodecyltrimethoxysilane, tridecafluorooctyltrimethoxysilane, heptadecafluorodecyltriethoxysilane, tridecafluorooctyltriethoxysilane, Examples include bifunctional fluorine-containing silane compounds such as heptadecafluorodecylmethyldimethoxysilane, all of which are preferably used. From the viewpoint of surface hardness, trifluoromethylmethoxysilane, trifluoro Chill silane, trifluoropropyl trimethoxy silane, trifluoropropyl triethoxy silane, more preferably. As the polyfunctional silane compound, a polyfunctional fluorine-free silane compound can be used. Examples of such polyfunctional fluorine-free silane compounds include vinyltrimethoxysilane, vinyltriethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane, methyltrimethoxysilane, and methyltriethoxy. Silane, hexyltrimethoxysilane, octadecyltrimethoxysilane, octadecyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, 3-aminopropyltriethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxy Trifunctional silanes such as silane, 3-chloropropyltrimethoxysilane, 3- (N, N-diglycidyl) aminopropyltrimethoxysilane, 3-glycidoxysipropyltrimethoxysilane Compound, dimethyldimethoxysilane, dimethyldiethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, methylphenyldimethoxysilane, methylvinyldimethoxysilane, methylvinyldiethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-amino Propylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropylmethyldiethoxysilane, cyclohexylmethyldimethoxysilane, 3-methacryloxypropyldimethoxy Bifunctional silane compounds such as silane and octadecylmethyldimethoxysilane, tetrafunctional silane compounds such as tetramethoxysilane and tetraethoxysilane, etc. All of these are preferably used. From the viewpoint of surface hardness, vinyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, phenyltrimethoxysilane, and phenyltriethoxysilane are preferable. More preferable.

  The silica-based fine particles are preferably silica-based fine particles having an average particle size of 1 nm to 200 nm, and particularly preferably an average particle size of 1 nm to 70 nm. When the average particle diameter is less than 1 nm, the bond with the matrix material becomes insufficient and the hardness may be lowered. On the other hand, if the average particle diameter exceeds 200 nm, the generation of voids between particles caused by introducing a large amount of particles is reduced, and the effect of lowering the refractive index may not be sufficiently exhibited. Further, among these silica-based fine particles, those having a structure having a cavity inside are particularly preferably used in order to lower the refractive index. Examples of such silica-based fine particles having cavities therein include silica-based fine particles having a hollow portion surrounded by an outer shell, porous silica-based fine particles having a large number of hollow portions, and the like. As such an example, for example, it can be produced by the method disclosed in Japanese Patent No. 3272111, and the volume occupied by the cavities inside the fine particles, that is, the porosity of the fine particles is preferably 5% or more, more preferably 30% or more. preferable. The porosity can be measured using, for example, a mercury porosimeter (trade name: Bore Sizer 9320-PC2, manufactured by Shimadzu Corporation). Further, the refractive index of the fine particles themselves is preferably 1.20 to 1.40, more preferably 1.20 to 1.35. Examples of such silica-based fine particles include those disclosed in Japanese Patent Application Laid-Open No. 2001-233611, and those commercially available such as Japanese Patent No. 3272111. The thickness of the low refractive index layer is preferably in the range of 0.01 to 1 μm, and more preferably in the range of 0.02 to 0.5 μm.

  In the present invention, various additives can be further blended in the antireflection layer as required, as long as the effects of the present invention are not impaired. For example, stabilizers such as antioxidants, light stabilizers, ultraviolet absorbers, surfactants, leveling agents, antistatic agents, and the like can be used. As the silicone-based leveling agent, those having polydimethylsiloxane as a basic skeleton and having a polyoxyalkylene group added are preferable, and dimethylpolysiloxane-polyoxyalkylene copolymer (for example, SH190 manufactured by Toray Dow Corning Co., Ltd.) is preferable. It is. Moreover, when providing a laminated film further on a hard-coat layer, it is preferable to apply the acrylic leveling agent which does not inhibit adhesiveness. As such a leveling agent, “ARUFON-UP1000 series, UH2000 series, UC3000 series (trade name): manufactured by Toa Gosei Chemical Co., Ltd.) and the like can be preferably used. The amount of the leveling agent added is a hard coat forming composition. It is desirable to set it as the range of 0.01-5 mass% with respect to the total amount.

(6) Electromagnetic wave shielding member and electric conductive part The electromagnetic wave shielding member is a member for shielding an electromagnetic wave generated from the display, and is made of an electric conductive oxide, an electric conductive polymer, such as a metal thin film or a conductive mesh. It is obtained by providing a conductive part on a transparent substrate. The surface resistance value of the electrically conductive portion is preferably lower, preferably 10Ω / □ or less, more preferably 5Ω / □ or less, and particularly preferably 3Ω / □ or less. The lower limit of the sheet resistance is about 0.01Ω / □. The sheet resistance value of the electromagnetic wave shielding member can be measured by a four-terminal method.
In the present invention, a conductive mesh is preferably used as the electrically conductive portion. The conductive mesh has an advantage that a low sheet resistance value can be obtained as compared with a metal thin film formed by a sputtering method, a vacuum deposition method, or the like or an electrically conductive portion made of a conductive filler and a resin binder. In particular, it is difficult to obtain a surface resistance value in an electrically conductive part composed of a conductive filler and a resin binder, so a large-scale apparatus is required to form a metal thin film by sputtering or vacuum deposition, and high productivity. There is a problem that cannot be obtained.

  Moreover, when forming a condensing part or a light absorption part on an electroconductive mesh, from the viewpoint of a moldability and coating property, the smaller one of the thickness of an electroconductive mesh is preferable, and the thickness of an electroconductive mesh is 10 micrometers. Or less, more preferably 6 μm or less, and particularly preferably 3 μm or less. If the thickness of the conductive mesh exceeds 10 μm, the unevenness on the surface of the electrically conductive portion increases and the smoothness decreases, so that the moldability and coating property deteriorate. The lower limit of the thickness of the conductive mesh is preferably 0.1 μm or more, more preferably 0.2 μm or more from the viewpoint of electromagnetic shielding performance. The line width and line interval (pitch) of the conductive mesh are designed so that the aperture ratio is 70% or more, but the line width is preferably 5 to 40 μm, and the line interval (pitch) is in the range of 100 to 500 μm. Is preferred.

  From the above viewpoint, as a method for forming a conductive mesh suitable for the electric conductive portion of the present invention, 1) a method of etching a metal thin film, and 2) a conductive mesh is directly formed on a substrate such as a plastic film by printing. Examples thereof include 3) a method using a photosensitive silver salt, 4) a method of developing after laminating a metal film on a print pattern, and 5) a method of laser ablating a metal thin film.

  Examples of the mesh pattern of the conductive mesh that can be used in the present invention include a lattice pattern, a pentagonal or more polygonal pattern, a circular pattern, or a composite pattern thereof, and a random pattern is also preferably used. In the present invention, the conductive mesh is preferably blackened. The blackening treatment can be performed by oxidation treatment or black printing. For example, the methods described in JP-A-10-41682, JP-A-2000-9484, 2005-317703 and the like can be used. The blackening treatment is preferably performed on the surface and both side surfaces of the conductive mesh on the visual recognition side, and it is further preferable to blacken both surfaces and both side surfaces of the conductive mesh.

(7) Manufacturing Method Next, an example of the manufacturing method of the display filter of the present invention will be described, but the present invention is not limited to this method. One example of the method for producing a display filter of the present invention comprises the following four steps.
1. 1. forming a condensing part on one surface of the electromagnetic wave shielding member 2. forming a light shielding layer and a non-light shielding layer on the other surface of the electromagnetic wave shielding member; Step of forming a light absorption part 4. 4. Applying an antireflection layer Steps for Forming the Adhesive Portion The above four steps will be described with reference to FIGS.
1. In this process, molding is performed using a so-called 2P method. First, the electromagnetic wave shielding member 13 shown in FIG. 6-A is prepared. This is one in which the electrically conductive portion 15 is provided on one surface of the transparent substrate 14 and is available from a plurality of manufacturers. Next, in FIG. 6-B, the condensing part forming material 16 is applied to the surface of the electromagnetic wave shielding member having the electrically conductive part 15, and this is pressed against the mold 17 of FIG. 6-C. By irradiating the UV light 18 from the base material side with the mold 17, the condensing part forming material 16 is cured, and after the curing, it is peeled off from the mold 17 to obtain the condensing part 19 of FIG. The mold 17 can be manufactured by machining, electroforming, etching, the PDMS method, or the like. Further, in order to ensure releasability from the mold, surface treatment may be appropriately performed. The thickness of the condensing part obtained in this step is adjusted by the supply amount of the condensing part forming material, the pressing pressure of the mold and the tension of the transparent substrate on the mold.

  2. This step is performed using a coating and drying process (wet coating process). As shown in FIG. 6-F, the light shielding layer 20 is applied and dried on the other surface of the electromagnetic wave shielding member 13 on which the light collecting portion 19 is formed on one surface. Next, as shown in FIG. 6-G, the non-light shielding layer 21 is coated on the light shielding layer 20 and dried. As the coating and drying process, the methods described in “Coating”, edited by the Processing Technology Research Group, and the Processing Technology Research Group (2002) can be referred to. As a coating apparatus for forming the light shielding layer and the non-light shielding layer, for example, various blade coaters, roll coaters, bar coaters, rod blade coaters, curtain coaters, gravure coaters, extrusions are provided so that an accurate coating amount can be obtained. (Described in U.S. Pat. No. 2,681,294) Various coating apparatuses such as a coater using a method are appropriately selected and used. In particular, from the viewpoint of coating accuracy, a coater using an extrusion method is preferable. As the drying device, a drying device using hot air or infrared rays is appropriately selected and used.

  3. The process of 2. The light-shielding layer and the non-light-shielding layer formed in this step are subjected to a photoresist exposure and development process. In this step, an opening having a shape different from the shape of the convex lens is formed by exposing UV light including light inclined with respect to the optical axis of the convex lens. One such method is shown in FIG. The parallel parallel UV light 22 in FIG. 7-H is then tilted with respect to the optical axis as shown in FIGS. 7-I and J from the light collecting unit 19 side toward the light-shielding layer 20 and the non-light-shielding layer 21. This is achieved by exposing UV light 22. At this time, the shape of the opening can be freely controlled by the inclination angle of the convex lens with respect to the optical axis, the inclination direction, the number of exposure steps, and the distribution of the exposure amount at each step. As another method, UV light including a component parallel to the optical axis and a tilted component can be exposed once. When performing exposure of a large area, it is possible to expose a large area with an exposure machine having a small exposure area by performing exposure while carrying. Next, after the exposure to ultraviolet light, the light-sensitive layer and the non-light-shielding layer forming step are subjected to a development treatment of the photosensitive resin layer with an organic solvent or an alkaline aqueous solution, as shown in FIG. The opening 23 is formed at the 19 focal positions, and the light absorbing portion 24 is completed. The development process is performed using the difference in solubility between the exposed part and the unexposed part in the developer. In this case, the development process is performed by an immersion method, a spray method, or a brush method. The developer used for the development treatment is preferably water as a main component from the viewpoint of cost and environmental load. As the alkaline aqueous solution, an inorganic alkaline aqueous solution such as sodium hydroxide, sodium carbonate or calcium hydroxide aqueous solution, or an organic alkaline aqueous solution comprising an amine compound such as tetramethylammonium hydroxide, trimethylbenzylammonium hydroxide, monoethanolamine or diethanolamine is used. May be. The density | concentration of aqueous alkali solution is 0.05-5 mass% normally, More preferably, it is 0.1-1 mass%. If the alkali concentration is too low, the soluble portion is not removed, and if the alkali concentration is too high, the light shielding portion may be peeled off. The development temperature during development is preferably 20 to 40 ° C. in terms of process control.

  4). As shown in FIG. The antireflection layer 25 is provided on the surface of the light collecting portion 19 formed in the process. The antireflection layer can be formed by the wet coating process described above or a dry coating process such as CVD, sputtering, vacuum deposition, etc., but the wet coating process is desirable from the viewpoint of manufacturing cost.

  5. First, the process of 4. The adhesive portion 26 is provided on the surface of the non-light-shielding layer 21 formed in the step. This method may be a sticking of an adhesive film or a coating / drying process of an adhesive material.

(8) Method for Measuring Characteristics and Method for Evaluating Effects The method for measuring characteristics and the method for evaluating effects in the present invention are as follows.
(8-1) Shape measurement <Shape measurement of convex shape>
Using Keyence Corporation's laser microscope VK8700, observation is performed at a magnification of 200 times in the ultra-depth measurement mode, and X ₁ (projection shape in a direction parallel to the transparent substrate surface) is obtained from the data in the image analysis mode. ), Y ₁ (the length of the convex shape in the direction parallel to the transparent substrate surface and perpendicular to X ₁ ), and Z ₁ (the total of the maximum thickness of the convex lens and the thickness of the antireflection layer) Thickness). Ten convex shapes were measured, and the average value thereof was taken as a representative value, and Z ₁ / Y ₁ and X ₁ / Y ₁ were determined based on this. Furthermore, about 10 convex part shape, the area was calculated | required in the area calculation mode of this apparatus. In this area calculation mode, a threshold value in the height direction is determined for a three-dimensional image obtained using the above-described apparatus, and the projected area of the portion exceeding the threshold value is calculated by image processing.

<Shape measurement of light shielding part and opening part>
Using Keyence Corporation's laser microscope VK8700, observation is performed at a magnification of 200 times in the ultra-depth measurement mode, and X ₂ (maximum opening in the direction parallel to the transparent substrate surface) is obtained from the data in the image analysis mode. Length) and Y ₂ (the maximum length of the opening in the direction parallel to the transparent substrate surface and perpendicular to X ₁ ) were measured. Measurement was performed for 10 openings, and the average value was used as a representative value, and X ₂ / Y ₂ and (X ₂ / Y ₂ ) / (X ₁ / Y ₁ ) were determined based on this. Furthermore, the area was calculated | required in the area calculation mode about 10 openings.

<Calculation of ratio of area of opening>
The ratio of the area of the opening (opening ratio of the opening) is obtained by dividing the area of the opening obtained by measuring the shape of the above-mentioned convex shape and the opening by the area of the convex shape obtained in the same manner. Calculated by

(8-2) Function evaluation
Remove the front filter of the plasma display television “42PX-20” manufactured by Matsushita Electric Industrial Co., Ltd., and attach the display filter prepared above to the display panel with the antireflection layer facing away from the viewer. Assembled so as to be conductive with the electrode, functional evaluation was performed by sensory evaluation. In addition, this evaluation can obtain the same result not only in the said model but if it is a plasma panel display.

<Evaluation of photopic contrast>
The plasma display was installed so that the display screen of the plasma display was at an angle of about 40 degrees with respect to the room lamp installed near the ceiling. The illuminance on the display surface by the interior lighting was about 168 lx for the horizontal plane and about 200 lx for the vertical plane. The observer observed the image at a position 1.5 m away from the display. Based on the product front filter (blank) as a standard, it is implemented in a 4-step scoring system, and the evaluation results for 10 people are averaged and evaluated by removing the maximum and minimum values one by one from the evaluation results of 10 people. The results were quantified. The results are shown in Table 1.
0 points Same as or lower than the front filter of the product 1 point There is a slight difference with the front filter of the product, but the effect is insufficient 2 points There is a difference with the front filter of the product, 3 points Good Front filter of the product There was a large difference with respect to the above, and it was very good. In addition, an intermediate value between the above evaluation values was evaluated by adding 0.5 points to the lower score. An evaluation result of 1.5 points or more was regarded as acceptable.

<Evaluation of screen brightness>
Based on the product front filter (blank) as a standard, it is implemented in a 4-step scoring system, and the evaluation results for 10 people are averaged and evaluated by removing the maximum and minimum values one by one from the evaluation results of 10 people. The results were quantified.
0 points 1 point that feels much darker than the front filter of the product 2 points that feel darker than the front filter of the product 3 points that are almost the same as the front filter of the product 3 points that are brighter than the front filter of the product Evaluation was made by adding 0.5 points to the score. An evaluation result of 1.5 points or more was regarded as acceptable.

<Evaluation of viewing angle>
Based on the product front filter (blank) as a standard, it is implemented in a 4-step scoring system, and the evaluation results for 10 people are averaged and evaluated by removing the maximum and minimum values one by one from the evaluation results of 10 people. The results were quantified.
0 points 1 point that makes the viewing angle considerably narrower than the front filter of the product 2 points that make the viewing angle narrower than the front filter of the product 3 points that make the viewing angle slightly narrower than the front filter of the product A value in the middle of the above evaluation values was evaluated by adding 0.5 points to the lower score. An evaluation result of 1.5 points or more was regarded as acceptable.

<Evaluation of moire>
Based on the product front filter (blank) as a standard, it is implemented in a 4-step scoring system, and the evaluation results for 10 people are averaged and evaluated by removing the maximum and minimum values one by one from the evaluation results of 10 people. The results were quantified.
0 points Strong moire feeling, uncomfortable feeling 1 point Moire feeling 2 points Slight moire feeling, but little concern 3 points Equivalent to the current product or no moire feeling at all.

<Anti-glare evaluation>
A bare fluorescent lamp (8000 cd / m ² ) without a louver was projected on the produced anti-glare film, and the degree of blur of the reflected image was evaluated in four stages according to the following criteria.
0 point Fluorescent lamp is hardly blurred 1 point Fluorescent lamp is blurred, but the outline can be identified 2 points The outline of the fluorescent lamp is slightly known ・ The outline of the fluorescent lamp is not known at all.

(8-3) Characteristic evaluation <Electromagnetic wave shielding evaluation>
The electromagnetic wave shielding property is measured at a frequency of 10 to 1000 MHz using the Advantest method. Evaluation is performed as follows based on the obtained measurement values. The shielding effect is expressed by the following formula.
SE = 20 log ₁₀ (Eb / Ea)
SE: Shielding effect (dB)
Eb: incident electric field strength (v / m)
Ea: Conducted electric field strength (v / m)
Rating:
0 points: 10 dB or less (almost no effect)
1 point: more than 10 to less than 30 dB (shows the minimum shielding effect)
2 points: 30 or more and less than 60 dB (showing average shielding performance)
3 points: 60 dB or more (shows good shielding performance)

Next, although this invention is demonstrated based on an Example, this invention is not necessarily limited to these.
1. Formulation of material <Concentration of condensing part forming material>
The following materials were mixed and degassed to obtain a condensing part forming material.
(Condensation part material prescription)
Aronix M-402 (trade name Toagosei Co., Ltd.) 70 parts by weight Aronix M-350 (trade name Toagosei Co., Ltd.) 30 parts by mass ESACURE KIP150 (product name: Lamberti) 3 parts by weight mixing, Aronix M-402, ESACURE KIP150 was heated to 70 ° C. to lower the viscosity, and other materials were gradually added and mixed while stirring Aronix M-402 with a homomixer (made by Tokushu Kika Kogyo Co., Ltd.). Next, the defoaming was performed using a mixing / defoaming apparatus (trade name, manufactured by Arotori Nertaro Co., Ltd., Shinky Co., Ltd.) for 5 minutes at 1500 rpm.

<Preparation of light shielding layer forming material>
The following materials were mixed to obtain a light shielding layer forming material.
(Light shielding layer forming material prescription)
Bisphenol A type liquid epoxy resin (R-140p, manufactured by Mitsui Chemicals Co., Ltd.) 50 parts by mass Carbon black (MA-8, manufactured by Mitsubishi Materials Corporation) 30 parts by mass Toluene 20 parts by mass After adding to the container in this order, zirconia beads were further added, followed by mixing and dispersing for about 3 hours in a ball mill.

<Preparation of non-light-shielding layer forming material>
The following materials were mixed to obtain a non-light-shielding layer forming material.
(Non-light-shielding layer forming material formulation)
o-Naphthoquinonediazide / phenol novolac-based positive photosensitive agent (SRC300A, Rohm and Haas Japan Co., Ltd.) 90 parts by mass thinner “C” (trade name Rohm and Haas Japan Co., Ltd.) 10 parts by mass Each material was weighed and added in the above order, stirred for about 10 minutes with a magnetic stirrer, and allowed to defoam until no bubbles were observed visually.

<Preparation of high refractive index layer forming material>
The following materials were mixed to obtain a high refractive index layer forming material.
(Prescription for high refractive index layer forming material)
Opstar TU4005 (manufactured by JSR Corporation) 90 parts by mass Isopropyl alcohol 10 parts by mass <Preparation of low refractive index layer forming material>
A low refractive index layer forming material was obtained in the following manner.
Add 20 g of methacryloxypropyltrimethoxysilane and 0.9 g of 5% by weight formic acid aqueous solution to 20 g of Sulria TR-113 (Catalytic Chemical Industry Co., Ltd.), which is hollow silica, and then add 2-perfluorooctylethyl acrylate. After adding 4.6 g and 2,2-azobisisobutyronitrile 0.1 g, the mixture was heated and stirred at 70 ° C. for 30 minutes. Thereafter, 333 g of isopropyl alcohol was added for dilution.

<Preparation of antireflection layer forming material>
The high refractive index layer forming material and the low refractive index layer forming material were mixed at a mass ratio of 4: 6, and this was used as the antireflection layer forming material.

2. Molding of the condensing part forming mold A mold having a structure A corresponding to the condensing part shown in FIG. 5 and having the shape shown in FIG. 8 was manufactured using a copper etching method used for gravure plate making. Specifically, a copper thin film was first formed on a metal roll by plating, and the surface was buffed to create a mirror roll. Next, a photopolymer was applied to the surface, a pattern was formed on the surface with a laser exposure machine, and development processing was performed. After the development treatment, etching was performed to form a recess on the surface of the copper thin film. Finally, the surface was chrome plated.
(Structure A)
Shape of condensing part (surface): Polygon (hexagonal) plane-filling condensing part shape (cross section): Ellipse (corresponding to convex lens)
Size of light condensing part (plane): x ₁ = 62 μm (maximum length in the direction parallel to the transparent substrate surface): y ₁ = 52 μm (parallel to the transparent substrate surface and perpendicular to x ₁₎ Maximum length). (Where x ₁ is the maximum length of the mold in the direction parallel to the transparent substrate surface, y ₁ is the maximum length of the mold parallel to the transparent substrate surface and perpendicular to x ₁ . .)
Size of light condensing part (cross section): d = 7 μm (length of elliptical short axis in cross section including y ₁ )
Gap between lenses: e = 5 μm.

3. Display filter manufacturing method <Condensation part formation>
Using the above-described condensing part forming material, the mold having the above-described structure A, and an electromagnetic wave shielding member having a thickness of 120 μm (line width 10 μm, pitch 300 μm) as the electromagnetic wave shielding member, The aforementioned condensing part forming material was supplied to the surface having the conductive part using an extrusion type coating die so as to have a thickness of 25 μm. Next, the surface on which the condensing portion forming material was adhered was pressed against the mold having the structure A described above. At this time, the press contact pressure of the press roll was adjusted so that the surface pressure of the press contact portion was 1 kg / cm ² . Furthermore, it was hardened by irradiating ultraviolet rays from the transparent substrate side on the mold. For irradiation of ultraviolet rays, an integrated ultra-high pressure mercury lamp manufactured by Eye Graphics Co., Ltd. is used, and the integrated irradiation intensity is 600 mJ / cm ² while being transmitted through a transparent substrate (measured with an UV light meter UVPF-36 manufactured by Eye Graphics Co., Ltd.). The lamp output was controlled so that

<Formation of light shielding layer>
The non-light-shielding layer is formed by applying the above-mentioned light-shielding layer forming material in a wet state on the surface opposite to the light-collecting part of the transparent substrate with a coater using an extrusion method in a wet state and then drying with hot air. Formed. The total thickness of the photosensitive resin layer thus obtained was 2 μm.

<Formation of non-light-shielding layer>
The non-light-shielding layer forming material was coated on the light-shielding layer in a wet state with a film thickness of about 15 μm with a coater using an extrusion method, and then dried with hot air to form a non-light-shielding layer. The total thickness of the photosensitive resin layer thus obtained was 1 μm.

<Formation of light absorption part>
For the non-light-shielding layer obtained by the above-described manufacturing method, an ultraviolet irradiation device (trade name: Multilight 250W) manufactured by Ushio Electric Co., Ltd. is used, and the following exposure 1 to exposure 3 are performed three times (exposure condition A) Went.
(Exposure condition A)
Exposure 1
Exposure amount (measured in the state of passing through the condensing part and the light-shielding part) 30 mJ / cm ²
Sample and parallel UV light angle (angle 1 in FIG. 9) 60 degree exposure 2
Exposure amount (measured in the state of passing through the condensing part and the light shielding part) 10 mJ / cm ²
Sample and parallel UV light angle (angle 2 in FIG. 9) 90 degree exposure 3
Exposure amount (measured in the state of passing through the condensing part and the light-shielding part) 30 mJ / cm ²
The angle between the sample and the parallel UV light (angle 3 in FIG. 9) is 120 degrees. Here, the angle between the sample and the parallel UV light is in the relationship shown in FIG. That is, the angle of the sample and the parallel UV light means an angle formed by the optical axis direction of the convex lens and the direction indicating the maximum length of the convex lens on a plane parallel to the transparent substrate. The above exposure amount is measured by an ultraviolet intensity meter UM-10 manufactured by Konica Minolta Co., Ltd., after exposure to parallel UV light, and development processing with a 0.5% aqueous sodium hydroxide solution at 25 ° C. for 30 seconds. Then, it was washed with water to obtain a light absorbing part comprising a light shielding part and an opening part.

<Formation of antireflection layer>
After the light absorption part is formed by the above-described manufacturing method, the antireflection layer forming material is applied to the surface of the light collecting part by a gravure coater so that the wet film thickness is about 10 μm, and then 100 ° C. For 1 minute, and further cured by irradiating with ultraviolet rays to form an antireflection layer. For UV irradiation, an ultra-high pressure mercury lamp manufactured by iGraphics is used, and the lamp output is controlled so that the integrated irradiation intensity is 800 mJ / cm ² (measured with an UV light meter UVPF-36 manufactured by iGraphics). did.

<Formation of adhesive part>
The pressure-sensitive adhesive part was applied to the surface of the light absorption part with a coater using an extrusion method so that the acrylic adhesive was applied to a thickness of 30 μm.

<Example 2>
A display filter having the structure of FIG. 1 was obtained in the same manner as in Example 1 except that the mold having the structure B was used.
(Structure B)
Shape of condensing part (surface): Polygon (hexagonal) plane-filling condensing part shape (cross section): Ellipse (corresponding to convex lens)
Condensing part size (plane): x ₁ = 62 μm (maximum length in the direction parallel to the transparent substrate surface),
: Y ₁ = 52 μm (maximum length parallel to the transparent substrate surface and perpendicular to x ₁ )
Size of light condensing part (cross section): d = 5 μm (maximum length of short axis of ellipse in cross section including y ₁ )
Gap between lenses: e = 5 μm.

<Example 3>
A display filter having the structure of FIG. 1 was obtained in the same manner as in Example 1 except that the mold having the structure C was used.
(Structure C)
Shape of condensing part (surface): Polygon (hexagonal) plane-filling condensing part shape (cross section): Ellipse (corresponding to convex lens)
Size of condensing part (plane): x ₁ = 62 μm (maximum length in the direction parallel to the transparent substrate surface)
: Y ₁ = 52 μm (maximum length parallel to the transparent substrate surface and perpendicular to x ₁ )
Size of light condensing part (cross section): d = 4 μm (maximum length of short axis of ellipse in cross section including y ₁ )
Gap between lenses: e = 5 μm.

<Example 4>
A display filter having the structure of FIG. 1 was obtained in the same manner as in Example 1 except that the mold having the structure D was used.
(Structure D)
Shape of condensing part (surface): Polygon (hexagonal) plane-filling condensing part shape (cross section): Ellipse (corresponding to convex lens)
Size of condensing part (plane): x ₁ = 62 μm (maximum length in the direction parallel to the transparent substrate surface)
: Y ₁ = 52 μm (maximum length parallel to the transparent substrate surface and perpendicular to x ₁ )
Size of light condensing part (cross section): d = 9 μm (length of elliptical short axis in cross section including y ₁ )
Gap between lenses: e = 5 μm.

<Example 5>
A display filter having the structure of FIG. 1 was obtained in the same manner as in Example 1 except that the mold having the structure E was used.
(Structure E)
Shape of condensing part (surface): Polygon (hexagonal) plane-filling condensing part shape (cross section): Ellipse (corresponding to convex lens)
Size of condensing part (plane): x ₁ = 62 μm (maximum length in the direction parallel to the transparent substrate surface)
: Y ₁ = 52 μm (maximum length parallel to the transparent substrate surface and perpendicular to x ₁ )
The size of the condenser section (cross-section): d = 10 [mu] m (the length of the minor axis of the oval in a cross section containing y ₁₎
Gap between lenses: e = 5 μm.

<Example 6>
A display filter having the structure of FIG. 1 was obtained in the same manner as in Example 1 except that the mold having the structure F was used.
(Structure F)
Shape of condensing part (surface): Polygon (hexagonal) plane-filling condensing part shape (cross section): Ellipse (corresponding to convex lens)
Condensing part size (plane): x ₁ = 52 μm (maximum length in the direction parallel to the transparent substrate surface)
: Y ₁ = 52 μm (maximum length parallel to the transparent substrate surface and perpendicular to x ₁ )
Size of light condensing part (cross section): d = 7 μm (length of elliptical short axis in cross section including y ₁ )
Gap between lenses: e = 5 μm.

<Example 7>
A display filter having the structure of FIG. 1 was obtained in the same manner as in Example 1 except that the mold having the structure G was used.
(Structure G)
Shape of condensing part (surface): Polygon (hexagonal) plane-filling condensing part shape (cross section): Ellipse (corresponding to convex lens)
Size of light condensing part (plane): x ₁ = 72 μm (maximum length in a direction parallel to the transparent substrate surface)
: Y ₁ = 52 μm (maximum length parallel to the transparent substrate surface and perpendicular to x ₁ )
Size of light condensing part (cross section): d = 7 μm (length of elliptical short axis in cross section including y ₁ )
Gap between lenses: e = 5 μm.

<Example 8>
A display filter having the structure of FIG. 1 was obtained in the same manner as in Example 1 except that the mold having the structure H was used.
(Structure H)
Shape of condensing part (surface): Polygon (hexagonal) plane-filling condensing part shape (cross section): Ellipse (corresponding to convex lens)
Size of condensing part (plane): x ₁ = 82 μm (maximum length in the direction parallel to the transparent substrate surface)
: Y ₁ = 52 μm (maximum length parallel to the transparent substrate surface and perpendicular to x ₁ )
Size of light condensing part (cross section): d = 7 μm (length of elliptical short axis in cross section including y ₁ )
Gap between lenses: e = 5 μm.

<Example 9>
A display filter having the structure shown in FIG. 1 was obtained in the same manner as in Example 1 except that exposure was performed under the following exposure condition B in the light absorption portion forming step.
(Exposure condition B)
Exposure 1
Exposure amount (measured in the state of passing through the condensing part and the light shielding part) 15 mJ / cm ²
Sample and parallel UV light angle (angle 1 in FIG. 9) 40 degree exposure 2
Exposure amount (measured in a state of passing through the condensing part and the light-shielding part) 45 mJ / cm ²
Sample and parallel UV light angle (angle 2 in FIG. 9) 90 degree exposure 3
Exposure amount (measured in the state of passing through the condensing part and the light shielding part) 15 mJ / cm ²
The angle between the sample and parallel UV light (angle 3 in FIG. 9) is 160 degrees.

<Example 10>
A display filter having the structure of FIG. 1 was obtained in the same manner as in Example 1 except that exposure was performed under the following exposure condition C in the step of forming the light absorbing portion.
(Exposure condition C)
Exposure 1
Exposure amount (measured in the state of passing through the condensing part and the light-shielding part) 25 mJ / cm ²
Sample and parallel UV light angle (angle 1 in FIG. 9) 40 degree exposure 2
Exposure amount (measured in the state of passing through the condensing part and the light-shielding part) 20 mJ / cm ²
Sample and parallel UV light angle (angle 2 in FIG. 9) 90 degree exposure 3
Exposure amount (measured in the state of passing through the condensing part and the light-shielding part) 25 mJ / cm ²
The angle between the sample and parallel UV light (angle 3 in FIG. 9) is 160 degrees.

<Example 11>
A display filter having the structure of FIG. 1 was obtained in the same manner as in Example 6 except that the condensing part material formulation B was used.
(Condensing part material prescription B)
Defensor OP40 (trade name, manufactured by DIC Corporation) 97 parts by mass ESACURE KIP150 (product name, manufactured by Lamberti) 3 parts by mass.

<Example 12>
A display filter having the structure of FIG. 1 was obtained in the same manner as in Example 7 except that the condensing part material formulation B was used.

<Example 13>
A display filter having the structure of FIG. 1 was obtained in the same manner as in Example 8 except that the condensing part material formulation B was used.

<Example 14>
A display filter having the structure of FIG. 1 was obtained in the same manner as in Example 1 except that the mold having the structure F was used, the light condensing part material formulation B was used, and the exposure condition D was used.
(Exposure condition D)
Exposure 1
Exposure amount (measured in the state of passing through the condensing part and the light-shielding part) 20 mJ / cm ²
Sample and parallel UV light angle (angle 1 in FIG. 9) 60 degree exposure 2
Exposure amount (measured in the state of passing through the condensing part and the light-shielding part) 30 mJ / cm ²
Sample and parallel UV light angle (angle 2 in FIG. 9) 90 degree exposure 3
Exposure amount (measured in the state of passing through the condensing part and the light-shielding part) 20 mJ / cm ²
The angle between the sample and parallel UV light (angle 3 in FIG. 9) is 120 degrees.

<Comparative Example 1>
A display filter was produced in the same manner as in Example 1 except that the condensing part forming step was not performed and no convex lens was provided on the surface of the condensing part. However, in this method, since the entire surface is irradiated with ultraviolet light, an absorption part cannot be formed, and a display filter having the structure of FIG. 10 is obtained.

<Comparative example 2>
A display filter having the structure of FIG. 11 was obtained in the same manner as in Example 1 except that the antireflection layer was not formed.

<Comparative Example 3>
A display filter having the structure of FIG. 12 was obtained in the same manner as in Example 1 except that the light shielding layer, the non-light shielding layer, and the light absorbing portion were not formed.

<Comparative example 4>
A display filter having the structure of FIG. 13 was obtained in the same manner as in Example 1 except that a 120 μm PET film (T-60 manufactured by Toray Industries, Inc.) was used instead of the electromagnetic shielding member.

<Comparative Example 5>
After manufacturing the condensing part, the light shielding layer, the non-light shielding layer, and the light absorbing part in the same manner as the display filter manufacturing method of Example 1 described above, the condensing part is removed with a strong adhesive tape, and the same is repeated. A display having the structure shown in FIG. 14 in the same manner as in Example 1 except that the condensing part is formed on the surface to produce a shape in which the opening of the light absorbing part and the optical axis of the convex lens of the condensing part do not coincide with each other. A filter was obtained.

<Comparative Example 6>
In the same manner as in the first embodiment, after forming the light collecting portion, the light shielding layer, the non-light shielding layer, and the light absorbing portion in this order, an antireflection layer is formed on the surface of the light absorbing portion, and the adhesive portion is formed on the surface of the light collecting portion. To obtain a display filter having the structure of FIG.

<Comparative Example 7>
Using an antireflection film (high-strength clear type Realook 9100 made by NOF Corporation), an electromagnetic shielding film (made by Hitachi Chemical Co., Ltd.), a light control member (made in-house), and the opposite side of the antireflection layer of the antireflection film For the display having the structure of FIG. 18, an adhesive part is laminated so that the thickness is 50 μm on the surface opposite to the electrically conductive part of the electromagnetic wave shielding film, and these three films are bonded together. A filter 29 was obtained. The light control member has the surface and cross-sectional shape shown in FIGS. 16 and 17, and the manufacturing method thereof includes the molding of the light transmission part and the filling of the light absorption part as described below.
(Method for manufacturing light transmitting portion)
Using a 75 μm thick PET film (T-60 manufactured by Toray Industries, Inc.) on the transparent substrate 26 and an ionizing radiation curable composition (“Desolite Z7528 manufactured by JSR Co., Ltd.) as the light transmitting part forming material, As shown in FIGS. 16 and 17, a long sheet-shaped light transmission portion 27 in which a plurality of grooves are formed in parallel in a stripe shape was manufactured. The shape and size of the groove are shown below.
Cross-sectional shape of groove: Height of rectangular groove h: 15 μm
Groove width w: 5 μm
Groove pitch p: 13 μm
(Filling method of light absorption part)
Using 100 parts by mass of an ionizing radiation curable composition (“Desolite Z7528” manufactured by JSR Co., Ltd.) as the matrix constituent material of the light absorption part, this was heated to 70 ° C. to reduce the viscosity, and stirred with a mixer. 10 parts by mass of carbon black was gradually added and dispersed to prepare a light absorbing part material. The light absorbing portion material was filled in the groove of the light transmitting portion by the wiping method and then cured by irradiating with ionizing radiation to form the light absorbing portion 28. As a result, a light beam control member having the structure shown in FIGS.

The display filter produced as described above was evaluated for its configuration, shape measurement results, and display (moire, brightness, contrast, viewing angle, antiglare property, electromagnetic wave shielding property). The results are summarized in Tables 1 to 3. From the results of Table 3, it can be seen that the examples of the present invention passed all of moire, contrast, brightness, viewing angle, antiglare property, and electromagnetic wave shielding property with a simple structure. The display filter of Example 3 having a value of (Z ₁ / Y ₁ ) smaller than the preferred range of the present invention was slightly inferior to the display filter of Example 1, but acceptable. It was in range. The display filter of Example 5 in which the value of (Z ₁ / Y ₁ ) is larger than the preferable range of the present invention and the ratio of the area of the opening is smaller than the preferable range of the present invention is that the antiglare property and the screen brightness are implemented. Although it was slightly inferior to the display filter of Example 1, it was in an acceptable range. The display filter of Example 8 in which the value of (X ₁ / Y ₁ ) and the value of X ₁ are larger than the preferred range of the present invention was slightly inferior to the display filter of Example 1 in moire. It was an acceptable range. The display filter of Example 13 in which the value of (X ₁ / Y ₁ ), the value of X ₁ , and the value of the ratio of the area of the opening is larger than the preferred range of the present invention has a moire and bright place contrast in Example 1. Although it was a little inferior to the display filter, it was acceptable. The display filter of Example 13 in which the value of (X ₂ / Y ₂ ) and the value of (X ₂ / Y ₂ ) / (X ₁ / Y ₁ ) are smaller than the preferred range of the present invention has a viewing angle of Example 1. Although it was a little inferior to the display filter, it was acceptable.

  The display filter of the present invention can be used for a self-luminous display such as a plasma display, FED or organic EL.

1, 32 Display filter 2, 25, 33 Antireflection layer 3, 19 Condensing part 4, 15, 35 Electrically conductive part 5, 14, 26 Transparent substrate 6, 13, 31 Electromagnetic wave shielding member 7, 23 Opening 8 Light-shielding parts 9, 24, 28 Light-absorbing parts 10, 34 Adhesive part 11 Convex lens 12 Display panel glass 16 Light-collecting part forming material 17 Mold 18 UV light 20 Light-shielding layer 21 Non-light-shielding layer 22 Parallel UV light 27 Light-transmitting part 29 Light beam Control member 30 Antireflection member

Claims (9)

A condensing portion having a plurality of convex lenses is formed on one surface of the electromagnetic wave shielding member, and an opening portion is provided at the optical axis position of the convex lens on the other surface of the electromagnetic wave shielding member, and a light shielding portion is provided in addition to the opening portion. A display filter including a structure in which a light absorbing portion is formed, having a single transparent substrate, and an antireflection layer, a light collecting portion, an electromagnetic wave shielding member, a light absorbing portion, and an adhesive portion are laminated in this order. The filter for the display characterized by being made. The display filter according to claim 1, wherein the antireflection layer has a convex shape that follows the shape of the convex lens. The display filter according to claim 2, wherein the convex shape is in the following range.
_{0.05 <(Z 1 / Y 1} ) <0.15
Here, the convex shape refers to a shape following the shape of the convex lens on the surface of the display filter, and Y ₁ is a direction orthogonal to the maximum length (X ₁ ) of the convex shape in a direction parallel to the transparent substrate surface. shows the maximum length of the convex shape, Z ₁ represents the total thickness of the thickness of the antireflection layer and the maximum thickness of the convex lens. The display filter according to claim 2 or 3, wherein the convex shape is in the following range.
1.0 ≦ (X ₁ / Y ₁ ) ≦ 1.5
Wherein, X ₁ is the maximum length in the direction of the convex shape parallel to the transparent substrate surface, Y ₁ indicates the maximum length in the direction of the convex shape which is orthogonal to X _1. The display filter according to any one of claims 1 to 4, wherein an area ratio of the opening to 100% of the area of the light absorbing portion is 40% or more and 70% or less. The display filter according to claim 1, wherein the shape of the opening is in the following range.
1.3 ≦ (X ₂ / Y ₂ )
Here, X ₂ represents the maximum length of the opening in the direction parallel to the transparent base material surface, and Y ₂ represents the maximum length of the opening in the direction parallel to the transparent base material surface and perpendicular to X ₂ . . The display filter according to claim 2, wherein the shape of the convex portion and the shape of the opening are in the following range.
1.3 ≦ (X ₂ / Y ₂ ) / (X ₁ / Y ₁ )
Wherein, X ₁ is the maximum length of the parallel direction of the convex shape on the transparent substrate surface, Y ₁ is the maximum length in the direction of the convex shape which is orthogonal to X _1, X ₂ parallel to the transparent substrate surface The maximum length of the opening in one direction, Y ₂ indicates the maximum length of the opening in the direction parallel to the transparent substrate surface and perpendicular to X ₂ . The maximum length X ₁ in the direction parallel to the convex shape on the transparent substrate surface, the display filter according to claim 2 7 is 40μm or more 75μm or less. A condensing portion having a plurality of convex lenses is formed on one surface of the electromagnetic wave shielding member, and an opening portion is provided at the optical axis position of the convex lens on the other surface of the electromagnetic wave shielding member, and a light shielding portion is provided in addition to the opening portion. A method for manufacturing a display filter including a structure in which a light absorbing portion is formed, wherein an antireflection layer is formed on a light collecting portion by wet coating.