JP2010177300A - 応力評価用teg - Google Patents
応力評価用teg Download PDFInfo
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- JP2010177300A JP2010177300A JP2009015982A JP2009015982A JP2010177300A JP 2010177300 A JP2010177300 A JP 2010177300A JP 2009015982 A JP2009015982 A JP 2009015982A JP 2009015982 A JP2009015982 A JP 2009015982A JP 2010177300 A JP2010177300 A JP 2010177300A
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Abstract
【解決手段】応力評価用TEG1は、基材の平面視において周囲の枠を構成するフレーム部11と、片持ち梁構造となるようにその一端がフレーム部11に支持されたメインビーム部12とを備え、メインビーム部12の支持されていない他端と、フレーム部11とは、平面視においてメインビーム部12の幅よりも細い幅に形成された応力拡大ビーム部13によって連接されている。この構成によれば、陽極接合後の収縮による残留応力が応力拡大ビーム部13に集中し、その残留応力の値が、顕微ラマン分光装置で測定できるレベルに達するので、接合界面に生じる残留応力を正確に評価することができる。
【選択図】図1
Description
11 フレーム部
12 メインビーム部
13 応力拡大ビーム部
2 ガラス基材
Claims (2)
- シリコン又はアルミニウムから成る基材に形成される応力評価用TEGであって、
前記基材の平面視において周囲の枠を構成するフレーム部と、片持ち梁構造となるようにその一端が前記フレーム部に支持されたメインビーム部とを備え、
前記メインビーム部の支持されていない他端と、前記フレーム部とは、平面視において前記メインビーム部の幅よりも細い幅に形成された応力拡大ビーム部によって連接されていることを特徴とする応力評価用TEG。 - 前記応力拡大ビーム部は、その断面視において前記メインビーム部の厚みより薄く形成されていることを特徴とする請求項1に記載の応力評価用TEG。
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JP2009015982A JP2010177300A (ja) | 2009-01-27 | 2009-01-27 | 応力評価用teg |
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JP2009015982A JP2010177300A (ja) | 2009-01-27 | 2009-01-27 | 応力評価用teg |
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JP2010177300A true JP2010177300A (ja) | 2010-08-12 |
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JP2009015982A Pending JP2010177300A (ja) | 2009-01-27 | 2009-01-27 | 応力評価用teg |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20180144952A1 (en) * | 2014-12-24 | 2018-05-24 | Stmicroelectronics, Inc. | Semiconductor package with cantilever pads |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03269263A (ja) * | 1990-03-19 | 1991-11-29 | Fujikura Ltd | 半導体加速度センサ |
JPH11233793A (ja) * | 1998-02-17 | 1999-08-27 | Denso Corp | 半導体装置の製造方法 |
JP2005209827A (ja) * | 2004-01-22 | 2005-08-04 | Hitachi Ulsi Systems Co Ltd | 半導体装置 |
JP2007194531A (ja) * | 2006-01-23 | 2007-08-02 | Consortium For Advanced Semiconductor Materials & Related Technologies | 耐性評価可能装置 |
JP2008085246A (ja) * | 2006-09-29 | 2008-04-10 | Hitachi Ltd | 半導体装置およびその製造方法 |
-
2009
- 2009-01-27 JP JP2009015982A patent/JP2010177300A/ja active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03269263A (ja) * | 1990-03-19 | 1991-11-29 | Fujikura Ltd | 半導体加速度センサ |
JPH11233793A (ja) * | 1998-02-17 | 1999-08-27 | Denso Corp | 半導体装置の製造方法 |
JP2005209827A (ja) * | 2004-01-22 | 2005-08-04 | Hitachi Ulsi Systems Co Ltd | 半導体装置 |
JP2007194531A (ja) * | 2006-01-23 | 2007-08-02 | Consortium For Advanced Semiconductor Materials & Related Technologies | 耐性評価可能装置 |
JP2008085246A (ja) * | 2006-09-29 | 2008-04-10 | Hitachi Ltd | 半導体装置およびその製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20180144952A1 (en) * | 2014-12-24 | 2018-05-24 | Stmicroelectronics, Inc. | Semiconductor package with cantilever pads |
US11270894B2 (en) * | 2014-12-24 | 2022-03-08 | Stmicroelectronics, Inc. | Manufacturing method for semiconductor package with cantilever pads |
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