JP2010171421A - Semiconductor device and manufacturing method thereof - Google Patents

Semiconductor device and manufacturing method thereof Download PDF

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Publication number
JP2010171421A
JP2010171421A JP2009295970A JP2009295970A JP2010171421A JP 2010171421 A JP2010171421 A JP 2010171421A JP 2009295970 A JP2009295970 A JP 2009295970A JP 2009295970 A JP2009295970 A JP 2009295970A JP 2010171421 A JP2010171421 A JP 2010171421A
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Japan
Prior art keywords
electrode
metal
oxide film
semiconductor device
minute metal
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JP2009295970A
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Japanese (ja)
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JP5207404B2 (en
Inventor
Fengqun Lang
豊群 郎
Yusuke Hayashi
林　　祐輔
Hiroshi Nakagawa
博 仲川
Masahiro Aoyanagi
昌宏 青柳
Hiromichi Ohashi
弘通 大橋
Hiroshi Yamaguchi
浩 山口
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National Institute of Advanced Industrial Science and Technology AIST
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National Institute of Advanced Industrial Science and Technology AIST
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Priority to JP2009295970A priority Critical patent/JP5207404B2/en
Publication of JP2010171421A publication Critical patent/JP2010171421A/en
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Publication of JP5207404B2 publication Critical patent/JP5207404B2/en
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    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151—Die mounting substrate
    • H01L2924/156—Material
    • H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
    • H01L2924/15787—Ceramics, e.g. crystalline carbides, nitrides or oxides

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Wire Bonding (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a semiconductor device equipped on a semiconductor chip with an aluminum electrode which is processed through direct soldering and wire bonding. <P>SOLUTION: A fine metal 11 penetrating through an aluminum oxide film 5 up to an aluminum electrode 4 is formed at an appropriate position of the aluminum oxide film 5 on the aluminum electrode 4 in the semiconductor chip 1. Both direct soldering and wire bonding is done in a kind of aluminum electrode with a fine metal penetrating through the oxide. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、半導体チップ上にＡｌ電極を具備した半導体装置（半導体デバイス）及びその製造方法に関する。   The present invention relates to a semiconductor device (semiconductor device) having an Al electrode on a semiconductor chip and a method for manufacturing the same.

電力制御やエネルギー変換等を行うパワーエレクトロニクス用のパワー素子として、たとえば図１に例示したように、半導体チップ１上にＴｉ／Ｗ等の接合金属３を介して”表面”電極としてのＡｌ電極４を作製したものが知られている。Ａｌ電極４に使われるＡｌ金属は、低電気抵抗、高性能、ＡｌとＡｕワイヤボンドが可能、及び低コストという優れた性能を有している。Ａｌ電極４の作製については、一般的に、真空中においてスパッタリング又は蒸着により、Ｓｉ、ＳｉＣ又はＧａＮ等の半導体ウェハにＴｉ／Ｗ、Ｃｒなどの接合・拡散バリヤ層を作製し、その上にスパッタリング又は蒸着方法によりＡｌ電極４を作製する（非特許文献１、２参照）。一方、スパッタリング又は蒸着により、チップの”裏面”つまりダイボンド面には、Ｎｉ／Ａｇ電極２が作製される。   As a power element for power electronics that performs power control, energy conversion, and the like, for example, as illustrated in FIG. 1, an Al electrode 4 as a “surface” electrode via a bonding metal 3 such as Ti / W on a semiconductor chip 1. What is produced is known. The Al metal used for the Al electrode 4 has excellent performance such as low electrical resistance, high performance, Al and Au wire bonding, and low cost. For the production of the Al electrode 4, a bonding / diffusion barrier layer such as Ti / W or Cr is generally produced on a semiconductor wafer such as Si, SiC or GaN by sputtering or vapor deposition in a vacuum, and sputtering is performed thereon. Alternatively, the Al electrode 4 is produced by a vapor deposition method (see Non-patent documents 1 and 2). On the other hand, the Ni / Ag electrode 2 is formed on the “back surface” of the chip, that is, the die bond surface, by sputtering or vapor deposition.

Ａｌ金属４は酸素との親和力が非常に高いので、常温でも空気中に曝露されると、たとえば図２ａに例示したようにその表面に薄いＡｌ酸化皮膜５が自然的に生成する。このＡｌ酸化皮膜５は絶縁体であり、導電性がほぼない。そこで、たとえば図２ｂに例示したように、超音波又は熱圧接によりこのＡｌ酸化皮膜５を破り、Ａｌ又はＡｕワイヤ６をその下のＡｌ電極４（Ａｌ金属）と接合させて、導電性を得る。しかし、このＡｌ酸化皮膜５ははんだとの濡れ性が不良で、ワイヤボンディングは可能であっても、はんだ接合は不可能である（非特許文献３参照）。   Since the Al metal 4 has a very high affinity with oxygen, when exposed to the air even at room temperature, a thin Al oxide film 5 is naturally formed on the surface thereof as illustrated in FIG. 2a, for example. The Al oxide film 5 is an insulator and has almost no conductivity. Therefore, for example, as illustrated in FIG. 2b, the Al oxide film 5 is broken by ultrasonic wave or heat pressure welding, and the Al or Au wire 6 is joined to the Al electrode 4 (Al metal) thereunder to obtain conductivity. . However, this Al oxide film 5 has poor wettability with solder, and even if wire bonding is possible, solder bonding is impossible (see Non-Patent Document 3).

そこで、従来、たとえば図３に例示したように、Ａｒ等を用いたスパッタリングによりＡｌ酸化皮膜５を除去し、半田付け性を持つＴｉＮ，ＮｉＣｒ等の金属を拡散バリヤ層７として蒸着する方法が採用されている。拡散バリヤ層７の上にはさらにＡｕ酸化防止層８が形成される。   Therefore, conventionally, for example, as illustrated in FIG. 3, a method of removing the Al oxide film 5 by sputtering using Ar or the like and depositing a metal such as TiN or NiCr having solderability as the diffusion barrier layer 7 is employed. Has been. An Au oxidation preventing layer 8 is further formed on the diffusion barrier layer 7.

また、たとえば図４に例示したように、亜鉛置換処理および無電解Ｎｉ（Ｐ）めっきによる方法も知られている。亜鉛置換処理では、Ａｌ酸化皮膜５がなくなり、Ａｌ電極４の表面に多くのＺｎ粒子９が析出する。無電解Ｎｉ（Ｐ）めっきでは、Ｎｉ（Ｐ）層が析出する。   For example, as illustrated in FIG. 4, a method using zinc replacement treatment and electroless Ni (P) plating is also known. In the zinc substitution treatment, the Al oxide film 5 is eliminated, and many Zn particles 9 are deposited on the surface of the Al electrode 4. In electroless Ni (P) plating, a Ni (P) layer is deposited.

しかしながら、これら従来の方法で処理したＡｌ電極４は直接はんだ付けできるが、Ａｌワイヤボンディングは困難である。そして、両方とも電極処理のプロセスが複雑になり、コストも上がる（非特許文献３−６参照）。   However, although the Al electrode 4 processed by these conventional methods can be directly soldered, Al wire bonding is difficult. In both cases, the electrode processing process becomes complicated and the cost increases (see Non-Patent Documents 3-6).

Randall Kirschman, "High-Temperature Electronics", IEEE Press, NY, 1999, pp.734,740.Randall Kirschman, "High-Temperature Electronics", IEEE Press, NY, 1999, pp.734,740. Jau-Jiun Chen, Soohhwan Jang, and F. Ren.et.al, “Comparison of Ti/Al/Pt/Au and Ti/Au/ Ohmic Contacts n-type ZnCdO”, Appl. Phys.Lett. 88 012109 (2006).Jau-Jiun Chen, Soohhwan Jang, and F. Ren.et.al, “Comparison of Ti / Al / Pt / Au and Ti / Au / Ohmic Contacts n-type ZnCdO”, Appl. Phys. Lett. 88 012109 (2006 ). J. H. Lau,”Flip Chip Technologies”, McGraw-Hill, NY, 1995, pp.226.J. H. Lau, “Flip Chip Technologies”, McGraw-Hill, NY, 1995, pp.226. John H. Lau, C. P. Wong, “Electronics Manufacturing with Lead-Free, Halogen-Free, and Conductive-Adhesive Materials", McGraw-Hill, NY, 2003, pp2.1-2.6.John H. Lau, C. P. Wong, “Electronics Manufacturing with Lead-Free, Halogen-Free, and Conductive-Adhesive Materials”, McGraw-Hill, NY, 2003, pp2.1-2.6. Haijing Lu, Cheah Li Kang, Stephen C K Wong and Hao Gong,”Evaluation of Commercial Electroless Nickel Chemical for a Low Cost Wafer Bumping Process”, Semicond. Sci. Technol. 17 (2002) 911-917.Haijing Lu, Cheah Li Kang, Stephen C K Wong and Hao Gong, “Evaluation of Commercial Electroless Nickel Chemical for a Low Cost Wafer Bumping Process”, Semicond. Sci. Technol. 17 (2002) 911-917. 牧野 豊、渡辺 英二、児玉 邦夫、水越 正孝、山田 光孝、“無電解NiめっきUBM形成と実用性に関する検討”、第１０回マイクロエレクトロニクスシンポジウム（MES’98）Dec. 1998、埼玉県大宮市。Yutaka Makino, Eiji Watanabe, Kunio Kodama, Masataka Mizukoshi, Mitsutaka Yamada, “Examination of Electroless Ni Plating UBM Formation and Practicality”, 10th Microelectronics Symposium (MES'98) Dec. 1998, Omiya City, Saitama Prefecture.

そこで、以上のとおりの事情に鑑み、本発明は、はんだ直接付けとワイヤボンディングとを両立できるアルミ電極を半導体チップ上に具備した半導体装置（半導体デバイス）を提供することを課題としている。   Accordingly, in view of the circumstances as described above, an object of the present invention is to provide a semiconductor device (semiconductor device) provided with an aluminum electrode on a semiconductor chip capable of both direct soldering and wire bonding.

上記課題を解決すべく、本発明の半導体装置は、半導体チップに設けられたＡｌ電極上のＡｌ酸化皮膜に、該皮膜を貫通してＡｌ電極に届く微小金属を備えたことを特徴とする。   In order to solve the above problems, a semiconductor device of the present invention is characterized in that an Al oxide film on an Al electrode provided on a semiconductor chip is provided with a minute metal that penetrates the film and reaches the Al electrode.

また、Ａｌ酸化皮膜に形成された貫通孔に微小金属が設けられていること、微小金属がＡｌ電極を貫通すること、微小金属が、Ａｌ電極を貫通し、さらに半導体チップとＡｌ電極との間に介在する接合金属を貫通すること、微小金属が、Ａｌ電極を貫通し、さらに半導体チップとＡｌ電極との間に介在する接合金属を貫通し、そして半導体チップを貫通すること、微小金属が、不動態皮膜生成し難く、かつはんだと濡れ性がある金属であること、微小金属が、Ａｕ、Ａｇ、Ｐｔ、Ｐｄ、またはＮｉであることなどを特徴とする。   In addition, a minute metal is provided in the through hole formed in the Al oxide film, the minute metal penetrates the Al electrode, the minute metal penetrates the Al electrode, and further between the semiconductor chip and the Al electrode. Penetrating through the bonding metal interposed between the semiconductor chip and the Al electrode, further penetrating through the bonding metal interposed between the semiconductor chip and the Al electrode, and penetrating the semiconductor chip, the micro metal, It is characterized in that it is difficult to form a passive film and is wettable with solder, and that the minute metal is Au, Ag, Pt, Pd, or Ni.

また、本発明の半導体装置の製造方法は、半導体チップに設けられたＡｌ電極上のＡｌ酸化皮膜に、該皮膜を貫通してＡｌ電極に届く微小金属を形成することを特徴とする。   In addition, the method for manufacturing a semiconductor device according to the present invention is characterized in that a minute metal that penetrates the coating and reaches the Al electrode is formed on the Al oxide coating on the Al electrode provided on the semiconductor chip.

また、Ａｌ酸化皮膜に貫通孔を形成し、該貫通孔に微小金属を設けること、微小金属を含むＡｌ酸化皮膜の表面にはんだを塗布すること、Ａｌ酸化皮膜の貫通孔にワイヤ形状の金属を埋め込むことにより、微小金属を形成すると同時にワイヤボンディングを行うことなどを特徴とする。   Also, a through hole is formed in the Al oxide film, a minute metal is provided in the through hole, solder is applied to the surface of the Al oxide film containing the minute metal, and a wire-shaped metal is applied to the through hole of the Al oxide film. By embedding, a minute metal is formed and wire bonding is performed at the same time.

従来の半導体装置の一例を示した図。The figure which showed an example of the conventional semiconductor device. 従来の半導体装置の一例を示した図。The figure which showed an example of the conventional semiconductor device. 従来のはんだ付けのための電極処理の一例について説明する図。The figure explaining an example of the electrode processing for the conventional soldering. 従来のはんだ付けのための電極処理の一例について説明する図。The figure explaining an example of the electrode processing for the conventional soldering. 本発明による半導体装置の一例を示した図。The figure which showed an example of the semiconductor device by this invention. 本発明によるはんだ付けの一例について説明する図。The figure explaining an example of the soldering by this invention. 図６に続くはんだ付けの一例について説明する図。The figure explaining an example of the soldering following FIG. 微小金属の各種形態を示した図。The figure which showed the various forms of a minute metal. 微小金属の作製方法の一例について説明する図。4A and 4B illustrate an example of a method for manufacturing a micro metal. 図９に続く微小金属の作製方法の一例について説明する図。10A and 10B illustrate an example of a method for manufacturing a minute metal following FIG. 9. 図１０に続く微小金属の作製方法の一例について説明する図。FIG. 11 is a diagram illustrating an example of a method for manufacturing a minute metal following FIG. 10. 微小金属の作製方法の一例について説明する図。4A and 4B illustrate an example of a method for manufacturing a micro metal. Ａｌ電極へのワイヤボンディングの一例について説明する図。The figure explaining an example of the wire bonding to Al electrode.

以下、本発明の実施の形態について図面を参照して説明する。   Hereinafter, embodiments of the present invention will be described with reference to the drawings.

図５は、本発明による一実施形態を示したものである。この実施形態では、Ａｌ電極４上に生成したＡｌ酸化皮膜５の適当な箇所に、該皮膜を貫通してＡｌ電極４まで届く微小金属１１を形成させており、この微小金属１１の存在により、後述するはんだ直接付け及びワイヤボンディングの両立が可能になる。すなわち、はんだ直接付け用のＡｌ電極４、ワイヤボンディング用のＡｌ電極４を別々に用意する必要がなく、酸化物貫通微小金属１１を具備した一種類のＡｌ電極４をはんだ直接付け及びワイヤボンディング両用とすることができる。   FIG. 5 shows an embodiment according to the present invention. In this embodiment, a minute metal 11 that penetrates the film and reaches the Al electrode 4 is formed at an appropriate portion of the Al oxide film 5 formed on the Al electrode 4. Due to the presence of the minute metal 11, Both direct soldering and wire bonding described later are possible. That is, it is not necessary to separately prepare the Al electrode 4 for direct soldering and the Al electrode 4 for wire bonding, and one type of Al electrode 4 including the oxide penetrating fine metal 11 is used for both direct soldering and wire bonding. It can be.

図６および図７は、上記微小金属１１の存在により可能となるはんだ直接付けについて説明する図である。微小金属１１が形成されたＡｌ電極４の表面全体にはんだ１２を塗布し、リフローすると、はんだ１２が微小金属１１と反応して（図中１３は微小金属原子）、さらにＡｌ電極４のＡｌとも反応する（図６参照）。はんだ１３とＡｌ原子１４との反応に伴い、Ａｌ酸化皮膜５が破壊されて、はんだ１３が徐々に周囲へ広がっていく（図７参照）。この広がり速度は、リフロー温度が高いほど、またはんだ量が多くほど、早くなる。これにより、Ａｌ電極４へのはんだ直接付けが実現し、たとえば半導体チップ１上に、セラミックス基板の表裏面に銅板が張り合わされたＤＢＣ基板１５を良好にはんだ接合することができるようになる。   6 and 7 are diagrams for explaining the direct soldering which is possible due to the presence of the minute metal 11. When the solder 12 is applied to the entire surface of the Al electrode 4 on which the minute metal 11 is formed and reflowed, the solder 12 reacts with the minute metal 11 (13 in the figure is a minute metal atom), and also the Al of the Al electrode 4 It reacts (see FIG. 6). With the reaction between the solder 13 and the Al atoms 14, the Al oxide film 5 is destroyed and the solder 13 gradually spreads to the surroundings (see FIG. 7). This spreading speed becomes faster as the reflow temperature is higher or as the amount of sand increases. Thus, direct soldering to the Al electrode 4 is realized, and for example, the DBC substrate 15 in which the copper plate is bonded to the front and back surfaces of the ceramic substrate can be satisfactorily soldered on the semiconductor chip 1.

微小金属１１については、図８に例示したように、様々な形状や貫通方法がある。たとえば、左枠内に例示したように、微小金属１１を、Ａｌ酸化皮膜５に設けられた貫通孔１６内にてＡｌ酸化皮膜５の表面と面一となるように埋める形態（上段図）、貫通孔１６内のある程度の高さまで埋め込む形態（中段図）、逆にＡｌ酸化皮膜５の表面から突出するように形成される形態（下段図）が考えられる。これらの形態では、微小金属１１の直径は貫通孔１６の直径と等しくなるように設けられる。   As for the minute metal 11, there are various shapes and penetration methods as illustrated in FIG. For example, as illustrated in the left frame, the fine metal 11 is buried in the through hole 16 provided in the Al oxide film 5 so as to be flush with the surface of the Al oxide film 5 (upper diagram). A mode of embedding up to a certain height in the through-hole 16 (middle step diagram) and a mode of forming so as to protrude from the surface of the Al oxide film 5 (lower step diagram) are conceivable. In these forms, the diameter of the minute metal 11 is provided to be equal to the diameter of the through hole 16.

また、微小金属１１の高さがＡｌ酸化皮膜５の高さと等しい、あるいはそれより低い又は高い場合のいずれにおいても、同図右枠内に例示したように、貫通孔１６を覆う構造（上段図）、貫通孔１６の直径よりも小さな直径を持つ構造（下段図）も可能である。   In addition, in the case where the height of the minute metal 11 is equal to, lower or higher than the height of the Al oxide film 5, as illustrated in the right frame of FIG. ), A structure having a diameter smaller than the diameter of the through hole 16 (lower diagram) is also possible.

また、微小金属１１の直径が貫通孔１６の直径より小さい又は等しい場合であっても、微小金属１１の高さがＡｌ酸化皮膜５の厚さと等しい、あるいは低い又は高い場合であっても、同図下枠内に例示したように、貫通孔１６をＡｌ酸化皮膜５からさらにＡｌ電極４をも貫通させる形状とさてもよい。たとえば、Ａｌ電極４の途中まで貫通させる形態（左端図）、Ａｌ電極４を全て貫通してその下の接合金属３まで届く形態（左中央図）、接合金属３をも貫通して半導体チップ１の表面まで届く形態（右中央図）、そしてさらに半導体チップ１をもある程度貫通する形態（右端図）などが考えられる。   Further, even when the diameter of the micro metal 11 is smaller than or equal to the diameter of the through-hole 16, even when the height of the micro metal 11 is equal to, lower or higher than the thickness of the Al oxide film 5. As illustrated in the lower frame of the figure, the through hole 16 may be shaped to further penetrate the Al electrode 4 from the Al oxide film 5. For example, a configuration in which the Al electrode 4 is partially penetrated (left end diagram), a configuration in which all of the Al electrode 4 is penetrated and reaches the bonding metal 3 below (left center diagram), and the bonding metal 3 is also penetrated to the semiconductor chip 1. A form reaching the surface (right center view) and a form penetrating the semiconductor chip 1 to some extent (right end view) are also conceivable.

なお、接合金属３については、Ｔｉ−Ｗの他に、Ｔｉ，Ｔｉ−Ｗ，Ｔｉ−Ｐｄ，Ｔｉ−Ｐｔ，Ｃｒ，Ｃｒ−Ｃｕ，Ｃｒ−Ｃｕ−Ａｕ，Ｎｉ，Ｎｉ−Ｃｕ，Ｎｉ−Ａｕ，ＴｉＷ−Ｃｕ，Ｔｉ−Ｖ−Ｃｕなども採用できる。   In addition to Ti-W, the bonding metal 3 is Ti, Ti-W, Ti-Pd, Ti-Pt, Cr, Cr-Cu, Cr-Cu-Au, Ni, Ni-Cu, Ni-Au. TiW-Cu, Ti-V-Cu, and the like can also be employed.

以上のとおりの微小金属１１は、たとえば図９〜１０に例示したような方法により作製することができる。   The minute metal 11 as described above can be manufactured by the method illustrated in FIGS.

まず、図９に例示したように、Ａｌ酸化皮膜５の表面全体を覆うようにフォトレジスト１７を塗布し、フォトリソグラフィによって貫通孔１６を形成させたい位置および形状パターンにフォトレジスト１７を露光、現像する。続いて、Ａｒ+イオンミリングやＲＩＥ（塩素系ガス）エッチングなどのドライエッチング、あるいはアルカリＮａＯＨ、ＫＯＨ、酸等のウェットエッチングにより、Ａｌ酸化皮膜５に貫通孔１６を形成する。次に、図１０に例示したように、スパッタリングや蒸着などの真空蒸着、あるいはめっきにより、貫通孔１６内に微小金属１１を埋め込む、後は図１１に例示したように、アセトンなどの有機溶剤等を用いたリフトオフにより、フォトレジストを除去する。以上により、Ａｌ酸化皮膜５を貫通してＡｌ電極４に届く微小金属１１を作製することができる。 First, as illustrated in FIG. 9, a photoresist 17 is applied so as to cover the entire surface of the Al oxide film 5, and the photoresist 17 is exposed and developed at a position and shape pattern where the through hole 16 is to be formed by photolithography. To do. Subsequently, through holes 16 are formed in the Al oxide film 5 by dry etching such as Ar + ion milling or RIE (chlorine gas) etching, or wet etching such as alkali NaOH, KOH, or acid. Next, as illustrated in FIG. 10, the fine metal 11 is embedded in the through hole 16 by vacuum deposition such as sputtering or vapor deposition, or plating, and thereafter, as illustrated in FIG. 11, an organic solvent such as acetone. The photoresist is removed by lift-off using. As described above, the minute metal 11 that penetrates the Al oxide film 5 and reaches the Al electrode 4 can be produced.

また、プラズマエッチング及びプラズマスパッタリングを利用して微小金属１１を作製することもできる。具体的には、例えば、アルゴンプラズマにより、所望形状及び寸法の孔を持つメタルマスクを介してＡｌ酸化皮膜５をエッチングして貫通孔１６を形成し、アルゴンプラズマ雰囲気下で貫通孔１６にＡｇを蒸着する。   Moreover, the micro metal 11 can also be produced using plasma etching and plasma sputtering. Specifically, for example, the argon oxide film 5 is etched by argon plasma through a metal mask having a hole having a desired shape and size to form a through hole 16, and Ag is formed in the through hole 16 in an argon plasma atmosphere. Evaporate.

その他、たとえば図１２に例示したように、加熱及び圧接によって、Ａｌ酸化皮膜５を破って微小金属１１を打ち込むちという方法も考えられる。また超音波によっても、Ａｌ酸化皮膜５に微小金属１１を埋め込むことができる。   In addition, as exemplified in FIG. 12, for example, a method of breaking the Al oxide film 5 and implanting the fine metal 11 by heating and pressure welding is also conceivable. Further, the micro metal 11 can be embedded in the Al oxide film 5 also by ultrasonic waves.

以上の微小金属１１の材料は、不動態皮膜生成し難く、かつはんだと濡れ性がある金属材料が好ましく、たとえばＡｕ，Ａｇ、Ｐｔ、Ｐｄ、Ｎｉなどを用いることができる。   The material of the fine metal 11 is preferably a metal material that hardly forms a passive film and has wettability with solder. For example, Au, Ag, Pt, Pd, Ni, or the like can be used.

ワイヤボンディングについては、たとえば図１３に例示したように、超音波などによって、Ａｕワイヤ６（ワイヤ形状の金属）をＡｌ電極４に直接埋め込むことによって、微小金属１１の形成と同時にワイヤボンディングを実現することができる。   As for wire bonding, for example, as illustrated in FIG. 13, wire bonding is realized simultaneously with the formation of the minute metal 11 by directly embedding the Au wire 6 (wire-shaped metal) in the Al electrode 4 by ultrasonic waves or the like. be able to.

ここで、実際にプラズマエッチング（アルゴンプラズマ〜０．５Ｐａ Ａｒ、エッチング時間約１０分）及びプラズマスパッタリング（アルゴンプラズマ雰囲気）によりＡｇ微小金属を形成後、Ａｕ−Ｓｎ共晶はんだを塗布して、窒素リフローを行った場合の接合強度評価及び破面分析を行った。その結果、Ａｇ微小金属とＡｌ電極との界面での良好な接合が確認された。また、Ａｌ電極とはんだとの接合強度についても５０ＭＰａ以上が得られた。   Here, after actually forming an Ag fine metal by plasma etching (argon plasma to 0.5 Pa Ar, etching time of about 10 minutes) and plasma sputtering (argon plasma atmosphere), Au—Sn eutectic solder is applied and nitrogen is added. Bond strength evaluation and fracture surface analysis were performed when reflow was performed. As a result, good bonding was confirmed at the interface between the Ag fine metal and the Al electrode. Also, the bonding strength between the Al electrode and the solder was 50 MPa or more.

リフローについては、リフロー時にはんだが微小金属の部分からＡｌ電極と反応して、Ａｌ原子がはんだに固溶しており、リフロー温度が高いほどはんだとＡｌ電極との反応速度が速くなり、一方リフロー温度が一定の場合ははんだの接合面積がはんだ量の増加に伴い増加した。   As for reflow, the solder reacts with the Al electrode from the minute metal part during reflow, and Al atoms are dissolved in the solder. The higher the reflow temperature, the faster the reaction rate between the solder and the Al electrode. When the temperature was constant, the solder joint area increased as the amount of solder increased.

１ 半導体チップ
２ Ｎｉ／Ａｇ電極
３ 接合金属
４ Ａｌ電極
５ Ａｌ酸化皮膜
６ ワイヤ
７ 拡散バリヤ層
８ Ａｕ酸化防止層
９ Ｚｎ粒子
１０ Ｎｉ（Ｐ）層
１１ 微小金属
１２ はんだ
１３ 微小金属原子
１４ Ａｌ原子
１５ ＤＢＣ基板
１６ 貫通孔
１７ フォトレジスト DESCRIPTION OF SYMBOLS 1 Semiconductor chip 2 Ni / Ag electrode 3 Bonding metal 4 Al electrode 5 Al oxide film 6 Wire 7 Diffusion barrier layer 8 Au oxidation prevention layer 9 Zn particle 10 Ni (P) layer 11 Micro metal 12 Solder 13 Micro metal atom 14 Al atom 15 DBC substrate 16 Through-hole 17 Photoresist

Claims (11)

半導体チップに設けられたＡｌ電極上のＡｌ酸化皮膜に、該皮膜を貫通して微小金属を備えた、半導体装置。   A semiconductor device comprising an Al oxide film on an Al electrode provided on a semiconductor chip and a minute metal penetrating the film. Ａｌ酸化皮膜に形成された貫通孔に微小金属が設けられている、請求項１記載の半導体装置。   The semiconductor device according to claim 1, wherein a minute metal is provided in a through-hole formed in the Al oxide film. 微小金属がＡｌ電極を貫通する、請求項１または２記載の半導体装置。   The semiconductor device according to claim 1, wherein the minute metal penetrates the Al electrode. 微小金属が、Ａｌ電極を貫通し、さらに半導体チップとＡｌ電極との間に介在する接合金属を貫通する、請求項１または２記載の半導体装置。   The semiconductor device according to claim 1, wherein the minute metal penetrates the Al electrode and further penetrates the bonding metal interposed between the semiconductor chip and the Al electrode. 微小金属が、Ａｌ電極を貫通し、さらに半導体チップとＡｌ電極との間に介在する接合金属を貫通し、そして半導体チップを貫通する、請求項１または２記載の半導体装置。   3. The semiconductor device according to claim 1, wherein the minute metal penetrates the Al electrode, further penetrates the bonding metal interposed between the semiconductor chip and the Al electrode, and penetrates the semiconductor chip. 微小金属が、不動態皮膜生成し難く、かつはんだと濡れ性がある金属である、請求項１ないし５のいずれかに記載の半導体装置。   The semiconductor device according to claim 1, wherein the minute metal is a metal that hardly forms a passive film and has wettability with solder. 微小金属が、Ａｕ、Ａｇ、Ｐｔ、Ｐｄ、またはＮｉである、請求項６記載の半導体装置。   The semiconductor device according to claim 6, wherein the minute metal is Au, Ag, Pt, Pd, or Ni. 半導体チップに設けられたＡｌ電極上のＡｌ酸化皮膜に、該皮膜を貫通してＡｌ電極に届く微小金属を形成する、半導体装置の製造方法。   A method of manufacturing a semiconductor device, comprising: forming a minute metal penetrating through an Al oxide film on an Al electrode provided on a semiconductor chip and reaching the Al electrode. Ａｌ酸化皮膜に貫通孔を形成し、該貫通孔に微小金属を設ける、請求項８記載の半導体装置の製造方法。   9. The method of manufacturing a semiconductor device according to claim 8, wherein a through hole is formed in the Al oxide film, and a minute metal is provided in the through hole. 微小金属を含むＡｌ酸化皮膜の表面にはんだを塗布する、請求項８または９記載の半導体装置の製造方法。   The method for manufacturing a semiconductor device according to claim 8 or 9, wherein solder is applied to the surface of the Al oxide film containing a minute metal. Ａｌ酸化皮膜の貫通孔にワイヤ形状の金属を埋め込むことにより、微小金属を形成すると同時にワイヤボンディングを行う、請求項８または９記載の半導体装置の製造方法。   10. The method of manufacturing a semiconductor device according to claim 8, wherein wire bonding is performed at the same time as forming a minute metal by embedding a wire-shaped metal in the through hole of the Al oxide film.
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