JP2010139663A - Optical device - Google Patents
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Abstract
Description
本発明は光学素子に関し、特にレンズ等に使用される高精度な光学素子に関するものである。 The present invention relates to an optical element, and more particularly to a high-precision optical element used for a lens or the like.
近年、デジタルカメラを始めとするカメラの生産量が増し、より高性能の光学レンズが要求されている。特にカメラ等の光学性能を向上させるためには、高屈折低分散の光学材料が必要となってきている。 In recent years, the production volume of cameras such as digital cameras has increased, and higher performance optical lenses have been demanded. In particular, in order to improve the optical performance of a camera or the like, an optical material with high refraction and low dispersion is required.
結晶材料では、従来の光学ガラスには無い高屈折低分散の光学性能が実現できるが、光学用途に適した透過率の良い材料として使用するには、単結晶材料を使用するか、或いは結晶粒子を焼結させて使用する方法があった。 Crystal materials can achieve high refractive and low dispersion optical performance not found in conventional optical glass, but to use as a material with good transmittance suitable for optical applications, use single crystal materials or crystal particles There was a method of sintering and using.
単結晶材料は、非常に高価であり、また光学レンズに適した直径の大きな材料が得られ難いという問題があった。
結晶粒子を焼結させる方法では、粒子直径が大きいと、焼結時に大きな粒界が生じ、光学レンズとして透過率の低下が生じたり、レンズ形状に加工する際に粒界によりレンズ表面に欠陥が生じ、良好な光学レンズが得られ難いという問題があった。
The single crystal material is very expensive and has a problem that it is difficult to obtain a material having a large diameter suitable for an optical lens.
In the method of sintering crystal particles, if the particle diameter is large, a large grain boundary is generated during sintering, and the transmittance of the optical lens is lowered, or when processing into a lens shape, defects on the lens surface are caused by the grain boundary. There arises a problem that it is difficult to obtain a good optical lens.
粒径の小さい結晶粒子として、特許文献１には、結晶粒子径が１００ｎｍ以下の透光性セラミックスの例が開示されている。
特許文献１には、結晶粒径が１００ｎｍ以下の透光性セラミックスの例が開示されているが、結晶粒径が１００ｎｍ以下の結晶粒子を焼結させる工程では、焼結前の予備成形体を形成する際に、嵩密度が小さいために取扱が困難となる。また、得られる光学素子中に生成する泡などの欠陥を充分に除去することが困難であった。 Patent Document 1 discloses an example of a translucent ceramic having a crystal grain size of 100 nm or less. In the step of sintering crystal grains having a crystal grain size of 100 nm or less, a preform before sintering is used. When forming, since the bulk density is small, handling becomes difficult. Further, it has been difficult to sufficiently remove defects such as bubbles generated in the obtained optical element.
本発明は、この様な背景技術に鑑みてなされたものであり、高屈折率で低分散の光学特性を有する光学素子を提供することにある。 The present invention has been made in view of such background art, and an object thereof is to provide an optical element having high refractive index and low dispersion optical characteristics.
上記の課題を解決する光学素子は、平均粒子径が１μｍ以上１０μｍ以下のＹ２ＳｉＯ４、Ｌａ２ＳｉＯ４、Ｇｄ２ＳｉＯ４またはＺｒＳｉＯ４から成るセラミックス粒子の成形体を焼結してなることを特徴とする。 An optical element that solves the above problems is obtained by sintering a ceramic particle compact made of Y 2 SiO 4 , La 2 SiO 4 , Gd 2 SiO 4, or ZrSiO 4 having an average particle diameter of 1 μm to 10 μm. It is characterized by.
本発明によれば、高屈折率で低分散の光学特性を有する光学素子を提供することができる。 According to the present invention, an optical element having high refractive index and low dispersion optical characteristics can be provided.
以下、本発明を詳細に説明する。
本発明に係る光学素子は、平均粒子径が１μｍ以上１０μｍ以下のＹ２ＳｉＯ４、Ｌａ２ＳｉＯ４、Ｇｄ２ＳｉＯ４またはＺｒＳｉＯ４から成るセラミックス粒子の成形体を焼結してなることを特徴とする。
本発明の光学素子は、例えば光学系に用いられるレンズ、プリズムなどが挙げられる。
Hereinafter, the present invention will be described in detail.
The optical element according to the present invention is obtained by sintering a ceramic particle compact made of Y 2 SiO 4 , La 2 SiO 4 , Gd 2 SiO 4 or ZrSiO 4 having an average particle diameter of 1 μm to 10 μm. And
Examples of the optical element of the present invention include lenses and prisms used in optical systems.
本発明の光学素子の製造方法は、下記の第１工程から第３工程により行なわれる。
第１工程として、原料からプラズマ溶融などの方法により、平均粒子径が１μｍ以上１０μｍ以下の球状のＹ２ＳｉＯ４、Ｌａ２ＳｉＯ４、Ｇｄ２ＳｉＯ４またはＺｒＳｉＯ４から成るセラミックス粒子を作製する。
The optical element manufacturing method of the present invention is performed by the following first to third steps.
As a first step, ceramic particles made of spherical Y 2 SiO 4 , La 2 SiO 4 , Gd 2 SiO 4 or ZrSiO 4 having an average particle diameter of 1 μm or more and 10 μm or less are produced from a raw material by a method such as plasma melting.
原料には、純度９９．９％以上のＹ２Ｏ３，Ｌａ２Ｏ３，Ｇｄ２Ｏ３，ＺｒＯ２，ＳｉＯ２等が用いられる。セラミックス粒子の作製において、Ｙ２ＳｉＯ４粒子は原料としてＹ２Ｏ３とＳｉＯ２が用いられ、Ｌａ２ＳｉＯ４粒子は原料としてＬａ２Ｏ３とＳｉＯ２が用いられ、Ｇｄ２ＳｉＯ４粒子は原料としてＧｄ２Ｏ３とＳｉＯ２が用いられ、ＺｒＳｉＯ４粒子は原料としてＺｒＯ２とＳｉＯ２が用いられる。 As the raw material, Y 2 O 3 , La 2 O 3 , Gd 2 O 3 , ZrO 2 , SiO 2 or the like having a purity of 99.9% or more is used. In the preparation of ceramic particles, Y 2 SiO 4 particles Y 2 O 3 and SiO 2 are used as starting materials, La 2 SiO 4 grains La 2 O 3 and SiO 2 is used as a raw material, Gd 2 SiO 4 grains Gd 2 O 3 and SiO 2 are used as raw materials, and ZrO 2 and SiO 2 are used as raw materials for ZrSiO 4 particles.
第２工程として、この球状粒子を、鋳込み成形、乾式成形あるいは湿式成形により予備成形体を作製する。
第３工程として、この予備成形体を真空中にて焼結させ、光学素子を作製し、その後に、研削、研磨工程を経て、光学レンズを作製する。
As a second step, a preform is produced from the spherical particles by casting, dry molding or wet molding.
As a third step, the preform is sintered in vacuum to produce an optical element, and then an optical lens is produced through grinding and polishing steps.
本発明において用いられるセラミックス粒子の粒子径は、平均粒子径が１μｍ以上１０μｍ以下、好ましくは１μｍ以上５μｍ以下の範囲が望ましい。平均粒子径が１μｍ未満では、粒子が細かく、部分的な凝集が生じるので、加圧の際に充分に緻密化し難く、また、焼結後の素子中に泡が残留し、光学素子としての使用に不適となる。また、平均粒子径が１０μｍより大きい場合には、加圧の際に空隙が生じやすく、焼結後に得られた結晶内部に粒界が生じやすく、研磨時に粒子の脱落が生じ、良好な表面を有する光学素子が得られない。 The average particle diameter of the ceramic particles used in the present invention is 1 μm or more and 10 μm or less, preferably 1 μm or more and 5 μm or less. When the average particle diameter is less than 1 μm, the particles are fine and partial aggregation occurs, so that it is difficult to be sufficiently densified during pressurization, and bubbles remain in the sintered element, so that it can be used as an optical element. It becomes unsuitable for. In addition, when the average particle size is larger than 10 μm, voids are likely to occur during pressurization, grain boundaries are likely to occur inside the crystal obtained after sintering, particles fall off during polishing, and a good surface is obtained. The optical element which has is not obtained.
また、セラミックス粒子が球形であることが好ましい。なお、球形とは、球の断面形状の縦径／横径＝１±０．１が好ましい。セラミックス粒子の形状が球形から不定形に移るほど、加圧の際に空隙が生じやすく、焼結後に得られた結晶内部に粒界が生じやすく、良好な光学素子が得られない。そのために粒子の形状は球形が望ましい。 The ceramic particles are preferably spherical. The spherical shape is preferably the longitudinal / lateral diameter = 1 ± 0.1 of the cross-sectional shape of the sphere. As the shape of the ceramic particles moves from a spherical shape to an indeterminate shape, voids are more likely to be generated during pressurization, grain boundaries are more likely to be formed inside the crystal obtained after sintering, and a good optical element cannot be obtained. Therefore, the shape of the particles is preferably spherical.
本発明の光学素子は、屈折率が１．８以上、好ましくは１．９３以上の透光性を有することが好ましい。
本発明の光学素子は、アッベ数が４０以上、好ましくは４５以上５６以下であるのが好ましい。
The optical element of the present invention preferably has a light-transmitting property having a refractive index of 1.8 or more, preferably 1.93 or more.
The optical element of the present invention has an Abbe number of 40 or more, preferably 45 or more and 56 or less.
以下、実施例を示して本発明を具体的に説明する。
実施例１
純度９９．９％以上のＹ２Ｏ３，Ｌａ２Ｏ３，Ｇｄ２Ｏ３，ＺｒＯ２，ＳｉＯ２を用意し、表１の試料Ｎｏ．１から４に示す化合物のセラミックス粒子となる比率になるように原料を調整し、混合した。
Hereinafter, the present invention will be specifically described with reference to examples.
Example 1
Y 2 O 3 , La 2 O 3 , Gd 2 O 3 , ZrO 2 and SiO 2 having a purity of 99.9% or more were prepared. The raw materials were adjusted and mixed so that the ratio of the compound shown in 1 to 4 was ceramic particles.
セラミックス粒子の作製において、Ｙ２ＳｉＯ４粒子は原料としてＹ２Ｏ３とＳｉＯ２が用いられ、Ｌａ２ＳｉＯ４粒子は原料としてＬａ２Ｏ３とＳｉＯ２が用いられ、Ｇｄ２ＳｉＯ４粒子は原料としてＧｄ２Ｏ３とＳｉＯ２が用いられ、ＺｒＳｉＯ４粒子は原料としてＺｒＯ２とＳｉＯ２が用いられる。 In the preparation of ceramic particles, Y 2 SiO 4 particles Y 2 O 3 and SiO 2 are used as starting materials, La 2 SiO 4 grains La 2 O 3 and SiO 2 is used as a raw material, Gd 2 SiO 4 grains Gd 2 O 3 and SiO 2 are used as raw materials, and ZrO 2 and SiO 2 are used as raw materials for ZrSiO 4 particles.
この原料を熱プラズマ中に導入し、加熱、溶融させた後に冷却して微粒子を得た。熱プラズマ法にて平均粒子径が１μｍの球状粒子を得た。このとき、加熱温度は１５００℃以上３２００℃以下とした。１５００℃未満では、熔融が充分に行われず、球状の粒子が得られず、３２００℃をこえると、原料の揮発が生じ、粒子径の小さい球形粒子しか得られなかった。 This raw material was introduced into thermal plasma, heated and melted, and then cooled to obtain fine particles. Spherical particles having an average particle diameter of 1 μm were obtained by a thermal plasma method. At this time, the heating temperature was set to 1500 ° C. or more and 3200 ° C. or less. When the temperature was lower than 1500 ° C., melting was not sufficiently performed, and spherical particles were not obtained. When the temperature exceeded 3200 ° C., the raw material was volatilized, and only spherical particles having a small particle diameter were obtained.
この球状粒子を９８０００００Ｐａ（１００ｋｇｆ）から１９６００００００Ｐａ（２０００ｋｇｆ）の圧力で乾式成形し、直径２０ｍｍ、厚さ２ｍｍの予備成形体を得た。予備成形体を１１００℃以上１５００℃以下の下記の表１に示す温度で１０−１Ｐａ以下の真空中にて焼結させた。尚、焼結時間は６時間以上２４時間以下とした。得られた焼結体を研削、研磨して厚さ１ｍｍの光学素子とした。 The spherical particles were dry-molded at a pressure of 9800000 Pa (100 kgf) to 196,000,000 Pa (2000 kgf) to obtain a preform having a diameter of 20 mm and a thickness of 2 mm. The preform was sintered in a vacuum of 10 −1 Pa or less at a temperature shown in Table 1 below from 1100 ° C. to 1500 ° C. The sintering time was 6 hours or more and 24 hours or less. The obtained sintered body was ground and polished to obtain an optical element having a thickness of 1 mm.
得られた光学素子の屈折率およびアッベ数を測定した結果を表１に示す。なお、アッベ数は分散を示す値である。各光学素子は、高屈折で低分散の光学特性を有していた。また表面を光学顕微鏡で観察したところ、研磨工程において生ずる表面粒子の脱落や表面のキズが無い良好な光学素子が得られた。 Table 1 shows the results of measuring the refractive index and Abbe number of the obtained optical element. The Abbe number is a value indicating dispersion. Each optical element had high refraction and low dispersion optical characteristics. Further, when the surface was observed with an optical microscope, a good optical element free from surface particle dropping and surface scratches generated in the polishing step was obtained.
また、内部透過率を測定したところ、４００ｎｍの波長で６０％以上と良好な透光性を得ることができた。
＜測定方法＞
（１）屈折率
屈折率は、プルフリッヒ法屈折率測定装置（商品名「ＫＰＲ−２０００」、島津デバイス製造株式会社）を用いて波長５８７ｎｍで測定し求めた値（ｎｄ）を示す。
（２）アッベ数
アッベ数は、プルフリッヒ法屈折率測定装置を用いて、波長５８７ｎｍ，４８６ｎｍ，６５６ｎｍの屈折率ｎｄ，ｎＦ，ｎＣを求め、アッベ数νｄをνｄ＝（ｎｄ−１）／（ｎＦ−ｎＣ）の式で求めた値を示す。
Further, when the internal transmittance was measured, it was possible to obtain good translucency of 60% or more at a wavelength of 400 nm.
<Measurement method>
(1) Refractive index A refractive index shows the value (nd) measured and calculated | required with the wavelength 587nm using the Purfrich method refractive index measuring apparatus (brand name "KPR-2000", Shimadzu Device Manufacturing Co., Ltd.).
(2) Abbe number Abbe number is obtained by using refractive index measurement apparatus of Purfrich method to obtain refractive indexes nd, nF, and nC of wavelengths 587 nm, 486 nm, and 656 nm, and Abbe number νd is represented by νd = (nd−1) / (nF -NC) represents the value obtained by the equation.
実施例２
純度９９．９％以上のＹ２Ｏ３，Ｌａ２Ｏ３，Ｇｄ２Ｏ３，ＺｒＯ２，ＳｉＯ２を用意し、表２の試料Ｎｏ．１１から１４に示す化合物のセラミックス粒子となる比率に原料を調整、混合した。この原料を熱プラズマ中に導入し、加熱、溶融させた後に冷却して微粒子を得る熱プラズマ法にて平均粒子径が３μｍの球状粒子を得た。このとき、加熱温度は１５００℃以上３０００℃以下とした。１５００℃未満では、熔融が充分に行われず、球状の粒子が得られず、３０００℃をこえると、原料の揮発が生じ、粒子径の小さい球形粒子しか得られなかった。
Example 2
Y 2 O 3 , La 2 O 3 , Gd 2 O 3 , ZrO 2 , SiO 2 having a purity of 99.9% or more were prepared. The raw materials were adjusted and mixed in a ratio to be ceramic particles of the compounds shown in 11 to 14. This raw material was introduced into thermal plasma, heated and melted, and then cooled to obtain spherical particles having an average particle diameter of 3 μm by a thermal plasma method for obtaining fine particles. At this time, the heating temperature was set to 1500 ° C. or more and 3000 ° C. or less. When the temperature was lower than 1500 ° C., melting was not sufficiently performed, and spherical particles were not obtained. When the temperature exceeded 3000 ° C., the raw material was volatilized, and only spherical particles having a small particle diameter were obtained.
この球状粒子を９８０００００Ｐａ（１００ｋｇｆ）から１９６００００００Ｐａ（２０００ｋｇｆ）の圧力で乾式成形し、直径２０ｍｍ、厚さ２ｍｍの予備成形体を得た。予備成形体を１１００℃以上１５００℃以下の表２に示す温度で１０−１Ｐａ以下の真空中にて焼結させた。尚、焼結時間は６時間以上２４時間以下とした。得られた焼結体を研削、研磨して厚さ１ｍｍの試料とした。 The spherical particles were dry-molded at a pressure of 9800000 Pa (100 kgf) to 196,000,000 Pa (2000 kgf) to obtain a preform having a diameter of 20 mm and a thickness of 2 mm. The preform was sintered in a vacuum of 10 −1 Pa or less at a temperature shown in Table 2 of 1100 ° C. or more and 1500 ° C. or less. The sintering time was 6 hours or more and 24 hours or less. The obtained sintered body was ground and polished to obtain a sample having a thickness of 1 mm.
得られた光学素子の屈折率を光学測定したところ、表２に示す、高屈折で低分散の光学特性を有していた。また表面を光学顕微鏡で観察したところ、研磨工程において生ずる表面粒子の脱落や表面のキズが無い良好な光学素子が得られた。 When the refractive index of the obtained optical element was optically measured, it had optical properties of high refraction and low dispersion shown in Table 2. Further, when the surface was observed with an optical microscope, a good optical element free from surface particle dropping and surface scratches generated in the polishing step was obtained.
また、内部透過率を測定したところ、４００ｎｍの波長で６０％以上と良好な透光性を得ることができた。 Further, when the internal transmittance was measured, it was possible to obtain good translucency of 60% or more at a wavelength of 400 nm.
実施例３
純度９９．９％以上のＹ２Ｏ３，Ｌａ２Ｏ３，Ｇｄ２Ｏ３，ＺｒＯ２，ＳｉＯ２を用意し、表３の試料Ｎｏ．２１から２４に示す化合物のセラミックス粒子となる比率に原料を調整、混合した。この原料を熱プラズマ中に導入し、加熱、溶融させた後に冷却して微粒子を得る熱プラズマ法にて平均粒子径が１０μｍの球状粒子を得た。このとき、加熱温度は１５００℃以上３０００℃以下とした。１５００℃未満では、熔融が充分に行われず、球状の粒子が得られず、３０００℃をこえると、原料の揮発が生じ、粒子径の小さい球形粒子しか得られなかった。
Example 3
Y 2 O 3 , La 2 O 3 , Gd 2 O 3 , ZrO 2 , SiO 2 having a purity of 99.9% or more were prepared. The raw materials were adjusted and mixed in a ratio that would be ceramic particles of the compounds shown in 21 to 24. The raw material was introduced into thermal plasma, heated and melted, and then cooled to obtain spherical particles having an average particle diameter of 10 μm by a thermal plasma method for obtaining fine particles. At this time, the heating temperature was set to 1500 ° C. or more and 3000 ° C. or less. When the temperature was lower than 1500 ° C., melting was not sufficiently performed, and spherical particles were not obtained. When the temperature exceeded 3000 ° C., the raw material was volatilized, and only spherical particles having a small particle diameter were obtained.
この球状粒子を９８０００００Ｐａ（１００ｋｇｆ）から１９６００００００Ｐａ（２０００ｋｇｆ）の圧力で乾式成形し、直径２０ｍｍ、厚さ２ｍｍの予備成形体を得た。予備成形体を１１００℃以上１５００℃以下の下記の表に示す温度で１０−１Ｐａ以下の真空中にて焼結させた。尚、焼結時間は６時間以上２４時間以下とした。得られた焼結体を研削、研磨して厚さ１ｍｍの試料とした。 The spherical particles were dry-molded at a pressure of 9800000 Pa (100 kgf) to 196,000,000 Pa (2000 kgf) to obtain a preform having a diameter of 20 mm and a thickness of 2 mm. The preform was sintered in a vacuum of 10 −1 Pa or less at a temperature shown in the following table of 1100 ° C. or more and 1500 ° C. or less. The sintering time was 6 hours or more and 24 hours or less. The obtained sintered body was ground and polished to obtain a sample having a thickness of 1 mm.
得られた光学素子の屈折率を光学測定したところ、表３に示す、高屈折で低分散の光学特性を有していた。また表面を光学顕微鏡で観察したところ、研磨工程において生ずる表面粒子の脱落や表面のキズが無い良好な光学素子が得られた。 When the refractive index of the obtained optical element was optically measured, it had optical properties of high refraction and low dispersion shown in Table 3. Further, when the surface was observed with an optical microscope, a good optical element free from surface particle dropping and surface scratches generated in the polishing step was obtained.
また、内部透過率を測定したところ、４００ｎｍの波長で６０％以上と良好な透光性を得ることができた。 Further, when the internal transmittance was measured, it was possible to obtain good translucency of 60% or more at a wavelength of 400 nm.
比較例１
純度９９．９％以上のＹ２Ｏ３，Ｌａ２Ｏ３，Ｇｄ２Ｏ３，ＺｒＯ２を用意し、表１の試料Ｎｏ．１から４に示す化合物のセラミックス粒子となる比率に原料を調整、混合した。この原料を熱プラズマ中に導入し、加熱、溶融させた後に冷却することで微粒子を得る熱プラズマ法にて平均粒子径が０．１μｍの球状粒子を得た。このとき、加熱温度は３５００℃以上とした。
Comparative Example 1
Y 2 O 3 , La 2 O 3 , Gd 2 O 3 and ZrO 2 having a purity of 99.9% or more were prepared. The raw materials were adjusted and mixed in a ratio that would be ceramic particles of the compounds shown in 1 to 4. Spherical particles having an average particle diameter of 0.1 μm were obtained by a thermal plasma method in which the raw material was introduced into thermal plasma, heated, melted and then cooled to obtain fine particles. At this time, the heating temperature was 3500 ° C. or higher.
この球状粒子を９８０００００Ｐａ（１００ｋｇｆ）から１９６００００００Ｐａ（２０００ｋｇｆ）の圧力で乾式成形し、直径２０ｍｍ、厚さ２ｍｍの予備成形体を得た。予備成形体を１１００℃以上１５００℃以下の表１に示す温度で１０−１Ｐａ以下の真空中にて焼結させた。尚、焼結時間は６時間以上２４時間以下とした。得られた焼結体を研削、研磨して厚さ１ｍｍの試料とした。 The spherical particles were dry-molded at a pressure of 9800000 Pa (100 kgf) to 196,000,000 Pa (2000 kgf) to obtain a preform having a diameter of 20 mm and a thickness of 2 mm. The preform was sintered in a vacuum of 10 −1 Pa or less at a temperature shown in Table 1 of 1100 ° C. or more and 1500 ° C. or less. The sintering time was 6 hours or more and 24 hours or less. The obtained sintered body was ground and polished to obtain a sample having a thickness of 1 mm.
得られた光学素子を光学顕微鏡で観察したところ、素子中に泡が多数観察され、光学素子としての使用には不適切であった。 When the obtained optical element was observed with an optical microscope, many bubbles were observed in the element, which was inappropriate for use as an optical element.
比較例２
純度９９．９％以上のＹ２Ｏ３，Ｌａ２Ｏ３，Ｇｄ２Ｏ３，ＺｒＯ２，を用意し、表１の試料Ｎｏ．１から４に示す化合物のセラミックス粒子となる比率に原料を調整、混合した。この原料を熱プラズマ中に導入し、加熱、溶融させた後に冷却して微粒子を得る熱プラズマ法にて平均粒子径が１００μｍの球状粒子を得た。このとき、加熱温度は１５００℃以上３２００℃以下とした。
Comparative Example 2
Y 2 O 3 , La 2 O 3 , Gd 2 O 3 , ZrO 2 having a purity of 99.9% or more were prepared. The raw materials were adjusted and mixed in a ratio that would be ceramic particles of the compounds shown in 1 to 4. This raw material was introduced into thermal plasma, heated and melted, and then cooled to obtain spherical particles having an average particle diameter of 100 μm by a thermal plasma method for obtaining fine particles. At this time, the heating temperature was set to 1500 ° C. or more and 3200 ° C. or less.
この球状粒子を９８０００００Ｐａ（１００ｋｇｆ）から１９６００００００Ｐａ（２０００ｋｇｆ）の圧力で乾式成形し、直径２０ｍｍ、厚さ２ｍｍの予備成形体を得た。予備成形体を１１００℃以上１５００℃以下の表１に示す温度で１０−１Ｐａ以下の真空中にて焼結させた。尚、焼結時間は６時間以上２４時間以下とした。得られた焼結体を研削、研磨して厚さ１ｍｍの試料とした。 The spherical particles were dry-molded at a pressure of 9800000 Pa (100 kgf) to 196,000,000 Pa (2000 kgf) to obtain a preform having a diameter of 20 mm and a thickness of 2 mm. The preform was sintered in a vacuum of 10 −1 Pa or less at a temperature shown in Table 1 of 1100 ° C. or more and 1500 ° C. or less. The sintering time was 6 hours or more and 24 hours or less. The obtained sintered body was ground and polished to obtain a sample having a thickness of 1 mm.
得られた光学素子の表面を光学顕微鏡で観察したところ、研磨工程において生ずる表面粒子の脱落や表面のキズが多数存在し、光学素子としての使用には不適切であった。
本発明は上記実施例に限定されるものではない。原料に例えば、Ｌａ２ＳｉＯ４のような複合合酸化物を用いてもよく、酸化物以外に炭酸塩、硝酸塩も用いることができる。予備成形体作製は鋳込み成形、湿式成形でも可能である。その際に少量の有機バインダーを加えることもできる。
When the surface of the obtained optical element was observed with an optical microscope, there were many surface particle dropouts and surface scratches that occurred in the polishing step, which was inappropriate for use as an optical element.
The present invention is not limited to the above embodiments. For example, a composite composite oxide such as La 2 SiO 4 may be used as the raw material, and carbonates and nitrates may be used in addition to the oxides. The preform can be produced by cast molding or wet molding. At that time, a small amount of an organic binder can be added.
また、乾式成形、真空加熱の２段階の工程に換えて、ＨＩＰ（熱間静水圧成形）により加熱時間を３から２４期間に短縮することが可能である。
予備成形体、焼結体それぞれの直径は２０ｍｍ以上、厚さは２ｍｍ以上の作製も可能であった。
In addition, the heating time can be shortened from 3 to 24 periods by HIP (hot isostatic pressing) instead of the two-stage process of dry molding and vacuum heating.
Each of the preform and the sintered body could be produced with a diameter of 20 mm or more and a thickness of 2 mm or more.
本発明の光学素子は、高屈折率、低分散の光学特性を有するので、レンズ、プリズムとして利用することができる。 Since the optical element of the present invention has high refractive index and low dispersion optical characteristics, it can be used as a lens or a prism.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013063868A (en) * | 2011-09-16 | 2013-04-11 | Shin-Etsu Chemical Co Ltd | Sintered compact for magnetooptic element, and magnetooptic device |
| JP2020073421A (en) * | 2018-08-22 | 2020-05-14 | 一般財団法人ファインセラミックスセンター | Heat-reflecting structure and heat-reflecting material including the same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013063868A (en) * | 2011-09-16 | 2013-04-11 | Shin-Etsu Chemical Co Ltd | Sintered compact for magnetooptic element, and magnetooptic device |
| JP2020073421A (en) * | 2018-08-22 | 2020-05-14 | 一般財団法人ファインセラミックスセンター | Heat-reflecting structure and heat-reflecting material including the same |
| JP7345755B2 (en) | 2018-08-22 | 2023-09-19 | 一般財団法人ファインセラミックスセンター | Heat reflective structure and heat reflective material equipped with the same |
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