JP2010123856A - Electrode processing apparatus and crystal vibrator-manufacturing system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electrode processing apparatus which performs predetermined processing on electrodes of a crystal vibrator, and to provide a crystal vibrator-manufacturing system which manufactures a crystal vibrator for detecting a specified substance. <P>SOLUTION: In a carrier 9, a plurality of vibrator arrays 80 each comprising crystal vibrators 81 forming a line in a predetermined direction are held while arrayed in an array direction perpendicular to the predetermined direction. At a principal induction film formation part 6, a plurality of vibrator arrays 80 are each arranged in a plurality of processing tanks 61, and electrodes of the plurality of vibrator arrays 80 are processed simultaneously in the plurality of processing tanks 61. Thus, the processing tanks 61 are provided by the vibrator arrays 80 to suppress three-dimensional flowing and then to suppress the occurrence of uneven or defective crystal vibrators, and prevent unnecessary matter from other vibrator arrays 80 from sticking on each vibrator array 80 being processed to limit an influence of the other crystal vibrators 81 on the each crystal vibrator 81. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to an electrode processing apparatus that performs a predetermined process on an electrode of a crystal resonator, and a crystal resonator manufacturing system that manufactures a crystal resonator for detecting a specific substance.

  Quartz crystal resonators are often used in devices for detecting the concentration of a specific substance. In a crystal resonator in which a pair of electrodes are formed on both main surfaces of a plate-shaped crystal piece, the substance is placed on the electrodes. By forming the adsorbing sensitive film, a crystal resonator for detecting the substance (that is, a crystal resonator serving as a detection unit in the device) is manufactured. The sensitive film is formed, for example, on a thin film of metal oxide or the like (hereinafter referred to as “intermediate film”) formed on the electrode. In Patent Document 1, a vapor-state metal oxide precursor is brought into contact with the electrode. A metal oxide precursor thin film is formed on the electrode, and the metal oxide precursor thin film is hydrolyzed to form an intermediate film that is a metal oxide thin film. A technique is disclosed in which a sensitive film is formed on an intermediate film by immersing in a treatment tank in which a treatment liquid containing a material is stored for a predetermined time.

Patent Document 1 also discloses a technique for forming a metal oxide thin film using a solution of a metal oxide precursor as background art. In this manner, a crystal resonator is immersed in a processing solution. In the case where the film is formed on the electrode by the above method, compared with the case where the film is formed by using an expensive vacuum film forming apparatus (see, for example, Patent Document 2 regarding film formation on a crystal resonator using a vacuum film forming apparatus). ) A thin film can be formed at a low cost for a large number of crystal resonators by a single film formation process.
JP 2007-61752 A JP-A-5-320902

  By the way, when forming a film on an electrode by immersing the crystal unit in a processing solution in a large processing tank while holding a large number of crystal units arranged in two orthogonal directions on a horizontal plane. , Movement and vibration of the crystal unit into the processing tank, temperature variation of the crystal unit itself, or non-uniform temperature of the processing liquid and processing vapor, kinetic energy when supplying them, ambient air flow As a result, a three-dimensional flow in which the processing liquid and processing vapor during processing are biased occurs, resulting in non-uniform film formation or poor film formation. Also, in the unlikely event that an unnecessary object adheres to one crystal resonator, the unnecessary object may also adhere to the surrounding crystal resonator during processing, and many crystal resonators may become defective. . Therefore, there is a need for a technique for suppressing the three-dimensional flow during processing or limiting the influence from other crystal resonators in each crystal resonator being processed.

  The present invention has been made in view of the above problems, and it is an object of the present invention to suppress three-dimensional flow during processing or to limit the influence from other crystal resonators in each crystal resonator being processed. .

  According to a first aspect of the present invention, in a crystal resonator in which a pair of electrodes is formed on both main surfaces of a plate-shaped crystal piece, a predetermined process is performed on at least one electrode of the pair of electrodes. An electrode processing apparatus, wherein the crystal units arranged in a row in a predetermined direction are set as a transducer row, and a holding unit that holds a plurality of transducer rows in an array direction perpendicular to the predetermined direction; By arranging a plurality of transducer arrays inside, each of the plurality of transducer arrays includes a plurality of treatment tanks that simultaneously process the at least one electrode.

  Invention of Claim 2 is the electrode processing apparatus of Claim 1, Comprising: The said holding | maintenance part respectively hold | maintains the said some vibrator | oscillator row | line | column, and these arrangement | positioning holders in the said arrangement direction And a holder main body that is arranged and supported.

  A third aspect of the present invention is the electrode processing apparatus according to the second aspect, wherein the holding portion main body is lowered by an arm when the plurality of transducer arrays are arranged in the plurality of treatment tanks. It has a collar part supported from.

  Invention of Claim 4 is an electrode processing apparatus in any one of Claim 1 thru | or 3, Comprising: A process liquid is stored in these process tanks, In the said process, in the said process liquid, the plurality of these process liquids And the treatment is a treatment for forming a thin film on the at least one electrode.

  A fifth aspect of the present invention is the electrode processing apparatus according to the fourth aspect, further comprising a common processing liquid tank for supplying a processing liquid to the plurality of processing tanks.

  Invention of Claim 6 is an electrode processing apparatus in any one of Claim 1 thru | or 3, Comprising: Process vapor | steam is supplied in these process tanks, The said process is on said at least 1 electrode. In this process, a thin film is formed.

  The invention according to claim 7 is the electrode processing apparatus according to any one of claims 4 to 6, wherein the pair of electrodes and the pair of electrodes of the crystal piece are formed in each crystal resonator. The part formed is the first vibrator, and the other pair of electrodes further formed on the two main surfaces and the part where the other pair of electrodes of the crystal piece are formed are the second vibrator. The remaining electrodes including the other pair of electrodes and excluding the at least one electrode are excluded from film formation.

  The invention according to claim 8 is the electrode processing apparatus according to claim 7, wherein the first vibrator on which the thin film is formed is a vibrator for alcohol detection, or for alcohol detection. This is a vibrator for correcting the output from the second vibrator.

  The invention according to claim 9 is a crystal resonator manufacturing system for manufacturing a crystal resonator for detecting a specific substance, wherein a plurality of pairs of electrodes are formed on both main surfaces of a plate-shaped crystal piece. In each of the quartz resonators, an intermediate film forming unit that forms an intermediate film on at least one electrode of the pair of electrodes, and a sensitive film forming unit that forms a sensitive film that adsorbs the specific substance on the intermediate film The intermediate film forming unit or the sensitive film forming unit includes the electrode processing apparatus according to any one of claims 1 to 8.

  According to the present invention, the three-dimensional flow during processing can be suppressed, or the influence from other crystal resonators can be limited in each crystal resonator being processed.

  In the invention of claim 2, a large number of crystal resonators can be easily held while being arranged in two orthogonal directions, and in the invention of claim 3, the holding portion main body can be easily supported.

  In the inventions of claims 4 and 6, the film formed on the electrodes in the plurality of transducer arrays can be made uniform. In the invention of claim 5, the films formed on the electrodes in the plurality of transducer arrays. The film can be made more uniform.

  FIG. 1 is a front view of the crystal resonator 81, and FIG. 2 is a rear view of the crystal resonator 81. The crystal unit 81 shown in FIGS. 1 and 2 is a processing target in the crystal unit manufacturing system 1 (see FIG. 3) described later.

  The crystal resonator 81 has, for example, a substantially circular plate-shaped (other than circular) crystal piece 82 having a diameter of 9 millimeters (mm), and one main surface of the crystal piece 82 shown in FIG. On the 821, two rectangular electrodes 831 and 841 made of, for example, gold (Au) are formed. These electrodes 831 and 841 are electrically connected to each other via rectangular auxiliary portions 851 formed of the same material at the end portions (lower end portions in FIG. 1). On the other main surface 822 of the crystal piece 82 shown in FIG. 2, the electrodes 831 and 841 have the same shape as the electrodes 831 and 841 at positions facing the electrodes 831 and 841, respectively (that is, at positions overlapping in the direction perpendicular to the main surface 822). The electrodes 832 and 842 are similarly formed of gold. The electrodes 832 and 842 are separated from each other, and rectangular auxiliary portions 852 and 853 that are electrically connected to the electrodes 832 and 842 are made of the same material on the outside of the electrodes 832 and 842 (the outer edge side of the crystal piece 82). Formed.

  The crystal resonator 81 has three leads 871, 872, and 873 which are lead lines formed of a predetermined metal, and these leads 871 to 873 are arranged in the horizontal direction of FIGS. In this state, it is fixed by a block-shaped member 86 formed of an insulating material (because it can be regarded as a member protruding from the leads 871 to 873 to the periphery, hereinafter referred to as “flange portion 86”). The leads 871 to 873 protrude from both the surface 861 on the side of the crystal piece 82 of the flange portion 86 and the surface 862 opposite to the surface 861, and the portions protruding from the surface 862 extend linearly in parallel with each other. Yes. Further, the portions protruding from the surface 861 of the leads 872 and 873 at both ends are curved outward so as to be separated from each other, and further curved in a direction substantially along the perpendicular of the surface 861 so as to be separated from the surface 861 at the tip side. ing. End portions (hereinafter referred to as “supporters”) 8711, 8721, and 8731 that protrude from the surface 861 of the leads 871 to 873 are divided into two forks when viewed from the side surface of the crystal resonator 81, It is sandwiched between supporters 8711, 8721, and 8731 and fixed to leads 871 to 873 and a flange portion 86 (collectively referred to as “base”).

  The support 8711 of the central lead 871 is bonded to the auxiliary portion 851 on the main surface 821 of the crystal piece 82 shown in FIG. 1 with a conductive adhesive, and the supporters 8721 and 8731 of the leads 872 and 873 at both ends are shown in FIG. 2 are bonded to the auxiliary portions 852 and 853 on the main surface 822 of the crystal piece 82 shown in FIG.

  In the crystal resonator 81, a portion where the pair of electrodes 841 and 842 formed on both main surfaces 821 and 822 and the electrodes 841 and 842 of the crystal piece 82 are formed is a single resonator (hereinafter referred to as “first” This is referred to as “one oscillator”.) 881, the portion where the other pair of electrodes 831, 832 formed on both main surfaces 821, 822, and the electrodes 831, 832 of the crystal piece 82 are formed. Also, a single vibrator (hereinafter referred to as a “second vibrator”) 882 that vibrates independently of the first vibrator is provided.

  FIG. 3 is a diagram showing a configuration of the crystal unit manufacturing system 1 according to one embodiment of the present invention. The crystal resonator manufacturing system 1 in FIG. 3 forms a predetermined thin film on the electrode 841 (see FIG. 1) of the crystal resonator 81 in multiple layers to thereby form a crystal resonator for alcohol detection (device for detecting ethyl alcohol ( The so-called odor sensor) is manufactured as a detection unit. In the crystal resonator manufacturing system 1, a plurality of crystal resonators 81 are held by the carrier 9, which is a holding unit, as will be described later, and the same processing is performed on all the crystal resonators 81 in the carrier 9 ( That is, batch processing is performed.)

The quartz crystal manufacturing system 1 shown in FIG. 3 uses a cleaning liquid containing sulfuric acid (H ₂ SO ₄ ) and hydrogen peroxide (H ₂ O ₂ ) to contaminate the surface of the crystal piece 82 (including electrodes) and organic matter. In order to detect ethyl alcohol on one electrode 841 on the main surface 821 of the pre-cleaning unit 31 for removing unnecessary materials such as the pre-processing unit 32 for performing pre-processing such as thiol processing on the electrode, and the crystal piece 82 The main sensitive electrode forming part 4 for forming the main sensitive electrode pair composed of the electrodes 841 and 842 by forming the multilayer film, the pre-cleaning part 31 for the carrier 9, the pre-processing part 32, and the main sensitive electrode forming part 4 And a general control unit 10 that controls each component of the crystal resonator manufacturing system 1.

  The main sensitive electrode forming unit 4 includes an intermediate film forming unit 5 for forming an intermediate film on the electrode 841, and a crystal piece 82 immediately after the intermediate film is formed by pure water (pure water vapor may be described later. The same applies to the cleaning unit 42.) The cleaning unit 41 that is cleaned and dried, and a film for alcohol detection on the intermediate film (that is, a film having a structure for selectively adsorbing ethyl alcohol). The main sensitive film forming section 6 for forming the main sensitive film), and the cleaning section 42 for cleaning and drying the crystal piece 82 immediately after the main sensitive film is formed with pure water. In the crystal unit manufacturing system 1, the pre-cleaning unit 31 is directed from the input unit 11 (loader) on which the carrier 9 before processing is placed toward the paying-out unit 12 (unloader) on which the carrier 9 after overall processing is placed. , The pre-processing unit 32, the intermediate film forming unit 5 of the main sensitive electrode forming unit 4, the cleaning unit 41, the main sensitive film forming unit 6 and the cleaning unit 42 are sequentially arranged in a line. In each of these configurations, the carrier Processing in units of 9 is performed.

  Here, the carrier 9 will be described. FIG. 4 is a front view of the carrier 9, and FIG. 5 is a side view of the carrier 9. As shown in FIGS. 4 and 5, the carrier 9 is formed by a frame corresponding to a plurality of sides of the rectangular parallelepiped (however, there are no portions (beams) corresponding to the four sides constituting the outer edge of the bottom surface of the rectangular parallelepiped). Carrier main body 91 and a plurality of holders 92 each having a long block shape.

  As shown in FIG. 6, each holder 92 is separable into two divided members 921, and surfaces of the two divided members 921 that face each other (surfaces that come into contact when combined as one member (holder 92)). The plurality of crystal resonators 81 are held by the holder 92 by sandwiching the flange portion 86 by the concave portion 923 formed in (). In practice, as shown in FIG. 5, the plurality of crystal resonators 81 are arranged and held in the longitudinal direction of the holder 92 with the crystal piece 82 facing downward. In the following description, the crystal resonators 81 held by the holders 92 and arranged in a line in the longitudinal direction of the holder 92 are referred to as “vibrator rows 80”.

  A through-hole extending in the horizontal direction (direction perpendicular to the paper surface of FIG. 5) is formed at the end of each holder 92. As shown in FIG. 4, bolts 922 are passed through the through-holes of the plurality of holders 92. At the same time, both end portions of the bolt 922 are fixed to two beams extending in the vertical direction (vertical direction in FIG. 4) of the carrier body 91. Accordingly, the plurality of holders 92 in FIG. 4 are firmly supported by the carrier body 91 in a state in which the bolts 922 are arranged in the extending direction (hereinafter referred to as “arrangement direction”), and are held by the plurality of holders 92, respectively. A plurality of transducer arrays 80 (see FIG. 5) are arranged in an arrangement direction perpendicular to the longitudinal direction of the holder 92. 4 and 5 illustrate the carrier 9 in a simplified manner. In actuality, 20 to 40 holders 92 are held by the carrier 9, and 10 to 20 crystal resonators 81 are held in each holder 92. As a result, 200 to 800 crystal resonators 81 are arranged and held in two orthogonal directions on a horizontal plane by the carrier 9.

  In the lower part of the carrier body 91, four leg portions 913 projecting downward are formed at the four corners of the rectangle corresponding to the bottom surface. In addition, the upper portion of the carrier main body 91 is formed with two flange portions 912 that protrude to both outer sides in the lateral direction of FIG. 4 and are elongated in the longitudinal direction of the holder 92.

  The carrier 9 is further provided with a measurement unit (not shown) that acquires the oscillation frequency of one of the plurality of crystal resonators 81, and the output value of the measurement unit is transmitted via a radio oscillator. It is transmitted to the overall control unit 10 (see FIG. 3). In the manufacture of a crystal resonator for alcohol detection, which will be described later, the quality of the film formation process is judged in real time (and the end point of the film formation process is detected if necessary) based on the output value of the measurement unit. By performing so-called in-situ monitoring, it is possible to prevent subsequent processing from being performed on the crystal resonator 81 of the carrier 9 even though it is defective. The defective crystal resonator 81 is immersed in a strongly acidic or strongly alkaline solution to remove the film on the electrode, and is used again for manufacturing a crystal resonator for alcohol detection.

  When the carrier 9 is transported by the transport unit 2 in FIG. 3, the support unit 21 is moved by the elevating mechanism 22 in FIG. 3 while the two support arms 211 of the support unit 21 of the transport unit 2 are opened. After descending to a position indicated by a two-dot chain line and closing the two support arms 211 to a position where the two support arms 211 can be engaged with the collar portion 912, the support portion 21 is elevated. As a result, the support arm 211 comes into contact with the lower surface of the flange portion 912 of the carrier body 91, and the carrier body 91 is easily supported. Subsequently, the traversing mechanism 23 moves the support unit 21 together with the lifting mechanism 22 to the upper side of the configuration in which the next processing is performed on the carrier 9 (for example, the cleaning unit 41). Placed on. And after the support arm 211 opens, the support part 21 raises and the conveyance of the carrier 9 is completed.

  FIG. 7 is a diagram showing the configuration of the main sensitive film forming unit 6. The main sensitive film forming unit 6 stores a treatment liquid containing cyclodextrin and has a plurality of treatment tanks 61 having the same shape as each other, an uncovered box-shaped main body 60 in which the plurality of treatment tanks 61 are disposed, In addition, a processing liquid tank 62 is provided which stores the processing liquid and is connected to a processing tank 61 and a recovery unit 612 described later via a supply line 63 and a discharge line 64. As described above, in the present embodiment, the electrode 841 of the crystal resonator 81 is the main sensitive film formation target (that is, the film formation target) in the main sensitive film forming unit 6 and the intermediate film forming unit 5. The other electrodes 831, 832, 842 and the auxiliary portions 851 to 853 are covered with a mask in advance.

  7 is arranged in a row in the horizontal direction of FIG. 7 in the main body 60, and the inside of FIG. 7 and the main body 60 is viewed along the arrangement direction of the processing tank 61. As shown in FIG. 8, each processing tank 61 has a shape that is long in the direction that is horizontal and perpendicular to the arrangement direction. As shown in FIG. 7 and FIG. 9, which is a perspective view of a plurality of processing tanks 61, the processing tank 61 overflows between two adjacent processing tanks 61 and outside the processing tank 61 located at the end. A recovery unit 612 for recovering (overflowing) the processing liquid is provided. In this Embodiment, the two collection | recovery parts 612 which pinch | interpose each process tank 61 are continuing so that the perimeter of the said process tank 61 may be surrounded, and the longitudinal direction (lateral direction of FIG. 8) of the said process tank 61 is concerned. The processing liquid overflowing from the vicinity of the end can also be recovered.

  As shown in FIG. 7, the plurality of treatment tanks 61 are arranged at a pitch equal to the pitch of the holders 92 in the arrangement direction of the holders 92 in the carrier 9. The plurality of transducer arrays 80 (see FIG. 8) are respectively disposed (one-to-one) in the plurality of treatment tanks 61 by being placed at the positions.

  7 is branched into a plurality of branch discharge lines 641, and the plurality of branch discharge lines 641 are connected to the plurality of collection units 612, respectively. The processing liquid overflowing from the processing tank 61 and flowing into the recovery unit 612 passes through the branch discharge line 641 and is discharged to the processing liquid tank 62. A portion of the supply line 63 on the main body 60 side also branches to form a plurality of branch supply lines 631, and the plurality of branch supply lines 631 are connected to the plurality of treatment tanks 61, respectively. The supply line 63 is provided with a pump (not shown) for sending the processing liquid in the processing liquid tank 62, and the processing liquid in the processing liquid tank 62 is supplied to the processing tank 61 via the branch supply line 631 by the pump. .

  The replacement of the processing liquid in the processing tank 61 in the main sensitive film forming unit 6 is performed by simultaneously supplying the processing liquid from the processing liquid tank 62 to the plurality of processing tanks 61, while the processing liquid overflowing from the processing tank 61 passes through the recovery unit 612. And is collected. In the processing liquid tank 62, the concentration and temperature of the processing liquid are adjusted, and unnecessary substances in the processing liquid are removed, whereby the processing liquid discharged from the processing tank 61 is reused. A discharge line may also be connected to each processing tank 61, and the processing liquid may be directly discharged from the processing tank 61 to the processing liquid tank 62 when the processing liquid is replaced.

  FIG. 10 is a diagram showing the configuration of the intermediate film forming unit 5. The intermediate film forming unit 5 includes a plurality of treatment tanks 51 and a plurality of treatment tanks 51 which are supplied with a predetermined inorganic compound vapor (hereinafter referred to as “treatment vapor”) and have the same shape. An uncovered box-shaped main body 50 is disposed, and includes a processing steam generator 52 that generates processing steam and is connected to a processing tank 51 and a recovery unit 512, which will be described later, via a supply line 53 and a discharge line 54, respectively. .

  In the intermediate film forming unit 5 shown in FIG. 10, a plurality of treatment tanks 51 are arranged in a row in the horizontal direction in FIG. The processing tank 51 has a shape that is long in the direction that is horizontal and perpendicular to the arrangement direction. A recovery unit 512 that recovers the processing vapor that has passed through the processing tank 51 is provided between the two processing tanks 51 adjacent to each other and outside the processing tank 51 located at the end. Two recovery units 512 sandwiching each processing tank 51 are continuous so as to surround the entire circumference of the processing tank 51, and near the end of the processing tank 51 in the longitudinal direction (direction perpendicular to the paper surface of FIG. 10). It is also possible to recover the treated steam.

  As shown in FIG. 10, the plurality of treatment tanks 51 are arranged at a pitch equal to the pitch in the arrangement direction of the holders 92 in the carrier 9, and the carrier 9 is positioned at a predetermined position in the main body 50 when an intermediate film to be described later is formed. As a result, the plurality of transducer arrays 80 are respectively arranged in the plurality of processing tanks 51.

  Further, the portion of the supply line 53 on the main body 50 side branches to form a plurality of branch supply lines 531, and the plurality of branch supply lines 531 are connected to the plurality of treatment tanks 51, respectively. The processing steam generation unit 52 includes a gas supply unit that supplies a carrier gas, and the substance (processing steam) that has been changed to a vapor state by the processing steam generation unit 52 moves along the supply line 53 together with the carrier gas to process the carrier gas. It is supplied into the tank 51. Thereby, in the intermediate film forming part 5, a thin film (for example, an oxide film) of a predetermined inorganic compound is formed on the electrode 841 as an intermediate film.

  A portion of the discharge line 54 on the main body 50 side branches to form a plurality of branch discharge lines 541, and the plurality of branch discharge lines 541 are connected to the plurality of collection units 512, respectively. The processing steam flowing into the recovery unit 512 from the processing tank 51 passes through the branch discharge line 541 and is discharged to the processing steam generation unit 52.

  As described above, in the crystal resonator manufacturing system 1 of FIG. 3, each of the intermediate film forming unit 5 and the main sensitive film forming unit 6 of the main sensitive electrode forming unit 4 forms a predetermined thin film on the electrode to be formed. A film forming apparatus is formed. As for the intermediate film, a thin film of a metal oxide precursor is formed on the electrode 841 by the intermediate film forming unit 5 as in the technique of Japanese Patent Application Laid-Open No. 2007-61752 (Patent Document 1). The precursor thin film may be hydrolyzed by washing with pure water to form a metal oxide thin film.

  Actually, in the crystal resonator manufacturing system 1, the pre-cleaning unit 31, the pre-processing unit 32, and the cleaning units 41 and 42 of the main sensitive electrode forming unit 4 are also formed in the main sensitive film forming unit 6 and the intermediate film forming unit. Similar to the unit 5, it has a plurality of processing tanks, and when performing processing, a plurality of transducer arrays 80 in the carrier 9 are respectively arranged in the plurality of processing tanks.

  FIG. 11 is a diagram showing a flow of processing in which the crystal unit manufacturing system 1 manufactures a crystal unit for alcohol detection. In the crystal unit manufacturing system 1 of FIG. 3, when the carrier 9 holding a plurality of crystal units 81 is placed on the loading unit 11, the support arm 211 of the transport unit 2 moves the flange 912 of the carrier body 91 downward. (See FIG. 4), the carrier 9 is carried into the pre-cleaning section 31, and a plurality of transducer arrays 80 are respectively disposed in the plurality of treatment tanks. In each processing tank, the crystal piece 82 is cleaned using a cleaning liquid that flows vigorously (step S11). As described above, since the electrodes 831, 832 and 842 and the auxiliary portions 851 to 853 are covered with a mask in advance, in practice, the other part of the crystal piece 82 (mainly the surface of the electrode 841) is cleaned. And is made hydrophilic (the same applies to the processing described later). In the pre-cleaning section 31, cleaning with pure water and cleaning with pure water are performed.

  Subsequently, the carrier 9 is transported to the pretreatment unit 32, and a plurality of transducer arrays 80 are respectively disposed in the plurality of treatment tanks. In each processing tank, the crystal piece 82 of the transducer array 80 is immersed in a predetermined solution whose temperature and concentration are adjusted for a predetermined time, so that the electrode 841 of the crystal piece 82 is subjected to thiol treatment or the like. The pretreatment is performed, and a hydroxyl group is introduced to the surface of the electrode 841 (step S12). Thereby, the adhesion between the intermediate film formed in the subsequent process and the electrode 841 is ensured. Also in the pre-processing unit 32, cleaning and drying with pure water are performed after the pre-processing.

  When the pretreatment is completed, the carrier 9 is disposed above the plurality of treatment tanks 51 of the intermediate film forming unit 5 in FIG. 10, and then the carrier 9 is lowered to form the plurality of transducer arrays 80 in the plurality of treatment tanks 51. Are arranged inside each. Specifically, the crystal piece 82 of each crystal resonator 81 is disposed in the processing tank 51. Then, by simultaneously supplying the processing steam from the processing steam generating unit 52 into the plurality of processing tanks 51, formation of the intermediate film on the electrodes 841 of the plurality of transducer arrays 80 is started simultaneously.

  At this time, in each processing tank 51, the processing vapor (and carrier gas) continuously supplied from the branch supply line 531 is diffused by the diffusion plate 511 provided in the lower part of the processing tank 51, and the inside of the processing tank 51. Move upward. Further, as described above, the outer periphery of the processing tank 51 is surrounded by the recovery unit 512, and the processing steam in the processing tank 51 is exhausted approximately uniformly over the entire upper portion of the processing tank 51. As a result, in the processing tank 51, a uniform film forming process can be performed on the electrode 841 of the transducer array 80.

  When the crystal piece 82 is held in the processing steam atmosphere in the processing tank 51 for a predetermined time (for example, 20 minutes), the carrier 9 is taken out from the intermediate film forming unit 5. Thus, an intermediate film having a predetermined thickness is formed on the electrode 841 in the plurality of transducer arrays 80 (step S13).

  When the film forming process (that is, the formation of the intermediate film) in the intermediate film forming unit 5 is completed, the carrier 9 is transported to the cleaning unit 41, and the plurality of vibrator arrays 80 are respectively disposed in the plurality of processing tanks. In each treatment tank, pure water is jetted from nozzles provided opposite to both main surfaces 821 and 822 of the crystal piece 82 of each crystal oscillator 81, and the crystal piece 82 immediately after the intermediate film is formed becomes pure water. Then, it is dried by spraying dry air or nitrogen gas from the nozzle (may be another nozzle) (the same applies to the cleaning unit 42) (step S14). In drying in the cleaning unit 41 (and the cleaning unit 42, the pre-cleaning unit 31, and the pre-processing unit 32), pure water such as ethyl alcohol or HFE (hydrofluoroether) or HFC (hydrofluorocarbon) containing a surfactant is used. Alternatively, a liquid drying medium having a lower boiling point may be used. In this case, pure water adhering to the surface of the crystal piece 82 is replaced with the drying medium, and drying can be performed in a short time.

  When the processing in the cleaning unit 41 is completed, the carrier 9 is disposed above the plurality of treatment tanks 61 of the main sensitive film forming unit 6 in FIG. 7, and then the carrier 9 is lowered to form the plurality of transducer arrays 80. It arrange | positions inside the some processing tank 61, respectively. Specifically, the crystal pieces 82 (entirely) of the plurality of transducer arrays 80 are immersed in the treatment liquid in the plurality of treatment tanks 61, and the main sensitive film on the electrodes 841 of the plurality of transducer arrays 80 is immersed. Formation begins simultaneously. The main sensitive film forming unit 6 does not supply or discharge the processing liquid to or from the processing tank 61 during the film forming process, and the highly sensitive film formation (under the condition that the diffusion of the substance serving as the main sensitive film becomes rate limiting) That is, dip-type film formation in which the flow of the processing liquid hardly occurs is performed. When the crystal piece 82 is held in the processing liquid for a predetermined time (for example, 20 minutes), the crystal piece 82 is taken out from the processing tank 61. As a result, a thin film of cyclodextrin that forms an inclusion complex with ethyl alcohol is formed on the intermediate film of the electrode 841 at a predetermined thickness as a main sensitive film in the plurality of transducer arrays 80 (step S15). .

  When the film formation process (that is, formation of the main sensitive film) in the main sensitive film forming unit 6 is completed, the carrier 9 is transferred to the cleaning unit 42 in FIG. 3, and the main sensitive film is formed in the same manner as the cleaning unit 41. The crystal piece 82 just after is washed with pure water and then dried by spraying nitrogen gas (step S16).

  In the overall control unit 10 of the crystal resonator manufacturing system 1, the number of processes in steps S <b> 13 to S <b> 16 for the carrier 9 is counted, and when it is confirmed that the predetermined number has not been reached (step S <b> 17), the above steps are performed. The processes of S13 to S16 are repeated, and an intermediate film and a main sensitive film are formed on the main sensitive film of the electrode 841. In this way, by repeating the process of steps S13 to S16 a predetermined number of times (for example, 2 times or more and 10 times or less) (step S17), the intermediate film and the main sensitive film are alternately laminated on the electrode 841, A main sensitive electrode pair which is a set of the electrode 841 having these films and the electrode 842 facing the electrode 841 is completed. Depending on the performance required for the crystal resonator to be manufactured, the processes in steps S13 to S16 may be performed only once.

  Actually, the pre-cleaning unit 31, the pre-processing unit 32, the intermediate film forming unit 5 of the main sensitive electrode forming unit 4, the cleaning unit 41, the main sensitive film forming unit 6, and the cleaning unit 42 for the plurality of carriers 9. The processes in are performed in parallel.

  Note that these electrode processing apparatuses for processing the electrodes (that is, the pre-cleaning unit 31, the pre-processing unit 32, the intermediate film forming unit 5, the cleaning unit 41, the main sensitive film forming unit 6 and the cleaning unit 42). In the case where the crystal unit 81 is held by a different holding unit, the crystal unit 81 needs to be detached from the holding unit and attached to the holding unit for the next processing every time processing is performed. During the removal operation and the attachment operation, an unnecessary object may adhere to the crystal resonator 81 (the crystal resonator 81 is contaminated). As described above, all of the crystal resonator manufacturing system 1 is used. In the electrode processing apparatus, since the processing is performed in units of the carrier 9, it is possible to prevent unnecessary substances from adhering to the crystal resonator 81 as described above. In addition, it is possible to shorten the time (turnaround time) required for manufacturing the crystal unit and reduce the manufacturing cost of the crystal unit.

  Further, in the crystal resonator 81 of FIG. 1 in the present embodiment, an organic material for adsorbing at least one of moisture in the air and substances other than ethyl alcohol adsorbed on the main sensitive film on the electrode 831. A film containing a compound (actually a film that does not form an inclusion complex with ethyl alcohol, hereinafter referred to as “sub-sensitive film”) is formed in advance. Specifically, an interlayer film of an inorganic compound and a sub-sensitive film are alternately stacked in layers (may be one layer each) on the electrode 831. An electrode 831 having these films, A set of the electrode 832 and the electrode 832 facing the 831 constitutes a sub-sensitive electrode pair used for correcting the output from the main sensitive electrode pair, as will be described later.

  Of course, the sub-sensitive electrode pair may be formed after the main sensitive electrode pair is formed in the process of FIG. 11, and in the formation of the sub-sensitive electrode pair, the types of the processing vapor and the processing liquid are the main sensitive electrode forming part. 4 having the same configuration as that of the crystal resonator manufacturing system 1 except for the difference from the intermediate film forming unit 5 and the main sensitive film forming unit 6 (that is, the intermediate film forming unit and the sub-sensitive film formed) A quartz crystal manufacturing system having a part) may be used. In such a crystal resonator manufacturing system, the electrode 831 of the crystal resonator 81 is a film formation target, and the other electrodes 832, 841, 842 and the auxiliary portions 851 to 853 are covered with a mask in advance.

  Here, a crystal resonator (also referred to as a twin sensor together with a dedicated oscillation circuit) having a main sensitive electrode pair and a sub-sensitive electrode pair will be described. As described above, in the crystal resonator, the first resonator 881 having a pair of electrodes 841 and 842 (that is, a main sensitive electrode pair) and the other pair of electrodes 831 and 832 (that is, a sub-sensitive). A second vibrator 882 having an electrode pair is formed, and each of the first and second vibrators 881 and 882 has a predetermined reference environment (normal temperature and normal humidity, and the concentration of ethyl alcohol is almost 0). %) Shows a constant oscillation frequency (hereinafter referred to as “reference frequency”).

  Further, the main sensitive film in the main sensitive electrode pair adsorbs ethyl alcohol, and when the crystal resonator is placed in an atmosphere containing ethyl alcohol, the mass of the main sensitive film increases due to the adsorption of ethyl alcohol. Therefore, in the atmosphere, the oscillation frequency of the first vibrator 881 changes from the reference frequency. At this time, the change of the oscillation frequency in the first vibrator 881 is not exactly the influence of the adsorption of ethyl alcohol, but the change of the temperature and humidity from the reference environment, and other than the ethyl alcohol adsorbed on the main sensitive film. This includes the effects of other substances. The sub-sensitive film in the sub-sensitive electrode pair adsorbs at least one of moisture and a substance other than ethyl alcohol adsorbed on the main sensitive film, and in the atmosphere, changes in temperature and humidity from the reference environment, The oscillation frequency in the second vibrator 882 changes from the reference frequency due to the influence of the substance. Therefore, by subtracting the change amount of the oscillation frequency in the second vibrator 882 from the change amount of the oscillation frequency in the first oscillator 881 (or performing a predetermined calculation using these change amounts), the first oscillator It is possible to cancel the frequency change due to factors other than ethyl alcohol in 881, and to detect the concentration of ethyl alcohol with high accuracy. As described above, in the crystal resonator, the first vibrator 881 is an alcohol detection vibrator, and the second vibrator 882 is an output correction vibrator from the first vibrator 881. In an actual crystal resonator, it is realized that the sensitivity is improved by laminating the main sensitive films in the main sensitive electrode pair in multiple layers.

  In addition, a crystal resonator for alcohol detection in which the sub-sensitive electrode pair does not have a sub-sensitive film may be manufactured. Even in this case, in the second vibrator 882 having the sub-sensitive electrode pair, Since the frequency change occurs due to the influence of the temperature change from the environment, the temperature compensation for the frequency change in the first vibrator 881 is possible.

  By the way, as shown in FIG. 12, while holding a large number of crystal resonators 81 arranged in two orthogonal directions on a horizontal plane by the carrier 9, these are placed in the treatment liquid in one large treatment tank 93. In the film forming apparatus of the comparative example that forms a film on the electrode by immersing the quartz crystal resonator 81, even if the processing liquid is not supplied to and discharged from the processing tank 93 during the film forming process, the processing tank 93 is not intended. A slight flow of the treatment liquid (that is, a three-dimensional flow) occurs depending on the position, and the treatment liquid flows freely without a partition. Although it is difficult to perform film formation uniformly in all the crystal resonators 81 (that is, the film formation conditions differ depending on the positions in the arrangement direction in the plurality of transducer arrays 80), the intermediate film formation is performed. Part 5 and main sensitive film forming part Each of the treatment tanks 51 and 61 has a narrow shape in the arrangement direction in which the unintended flow of the treatment liquid or the treatment steam can be restricted, and each of the plurality of treatment tanks 51 and 61 having the same shape. Only one transducer array 80 is arranged inside. As a result, the three-dimensional flow of the processing liquid or processing vapor during processing is suppressed, and in the plurality of transducer arrays 80, the film formed on the electrode is made uniform with the film forming conditions constant (film thickness and film quality). And the productivity (including the yield) of the crystal unit for alcohol detection can be improved.

  In addition, in the apparatus of the comparative example of FIG. 12, if a large amount of unnecessary material adheres to one crystal resonator 81, the unnecessary material adheres to the surrounding crystal resonator 81 during processing, Many crystal resonators 81 are defective.

  In contrast, each of the pre-cleaning unit 31, the pre-processing unit 32, the intermediate film forming unit 5, the main sensitive film forming unit 6, and the cleaning units 41 and 42 of the crystal resonator manufacturing system 1 of FIG. The transducer array 80 is disposed inside each of the plurality of treatment tanks 51 and 61, and the same processing is simultaneously performed on the electrodes of the plurality of transducer arrays 80 in the plurality of treatment tanks 51 and 61. Thus, by providing the processing tanks 51 and 61 for each transducer array 80, it is possible to prevent each transducer array 80 being processed from being affected by the other transducer arrays 80, and each crystal oscillator. In 81, the influence from the other crystal resonators 81 is limited. As a result, as described above, even if a large amount of unwanted matter is attached to one crystal resonator 81, the unwanted matter may be removed from the other crystal array 80 during processing. It is possible to prevent many quartz crystal resonators 81 from adhering to 81 and becoming defective.

  Further, in the main sensitive film forming unit 6 of FIG. 7, a common processing liquid tank 62 for supplying the processing liquid to the plurality of processing tanks 61 is provided, so that the processing liquids having the same concentration and temperature are supplied to the plurality of processing tanks 61. Compared with the case where a treatment liquid tank is provided for each treatment tank 61, the films formed on the electrodes in the plurality of transducer arrays 80 can be made more uniform.

  13 and 14 are diagrams showing another example of the main sensitive film forming portion. 13 is a view of the crystal piece 82 in one processing tank 61 of the main sensitive film forming unit 6 as viewed from the main surface 822 side, and FIG. 14 is a view of the crystal piece 82 as viewed from the main surface 821 side. In FIG. 13 and FIG. 14, the inside of the processing tank 61 is shown abstractly. In the crystal unit manufacturing system 1 having the main sensitive film forming unit 6 shown in FIGS. 13 and 14, the base (that is, the leads 871 to 873 and the flange portion 86) of the crystal unit 81 shown in FIGS. 1 and 2 is omitted. The main sensitive film forming unit 6 has the same configuration as the main sensitive film forming unit 6 of FIG. 7 except that the crystal piece 82 is supported by a crystal piece support part 71 described later. It has become.

  In the main sensitive film forming unit 6 of FIGS. 13 and 14, the crystal piece 82 is supported by the crystal piece support portion 71 in a state where the electrodes 832 and 842 are aligned in the vertical direction (direction perpendicular to the liquid surface) of FIG. ing. The crystal piece support 71 has three conductive support elements 711, 712, and 713 (covered with an insulating material having chemical resistance). A clamp portion 721 that clamps the crystal piece 82 is provided at the tip. Actually, a plurality of crystal piece support portions 71 each holding a crystal piece 82 are fixed to each holder 92 of the carrier 9, and the plurality of crystal resonators 81 serve as transducer rows 80 in the longitudinal direction of the holder 92. It is lined up in a direction. The main sensitive film forming unit 6 is provided with a plurality of treatment tanks 61, and a plurality of transducer arrays 80 are respectively disposed in the plurality of treatment tanks 61.

  As described above, in the crystal piece 82 in FIG. 14, the electrode 841 of the pair of electrodes 841 and 842 and the electrode 831 formed on the same main surface 821 as the electrode 841 of the other pair of electrodes 831 and 832 Are electrically connected to each other via an auxiliary portion 851, and the clamp portion 721 of the support element 711 is connected to the auxiliary portion 851. As shown in FIG. 13, the clamp portion 721 of the support element 712 is connected to an auxiliary portion 852 that continues to the electrode 832, and the clamp portion 721 of the support element 713 is connected to an auxiliary portion 853 that continues to the electrode 842. The support elements 711 to 713 are connected to a measurement unit (not shown) so that the oscillation frequencies of the first and second vibrators 881 and 882 (see FIG. 13) can be acquired. In the crystal resonator manufacturing system 1 having the main sensitive film forming unit 6 in FIG. 13, the intermediate film forming unit has the same configuration.

  In the main sensitive film forming unit 6 and the intermediate film forming unit in FIG. 13, both of the electrodes 841 and 842 facing each other are set as film formation targets, and the pair of electrodes 841 and 842 as film formation targets are in the processing tank 61. The crystal piece so that the other pair of electrodes 831 and 832 that are not film formation targets are disposed outside the processing liquid (that is, the crystal piece 82 is partially immersed). 82 is supported to form a film. Accordingly, a thin film is formed only on the electrodes 841 and 842 to be formed, and a substance that forms the thin film is reliably attached to the remaining electrodes 831 and 832 that are not to be formed (without forming a mask). Can be prevented. A crystal resonator (but not a base) in which a main sensitive electrode pair (and a sub-sensitive electrode pair) is formed is incorporated into a printed circuit board on which a dedicated electrical circuit is formed, for example. A device for detecting the concentration is completed.

  The sub-sensitive electrode pair may also be formed by a crystal resonator manufacturing system having an intermediate film forming unit and a sub-sensitive film forming unit similar to the main sensitive film forming unit 6 in FIGS. 13 and 14. The crystal piece 82 is only 180 degrees along the outer periphery from the posture shown in FIGS. 13 and 14 so that the electrodes 831 and 832 are located in the treatment liquid in the treatment tank and the electrodes 841 and 842 are located outside the treatment liquid. In the rotated posture, the crystal piece 82 is supported by the crystal piece support portion.

  In addition, a mask is formed on one of the pair of electrodes 841 and 842 immersed in the processing liquid in the main sensitive film forming unit 6 of FIGS. 13 and 14, and only the other electrode is set as a film formation target. In this case, in the other electrode processing apparatuses (the pre-cleaning unit 31, the pre-processing unit 32, and the cleaning units 41 and 42) as well, only the other electrode is set as a processing target. Further, in the crystal resonator manufacturing system 1 of FIG. 3, both the electrodes 841 and 842 may be film formation targets, and a mask may be formed only on the electrodes 831 and 832 (and the auxiliary portions 851 to 853). As described above, in the electrode processing apparatus that performs a predetermined process on the electrodes of the crystal resonator 81, at least one of the pair of electrodes 841 and 842 is a deposition target, and the other pair of electrodes 831. , 832 and the remaining electrodes excluding the at least one electrode are excluded from the processing target (the same applies to the electrode processing apparatus related to the formation of the sub-sensitive electrode pair).

  Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and various modifications can be made.

  As shown in FIG. 15, the crystal resonator 81 a from which the electrodes 831 and 841 on the main surface 821 of the crystal piece 82 are separated may be a processing target in the crystal resonator manufacturing system 1. However, in the crystal piece 82 shown in FIG. 1, the electrodes 831 and 841 are connected, so that the electrodes 831 and 841 are separated from the case where the electrodes 831 and 841 are separated as in the crystal piece 82 shown in FIG. The surface of 841 can be further smoothed (roughness is reduced), and a more preferable (less defective) thin film can be easily formed on the electrode 841. Further, in the case where a base is provided in the crystal unit 81, the number of parts (the number of leads) can be reduced by connecting the electrodes 831 and 841, and the cost for manufacturing the crystal unit 81 can be reduced. be able to.

  Further, as shown in FIGS. 16 and 17, a crystal resonator 81 b in which only a pair of electrodes 831 a and 832 a are formed on both main surfaces 821 and 822 of the crystal piece 82 is a processing target in the crystal resonator manufacturing system 1. In this case, a thin film is formed on at least one of the pair of electrodes 831a and 832a.

  In the holder 92 of FIG. 6, a plurality of crystal resonators 81 are arranged so that the direction in which the leads 871 to 873 are aligned is parallel to the longitudinal direction of the holder 92. As shown in FIG. A plurality of crystal resonators 81 may be arranged so that the direction in which the leads 871 to 873 are aligned is perpendicular to the longitudinal direction of the holder 92 (the same applies when the crystal piece support portion 71 is used). In the arrangement of the crystal resonators 81 in the holder 92 of FIG. 6, the pitch in the arrangement direction of the processing tanks 51 and 61 can be reduced, whereas in the holder 92a of FIG. The quartz crystal resonator 81 can be held (accommodating efficiency can be improved). In addition, in the holder 92a of FIG. 18, the flange part 86 of the crystal oscillator 81 is clamped by the two divided members 921a.

  Further, in the carrier 9, the carrier body 91 supports the plurality of holders 92 arranged in the arrangement direction, so that a large number of crystal resonators 81 can be easily held while being arranged in two orthogonal directions. However, if the plurality of transducer arrays 80 are arranged in the arrangement direction perpendicular to the column direction (the direction in which the crystal oscillators 81 are arranged in each transducer array 80), the plurality of transducer arrays 80 are: The carrier 9 may be held by a holding unit having a different design.

  The arm that supports the flange portion 912 of the carrier 9 from below is a pre-cleaning unit 31, a pre-processing unit 32, a main sensitive film forming unit 6, an intermediate film forming unit 5, and a cleaning unit 41, of the crystal resonator manufacturing system 1. Each of 42 may be provided individually. For example, an elevating mechanism having a support arm is provided in each of these configurations, and the collar portion 912 of the carrier 9 disposed above the processing tank by the traversing mechanism 23 of the transport unit 2 is moved from below by the support arm of the elevating mechanism. It is also possible to support the carrier 9 and then lower the carrier 9 together with the support arm so that the plurality of transducer arrays 80 are respectively disposed in the plurality of treatment tanks.

  In the main sensitive film forming unit 6 of FIG. 7, the processing liquid is collected and replenished except when the film is formed on the electrode, and the processing liquid is not supplied to and discharged from the processing tank at the time of film formation. In the case where peeling of the formed thin film is difficult to occur, a gradual supply of the processing liquid from the branch supply line 631 and a gradual discharge of the processing liquid from the recovery unit 612 may be performed during film formation. In addition, film formation using the processing vapor may be performed in the main sensitive film forming unit, and film formation using the processing liquid may be performed in the intermediate film forming unit.

  As in the case of the main sensitive film forming unit 6, the cleaning units 41 and 42 immerse the plurality of vibrator arrays 80 in cleaning processing liquids (for example, pure water) stored in the plurality of processing tanks, respectively. The cleaning may be performed, or cleaning may be performed by supplying processing vapor into the processing tank, and in such a cleaning unit, the cleaning processing for a large number of crystal resonators 81 can be performed uniformly. . As described above, in the electrode processing apparatus for storing the processing liquid in each processing tank or supplying the processing steam to each processing tank, a plurality of transducer arrays 80 are respectively disposed in the plurality of processing tanks. Thus, it is possible to improve the uniformity of processing for a large number of crystal resonators 81.

  The above-described method for eliminating the influence from the other transducer arrays 80 in each transducer array 80 being processed by providing a plurality of treatment tanks in which the plurality of transducer arrays 80 are respectively disposed is the formation of the main sensitive film. And may be used only in the formation of the intermediate film. In the crystal resonator manufacturing system 1, the main sensitive film forming unit or the intermediate film forming unit for film formation includes the electrode processing apparatus using the above-described method, so that the crystal unit for alcohol detection is manufactured with stable quality. (Similarly in the crystal resonator manufacturing system relating to the formation of the sub-sensitive film). In the main sensitive film forming unit and the intermediate film forming unit, the cleaning process may be performed in the same processing tank.

  In the production of a crystal resonator for alcohol detection, the main sensitive film formed in the main sensitive film forming part may contain an organic compound that forms an inclusion complex with ethyl alcohol other than cyclodextrin. In addition, in the quartz crystal manufacturing system 1, specific substances other than ethyl alcohol (for example, toxic gas, flammable gas, smoke (smoke in case of fire), specific dangerous substances, environmental hormones, specific pollutants (soil contamination) A crystal resonator for detecting a substance, a metabolite by ingestion of ethyl alcohol or a drug, a metabolite caused by a disease, etc.), and each electrode processing apparatus ( The processing liquid and the processing vapor used in the intermediate film forming unit and the main sensitive film forming unit are appropriately changed to those containing a substance that becomes a thin film according to the use of the crystal resonator.

  In this case, after the main sensitive film is formed in the state where the specific molecules are adsorbed in the main sensitive film forming unit 6, the specific molecules are desorbed from the main sensitive film during the washing process, and the specific molecules are lost. The final main sensitive film may be formed using the mark as an adsorption site (the same applies to the secondary sensitive film). In desorbing the specific molecule, air or nitrogen or other inert gas hot air is jetted toward the main sensitive film on which the specific molecule is adsorbed to evaporate and thermally decompose the specific molecule, acid or alkalinity. A method of applying a predetermined liquid to the main sensitive film and chemically decomposing the specific molecule, a method of electrolyzing the specific molecule by applying a voltage to the electrode on which the main sensitive film is formed, or a specific molecule as the main sensitive film It is possible to adopt a method such as forming a final main sensitive film by applying a liquid that forms a complex that more strongly adsorbs to desorb specific molecules from the main sensitive film. Actually, by heating the main sensitive film formed on the electrode, it is possible to evaporate unnecessary moisture, etc., so that the main sensitive film can be dried and strengthened. In the case where a main sensitive film that does not contain odor molecules is formed as in the above embodiment, a process of heating the main sensitive film may be performed.

It is a front view of a crystal oscillator. It is a rear view of a crystal oscillator. It is a figure which shows the structure of a crystal oscillator manufacturing system. It is a front view of a carrier. It is a side view of a carrier. It is a figure which shows the structure of a holder. It is a figure which shows the structure of the main sensitive film | membrane formation part. It is a figure which shows the inside of a main-body part. It is a perspective view which shows a some processing tank. It is a figure which shows the structure of an intermediate film formation part. It is a figure which shows the flow of the process which manufactures the crystal oscillator for alcohol detection. It is a figure which shows the structure of the film-forming apparatus of a comparative example. It is a figure which shows the other example of the main sensitive film | membrane formation part. It is a figure which shows the other example of the main sensitive film | membrane formation part. It is a figure which shows the other example of a crystal oscillator. It is a figure which shows the further another example of a crystal oscillator. It is a figure which shows the further another example of a crystal oscillator. It is a figure which shows the other example of a holder.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Crystal oscillator manufacturing system 5 Intermediate film formation part 6 Main sensitive film formation part 9 Carrier 31 Pre-cleaning part 32 Pre-processing part 41,42 Cleaning part 51,61 Processing tank 62 Processing liquid tank 80 Vibrator rows 81, 81a, 81b Crystal vibrator 82 Crystal piece 91 Carrier main body 92, 92a Holder 211 Support arm 821, 822 Main surface 831, 831a, 832, 832a, 841, 842 Electrode 881 First vibrator 882 Second vibrator 912 Gutter

Claims (9)

In a crystal resonator in which a pair of electrodes is formed on both main surfaces of a plate-like crystal piece, an electrode processing apparatus that performs a predetermined process on at least one electrode of the pair of electrodes,
A holding unit that holds a plurality of vibrator rows arranged in an arrangement direction perpendicular to the predetermined direction, with crystal vibrators arranged in a row in a predetermined direction as vibrator rows,
A plurality of treatment tanks that simultaneously perform processing on the at least one electrode in the plurality of transducer arrays by arranging the plurality of transducer arrays inside,
An electrode processing apparatus comprising: The electrode processing apparatus according to claim 1,
The holding part is
A plurality of holders each holding the plurality of transducer arrays;
A holding body that supports the plurality of holders arranged in the arrangement direction; and
An electrode processing apparatus comprising: The electrode processing apparatus according to claim 2,
The electrode processing apparatus, wherein the holding unit main body has a flange portion supported from below by an arm when the plurality of transducer arrays are arranged in the plurality of processing tanks. The electrode processing apparatus according to any one of claims 1 to 3,
Treatment liquid is stored in the plurality of treatment tanks, and the plurality of vibrator arrays are immersed in the treatment liquid in the treatment,
The electrode processing apparatus, wherein the processing is processing for forming a thin film on the at least one electrode. The electrode processing apparatus according to claim 4,
An electrode processing apparatus further comprising a common processing liquid tank for supplying a processing liquid to the plurality of processing tanks. The electrode processing apparatus according to any one of claims 1 to 3,
Processing steam is supplied into the plurality of processing tanks,
The electrode processing apparatus, wherein the processing is processing for forming a thin film on the at least one electrode. The electrode processing apparatus according to any one of claims 4 to 6,
In each crystal resonator, a portion where the pair of electrodes and the pair of electrodes of the crystal piece are formed is a first resonator, and another pair of electrodes further formed on both main surfaces, A portion where the other pair of electrodes of the crystal piece is formed is a second vibrator,
An electrode processing apparatus comprising the other pair of electrodes and the remaining electrodes excluding the at least one electrode being excluded from film formation. The electrode processing apparatus according to claim 7,
The electrode processing characterized in that the first vibrator on which the thin film is formed is a vibrator for alcohol detection or a vibrator for output correction from the second vibrator for alcohol detection. apparatus. A crystal resonator manufacturing system for manufacturing a crystal resonator for detecting a specific substance,
In each of a plurality of crystal resonators in which a pair of electrodes are formed on both main surfaces of a plate-like crystal piece, an intermediate film forming section that forms an intermediate film on at least one electrode of the pair of electrodes;
A sensitive film forming part for forming a sensitive film that adsorbs the specific substance on the intermediate film;
With
9. The crystal resonator manufacturing system, wherein the intermediate film forming unit or the sensitive film forming unit includes the electrode processing apparatus according to claim 1.

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