JP2010113372A - Liquid crystal device, method for manufacturing liquid crystal device, and electronic equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a transflective liquid crystal device having good appearance and reduced light leakage in an outer circumferential part of a retardation film, and to provide a method for manufacturing the device. <P>SOLUTION: The liquid crystal device 100 includes: an element substrate 10 and a counter substrate 20 being a pair of substrates; a liquid crystal layer 50 held in between the element substrate 10 and the counter substrate 20; a plurality of pixels having a reflective display area R and a transmissive display area T in a sub-pixel SG; and a retardation film 26 disposed in the reflective display area R. A light-shielding partition wall part 61 segmenting the retardation film 26 is disposed in the liquid crystal layer 50 side of the counter substrate 20. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a liquid crystal device having a reflective display region and a transmissive display region, a method for manufacturing the liquid crystal device, and an electronic apparatus.

  The liquid crystal device includes an array substrate that intersects a plurality of scanning lines and a plurality of signal lines, and a counter substrate that faces the array substrate with a liquid crystal layer interposed therebetween, and intersects the scanning lines and the signal lines. Are provided with red, blue, and green pixels each having a reflecting portion having a means for reflecting external light and a retardation film, and the phase difference values of the red pixels in the retardation film are represented by rR and green pixels. RR> rG, rG> rB, rR> rB, and at least one of rR> rB and rR> rB, where rG is the phase difference value at the phase difference film of rG and rB is the phase difference value at the phase difference film of the blue pixel, and , 120 nm <rR <180 nm, 110 nm <rG <170 nm, and 80 nm <rB <140 nm are known (Patent Document 1).

  The above-mentioned liquid crystal display device is intended to prevent reduction in contrast ratio and reduce coloration in reflective display by considering the optical characteristics of red, blue, and green pixels and defining the phase difference value of these pixels. It is.

  Another liquid crystal device includes a liquid crystal layer and a first substrate and a second substrate that sandwich the liquid crystal layer. The liquid crystal device includes a reflective display portion and a transmissive display portion in one pixel. There is known another liquid crystal display device in which the retardation of the liquid crystal layer in the part is a quarter wavelength and the retardation of the retardation plate is a half wavelength (Patent Document 2).

  The other liquid crystal display device adopts a so-called transflective IPS system, and the optical design described above realizes a wide viewing angle equivalent to that of the transmissive IPS system.

  In these liquid crystal display devices, a retardation film (retardation plate) is formed on the side facing the liquid crystal layer. As a method for forming such a built-in retardation film, Patent Document 1 discloses an example in which a mixture of a polymer liquid crystal polymer and a photosensitive resin is applied on a substrate and patterned by photolithography. .

JP 2006-292847 A JP 2005-338256 A

However, in the method for forming the retardation film, when the patterning is performed by the photolithography method, the film thickness sometimes changes in the outer peripheral portion of the retardation film. As a result, a change in the phase difference value due to a change in the film thickness occurs, and there is a risk of causing a decrease in contrast due to light leakage in actual display.
In addition, it is necessary to pattern the retardation film corresponding to red, blue, and green pixels, which causes a problem that the manufacturing process becomes complicated.
Furthermore, in the case of patterning by photolithography, there is a problem that most of the retardation film forming material is wasted.

  SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.

  Application Example 1 A liquid crystal device according to this application example includes a pair of substrates, a liquid crystal layer sandwiched between the pair of substrates, a plurality of pixels having a reflective display region and a transmissive display region in one pixel region, A retardation film provided in the reflective display region, the retardation film is provided on the liquid crystal layer side of one of the pair of substrates, and on the liquid crystal layer side of the one substrate, A light-shielding partition wall partitioning the retardation film is provided.

  According to this configuration, since the retardation film is partitioned by the light-shielding partition wall, the change in film thickness at the outer periphery of the retardation film is suppressed, and light leakage due to the change in the retardation value at the outer periphery is reduced. can do. In addition, the light leakage can be prevented from leaking into the transmissive display area. That is, it is possible to provide a liquid crystal device that can obtain a predetermined contrast in both the reflective display mode and the transmissive display mode and has good appearance.

Application Example 2 In the liquid crystal device according to the application example described above, a color filter including a plurality of color filter elements is provided on the liquid crystal layer side of the one substrate, and the partition wall portion includes the plurality of color filter elements. It is desirable to partition the retardation film as well as partition.
According to this configuration, the partition wall partitions both the filter element and the retardation film. Therefore, a liquid crystal device capable of color display and having a good appearance can be provided with a simple configuration.

Application Example 3 In the liquid crystal device according to the application example described above, the filter element provided in the reflective display region of the one substrate may be stacked on the retardation film toward the liquid crystal layer. Good.
In the liquid crystal device, the various functional layers provided facing the liquid crystal layer preferably have a configuration that does not diffuse impurities into the liquid crystal layer. According to this configuration, the filter element provided in the reflective display region can protect the retardation film. Therefore, by causing the filter element to function as a protective layer, it is possible to prevent diffusion of impurities from the retardation film. Therefore, the freedom degree of selection of the material which forms retardation film is raised.

Application Example 4 In the liquid crystal device according to the application example described above, an alignment film that defines a direction of a slow axis of the retardation film is provided on the liquid crystal layer side of the one substrate.
According to this configuration, the direction of the slow axis of the retardation film is defined by the alignment film, and a retardation film with little disturbance of the slow phase can be obtained. In addition, since the orientation film defines the direction of the slow axis of the retardation film, various retardation film forming materials can be selected. For example, a thermosetting type, a photocuring type, etc. are mentioned.

Application Example 5 In the liquid crystal device according to the application example, the retardation film provided corresponding to at least one color of the filter elements of the plurality of pixels is provided corresponding to the filter elements of other colors. The film thickness may be different from the obtained retardation film.
According to this configuration, the optimum film thickness of the retardation film can be set according to the absorption wavelength of the filter element, and a liquid crystal device with better appearance can be provided.

Application Example 6 In the liquid crystal device according to the application example described above, a liquid crystal layer thickness adjusting layer for adjusting the thickness of the liquid crystal layer in the reflective display region is defined by the partition wall between the retardation film and the liquid crystal layer. The reflection display area may be provided.
According to this configuration, even if the film thickness at which a predetermined retardation value is obtained differs depending on the retardation film forming material, or even if the film thickness of the retardation film varies depending on the color of the filter element, the liquid crystal layer thickness adjustment By providing the layer, a predetermined liquid crystal layer thickness can be secured in the reflective display region.

Application Example 7 In the liquid crystal device according to the application example described above, the liquid crystal layer thickness adjusting layer is configured such that the thickness of the liquid crystal layer in the reflective display region is halved with respect to the thickness of the liquid crystal layer in the transmissive display region. Is preferably provided.
According to this configuration, the phase of the transmitted light in the transmissive display region and the phase of the reflected light having a double optical path in the reflective display region can be compensated for by the retardation film to be the same. That is, it is possible to provide a liquid crystal device with good appearance by eliminating a phase shift of reflected light with respect to transmitted light.

  Application Example 8 A manufacturing method of a liquid crystal device according to this application example is a manufacturing method of a liquid crystal device including a plurality of pixels having a reflective display region and a transmissive display region in one pixel region, and includes a pair of substrates. A partition portion forming step of partitioning the plurality of pixel regions on the surface of one of the substrates and forming a light-blocking partition portion so as to partition the reflective display region and the transmissive display region; and A retardation film forming step of forming a retardation film in the partitioned reflective display region, and an assembly step of bonding the pair of substrates via a liquid crystal layer.

  According to this method, in the retardation film forming step, it is possible to form a retardation film whose outer peripheral portion is partitioned by the partition wall in the reflective display region. Therefore, it is possible to suppress a change in film thickness at the outer peripheral portion of the retardation film and reduce light leakage due to a change in the retardation value of the outer peripheral portion. In addition, the light leakage can be prevented from leaking into the transmissive display area. That is, a predetermined contrast can be obtained in both the reflective display mode and the transmissive display mode, and a liquid crystal device with good appearance can be manufactured.

Application Example 9 In the method for manufacturing a liquid crystal device according to the application example, the method further includes a color filter forming step of forming a color filter having a plurality of color filter elements in the plurality of pixel regions partitioned by the partition wall, The partition wall forming step forms the partition wall at a height exceeding the film thickness of the filter element, and the retardation film forming step is laminated on the filter element in the reflective display area partitioned by the partition wall. Thus, the retardation film is formed.
According to this method, in the partition wall forming step, the partition wall is formed so as to partition both the filter element and the retardation film. Therefore, a manufacturing process can be simplified compared with the case where a partition part is formed separately for the filter element and the retardation film.

Application Example 10 In the method of manufacturing a liquid crystal device according to the application example described above, the method further includes a color filter forming step of forming a color filter having a plurality of color filter elements in the plurality of pixel regions partitioned by the partition wall, The partition wall forming step forms the partition wall at a height exceeding the thickness of the retardation film, and the color filter forming step is laminated on the retardation film in the reflective display area partitioned by the partition wall. As such, the filter element may be formed.
According to this method, the filter element is laminated on the retardation film in the reflective display region. Therefore, the filter element can be formed as a protective layer for the retardation film.

Application Example 11 In the method of manufacturing a liquid crystal device according to the application example, the color filter forming step applies a liquid material containing a filter element forming material as droplets to the plurality of pixel regions partitioned by the partition walls. The filter element is preferably formed by solidifying the applied liquid material.
According to this method, since the filter element is formed by using the droplet discharge method, mask elements are not required and the filter element can be efficiently formed by eliminating waste of the filter element forming material as compared with the photolithography method. be able to.

Application Example 12 In the method for manufacturing a liquid crystal device according to the application example described above, the method further includes an alignment film forming step of forming an alignment film that defines the direction of the slow axis of the retardation film before forming the retardation film. It is desirable.
According to this method, in the alignment film forming step, an alignment film that defines the direction of the slow axis of the retardation film is formed, and a retardation film with little disturbance of the slow phase can be obtained. In addition, since the orientation film defines the direction of the slow axis of the retardation film, various retardation film forming materials can be selected.

Application Example 13 In the method of manufacturing a liquid crystal device according to the application example, in the alignment film forming step, the reflective display in which the liquid material containing a photocurable alignment film forming material is used as droplets and is partitioned by the partition walls. It is preferable that the alignment film is formed by applying to the region, drying the applied liquid material, and then curing by applying light.
According to this method, the alignment film can be selectively formed only in the reflective display region by using the droplet discharge method. That is, the waste of the alignment film forming material can be saved as compared with the case where the alignment film that defines the direction of the slow axis of the retardation film is formed over a plurality of pixel regions.

Application Example 14 In the method for manufacturing a liquid crystal device according to the application example described above, the retardation film forming step forms a liquid material containing a retardation film forming material as a liquid droplet on the reflective display area partitioned by the partition wall. It is preferable to include an application process for applying and a film formation process for solidifying the applied liquid material to form the retardation film.
According to this method, it is possible to selectively form the retardation film only in the reflective display region by using the droplet discharge method. That is, compared with the case where the retardation film forming material is applied to the entire surface of one of the pair of substrates and patterned, the manufacturing process can be simplified and waste of the retardation film forming material can be eliminated. .

Application Example 15 In the method for manufacturing a liquid crystal device according to the application example, in the application step, the application amount of the liquid material to be applied corresponding to at least one display color in the reflective display region is changed to another display color. It may be different from the coating amount of the liquid corresponding to the above.
According to this method, the thickness of the retardation film formed corresponding to at least one display color is made different from the thickness of the retardation film formed corresponding to another display color. Can do. That is, the optimum film thickness of the retardation film can be set according to the wavelength of the display color, and a liquid crystal device with better appearance can be manufactured.

Application Example 16 In the method for manufacturing a liquid crystal device according to the application example described above, the thickness of the liquid crystal layer in the reflective display region is set so as to be stacked on the retardation film in the reflective display region partitioned by the partition wall. A liquid crystal layer thickness adjusting layer forming step for forming a liquid crystal layer thickness adjusting layer for adjustment may be further provided.
According to this method, by providing the liquid crystal layer thickness adjusting layer forming step, even if the film thickness at which a predetermined retardation value is obtained differs depending on the retardation film forming material, or the film thickness of the retardation film depends on the display color. Even if they are different, by forming the liquid crystal layer thickness adjusting layer, a predetermined thickness of the liquid crystal layer can be secured in the reflective display region.

Application Example 17 In the method of manufacturing a liquid crystal device according to the application example described above, the liquid crystal layer thickness adjusting layer forming step includes the thickness of the liquid crystal layer in the reflective display region with respect to the thickness of the liquid crystal layer in the transmissive display region. It is preferable to form the liquid crystal layer thickness adjusting layer so that is half.
According to this method, the phase of the transmitted light in the transmissive display region and the phase of the reflected light having a double optical path in the reflective display region can be compensated by the retardation film so as to be the same. That is, it is possible to manufacture a liquid crystal device with good appearance by eliminating the phase shift of the reflected light with respect to the transmitted light.

[Application Example 18] In the method for manufacturing a liquid crystal device according to the application example, the liquid crystal layer thickness adjusting layer forming step includes the liquid material containing a liquid crystal layer thickness adjusting layer forming material as liquid droplets and partitioned by the partition walls. It is preferable to form the liquid crystal layer thickness adjusting layer by applying to the reflective display region and solidifying the applied liquid.
According to this method, the liquid crystal layer thickness adjusting layer can be selectively formed only in the reflective display region by using the droplet discharge method. That is, as compared with the case where the liquid crystal layer thickness adjusting layer forming material is applied to the entire surface of one of the pair of substrates and patterned, the manufacturing process is simplified and the liquid crystal layer thickness adjusting layer forming material is not wasted. be able to.

Application Example 19 An electronic apparatus according to this application example includes the liquid crystal device according to the application example described above or a liquid crystal device manufactured using the method for manufacturing the liquid crystal device according to the application example.
According to this configuration, since the liquid crystal device having a good appearance and a simplified manufacturing process is provided, a competitive electronic device can be provided.

FIG. 2 is an equivalent circuit diagram illustrating an electrical configuration of the liquid crystal device according to the first embodiment. FIG. 2 is a schematic plan view showing a structure of a pixel. FIG. 3A is a cross-sectional view showing the structure of the liquid crystal device cut along line A-A ′ in FIG. 2, and FIG. 3B is a cross-sectional view showing the structure of the liquid crystal device cut along line B-B ′ in FIG. 2. Schematic which shows an example of the optical design conditions of a liquid crystal device. 6 is a flowchart showing a method for manufacturing a liquid crystal device. (A)-(e) is a schematic sectional drawing which shows the manufacturing method of a liquid crystal device. (F)-(j) is a schematic sectional drawing which shows the manufacturing method of a liquid crystal device. The table | surface which shows the result of having evaluated the solubility of the solute in a liquid. The graph which shows the relationship between the application quantity of a liquid, and a film thickness. FIG. 4 is a schematic cross-sectional view illustrating a structure of a liquid crystal device according to Embodiment 2. Schematic perspective view showing a portable telephone as an electronic device (A) And (b) is a schematic plan view which shows arrangement | positioning of a partition part.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, embodiments of the invention will be described with reference to the drawings.

(Embodiment 1)
<Liquid crystal device>
First, the liquid crystal device of this embodiment will be described. FIG. 1 is an equivalent circuit diagram showing an electrical configuration of the liquid crystal device.

  As shown in FIG. 1, the liquid crystal device 100 of the present embodiment has a plurality of sub-pixels SG. Each sub-pixel SG includes a pixel electrode 9, a common electrode 19, and a TFT (Thin Film Transistor) 30 for controlling the switching of the pixel electrode 9. A liquid crystal layer 50 is interposed between the pixel electrode 9 and the common electrode 19. The common electrode 19 is electrically connected to the common line 3b extending from the scanning line driving circuit 90, and is held at a common potential in each subpixel SG.

  A data line 6 a extending from the data line driving circuit 70 is electrically connected to the source of the TFT 30. The data line driving circuit 70 supplies the image signals S1, S2,..., Sn to each subpixel SG via the data line 6a. The image signals S1 to Sn may be supplied line-sequentially in this order, or may be supplied for each group to a plurality of adjacent data lines 6a.

  Further, the scanning line 3 a extending from the scanning line driving circuit 90 is electrically connected to the gate of the TFT 30. Scan signals G1, G2,..., Gm, which are supplied from the scanning line driving circuit 90 to the scanning line 3a at a predetermined timing, are applied to the gates of the TFTs 30 in this order. The pixel electrode 9 is electrically connected to the drain of the TFT 30.

  The TFT 30 serving as a switching element is turned on for a certain period by the input of the scanning signals G1, G2,..., Gm, so that the image signals S1, S2,. Writing is performed on the pixel electrode 9. Image signals S1, S2,..., Sn written to the liquid crystal via the pixel electrode 9 are held for a certain period between the pixel electrode 9 and the common electrode 19 opposed via the liquid crystal.

FIG. 2 is a schematic plan view showing the structure of the pixel. As shown in FIG. 2, the liquid crystal device 100 includes a plurality of sub-pixels SG corresponding to three color filters 22R, 22G, and 22B corresponding to R (red), G (green), and B (blue). Of pixels. Each sub-pixel SG is provided with a rectangular pixel electrode 9 having a plurality of slits (gap) 29 formed in a substantially ladder shape. A scanning line 3a, a common line 3b, and a plurality of data lines 6a are arranged so as to surround the outer periphery of the pixel electrode 9.
A TFT 30 is formed in the vicinity of the intersection of the scanning line 3a and the data line 6a, and the TFT 30 is electrically connected to the data line 6a and the pixel electrode 9. Further, a rectangular common electrode 19 is formed at a position substantially overlapping the pixel electrode 9 in plan view.

  The pixel electrode 9 is a conductive film made of a transparent conductive material such as ITO. Seventeen slits 29 are formed in the pixel electrode 9 of one subpixel SG. Each slit 29 extends in a direction intersecting with both the scanning line 3a and the data line 6a (an oblique direction in the figure), and is formed so as to be arranged at equal intervals in the Y-axis direction. The slits 29 are formed to have substantially the same width and are parallel to each other. As a result, the pixel electrode 9 has a plurality (16 in the drawing) of strip-shaped electrode portions 9c. Since the slits 29 have a constant width and are arranged at equal intervals, the strip electrode portions 9c are also arranged with a constant width and at equal intervals. In the present embodiment, the width of the slit 29 and the width of the strip electrode portion 9c are both 4 μm.

The common electrode 19 includes a transparent common electrode 19t having a substantially rectangular shape in plan view made of a transparent conductive material such as ITO, and a reflective common electrode 19r having a substantially rectangular shape in plan view made of a metal material having light reflectivity such as aluminum or silver. Consists of. The transparent common electrode 19t and the reflective common electrode 19r are electrically connected to each other at the end portions.
The reflective common electrode 19r is integrally formed with a common line 3b extending in parallel with the scanning line 3a. Therefore, the common electrode 19 composed of the transparent common electrode 19t and the reflective common electrode 19r is electrically connected to the common line 3b.
The formation area of the reflective common electrode 19r constitutes the reflective display area R of the subpixel SG, and the formation area of the transparent common electrode 19t constitutes the transmissive display area T. That is, in the liquid crystal device 100, the reflective common electrode 19r functions as a reflective layer, and includes a reflective display region R and a transmissive display region T in each subpixel SG.

  Alternatively, the common line 3b and the reflective common electrode 19r may be formed using different conductive films, and these may be electrically connected. As the method, there is a method in which the reflective common electrode 19r and the common line 3b are formed in different wiring layers through an interlayer insulating film, and both are connected through a contact hole opened in the interlayer insulating film. Further, the transparent common electrode 19t may be formed so as to cover the reflective common electrode 19r.

The TFT 30 includes a semiconductor layer 35 made of an island-shaped amorphous silicon film partially formed on the scanning line 3a, a source electrode 31 branched from the data line 6a and extended onto the semiconductor layer 35, and a semiconductor layer. 35 and a rectangular drain electrode 32 extending from above to the formation region of the pixel electrode 9.
The scanning line 3 a functions as a gate electrode of the TFT 30 at a position facing the semiconductor layer 35. The drain electrode 32 and the pixel electrode 9 are electrically connected via a pixel contact hole 47 formed at a position where they overlap in a plane.
In the illustrated subpixel SG, a region where the pixel electrode 9 and the common electrode 19 overlap in plan view functions as a capacitor of the subpixel SG. Therefore, a separate storage capacitor is provided to hold the image signal. Therefore, it is not necessary to provide in the formation region, and a high aperture ratio can be obtained.

  With reference to FIG. 3, the structure of the liquid crystal device 100 will be described in more detail. FIG. 3 is a schematic cross-sectional view showing the structure of the liquid crystal device. Specifically, FIG. 4A is a cross-sectional view taken along line A-A ′ in FIG. 2, and FIG. 5B is a cross-sectional view taken along line B-B ′ in FIG. 2.

  As shown in FIG. 3A, in the liquid crystal device 100, a liquid crystal layer 50 is sandwiched between a counter substrate 20 which is a pair of substrates and an element substrate 10 having a pixel electrode 9 and a common electrode 19. The counter substrate 20 includes a color filter 22 and a partition wall 61 that partitions the color filter 22 (filter element 22G) for each sub-pixel SG (for each color). On the color filter 22 (on the liquid crystal layer 50 side), a retardation film 26 (26G) and a cell thickness adjusting layer 27 (27G) as a liquid crystal layer thickness adjusting layer are selectively formed corresponding to the reflective display region R. Has been. The partition wall portion 61 is provided so as to partition the retardation film 26 and the cell thickness adjusting layer 27. Accordingly, the cell thickness of the reflective display region R is thinner than the cell thickness of the transmissive display region T (thickness of the liquid crystal layer 50) d, and in this embodiment, is approximately d / 2, that is, half. .

In the liquid crystal device 100 that performs the reflective display in this manner, the external light that reaches the reflective common electrode 19r when performing the reflective black display needs to be substantially circularly polarized in all visible wavelength regions in terms of optical design. This is because if the external light reaching the reflective common electrode 19r is elliptically polarized, the black display is colored, making it difficult to obtain a high-contrast reflective display.
Therefore, in the present embodiment, the retardation film 26 and the cell thickness adjusting layer 27 are selectively formed in the reflective display region R partitioned by the partition wall 61, and the cell thickness in the reflective display region R is larger than that of the transmissive display region T. It is configured to be thin. Thereby, the upper polarizing plate 24, the retardation film 26, and the liquid crystal layer 50 in the reflective display region R can produce broadband circularly polarized light, and external light reaching the reflective common electrode 19r is circularly polarized in all visible wavelength regions. It is close to.

  A scanning line 3a, a common electrode 19 and a common line 3b are formed on the element substrate 10 made of transparent glass or the like. An insulating thin film 11 made of a silicon oxide film or the like is formed so as to cover the scanning line 3a, the common electrode 19 and the common line 3b. On the insulating thin film 11, an island-shaped semiconductor layer 35 constituting the TFT 30, a source electrode 31 (data line 6 a), and a drain electrode 32 are formed so as to partially overlap the semiconductor layer 35. An interlayer insulating film 12 made of a silicon oxide film or a resin film is formed so as to cover the semiconductor layer 35, the source electrode 31, and the drain electrode 32. A pixel electrode 9 is formed on the interlayer insulating film 12, and the pixel electrode 9 and the drain electrode 32 are electrically connected through a pixel contact hole 47 that penetrates the interlayer insulating film 12 and reaches the drain electrode 32. ing. The boundary between the transparent common electrode 19t and the reflective common electrode 19r in the common electrode 19 is located just below the partition wall 61 that partitions the transmissive display area T and the reflective display area R.

  An alignment film 18 made of polyimide or the like is formed so as to cover the pixel electrode 9. The alignment film 18 is subjected to an alignment process such as a rubbing process to align the liquid crystal in a predetermined direction. In the present embodiment, the alignment regulating direction by the alignment film 18 is parallel to the extending direction of the scanning line 3 a and intersects the extending direction of the slit 29 of the pixel electrode 9.

  Similar to the element substrate 10, on the counter substrate 20 made of transparent glass or the like, the color filter 22 (filter element 22G), the alignment film 23, the retardation film 26 (26G), toward the liquid crystal layer 50 side, A cell thickness adjusting layer 27 (27G), a partition wall portion 61 partitioning each of these components, and an alignment film 28 are formed. An upper polarizing plate 24 is attached to the surface of the counter substrate 20 (the surface opposite to the liquid crystal layer 50 side). The optical arrangement of the upper polarizing plate 24 and the lower polarizing plate 14 on the element substrate 10 side is crossed Nicol.

  The partition wall 61 is called a black matrix (BM). Examples of the forming method include a method of patterning a resin material containing a black pigment or the like as a light shielding material on the surface of the counter substrate 20 by a printing method such as offset. If a resin material having photosensitivity is selected, the resin material applied on the entire surface can be patterned by a photolithography method. In the present embodiment, the partition wall 61 has a high height so as to partition the color filter 22 (filter element 22G), the alignment film 23, the retardation film 26 (26G), and the cell thickness adjustment layer 27 (27G). Adjust the height. Therefore, you may form by laminating over multiple times so that it may become a thick film. Further, the length (in other words, the width) of the partition wall portion 61 that partitions the transmissive display region T and the reflective display region R in the Y-axis direction is such that the boundary between the transparent common electrode 19t and the reflective common electrode 19r is directly below the partition wall portion 61. It is preferable to determine the position in consideration of the positional accuracy in the Y-axis direction when the element substrate 10 and the counter substrate 20 are assembled.

  The color filter 22 is formed of a resin material including filter element forming materials (coloring materials) for the respective colors so as to fill the openings of the partition wall 61. Examples of the forming method include a method in which a liquid material containing the resin material is applied using a droplet discharge method (inkjet method), and the applied liquid material is dried to form the color filter 22. If such a droplet discharge method is used, it is possible to apply a necessary amount of the liquid material to the sub-pixel region partitioned by the partition wall 61 without waste as compared with the case where the droplet discharge method is used. is there. Further, a photomask is not required, and manufacturing processes such as exposure and development can be omitted.

The retardation film 26 is selectively formed on the color filter 22 corresponding to the reflective display region R. The retardation film 26 imparts a retardation (retardation) of approximately ½ wavelength (λ / 2) to the light transmitted through the retardation film 26, and the liquid crystal layer 50 is held between a pair of substrates. This is a so-called built-in retardation film provided on the inner surface side of the cell.
The retardation film 26 is a reflective display region R partitioned by a partition wall 61 by using a droplet discharge method (inkjet method) of a liquid (organic solution) containing a polymerizable liquid crystal compound as a retardation film forming material. The film is applied on the alignment film 23 formed in the above and is solidified in a state of being aligned in a predetermined direction. In detail, it demonstrates in the manufacturing method of the liquid crystal device mentioned later.
The alignment film 23 that regulates the alignment direction of the polymerizable liquid crystal compound (the direction of the slow axis of the retardation film 26) can be made of the same film material as the alignment films 18 and 28 facing the liquid crystal layer 50. In that case, the surface of the alignment film 23 is rubbed to determine the alignment direction (the direction of the slow axis). In addition to the alignment film 23, a method of obliquely depositing silicon oxide or the like on the surface of the color filter 22, a method of photo-alignment by applying a photosensitive alignment film material and irradiating polarized ultraviolet rays, etc. There is. In the present embodiment, since it is preferable to selectively form the alignment film 23 in the region partitioned by the partition wall 61, the liquid containing the photosensitive alignment film material is liquid like the method for forming the retardation film 26. A method of coating using a droplet discharge method was adopted.

  The phase difference value (hereinafter referred to as the phase difference value) imparted to the light transmitted through the phase difference film 26 is adjusted according to the type of the polymerizable liquid crystal compound that is the constituent material and the layer thickness of the phase difference film 26. can do. In the present embodiment, the target retardation value of the retardation film 26 is equivalent to the retardation value (λ / 2) of the liquid crystal layer 50 in the transmissive display region T. The wavelength λ is based on 550 nm, and the retardation value of the liquid crystal layer 50 is obtained by multiplying the birefringence Δn of the liquid crystal molecules by the cell thickness d. Therefore, the retardation value of the liquid crystal layer 50 in the reflective display region R is λ / 4.

  As shown in FIG. 3B, the retardation film 26 and the cell thickness adjusting layer 27 are partitioned by the partition wall portions 61 of the sub-pixels SG corresponding to the three color (R, G, B) color filters 22. It is provided in the reflective display region R.

  The film thicknesses of the filter elements 22R, 22G, and 22B of the respective colors in the color filter 22 are substantially the same, but the film thickness of the retardation film 26 formed for each of the filter elements 22R, 22G, and 22B is, in this case, for each color. Different. Specifically, the order is retardation film 26R> retardation film 26G> retardation film 26B. In consideration of the absorption wavelength of each of the filter elements 22R, 22G, and 22B, the film thickness of the retardation film 22 is made different for each color so that an optimum retardation value is given. Thereby, the color purity in color display can be improved.

  Therefore, as described above, in order to set the cell thickness in the reflective display region R to d / 2, it is necessary to make the layer thickness of the cell thickness adjusting layer 27 different for each color. Specifically, the layer thickness of the cell thickness adjustment layer 27 is in the order of cell thickness adjustment layer 27B> cell thickness adjustment layer 27G> cell thickness adjustment layer 27R. Such adjustment of the thickness of the retardation film 26 and the cell thickness adjusting layer 27 has a considerable effect if performed on at least one color (display color) filter element.

  The cell thickness adjusting layer 27 is preferably a resin material having optical transparency and isotropic properties. It is desirable that the protective layer covering the retardation film 26 has physical strength. For example, an acrylic resin material is preferably used. In the present embodiment, since the cell thickness adjusting layer 27 is selectively formed in the region partitioned by the partition wall 61, it is preferable to employ the droplet discharge method. In that case, a liquid containing the resin material as a cell thickness adjusting layer forming material is used.

  Next, the optical design conditions of the liquid crystal device 100 will be described together. FIG. 4 is a schematic diagram illustrating an example of the optical design conditions of the liquid crystal device. As shown in FIG. 4, the optical design condition of the liquid crystal device 100 is that the polarization axis of the upper polarizing plate 24 and the polarization axis of the lower polarizing plate 14 are orthogonal to each other. The slow axis of the retardation film 26 provided in the reflective display region R intersects the polarization axis of the upper polarizing plate 24 at an angle of 22.5 degrees. The slow axis is set to intersect with the slit 29 (see FIG. 2) provided in the pixel electrode 9 at an angle of 45 degrees. The orientation direction of the slow axis of the liquid crystal molecules in the liquid crystal layer 50 is parallel to the polarization axis of the lower polarizing plate 14 in the OFF state in which a predetermined drive voltage is not applied between the pixel electrode 9 and the common electrode 19. It has become. In an ON state in which a predetermined drive voltage is applied between the pixel electrode 9 and the common electrode 19, the pixel electrode 9 intersects the polarization axis of the upper polarizing plate 24 at an angle of 45 degrees. Thereby, in the OFF state, the transmitted light (linearly polarized light) that is polarized through the lower polarizing plate 14 is given a phase of λ / 2 in the liquid crystal layer 50, and the vibration direction of the transmitted light is that of the upper polarizing plate 24. The light is shielded because it is converted in a direction perpendicular to the polarization axis (parallel to the absorption axis). On the other hand, incident light (linearly polarized light) that has been transmitted through the upper polarizing plate 24 and polarized in the reflective display region R is given a phase of λ / 2 and λ / 4 by the retardation film 26 and the liquid crystal layer 50, respectively. The substantially circularly polarized light is incident on the reflective common electrode 19r over almost the entire wavelength range. The reflected light reflected by the reflective common electrode 19r is converted into polarized light perpendicular to the polarization axis of the upper polarizing plate 24 when entering the upper polarizing plate 24 again, so that the light is not transmitted. Therefore, a so-called black display state (normally black) is obtained. In the ON state, the orientation direction of the slow axis of the liquid crystal molecules is 45 degrees with respect to each of the upper polarizing plate 24 and the lower polarizing plate 14, so the vibration direction of the transmitted light and the reflected light transmitted through the color filter 22 is the upper polarization It is parallel to the polarization axis of the plate 24 and passes through the upper polarizing plate 24. Therefore, a color display state corresponding to the colors of the filter elements 22R, 22G, and 22B is obtained.

  As described above, the liquid crystal device 100 according to the present embodiment has the transmissive display region T and the reflective display region R for each subpixel SG, and the so-called FFS (with the retardation film 26 in the cell corresponding to the reflective display region R). Fringe Field Switching). The optical design is optimized, and the retardation film 26 is formed in the reflective display region R partitioned by the partition wall portion 61. Therefore, the change of the phase difference value in the outer peripheral portion of the phase difference film 26 is suppressed, and the display is hardly affected. Therefore, a transmissive display and a reflective display are realized in which the contrast decrease due to light leakage at the outer peripheral portion of the retardation film 26 during black display is small.

<Method for manufacturing liquid crystal device>
Next, a method for manufacturing the liquid crystal device of this embodiment will be described. FIG. 5 is a flowchart showing a method for manufacturing a liquid crystal device, and FIGS. 6A to 6E and 7F to 7J are schematic cross-sectional views showing a method for manufacturing a liquid crystal device.

  As shown in FIG. 5, in the method of manufacturing the liquid crystal device 100 according to the present embodiment, the partition part forming step (step S <b> 1) for forming the partition part 61, and the color filter 22 is formed in the region partitioned by the partition part 61. And a color filter forming step (step S2). A first alignment film forming step (step S3) for forming the alignment film 23 as the first alignment film, a coating step for applying the liquid material containing the retardation film forming material, and drying the applied liquid material And a retardation film forming step (step S4) for forming a retardation film. In addition, a cell thickness adjusting layer forming step (step S5) for forming the cell thickness adjusting layer 27 on the formed retardation film 26 and a second alignment film forming step for forming the alignment film 28 as the second alignment film (step S5). Step S6) and a liquid crystal filling assembly step (Step S7) for filling and assembling liquid crystal between the element substrate 10 and the counter substrate 20 are provided.

  Step S1 in FIG. 5 is a partition wall forming process. In step S1, as shown in FIG. 6A, a partition wall 61 having a plurality of openings 61a is formed. Specifically, a method of applying and patterning a light-blocking partition wall forming material on the surface of the counter substrate 20 by using a printing method such as offset, and applying a photosensitive partition wall forming material with a predetermined film thickness. Then, there is a method of patterning the partition wall 61 by exposing and developing. The partition wall 61 is formed so as to partition and open the above-described subpixels SG, and to partition the reflective display region R and the transmissive display region T (see FIG. 3). The film thickness, that is, the height h of the partition wall 61 is a height at which the filter elements 22R, 22G, and 22B, the alignment film 23, the retardation film 26, and the cell thickness adjusting layer 27 of the color filter 22 to be formed later can be partitioned. Adjust as follows. Then, the process proceeds to step S2.

  Step S2 in FIG. 5 is a color filter forming process. In step S2, as shown in FIG. 6B, first, three color liquids 4R, 4G, and 4B containing a filter element forming material are respectively applied to desired openings 61a (in other words, sub-pixel regions). In the present embodiment, the three color liquids 4R, 4G, and 4B are filled in different ejection heads 1R, 1G, and 1B, and the ejection heads 1R, 1G, and 1B and the counter substrate 20 are relatively scanned. The liquid is ejected as droplets from a plurality of nozzles 2 provided in each ejection head 1R, 1G, 1B. The three color liquids 4R, 4G, and 4B may be discharged almost simultaneously or individually. If, for example, an inkjet head is used as the ejection heads 1R, 1G, and 1B, the required amount of the liquid materials 4R, 4G, and 4B can be applied to the desired openings 61a with high accuracy and without waste.

In addition, before apply | coating liquid 4R, 4G, 4B, it is preferable to carry out a lyophilic process on the application surface of the counter substrate 20 in which the partition part 61 was formed, and to perform the liquid-repellent process on the partition part 61. As a method of lyophilic treatment, plasma treatment using oxygen gas as a treatment gas can be given. As a liquid repellent treatment method, plasma treatment using CF ₄ as a treatment gas can be given. By applying such a surface treatment, the liquids 4R, 4G, and 4B can be applied to the opening 61a without unevenness.

  Next, the applied liquids 4R, 4G, and 4B are dried and the solvent component is removed, so that the filter elements 22R and green (G) corresponding to red (R) are obtained as shown in FIG. The corresponding filter element 22G and the filter element 22B corresponding to blue (B) can each be formed with a predetermined film thickness (approximately 1.5 to 2 μm). Then, the process proceeds to step S3.

  Step S3 in FIG. 5 is a first alignment film forming step. In step S3, as shown in FIG. 6D, first, the liquid 5 containing the photosensitive alignment film forming material is applied on the filter element in the reflective display region R partitioned by the partition wall portion 61. Similarly to the color filter forming step, the liquid material 5 is filled in the discharge head 1 and the discharge head 1 and the counter substrate 20 are scanned relatively, so that the liquid is discharged from the plurality of nozzles 2 provided in the discharge head 1. Discharge as drops. Although not shown, the partition wall section 61 partitions the reflective display region R and the transmissive display region T, but it is not necessary to discharge the liquid material 5 to the transmissive display region T.

  Next, as shown in FIG. 6E, the applied liquid 5 is dried and cured while being photo-aligned by irradiating polarized ultraviolet rays (shown by arrows). Thereby, the alignment film 23 is formed in the reflective display region R. Examples of the photosensitive alignment film material include polyimide-based photosensitive resin materials. Then, the process proceeds to step S4.

  Step S4 in FIG. 5 is a retardation film forming process. In step S4, first, as shown in FIG. 7F, the liquid material 6 containing the retardation film forming material is applied to the reflective display region R partitioned by the partition wall portion 61 (application process). Also in this case, a liquid droplet ejection method (inkjet method) is used, the liquid body 6 is filled in the ejection head 1, and the ejection head 1 and the counter substrate 20 are relatively scanned to provide the ejection head 1. A plurality of nozzles 2 are discharged as droplets. Since the surface of the alignment film 23 may exhibit liquid repellency with respect to the liquid 6, it is preferable to perform the lyophilic treatment as described above.

  In the coating process, the coating amount of the liquid material 6 is made different corresponding to each filter element 22R, 22G, 22B. If the droplet discharge method is used, a desired amount of the liquid material 6 can be discharged as droplets in a desired region.

  Next, as shown in FIG. 7G, the applied liquid material 6 is dried and solidified to form the retardation films 26R, 26G, and 26B having different film thicknesses (film forming process). In this case, the film thickness (application amount) is set based on the retardation value of the retardation film 26G. The thickness of the retardation film 26G is approximately 1.5 to 2 μm, and the retardation value is approximately 265 to 275 nm. The thickness of the retardation film 26R is set to be thicker than that, and the thickness of the retardation film 26B is set to be thinner than this. Needless to say, the setting of these film thicknesses depends on the selection of the retardation film forming material.

  An example of the case where a polymerizable liquid crystal compound is used as the phase difference film forming material includes Paliocolor LC242 manufactured by BASF. LC242 is a photopolymerization type material. Hereinafter, the Example using LC242 about the composition of the liquid body 6 is described.

(Example)
Retardation film forming material: LC242, concentration 30 wt%.
Photopolymerization initiator; 2-methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one, specifically, an amount added to Irgacure 907 and LC242 manufactured by Ciba Specialty Chemicals Is 3 wt%.
Solvent; PGMEA; 2-acetoxy-1-methoxypropane, concentration 70 wt%.

  LC242 as a solute hardly dissolves at room temperature in PGMEA as a solvent. Therefore, the solute was added to the solvent heated to about 70 ° C. and stirred, and the solubility was evaluated. FIG. 8 is a table showing the results of evaluating the solubility of the solute in the liquid.

  As shown in FIG. 8, when the solute concentration is 30 to 50 wt%, the solute does not precipitate even if it is left at room temperature for 100 H (hours) after being dissolved at 70 ° C. When the solute concentration is 60 to 70 wt%, it dissolves once at 70 ° C, but precipitates when left at room temperature for 24H. When the solute concentration is 80 wt%, precipitation occurs in the same manner at room temperature 8H. When the solute concentration is 90 wt%, it does not dissolve in the solvent heated to 70 ° C. Therefore, considering the stability as the liquid material 6, the solute concentration is preferably 50 wt% or less. In order to discharge using the droplet discharge method, it is desirable that the viscosity be adjusted to 3 mPa, s or more and 20 mPa, s or less. Therefore, in this example, the solute concentration was set to 30 wt%. The viscosity at this time is approximately 10 mPa, s.

  Using such a liquid material 6, the discharge amount per drop was set to about 10 ng. The counter substrate 20 coated with the liquid material 6 was heated to dry the liquid material 6. Examples of the drying method include a method of leaving the counter substrate 20 on a heated hot plate and a method of using a drying furnace. For example, when left on a hot plate heated to 70 ° C., it can be dried in several tens of seconds.

The thin film obtained by drying was irradiated with ultraviolet light having a main wavelength of 365 nm under the condition of 400 mJ / cm ² , so that photopolymerization occurred and the retardation film 26 could be formed. Note that for ultraviolet irradiation, nitrogen (N ₂₎ is desirably carried out under atmosphere. Thus, it is possible to reduce the photopolymerization due to the influence of atmospheric oxygen (O ₂₎ is inhibited.

FIG. 9 is a graph showing the relationship between the coating amount of the liquid material and the film thickness. As shown in FIG. 9, when the coating amount of the liquid material 6 in the above embodiment is applied in the range of 1.0 to 6.0 μg / mm ² , the thickness of the retardation film 26 is 1.5 to 4.5 μm. It was found that control was possible within the range.

  When such a liquid material 6 is used, the retardation films 26R, 26G, and 26B having different film thicknesses as shown in FIG. 7G can be formed by adjusting the coating amount for each color of the color filter. The retardation value is given by multiplying the birefringence Δn of the retardation film forming material and the film thickness t. For example, when the retardation value is λ / 2 and the birefringence Δn of the retardation film forming material is 0.14, the thickness of the retardation film 26R is set to 2.32 μm, so that red (R) A phase difference value of 325 nm, which is half the wavelength of 650 nm, is obtained. Similarly, if the thickness of the retardation film 26G is 1.96 μm, a retardation value 275 nm, which is a half value of the green (G) wavelength 550 nm, is obtained. If the thickness of the retardation film 26B is 1.61 μm, a retardation value 225 nm, which is half the blue (B) wavelength 450 nm, can be obtained.

  The photopolymerization initiator is not limited to this. Since the ultraviolet absorption characteristic of the photopolymerization initiator varies depending on the wavelength of the ultraviolet ray, it is desirable to select the photopolymerization initiator in consideration of the wavelength characteristic of the ultraviolet irradiation device and adjust the addition amount to the retardation film forming material. Needless to say, the photopolymerization initiator is selected in consideration of the chemical structure of the retardation film forming material.

  The retardation film forming material is not limited to the photopolymerization type polymerizable liquid crystal compound. For example, a thermal polymerization type may be adopted. In the case of the thermal polymerization type, it is not necessary to use a photosensitive material having a photosensitive group that is easily colored as compared with the case where the retardation film 26 is formed by a so-called photolithography method. Can be formed. On the other hand, in order to carry out thermal polymerization, it is desirable to set the heating conditions in consideration of variations in film thickness caused by heating. Then, the process proceeds to step S5.

  Step S5 in FIG. 5 is a cell thickness adjusting layer forming step. In step S5, first, as shown in FIG. 7 (h), the liquid 7 containing the cell thickness adjusting layer forming material is applied to the reflective display region R partitioned by the partition wall 61. Also in this case, a liquid droplet ejection method (inkjet method) is used, the liquid material 7 is filled in the ejection head 1, and the ejection head 1 and the counter substrate 20 are relatively scanned to provide the ejection head 1. A plurality of nozzles 2 are discharged as droplets.

  As the cell thickness adjusting layer forming material, a photocurable acrylic resin material is used as described above. The coating amount of the liquid 7 is made different for each of the retardation films 26R, 26G, and 26B so that the surface becomes flat after the film formation in each opening 61a.

  Next, as shown in FIG. 7 (i), the cell thickness adjusting layers 27R, 27G, and 27B are formed by irradiating and curing ultraviolet rays, respectively. The thickness of the cell thickness adjusting layer 27 is set so that the cell thickness in the reflective display region R after cell assembly is half of the cell thickness d in the transmissive display region T. Then, the process proceeds to step S6.

  Step S6 in FIG. 5 is a second alignment film forming step. In step S6, as shown in FIG. 7J, an alignment film 28 as a second alignment film is formed so as to cover the partition wall 61 and the cell thickness adjustment layers 27R, 27G, and 27B. The alignment film 28 is formed by applying an organic solution containing polyimide or polyamic acid as an alignment film material, followed by drying and baking to remove the solvent component. Examples of the coating method include spin coating and slit coating, printing methods such as offset, and droplet discharge methods. The formed alignment film 28 is rubbed in a certain direction on the surface thereof. Then, the process proceeds to step S7.

  Step S7 in FIG. 5 is a liquid crystal filling assembly process. In step S7, as shown in FIGS. 3A and 3B, the element substrate 10 on which the pixel components (pixel electrode 9, common electrode 19 and the like) are formed and the counter substrate 20 are placed at predetermined positions. It is made to oppose and it joins via a sealing material. A liquid crystal is filled between the element substrate 10 and the counter substrate 20 to form a liquid crystal layer 50. As a method of filling the liquid crystal, a sealing material is formed in a frame shape on one of a pair of substrates by a printing method or a discharge method. There is a method in which a required amount of liquid crystal is dropped in a vacuum after seeing it on a saucer and then bonded to the other substrate. As the sealing material, for example, a thermosetting epoxy adhesive is preferably used. The thickness of the liquid crystal layer 50 is set so that the thickness of the liquid crystal layer 50 in the reflective display region R after cell assembly is half the thickness d of the liquid crystal layer 50 in the transmissive display region T.

  By attaching the upper polarizing plate 24 and the lower polarizing plate 14 to the front and back surfaces of the cell thus formed, the liquid crystal device 100 is completed. The liquid crystal device 100 is connected to a drive circuit that drives the liquid crystal device 100, and an illuminating device for illuminating the liquid crystal device 100 is provided on the back side of the element substrate 10. The lighting device includes an LED as a light source, a cold cathode tube, a light guide plate that guides light from the light source to the liquid crystal device 100, and the like.

  According to the method for manufacturing the liquid crystal device 100, the color filter forming step (step S2), the first alignment film forming step (step S3), the retardation film forming step (step S4), and the cell thickness adjusting layer forming step (step S5). ) At least using a droplet discharge method. Therefore, the manufacturing process can be simplified as compared with the case where the photolithography method is used in these processes. Moreover, a desired thin film can be formed using each liquid body 4,5,6,7 without waste. Furthermore, since the retardation film 26 is partitioned by the partition wall portion 61 having a light shielding property, a change in the retardation value in the outer peripheral portion of the retardation film 26 is suppressed, and light leakage hardly occurs. Is prevented from leaking into the transmissive display area T. Therefore, the liquid crystal device 100 with good appearance can be manufactured.

(Embodiment 2)
Next, another liquid crystal device will be described with reference to FIG. FIG. 10 is a schematic cross-sectional view illustrating the liquid crystal device according to the second embodiment. The liquid crystal device of the second embodiment has the same equivalent circuit configuration as the liquid crystal device 100 of the first embodiment and the configuration of the element substrate 10, and the configuration of the counter substrate 20 is different. Therefore, the same components as those in the first embodiment are represented by the same reference numerals.

  As shown in FIG. 10, the liquid crystal device 200 according to this embodiment includes an alignment film 23 and a retardation film 26 (26G) facing the liquid crystal layer 50 in the reflective display region R partitioned by the partition wall 61 of the counter substrate 20. The color filter 22 (filter element 22G) is stacked in this order. That is, the filter element 22G is laminated on the retardation film 26 (26G) in the reflective display region R.

  Depending on the selection of the material for forming the retardation film 26, it is conceivable that the physical properties of the formed retardation film 26, for example, the surface hardness is lowered. In such a case, problems such as the inability to withstand an alignment process such as rubbing for aligning liquid crystal molecules, and the retardation film 26 may be scraped off. Further, when the retardation film 26 contains impurities such as an ionic component, even if the retardation film 26 is covered with the alignment film 28, the impurities may diffuse into the liquid crystal layer 50 with time and the optical characteristics may change. In the liquid crystal device 100 of the first embodiment, the cell thickness adjusting layer 27 is provided so as to cover the retardation film 26. The cell thickness adjusting layer 27 has a function as a protective layer for preventing the above-described problems.

  In the liquid crystal device 200, by providing the filter element 22G on the retardation film 26, the function as the protective layer is given to the filter element 22G. Therefore, the structure is more simplified than that of the liquid crystal device 100.

  Such a manufacturing method of the liquid crystal device 200 is the same as the manufacturing method of the liquid crystal device 100 of the first embodiment, except that the order of steps S1 to S4 is changed and the cell thickness adjusting layer forming step of step S5 is omitted. That is, after the partition wall 61 is formed on the counter substrate 20, the alignment film 23 is formed in the reflective display region R. Subsequently, the color filter 22 may be formed after the retardation film 26 is formed in the reflective display region R. Since each of these steps uses a droplet discharge method (inkjet method), the alignment film 23, the retardation film 26, and the color filter 22 can be selectively formed in the reflective display region R. Needless to say, in the retardation film forming step, material selection and film thickness adjustment are performed so that the cell thickness adjustment layer 27 is not necessary.

  According to such a manufacturing method of the liquid crystal device 200, the transflective liquid crystal device 200 can be manufactured more efficiently without the manufacturing process.

(Embodiment 3)
Next, an electronic device including the liquid crystal device will be described with reference to FIG. FIG. 11 is a schematic perspective view showing a mobile phone as an electronic apparatus.

  As shown in FIG. 11, a mobile phone 300 as an electronic apparatus according to the present embodiment includes a main body including an operation input unit and a display unit 301. The display unit 301 incorporates the liquid crystal device 100 or the liquid crystal device 200 and an illumination device that illuminates the liquid crystal device 100. Therefore, the displayed information can be confirmed by transmissive display using transmitted light from the illumination device and reflective display using incident light such as external light. That is, in an environment with sufficient brightness, such as outdoors, it is possible to check information by the reflective display mode without driving the lighting device. That is, power saving and a portable phone 300 having a long battery life are realized.

  The mobile phone 300 includes the liquid crystal device 100 according to the first embodiment, the liquid crystal device 200 according to the second embodiment, or the liquid crystal device 100 manufactured using the method for manufacturing the liquid crystal device 100 according to the first embodiment. The liquid crystal device 200 manufactured using the manufacturing method of the liquid crystal device 200 of No. 2 is mounted. Therefore, it is possible to provide the mobile phone 300 having a good display quality and excellent cost performance.

  Various modifications other than the above embodiment are conceivable. Hereinafter, a modification will be described.

  (Modification 1) In the liquid crystal device 100 of the first embodiment, the arrangement of the partition walls 61 is not limited to this. 12A and 12B are schematic plan views showing the arrangement of the partition walls. In the first embodiment, as shown in FIG. 12A, the partition walls 61 are provided in a lattice pattern to partition each sub-pixel SG (substantially each filter element 22R, 22G, 22B), and Y The reflective display region R and the transmissive display region T were partitioned in the axial direction (the direction in which filter elements of the same color are arranged in stripes). On the other hand, as shown in FIG. 5B, the reflective display area R and the transmissive display area T may be partitioned in the X-axis direction orthogonal to the Y-axis direction. As described above, how the reflective display region R and the transmissive display region T are partitioned by the partition wall 61 is more effective in reflecting the reflective display region R and the transmissive display in consideration of the shape of the subpixel SG and the viewing angle characteristics. What is necessary is just to determine arrangement | positioning of the area | region T. FIG. In addition, in the subpixel SG, the reflective display region R can be isolated and provided in an island shape.

  (Modification 2) In the liquid crystal device 100 of the first embodiment, the arrangement of the partition wall 61, the retardation film 26, and the cell thickness adjusting layer 27 is not limited to this. For example, in FIGS. 3A and 3B, the color filter 22 may be provided on the counter substrate 20 side, and the partition wall portion 61, the retardation film 26, and the cell thickness adjusting layer 27 may be disposed on the element substrate 10 side. . A similar effect can be obtained with such a configuration. Further, since the configuration on the counter substrate 20 side is simplified, a raw material substrate including the color filter 22 can be procured from an external manufacturer. Further, the cell thickness adjusting layer 27 is not essential, and a phase difference value of λ / 2 is given to the cell thickness d of the transmissive display region T so that the cell thickness of the reflective display region R becomes d / 2. The film thickness of the retardation film 26 may be adjusted.

  (Modification 3) In the liquid crystal device 100 of the first embodiment, the configuration of the sub-pixel SG realizing the reflective display region R is not limited to the reflective common electrode 19r having light reflectivity. For example, the transparent common electrode 19t may be provided in the same size as the pixel electrode 9 in plan view, and a reflective layer having light reflectivity may be formed under the transparent common electrode 19t. Examples of the method for forming the reflective layer include a method of forming a metal thin film such as Al or Ag on a resin layer having a plurality of irregularities. Such a reflective layer is formed corresponding to the reflective display region R. According to this, it is possible to realize a brighter reflective display by reducing the directivity of the light reflected by the reflective layer.

  (Modification 4) In the liquid crystal device 100 of the first embodiment, the arrangement of the three color filter elements 22R, 22G, and 22B is not limited to the stripe method. For example, the configuration of the retardation film 26 of the first embodiment can also be applied to a mosaic arrangement and a delta arrangement. The color filter 22 is not limited to three colors, and may have a multicolor configuration in which colors other than R, G, and B are added. Further, the present invention can also be applied to a transflective liquid crystal panel having only a so-called monochrome display without providing the color filter 22.

  (Modification 5) The liquid crystal device 100 of the first embodiment and the liquid crystal device 200 of the second embodiment are not limited to the FFS transflective type. For example, the present invention can be applied to a transflective liquid crystal device of an IPS system or a VA (Vertical Alignment) system. The switching element is not limited to the TFT 30 and may be a TFD (Thin Film Diode) element. Furthermore, the present invention is not limited to an active method including a switching element, and can be applied to a simple matrix liquid crystal device.

  (Modification 6) In the method of manufacturing the liquid crystal device 100 of the first embodiment, the method of forming the color filter 22 is not limited to using the droplet discharge method. The partition wall 61 may be formed on the color filter 22 after the color filter 22 is formed by photolithography.

  (Modification 7) In the method of manufacturing the liquid crystal device 100 of the first embodiment, the method of forming the alignment film 23 that defines the direction of the slow axis of the retardation film 26 is the method of forming the liquid 5 using the droplet discharge method. It is not limited to the method of applying to the opening 61a and irradiating with polarized ultraviolet rays for photo-alignment. For example, a method of patterning by applying the liquid material 5 containing the alignment film forming material by spin coating or roll coating and a patterning method using a printing method such as offset can be employed.

  (Modification 8) In the method for manufacturing the liquid crystal device 100 of the first embodiment, the cell thickness adjustment layer forming step (step S5) is not essential. For example, the thickness of the retardation film 26 may be adjusted by selecting a retardation film forming material so that the cell thickness adjustment is not necessary.

  (Modification 9) In the method of manufacturing the liquid crystal device 100 of the first embodiment, the configuration in which the thickness of the retardation film 26 and the cell thickness adjustment layer 27 is different for each display color is not limited to this. For example, the thickness of the retardation film 26 and the cell thickness adjusting layer 27 may be the same regardless of the display color. According to this, it can simplify more except the adjustment process of the film thickness in a manufacturing process.

  (Modification 10) The method of manufacturing the liquid crystal device 200 of the second embodiment is not limited to this. For example, first, the alignment film 23 is formed on the counter substrate 20, and the direction of the slow axis is regulated by rubbing. Thereafter, the partition wall 61 is formed using a printing method such as offset or transfer. Subsequently, the retardation film 26 is formed in the reflective display region R partitioned by the partition wall 61. Further, the filter elements 22R, 22G, and 22B of the color filter 22 may be formed in the sub-pixel region partitioned by the partition wall 61. According to this, a rubbing process can be used as a method for regulating the direction of the slow axis of the retardation film 26, and the direction of the slow axis can be stabilized without being disturbed by the partition wall 61. it can.

  (Modification 11) In the third embodiment, the electronic device including the liquid crystal device 100 or the liquid crystal device 200 is not limited to the mobile phone 300. For example, it is suitable if it is installed in an electronic device such as a notebook personal computer, an electronic notebook, a viewer for displaying video information, a DVD player, or a portable information terminal.

  4R, 4G, 4B ... Liquid containing filter element forming material, 5 ... Liquid containing alignment film material, 6 ... Liquid containing retardation film forming material, 7 ... Liquid containing cell thickness adjusting layer forming material, DESCRIPTION OF SYMBOLS 10 ... Element board | substrate as one of a pair of board | substrate, 20 ... Counter board | substrate as one of a pair of board | substrate, 22 ... Color filter, 22R, 22G, 22B ... Filter element, 23 ... Orientation film | membrane, 26, 26R, 26G, 26B ... retardation film, 27, 27R, 27G, 27B ... cell thickness adjusting layer, 50 ... liquid crystal layer, 61 ... partition part, 61a ... opening as a region partitioned by the partition part, 100 ... liquid crystal device, 200 ... liquid crystal 300, a mobile phone as an electronic device, R, a reflective display area, SG, a sub-pixel, T, a transmissive display area.

Claims (19)

A pair of substrates;
A liquid crystal layer sandwiched between the pair of substrates;
A plurality of pixels having a reflective display area and a transmissive display area in one pixel area;
A retardation film provided in the reflective display region,
The retardation film is provided on the liquid crystal layer side of one of the pair of substrates,
A liquid crystal device, wherein a light-shielding partition wall partitioning the retardation film is provided on the liquid crystal layer side of the one substrate. A color filter having a plurality of color filter elements is provided on the liquid crystal layer side of the one substrate;
The liquid crystal device according to claim 1, wherein the partition wall partitions the plurality of color filter elements and partitions the retardation film.   3. The liquid crystal device according to claim 2, wherein the filter element provided in the reflective display region of the one substrate is stacked on the retardation film toward the liquid crystal layer.   The liquid crystal device according to claim 1, wherein an alignment film that defines a direction of a slow axis of the retardation film is provided on the liquid crystal layer side of the one substrate.   The retardation film provided corresponding to at least one color of the filter elements of the plurality of pixels is different in film thickness from the retardation film provided corresponding to the filter elements of other colors. The liquid crystal device according to claim 2, wherein the liquid crystal device is a liquid crystal device.   A liquid crystal layer thickness adjusting layer for adjusting a thickness of the liquid crystal layer in the reflective display region is provided in the reflective display region partitioned by the partition wall between the retardation film and the liquid crystal layer. The liquid crystal device according to claim 1, wherein the liquid crystal device is a liquid crystal device.   The liquid crystal layer thickness adjusting layer is provided so that a thickness of the liquid crystal layer in the reflective display region is half of a thickness of the liquid crystal layer in the transmissive display region. The liquid crystal device according to 1. A method of manufacturing a liquid crystal device including a plurality of pixels having a reflective display region and a transmissive display region in one pixel region,
A partition wall forming step of partitioning a plurality of the pixel regions on the surface of one of the pair of substrates and forming a light-shielding partition wall so as to partition the reflective display region and the transmissive display region; ,
A retardation film forming step of forming a retardation film in the reflective display area partitioned by the partition;
An assembly step of joining the pair of substrates through a liquid crystal layer. A color filter forming step of forming a color filter having a plurality of color filter elements in the plurality of pixel regions partitioned by the partition wall;
The partition wall forming step forms the partition wall at a height exceeding the film thickness of the filter element,
9. The liquid crystal device according to claim 8, wherein in the retardation film forming step, the retardation film is formed so as to be laminated on the filter element in the reflective display region partitioned by the partition wall. Production method. A color filter forming step of forming a color filter having a plurality of color filter elements in the plurality of pixel regions partitioned by the partition wall;
In the partition wall forming step, the partition wall is formed at a height exceeding the thickness of the retardation film,
The liquid crystal device manufacturing method according to claim 8, wherein in the color filter forming step, the filter element is formed so as to be laminated on the retardation film in the reflective display region partitioned by the partition wall. Method.   In the color filter forming step, a liquid material containing a filter element forming material is applied as droplets to the plurality of pixel regions partitioned by the partition wall, and the applied liquid material is solidified, whereby the filter 11. The method for manufacturing a liquid crystal device according to claim 9, wherein an element is formed.   11. The alignment film forming step of forming an alignment film that defines a direction of a slow axis of the retardation film before forming the retardation film. A manufacturing method of a liquid crystal device given in the above.   In the alignment film forming step, a liquid containing a photocurable alignment film forming material is applied as droplets to the reflective display region partitioned by the partition wall, and the applied liquid is dried. The method of manufacturing a liquid crystal device according to claim 12, wherein the alignment film is formed by being cured by irradiation with light.   In the retardation film forming step, a liquid material containing a retardation film forming material is applied as droplets to the reflective display area partitioned by the partition wall, and the applied liquid material is solidified. The method for manufacturing a liquid crystal device according to claim 8, further comprising a film forming step of forming the retardation film.   The application step is characterized in that an application amount of the liquid material applied corresponding to at least one display color in the reflective display region is different from an application amount of the liquid material corresponding to another display color. The method of manufacturing a liquid crystal device according to claim 14.   The liquid crystal layer thickness adjusting layer forming step of forming a liquid crystal layer thickness adjusting layer for adjusting the thickness of the liquid crystal layer in the reflective display region is further provided in the reflective display region partitioned by the partition wall. The method for manufacturing a liquid crystal device according to claim 8.   In the liquid crystal layer thickness adjusting layer forming step, the liquid crystal layer thickness adjusting layer is formed so that the thickness of the liquid crystal layer in the reflective display region is half the thickness of the liquid crystal layer in the transmissive display region. The method of manufacturing a liquid crystal device according to claim 16.   In the liquid crystal layer thickness adjusting layer forming step, a liquid material containing a liquid crystal layer thickness adjusting layer forming material is applied as droplets to the reflective display region partitioned by the partition wall, and the applied liquid material is solidified. The method for manufacturing a liquid crystal device according to claim 16, wherein the liquid crystal layer thickness adjusting layer is formed.   A liquid crystal device according to any one of claims 1 to 7 or a liquid crystal device manufactured using the method for manufacturing a liquid crystal device according to any one of claims 8 to 18 is provided. Electronic equipment.

Images