JP2010112535A - Sealing structure - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a sealing structure superior in sealability between two members different in a linear expansion coefficient such as quartz (or ceramic) and metal used for a manufacturing device of a semiconductor and liquid crystal, particularly, maintaining high sealability even when a heat cycle is repeated. <P>SOLUTION: In the sealing structure for sealing by bringing a close contact seal part 7 of a metallic seal 5 into contact with a sealed plane surface 16 of a fragile member 1 having the low linear expansion coefficient, a metal plated layer 8 is laminated on at least a part of the sealed plane surface 16 brought into contact with the metallic seal 5. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a sealing structure.

In semiconductor manufacturing equipment and liquid crystal manufacturing equipment, there are places where quartz, ceramics, and metal materials such as stainless steel are used in combination, and rubber seals have often been used for the sealing structure of such places. Yes.
The reason is that quartz or ceramic is easily broken (brittle), and therefore, a rubber material that is easily elastically deformed has been selected as a suitable material.

However, in recent semiconductor and liquid crystal manufacturing apparatuses, high precision and high functionality are being achieved, and conventional rubber seals are in terms of gas permeability, heat resistance, plasma resistance, radical resistance and life. It is becoming impossible to respond.
Therefore, a metal seal using metal as a material excellent in these characteristics has been proposed (for example, see Patent Document 1).
JP 2002-317889 A

  By the way, in the sealing structure using the above-mentioned metal (metal) seal, the metal seal is less compatible with the mating surface than the rubber seal, and has a low linear expansion coefficient quartz flange and a larger linear expansion coefficient than that. When sealing with a metal seal between (high) metal flanges, there is a problem that the quartz flange breaks due to thermal deformation such as heat cycle, tightening external force and strain such as bolts, and fluctuations. . Furthermore, in the thing of the said patent document 1, although it applies to the site | part of a comparatively small diameter pipe joint, in a large-sized quartz (or ceramic) plate-shaped brittle member, it is due to a thermal deformation (thermal distortion) and a component dimensional error. External strain caused by distortion, bolt tightening force, etc. becomes excessive, and the risk of cracking is further increased.

  Therefore, the present invention is excellent in sealing (sealability) between two members having different linear expansion coefficients, such as quartz (or ceramic) and metal, which are used in semiconductor and liquid crystal manufacturing apparatuses, and in particular, repeats a heat cycle. However, it aims at providing the sealing structure which can exhibit high sealing performance. Accordingly, another object is to improve the performance and functionality of the semiconductor or liquid crystal manufacturing method.

Therefore, the sealing structure according to the present invention is a sealing structure that seals a tight seal portion of a metal seal in contact with a flat surface to be sealed of a brittle member having a low linear expansion coefficient.
A metal plating layer is laminated on at least a portion in contact with the metal seal in the sealed flat surface.

Further, the outer edge portion to be sealed of the brittle member having a low linear expansion coefficient is sandwiched and held by the first metal flat surface portion and the second metal flat surface portion having a linear expansion coefficient larger than the low linear expansion coefficient and sealed. A main seal interposed between the first metal flat surface portion defining the space and one surface of the outer edge portion, and a sub seal interposed between the second metal flat surface portion and the other surface of the outer edge portion. The brittle member is configured to be sandwiched and held in a resiliently released state from the first metal flat surface portion and the second metal flat surface portion,
A metal plating layer is laminated on at least a portion in contact with the main seal in one surface of the outer edge portion.

Further, the outer edge for sealing of the brittle member made of quartz or ceramic is sandwiched and held by the first metal flat surface portion and the second metal flat surface portion, and the first metal flat surface portion defining the sealed space, The brittle member is connected to the first metal flat surface portion by the main seal interposed between the one surface of the outer edge portion and the sub seal interposed between the second metal flat surface portion and the other surface of the outer edge portion. The second metal flat surface portion is configured to be held in a resiliently released state,
A metal plating layer is laminated on at least a portion in contact with the main seal in one surface of the outer edge portion.

Further, the metal seal is made of a shape / material having a large elastic recovery amount. Alternatively, the main seal and the sub seal are made of a shape / material having a large elastic recovery amount.
The thickness of the metal plating layer is set to 1 μm or more and 15 μm or less.
Further, the metal plating layer is formed in a band shape within a range of 5 mm in each of an inner diameter direction and an outer diameter direction from a contact portion between the metal seal and the flat surface to be sealed.

  According to the sealing structure of the present invention, the sealing (sealability) between two members having different linear expansion coefficients of quartz (or ceramic) and metal used in a semiconductor or liquid crystal manufacturing apparatus is excellent. High sealing performance can be maintained even after repeated heat cycles. Thereby, it can contribute to realization of high performance and high functionality of a semiconductor or liquid crystal manufacturing apparatus.

  1 and 2 show an embodiment of the present invention. By a flat brittle member 1, a lower (container-type) metal member 2, and a metal seal 5 (described later) interposed between the lower surface 4 of the outer edge 3 of the brittle member 1 and the metal member 2. A sealed space 6 is formed.

That is, this sealing structure is a hermetically sealed by bringing the tight seal portion 7 of the metal seal 5 into contact with the flat surface 16 to be sealed of the brittle member 1 having a low linear expansion coefficient (for example, made of quartz or ceramic). In the structure, a metal plating layer 8 is laminated on at least a portion of the flat surface 16 to be sealed that is in contact with the metal seal 5. In other words, a metal plating layer 8 is laminated on a part of the surface 1a of the brittle member 1 having a low coefficient of linear expansion so that the metal seal 5 (the close seal portion 7) contacts and seals. In the present invention, the low linear expansion coefficient is defined as 0.5 × 10 ⁻⁶ to 9.2 × 10 ⁻⁶ . Note that the coefficient of linear expansion of quartz is 0.5 × 10 ⁻⁶ .

  Specifically, the outer edge 3 to be sealed of the brittle member 1 having a low linear expansion coefficient is sandwiched between the first metal flat surface portion 10 and the second metal flat surface portion 11 having a linear expansion coefficient larger than the low linear expansion coefficient. A main seal 13 interposed between the first metal flat surface portion 10 and the one surface 12 of the outer edge portion 3 that holds and holds the sealed space 6, and the second metal flat surface portion 11 and the other surface 14 of the outer edge portion 3. The brittle member 1 is sandwiched and held from the first metal flat surface portion 10 and the second metal flat surface portion 11 in a resiliently released state by the auxiliary seal 15 interposed therebetween. And the metal plating layer 8 is laminated | stacked on the part which contacts the main seal 13 among the one surfaces 12 of the outer edge part 3 at least.

  The metal seal 5 (main seal 13 and sub-seal 15) is configured with a shape and material having a large elastic recovery amount. The metal seal 5 is made of, for example, a heat resistant alloy (stainless steel or the like) plated with silver, gold, nickel, indium or the like.

  The thickness t of the metal plating layer 8 is set to 1 μm or more and 15 μm or less. When the thickness dimension t is smaller than 1 μm, the contact portion 19 of the metal seal 5 bites too little, and there is a possibility that good sealing performance cannot be obtained. If the thickness dimension t is larger than 15 μm, it is difficult to plate, and much material is wasted. In the present invention, the metal plating (layer) is not limited to the original metal plating, but includes a base (layer) (for example, vapor deposition) and the original metal plating (layer) laminated thereon. It is defined to include the combined case, and also the case of only the base (layer). The metal plating layer 8 can be selected from copper, silver, gold, or the like, but is softer than the hardness of the contact portion 19 of the metal seal 5 (the hardness of the plating when plating is applied). It is desirable to set.

  The metal plating layer 8 is formed in a band shape within a range of 5 mm in each of the inner diameter direction and the outer diameter direction from the contact portion 19 between the metal seal 5 and the flat surface 16 to be sealed. When the contact part 19 has a width in the normal tightening (compression) use state, the measurement is performed from the center of the width (the same applies to other shapes of metal seals such as FIGS. 3 and 4 described later). And). In this way, even if there is a dimensional error of each component (member), or even when the radial position of the contact portion 19 changes inside and outside due to elastic deformation of the metal seal 5, The metal plating layer 8 is surely contacted. That is, the sealing performance can be improved.

  FIG. 2B is an enlarged view of a main part of FIG. If the sealed flat surface of the brittle member is exposed (that is, the metal plating layer is not laminated) as in the conventional case, the metal seal can be secured even if the metal seal is brought into contact with the sealed flat surface of the brittle member and tightened. If the contact portion of the material collapses along the flat surface to be sealed and a force is applied in the horizontal direction (due to the difference in the coefficient of linear expansion when heat is applied), the relative contact between the brittle member and the metal seal will occur. Although slipping occurs, when the metal plating layer 8 is laminated on the sealed flat surface 16 of the brittle member 1 as in the present invention, the close seal portion 7 of the metal seal 5 is made of metal as shown in FIG. Even if the plating layer 8 is bitten and a force is applied in the horizontal direction in this state, the relative slip between the brittle member 1 and the metal seal 5 is suppressed and stopped, so that the sealing performance can be maintained well. .

FIG. 3 shows a case where the cross-sectional shape of the metal seal 5 is a curved S-shape (Z-shape).
4 shows a case where the metal seal 5 has a shape in which the semicircular protrusions 17 and 17 protrude from the rectangular basic portion 9.
As the metal seal 5 of the present invention, various cross-sectional shapes other than those shown in FIG. 2, FIG. 3, or FIG. 4 can be freely used.

  FIG. 5 shows a second embodiment. The brittle member 1 is a container type (a bowl type) or a shallow dish type, and the outer edge 3 (flange part) to be sealed is formed so as to project into an outer bowl shape. In FIG. 5, a metal seal 5 as the main seal 13 (described above) is interposed between the upper (flat plate) metal member 2 and the upper surface 18 of the outer edge 3 of the brittle member 1. A sealed space 6 is formed by the member 2, the outer edge portion 3 of the brittle member 1, and the main seal 13. Other configurations are the same as those of the first embodiment.

  A copper plating layer is laminated on the contact surface (sealed flat surface 16) of the quartz flange (brittle member 1) with the metal seal 5 with a thickness dimension t of 10 μm, and the metal seal 5 shown in FIG. SUS630, silver plating 30-50 .mu.m) was used, and a He pressure leak test was carried out by setting on both sides of a quartz flange subjected to copper plating. The test results are shown in FIG. FIG. 7 shows a comparative example in which copper plating is not applied to the quartz flange (note that other conditions are the same as those in the above example). 6 and 7, the dotted line indicates the amount of He leak before the He gas is injected, and the solid line indicates the amount of He leak when the He gas is injected at a pressure of 0.3 MPa. From the test results, it can be seen that the present invention has a small amount of leakage and excellent sealing performance.

In the present invention, the design can be changed. For example, the metal plating layer 8 is laminated on at least a portion of the one surface 12 of the outer edge portion 3 to be sealed that contacts the main seal 13 and the brittle member 1 The metal plating layer 8 may be laminated on at least a portion of the other surface 14 of the outer edge portion 3 to be sealed that is in contact with the sub seal 15.
Further, it may be a sealing structure that does not include the secondary seal 15 (only the main seal 13 is provided as the metal seal 5).

  As described above, the present invention provides a sealed structure in which the tight seal portion 7 of the metal seal 5 is brought into contact with the flat surface 16 to be sealed of the brittle member 1 having a low linear expansion coefficient so as to be sealed. Since the metal plating layer 8 is laminated on at least a portion of the flat surface 16 that is in contact with the metal seal 5, the linear expansion coefficients of quartz (or ceramic) and metal used in a semiconductor or liquid crystal manufacturing apparatus are different. It is excellent in sealing performance (sealing performance) between members, and in particular, high sealing performance can be maintained even if the heat cycle is repeated. As shown in FIG. 2 (B), the contact portion 19 of the metal seal 5 slightly bites into the metal plating layer 8 of the brittle member 1, and the slip in the direction of the arrow R is suppressed. It prevents the external leakage of the accompanying internal sealing gas (He etc.) and exhibits high sealing performance even after repeated heat cycles.

  Further, the sealed outer edge portion 3 of the brittle member 1 having a low linear expansion coefficient is sandwiched and held by the first metal flat surface portion 10 and the second metal flat surface portion 11 having a linear expansion coefficient larger than the low linear expansion coefficient. In addition, a main seal 13 interposed between the first metal flat surface portion 10 and the one surface 12 of the outer edge portion 3 that define the sealed space 6, and between the second metal flat surface portion 11 and the other surface 14 of the outer edge portion 3. The brittle member 1 is sandwiched and held from the first metal flat surface portion 10 and the second metal flat surface portion 11 in a resiliently released state by the intervening sub-seal 15. Since the metal plating layer 8 is laminated at least in a portion in contact with the main seal 13, the sealing performance between two members having different linear expansion coefficients of quartz (or ceramic) and metal used in a semiconductor or liquid crystal manufacturing apparatus. Excellent (sealability), especially as shown in FIG. The contact portion 19 of the brittle member 1 slightly bites into the metal plating layer 8 of the brittle member 1 to prevent slipping in the direction of arrow R and prevent external leakage of the internal sealing gas (He etc.) accompanying this slipping. Thus, high sealing performance can be maintained even after repeated heat cycles. Moreover, the finishing precision (parallelism, flatness) of the brittle member 1, the expansion and contraction of the bolt due to the heat cycle, and the expansion and contraction due to the difference in the thermal expansion coefficient between the brittle member 1 and the metal seal 5 can be absorbed. That is, it is possible to use the metal seal 5 for a flange made of quartz or ceramic, which has been difficult until now, and to exhibit high sealing performance by a relatively easy method.

  In addition, the outer edge portion 3 to be sealed of the brittle member 1 made of quartz or ceramic is sandwiched and held by the first metal flat surface portion 10 and the second metal flat surface portion 11 and the sealed space 6 is partitioned. A brittle member is formed by a main seal 13 interposed between the flat metal surface portion 10 and one surface 12 of the outer edge portion 3 and a secondary seal 15 interposed between the second metal flat surface portion 11 and the other surface 14 of the outer edge portion 3. 1 is configured to be clamped and held from the first metal flat surface portion 10 and the second metal flat surface portion 11 in a resiliently released state, and at least a portion of the one surface 12 of the outer edge portion 3 that contacts the main seal 13 is plated with metal. Since the layer 8 is laminated, quartz or ceramic used in a semiconductor or liquid crystal manufacturing apparatus is excellent in sealing performance (sealing performance) between two members having different linear expansion coefficients such as metal. As shown in B), the contact portion 19 of the metal seal 5 is a brittle member 1. Slightly bites into the metal plating layer 8 to prevent slipping in the direction of arrow R, prevent external leakage of the internal sealing gas (He etc.) accompanying this slipping, and is high even if the heat cycle is repeated Seal performance can be maintained. Moreover, the finishing precision (parallelism, flatness) of the brittle member 1, the expansion and contraction of the bolt due to the heat cycle, and the expansion and contraction due to the difference in the thermal expansion coefficient between the brittle member 1 and the metal seal 5 can be absorbed. That is, it is possible to use the metal seal 5 against a flange made of quartz or ceramic, which has been difficult until now, by a relatively easy method, and can exhibit high sealing performance.

Further, since the metal seal 5 (or the main seal 13 and the sub-seal 15) is made of a shape and material having a large elastic recovery amount, the sealing performance is more excellent.
Further, since the thickness dimension t of the metal plating layer 8 is set to 1 μm or more and 15 μm or less, a good sealing property can be obtained efficiently.
Further, since the metal plating layer 8 is formed in a band shape within a range of 5 mm in each of the inner diameter direction and the outer diameter direction from the contact portion 19 between the metal seal 5 and the flat surface 16 to be sealed, the close seal portion 7 of the metal seal 5 is formed. Does not come off the metal plating layer 8.

It is a section front view showing a 1st embodiment of the present invention. It is a principal part expanded sectional view. FIG. 2B is an enlarged cross-sectional view of an essential part of FIG. It is sectional drawing which shows the other example of a metal seal. It is sectional drawing which shows the other example of a metal seal. It is a section front view showing a 2nd embodiment. It is a graph which shows the measurement result of the Example of this invention. It is a graph which shows the measurement result of a comparative example.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Brittle member 3 (For sealing) Outer edge part 5 Metal seal 6 Sealed space 7 Close seal part 8 Metal plating layer
10 1st metal flat surface
11 Second metal flat surface
12 One side
13 Main seal
14 Other side
15 Secondary seal
16 Sealed flat surface
19 Contact area

Claims (7)

In a sealing structure in which a tight seal portion (7) of a metal seal (5) is brought into contact with a flat surface (16) to be sealed of a brittle member (1) having a low linear expansion coefficient, and sealed.
A sealing structure characterized in that a metal plating layer (8) is laminated on at least a portion of the flat surface to be sealed (16) that is in contact with the metal seal (5). The outer edge portion (3) to be sealed of the brittle member (1) having a low linear expansion coefficient is composed of a first metal flat surface portion (10) and a second metal flat surface portion (11) having a linear expansion coefficient larger than the low linear expansion coefficient. The main seal (13) interposed between the first metal flat surface portion (10) and the one surface (12) of the outer edge portion (3) which sandwich and hold the sealed space (6). And the second metal flat surface portion (11) and the secondary seal (15) interposed between the other surface (14) of the outer edge portion (3), the brittle member (1) is flattened with the first metal flat surface. It is constructed so as to be clamped and held from the face part (10) and the second metal flat face part (11),
A sealing structure characterized in that a metal plating layer (8) is laminated on at least a portion in contact with the main seal (13) of one surface (12) of the outer edge portion (3). The sealed outer edge (3) of the brittle member (1) made of quartz or ceramic is sandwiched and held by the first metal flat surface portion (10) and the second metal flat surface portion (11), and the sealed space ( 6) a main seal (13) interposed between the first metal flat surface portion (10) and the one surface (12) of the outer edge portion (3), and the second metal flat surface portion (11). The brittle member (1) is attached to the first metal flat surface portion (10) and the second metal flat surface portion (11) by the sub seal (15) interposed between the other surfaces (14) of the outer edge portion (3). ) Is configured to hold in a loosely released state,
A sealing structure characterized in that a metal plating layer (8) is laminated on at least a portion in contact with the main seal (13) of one surface (12) of the outer edge portion (3).   The sealing structure according to claim 1, wherein the metal seal (5) is formed of a shape and material having a large elastic recovery amount.   The sealing structure according to claim 2 or 3, wherein the main seal (13) and the sub-seal (15) are formed of a shape and material having a large elastic recovery amount.   The sealed structure according to claim 1, 2, 3, 4 or 5, wherein the thickness (t) of the metal plating layer (8) is set to 1 µm or more and 15 µm or less.   The metal plating layer (8) is formed in a strip shape within a range of 5 mm from the contact portion (19) between the metal seal (5) and the sealed flat surface (16) in the inner diameter direction and the outer diameter direction. Item 7. The sealed structure according to Item 1 or 6.

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