JP2010109294A5 - - Google Patents

Download PDF

Info

Publication number
JP2010109294A5
JP2010109294A5 JP2008282435A JP2008282435A JP2010109294A5 JP 2010109294 A5 JP2010109294 A5 JP 2010109294A5 JP 2008282435 A JP2008282435 A JP 2008282435A JP 2008282435 A JP2008282435 A JP 2008282435A JP 2010109294 A5 JP2010109294 A5 JP 2010109294A5
Authority
JP
Japan
Prior art keywords
optical system
pinhole
measuring apparatus
optical member
test
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008282435A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010109294A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008282435A priority Critical patent/JP2010109294A/ja
Priority claimed from JP2008282435A external-priority patent/JP2010109294A/ja
Priority to US12/608,771 priority patent/US20100110403A1/en
Publication of JP2010109294A publication Critical patent/JP2010109294A/ja
Publication of JP2010109294A5 publication Critical patent/JP2010109294A5/ja
Pending legal-status Critical Current

Links

JP2008282435A 2008-10-31 2008-10-31 測定装置、露光装置およびデバイス製造方法 Pending JP2010109294A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008282435A JP2010109294A (ja) 2008-10-31 2008-10-31 測定装置、露光装置およびデバイス製造方法
US12/608,771 US20100110403A1 (en) 2008-10-31 2009-10-29 Measurement apparatus, exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008282435A JP2010109294A (ja) 2008-10-31 2008-10-31 測定装置、露光装置およびデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2010109294A JP2010109294A (ja) 2010-05-13
JP2010109294A5 true JP2010109294A5 (OSRAM) 2011-12-15

Family

ID=42130975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008282435A Pending JP2010109294A (ja) 2008-10-31 2008-10-31 測定装置、露光装置およびデバイス製造方法

Country Status (2)

Country Link
US (1) US20100110403A1 (OSRAM)
JP (1) JP2010109294A (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010016057A (ja) * 2008-07-01 2010-01-21 Canon Inc 測定方法、測定装置、露光装置、露光方法、デバイスの製造方法及び設計方法
WO2012072090A1 (en) * 2010-11-29 2012-06-07 Carl Zeiss Smt Gmbh Method of determining a border of an intensity distribution
NL2008957A (en) * 2011-07-08 2013-01-09 Asml Netherlands Bv Methods and systems for pattern design with tailored response to wavefront aberration.
KR102043384B1 (ko) * 2015-04-20 2019-11-27 에이에스엠엘 네델란즈 비.브이. 리소그래피 방법 및 장치

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW587199B (en) * 1999-09-29 2004-05-11 Asml Netherlands Bv Lithographic method and apparatus
JP2002169083A (ja) * 2000-11-30 2002-06-14 Nikon Corp 対物光学系、収差測定装置、投影露光装置、対物光学系の製造方法、収差測定装置の製造方法、投影露光装置の製造方法及びマイクロデバイスの製造方法
KR100654784B1 (ko) * 2001-08-31 2006-12-08 캐논 가부시끼가이샤 레티클과 광학특성의 측정방법
KR100673487B1 (ko) * 2002-04-17 2007-01-24 캐논 가부시끼가이샤 레티클 및 광학특성 계측방법
JP2004014865A (ja) * 2002-06-07 2004-01-15 Nikon Corp レチクル、波面収差測定機、及び半導体露光装置の製造方法
US6963390B1 (en) * 2002-07-19 2005-11-08 Litel Instruments In-situ interferometer arrangement
JP2006080444A (ja) * 2004-09-13 2006-03-23 Canon Inc 測定装置、テストレチクル、露光装置及びデバイス製造方法
JP2007066926A (ja) * 2005-08-29 2007-03-15 Canon Inc 計測方法及び装置、露光装置、並びに、デバイス製造方法
US7388652B2 (en) * 2006-06-15 2008-06-17 Asml Netherlands B.V. Wave front sensor with grey filter and lithographic apparatus comprising same

Similar Documents

Publication Publication Date Title
JP4343706B2 (ja) レチクル及び光学特性計測方法
JP2010161261A5 (OSRAM)
WO2008061681A3 (de) Beleuchtungsoptik für die projektions-mikrolithografie sowie mess- und überwachungsverfahren für eine derartige beleuchtungsoptik
JP2012168543A5 (ja) 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP2007035671A5 (OSRAM)
JP2007220767A5 (OSRAM)
JP2012155330A5 (ja) 露光装置、露光方法、およびデバイス製造方法
JP2005302777A5 (OSRAM)
JP2009016761A5 (OSRAM)
JP2005244126A5 (OSRAM)
JP2009182253A5 (OSRAM)
JP2010109294A5 (OSRAM)
JP2006332586A5 (OSRAM)
JP2006324311A5 (OSRAM)
JP5942242B2 (ja) 検査用照明装置
KR20190005762A (ko) 마이크로리소그라피용 마스크의 특징을 구하는 방법 및 디바이스
JP2007121292A (ja) 物体を検査する方法および装置
JP2009021450A5 (OSRAM)
EP2020620A3 (en) Adjustment method, exposure method, device manufacturing method, and exposure apparatus
JP2006120675A5 (OSRAM)
TW200942993A (en) Exposure apparatus and device manufacturing method
JP2007036016A5 (OSRAM)
JP2005243953A5 (OSRAM)
US20070292778A1 (en) Methods of measuring critical dimensions and related devices
JP2009088358A5 (OSRAM)