JP2010107337A - Gas generator and sensor evaluation system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a gas generator of a simple composition, generating multiple concentrations of a standard gas at a high speed, and to provide a sensor evaluation system including the gas generator and performing a gas sensor evaluation in a short time. <P>SOLUTION: The sensor evaluation system is configured so that the gas generating unit 10 includes N (2≤N) gas mixing units mutually connected in series, and by the first gas mixing unit 11, the standard gas introduced from a standard gas line L1 and a dilution gas introduced from a dilution gas line L2 are mixed to generate a first low concentration standard gas and the generated first low concentration standard gas is introduced to the second gas mixing unit 12 and/or a gas supply line L3. By the M-th gas mixing unit (2≤M≤N), the (M-1)th low concentration standard gas introduced from the (M-1)th gas mixing unit and the dilution gas introduced from the dilution gas line L2 are mixed to generate the M-th low concentration standard gas, and the generated M-th low concentration standard gas is introduced to the (M+1)th gas mixing unit and/or the gas supply line L3. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a gas generator and a sensor evaluation system.

  Conventionally, devices such as a gas sensor used for detecting a specific substance in a gas sample and measuring a specific substance concentration are known.

By the way, when evaluating or calibrating such a device, a standard gas is used. In particular, when the device is a device capable of detecting a trace gas or a device capable of measuring a trace gas concentration, a low concentration standard gas such as a ppb level or a ppt level is required. For this reason, for example, a gas generating device that can further dilute a commercially available standard gas or the like to generate a low concentration standard gas has been proposed (see, for example, Patent Documents 1 and 2).
Japanese Patent Laid-Open No. 07-151652 JP-A-10-104130

  However, in the inventions described in Patent Documents 1 and 2, only one type of standard gas is generated at a time. Therefore, for example, when a standard gas having a plurality of types of concentrations is required, for example, when the instrument is evaluated by creating calibration curve data of a device such as a gas sensor, it is necessary to sequentially generate standard gases of each concentration. There is a problem that it takes time. In particular, since it takes a long time to stably generate a low concentration standard gas, it takes an enormous amount of time to generate a plurality of types of low concentration standard gases. Efficient.

  An object of the present invention is to provide a gas generation device capable of generating a plurality of types of standard gases at a high speed with a simple configuration, and a sensor evaluation system including the gas generation device and capable of evaluating a gas sensor in a short time. It is to provide.

In order to solve the above-mentioned problem, the invention described in claim 1
In the gas generator,
N gas mixing sections connected in series with each other (N is any one integer satisfying 2 ≦ N),
The first gas mixing unit among the N gas mixing units includes a standard gas line for introducing a standard gas into the gas mixing unit and a dilution gas line for introducing a dilution gas into the gas mixing unit. And a gas supply line for supplying the gas generated by the gas mixing unit to the outside, a standard gas introduced from the standard gas line, and a dilution gas introduced from the dilution gas line; , To generate a first low-concentration standard gas, and the generated first low-concentration standard gas is introduced into the second gas mixing unit and / or the gas supply line among the N gas mixing units. And
An M-th gas mixing unit (M is an integer satisfying 2 ≦ M ≦ N) among the N gas mixing units is connected to the dilution gas line and the gas supply line, and the N gas mixing units The M-1 low concentration standard gas introduced from the M-1 gas mixing portion of the gas mixing portion and the dilution gas introduced from the dilution gas line are mixed to obtain the M low concentration. A standard gas is generated, and the generated Mth low-concentration standard gas is introduced into the M + 1th gas mixing unit and / or the gas supply line among the N gas mixing units.

The invention described in claim 2
The gas generator according to claim 1,
Gas concentration measuring means for measuring the concentration of the gas generated by each gas mixing section of the first to Nth gas mixing sections;
The flow rate of the standard gas introduced from the standard gas line, the flow rate of the dilution gas introduced from the dilution gas line, and the flow rate of the M-1 low concentration standard gas introduced from the M-1 gas mixing unit. Gas concentration adjusting means for adjusting the concentration of the gas generated by each gas mixing unit by adjusting at least one of
Based on the gas concentration measured by the gas concentration measuring unit, the gas concentration adjusting unit generates the gas concentration by the gas mixing unit so that the gas concentration generated by the gas mixing unit becomes a predetermined concentration. Gas concentration adjustment control means for adjusting the concentration of the gas to be respectively adjusted;
It is characterized by providing.

The invention according to claim 3
In the gas generating device according to claim 1 or 2,
It is characterized by comprising switching means for switching the gas supplied by the gas supply line to any one of the first to Nth low concentration standard gases.

The invention according to claim 4
In a sensor evaluation system for evaluating a gas sensor,
Comprising the gas generating device according to any one of claims 1 to 3,
The gas supply line supplies the gas generated by the gas mixing unit to the gas sensor.

The invention described in claim 5
The sensor evaluation system according to claim 4,
Sensor temperature adjusting means for adjusting the temperature of the gas sensor;
Sensor temperature adjustment control means for causing the sensor temperature adjustment means to adjust the temperature of the gas sensor so that the temperature of the gas sensor becomes a predetermined temperature;
It is characterized by providing.

The invention described in claim 6
In the sensor evaluation system according to claim 4 or 5,
Sensor humidity adjusting means for adjusting the humidity of the gas sensor by humidifying the dilution gas;
Sensor humidity adjustment control means for causing the sensor humidity adjustment means to adjust the humidity of the gas sensor so that the humidity of the gas sensor becomes a predetermined humidity;
It is characterized by providing.

The invention described in claim 7
The sensor evaluation system according to claim 6,
Mixing section temperature adjusting means for adjusting the temperature of each of the gas mixing sections;
Mixing unit temperature adjustment control means for adjusting the temperature of each gas mixing unit to the mixing unit temperature adjusting unit so that the temperature of each gas mixing unit is higher than room temperature;
Line temperature adjusting means for adjusting the temperature of each of the standard gas line, the dilution gas line, and the gas supply line;
Line temperature adjustment control means for causing the line temperature adjustment means to adjust the temperature of each line so that the temperature of each line is higher than room temperature;
It is characterized by providing.

The invention according to claim 8 provides:
In the sensor evaluation system according to any one of claims 4 to 7,
Supply gas flow rate adjusting means for adjusting the flow rate of the gas supplied by the gas supply line;
Supply gas flow rate adjustment control means for adjusting the flow rate of gas supplied from the gas supply line to the supply gas flow rate adjustment means so that the flow rate of gas supplied to the gas sensor becomes a predetermined flow rate;
It is characterized by providing.

The invention according to claim 9 is:
In the sensor evaluation system according to any one of claims 4 to 8,
The gas supply line is characterized in that the gas sensor side branches into a plurality so that the gas generated by the gas mixing unit can be supplied to the plurality of gas sensors at a time.

The invention according to claim 10 is:
In a sensor evaluation system for evaluating a gas sensor,
A gas generator according to claim 3;
Sensor temperature adjusting means for adjusting the temperature of the gas sensor;
Sensor temperature adjustment control means for causing the sensor temperature adjustment means to adjust the temperature of the gas sensor so that the temperature of the gas sensor becomes a predetermined temperature;
Sensor humidity adjusting means for adjusting the humidity of the gas sensor by humidifying the dilution gas;
Sensor humidity adjustment control means for causing the sensor humidity adjustment means to adjust the humidity of the gas sensor so that the humidity of the gas sensor becomes a predetermined humidity;
Mixing section temperature adjusting means for adjusting the temperature of each of the gas mixing sections;
Mixing unit temperature adjustment control means for adjusting the temperature of each gas mixing unit to the mixing unit temperature adjusting unit so that the temperature of each gas mixing unit is higher than room temperature;
Line temperature adjusting means for adjusting the temperature of each of the standard gas line, the dilution gas line, and the gas supply line;
Line temperature adjustment control means for causing the line temperature adjustment means to adjust the temperature of each line so that the temperature of each line is higher than room temperature;
Supply gas flow rate adjusting means for adjusting the flow rate of the gas supplied by the gas supply line;
Supply gas flow rate adjustment control means for adjusting the flow rate of gas supplied by the gas supply line to the supply gas flow rate adjustment means so that the flow rate of gas supplied by the gas supply line becomes a predetermined flow rate;
With
The gas supply line is branched into a plurality of gas sensors so that the gas generated by the gas mixing unit can be supplied to the plurality of gas sensors at once.
The supply gas flow rate adjusting means adjusts the flow rate of the gas supplied to each of the plurality of gas sensors,
The supply gas flow rate adjustment control means adjusts the flow rate of the gas supplied to the supply gas adjustment means by the branched gas supply line so that the flow rate of the gas supplied to each of the plurality of gas sensors becomes a predetermined flow rate. Each of them is adjusted.

According to the gas generation device of the present invention, N gas mixing units (N is any one integer satisfying 2 ≦ N) connected in series with each other, and the first of the N gas mixing units is provided. The 1 gas mixing unit mixes the standard gas introduced from the standard gas line and the dilution gas introduced from the dilution gas line to generate a first low concentration standard gas, and the generated first gas The low concentration standard gas is introduced into the second gas mixing unit and / or the gas supply line among the N gas mixing units, and the Mth gas mixing unit (M is 2 ≦ M) of the N gas mixing units. ≦ all integers satisfying N) are the M-1 low concentration standard gas introduced from the M-1 gas mixing portion of the N gas mixing portions and the dilution gas introduced from the dilution gas line And the gas are mixed to generate an Mth low concentration standard gas, and the generated Mth low concentration standard gas is N It has become of such introduction to the M + 1 gas mixing unit and / or the gas supply line of the gas mixing unit.
That is, since the multistage gas mixing section connected in series with each other is provided, the low-concentration standard gas generated by diluting the introduced gas can be immediately introduced to the next stage, and in the next stage. Since the introduced low concentration standard gas can be diluted to generate a low concentration standard gas having a lower concentration, a plurality of low concentration standard gases having arbitrary concentrations can be generated substantially simultaneously.
Therefore, a standard gas having a plurality of types of concentrations can be generated at high speed with a simple configuration in which dilution is performed sequentially.

According to the sensor evaluation system of the present invention, the gas generation device of the present invention is provided, and the gas supply line supplies the gas generated by the gas mixing unit to the gas sensor.
That is, since the gas sensor can be evaluated using the gas generated by the gas generating device of the present invention, the gas sensor can be evaluated in a short time.

Hereinafter, the best mode for carrying out the present invention will be described in detail with reference to the drawings. The scope of the invention is not limited to the illustrated example.
In the present embodiment, standard air is exemplified as the dilution gas, and a case where N = 4 is exemplified.

  FIG. 1 is a diagram schematically illustrating the configuration of the sensor evaluation system 1 of the present embodiment, and FIG. 2 is a diagram schematically illustrating the configuration of the gas generation unit 10 of the present embodiment. FIG. 3 is a block diagram showing a functional configuration of the sensor evaluation system 1 of the present embodiment.

The sensor evaluation system 1 is a system that evaluates the gas sensor S using, for example, a gas (low concentration standard gas) generated by the gas generation unit 10.
Specifically, for example, as shown in FIGS. 1 and 3, the sensor evaluation system 1 includes a gas generation unit 10, a plurality (three in this embodiment) of sensor mounting units 30, and a first mass flow controller 31. (Hereinafter referred to as “first MFC 31”), standard gas storage unit 31a, filter 31b, second mass flow controller 32 (hereinafter referred to as “second MFC 32”), standard air storage unit 32a, filter 32b, and humidification unit 32c. A vacuum pump 33, an exhaust unit 33a, a system exhaust unit 34, a sensor temperature measurement unit 35, a sensor temperature adjustment unit 36, a sensor humidity measurement unit 37, a sensor humidity adjustment unit 38, and a mixing unit temperature. Adjustment unit 39, line temperature adjustment unit 40, supply gas flow rate adjustment unit 41, valve / flow meter control unit 42, measurement unit 43, data processing unit 44, table Unit 45, operation unit 46, control unit 50, standard gas line L1 for introducing standard gas into gas generation unit 10 (gas mixing unit), and gas for dilution gas generation unit 10 (gas mixing unit) A gas line L2 for dilution, a gas supply line L3 for supplying the gas generated by the gas generator 10 (gas mixing unit) to the outside of the gas generator 10 (gas sensor S), and a flow path And a plurality of switching valves for switching the flow path, a plurality of flow meters for detecting and adjusting the flow rate (for example, a flow meter with a needle valve), and the like.

For example, as shown in FIGS. 2 and 3, the gas generation unit 10 includes four gas mixing units (first gas mixing unit 11, second gas mixing unit 12, and third gas mixing unit) connected in series to each other. 13 and the fourth gas mixing unit 14), a generating unit exhaust unit 15, a gas concentration measuring unit 16, a gas concentration adjusting unit 17, a switching unit 18, and the like.
Here, the gas generation device of the present invention includes the gas generation unit 10, the control unit 50 (the CPU 51 that executes the gas concentration adjustment control program 535, the CPU 51 that executes the switching control program 536), and the like.

In the first gas mixing unit 11, for example, the upstream first introduction port 11a is connected to the standard gas line L1 via the thirteenth flow meter F13, and the upstream second introduction port 11b is the first one. It is connected to the dilution gas line L2 via the flow meter F1. In the first gas mixing unit 11, for example, the first outlet 11c on the downstream side is connected to the gas supply line L3 via the first switching valve Vb1, and is also connected to the generating unit exhaust unit 15. The second outlet 11d on the downstream side is connected to the second gas mixing unit 12 via the sixth flow meter F6 and the fifth switching valve Vb5, and for the generating unit via the ninth flow meter F9. It is connected to the exhaust part 15.
In other words, the first gas mixing unit 11 dilutes the standard gas by mixing the standard gas introduced from the standard gas line L1 and the standard air introduced from the dilution gas line L2, thereby reducing the first low concentration. A standard gas is generated, and the generated first low-concentration standard gas is introduced into the second gas mixing unit 12 and / or the gas supply line L3.

  Here, the first switching valve Vb1 is switched between the gas supply line L3 side and the generator exhaust part 15 side. For example, when the first switching valve Vb1 is switched to the gas supply line L3 side, the first low-concentration standard gas flowing out from the first outlet 11c is introduced into the gas supply line L3. The first switching valve Vb1 is connected to the generator exhaust part 15 via the first open / close bubble Va1, the collection pipe 16a and the air sampler 16b, and the generator exhaust via the fifth open / close valve Va5. Since the first switching valve Vb1 is switched to the generating section exhaust section 15 side and the first opening / closing bubble Va1 is opened and the fifth opening / closing valve Va5 is closed, the first switching valve Vb1 flows out from the first outlet 11c. The first low-concentration standard gas is sucked by the air sampler 16b and collected in the collecting tube 16a. Further, when the first switching valve Vb1 is switched to the generator exhaust part 15 side, the first opening / closing bubble Va1 is closed and the fifth opening / closing valve Va5 is opened, the first low-concentration standard gas flowing out from the first outlet 11c is Then, the air is exhausted by the generator exhaust part 15.

In the second gas mixing unit 12, for example, the first inlet 12a on the upstream side is connected to the first gas mixing unit 11 via the fifth switching valve Vb5 and the sixth flow meter F6, and the first gas mixing unit 12 on the upstream side 2 The inlet 12b is connected to the dilution gas line L2 via the second flow meter F2. In the second gas mixing unit 12, for example, the downstream first outlet 12c is connected to the gas supply line L3 via the second switching valve Vb2, and is also connected to the generating unit exhaust unit 15. The downstream second outlet 12d is connected to the third gas mixing unit 13 via the seventh flow meter F7 and the sixth switching valve Vb6, and for the generator via the tenth flow meter F10. It is connected to the exhaust part 15.
In other words, the second gas mixing unit 12 mixes the first low-concentration standard gas introduced from the first gas mixing unit 11 and the standard air introduced from the dilution gas line L2, so that the first low-concentration standard gas is mixed. The standard gas is diluted to generate a second low-concentration standard gas, and the generated second low-concentration standard gas is introduced into the third gas mixing unit 13 and / or the gas supply line L3.

Here, in FIG. 2, the second gas mixing unit 12 is connected to the first gas mixing unit 11 and the standard gas line L1 via the fifth switching valve Vb5 and the fourteenth flow meter F14. However, in the present embodiment, the fourteenth flow meter F14 is always closed, and the fifth switching valve Vb5 is always switched to the first gas mixing unit 11 side. In other words, in this embodiment, the standard gas is not introduced into the second gas mixing unit 12 from the standard gas line L1. Although not used in this embodiment, a standard gas can be introduced from the standard gas line L1 to the second gas mixing unit 12. This is due to subtle differences in gas concentration by introducing a standard gas or a gas from at least one stage of gas mixing unit introduced before the gas generation unit 10 to generate a series of gases slightly different from the gas concentration. This is effective when measuring the resolution of sensor responses such as differences in sensor responses.
Further, the second switching valve Vb2 is switched between the gas supply line L3 side and the generator exhaust part 15 side. For example, when the second switching valve Vb2 is switched to the gas supply line L3 side, the second low concentration standard gas flowing out from the first outlet 12c is introduced into the gas supply line L3. The second switching valve Vb2 is connected to the generator exhaust 15 via the second open / close bubble Va2, the collection pipe 16a and the air sampler 16b, and the generator exhaust via the sixth open / close valve Va6. Since the second switching valve Vb2 is switched to the generating section exhaust section 15 side and the second opening / closing bubble Va2 is opened and the sixth opening / closing valve Va6 is closed, the second switching valve Vb2 flows out from the first outlet 12c. The second low-concentration standard gas is sucked by the air sampler 16b and collected in the collecting tube 16a. Further, when the second switching valve Vb2 is switched to the generator exhaust section 15 side, the second opening / closing bubble Va2 is closed and the sixth opening / closing valve Va6 is opened, the second low-concentration standard gas flowing out from the first outlet 12c is Then, the air is exhausted by the generator exhaust part 15.

In the third gas mixing unit 13, for example, the upstream first introduction port 13a is connected to the second gas mixing unit 12 via the sixth switching valve Vb6 and the seventh flow meter F7, and the upstream first mixing port 13a is connected. 2 The inlet 13b is connected to the dilution gas line L2 via the third flow meter F3. Further, the third gas mixing unit 13 is connected, for example, to the downstream side first outlet 13c with the gas supply line L3 via the third switching valve Vb3 and with the generator exhaust unit 15. The downstream second outlet 13d is connected to the fourth gas mixing section 14 via the eighth flow meter F8 and the seventh switching valve Vb7, and for the generating section via the eleventh flow meter F11. It is connected to the exhaust part 15.
That is, the third gas mixing unit 13 mixes the second low-concentration standard gas introduced from the second gas mixing unit 12 and the standard air introduced from the dilution gas line L2, thereby mixing the second low-concentration standard gas. The standard gas is diluted to generate a third low concentration standard gas, and the generated third low concentration standard gas is introduced into the fourth gas mixing unit 14 and / or the gas supply line L3.

Here, in FIG. 2, the third gas mixing unit 13 is connected to the second gas mixing unit 12 and the standard gas line L1 via the sixth switching valve Vb6 and the fifteenth flow meter F15. However, in the present embodiment, the fifteenth flow meter F15 is always closed, and the sixth switching valve Vb6 is always switched to the second gas mixing unit 12 side. That is, in this embodiment, the standard gas is not introduced from the standard gas line L1 to the third gas mixing unit 13. Although not used in the present embodiment, a standard gas can be introduced from the standard gas line L1 into the third gas mixing unit 13. This is due to subtle differences in gas concentration by introducing a standard gas or a gas from at least one stage of gas mixing unit introduced before the gas generation unit 10 to generate a series of gases slightly different from the gas concentration. This is effective when measuring the resolution of sensor responses such as differences in sensor responses.
Further, the third switching valve Vb3 is switched between the gas supply line L3 side and the generator exhaust part 15 side. For example, when the third switching valve Vb3 is switched to the gas supply line L3 side, the third low-concentration standard gas flowing out from the first outlet 13c is introduced into the gas supply line L3. The third switching valve Vb3 is connected to the generator exhaust part 15 via the third open / close bubble Va3, the collection pipe 16a and the air sampler 16b, and is also connected to the generator exhaust via the seventh open / close valve Va7. Since the third switching valve Vb3 is switched to the generator exhaust section 15 side and the third opening / closing bubble Va3 is opened and the seventh opening / closing valve Va7 is closed, the third switching valve Vb3 flows out from the first outlet 13c. The third low-concentration standard gas is sucked by the air sampler 16b and collected in the collecting tube 16a. In addition, when the third switching valve Vb3 is switched to the generator exhaust section 15 side, the third opening / closing bubble Va3 is closed and the seventh opening / closing valve Va7 is opened, the third low-concentration standard gas flowing out from the first outlet 13c is Then, the air is exhausted by the generator exhaust part 15.

In the fourth gas mixing unit 14, for example, the upstream first introduction port 14a is connected to the third gas mixing unit 13 via the seventh switching valve Vb7 and the eighth flow meter F8. 2 The inlet 14b is connected to the dilution gas line L2 via the fourth flow meter F4. The fourth gas mixing unit 14 is connected, for example, to the downstream side first outlet 14c to the gas supply line L3 via the fourth switching valve Vb4 and to the generator exhaust unit 15. The second outlet 14d on the downstream side is connected to the generator exhaust 15 via the twelfth flow meter F12.
That is, the fourth gas mixing unit 14 mixes the third low-concentration standard gas introduced from the third gas mixing unit 13 and the standard air introduced from the dilution gas line L2, to thereby achieve the third low-concentration standard gas. The standard gas is diluted to generate a fourth low concentration standard gas, and the generated fourth low concentration standard gas is introduced into the gas supply line L3.

Here, in FIG. 2, the fourth gas mixing unit 14 is connected to the third gas mixing unit 13 and the standard gas line L1 via the seventh switching valve Vb7 and the sixteenth flow meter F16. However, in the present embodiment, the sixteenth flow meter F16 is always closed, and the seventh switching valve Vb7 is always switched to the third gas mixing unit 13 side. That is, in this embodiment, the standard gas is not introduced from the standard gas line L1 to the fourth gas mixing unit 14. Although not used in this embodiment, a standard gas can be introduced from the standard gas line L1 into the fourth gas mixing unit 14. This is due to subtle differences in gas concentration by introducing a standard gas or a gas from at least one stage of gas mixing unit introduced before the gas generation unit 10 to generate a series of gases slightly different from the gas concentration. This is effective when measuring the resolution of sensor responses such as differences in sensor responses.
Further, the fourth switching valve Vb4 is switched between the gas supply line L3 side and the generator exhaust part 15 side. For example, when the fourth switching valve Vb4 is switched to the gas supply line L3 side, the fourth low-concentration standard gas flowing out from the first outlet 14c is introduced into the gas supply line L3. The fourth switching valve Vb4 is connected to the generator exhaust 15 via the fourth open / close bubble Va4, the collection tube 16a and the air sampler 16b, and the generator exhaust via the eighth open / close valve Va8. When the fourth switching valve Vb4 is switched to the generator exhaust section 15 side, the fourth opening / closing bubble Va4 is opened and the eighth opening / closing valve Va8 is closed, the fourth switching valve Vb4 flows out from the first outlet 14c. The fourth low-concentration standard gas is sucked by the air sampler 16b and collected in the collecting tube 16a. Further, when the fourth switching valve Vb4 is switched to the generator exhaust section 15 side, the fourth opening / closing bubble Va4 is closed and the eighth opening / closing valve Va8 is opened, the fourth low-concentration standard gas flowing out from the first outlet 14c is Then, the air is exhausted by the generator exhaust part 15.

The generation unit exhaust unit 15 is a device that exhausts unnecessary gas to the outside of the gas generation unit 10 (sensor evaluation system 1).
For example, the generation unit exhaust unit 15 is connected to the first gas mixing unit 11 through the ninth flow meter F9, and is connected to the second gas mixing unit 12 through the tenth flow meter F10. It is connected to the third gas mixing unit 13 via F11, and is connected to the fourth gas mixing unit 14 via the twelfth flow meter F12. Further, the generator exhaust part 15 is connected to, for example, the dilution gas line L2 via the fifth flow meter F5, and is connected to the standard gas line L1 via the seventeenth flow meter F17.
Accordingly, the first low concentration standard gas that is not introduced into the second gas mixing portion 12 out of the first low concentration standard gas that has flowed out from the second outlet 11d of the first gas mixing portion 11 is the generator exhaust portion. 15 is exhausted.
Of the second low-concentration standard gas that flows out from the second outlet 12d of the second gas mixing unit 12, the second low-concentration standard gas that is not introduced into the third gas mixing unit 13 is the generator exhaust unit. 15 is exhausted.
Of the third low-concentration standard gas flowing out from the second outlet 13d of the third gas mixing section 13, the third low-concentration standard gas that is not introduced into the fourth gas mixing section 14 is the generator exhaust section. 15 is exhausted.
In addition, the fourth low-concentration standard gas flowing out from the second outlet 14d of the fourth gas mixing unit 14 is exhausted by the generator exhaust unit 15.
Of the standard air introduced into the gas generation unit 10 through the dilution gas line L2, the first gas mixing unit 11, the second gas mixing unit 12, the third gas mixing unit 13, and the fourth gas mixing unit. The standard air that is not introduced to the exhaust gas 14 is exhausted by the generator exhaust part 15.

Further, the generating unit exhaust unit 15 is connected to the first gas mixing unit 11 via the first switching valve Vb1, and connected to the second gas mixing unit 12 via the second switching valve Vb2, for example. It is connected to the third gas mixing unit 13 via the switching valve Vb3, and is connected to the fourth gas mixing unit 14 via the fourth switching valve Vb4.
Therefore, when the first low-concentration standard gas flowing out from the first outlet 11c of the first gas mixing unit 11 is not introduced into the gas supply line L3 or is not collected in the collection tube 16a, the first low-concentration standard gas is used. The standard gas is exhausted by the generator exhaust part 15.
Further, when the second low-concentration standard gas flowing out from the first outlet 12c of the second gas mixing unit 12 is not introduced into the gas supply line L3 or is not collected in the collection pipe 16a, the second low-concentration standard gas is used. The standard gas is exhausted by the generator exhaust part 15.
Further, when the third low-concentration standard gas flowing out from the first outlet 13c of the third gas mixing unit 13 is not introduced into the gas supply line L3 or is not collected in the collection pipe 16a, the third low-concentration standard gas is used. The standard gas is exhausted by the generator exhaust part 15.
Further, when the fourth low-concentration standard gas flowing out from the first outlet 14c of the fourth gas mixing unit 14 is not introduced into the gas supply line L3 or is not collected in the collection tube 16a, the fourth low-concentration standard gas is used. The standard gas is exhausted by the generator exhaust part 15.
Further, the gas discharged from the air sampler 16b is exhausted by the generator exhaust unit 15.

  For example, the dilution gas line L2 is connected to the gas supply line L3 via an eighteenth flow meter F18.

The gas concentration measuring unit 16 is configured by, for example, high performance liquid chromatography (HPLC) or the like, and, for example, each gas mixing unit (the first gas mixing unit 11 and the second gas mixing unit) included in the gas generation unit 10 as a gas concentration measuring unit. Unit 12, the third gas mixing unit 13, and the fourth gas mixing unit 14) respectively measure the concentration of the gas generated and output the measurement result to the control unit 50.
Specifically, the gas concentration measurement unit 16, for example, uses calibration curve data for concentration determination (for example, calibration curve data representing the relationship between the HPLC area of a specific substance (peak area of the specific substance) and the concentration of the specific substance). ) In advance, for example, by analyzing the gas collected by the collection tube 16a, and based on the analysis result (peak area of the specific substance) and the calibration curve data for concentration determination stored in advance Then, the concentration of the specific substance in the gas is determined, and the determination result is output to the control unit 50 as a measurement result.
And the measurement result output to the control part 50 is memorize | stored in RAM52 etc. with gas generation conditions (The flow rate of each gas (standard gas, standard air, and low concentration standard gas), the mixing ratio of each gas, etc.), for example. When the gas sensor S is evaluated, the generated concentration calibration curve data (gas generation conditions (the flow rate of each gas (standard gas, standard air, and low concentration standard gas), the mixing ratio of each gas, etc.) and the generated gas) Calibration curve data representing the relationship between the concentration and the concentration).

  The gas concentration adjusting unit 17 includes, for example, the flow rate of standard gas introduced from the standard gas line L1, the flow rate of standard air introduced from the dilution gas line L2, and the M-1th gas mixing unit (M is 2 ≦ M By adjusting the flow rate of the M-1 low concentration standard gas introduced into the Mth gas mixing unit from all integers satisfying ≦ 4, the concentration of the gas generated by each gas mixing unit is adjusted.

Specifically, the gas concentration adjustment unit 17 adjusts the flow rate of the standard gas introduced into the first gas mixing unit 11 from the standard gas line L1, for example, by controlling the first MFC 31 and the like.
Further, the gas concentration adjusting unit 17 controls, for example, the second MFC 32, the first flow meter F1, the second flow meter F2, the third flow meter F3, the fourth flow meter F4, the fifth flow meter F5, and the like to dilute. The flow rate of standard air introduced from the gas line L2 to each gas mixing unit is adjusted.
The gas concentration adjusting unit 17 controls the sixth flow meter F6, the ninth flow meter F9, and the like, for example, and introduces the first low concentration standard introduced from the first gas mixing unit 11 into the second gas mixing unit 12. Adjust the gas flow rate.
The gas concentration adjusting unit 17 controls the seventh flow meter F7, the tenth flow meter F10, and the like, for example, and introduces the second low concentration standard introduced from the second gas mixing unit 12 to the third gas mixing unit 13. Adjust the gas flow rate.
The gas concentration adjusting unit 17 controls, for example, the eighth flow meter F8, the eleventh flow meter F11, and the like, and the third low concentration standard introduced from the third gas mixing unit 13 to the fourth gas mixing unit 14. Adjust the gas flow rate.
Here, the gas concentration adjusting means includes the gas concentration adjusting unit 17, the first MFC 31, the second MFC 32, the first flow meter F1, the second flow meter F2, the third flow meter F3, and the fourth flow meter F4. A fifth flow meter F5, a sixth flow meter F6, a seventh flow meter F7, an eighth flow meter F8, a ninth flow meter F9, a tenth flow meter F10, and an eleventh flow meter F11. , Etc.

  The switching unit 18 controls, for example, the first switching valve Vb1, the second switching valve Vb2, the third switching valve Vb3, and the fourth switching valve Vb4 so that the gas supplied to the gas sensor S by the gas supply line L3 is changed to the first. Switch to any one of the first to fourth low concentration standard gases.

Specifically, for example, when supplying the first low-concentration standard gas to the gas sensor S mounted on the sensor mounting unit 30, the switching unit 18 switches the first switching valve Vb1 to the gas supply line L3 side, The 2 switching valve Vb2, the 3rd switching valve Vb3, and the 4th switching valve Vb4 are switched to the production | generation part exhaust part 15 side.
Further, for example, when supplying the second low-concentration standard gas to the gas sensor S mounted on the sensor mounting unit 30, the switching unit 18 switches the second switching valve Vb2 to the gas supply line L3 side and the first switching valve. Vb1, the 3rd switching valve Vb3, and the 4th switching valve Vb4 are switched to the production | generation part exhaust part 15 side.
In addition, for example, when supplying the third low-concentration standard gas to the gas sensor S mounted on the sensor mounting unit 30, the switching unit 18 switches the third switching valve Vb3 to the gas supply line L3 side and the first switching valve. Vb1, the 2nd switching valve Vb2, and the 4th switching valve Vb4 are switched to the production | generation part exhaust part 15 side.
In addition, for example, when supplying the fourth low-concentration standard gas to the gas sensor S mounted on the sensor mounting unit 30, the switching unit 18 switches the fourth switching valve Vb4 to the gas supply line L3 side and the first switching valve. Vb1, the 2nd switching valve Vb2, and the 3rd switching valve Vb3 are switched to the production | generation part exhaust part 15 side.
Here, the switching means includes a switching unit 18, a first switching valve Vb1, a second switching valve Vb2, a third switching valve Vb3, a fourth switching valve Vb4, and the like.

  For example, as illustrated in FIG. 1, the gas generation unit 10 is connected to a first MFC 31 that adjusts the flow rate of the standard gas introduced into the gas generation unit 10 by a standard gas line L1.

For example, the upstream side of the first MFC 31 is connected via a standard gas storage unit 31a that stores a standard gas (for example, a commercially available standard gas) and a filter 31b that purifies the standard gas. In addition, the first MFC 31 is connected, for example, to the gas generation unit 10 via the ninth opening / closing valve Va9 and to the vacuum pump 33 via the tenth opening / closing valve Va10.
Therefore, for example, when the ninth open / close bubble Va9 is opened and the tenth open / close valve Va10 is closed, the standard gas stored in the standard gas storage unit 31a passes through the filter 31b and is supplied to the first MFC 31, and After the flow rate is adjusted by the first MFC 31, the gas is introduced into the gas generator 10 through the standard gas line L1.

  The gas generator 10 is connected to the second MFC 32 that adjusts the flow rate of standard air introduced into the gas generator 10 by a dilution gas line L2.

For example, the upstream side of the second MFC 32 is connected via a standard gas storage unit 32a that stores standard air (for example, commercially available standard air (dry air)) and a filter 32b that purifies the standard air. The second MFC 32 has, for example, a downstream side connected to the gas generation unit 10 via a twentieth flow meter F20, a twenty-first flow meter F21, a humidification unit 32c that humidifies standard air (dry air), and It is connected via a 22nd flow meter F22 and connected via a vacuum pump 33 and an 11th on-off valve Va11.
Therefore, for example, when the twentieth flow meter F20, the twenty-first flow meter F21 and the twenty-second flow meter F22 are open and the eleventh opening / closing valve Va11 is closed, the standard air stored in the standard air storage unit 33a is filtered by the filter 32b. And is supplied to the second MFC 32, and after the flow rate is adjusted by the second MFC 32, it is introduced into the gas generation unit 10 through the dilution gas line L2, but the standard air introduced into the gas generation unit 10 Is composed of a mixture of dry air supplied via the 20th flow meter F20 and wet air supplied via the 21st flow meter F21, the humidifying part 32c and the 22nd flow meter F22. .

Here, the humidification part 32c is comprised from the tank etc. which stored the pure water, for example, For example, it has the structure which can bubble the introduced gas with a pure water and can discharge | emit the gas generated by the said bubbling.
Therefore, the standard air (dry air) introduced from the second MFC 32 to the humidifying unit 32c is humidified by bubbling with pure water in the humidifying unit 32c and becomes humid air.

  Moreover, the gas production | generation part 10 is connected with the vacuum pump 33 which wash | cleans the inside of the standard gas line L1, for example.

For example, the vacuum pump 33 is connected to the first MFC 31 via a tenth opening / closing valve Va10, and is connected to the gas generating unit 10 via a tenth opening / closing valve Va10 and a ninth opening / closing valve Va9. The vacuum pump 33 is connected to, for example, the second MFC 32 via the eleventh opening / closing valve Va11, and connected to the gas generator 10 via the eleventh opening / closing valve Va11 and the twentieth flow meter F20. The eleventh on-off valve Va11, the twenty-first flow meter F21, the humidifying unit 32c, and the twenty-second flow meter F22 are connected.
Therefore, for example, when the vacuum pump 33 is operated in a state where the tenth opening / closing bubble Va10 is opened and the ninth opening / closing valve Va9 and the eleventh opening / closing valve Va11 are closed, the standard gas storage unit 31a, the filter 31b, and the first MFC 31 are operated. And the gas in the line connecting them are exhausted to the outside of the sensor evaluation system 1 via the exhaust part 33a and cleaned.
For example, when the vacuum pump 33 is operated in a state where the eleventh opening / closing valve Va11 is opened and the tenth opening / closing valve Va10, the twentieth flow meter F20, and the twenty-first flow meter F21 are closed, the standard air storage portion 32a. The gas inside the filter 32b and the second MFC 32 and the inside of the line connecting them are exhausted to the outside of the sensor evaluation system 1 through the exhaust part 33a and cleaned.

  The gas generation unit 10 is connected to the gas sensor S mounted on the sensor mounting unit 30 and a gas supply line L3, for example.

For example, the upstream side of the gas sensor S mounted on the sensor mounting unit 30 is connected to the gas generation unit 10 via the 23rd flow meter F23 and the 24th flow meter F24, the 25th flow meter F25, or the 26th flow meter F26. It is connected. Further, the gas sensor S mounted on the sensor mounting portion 30 is connected to the system exhaust device 34 on the downstream side.
Accordingly, the gas supplied from the gas generation unit 10 is supplied to the gas sensor S mounted on the sensor mounting unit 30 through the gas supply line L3, but the 23rd flow is performed while passing through the gas supply line L3. The flow rate is adjusted by the meter F23, the 24th flow meter F24, the 25th flow meter F25 or the 26th flow meter F26.
In addition, the gas sensor with which a sensor mounting part is mounted | worn is arbitrary and the kind is not ask | required. For example, electrochemical sensor, solid electrolyte sensor, catalytic combustion sensor, metal oxide semiconductor sensor, field effect transistor sensor, crystal oscillator sensor, electrode sensor, ion sensitive field effect transistor (ISFET) Biosensors such as a type sensor, an optical sensor, an elastic surface sensor, a cantilever type sensor, or an enzyme sensor.

Here, the gas supply line L3 can supply the gas generated by any one of the first gas mixing unit 11 to the fourth gas mixing unit 14 included in the gas generation unit 10 to a plurality of gas sensors S at a time. The gas sensor S side (the sensor mounting portion 30 side) is branched into a plurality so that
Specifically, for example, the downstream side of the 23rd on-off valve F23 in the gas supply line L3 is branched into a plurality (three in this embodiment). A twenty-fourth flow meter F24, a twenty-fifth flow meter F25, and a twenty-sixth flow meter F26 are provided in each flow path between the branch point and the sensor mounting portion 30, respectively.

  The gas generation unit 10 is connected to a system exhaust unit 34 that exhausts unnecessary gas to the outside of the sensor evaluation system 1, for example.

The system exhaust unit 34 is connected to, for example, the gas sensor S mounted on the sensor mounting unit 30 and flows between the gas generation unit 10 and the 23rd flow meter F23 via the 27th flow meter F27. Accordingly, the gas discharged from the gas sensor S mounted on the sensor mounting unit 30 is exhausted by the system exhaust unit 34.
Further, of the gas generated by the gas generation unit 10, gas that is not supplied to the gas sensor S (for example, gas generated in a time zone in which the initial concentration is not stable) is exhausted by the system exhaust unit 34. It has come to be.

  The sensor temperature measurement unit 35 includes, for example, a temperature sensor disposed in each sensor mounting unit 30, and measures, for example, the temperature of the gas sensor S (inside the gas sensor S) mounted on each sensor mounting unit 30. Then, the measurement result is output to the control unit 50.

  The sensor temperature adjustment unit 36 includes, for example, a heater (for example, a heater film or a Peltier element) disposed in each sensor mounting unit 30. For example, the sensor temperature adjustment unit 36 is mounted on each sensor mounting unit 30 as a sensor temperature adjustment unit. The temperature of the gas sensor S (inside the gas sensor S) is adjusted.

  The sensor humidity measuring unit 37 includes, for example, a hygrometer disposed in each sensor mounting unit 30 and measures the humidity of the gas sensor S (inside the gas sensor S) mounted on each sensor mounting unit 30, for example. Then, the measurement result is output to the control unit 50.

The sensor humidity adjusting unit 38 adjusts the humidity of the gas sensor S (inside the gas sensor S) mounted on each sensor mounting unit 30 by, for example, mixing dry air with wet air humidified by the humidifying unit 32c. .
Specifically, the sensor humidity adjusting unit 38 controls, for example, the twentieth flow meter F20, the twenty-first flow meter F21, and the twenty-second flow meter F22 so as to configure the standard air introduced into the gas generation unit 10. The humidity of the gas sensor S is adjusted by adjusting the mixing ratio of air and wet air.
Here, the sensor humidity adjusting means includes, for example, a humidifying unit 32c, a sensor humidity adjusting unit 38, a twentieth flow meter F20, a twenty-first flow meter F21, a twenty-second flow meter F22, and the like.

  The mixing unit temperature adjustment unit 39 includes, for example, a ribbon heater disposed in the vicinity of each gas mixing unit included in the gas generation unit 10. For example, as the mixing unit temperature adjustment unit, the temperature of each gas mixing unit is set. adjust.

  The line temperature adjusting unit 40 includes, for example, a ribbon heater wound around each of the standard gas line L1, the dilution gas line L2, and the gas supply line L3 provided in the sensor evaluation system 1, and includes, for example, a line temperature adjusting unit. Adjust the temperature of each line.

The supply gas flow rate adjustment unit 41 controls, for example, the 23rd flow meter F23, the 24th flow meter F24, the 25th flow meter F25, the 26th flow meter F26, the 27th flow meter F27, etc., and the gas supply line L3. Adjust the flow rate of the supplied gas.
In addition, when the several gas sensor S is mounted | worn with the sensor evaluation system 1, the supply gas flow volume adjustment part 41 adjusts the flow volume of the gas supplied to each of the said several gas sensor S, respectively.
Here, the supply gas flow rate adjusting means includes a supply gas flow rate adjustment unit 41, a 23rd flow meter F23, a 24th flow meter F24, a 25th flow meter F25, a 26th flow meter F26, and a 27th flow meter. F27 and the like.

  The valve / flow meter control unit 42 controls, for example, each open / close valve, each switching valve, and each flow meter included in the sensor evaluation system 1.

  For example, the measurement unit 43 measures a signal value from the gas sensor S attached to the sensor attachment unit 30 and outputs the measurement result to the data processing unit 44.

The data processing unit 44 processes the measurement result input from the measurement unit 43, for example, and creates numerical data based on the measurement result.
Here, the numerical data is, for example, calibration curve data representing the relationship between the concentration of the gas supplied to the gas sensor S and the signal value from the gas sensor S when the gas is supplied. The data processing unit 44 uses, for example, the gas concentration measured by the gas concentration measuring unit 16 as the concentration of the gas supplied to the gas sensor S, and creates calibration curve data for each gas sensor S.

  The display unit 45 includes, for example, an LCD (Liquid Crystal Display) panel, and displays, for example, numerical information based on numerical data created by the data processing unit 44, information on the operation method of the sensor evaluation system 1, and the like. The

  The operation unit 46 includes, for example, operation buttons and the like, and outputs the operation signal to the control unit 50 when operated by the user. The operation unit 46 may include other input devices such as a pointing device such as a mouse or a touch panel (a touch panel integrally formed with the LCD panel or the like of the display unit 45) as necessary.

For example, the control unit 50 performs centralized control of the operation of each unit constituting the sensor evaluation system 1.
Specifically, for example, as illustrated in FIG. 3, the control unit 50 includes a CPU (Central Processing Unit) 51, a RAM (Random Access Memory) 52, a storage unit 53, and the like.

  For example, the CPU 51 performs various control operations according to various processing programs for the sensor evaluation system 1 stored in the storage unit 53.

  The RAM 52 includes, for example, a program storage area for expanding a processing program executed by the CPU 51, a data storage area for storing input data, a processing result generated when the processing program is executed, and the like.

  The storage unit 53 includes, for example, a system program that can be executed by the sensor evaluation system 1, various processing programs that can be executed by the system program, data that is used when these various processing programs are executed, and processing that is calculated by the CPU 51. The result data and the like are stored. The program is stored in the storage unit 53 in the form of a computer readable program code.

  For example, as shown in FIG. 3, the storage unit 53 includes a sensor temperature adjustment control program 531, a sensor humidity adjustment control program 532, a mixing unit temperature adjustment control program 533, a line temperature adjustment control program 534, and a gas concentration adjustment. A control program 535, a switching control program 536, a supply gas flow rate adjustment control program 537, and the like are stored.

The sensor temperature adjustment control program 531 is based on the temperature of the gas sensor S measured by the sensor temperature measurement unit 35 so that the temperature of the gas sensor S mounted on the sensor mounting unit 30 becomes a predetermined temperature, for example. The CPU 51 is caused to realize a function of causing the adjustment unit 36 to adjust the temperature of the gas sensor S.
That is, the CPU 51 feeds back the temperature of the gas sensor S measured by the sensor temperature measuring unit 35 to the sensor temperature adjusting unit 36.
Here, the predetermined temperature is a preset temperature, and can be appropriately changed by, for example, an operation of the operation unit 46 by the user.
The CPU 51 functions as a sensor temperature adjustment control unit by executing the sensor temperature adjustment control program 531.

The sensor humidity adjustment control program 532, for example, based on the humidity of the gas sensor S measured by the sensor humidity measurement unit 37 so that the humidity of the gas sensor S mounted on the sensor mounting unit 30 becomes a predetermined humidity. The CPU 51 is caused to realize the function of causing the adjustment unit 38 to adjust the humidity of the gas sensor S.
That is, the CPU 51 feeds back the humidity of the gas sensor S measured by the sensor humidity measuring unit 37 to the sensor humidity adjusting unit 38.
Here, the predetermined humidity is a preset humidity, and can be appropriately changed by, for example, an operation of the operation unit 46 by the user.
The CPU 51 functions as a sensor humidity adjustment control unit by executing the sensor humidity adjustment control program 532.

The mixing unit temperature adjustment control program 533, for example, causes the mixing unit temperature adjustment unit 39 to set each gas mixing unit so that the temperature of each gas mixing unit included in the gas generation unit 10 becomes a predetermined temperature (a temperature higher than room temperature). The CPU 51 is caused to realize a function of adjusting the temperature.
Here, the predetermined temperature (temperature higher than room temperature) is a preset temperature, and can be appropriately changed by, for example, the operation of the operation unit 46 by the user.
The CPU 51 functions as a mixing unit temperature adjustment control unit by executing the mixing unit temperature adjustment control program 533.

The line temperature adjustment control program 534 is a function for causing the line temperature adjustment unit 40 to adjust the temperature of each line so that the temperature of each line included in the sensor evaluation system 1 becomes a predetermined temperature (temperature higher than room temperature), for example. Is realized by the CPU 51.
Here, the predetermined temperature (temperature higher than room temperature) is a preset temperature, and can be appropriately changed by, for example, the operation of the operation unit 46 by the user.
The CPU 51 functions as a line temperature adjustment control unit by executing the line temperature adjustment control program 534.

The gas concentration adjustment control program 535 is generated by each gas mixing unit in the gas concentration adjusting unit 17 so that the concentration of the gas generated by each gas mixing unit included in the gas generation unit 10 becomes a predetermined concentration, for example. The CPU 51 is allowed to realize a function of adjusting the concentration of each gas.
Here, the predetermined density is a preset density, and can be appropriately changed by, for example, an operation of the operation unit 46 by the user.

Specifically, the CPU 51, for example, in accordance with a predetermined concentration set in advance, the calibration concentration representing the relationship between the generated gas concentration curve data (the gas generation conditions stored in the RAM 52 and the like, and the generated gas concentration). Line data), the standard gas flow rate, the standard air flow rate, and the low concentration standard gas flow rate are calculated, and the gas concentration adjustment unit 17 is supplied with the standard gas flow rate, the standard air flow rate, and the calculated flow rate. The flow rate, the flow rate of the standard gas, and the flow rate of the low concentration standard gas are adjusted.
That is, the CPU 51 determines that “(concentration preset as the concentration of the first low-concentration standard gas) = (concentration of standard gas introduced into the first gas mixing unit 11) × (standard introduced into the first gas mixing unit 11). Gas flow rate) / ((flow rate of standard gas introduced into the first gas mixing unit 11) + (flow rate of standard air introduced into the first gas mixing unit 11)) "and" (of the Mth low concentration standard gas Concentration preset as concentration) = (concentration of M-1 low concentration standard gas introduced into Mth gas mixing unit) × (flow rate of M-1 low concentration standard gas introduced into Mth gas mixing unit) / ((Flow rate of M-1 low-concentration standard gas introduced into the Mth gas mixing unit) + (flow rate of standard air introduced into the Mth gas mixing unit)) " Calculate the flow rate of the gas and the flow rate of the low-concentration standard gas, and adjust the gas so that the calculated flow rate is the same. The concentration adjusting unit 17 adjusts the flow rate of the standard gas, the flow rate of the standard air, and the flow rate of the low concentration standard gas. However, the actual set concentration of each low concentration standard gas is uniquely determined from the correspondence with the generated concentration calibration curve data.
The CPU 51 functions as a gas concentration adjustment control unit by executing the gas concentration adjustment control program 535.

For example, the switching control program 536 has a function of causing the switching unit 18 to switch so that the gas supplied to the gas sensor S by the gas supply line L3 is one of the first to fourth low concentration standard gases. This is realized by the CPU 51.
That is, the CPU 51 switches the concentration of the gas supplied to the gas sensor S by switching the type of gas supplied to the gas sensor S by the switching unit 18.

The supply gas flow rate adjustment control program 537 is supplied to the supply gas flow rate adjustment unit 41 through the gas supply line L3 so that the flow rate of the gas supplied to the gas sensor S attached to the sensor attachment unit 30 becomes a predetermined flow rate, for example. The CPU 51 is allowed to realize a function of adjusting the gas flow rate.
When a plurality of gas sensors S are attached to the sensor evaluation system 1, the CPU 51 supplies gas to the supply gas adjusting unit 41 so that the flow rate of the gas supplied to each of the plurality of gas sensors S becomes a predetermined flow rate. The flow rate of the gas supplied from the supply line L3 is adjusted.
Here, the predetermined flow rate is, for example, a preset flow rate, and can be appropriately changed by, for example, an operation of the operation unit 46 by the user.
The CPU 51 functions as a supply gas flow rate adjustment control unit by executing the supply gas flow rate adjustment control program 537.

<Sensor evaluation processing>
Next, processing relating to the evaluation of the gas sensor S by the sensor evaluation system 1 of the present embodiment will be described with reference to the flowchart of FIG.

When evaluating the gas sensor S by the sensor evaluation system 1, the user first attaches the gas sensor S to the sensor attachment unit 30, and then operates the operation unit 46 to instruct to start cleaning in the sensor evaluation system 1.
When instructed by the user (operation unit 46) to start cleaning in the sensor evaluation system 1, the CPU 51 first adjusts the temperature of the gas sensor S mounted on the sensor mounting unit 30, and each of the gas generation unit 10 includes Adjustment of the temperature of the gas mixing unit and adjustment of the temperature of each line provided in the sensor evaluation system 1 are started (step S1). Then, for example, the CPU 51 ends these adjustments when the evaluation of the gas sensor S (step S10) ends.

Specifically, the CPU 51 executes the sensor temperature adjustment control program 531 to cause the sensor temperature adjustment unit 36 to adjust the temperature of the gas sensor S so that the temperature of the gas sensor S becomes a predetermined temperature (for example, 30 ° C.). .
In addition, the CPU 51 executes the mixing unit temperature adjustment control program 533 so that the gas mixing unit temperature adjustment unit 39 mixes each gas so that the temperature of each gas mixing unit becomes a predetermined temperature (for example, 38 ° C.) higher than room temperature. Adjust the temperature of the part.
Further, the CPU 51 executes the line temperature adjustment control program 534 to cause the line temperature adjustment unit 40 to adjust the temperature of each line so that the temperature of each line becomes a predetermined temperature (for example, 38 ° C.) higher than the room temperature. .
In addition, although adjustment of the temperature of each gas mixing part and the adjustment of the temperature of each line was started at step S1 and ended when step S10 was completed, it is not limited to this. (That is, while the sensor evaluation process (FIG. 4) is not executed) may be performed. Thereby, it is possible to prevent dew condensation from occurring inside the sensor evaluation system 1 due to a change in room temperature even while the sensor evaluation process is not being executed.

Next, the CPU 51 executes the first line cleaning process for a predetermined time (for example, 1 hour) (step S2).
Specifically, for example, the CPU 51 controls the valve / flow meter control unit 42 to open / close each of the standard air storage unit 32a, the filter 32b, the second MFC 32, and the line connecting them, for example, From the state where the valves and the flow meters are all closed, an instruction is given to open the eleventh open / close valve Va11, an appropriate flow rate is set in the second MFC 32, and an instruction is given to operate the second MFC 32 and the vacuum pump 33.
As a result, the gas inside the standard air storage unit 32a, the filter 32b and the second MFC 32 and the line connecting them are exhausted to the outside of the sensor evaluation system 1 through the exhaust unit 33a and cleaned, and for dilution. The standard air is filled up to the 20th flow meter F20 and the 21st flow meter F21 in the gas line L2.

Next, when the execution of the first line cleaning process is finished, the CPU 51 executes the first exhaust process for a predetermined time (for example, 1 hour) (step S3).
Specifically, for example, the CPU 51 sets, for example, the first switching valve Vb1 to the fourth switching valve Vb4 to the valve / flow meter control unit 42 so that the standard air is exhausted via each gas mixing unit. Switching to the generator exhaust section 15 side, closing the eleventh open / close valve Va11, the twentieth flow meter F20, the twenty-seventh flow meter F27, the eighteenth flow meter F18, the first flow meter F1 to the fourth flow meter F4, Instructions are given to open the 6th flow meter F6 to the 8th flow meter F8, the fifth on / off valve Va5 to the eighth on / off valve Va8.

Next, when the execution of the first exhaust process ends, the CPU 51 executes the second exhaust process for a predetermined time (for example, 1 hour) (step S4).
Specifically, the CPU 51 closes, for example, the 27th flow meter F27 to the valve / flow meter control unit 42 so that the standard air is exhausted via the gas sensor S mounted on the sensor mounting unit 30. The 21st flow meter F21 to the 26th flow meter F26 are instructed to be opened.

Here, for example, in step S4, the CPU 51 starts adjusting the flow rate of the gas supplied to the gas sensor S and adjusting the humidity of the gas sensor S. For example, when the evaluation of the gas sensor S (step S10) is completed, These adjustments are finished.
Specifically, the CPU 51 executes the supply gas flow rate adjustment control program 537 so that the gas flow to the gas sensor S is supplied to the supply gas flow rate adjustment unit 41 so that the flow rate of the gas supplied to the gas sensor S becomes a predetermined flow rate (for example, 40 sccm). The adjustment of the flow rate of the gas supplied through the supply line L3 is started. That is, the supply gas flow rate adjustment unit 41 sets a flow rate of 120 sccm as the flow rate of the 23rd flow meter F23 and a flow rate of 40 sccm as the flow rates of the 14th flow meter F24 to the 16th flow meter F26.
Further, the CPU 51 executes the sensor humidity adjustment control program 532 to cause the sensor humidity adjustment unit 38 to adjust the humidity of the gas sensor S so that the humidity of the gas sensor S becomes a predetermined humidity (for example, 90%).

When the execution of the first line cleaning process is completed, the CPU 51 executes the second line cleaning process for a predetermined time (for example, 1 hour) (step S5).
Specifically, the CPU 51 sends the eleventh open / close valve to the valve / flow meter control unit 42 so that the inside of the standard gas storage unit 31a, the filter 31b, the first MFC 31 and the inside of the line connecting them are washed, for example. Va11 is closed and the tenth on-off valve Va10 is instructed to be opened, and an appropriate flow rate is set in the first MFC 31, and the first MFC 31 is instructed to operate.
As a result, the gas inside the standard gas storage unit 31a, the filter 31b and the first MFC 31 and the inside of the line connecting them are exhausted to the outside of the sensor evaluation system 1 through the exhaust unit 33a and cleaned, and the supplied gas The standard gas is filled up to just before the ninth on-off valve Va9 in the line L1.

  Next, when the execution of the second line cleaning process is completed, the CPU 51 instructs, for example, the valve / flow meter control unit 42 to close the tenth on-off valve Va10 and open the ninth on-off valve Va9, and the vacuum pump 33 is instructed to stop the operation, and for example, in parallel with the execution of the second exhaust process (step S4), the gas generation unit 10 starts generating the gas (step S6).

Specifically, the CPU 51 executes the gas concentration adjustment control program 535 to generate the gas concentration adjusting unit 17 by the gas mixing unit so that the concentration of the gas generated by each gas mixing unit becomes a predetermined concentration. Adjust the gas concentration.
For example, the concentration of the standard gas stored in the standard gas storage unit 31a is 1000 ppb, the concentration of the first low concentration standard gas (predetermined concentration) is 200 ppb, and the concentration of the second low concentration standard gas (predetermined concentration). 40 ppb, 8 ppb as the third low-concentration standard gas concentration (predetermined concentration), and 1.6 ppb as the fourth low-concentration standard gas concentration (predetermined concentration), the CPU 51 uses the gas concentration adjustment unit 17, the flow rate of the first MFC 31 is 5 sccm, the flow rate of the first flow meter F1 to the fourth flow meter F4 is 20 sccm, the flow rate of the sixth flow meter F6 to the eighth flow meter F8 is 5 sccm, and the ninth flow meter F9. The flow rate of 5 sccm is set as the flow rate of the twelfth flow meter F12 and the first flow meter F1 to the first flow meter F12 The flow rate of the second MFC 32, the 20th flow meter F20 to the 22nd flow meter F22, the 5th flow meter F5, the 18th flow meter F18, etc. is evaluated, for example, by the gas sensor S (step) so that the flow rate of the flow meter F4 becomes 20 sccm. Adjust until S10) is completed. Therefore, as will be described later, in step S7, the eighteenth flow meter F18 is closed, but at this stage, the gas concentration adjusting unit 17 causes the flow rates of the first flow meter F1 to the fourth flow meter F4 to be 20 sccm. The flow rates of the second MFC 32, the 20th flow meter F20 to the 22nd flow meter F22, the fifth flow meter F5, etc. are adjusted again.

Next, after a predetermined time has elapsed from the start of gas generation (a time during which the concentration of the generated low-concentration standard gas is sufficiently stable (for example, 3 hours)), the CPU 51 ends the execution of the second exhaust processing (step S4). If confirmed, the valve / flow meter control unit 42 is instructed to close the eighteenth flow meter F18, and the gas generated by each gas mixing unit is collected by the collection tube 16a (step S7).
Specifically, the CPU 51 causes the valve / flow meter control unit 42 to open, for example, the fifth open / close valve Va5 to the eighth open / close valve so that the gas generated by each gas mixing unit is collected in the collection pipe 16a. The valve Va8 is closed and an instruction is given to open the first opening / closing valve Va1 to the fourth opening / closing valve Va4.
Then, the CPU 51 instructs the air sampler 16a and the like to start operation.

  Next, after a predetermined time (for example, 30 minutes) has elapsed since the start of collection and a predetermined amount (for example, 20 L) of gas is collected in the collection tube 16a, the CPU 51 generates each gas mixing unit. For example, the valve / flow meter control unit 42 closes the first opening / closing valve Va1 to the fourth opening / closing valve Va4 and the fifth opening / closing valve Va5 to the second opening / closing valve Va4 so that the generated gas is exhausted by the generator exhaust unit 15. Instructs to open the 8 open / close valve Va8.

Next, the CPU 51 causes the gas concentration measurement unit 16 to measure the concentration of the gas generated by each gas mixing unit and collected in the collection tube 16a (step S8), and determines the measured gas concentration. The concentration of the gas generated by each gas mixing unit is stored in the RAM 52 or the like (step S9).
Specifically, the CPU 51 stores the measured value of the concentration of the gas generated by the first gas mixing unit 11 as the concentration of the first low concentration standard gas, and the concentration of the gas generated by the second gas mixing unit 12 Is stored as the concentration of the second low concentration standard gas, the measured value of the concentration of the gas generated by the third gas mixing unit 13 is stored as the concentration of the third low concentration standard gas, and the fourth gas mixing unit 14 is stored as the concentration of the fourth low-concentration standard gas. Thereby, the density | concentration of the gas produced | generated by the gas production | generation part 10 is prescribed | regulated.

  Next, the CPU 51 evaluates the gas sensor S while switching the type of gas to be supplied (concentration of supplied gas) (step S10).

  Specifically, the CPU 51 executes the switching control program 536 so that the gas (fourth low concentration standard gas) generated by the fourth gas mixing unit 14 is supplied to the gas sensor S to the switching unit 18. For example, the fourth switching valve Vb4 is instructed to be switched to the gas supply line L3 side while the first switching valve Vb1 to the third switching valve Vb3 are kept on the generator exhaust section 15 side, and the gas sensor is Instruct to measure the signal value from S.

  Next, the CPU 51 executes the switching control program 536 so that the gas generated by the third gas mixing unit 13 (third low-concentration standard gas) is supplied to the gas sensor S, for example, With the first switching valve Vb1 and the second switching valve Vb2 on the generator exhaust section 15 side, the fourth switch valve Vb4 is switched to the generator exhaust section 15 side, and the third switch valve Vb3 is switched to the gas supply line L3 side. And instructing the measurement unit 43 to measure the signal value from the gas sensor S.

  Next, the CPU 51 executes the switching control program 536 so that the gas generated by the second gas mixing unit 12 (second low concentration standard gas) is supplied to the gas sensor S, for example, While the first switching valve Vb1 and the fourth switching valve Vb4 are kept on the generating section exhaust section 15 side, the third switching valve Vb3 is switched to the generating exhaust section 15 side, and the second switching valve Vb2 is switched to the gas supply line L3 side. And instructing the measurement unit 43 to measure the signal value from the gas sensor S.

  Next, the CPU 51 executes the switching control program 536 so that the gas generated by the first gas mixing unit 12 (first low concentration standard gas) is supplied to the gas sensor S, for example, While the third switching valve Vb3 and the fourth switching valve Vb4 are on the generator exhaust section 15 side, the second switch valve Vb2 is switched to the generator exhaust section 15 side, and the first switch valve Vb1 is switched to the gas supply line L3 side. And instructing the measurement unit 43 to measure the signal value from the gas sensor S.

Next, for example, the CPU 51 causes the data processing unit 44 to process the measurement result obtained by the measurement unit 43 and create numerical data (for example, calibration curve data of the evaluation target sensor (gas sensor S)) based on the measurement result. Then, numerical information based on the numerical data is displayed on the display unit 45, and the process is terminated.
Here, every time the gas supplied to the gas sensor S is switched, the second exhaust process (a process of exhausting the standard air via the gas sensor S mounted on the sensor mounting unit 30) may be performed. Thereby, the baseline of the sensor can be restored and returned to the initial state.
Further, when the evaluation of the gas sensor S is repeatedly performed, the second exhaust processing may be executed every time the evaluation of the gas sensor S is repeatedly performed. Thereby, the baseline of the sensor can be restored and returned to the initial state.
Further, by performing evaluation by changing the temperature and humidity of each gas sensor S, it is possible to perform an environmental test of the gas sensor such as temperature dependency and humidity dependency.
In the sensor evaluation process described above, the type of gas to be supplied is the type of the low concentration standard gas in the order of the fourth low concentration standard gas → the third low concentration standard gas → the second low concentration standard gas → the first low concentration standard gas. However, the order of switching the type of the low-concentration standard gas is arbitrary.

  Hereinafter, the present invention will be described with reference to specific examples, but the present invention is not limited thereto.

  In this example, formaldehyde gas (concentration: 1000 ppb) was used as the standard gas, and the measured value of the concentration of the gas generated by each gas mixing unit was compared with the theoretical value.

First, a flow rate of 5 sccm is set in the first MFC 31, a flow rate of 10 sccm is set as the flow rate of the first flow meter F1 to the fourth flow meter F4, and a flow rate of 5 sccm is set as the flow rate of the sixth flow meter F6 to the eighth flow meter F8. Thus, gas was generated in the gas generator 10.
Subsequently, the gas produced | generated by each gas mixing part was each collected with the collection pipe | tube 16a, and the formaldehyde concentration was each measured by DNPH-HPLC method. The result is shown in FIG.

In FIG. 5, the measured value of the formaldehyde concentration measured by the DNPH-HPLC method is shown by the black rhombus plot (♦), and the first MFC 31, the first flow meter F1 to the fourth flow meter F4, The theoretical value of the formaldehyde concentration calculated from the flow rates set in the sixth flow meter F6 to the eighth flow meter F8 is shown.
Specifically, the theoretical value of the concentration of the gas (first low concentration standard gas) generated by the first gas mixing unit 11 is “1000 ppb × 5 sccm / (5 sccm + 10 sccm)”, which is generated by the second gas mixing unit 12. The theoretical value of the concentration of the gas (second low-concentration standard gas) is “(concentration of the first low-concentration standard gas) × 5 sccm / (5 sccm + 10 sccm)”, and the gas generated by the third gas mixing unit 13 ( The theoretical value of the concentration of the third low-concentration standard gas) is “(concentration of the second low-concentration standard gas) × 5 sccm / (5 sccm + 10 sccm)”, and the gas (fourth low-concentration gas) generated by the fourth gas mixing unit 14 The theoretical value of the standard gas concentration is “(concentration of the third low-concentration standard gas) × 5 sccm / (5 sccm + 10 sccm)”.

Also, a flow rate of 5 sccm is set in the first MFC 31, a flow rate of 20 sccm is set as the flow rate of the first flow meter F1 to the fourth flow meter F4, and a flow rate of 5 sccm is set as the flow rate of the sixth flow meter F6 to the eighth flow meter F8. Thus, gas was generated in the gas generator 10.
Subsequently, the gas produced | generated by each gas mixing part was each collected with the collection pipe | tube 16a, and the formaldehyde concentration was each measured by DNPH-HPLC method. The result is shown in FIG.

In FIG. 6, the black square plot (■) shows the measured value of the formaldehyde concentration measured by the DNPH-HPLC method, and the white square plot (□) shows the first MFC 31, the first flow meter F1 to the fourth flow meter F4, The theoretical value of the formaldehyde concentration calculated from the flow rates set in the sixth flow meter F6 to the eighth flow meter F8 is shown.
Specifically, the theoretical value of the concentration of the gas (first low concentration standard gas) generated by the first gas mixing unit 11 is “1000 ppb × 5 sccm / (5 sccm + 20 sccm)”, which is generated by the second gas mixing unit 12. The theoretical value of the concentration of the gas (second low-concentration standard gas) is “(concentration of the first low-concentration standard gas) × 5 sccm / (5 sccm + 20 sccm)”, and the gas generated by the third gas mixing unit 13 ( The theoretical value of the concentration of the third low-concentration standard gas) is “(concentration of the second low-concentration standard gas) × 5 sccm / (5 sccm + 20 sccm)”, and the gas generated by the fourth gas mixing unit 14 (fourth low-concentration standard gas) The theoretical value of the standard gas concentration is “(concentration of the third low-concentration standard gas) × 5 sccm / (5 sccm + 20 sccm)”.

Also, a flow rate of 5 sccm is set in the first MFC 31, a flow rate of 30 sccm is set as the flow rate of the first flow meter F1 to the fourth flow meter F4, and a flow rate of 5 sccm is set as the flow rate of the sixth flow meter F6 to the eighth flow meter F8. Thus, gas was generated in the gas generator 10.
Subsequently, the gas produced | generated by each gas mixing part was each collected with the collection pipe | tube 16a, and the formaldehyde concentration was each measured by DNPH-HPLC method. The result is shown in FIG.

In FIG. 7, the black triangle plot (▲) shows the measured value of the formaldehyde concentration measured by the DNPH-HPLC method, and the white triangle plot (△) shows the first MFC 31, the first flow meter F1 to the fourth flow meter F4, The theoretical value of the formaldehyde concentration calculated from the flow rates set in the sixth flow meter F6 to the eighth flow meter F8 is shown.
Specifically, the theoretical value of the concentration of the gas (first low concentration standard gas) generated by the first gas mixing unit 11 is “1000 ppb × 5 sccm / (5 sccm + 30 sccm)”, which is generated by the second gas mixing unit 12. The theoretical value of the concentration of the gas (second low-concentration standard gas) is “(concentration of the first low-concentration standard gas) × 5 sccm / (5 sccm + 30 sccm)”, and the gas generated by the third gas mixing unit 13 ( The theoretical value of the concentration of the third low-concentration standard gas) is “(concentration of the second low-concentration standard gas) × 5 sccm / (5 sccm + 30 sccm)”, and the gas generated by the fourth gas mixing unit 14 (fourth low-concentration standard gas) The theoretical value of the concentration of (standard gas) is “(concentration of the third low concentration standard gas) × 5 sccm / (5 sccm + 30 sccm).

Also, a flow rate of 5 sccm is set in the first MFC 31, a flow rate of 40 sccm is set as the flow rate of the first flow meter F1 to the fourth flow meter F4, and a flow rate of 5 sccm is set as the flow rate of the sixth flow meter F6 to the eighth flow meter F8. Thus, gas was generated in the gas generator 10.
Subsequently, the gas produced | generated by each gas mixing part was each collected with the collection pipe | tube 16a, and the formaldehyde concentration was each measured by DNPH-HPLC method. The result is shown in FIG.

In FIG. 8, the black circle plot (●) shows the measured value of the formaldehyde concentration measured by the DNPH-HPLC method, and the white circle plot (◯) shows the first MFC 31, the first flow meter F1 to the fourth flow meter F4, the sixth The theoretical value of the formaldehyde concentration calculated from the flow rate set in the flow meter F6 to the eighth flow meter F8 is shown.
Specifically, the theoretical value of the concentration of the gas (first low concentration standard gas) generated by the first gas mixing unit 11 is “1000 ppb × 5 sccm / (5 sccm + 40 sccm)”, which is generated by the second gas mixing unit 12. The theoretical value of the concentration of the gas (second low-concentration standard gas) is “(concentration of the first low-concentration standard gas) × 5 sccm / (5 sccm + 40 sccm)”, and the gas generated by the third gas mixing unit 13 ( The theoretical value of the concentration of the third low-concentration standard gas is “(concentration of the second low-concentration standard gas) × 5 sccm / (5 sccm + 40 sccm)”, and the gas generated by the fourth gas mixing unit 14 (fourth low-concentration standard gas) The theoretical value of the standard gas concentration is “(concentration of the third low-concentration standard gas) × 5 sccm / (5 sccm + 40 sccm)”.

  From the results of FIGS. 5 to 8, the actual measurement value slightly deviates from the theoretical value as the standard gas is diluted, that is, as the gas mixing part is in the latter stage, but it is almost theoretical even in the extremely low concentration region. It was found that a gas having a value concentration could be generated with good reproducibility.

According to the gas generation apparatus (the gas generation unit 10 and the control unit 50) of the present embodiment described above, N gas mixtures (N is any one integer satisfying 2 ≦ N) connected in series to each other. The first gas mixing unit 11 among the N gas mixing units includes a standard gas line L1 for introducing the standard gas into the gas mixing unit and a dilution for introducing the dilution gas into the gas mixing unit. Gas line L2 and a gas supply line L3 for supplying the gas generated by the gas mixing unit to the outside, and a standard gas introduced from the standard gas line L1 and a gas line L2 for dilution. The first low concentration standard gas is generated by mixing with the dilution gas, and the generated first low concentration standard gas is introduced into the second gas mixing unit 12 and / or the gas supply line L3, and N Mth gas mixing in the gas mixing section (M is an integer satisfying 2 ≦ M ≦ N) is connected to the gas line for dilution L2, the gas supply line, and L3, and is introduced from the M-1th gas mixing unit among the N gas mixing units. The M-1th low concentration standard gas and the dilution gas introduced from the dilution gas line L2 are mixed to generate the Mth low concentration standard gas, and the generated Mth low concentration standard gas Is introduced into the (M + 1) th gas mixing section and / or the gas supply line L3 among the N gas mixing sections.
That is, since the multistage gas mixing section connected in series with each other is provided, the low-concentration standard gas generated by diluting the introduced gas can be immediately introduced to the next stage, and in the next stage. Since the introduced low concentration standard gas can be diluted to generate a low concentration standard gas having a lower concentration, a plurality of low concentration standard gases having arbitrary concentrations can be generated substantially simultaneously.
Therefore, a standard gas having a plurality of types of concentrations can be generated at high speed with a simple configuration in which dilution is performed sequentially. This is extremely effective in terms of time and cost when using a low-concentration standard gas that requires a long time for concentration stabilization in sensor evaluation or the like.

In addition, according to the gas generation apparatus (the gas generation unit 10 and the control unit 50) of the present embodiment described above, the gas supplied from the gas supply line L3 is any of the first to Nth low concentration standard gases. The switching part 18 which switches to one is provided.
Therefore, only a standard gas having a desired concentration can be supplied, and standard gases having a plurality of types of concentrations are generated almost simultaneously, so that the supplied standard gases can be switched one after another, which is convenient.

According to the sensor evaluation system 1 of the present invention described above, the gas generation unit 10 is provided, and the gas supply line L3 supplies the gas generated by the gas mixing unit to the gas sensor S.
That is, since the gas sensor S can be evaluated using the gas generated by the gas generation unit 10, the gas sensor S can be evaluated in a short time.

In addition, according to the sensor evaluation system 1 of the present embodiment described above, the sensor temperature adjustment unit 36 that adjusts the temperature of the gas sensor S is provided, and the sensor temperature adjustment unit 36 is adjusted so that the temperature of the gas sensor S becomes a predetermined temperature. The temperature of the gas sensor S is adjusted.
Therefore, while the gas sensor S is being evaluated, the temperature in the gas sensor S can be kept constant, so that the evaluation of the gas sensor S can be performed stably and accurately. Moreover, since the temperature in the gas sensor S can be maintained at an arbitrary temperature, the range of evaluation methods can be widened and used for environmental tests.

In addition, according to the sensor evaluation system 1 of the present embodiment described above, the sensor humidity adjusting unit 38 that adjusts the humidity of the gas sensor S by humidifying the dilution gas is provided, and the humidity of the gas sensor S is set to a predetermined humidity. Thus, the humidity of the gas sensor S is adjusted by the sensor humidity adjusting unit 38.
Therefore, while the gas sensor S is being evaluated, the humidity in the gas sensor S can be kept constant, so that the evaluation of the gas sensor S can be performed stably and accurately. Moreover, since the humidity in the gas sensor S can be maintained at an arbitrary humidity, the range of evaluation methods can be widened and used for environmental tests.

In addition, according to the sensor evaluation system 1 of the present embodiment described above, the mixing unit temperature adjusting unit 39 that adjusts the temperature of each gas mixing unit is provided, and mixing is performed so that the temperature of each gas mixing unit is higher than room temperature. The temperature of each gas mixing section is adjusted by the section temperature adjusting section 39, and the line temperatures for adjusting the temperatures of the standard gas line L1, the dilution gas line L2, and the gas supply line L3, respectively. An adjustment unit 40 is provided, and the temperature of each line is adjusted by the line temperature adjustment unit 40 so that the temperature of each line becomes higher than room temperature.
Therefore, when the dilution gas is humidified, dew condensation may occur in each gas mixing section or each line, but the temperature of each gas mixing section or each line can be maintained at a temperature higher than room temperature. The condensation can be prevented, and the gas sensor S can be evaluated stably and accurately.

In addition, according to the sensor evaluation system 1 of the present embodiment described above, the supply gas flow rate adjustment unit 41 that adjusts the flow rate of the gas supplied by the gas supply line L3 is provided, and the flow rate of the gas supplied to the gas sensor S is The flow rate of the gas supplied from the gas supply line L3 is adjusted by the supply gas flow rate adjustment unit 41 so as to obtain a predetermined flow rate.
Accordingly, since the flow rate of the supplied gas can be kept constant while the gas sensor S is being evaluated, the gas sensor S can be evaluated stably and accurately. In addition, since the flow rate of the supplied gas can be maintained at an arbitrary flow rate, the range of evaluation methods is widened and the usability is good.

Moreover, according to the sensor evaluation system 1 of the present embodiment described above, the gas supply line L3 once generates the gas generated by any one of the first gas mixing unit 11 to the fourth gas mixing unit 14. In addition, the gas sensor S side is branched into a plurality so that the gas sensor S can be supplied to the gas sensor S.
Therefore, since a plurality of gas sensors S can be evaluated at a time, efficiency is good.

  The present invention is not limited to the above-described embodiment, and can be appropriately changed without departing from the gist thereof.

<Modification 1>
The CPU 51 that has executed the gas concentration adjustment control program 535 calculates the flow rate of the standard gas, the flow rate of the standard air, and the flow rate of the low-concentration standard gas based on a predetermined concentration set in advance, and the calculated flow rate is obtained. However, the present invention is not limited to this. For example, the concentration of the low concentration standard gas measured by the gas concentration measuring unit 16 is fed back to the gas concentration adjusting unit 17. May be.

That is, for example, the CPU 51 first calculates the flow rate of the standard gas, the flow rate of the standard air, and the flow rate of the low-concentration standard gas based on a predetermined concentration set in advance, and the gas is set to the calculated flow rate. The low concentration measured by the gas concentration measuring unit 16 is adjusted so that the concentration of the low concentration standard gas generated by each gas mixing unit matches the predetermined concentration set in advance. The gas concentration adjusting unit 17 may be further adjusted based on the standard gas concentration.
Thereby, for example, first, the flow rate of the standard gas, the flow rate of the standard air, and the flow rate of the low-concentration standard gas are adjusted to the calculated flow rates by the gas concentration adjusting unit 17, and then, the standard gas flow rate, the standard flow rate At least one of the air flow rate and the low-concentration standard gas flow rate is adjusted based on the measured concentration of the low-concentration standard gas.

  Regarding the evaluation process of the gas sensor S in this case, for example, as shown in the flowchart of FIG. 9, after the measurement by the gas concentration measurement unit 16 (step S <b> 8), the CPU 51 determines the measured first to fourth low concentrations. Whether or not it is necessary to adjust the concentration of the low concentration standard gas by comparing the concentration of the standard gas with a predetermined concentration (the concentrations of the first to fourth low concentration standard gases set in advance), respectively. Judgment is made (step S21).

  If it is determined in step S21 that the concentration of the low-concentration standard gas needs to be adjusted (step S21; Yes), that is, out of the concentrations of the first to fourth low-concentration standard gases measured by the gas concentration measurement unit 16 If any one of these does not match the predetermined concentration set in advance, the CPU 51 determines that all of the concentrations of the first to fourth low concentration standard gases match the predetermined concentration set in advance. Thus, at least one of the flow rate of the standard gas, the flow rate of the standard air, and the flow rate of the low-concentration standard gas is adjusted by the gas concentration adjusting unit 17 (Step S22), and the processes after Step S8 are repeated.

  On the other hand, if it is determined in step S21 that it is not necessary to adjust the concentration of the low concentration standard gas (step S21; No), that is, the concentrations of the first to fourth low concentration standard gases measured by the gas concentration measurement unit 16. If all of the values match the predetermined density, the CPU 51 proceeds to the process of step S9.

According to the sensor evaluation system 1 of the modified example 1 described above, the gas concentration measuring unit 16 that measures the concentration of the gas generated by each gas mixing unit, the flow rate of the standard gas introduced from the standard gas line L3, By adjusting at least one of the flow rate of the standard air introduced from the dilution gas line L2 and the flow rate of the M-1 low concentration standard gas introduced from the M-1th gas mixing unit, Gas concentration adjusting unit 17 that adjusts the concentration of the low concentration standard gas generated by the gas mixing unit, respectively, so that the concentration of the low concentration standard gas generated by each gas mixing unit becomes a predetermined concentration, respectively. Based on the concentration of the low concentration standard gas measured by the gas concentration measuring unit 16, the concentration of the low concentration standard gas generated by each gas mixing unit is set in the gas concentration adjusting unit 17, respectively. And it is adapted to integer.
Therefore, it is possible to reliably generate a low concentration standard gas having a predetermined concentration set in advance.

  In the embodiment and the first modification, the same flow rate is set as the flow rate of the first flow meter F1 to the fourth flow meter F4, and the same flow rate is set as the flow rate of the sixth flow meter F6 to the eighth flow meter F8. Although set, the flow rates of the first flow meter F1 to the fourth flow meter F4 and the flow rates of the sixth flow meter F6 to the eighth flow meter F8 are predetermined concentrations (first to fourth low flow rates). The concentration may be the same or different as long as it is adjusted according to the concentration of the concentration standard gas.

  Moreover, in the said embodiment and the modification 1, although the same flow volume was set as a flow volume of 24th flow meter F24-26th flow meter F26, the flow volume of 24th flow meter F24-26th flow meter F26 is set. As long as it is adjusted to a predetermined flow rate set in advance, they may be the same or different.

  Further, in the embodiment and the first modification, the number of branches on the gas sensor S side in the gas supply line L3, that is, the number of sensor mounting portions 30 provided in the sensor evaluation system 1 is not limited to three, but one. It may be two, two, or four or more.

Moreover, in the said embodiment and the modification 1, although the gas concentration measurement part 16 was provided in the gas generation part 10, the gas generation part 10 does not need to be provided with the gas concentration measurement part 16. FIG.
In this case, the concentration of the generated low concentration standard gas is measured by an external device (concentration measuring device) provided outside the gas generating unit 10 (including the inside and outside of the sensor evaluation system 1). And good. When the concentration is measured by an external device, in the above embodiment, the gas sensor S may be evaluated using the concentration measured by the external device. In the first modification, the concentration measured by the external device may be fed back to the gas concentration adjusting unit 17.

  Moreover, in the said embodiment and the modification 1, although the sensor evaluation system 1 was equipped with the two exhaust parts of the production | generation part exhaust part 15 and the system exhaust part 34, it does not restrict to this. The generator exhaust unit 15 and the system exhaust unit 34 may be integrated into a single exhaust unit.

  Moreover, in the said embodiment and the modification 1, although temperature higher than room temperature was preset, it was made to adjust the temperature of each gas mixing part and each line so that it might become the said set temperature, For example, the sensor evaluation system 1 includes a room temperature measurement unit, and adjusts the temperature of each gas mixing unit and each line so that the temperature is higher than the room temperature measured by the room temperature measurement unit. You may do it.

  In the embodiment and the first modification, the dilution gas is not limited to the standard air, and any gas that can dilute the standard gas is used. For example, the dilution gas is included in the standard gas such as standard air. A gas that does not contain a specific substance (for example, formaldehyde when the standard gas is formaldehyde gas) is preferable.

  Moreover, in the said embodiment and the modification 1, the number of the gas mixing parts with which the gas production | generation part 10 is provided is not restricted to four, but if it is plurality, it is arbitrary. In other words, “N” is not limited to “N = 4”, and may be any integer that satisfies “2 ≦ N”.

  Moreover, in the said embodiment and the modification 1, although 1 type of gas was selected from the gas produced | generated by each gas mixing part, and it supplied to the gas sensor S by the gas supply line L3, it is restricted to this. For example, an arbitrary A type (A is an integer satisfying A ≦ N) is selected from N types of gases generated by the N gas mixing units, and B (B is an arbitrary integer). A matrix type gas supply line L3 that supplies the gas sensor S in any combination may be configured.

  Moreover, in the said embodiment and the modification 1, the gas produced | generated by each gas mixing part was supplied to the gas sensor S, and the gas sensor S was evaluated, but it is not restricted to this, For example, 18th flow The standard gas may be supplied to the gas sensor S via the meter F18, and the gas generated by each gas mixing unit may be supplied to the gas sensor S to evaluate the gas sensor S.

It is a figure which shows typically the structure of the sensor evaluation system of one Embodiment to which this invention is applied. It is a figure which shows typically the structure of the gas production | generation part with which the sensor evaluation system of one Embodiment to which this invention is applied is provided. It is a block diagram which shows the functional structure of the sensor evaluation system of one Embodiment to which this invention is applied. It is a flowchart for demonstrating the process regarding evaluation of the gas sensor by the sensor evaluation system of one Embodiment to which this invention is applied. It is a figure which shows the comparison result of the measured value of the density | concentration of the gas produced | generated by each gas mixing part, and a theoretical value. It is a figure which shows the comparison result of the measured value of the density | concentration of the gas produced | generated by each gas mixing part, and a theoretical value. It is a figure which shows the comparison result of the measured value of the density | concentration of the gas produced | generated by each gas mixing part, and a theoretical value. It is a figure which shows the comparison result of the measured value of the density | concentration of the gas produced | generated by each gas mixing part, and a theoretical value. It is a flowchart for demonstrating the process regarding the evaluation of the gas sensor by the sensor evaluation system of the modification 1.

Explanation of symbols

1 Sensor Evaluation System 10 Gas Generator (Gas Generator)
11 1st gas mixing part 12 2nd gas mixing part 13 3rd gas mixing part 14 4th gas mixing part 16 Gas concentration measuring part (gas concentration measuring means)
17 Gas concentration adjusting unit (gas concentration adjusting means)
18 Switching part (switching means)
31 1st MFC (gas concentration adjusting means)
32 2nd MFC (Gas concentration adjusting means)
32c Humidifier (sensor humidity adjusting means)
36 Sensor temperature adjustment unit (sensor temperature adjustment means)
38 Sensor humidity adjuster (sensor humidity adjuster)
39 Mixing unit temperature adjusting unit (mixing unit temperature adjusting means)
40 Line temperature adjustment unit (Line temperature adjustment means)
41 Supply gas flow rate adjuster (Supply gas flow rate adjusting means)
51 CPU (gas generating device (gas concentration adjustment control means), sensor temperature adjustment control means, sensor humidity adjustment control means, mixing unit temperature adjustment control means, line temperature adjustment control means, supply gas flow rate adjustment control means)
531 Sensor temperature adjustment control program (sensor temperature adjustment control means)
532 Sensor humidity adjustment control program (sensor humidity adjustment control means)
533 Mixing part temperature adjustment control program (mixing part temperature adjustment control means)
534 Line temperature adjustment control program (line temperature adjustment control means)
535 Gas concentration adjustment control program (gas generation device (gas concentration adjustment control means))
536 Switching control program (gas generator)
537 Supply gas flow rate adjustment control program (Supply gas flow rate adjustment control means)
F1 first flow meter (gas concentration adjusting means)
F2 Second flow meter (gas concentration adjusting means)
F3 Third flow meter (gas concentration adjusting means)
F4 4th flow meter (gas concentration adjusting means)
F5 Fifth flow meter (gas concentration adjusting means)
F6 6th flow meter (gas concentration adjusting means)
F7 7th flow meter (gas concentration adjusting means)
F8 8th flow meter (gas concentration adjusting means)
F9 9th flow meter (gas concentration adjusting means)
F10 10th flow meter (gas concentration adjusting means)
F11 Eleventh flow meter (gas concentration adjusting means)
F20 20th open / close valve (sensor humidity adjusting means)
F21 21st open / close valve (sensor humidity adjusting means)
F22 23rd flow meter (sensor humidity adjusting means)
F23 23rd flow meter (supply gas flow rate adjusting means)
F24 24th flow meter (supply gas flow rate adjusting means)
F25 25th flow meter (supply gas flow rate adjusting means)
F26 26th flow meter (supply gas flow rate adjusting means)
F27 27th flow meter (supply gas flow rate adjusting means)
L1 Standard gas line L2 Gas line for dilution L3 Gas supply line S Gas sensor Vb1 First switching valve (switching means)
Vb2 second switching valve (switching means)
Vb3 third switching valve (switching means)
Vb4 4th switching valve (switching means)

Claims (10)

N gas mixing sections connected in series with each other (N is any one integer satisfying 2 ≦ N),
The first gas mixing unit among the N gas mixing units includes a standard gas line for introducing a standard gas into the gas mixing unit and a dilution gas line for introducing a dilution gas into the gas mixing unit. And a gas supply line for supplying the gas generated by the gas mixing unit to the outside, a standard gas introduced from the standard gas line, and a dilution gas introduced from the dilution gas line; , To generate a first low-concentration standard gas, and the generated first low-concentration standard gas is introduced into the second gas mixing unit and / or the gas supply line among the N gas mixing units. And
An M-th gas mixing unit (M is an integer satisfying 2 ≦ M ≦ N) among the N gas mixing units is connected to the dilution gas line and the gas supply line, and the N gas mixing units The M-1 low concentration standard gas introduced from the M-1 gas mixing portion of the gas mixing portion and the dilution gas introduced from the dilution gas line are mixed to obtain the M low concentration. A gas generating apparatus characterized by generating a standard gas and introducing the generated Mth low-concentration standard gas into the M + 1th gas mixing section and / or the gas supply line of the N gas mixing sections. . The gas generator according to claim 1,
Gas concentration measuring means for measuring the concentration of the gas generated by each gas mixing section of the first to Nth gas mixing sections;
The flow rate of the standard gas introduced from the standard gas line, the flow rate of the dilution gas introduced from the dilution gas line, and the flow rate of the M-1 low concentration standard gas introduced from the M-1 gas mixing unit. Gas concentration adjusting means for adjusting the concentration of the gas generated by each gas mixing unit by adjusting at least one of
Based on the gas concentration measured by the gas concentration measuring unit, the gas concentration adjusting unit generates the gas concentration by the gas mixing unit so that the gas concentration generated by the gas mixing unit becomes a predetermined concentration. Gas concentration adjustment control means for adjusting the concentration of the gas to be respectively adjusted;
A gas generating apparatus comprising: In the gas generating device according to claim 1 or 2,
A gas generation apparatus comprising: a switching unit configured to switch a gas supplied from the gas supply line to any one of first to Nth low concentration standard gases. In a sensor evaluation system for evaluating a gas sensor,
Comprising the gas generating device according to any one of claims 1 to 3,
The said gas supply line supplies the gas produced | generated by the said gas mixing part to the said gas sensor, The sensor evaluation system characterized by the above-mentioned. The sensor evaluation system according to claim 4,
Sensor temperature adjusting means for adjusting the temperature of the gas sensor;
Sensor temperature adjustment control means for causing the sensor temperature adjustment means to adjust the temperature of the gas sensor so that the temperature of the gas sensor becomes a predetermined temperature;
A sensor evaluation system comprising: In the sensor evaluation system according to claim 4 or 5,
Sensor humidity adjusting means for adjusting the humidity of the gas sensor by humidifying the dilution gas;
Sensor humidity adjustment control means for causing the sensor humidity adjustment means to adjust the humidity of the gas sensor so that the humidity of the gas sensor becomes a predetermined humidity;
A sensor evaluation system comprising: The sensor evaluation system according to claim 6,
Mixing section temperature adjusting means for adjusting the temperature of each of the gas mixing sections;
Mixing unit temperature adjustment control means for adjusting the temperature of each gas mixing unit to the mixing unit temperature adjusting unit so that the temperature of each gas mixing unit is higher than room temperature;
Line temperature adjusting means for adjusting the temperature of each of the standard gas line, the dilution gas line, and the gas supply line;
Line temperature adjustment control means for causing the line temperature adjustment means to adjust the temperature of each line so that the temperature of each line is higher than room temperature;
A sensor evaluation system comprising: In the sensor evaluation system according to any one of claims 4 to 7,
Supply gas flow rate adjusting means for adjusting the flow rate of the gas supplied by the gas supply line;
Supply gas flow rate adjustment control means for adjusting the flow rate of gas supplied from the gas supply line to the supply gas flow rate adjustment means so that the flow rate of gas supplied to the gas sensor becomes a predetermined flow rate;
A sensor evaluation system comprising: In the sensor evaluation system according to any one of claims 4 to 8,
The sensor evaluation system, wherein the gas supply line is branched into a plurality of portions so that the gas generated by the gas mixing unit can be supplied to the plurality of gas sensors at a time. In a sensor evaluation system for evaluating a gas sensor,
A gas generator according to claim 3;
Sensor temperature adjusting means for adjusting the temperature of the gas sensor;
Sensor temperature adjustment control means for causing the sensor temperature adjustment means to adjust the temperature of the gas sensor so that the temperature of the gas sensor becomes a predetermined temperature;
Sensor humidity adjusting means for adjusting the humidity of the gas sensor by humidifying the dilution gas;
Sensor humidity adjustment control means for causing the sensor humidity adjustment means to adjust the humidity of the gas sensor so that the humidity of the gas sensor becomes a predetermined humidity;
Mixing section temperature adjusting means for adjusting the temperature of each of the gas mixing sections;
Mixing unit temperature adjustment control means for adjusting the temperature of each gas mixing unit to the mixing unit temperature adjusting unit so that the temperature of each gas mixing unit is higher than room temperature;
Line temperature adjusting means for adjusting the temperature of each of the standard gas line, the dilution gas line, and the gas supply line;
Line temperature adjustment control means for causing the line temperature adjustment means to adjust the temperature of each line so that the temperature of each line is higher than room temperature;
Supply gas flow rate adjusting means for adjusting the flow rate of the gas supplied by the gas supply line;
Supply gas flow rate adjustment control means for adjusting the flow rate of gas supplied by the gas supply line to the supply gas flow rate adjustment means so that the flow rate of gas supplied by the gas supply line becomes a predetermined flow rate;
With
The gas supply line is branched into a plurality of gas sensors so that the gas generated by the gas mixing unit can be supplied to the plurality of gas sensors at once.
The supply gas flow rate adjusting means adjusts the flow rate of the gas supplied to each of the plurality of gas sensors,
The supply gas flow rate adjustment control means adjusts the flow rate of gas supplied to the supply gas adjustment means by the branched gas supply line so that the flow rate of gas supplied to each of the plurality of gas sensors becomes a predetermined flow rate. Sensor evaluation system characterized by adjusting each.

Images