JP2010087994A5 - - Google Patents

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Publication number
JP2010087994A5
JP2010087994A5 JP2008256747A JP2008256747A JP2010087994A5 JP 2010087994 A5 JP2010087994 A5 JP 2010087994A5 JP 2008256747 A JP2008256747 A JP 2008256747A JP 2008256747 A JP2008256747 A JP 2008256747A JP 2010087994 A5 JP2010087994 A5 JP 2010087994A5
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JP
Japan
Prior art keywords
condenser microphone
film
dielectric film
fixed electrode
predetermined potential
Prior art date
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Application number
JP2008256747A
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Japanese (ja)
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JP5055238B2 (en
JP2010087994A (en
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Publication date
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Priority to JP2008256747A priority Critical patent/JP5055238B2/en
Priority claimed from JP2008256747A external-priority patent/JP5055238B2/en
Publication of JP2010087994A publication Critical patent/JP2010087994A/en
Publication of JP2010087994A5 publication Critical patent/JP2010087994A5/ja
Application granted granted Critical
Publication of JP5055238B2 publication Critical patent/JP5055238B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Claims (2)

半導体基板からなる基台に周縁部が支持された振動膜と、前記振動膜上に形成された誘電体膜と、前記誘電体膜の上方に空間を介して配置された固定電極とを備える微小コンデンサマイクロホンの製造方法であって、
前記微小コンデンサマイクロホンを、放電電極と対向させて設置する工程と、
設置された微小コンデンサマイクロホンが備える前記固定電極と前記振動膜との間に所定の電位差を付与した状態で、当該固定電極と振動膜との間の誘電体膜に、前記放電電極のコロナ放電により発生したイオンを入射させ、当該イオンに基づく電荷を当該誘電体膜に固定するエレクトレット化を実施する工程と、
を有し、
前記微小コンデンサマイクロホンと前記放電電極との間に設置された、所定の電位が付与されるとともに抵抗体を介して接地電位に接続された導電性カバーの開口部を通じて、前記所定電位差が付与された固定電極と振動との間の誘電体膜へ前記イオンが入射することを特徴とする微小コンデンサマイクロホンの製造方法。
A microscopic film comprising: a vibration film having a peripheral edge supported by a base made of a semiconductor substrate; a dielectric film formed on the vibration film; and a fixed electrode disposed above the dielectric film via a space. A method of manufacturing a condenser microphone,
Installing the micro condenser microphone opposite to the discharge electrode;
In a state where a predetermined potential difference is applied between the fixed electrode and the vibrating membrane included in the installed micro condenser microphone, the dielectric film between the fixed electrode and the vibrating membrane is subjected to corona discharge of the discharge electrode. Performing the electretization in which the generated ions are incident and the charge based on the ions is fixed to the dielectric film;
Have
The predetermined potential difference is applied through an opening of a conductive cover that is installed between the micro condenser microphone and the discharge electrode and is connected to the ground potential through a resistor. A method of manufacturing a micro condenser microphone, wherein the ions are incident on a dielectric film between a fixed electrode and a vibrating film .
半導体基板からなる基台に周縁部が支持された振動膜と、前記振動膜上に形成された誘電体膜と、前記誘電体膜の上方に空間を介して配置された固定電極とを備える微小コンデンサマイクロホンのエレクトレット化するエレクトレット化装置であって、
前記微小コンデンサマイクロホンが設置されるステージと、
前記ステージと対向して配置された放電電極と、
前記ステージに設置された微小コンデンサマイクロホンが備える前記固定電極と前記振動との間に所定の電位差を付与する手段と、
前記ステージと前記放電電極との間に設置され、抵抗体を介して接地電位に接続された導電性カバーと、
前記導電性カバーに設けられた、前記放電電極のコロナ放電により発生し、前記所定電位差が付与された固定電極と振動との間の前記誘電体膜へ到達するイオンの経路となる開口部と、
前記導電性カバーに所定電位を付与する直流電源と、
を備えたことを特徴とするエレクトレット化装置。
A microscopic film comprising: a vibration film having a peripheral edge supported by a base made of a semiconductor substrate; a dielectric film formed on the vibration film; and a fixed electrode disposed above the dielectric film via a space. An electretizing device for electretizing a condenser microphone,
A stage on which the micro condenser microphone is installed;
A discharge electrode disposed opposite the stage;
Means for applying a predetermined potential difference between the fixed electrode and the vibrating membrane included in the micro condenser microphone installed on the stage;
A conductive cover installed between the stage and the discharge electrode and connected to a ground potential via a resistor;
An opening provided on the conductive cover and serving as a path for ions that are generated by corona discharge of the discharge electrode and reach the dielectric film between the fixed electrode to which the predetermined potential difference is applied and the vibration film ; ,
A DC power supply for applying a predetermined potential to the conductive cover;
An electretizing apparatus characterized by comprising:
JP2008256747A 2008-10-01 2008-10-01 Manufacturing method and electretization apparatus for micro condenser microphone Expired - Fee Related JP5055238B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008256747A JP5055238B2 (en) 2008-10-01 2008-10-01 Manufacturing method and electretization apparatus for micro condenser microphone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008256747A JP5055238B2 (en) 2008-10-01 2008-10-01 Manufacturing method and electretization apparatus for micro condenser microphone

Publications (3)

Publication Number Publication Date
JP2010087994A JP2010087994A (en) 2010-04-15
JP2010087994A5 true JP2010087994A5 (en) 2011-07-21
JP5055238B2 JP5055238B2 (en) 2012-10-24

Family

ID=42251460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008256747A Expired - Fee Related JP5055238B2 (en) 2008-10-01 2008-10-01 Manufacturing method and electretization apparatus for micro condenser microphone

Country Status (1)

Country Link
JP (1) JP5055238B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012085515A (en) * 2010-09-16 2012-04-26 Murata Mfg Co Ltd Charging device of electret, charging method of electret, and vibration power generating device
JP6515408B2 (en) * 2015-07-17 2019-05-22 新日本無線株式会社 MEMS element

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006132193A1 (en) * 2005-06-06 2006-12-14 Matsushita Electric Industrial Co., Ltd. Method of turning condenser microphone into electret, electret-turning device and method of producing condenser microphone using this

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