JP2010044143A5 - - Google Patents
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- Publication number
- JP2010044143A5 JP2010044143A5 JP2008206678A JP2008206678A JP2010044143A5 JP 2010044143 A5 JP2010044143 A5 JP 2010044143A5 JP 2008206678 A JP2008206678 A JP 2008206678A JP 2008206678 A JP2008206678 A JP 2008206678A JP 2010044143 A5 JP2010044143 A5 JP 2010044143A5
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- JP
- Japan
- Prior art keywords
- general formula
- carbon atoms
- different
- same
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000002253 acid Substances 0.000 claims description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 11
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 7
- 229920005989 resin Polymers 0.000 claims description 7
- 125000004849 alkoxymethyl group Chemical group 0.000 claims description 6
- 125000000962 organic group Chemical group 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 239000011342 resin composition Substances 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 230000000977 initiatory effect Effects 0.000 claims description 3
- -1 quinonediazide compound Chemical class 0.000 claims description 2
- 239000002904 solvent Substances 0.000 claims description 2
- 238000004132 cross linking Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000013035 low temperature curing Methods 0.000 description 3
- 0 Cc(cccc1)c1C(C#N)=C(C=CS1)C1=NOS(*)(=O)=O Chemical compound Cc(cccc1)c1C(C#N)=C(C=CS1)C1=NOS(*)(=O)=O 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000009849 deactivation Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008206678A JP5206214B2 (ja) | 2008-08-11 | 2008-08-11 | ポジ型感光性樹脂組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008206678A JP5206214B2 (ja) | 2008-08-11 | 2008-08-11 | ポジ型感光性樹脂組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010044143A JP2010044143A (ja) | 2010-02-25 |
| JP2010044143A5 true JP2010044143A5 (enrdf_load_stackoverflow) | 2011-09-22 |
| JP5206214B2 JP5206214B2 (ja) | 2013-06-12 |
Family
ID=42015590
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008206678A Active JP5206214B2 (ja) | 2008-08-11 | 2008-08-11 | ポジ型感光性樹脂組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5206214B2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102276783B1 (ko) * | 2013-06-26 | 2021-07-14 | 닛산 가가쿠 가부시키가이샤 | 치환된 가교성 화합물을 포함하는 레지스트 하층막 형성 조성물 |
| TWI627502B (zh) | 2014-09-04 | 2018-06-21 | Fujifilm Corp | 感光性樹脂組成物、硬化膜的製造方法、硬化膜、液晶顯示裝置、有機電激發光顯示裝置及觸控面板 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG78412A1 (en) * | 1999-03-31 | 2001-02-20 | Ciba Sc Holding Ag | Oxime derivatives and the use thereof as latent acids |
| JP2005077811A (ja) * | 2003-09-01 | 2005-03-24 | Fuji Photo Film Co Ltd | 感光性組成物及びそれを用いたパターン形成方法 |
| JP5211438B2 (ja) * | 2005-06-09 | 2013-06-12 | 東レ株式会社 | 樹脂組成物およびそれを用いた表示装置 |
| JP4935272B2 (ja) * | 2006-09-26 | 2012-05-23 | 東レ株式会社 | ポジ型感光性樹脂組成物 |
| JP5028059B2 (ja) * | 2006-09-28 | 2012-09-19 | 富士フイルム株式会社 | 感光性樹脂組成物、それを用いた硬化レリーフパターンの製造方法及び半導体装置 |
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2008
- 2008-08-11 JP JP2008206678A patent/JP5206214B2/ja active Active