JP2010032236A5 - - Google Patents

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Publication number
JP2010032236A5
JP2010032236A5 JP2008191814A JP2008191814A JP2010032236A5 JP 2010032236 A5 JP2010032236 A5 JP 2010032236A5 JP 2008191814 A JP2008191814 A JP 2008191814A JP 2008191814 A JP2008191814 A JP 2008191814A JP 2010032236 A5 JP2010032236 A5 JP 2010032236A5
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Japan
Prior art keywords
lens
order
evaluation method
zernike
zernike coefficient
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JP2008191814A
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English (en)
Japanese (ja)
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JP5608892B2 (ja
JP2010032236A (ja
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Publication of JP2010032236A5 publication Critical patent/JP2010032236A5/ja
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JP2008191814A 2008-07-25 2008-07-25 レンズ評価方法 Active JP5608892B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008191814A JP5608892B2 (ja) 2008-07-25 2008-07-25 レンズ評価方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008191814A JP5608892B2 (ja) 2008-07-25 2008-07-25 レンズ評価方法

Publications (3)

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JP2010032236A JP2010032236A (ja) 2010-02-12
JP2010032236A5 true JP2010032236A5 (https=) 2011-07-14
JP5608892B2 JP5608892B2 (ja) 2014-10-22

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9182289B2 (en) * 2011-10-14 2015-11-10 Canon Kabushiki Kaisha Apparatus and method for estimating wavefront parameters
CN103454069B (zh) * 2013-08-20 2016-04-13 浙江工业大学 X射线组合折射透镜聚焦性能测试装置
CN116539284B (zh) * 2023-07-06 2023-09-22 天津大学 针对彩绘文物照明光源的光源照明质量评价方法及装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG154324A1 (en) * 2001-04-18 2009-08-28 Bausch & Lomb Objective manifest refraction
JP2004061238A (ja) * 2002-07-26 2004-02-26 Nikon Corp 波面収差測定方法、波面収差測定装置、結像光学系の製造方法、及び露光装置の製造方法
AU2004291042B2 (en) * 2003-11-14 2010-10-14 Essilor International (Compagnie Generale D'optique) Ophthalmic binocular wafefront measurement system
JP5473920B2 (ja) * 2007-10-05 2014-04-16 エシロール アンテルナシオナル （コンパニー ジェネラル ドプティック） デザインの計算又は選択による眼科用メガネレンズの提供方法

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