JP2010017150A - Culture apparatus - Google Patents

Culture apparatus Download PDF

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JP2010017150A
JP2010017150A JP2008181903A JP2008181903A JP2010017150A JP 2010017150 A JP2010017150 A JP 2010017150A JP 2008181903 A JP2008181903 A JP 2008181903A JP 2008181903 A JP2008181903 A JP 2008181903A JP 2010017150 A JP2010017150 A JP 2010017150A
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inner box
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JP5469827B2 (en
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Yasuhiro Kikuchi
靖寛 菊地
Yuichi Tamaoki
裕一 玉置
Shinji Sugimoto
真司 杉本
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Sanyo Electric Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12M—APPARATUS FOR ENZYMOLOGY OR MICROBIOLOGY; APPARATUS FOR CULTURING MICROORGANISMS FOR PRODUCING BIOMASS, FOR GROWING CELLS OR FOR OBTAINING FERMENTATION OR METABOLIC PRODUCTS, i.e. BIOREACTORS OR FERMENTERS
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    • C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12M—APPARATUS FOR ENZYMOLOGY OR MICROBIOLOGY; APPARATUS FOR CULTURING MICROORGANISMS FOR PRODUCING BIOMASS, FOR GROWING CELLS OR FOR OBTAINING FERMENTATION OR METABOLIC PRODUCTS, i.e. BIOREACTORS OR FERMENTERS
    • C12M41/00—Means for regulation, monitoring, measurement or control, e.g. flow regulation
    • C12M41/30—Means for regulation, monitoring, measurement or control, e.g. flow regulation of concentration
    • C12M41/34—Means for regulation, monitoring, measurement or control, e.g. flow regulation of concentration of gas

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Abstract

<P>PROBLEM TO BE SOLVED: To detect concentration of a gas in a culture chamber without using a suction apparatus. <P>SOLUTION: A culture apparatus comprises an inner box forming the culture chamber for culturing a culture product; an outer box covering the inner box; a fan disposed in the inner box, and circulating the gas in the culture chamber through a wind passage installed in the inner box in the culture chamber; a first through-hole passing through a wall composing a part of the wind passage in the inner box; a second through-hole passing through the wall, and disposed at a position where the flow velocity of the gas circulated in the window passage with the fan is lower than the flow velocity of the gas around the first through-hole; a connecting tube connecting the first and the second through-holes on the exterior of the inner box so that the gas in the culture chamber can be made to flow; and a sensor for detecting the concentration of the gas flowing through the connecting tube. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、培養装置に関する。   The present invention relates to a culture apparatus.

培養装置では、培養室内の温度や二酸化炭素（ＣＯ2）や酸素（Ｏ2）等のガス濃度を一定に維持し、培養室内部を無菌状態にして細胞や微生物等の培養物を培養することが行われる。このような培養装置では、培養室内のガス濃度をセンサで検出し、ガス濃度が一定に維持されるよう、培養室内へのガスの供給が制御される。一般的に、培養室内のガス濃度を検出する際には、培養室内の空気を主体とする雰囲気ガス（以下、単にガスと言う。）を培養装置の外部に繋がる配管に吸引し、吸引されたガスの濃度をセンサで検出した上で培養室内に戻すことが行われる。そして、ガスを培養室内から配管に吸引し、再度培養室に戻すために、ポンプやファン等の吸引装置が用いられている（例えば、特許文献１）。
特開２００７−２５９７１５号公報 In the culture apparatus, the temperature in the culture chamber and the concentration of gas such as carbon dioxide (CO 2 ) and oxygen (O 2 ) are maintained constant, and the culture chamber is sterilized to culture cultures such as cells and microorganisms. Is done. In such a culture apparatus, the gas concentration in the culture chamber is detected by a sensor, and the gas supply into the culture chamber is controlled so that the gas concentration is kept constant. In general, when detecting the gas concentration in the culture chamber, an atmospheric gas mainly composed of air in the culture chamber (hereinafter simply referred to as gas) is sucked into a pipe connected to the outside of the culture apparatus and sucked. The gas concentration is detected by a sensor and then returned to the culture chamber. A suction device such as a pump or a fan is used to suck the gas from the culture chamber into the pipe and return it to the culture chamber again (for example, Patent Document 1).
JP 2007-259715 A

このように、吸引装置を用いることにより、培養室内のガスを強制的に配管に導くことができるとともに、配管内におけるガスの流速をセンサでの検出に適した速度に制御することができる。しかしながら、吸引装置が必要となる分、コストや消費電力が上昇するとともに、吸引装置が故障した場合にはガス濃度を正確に検出できず、培養室内のガス濃度を一定に維持することが難しくなってしまう。
本発明は上記課題を鑑みてなされたものであり、吸引装置を用いることなく培養室内のガスの濃度を検出することを目的とする。 As described above, by using the suction device, the gas in the culture chamber can be forcibly guided to the pipe, and the flow rate of the gas in the pipe can be controlled to a speed suitable for detection by the sensor. However, as the suction device is required, the cost and power consumption increase, and if the suction device fails, the gas concentration cannot be detected accurately, making it difficult to maintain a constant gas concentration in the culture chamber. End up.
This invention is made | formed in view of the said subject, and it aims at detecting the density | concentration of the gas in a culture chamber, without using a suction device.

上記目的を達成するため、本発明の一つの側面に係る培養装置は、培養物を培養するための培養室を形成する内箱と、前記内箱を覆う外箱と、前記内箱内に配設され、前記培養室内で前記内箱内に設けられた風路を介して前記培養室内のガスを循環させるファンと、
前記内箱内の前記風路の一部を構成する壁を貫通する第１の貫通穴と、前記壁を貫通し、前記ファンにより前記風路内を循環される前記ガスの流速が前記第１の貫通穴の周囲における前記ガスの流速よりも遅い位置に配設された第２の貫通穴と、前記培養室内の前記ガスを流通可能に、前記第１及び前記第２の貫通穴を前記内箱の外部において接続する接続管と、前記接続管を流れる前記ガスの濃度を検出するセンサと、を備える。 In order to achieve the above object, a culture apparatus according to one aspect of the present invention includes an inner box forming a culture chamber for culturing a culture, an outer box covering the inner box, and an inner box. A fan configured to circulate the gas in the culture chamber through an air passage provided in the inner box in the culture chamber;
A first through hole that penetrates a wall that constitutes a part of the air passage in the inner box, and a flow rate of the gas that passes through the wall and is circulated in the air passage by the fan. A second through hole disposed at a position slower than the flow velocity of the gas around the through hole, and the first and second through holes to allow the gas in the culture chamber to flow. A connecting pipe connected outside the box; and a sensor for detecting a concentration of the gas flowing through the connecting pipe.

吸引装置を用いることなく培養室内のガスの濃度を検出することができる。   The gas concentration in the culture chamber can be detected without using a suction device.

図１は、本発明の一実施形態である培養装置を側面から見た断面図である。培養装置１０は、外箱１２及び内箱１４を備えている。外箱１２の内側には断熱材１６が設けられており、さらに内側に空間１８を介して内箱１４が設けられている。内箱１４の前面には、内箱１４の開口部を開閉自在に閉塞する透明の内扉２０が設けられ、さらに外側に外扉２２が設けられ、外扉２２の内側には断熱材２４が設けられている。   FIG. 1 is a cross-sectional view of a culture apparatus according to an embodiment of the present invention as viewed from the side. The culture apparatus 10 includes an outer box 12 and an inner box 14. A heat insulating material 16 is provided on the inner side of the outer box 12, and an inner box 14 is provided on the inner side through a space 18. A transparent inner door 20 is provided on the front surface of the inner box 14 so as to freely open and close the opening of the inner box 14, an outer door 22 is provided on the outer side, and a heat insulating material 24 is provided inside the outer door 22. Is provided.

そして、内扉２０によって密閉される内箱１４内の空間が培養室２６となっている。培養室２６内には多数の通風穴を有する棚２８が設けられており、外扉２２及び内扉２０が開けられた状態で、培養物の入った容器が棚２８に載置される。そして、棚２８に載置された培養物は、外扉２２及び内扉２０が閉じられた状態で、培養室２６内で培養されることになる。なお、培養中、外扉２２のみを開き、内扉２０は閉じたままの状態で、培養室２６内を観察することができる。   A space in the inner box 14 sealed by the inner door 20 is a culture chamber 26. A shelf 28 having a large number of ventilation holes is provided in the culture chamber 26, and the container containing the culture is placed on the shelf 28 with the outer door 22 and the inner door 20 being opened. Then, the culture placed on the shelf 28 is cultured in the culture chamber 26 with the outer door 22 and the inner door 20 being closed. During culture, only the outer door 22 is opened, and the inside of the culture chamber 26 can be observed with the inner door 20 kept closed.

内箱１４内の背面３０には、培養室２６内のガスを循環させるためのファン（シロッコファン）３２が設けられている。そして、ファン３２を駆動するためのモータ３３が空間１８内に設けられている。また、培養室２６内において、ファン３２及び背面３０の一部を覆うように壁板３４が設けられている。壁板３４には、ファン３２を覆う箇所の近傍に吸入口３６が設けられており、吸入口３６から吸入されたガスが流れるダクト３８（風路）が形成されている。つまり、培養室２６内のガスは、ファン３２の回転によって背面３０の上方の吸入口３６から吸い込まれ、ダクト３８内を上方から下方に流れて背面３０の下方から培養室２６に戻される。ダクト３８の下部から排出されたガスは、内箱１４の底面４０から天面４２に向かって棚２８の通風穴を通って流れ、再び吸入口３６から吸い込まれる。これにより、培養室２６内のガスが循環することになる。   A fan (sirocco fan) 32 for circulating the gas in the culture chamber 26 is provided on the back surface 30 in the inner box 14. A motor 33 for driving the fan 32 is provided in the space 18. Further, a wall plate 34 is provided in the culture chamber 26 so as to cover a part of the fan 32 and the back surface 30. The wall plate 34 is provided with a suction port 36 in the vicinity of a portion covering the fan 32, and a duct 38 (air passage) through which the gas sucked from the suction port 36 flows is formed. That is, the gas in the culture chamber 26 is sucked from the suction port 36 above the back surface 30 by the rotation of the fan 32, flows in the duct 38 from below to return to the culture chamber 26 from below the back surface 30. The gas discharged from the lower portion of the duct 38 flows from the bottom surface 40 of the inner box 14 toward the top surface 42 through the ventilation hole of the shelf 28 and is sucked from the suction port 36 again. Thereby, the gas in the culture chamber 26 circulates.

外箱１２の背面４４から内箱１４内のダクト３８まで貫通し、培養室２６にＣＯ2ガスを供給するための噴射口４８が設けられている。さらに、外箱１２の背面４４から内箱１４内のダクト３８まで貫通するように温度センサ５０が設けられている。この温度センサ５０によって培養室２６内の温度が検出され、培養室２６内が培養に適した温度となるよう、培養室２６内を加熱するヒータの制御が行われる。 An injection port 48 is provided for penetrating from the back surface 44 of the outer box 12 to the duct 38 in the inner box 14 and for supplying CO 2 gas to the culture chamber 26. Further, a temperature sensor 50 is provided so as to penetrate from the back surface 44 of the outer box 12 to the duct 38 in the inner box 14. The temperature in the culture chamber 26 is detected by the temperature sensor 50, and the heater that heats the culture chamber 26 is controlled so that the temperature in the culture chamber 26 is suitable for culture.

内箱１４の背面３０における壁板３４で覆われた領域に、内箱１４の背面３０から外箱１２の背面４４まで貫通する貫通穴５２（第１の貫通穴）及び貫通穴５４（第２の貫通穴）が設けられている。貫通穴５２，５４には、外箱１２の背面４４側から、可撓性を有するチューブ５６（接続管）が、チューブ５６の外周が貫通穴５２，５４の内周に密着するように挿入されている。すなわち、培養室２６内のガスがチューブ５６内を流通可能な状態となっている。そして、チューブ５６の外箱１２の外部に突出した箇所には、チューブ５６内を流れるＣＯ2ガスの濃度を検出する濃度センサ５８が設けられている。濃度センサ５８は、例えば赤外線式を用いることができる。赤外線式の場合、セラミックヒータを加熱することにより、ＣＯ2ガスに吸収される４．３μｍ付近の赤外線を発生させてチューブ５６を流れるガスに照射し、ガスを通過した赤外線の光量を受光素子で検出することにより、ＣＯ2ガスの濃度を測定することができる。なお、濃度センサ５８として、熱伝導式等、赤外線式以外の方式のものを用いることも可能である。 A through hole 52 (a first through hole) and a through hole 54 (a second through hole) penetrating from the back surface 30 of the inner box 14 to the back surface 44 of the outer box 12 in the region covered with the wall plate 34 on the back surface 30 of the inner box 14. Through-holes). A flexible tube 56 (connection pipe) is inserted into the through holes 52 and 54 from the back surface 44 side of the outer box 12 so that the outer periphery of the tube 56 is in close contact with the inner periphery of the through holes 52 and 54. ing. That is, the gas in the culture chamber 26 can be circulated through the tube 56. A concentration sensor 58 that detects the concentration of the CO 2 gas flowing through the tube 56 is provided at a portion of the tube 56 that protrudes outside the outer box 12. The density sensor 58 can use, for example, an infrared type. In the case of the infrared type, by heating a ceramic heater, an infrared ray around 4.3 μm absorbed by the CO 2 gas is generated and irradiated to the gas flowing through the tube 56, and the amount of the infrared ray that has passed through the gas is received by the light receiving element. By detecting, the concentration of CO 2 gas can be measured. As the concentration sensor 58, it is also possible to use a method other than the infrared type, such as a heat conduction type.

また、チューブ５６の外箱１２の外部に突出した部分は、ヒータ６０（加熱装置）によって覆われた閉空間６１に存している。培養室２６内は、例えば、温度は３７℃程度、湿度は９５％程度に維持されるが、閉空間６１の温度がそれより低いと、チューブ５６内が結露してしまうおそれがある。そのため、チューブ５６の外箱１２の外部に突出した部分が存する閉空間６１の内部が、ヒータ６０によって例えば４５℃程度に加熱・維持される。また、閉空間６１の内部の温度を一定とすることにより、濃度センサ５８の感度を一定にする効果もある。   Further, a portion of the tube 56 that protrudes to the outside of the outer box 12 exists in a closed space 61 that is covered with a heater 60 (heating device). In the culture chamber 26, for example, the temperature is maintained at about 37 ° C. and the humidity is about 95%. However, if the temperature of the closed space 61 is lower than that, the inside of the tube 56 may be condensed. Therefore, the inside of the closed space 61 where the portion protruding outside the outer box 12 of the tube 56 exists is heated and maintained by the heater 60 at about 45 ° C. Further, by making the temperature inside the closed space 61 constant, there is also an effect of making the sensitivity of the density sensor 58 constant.

その他、培養装置１０には、培養室２６内の湿度を検出するセンサが設けられており、内箱の底面４０に載置される水皿の加熱を制御することにより、培養室２６内の湿度が一定に維持される。   In addition, the culture apparatus 10 is provided with a sensor for detecting the humidity in the culture chamber 26, and the humidity in the culture chamber 26 is controlled by controlling the heating of the water dish placed on the bottom surface 40 of the inner box. Is kept constant.

図２は、培養装置１０の外箱１２の背面４４の一部を示す図である。外箱１２の背面４４には、貫通穴５２，５４に挿入されたチューブ５６が突出している。濃度センサ５８は、チューブ５６内のＣＯ2濃度を検出可能に配設されている。なお、貫通穴５２，５４の間を接続するチューブ５６は、濃度センサ５８内を貫通する１本のチューブとすることもできるし、貫通穴５２と濃度センサ５８とを繋ぐチューブと貫通穴５４と濃度センサ５８とを繋ぐチューブの２本により構成することもできる。ＣＯ2ガスが充填されたガスボンベは、配管６４の接続口６６に接続される。配管６４は培養室２６の噴射口４８と接続されており、接続口６６に供給されるＣＯ2ガスは、フィルタ６８、バルブ７０を介して培養室２６へと供給される。制御装置７２は、培養装置１０の温度やガス濃度の制御を行うものであり、マイコン等を含んで構成されている。例えば、制御装置７２は、濃度センサ５８の検出結果に基づいてバルブ７０の開閉を制御することにより、培養室２６内へのＣＯ2ガスの供給量を調整する。 FIG. 2 is a diagram showing a part of the back surface 44 of the outer box 12 of the culture apparatus 10. A tube 56 inserted into the through holes 52 and 54 protrudes from the back surface 44 of the outer box 12. The concentration sensor 58 is disposed so as to be able to detect the CO 2 concentration in the tube 56. The tube 56 connecting between the through holes 52 and 54 can be a single tube that penetrates through the concentration sensor 58, or the tube connecting the through hole 52 and the concentration sensor 58 to the through hole 54. It can also be configured by two tubes connecting the concentration sensor 58. The gas cylinder filled with CO 2 gas is connected to the connection port 66 of the pipe 64. The pipe 64 is connected to the injection port 48 of the culture chamber 26, and the CO 2 gas supplied to the connection port 66 is supplied to the culture chamber 26 via the filter 68 and the valve 70. The control device 72 controls the temperature and gas concentration of the culture device 10 and includes a microcomputer and the like. For example, the control device 72 adjusts the supply amount of CO 2 gas into the culture chamber 26 by controlling the opening and closing of the valve 70 based on the detection result of the concentration sensor 58.

図３は、培養装置１０の外扉２２及び内扉２０を開いた状態の正面図である。前述したように、ファン３２が回転すると、壁板３４に設けられた吸入口３６から培養室２６内のガスが吸入される。そして、吸入されたガスは、ファン３２の外周全周から吐出されるが、壁板３４で上方及び左右側方が囲われているため、結果、ダクト３８内のガスをかきまぜながらダクト３８内を上方から下方に向かって流れ、ダクト３８の下部から培養室２６内に排出され、循環する。ここで、貫通穴５４は、ダクト３８内のガスの流通方向において、貫通穴５２よりも下流に設けられている。ダクト３８内を流れるガスの流速は、ファン３２から離れるに連れて低下していくため、貫通穴５２近傍の流速の方が貫通穴５４近傍の流速よりもやや速い状態となる。ガスの気圧は流速が速くなるに連れて低くなるため、貫通穴５２近傍の方が貫通穴５４の近傍よりも気圧が低くなる。この気圧差により、貫通穴５４近傍のガスが、チューブ５６を介して貫通穴５２の方向へと流れる。つまり、培養装置１０では、ポンプ等の吸引装置を用いることなく培養室２６内のガスをチューブ５６に流通させ、ＣＯ2ガスの濃度を検出することができる。 FIG. 3 is a front view of the culture apparatus 10 with the outer door 22 and the inner door 20 opened. As described above, when the fan 32 rotates, the gas in the culture chamber 26 is sucked from the suction port 36 provided in the wall plate 34. The sucked gas is discharged from the entire outer periphery of the fan 32. However, since the upper and left and right sides are surrounded by the wall plate 34, as a result, the gas in the duct 38 is stirred and the inside of the duct 38 is stirred. It flows from the upper side to the lower side and is discharged from the lower part of the duct 38 into the culture chamber 26 and circulates. Here, the through hole 54 is provided downstream of the through hole 52 in the gas flow direction in the duct 38. Since the flow rate of the gas flowing in the duct 38 decreases as the distance from the fan 32 increases, the flow rate in the vicinity of the through hole 52 is slightly higher than the flow rate in the vicinity of the through hole 54. Since the gas pressure decreases as the flow rate increases, the pressure in the vicinity of the through hole 52 is lower than that in the vicinity of the through hole 54. Due to this pressure difference, the gas in the vicinity of the through hole 54 flows in the direction of the through hole 52 through the tube 56. That is, the culture apparatus 10 can detect the concentration of CO 2 gas by circulating the gas in the culture chamber 26 through the tube 56 without using a suction device such as a pump.

また、ダクト３８内において、噴射口４８は、貫通穴５２，５４よりも、ダクト３８内のガスの流通方向の上流に配設されている。また、噴射口４８は、ファン３２と貫通穴５２，５４とを結ぶ位置から背面３０に向かって左側にずれた位置に、背面３０に向かって左側にＣＯ2ガスを噴射するように配設されている。つまり、培養室２６内を循環するガスの流通方向とは異なる向きに、噴射口４８からＣＯ2ガスが噴射される。噴射口４８から噴射されたＣＯ2ガスは、ファン３２の気流によって吸入口３６から吸入されたガスと混ざりながらダクト３８内の上方から下方に流れ、培養室２６に供給される。そして、噴射口４８がファン３２に近い位置に配設されているため、噴射口４８から噴射されるＣＯ2ガスが攪拌されやすく、培養室２６内のＣＯ2ガスの濃度を調整する際の応答性を良くすることができる。また、噴射口４８からＣＯ2ガスが噴射される向きがダクト３８内のガスの流通方向とは異なっているため、噴射口４８から噴射された高濃度のＣＯ2ガスが貫通穴５２，５４の近傍に直接的に流れ込むことが抑制され、培養室２６内のＣＯ2ガスの濃度の検出精度を向上させることができる。 Further, in the duct 38, the injection port 48 is disposed upstream of the through holes 52 and 54 in the gas flow direction in the duct 38. Further, the injection port 48 is disposed so as to inject CO 2 gas to the left side toward the back surface 30 at a position shifted to the left side from the position connecting the fan 32 and the through holes 52 and 54 toward the back surface 30. ing. That is, CO 2 gas is injected from the injection port 48 in a direction different from the direction in which the gas circulating in the culture chamber 26 flows. The CO 2 gas injected from the injection port 48 flows downward from the inside of the duct 38 while being mixed with the gas sucked from the suction port 36 by the air flow of the fan 32 and is supplied to the culture chamber 26. Since the injection port 48 is disposed at a position closer to the fan 32, CO tends 2 gas is agitated ejected from the ejection nozzle 48, the response at the time of adjusting the concentration of CO 2 gas in the cultivation room 26 The sex can be improved. Further, since the direction in which the CO 2 gas is injected from the injection port 48 is different from the direction in which the gas in the duct 38 flows, the high concentration CO 2 gas injected from the injection port 48 passes through the through holes 52 and 54. The direct flow into the vicinity is suppressed, and the detection accuracy of the CO 2 gas concentration in the culture chamber 26 can be improved.

図４及び図５は、外扉２２及び内扉２０を開閉した場合のＣＯ2ガス濃度の推移の例を示す実験結果である。図４の実線で示されたグラフは、培養室２６内のＣＯ2ガス濃度が約５％に維持されている状態から、外扉２２及び内扉２０を３０秒間開けた後に閉めた場合のＣＯ2ガス濃度の推移を示している。また、図５の実線で示されたグラフは、外扉２２及び内扉２０の開放時間を６０秒としたものである。なお、図４及び図５の破線で示されたグラフは、貫通穴５２から培養室２６内のガスを吸引して貫通穴５４に戻すポンプを備える以外は培養装置１０と同一の構成とした場合における、ＣＯ2ガス濃度の推移を示している。 4 and 5 are experimental results showing an example of transition of the CO 2 gas concentration when the outer door 22 and the inner door 20 are opened and closed. The graph shown by the solid line in FIG. 4 shows the CO when the outer door 22 and the inner door 20 are closed for 30 seconds after the CO 2 gas concentration in the culture chamber 26 is maintained at about 5%. It shows a transition of 2 gas concentration. Moreover, the graph shown with the continuous line of FIG. 5 makes the open time of the outer door 22 and the inner door 20 60 seconds. The graphs shown by the broken lines in FIGS. 4 and 5 are the same as those of the culture apparatus 10 except that a pump that sucks the gas in the culture chamber 26 from the through hole 52 and returns it to the through hole 54 is provided. Shows the transition of the CO 2 gas concentration.

図４及び図５のグラフに示されるように、外扉２２及び内扉２０が開けられると、培養室２６内のＣＯ2ガス濃度が低下するので、外扉２２及び内扉２０が閉じられると、制御装置７２は、濃度センサ５８の検出値に基づいてバルブ７０を開閉制御し、培養室２６内のＣＯ2ガス濃度を約５％に復帰させる。これらのグラフからわかるように、外扉２２及び内扉２０が閉じられてからＣＯ2ガス濃度が約５％まで復帰する時間は、ポンプを備えない本実施形態の培養装置１０においても、ポンプを備える構成とほぼ同等となっている。この実験結果からも、培養装置１０はポンプ等の吸引装置を備えないものの、濃度センサ５８での検出に適した速度でチューブ５６内をガスが流れており、ＣＯ2ガス濃度を精度良く検出できていることがわかる。 As shown in the graphs of FIGS. 4 and 5, when the outer door 22 and the inner door 20 are opened, the CO 2 gas concentration in the culture chamber 26 decreases, so that the outer door 22 and the inner door 20 are closed. The control device 72 controls the opening and closing of the valve 70 based on the detection value of the concentration sensor 58 to return the CO 2 gas concentration in the culture chamber 26 to about 5%. As can be seen from these graphs, the time for the CO 2 gas concentration to return to about 5% after the outer door 22 and the inner door 20 are closed is also used in the culture apparatus 10 of this embodiment that does not include a pump. It is almost the same as the configuration provided. Even from this experimental result, although the culture apparatus 10 does not include a suction device such as a pump, the gas flows through the tube 56 at a speed suitable for detection by the concentration sensor 58, and the CO 2 gas concentration can be accurately detected. You can see that

なお、上記実施形態は本発明の理解を容易にするためのものであり、本発明を限定して解釈するためのものではない。本発明は、その趣旨を逸脱することなく、変更、改良され得ると共に、本発明にはその等価物も含まれる。   In addition, the said embodiment is for making an understanding of this invention easy, and is not for limiting and interpreting this invention. The present invention can be changed and improved without departing from the gist thereof, and the present invention includes equivalents thereof.

例えば、本実施形態では、ダクト３８が内箱１４の背面３０側に設けられているが、側面側に設けられても良い。また、ファン３２を内箱１４の天面４２に配設し、貫通穴５２，５４を内箱１４の背面３０または側面に設けることとしてもよい。さらに、貫通穴５２，５４を内箱１４の天面に設けても良い。また、培養装置１０では、貫通穴５２，５４が、ファン３２から見て同一直線上に配設されているが、流速が異なる位置であれば同一直線上でなくてもよい。さらに、貫通穴５２，５４が内箱１４における同一の面ではなく、異なる面に設けられてもよい。また、貫通穴５２，５４に接続されるチューブを、外箱１２の外部に突出させずに、外箱１２と内箱１４の間の空間１８内に配設することとしてもよい。また、培養室２６内のガスを循環させることが可能であり、貫通穴５２，５４の周囲の流速を異ならせることが可能であれば、壁板３４を設けない構成としてもよい。   For example, in this embodiment, the duct 38 is provided on the back surface 30 side of the inner box 14, but may be provided on the side surface side. Further, the fan 32 may be disposed on the top surface 42 of the inner box 14 and the through holes 52 and 54 may be provided on the back surface 30 or the side surface of the inner box 14. Further, the through holes 52 and 54 may be provided on the top surface of the inner box 14. Further, in the culture apparatus 10, the through holes 52 and 54 are arranged on the same straight line as viewed from the fan 32, but may not be on the same straight line as long as the flow rates are different. Furthermore, the through holes 52 and 54 may be provided on different surfaces instead of the same surface of the inner box 14. Further, the tubes connected to the through holes 52 and 54 may be disposed in the space 18 between the outer box 12 and the inner box 14 without protruding outside the outer box 12. Further, the wall plate 34 may be omitted if the gas in the culture chamber 26 can be circulated and the flow velocity around the through holes 52 and 54 can be varied.

本発明の一実施形態である培養装置の断面図である。It is sectional drawing of the culture apparatus which is one Embodiment of this invention. 培養装置の外箱の背面の一部を示す図である。It is a figure which shows a part of back surface of the outer case of a culture apparatus. 培養装置の外扉及び内扉を開いた状態の正面図である。It is a front view of the state which opened the outer door and the inner door of the culture apparatus. 外扉及び内扉を３０秒開けた場合のＣＯ2ガス濃度の推移の一例を示す実験結果である。The experimental results showing an example of changes in the CO 2 gas concentration in the case of opening the outer door and inner door 30 seconds. 外扉及び内扉を６０秒開けた場合のＣＯ2ガス濃度の推移の一例を示す実験結果である。The experimental results showing an example of changes in the CO 2 gas concentration in the case of opening the outer door and inner door 60 seconds.

符号の説明Explanation of symbols

１０ 培養装置
１２ 外箱
１４ 内箱
２６ 培養室
３２ ファン
３４ 壁板
３８ ダクト
５２，５４ 貫通穴
５６ チューブ
５８ 濃度センサ DESCRIPTION OF SYMBOLS 10 Culture apparatus 12 Outer box 14 Inner box 26 Culture chamber 32 Fan 34 Wall board 38 Duct 52,54 Through hole 56 Tube 58 Concentration sensor

Claims (5)

培養物を培養するための培養室を形成する内箱と、
前記内箱を覆う外箱と、
前記内箱内に配設され、前記培養室内で前記内箱内に設けられた風路を介して前記培養室内のガスを循環させるファンと、
前記内箱内の前記風路の一部を構成する壁を貫通する第１の貫通穴と、
前記壁を貫通し、前記ファンにより前記風路内を循環される前記ガスの流速が前記第１の貫通穴の周囲における前記ガスの流速よりも遅い位置に配設された第２の貫通穴と、
前記培養室内の前記ガスを流通可能に、前記第１及び前記第２の貫通穴を前記内箱の外部において接続する接続管と、
前記接続管を流れる前記ガスの濃度を検出するセンサと、
を備えることを特徴とする培養装置。 An inner box forming a culture chamber for culturing the culture,
An outer box covering the inner box;
A fan that is disposed in the inner box and circulates the gas in the culture chamber through an air passage provided in the inner box in the culture chamber;
A first through hole penetrating a wall constituting a part of the air passage in the inner box;
A second through hole disposed in a position where the flow rate of the gas passing through the wall and circulated in the air passage by the fan is slower than the flow rate of the gas around the first through hole; ,
A connecting pipe that connects the first and second through holes outside the inner box so that the gas in the culture chamber can be circulated;
A sensor for detecting the concentration of the gas flowing through the connecting pipe;
A culture apparatus comprising: 請求項１に記載の培養装置であって、
前記第１の貫通穴が前記培養室内の前記風路における前記ガスの流通方向の上流となり、前記第２の貫通穴が前記流通方向の下流となるように、前記内箱を構成する前記壁のうちの同一の壁に前記第１及び第２の貫通穴が形成されていること、
を特徴とする培養装置。 The culture apparatus according to claim 1,
The wall constituting the inner box such that the first through hole is upstream in the flow direction of the gas in the air passage in the culture chamber, and the second through hole is downstream in the flow direction. The first and second through holes are formed in the same wall,
A culture apparatus characterized by. 請求項２に記載の培養装置であって、
前記第１及び第２の貫通穴が形成されている前記壁面と対向し、前記ファンにより循環される前記ガスの前記風路を形成する壁板を更に含んで構成されること、
を特徴とする培養装置。 The culture apparatus according to claim 2,
A wall plate that is opposed to the wall surface in which the first and second through holes are formed and that forms the air passage of the gas circulated by the fan;
A culture apparatus characterized by. 請求項３に記載の培養装置であって、
前記風路内において前記第１の貫通穴より前記ガスの流通方向の上流に配設され、前記第１の貫通穴に対する前記ガスの前記流通方向とは異なる向きに、前記外箱の外部から供給される前記ガスを噴射する噴射口を更に含んで構成されること、
を特徴とする培養装置。 The culture apparatus according to claim 3, wherein
Provided from the outside of the outer box in a direction different from the flow direction of the gas with respect to the first through hole, disposed upstream of the first through hole in the air passage. And further comprising an injection port for injecting the gas.
A culture apparatus characterized by. 請求項１〜４の何れか一項に記載の培養装置であって、
前記接続管の前記内箱の外部に突出している部分を前記培養室内より高い温度に加熱する加熱装置を更に含んで構成されること、
を特徴とする培養装置。 The culture apparatus according to any one of claims 1 to 4,
Further comprising a heating device that heats the portion of the connecting pipe that protrudes outside the inner box to a temperature higher than that in the culture chamber;
A culture apparatus characterized by.
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