JP2009530638A5 - - Google Patents

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Publication number
JP2009530638A5
JP2009530638A5 JP2009501390A JP2009501390A JP2009530638A5 JP 2009530638 A5 JP2009530638 A5 JP 2009530638A5 JP 2009501390 A JP2009501390 A JP 2009501390A JP 2009501390 A JP2009501390 A JP 2009501390A JP 2009530638 A5 JP2009530638 A5 JP 2009530638A5
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JP
Japan
Prior art keywords
microfluidic device
opening
filling
recess
base substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009501390A
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English (en)
Japanese (ja)
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JP2009530638A (ja
JP5254202B2 (ja
Filing date
Publication date
Priority claimed from PCT/SG2006/000071 external-priority patent/WO2007108773A1/en
Application filed filed Critical
Publication of JP2009530638A publication Critical patent/JP2009530638A/ja
Publication of JP2009530638A5 publication Critical patent/JP2009530638A5/ja
Application granted granted Critical
Publication of JP5254202B2 publication Critical patent/JP5254202B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009501390A 2006-03-23 2007-03-23 粒子の状態を分析するマイクロ流体装置、その作製方法、および分析方法 Expired - Fee Related JP5254202B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SGPCT/SG2006/000071 2006-03-23
PCT/SG2006/000071 WO2007108773A1 (en) 2006-03-23 2006-03-23 Device for analyzing the status of a particle
PCT/SG2007/000080 WO2007108779A1 (en) 2006-03-23 2007-03-23 Microfluidic device for analyzing the status of a particle

Publications (3)

Publication Number Publication Date
JP2009530638A JP2009530638A (ja) 2009-08-27
JP2009530638A5 true JP2009530638A5 (enExample) 2010-05-13
JP5254202B2 JP5254202B2 (ja) 2013-08-07

Family

ID=38522731

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009501390A Expired - Fee Related JP5254202B2 (ja) 2006-03-23 2007-03-23 粒子の状態を分析するマイクロ流体装置、その作製方法、および分析方法

Country Status (5)

Country Link
US (1) US20100015008A1 (enExample)
EP (1) EP2008093A4 (enExample)
JP (1) JP5254202B2 (enExample)
AU (1) AU2007227782A1 (enExample)
WO (2) WO2007108773A1 (enExample)

Families Citing this family (12)

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US8454811B2 (en) * 2008-07-14 2013-06-04 Octrolix Bv Microfluidic system
EP2490013A1 (en) 2009-10-13 2012-08-22 Panasonic Corporation Measuring device
CN101905859B (zh) * 2010-04-16 2011-11-16 东南大学 正压热成型制备圆片级均匀尺寸玻璃微腔的方法
CN101817498B (zh) * 2010-04-16 2011-11-16 东南大学 低污染高成品率圆片级均匀尺寸玻璃微腔的制备方法
US8966960B2 (en) 2010-04-27 2015-03-03 Panasonic Intellectual Property Management Co., Ltd. Measuring device
WO2012043726A1 (ja) * 2010-09-30 2012-04-05 株式会社フジクラ 基体、及び基体の製造方法
WO2016154627A1 (en) * 2015-03-26 2016-09-29 Xagenic Inc. Ultrasensitive diagnostic device using electrocatalytic fluid displacement (efd) for visual readout
US9679897B1 (en) * 2016-04-04 2017-06-13 International Business Machines Corporation High density nanofluidic structure with precisely controlled nano-channel dimensions
US11213824B2 (en) 2017-03-29 2022-01-04 The Research Foundation For The State University Of New York Microfluidic device and methods
CN110254914B (zh) * 2019-07-23 2021-03-02 重庆医药高等专科学校 一种蛙电生理实验标本盒
CN110514461B (zh) * 2019-08-29 2021-10-08 上海华力微电子有限公司 一种化学机械研磨机台缺陷检测方法
AU2022297910A1 (en) * 2021-06-23 2024-01-18 Peter Maccallum Cancer Institute Conductometric sensor for detecting a nucleic acid and a method for the detection thereof

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2502621C3 (de) * 1975-01-23 1978-09-14 Kernforschungsanlage Juelich Gmbh, 5170 Juelich Messung elastischer und dielektrischer Eigenschaften der Membran lebender Zellen
EP0460106A4 (en) * 1989-02-21 1992-02-26 Lam Research Corporation Novel glass deposition viscoelastic flow process
SE470347B (sv) * 1990-05-10 1994-01-31 Pharmacia Lkb Biotech Mikrostruktur för vätskeflödessystem och förfarande för tillverkning av ett sådant system
JP3199398B2 (ja) * 1991-07-22 2001-08-20 オリンパス光学工業株式会社 生体組織分析装置
US5278103A (en) * 1993-02-26 1994-01-11 Lsi Logic Corporation Method for the controlled formation of voids in doped glass dielectric films
EP1178315A1 (de) * 2000-07-31 2002-02-06 Albrecht Dr.med. Priv.Doz. Lepple-Wienhues Verfahren und Vorrichtung zur Untersuchung von Zellen mit Hilfe der Patch Clamp-Methode
US7270730B2 (en) * 2000-08-04 2007-09-18 Essen Instruments, Inc. High-throughput electrophysiological measurement system
DE10130218A1 (de) * 2001-06-22 2003-01-09 Infineon Technologies Ag Vorrichtung für ein Patch-Clamping von Vesikeln und Verfahren zu deren Herstellung
DE10203686A1 (de) * 2002-01-31 2003-08-07 Bayer Ag Verfahren zur Durchführung von elektrischen Messungen an biologischen Membrankörpern
ATE419550T1 (de) * 2002-02-12 2009-01-15 Oc Oerlikon Balzers Ag Optisches bauteil mit submikrometer-hohlräumen
US20030180965A1 (en) * 2002-03-25 2003-09-25 Levent Yobas Micro-fluidic device and method of manufacturing and using the same
EP1495105B1 (en) * 2002-04-17 2007-02-21 Sophion Bioscience A/S Substrate and method for measuring the electrophysiological properties of cell membranes
US7214348B2 (en) * 2002-07-26 2007-05-08 Applera Corporation Microfluidic size-exclusion devices, systems, and methods
WO2004011149A1 (en) * 2002-07-26 2004-02-05 Applera Corporation Valve assembly for microfluidic devices, and method for opening and closing same
JP2004166693A (ja) * 2002-10-28 2004-06-17 Matsushita Electric Ind Co Ltd 細胞の固定化方法
US7309467B2 (en) * 2003-06-24 2007-12-18 Hewlett-Packard Development Company, L.P. Fluidic MEMS device
EP1547676A1 (en) * 2003-12-24 2005-06-29 Corning Incorporated Porous membrane microstructure devices and methods of manufacture
WO2005078083A1 (en) * 2004-02-04 2005-08-25 California Institute Of Technology Ultra-smooth microfabricated pores on a planar substrate for integrated patch-clamping
CA2510996C (en) * 2004-06-29 2012-02-07 Chantal Blanchetiere Waveguiding structures with embedded microchannels and method for fabrication thereof
US7223157B2 (en) * 2005-08-30 2007-05-29 United Microelectronics Corp. Chemical-mechanical polishing apparatus and method of conditioning polishing pad
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