JP2009527910A - Ｓｌｍ高さ誤差補正法 - Google Patents

Ｓｌｍ高さ誤差補正法 Download PDF

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Publication number
JP2009527910A
JP2009527910A JP2008555704A JP2008555704A JP2009527910A JP 2009527910 A JP2009527910 A JP 2009527910A JP 2008555704 A JP2008555704 A JP 2008555704A JP 2008555704 A JP2008555704 A JP 2008555704A JP 2009527910 A JP2009527910 A JP 2009527910A
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Japan
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JP2008555704A
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English (en)
Japanese (ja)
Inventor
サンドストレム、トルビョルン
デュール、ピーター
リュングブラッド、ウルリック
Original Assignee
マイクロニック レーザー システムズ アクチボラゲット
フラウンホーファー − ゲゼルシャフト ツル フェーデルング デル アンゲヴァントテン フォルシュング エー．ファォ．
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Application filed by マイクロニック レーザー システムズ アクチボラゲット, フラウンホーファー − ゲゼルシャフト ツル フェーデルング デル アンゲヴァントテン フォルシュング エー．ファォ． filed Critical マイクロニック レーザー システムズ アクチボラゲット
Publication of JP2009527910A publication Critical patent/JP2009527910A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)
JP2008555704A 2006-02-22 2007-02-22 Ｓｌｍ高さ誤差補正法 Pending JP2009527910A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP06003560A EP1826614A1 (fr) 2006-02-22 2006-02-22 Méthode de compensation de hauteur pour un modulateur spatial de lumière
PCT/EP2007/001553 WO2007096175A1 (fr) 2006-02-22 2007-02-22 Procede de compensation d'erreur de hauteur de modulateur spatial de lumiere

Publications (1)

Publication Number Publication Date
JP2009527910A true JP2009527910A (ja) 2009-07-30

Family

ID=37087759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008555704A Pending JP2009527910A (ja) 2006-02-22 2007-02-22 Ｓｌｍ高さ誤差補正法

Country Status (4)

Country Link
EP (1) EP1826614A1 (fr)
JP (1) JP2009527910A (fr)
KR (1) KR20090065477A (fr)
WO (1) WO2007096175A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023282213A1 (fr) * 2021-07-05 2023-01-12 株式会社ニコン Appareil d'exposition de motif, procédé d'exposition et procédé de fabrication de dispositif

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5172262A (en) * 1985-10-30 1992-12-15 Texas Instruments Incorporated Spatial light modulator and method
US6025951A (en) * 1996-11-27 2000-02-15 National Optics Institute Light modulating microdevice and method
US7019376B2 (en) * 2000-08-11 2006-03-28 Reflectivity, Inc Micromirror array device with a small pitch size
EP1517188A3 (fr) * 2003-09-22 2005-05-04 ASML Netherlands B.V. Appareil lithographique et méthode de fabrication d'un dispositif
TW200521477A (en) * 2003-09-25 2005-07-01 Matsushita Electric Ind Co Ltd Projector and projection method
US7189498B2 (en) * 2004-01-08 2007-03-13 Lsi Logic Corporation Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process
US6847461B1 (en) * 2004-01-29 2005-01-25 Asml Holding N.V. System and method for calibrating a spatial light modulator array using shearing interferometry

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023282213A1 (fr) * 2021-07-05 2023-01-12 株式会社ニコン Appareil d'exposition de motif, procédé d'exposition et procédé de fabrication de dispositif

Also Published As

Publication number Publication date
EP1826614A1 (fr) 2007-08-29
KR20090065477A (ko) 2009-06-22
WO2007096175A1 (fr) 2007-08-30

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