JP2009524811A5 - - Google Patents

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Publication number
JP2009524811A5
JP2009524811A5 JP2008551873A JP2008551873A JP2009524811A5 JP 2009524811 A5 JP2009524811 A5 JP 2009524811A5 JP 2008551873 A JP2008551873 A JP 2008551873A JP 2008551873 A JP2008551873 A JP 2008551873A JP 2009524811 A5 JP2009524811 A5 JP 2009524811A5
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JP
Japan
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layer
microelectrode
metal
line
alternating
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JP2008551873A
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English (en)
Japanese (ja)
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JP2009524811A (ja
JP5171646B2 (ja
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Priority claimed from GBGB0601703.2A external-priority patent/GB0601703D0/en
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Publication of JP2009524811A5 publication Critical patent/JP2009524811A5/ja
Application granted granted Critical
Publication of JP5171646B2 publication Critical patent/JP5171646B2/ja
Expired - Fee Related legal-status Critical Current
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JP2008551873A 2006-01-27 2007-01-25 交互くし型マイクロ電極および交互くし型マイクロ電極を製造するプロセス Expired - Fee Related JP5171646B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB0601703.2A GB0601703D0 (en) 2006-01-27 2006-01-27 Improvement To The Design And Construction Of Electrochemical Sensors
GB0601703.2 2006-01-27
PCT/GB2007/000259 WO2007085838A1 (en) 2006-01-27 2007-01-25 An interdigitated microelectrode and a process for producing the interdigitated microelectrode

Publications (3)

Publication Number Publication Date
JP2009524811A JP2009524811A (ja) 2009-07-02
JP2009524811A5 true JP2009524811A5 (https=) 2010-03-11
JP5171646B2 JP5171646B2 (ja) 2013-03-27

Family

ID=36061013

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008551873A Expired - Fee Related JP5171646B2 (ja) 2006-01-27 2007-01-25 交互くし型マイクロ電極および交互くし型マイクロ電極を製造するプロセス

Country Status (8)

Country Link
US (1) US8540858B2 (https=)
EP (1) EP1977226A1 (https=)
JP (1) JP5171646B2 (https=)
CN (1) CN101375155B (https=)
AU (1) AU2007209131B2 (https=)
CA (1) CA2637484A1 (https=)
GB (1) GB0601703D0 (https=)
WO (1) WO2007085838A1 (https=)

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DE102009020743A1 (de) 2009-05-11 2010-12-09 Heraeus Sensor Technology Gmbh Fotolithographisch strukturierter Dickschichtsensor
US20130099956A1 (en) * 2011-10-24 2013-04-25 Lsi Corporation Apparatus to reduce specific absorption rate
EP2769210B1 (en) 2011-11-22 2021-08-25 Siemens Healthcare Diagnostics Inc. Interdigitated array and method of manufacture
WO2014040650A1 (en) 2012-09-17 2014-03-20 Element Six Limited Diamond microelectrode
US9084561B2 (en) * 2013-06-17 2015-07-21 Google Inc. Symmetrically arranged sensor electrodes in an ophthalmic electrochemical sensor
CN103663342B (zh) * 2013-11-15 2016-03-02 上海交通大学 共布线微电极阵列芯片及其制备方法
CN103682224B (zh) * 2013-12-15 2017-12-29 北京自动测试技术研究所 一种柔性芯片、具有该柔性芯片的动力电池组及电动汽车
US20180328885A1 (en) * 2015-11-12 2018-11-15 Hach Company Combined and free chlorine measurement through electrochemical microsensors
CN105891292A (zh) * 2016-05-28 2016-08-24 惠州市力道电子材料有限公司 一种高导电型叉指电极、其制备方法和应用
JP6923657B2 (ja) * 2017-08-25 2021-08-25 京セラ株式会社 センサ基板およびそれを備えるセンサ装置

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JPS63168552A (ja) * 1986-12-31 1988-07-12 Horiba Ltd バイオセンサ−
US4900405A (en) * 1987-07-15 1990-02-13 Sri International Surface type microelectronic gas and vapor sensor
GB8817421D0 (en) 1988-07-21 1988-08-24 Medisense Inc Bioelectrochemical electrodes
JPH02140655A (ja) * 1988-11-21 1990-05-30 Nippon Telegr & Teleph Corp <Ntt> 電気化学的検出器およびその製造方法
JPH07505952A (ja) * 1992-04-22 1995-06-29 ザ　ダウ　ケミカル　カンパニー 重合体フィルムに基づく電気化学センサー装置
JP3289059B2 (ja) * 1992-05-11 2002-06-04 日本電信電話株式会社 電気化学検出方法および検出装置
DE4318519C2 (de) * 1993-06-03 1996-11-28 Fraunhofer Ges Forschung Elektrochemischer Sensor
GB9412820D0 (en) * 1994-06-25 1994-08-17 Siemens Plessey Controls Ltd Water quality measuring apparatus
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