JP2009290776A - Manufacturing method of planar antenna element, and planar antenna element - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a planar antenna element, capable of adjusting a resonance frequency comparatively little by little, without using a branch pattern and by using an element having a prescribed shape for a parallel resonance pattern. <P>SOLUTION: This manufacturing method of the planar antenna 100 is equipped with a process for forming an antenna pattern 110, and a process for forming parallel resonance patterns 121-124 having prescribed shapes and making a portion, located relatively on the inner peripheral side of the antenna pattern 110, which is capacitively couple to a portion located relatively outer peripheral side into layers different from the antenna pattern 110. The resonance frequency of the planar antenna element 100 is adjusted, by adjusting the relative disposition of the parallel resonance patterns 121-124, with respect to the antenna pattern 110. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a method for manufacturing a planar antenna element and a planar antenna element, and more particularly to a method for manufacturing an antenna element having a spiral planar antenna pattern and a planar antenna element manufactured by the manufacturing method.

  In recent years, electronic money using non-contact IC tags has become widespread (see Patent Document 1). Since such a non-contact IC tag is used by being built in a thin card or affixed to a casing of a cellular phone, a spiral planar antenna is used as an antenna element used for the non-contact IC tag. A planar antenna element having a pattern is used.

  As a method for manufacturing a planar antenna element, a method of printing a conductive ink on an insulating film, a method of etching a metal foil laminated on the insulating film, a method of thermally transferring a metal foil on the insulating film, etc. are mainly used. It is used. Among them, the method of thermally transferring a metal foil has a feature that it can be manufactured at a low cost because the design time is extremely short because a printer or the like can be used (see Patent Document 2).

  Currently, the frequency used for contactless IC tags is about 13.56 MHz, which is a relatively low frequency region. For this reason, if an attempt is made to realize resonance in this frequency band using only a spiral antenna pattern, the antenna pattern becomes very large and cannot be built in a card or a mobile phone. Therefore, some conventional planar antenna elements for non-contact IC tags can obtain a resonance frequency in the above frequency band with a relatively small antenna pattern by adding a capacitor to the antenna pattern.

Further, the non-contact type data receiving / transmitting body disclosed in Patent Document 3 is an example of such a planar antenna element. In this non-contact type data receiving / transmitting body, a plurality of parallel resonance patterns (referred to as “planar portions” in Patent Document 3) are installed on a spiral antenna pattern via an insulating member. The parallel resonance pattern and the antenna pattern constitute a capacitor.
Japanese Patent No. 3150575 JP 2007-324641 A JP 2004-153716 A

  By the way, it is preferable that the resonance frequency of the planar antenna element can be adjusted in the manufacturing process. In this regard, in the technique disclosed in Patent Document 3, each parallel resonance pattern and the spiral antenna pattern are connected by a branch pattern (referred to as “open end” in Patent Document 3). The resonance frequency can be adjusted by dividing the branch pattern as necessary. However, the branch pattern prevents the passage of magnetic field lines, and the shape of the antenna pattern also changes. There is a problem that the characteristics of the are deteriorated. In addition, the amount of adjustment is also rough.

  Accordingly, an object of the present invention is to provide a method for manufacturing a planar antenna element and a planar antenna element that can adjust the resonance frequency relatively little without using a branch pattern.

  In order to achieve the above object, a method for manufacturing a planar antenna element according to the present invention includes a step of forming an antenna pattern, and a portion positioned relatively on the inner periphery of the antenna pattern and positioned relatively on the outer periphery. Forming a parallel resonance pattern of a predetermined shape for capacitively coupling a portion to a layer different from the antenna pattern, and adjusting the relative arrangement of the parallel resonance pattern with respect to the antenna pattern The resonance frequency of the antenna element is adjusted.

  According to the present invention, since the resonance frequency of the planar antenna element can be adjusted by adjusting the relative arrangement of the parallel resonance pattern with respect to the antenna pattern, the parallel resonance pattern having a predetermined shape is used without using the branch pattern. Thus, the resonance frequency of the planar antenna element can be adjusted in a relatively small increment.

  The planar antenna element according to the first aspect of the present invention is a planar antenna element manufactured by the above manufacturing method, wherein the antenna pattern has a spiral portion, and the spiral portion is a first conductor. It includes a portion having a width and a portion having a second conductor width wider than the first conductor width. According to this, the resonance frequency of the planar antenna element can be adjusted relatively large and in small increments by adjusting the relative arrangement of the parallel resonance pattern with respect to the antenna pattern.

  The planar antenna element according to the second aspect of the present invention is a planar antenna element manufactured by the above manufacturing method, wherein the parallel resonance pattern includes a portion having a third conductor width, and the third antenna element. And a portion having a fourth conductor width wider than the conductor width. Also by this, the resonance frequency of the planar antenna element can be adjusted relatively large and small by adjusting the relative arrangement of the parallel resonance pattern with respect to the antenna pattern.

  The planar antenna element according to the third aspect of the present invention includes an antenna having a spiral portion including a portion having a first conductor width and a portion having a second conductor width wider than the first conductor width. And a parallel resonant pattern having a predetermined shape that is formed on a layer different from the antenna pattern and capacitively couples a portion located on the relatively inner circumference side and a portion located on the relatively outer circumference side of the spiral portion. It is characterized by including. According to this, it is possible to adjust the resonance frequency in a relatively large and small increment without using a branch pattern and using a parallel resonance pattern having a predetermined shape.

  In the planar antenna element, the spiral portion includes a first straight portion, a second straight portion adjacent to the first straight portion, and positioned relatively on the inner peripheral side from the first straight portion. A first straight portion including a straight portion and a third straight portion adjacent to the second straight portion and positioned on an inner peripheral side relative to the second straight portion; At least one of the above may have an enlarged portion that is the second conductor width sandwiched between the sections that are the first conductor width. Even in this case, the resonance frequency can be adjusted relatively large and in small increments.

  Further, in the planar antenna element, each of the first to third straight portions includes an enlarged portion that is the second conductor width sandwiched between sections that are the first conductor width, At least one of the length or the position of the enlarged portion may be different between any one of the first to third linear portions and the other. In this way, it is possible to adjust the resonance frequency relatively further and in small increments.

  According to the present invention, it is possible to adjust the resonance frequency of a planar antenna element relatively in steps without using a branch pattern.

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[First Embodiment]
FIG. 1 is a schematic plan view showing the structure of a planar antenna element 100 according to a preferred first embodiment of the present invention. 2 is a schematic cross-sectional view taken along the line AA ′ shown in FIG.

  As shown in FIGS. 1 and 2, the planar antenna element 100 according to the present embodiment is rectangular, and includes an insulating film 101 as a support, a planar antenna pattern 110 attached to the insulating film 101, and an antenna pattern 110. The parallel resonance patterns 121 to 124 and the lead wiring pattern 130 attached to the upper layer are provided. The planar antenna element 100 includes feeding terminals P1 and P2.

  Although not particularly limited, the planar antenna element 100 according to the present embodiment is used as an antenna element for a non-contact IC tag. In this case, as shown in FIG. 3, the two power supply terminals P1 and P2 are connected to the transmission / reception circuit 50, thereby configuring an antenna device. The transmission / reception circuit 50 is formed on a circuit board (not shown) separate from the planar antenna element 100.

  As shown in FIG. 2, an insulating adhesive layer 190 is provided on the bottom surface (surface on the insulating film 101 side) of the antenna pattern 110, the parallel resonance patterns 121 to 124, and the lead-out wiring pattern 130. Each pattern is affixed to the insulating film 101 or the underlying pattern by the adhesive layer 190. Such a pattern can be realized by forming by a thermal transfer method using a printer or the like, but it is preferable to use a conductor tape having a predetermined shape as a simpler method particularly for the parallel resonance patterns 121 to 124. That is, after the antenna pattern 110 and the lead-out wiring pattern 130 are formed, a conductor tape is affixed thereon to form parallel resonance patterns 121-124. By forming the parallel resonance patterns 121 to 124 by such a process, adjustment of the relative arrangement of the parallel resonance patterns 121 to 124 with respect to the antenna pattern 110 becomes extremely easy. The antenna pattern 110 may be formed by an etching method, a printing method, a punching method, or the like.

The antenna pattern 110 includes a spiral part 111 and an extraction electrode part 112. The spiral portion 111 is a conductor pattern configured by arranging a plurality of linear portions 111 _{S1 to} 111 _S12 in a spiral shape, and the inner peripheral end 111a is connected to the extraction electrode portion 112, and the outer peripheral end 111b is used as a power supply terminal P1. Used. Each linear portion 111 _{S1 to} 111 _S12 is sandwiched between sections where the conductor width is W1 (first conductor width), and the enlarged portion 111 _S1W where the conductor width is W2 (second conductor width. W2> W1). _{-111 S12W} respectively. Details of the configuration of each of the straight portions 111 _{S1 to} 111 _S12 will be described later.

  The lead electrode portion 112 contacts the inner peripheral end 111 a of the spiral portion 111 and is capacitively coupled to the lead wiring pattern 130. In order to make the capacitance value for this capacitive coupling sufficient, it is preferable that the area of the extraction electrode portion 112 is relatively wide.

The lead wiring pattern 130 has a shape in which a straight lead conductor pattern 132 is added to the coupling conductor pattern 131 having the same shape and the same size as the lead electrode portion 112. In the present embodiment, the coupling conductor pattern 131 is disposed so as to overlap the extraction electrode portion 112 in order to ensure a sufficient capacitance value. The lead conductor pattern 132 is introduced to the end of the planar antenna element 100 across the straight portion 110 _S8 and the straight portion 110 _S4 . The end portion 132a of the lead conductor pattern 132 located at the end of the planar antenna element 100 is used as the power feeding terminal P2.

Note that capacitive coupling also occurs between the lead conductor pattern 132 and the straight portions 110 _S8 and 110 _S4 . In order to minimize the influence of this capacitive coupling on the special characteristics of the planar antenna element 100 as a whole, the conductor width of the lead-out conductor pattern 132 is preferably as thin as possible.

  In the present embodiment, the extraction electrode portion 112 and the extraction wiring pattern 130 are capacitively coupled. However, inductive coupling or coupling by contact may be used. When inductive coupling is used, the extraction electrode portion 112 and the coupling conductor pattern 131 may each be a spiral planar coil. Further, without using the lead wiring pattern 130, the lead pin with spring and the lead electrode portion 112 may be directly conducted.

The parallel resonance patterns 121 to 124 are rectangular conductor patterns having a width WP1 and a length WP2 in the present embodiment, and a portion located relatively on the inner peripheral side and a portion located relatively on the outer peripheral side of the spiral portion 111. And are capacitively coupled. Specifically, the parallel resonance pattern 121 is disposed across the straight portions 111 _S1 , 111 _S5 , and 111 _S9 and capacitively couples them. Similarly, the parallel resonance pattern 122 is disposed across the straight portions 111 _S2 , 111 _S6 , and 111 _S10 and capacitively couples them. The parallel resonance pattern 123 is disposed across the straight portions 111 _S3 , 111 _S7 , and 111 _S11 and capacitively couples them. The parallel resonance pattern 124 is disposed across the straight portions 111 _S4 , 111 _S8 , and 111 _S12 and capacitively couples them.

  FIG. 4 is an equivalent circuit diagram of the planar antenna element 100 according to the present embodiment.

  Due to the above-described capacitive coupling by the parallel resonance patterns 121 to 124 and the lead-out wiring pattern 130, the antenna pattern 110 has capacitors C1 to C12 and C31 to C33 as shown in FIG. Due to these capacitors, the antenna pattern 110 itself has a large capacitor. As a result, a resonance frequency in the low frequency region (about 13.56 MHz) can be obtained with a relatively small antenna pattern.

  Further, in the present embodiment, since the parallel resonance patterns 121 to 124 are arranged substantially symmetrically in the horizontal direction, the parallel resonance patterns 121 to 124 are distributed substantially uniformly in the circumferential direction of the antenna pattern 110. Become. As a result, the bias of the electromagnetic waves radiated from the antenna pattern 110 is reduced, and the interference of the electromagnetic waves radiated by the parallel resonance patterns 121 to 124 is suppressed. In addition, since the parallel resonance patterns 121 to 124 are arranged at substantially the center of each straight line portion, it is possible to reduce the loss caused by the parallel resonance patterns 121 to 124. That is, in the antenna pattern 110, the magnetic field at the corner portion is the strongest, but the parallel resonance patterns 121 to 124 arranged at substantially the center of each linear portion do not hinder the radiation of the electromagnetic wave at the corner portion. Can be reduced.

  Next, a method for manufacturing the planar antenna element 100 will be described.

  FIG. 5 is a flowchart of a method for manufacturing the planar antenna element 100. First, the antenna pattern 110 and the lead wiring pattern 130 are formed on the insulating film 101 (step S1). Note that the conductor length, conductor width, conductor pitch, and the like of the antenna pattern 110 and the lead wiring pattern 130 need to be designed in advance so that the resonance frequency at step S1 is higher than the target resonance frequency.

  Next, the resonance frequency of the antenna pattern 110 is measured (step S2). The measurement in step S2 is preferably performed using an impedance analyzer or a network analyzer. That is, the impedance for each frequency of the antenna pattern 110 is acquired by measuring the characteristics of the antenna pattern using an impedance analyzer or a network analyzer. The frequency at which the real part of this impedance has a peak value is the resonance frequency.

  When the resonance frequency is obtained in step S2, the resonance frequency is compared with the target resonance frequency to determine whether the difference is within a predetermined value (step S3). If it is within the predetermined value, the manufacturing is completed. On the other hand, if it is not within the predetermined value, a capacitance value (hereinafter referred to as an additional capacitance value) that needs to be added to the antenna pattern 110 in order to lower the resonance frequency is calculated (step S4). At this time, if a table showing the relationship between the additional capacitance value and the amount of change in frequency is created in advance, the required additional capacitance value can be quickly determined. When the additional capacitance value is determined, at least a part of the parallel resonance patterns 121 to 124 is pasted on the antenna pattern 110 so as to obtain this additional capacitance value (step S5).

  When step S5 is completed, the characteristics of the antenna pattern are measured again using an impedance analyzer, and the adjusted frequency is confirmed (steps S2 and S3). If the adjustment is not sufficient, an additional capacitance value is calculated and a parallel resonance pattern is added (steps S4 and S5).

  Once the planar antenna element 100 is manufactured through the above steps, the antenna pattern 110, the lead-out wiring pattern 130, and the parallel resonance patterns 121 to 124 can be subsequently mass-produced.

Here, details of construction of the linear portion ₁₁₁ S1 _{- 111 S12.} In the following description, attention is paid to the region B (straight line portions 111 _S2 , 111 _S6 , 111 _S10 ) in FIG. 1, but the same applies to other regions.

  6 and 7 are enlarged views of region B in FIG. In these figures and the subsequent figures, the hatching of the parallel resonance pattern is omitted for easy viewing.

As shown in FIG. _6A , each of the straight portions 111 _S2 , 111 _S6 , and 111 _S10 is sandwiched between sections where the conductor width is W1, and the enlarged portions (111 _S2W and 111 _S6W where the conductor width is W2). , 111 _S10W ). The lengths of the enlarged portions 111 _S2W , 111 _S6W , and 111 _S10W are the same and are WP1 × 2.

On the other hand, the positions of the enlarged portions 111 _S2W , 111 _S6W , and 111 _S10W are different between the straight portion 111 _S6 and the other straight portions. Specifically, the enlarged portion 111 _S6W of the straight line portion 111 _S6 is compared with the enlarged portions 111 _S2W and 111 _S10W of the straight line portions 111 _S2 and 111 _S10 by the shift amount WP1 (= the width of the parallel resonance pattern 122). It is shifted and located closer to the outer peripheral end 111b. This positional shift is intended to enable a fine adjustment of the resonance frequency.

  Note that the amount of shift of the enlarged portion does not necessarily have to be equal to the width of the parallel resonance pattern 122, and it is only necessary that the enlarged portions overlap each other in the radial direction of the antenna pattern 110. In particular, if the amount of deviation is slightly larger than the width of the parallel resonance pattern 122, when the parallel resonance pattern 122 is pasted to adjust the resonance frequency, the deviation of the additional capacitance value is reduced even if the position is slightly displaced. Is more preferable.

Hereinafter, an example of the relative arrangement of the parallel resonance pattern 122 with respect to the antenna pattern 110 and the additional capacitance value thereof will be described. In the following, for the sake of simplicity of description, the area ratio of the overlapped region is approximated (FIG. 6 ( In the case of a), the area is assumed to be 300. This is because the additional capacitance value is substantially proportional to the area of the overlapping region of the antenna pattern 110 and the parallel resonance pattern 122. In calculating the additional capacitance value, it is assumed that W2 = 4 × W1. The length between the length WP2 parallel resonance pattern 122 includes an outer end of the enlarged portion _{111 S2W} (FIG upper end in such 6) and enlarged portion ₁₁₁ inside end of _S10W (lower end in FIG. 6, etc.) Is equal to

In FIG. _6A , the parallel resonance pattern 122 is arranged with the left end aligned with the left ends of the enlarged portion 111 _S2W and the enlarged portion 111 _S10W and the lower end aligned with the inner end of the enlarged portion 111 _S10W . In such an arrangement, the overlapping areas of the enlarged portions and the parallel resonance pattern 122 are the same, and this area is set to 100 below. Therefore, the additional capacitance value obtained by the arrangement shown in FIG. 6A is 100 × 3 = 300.

In FIG. 6B, the parallel resonance pattern 122 is arranged with the left end aligned with the left end of the enlarged portion 111 _S6W and the lower end aligned with the inner end of the enlarged portion 111 _S10W . As a result, as shown in the figure, the parallel resonance pattern 122 is located on the enlarged portion of the conductor width W2 in the relationship with the straight portion 111 _S6 , but the conductor width W1 in the relationship with the straight portions 111 _S2 and 111 _S10. It will be located on the part of. Therefore, since W2 = 4 × W1 here, the additional capacitance value obtained by the arrangement of FIG. 6B is 100 + 25 × 2 = 150.

In FIG. 7A, the parallel resonance pattern 122 is arranged with the right end aligned with the right _ends of the enlarged portion 111 _S2W and the enlarged portion 111 _S10W and the lower end aligned with the inner end of the enlarged portion 111 _S10W . As a result, as shown in the figure, the parallel resonance pattern 122 is located on the enlarged portion of the conductor width W2 in relation to the straight portions 111 _S2 and 111 _S10 , but in the relationship with the straight portion 111 _S6 , the conductor width W1. It will be located on the part of. The overlapping areas of the enlarged portion 111 _{S2W, the} enlarged portion 111 _S10W, and the parallel resonance pattern 122 are the same. Therefore, the additional capacitance value obtained by the arrangement of FIG. 7A is 100 × 2 + 25 = 225.

In FIG. 7 (b), the parallel resonance pattern 122 is formed by aligning the right end with WP1 / 2 leftward from the right ends of the enlargement unit 111 _S1W and the enlargement unit 111 _S1W and aligning the lower end with the inner end of the enlargement unit 111 _S10W. Is arranged. As a result, as shown in the figure, the parallel resonance pattern 122 is located on the enlarged portion of the conductor width W2 in the relationship with the straight portions 111 _S2 and 111 _S10 , but in the relationship with the straight portion 111 _S6 , the left side WP1 / Two minutes are positioned on the enlarged portion of the conductor width W2, and the right side WP1 / 2 is positioned on the portion of the conductor width W1. The overlapping area of the enlarged portion 111 _{S2W, the} enlarged portion 111 _S10W, and the parallel resonance pattern 122 is the same, and the overlapping area of the enlarged portion 111 _S6W is smaller. Therefore, the additional capacitance value obtained by the arrangement of FIG. 7B is 100 × 2 + (50 + 12.5) = 262.5.

  Although four patterns are shown in FIGS. 6 and 7, other examples of the relative arrangement of the parallel resonance pattern 122 with respect to the antenna pattern 110 can be considered infinitely. When the parallel resonance pattern 122 is moved only in the circumferential direction of the spiral portion 111 (lateral direction in FIGS. 6 and 7) without inclining the angle of the parallel resonance pattern 122, the additional capacitance value is the minimum value 25 × 3 = 75 (in the case where the parallel resonance pattern 122 is not on each enlarged portion) to a maximum value 300 (in the case of FIG. 6A), and may change in small increments between these values.

As described above, in the planar antenna element 100 according to the present embodiment, the additional capacitance value can be adjusted relatively small by adjusting the relative arrangement of the parallel resonance patterns 121 to 124 with respect to the antenna pattern 110. Yes. _Further, by providing the enlarged portions 111 _{S1W to} 111 _S12W in the linear portions 111 _{S1 to} 111 _S12 , the additional capacitance value can be adjusted relatively large. As a result, the resonant frequency of the planar antenna element 100 can be adjusted relatively large and in small increments.

_Further, by providing the enlarged portions 111 _{S1W to} 111 _S12W , it is possible to adjust the resonant frequency of the planar antenna element 100 only by translating the parallel resonant patterns 121 to 124 near the enlarged portion (without tilting). Therefore, the angle adjustment of the parallel resonance patterns 121 to 124 is not necessary, and the process is simplified.

In the above-described embodiment, the length WP2 of the parallel resonance pattern 122 has been described as being equal to the length between the outer end of the enlarged portion 111 _S2W and the inner end of the enlarged portion 111 _S10W. The length need not be, for example, a shorter parallel resonance pattern 122 may be used.

  FIG. 8 shows an example in which the length of the parallel resonance pattern 122 is half that of the above embodiment. The additional capacitance value in the arrangement example of FIG. 8A is about 138, and the additional capacitance value in the arrangement example of FIG. Thus, even if the length of the parallel resonance pattern 122 is halved, the resonance frequency can be adjusted by adjusting the relative arrangement of the parallel resonance patterns 121 to 124 with respect to the antenna pattern 110. In addition, compared with the parallel resonance pattern described in the above embodiment, the area of the parallel resonance pattern according to the present modification is smaller as a whole, so that the interference of radiated electromagnetic waves by the parallel resonance pattern is suppressed. Further, since the area is small, the resonance frequency can be adjusted with finer accuracy. Furthermore, even if the positional deviation of the parallel pattern 122 occurs, the deviation of the additional capacitance value caused by the positional deviation can be reduced.

  Moreover, in the said embodiment, although the parallel resonance pattern was arrange | positioned at right angles to each linear part, you may arrange | position the parallel resonance pattern inclining with respect to each linear part.

  FIG. 9 is an example in which the parallel resonance pattern 122 is arranged so as to be inclined with respect to each linear portion. The additional capacitance value in the arrangement example of FIG. 9A is about 270, and the additional capacitance value in the arrangement example of FIG. 9B is about 177. In the arrangement example of FIG. 9B, the overlapping areas of the enlarged portions and the parallel resonance pattern 122 are different from each other. As described above, even if the parallel resonance pattern 122 is arranged so as to be inclined with respect to each straight line portion, the resonance frequency can be adjusted by adjusting the relative arrangement of the parallel resonance patterns 121 to 124 with respect to the antenna pattern 110. . The resonance frequency can also be adjusted by adjusting the inclination of the parallel resonance pattern with respect to the straight line portion.

In the above embodiment has been installed an enlarged portion to all of the linear portion 111 _S1 - 111 _S12, it is also possible to install the enlarged portion only on a part of the straight portion.

FIG. 10A is an example in which the enlarged portion 111 _S6W is installed only in the straight portion 111 _S6 out of the straight portions 111 _S2 , 111 _S6 , and 111 _S10 , and the enlarged portion is not installed in the straight portions 111 _S2 and 111 _S10. . Even in this case, the resonance frequency can be adjusted by adjusting the relative arrangement of the parallel resonance patterns 121 to 124 with respect to the antenna pattern 110. Further, compared to the example in which the enlarged portions are provided in all the straight portions, the antenna pattern according to the present modification has a smaller area as a whole, so that the interference of radiated electromagnetic waves by the antenna pattern is suppressed.

  Moreover, although the length of each enlarged part was made the same in the said embodiment, the length of each enlarged part may differ.

FIG. 10B is an example in which the length of the enlarged portion is increased in the order of the enlarged portion 111 _S2W , the enlarged portion 111 _S6W , and the enlarged portion 111 _S10W . Even in this case, the resonance frequency can be adjusted by adjusting the relative arrangement of the parallel resonance patterns 121 to 124 with respect to the antenna pattern 110.

Note that the antenna pattern shown in FIG. 10A and the antenna pattern shown in FIG. 10B may be used in combination. For example, the linear portions 111 _S2 , 111 _S6 , 111 _S10 and the linear portions 111 _S4 , 111 _S8 , 111 _S12 are provided with enlarged portions as shown in FIG. 10A, and the linear portions 111 _S1 , 111 _S5 , 111 _S9 and the linear portions An enlarged portion as shown in FIG. 10B is provided in 111 _S3 , 111 _S7 , and 111 _S11 . If both types of antenna patterns are provided in this way, the portion to which the antenna pattern shown in FIG. 10B is applied is used for coarse adjustment, and the portion to which the antenna pattern shown in FIG. It is possible to adjust the resonance frequency rich in flexibility, such as for fine adjustment.

[Second Embodiment]
In the first embodiment, by providing an enlarged portion in the straight portion of the spiral portion 111, the resonance frequency of the planar antenna element 100 can be adjusted relatively large and in small increments. A rectangular conductor pattern was used for the parallel resonance patterns 121 to 124. In the present embodiment, the same resonance frequency adjustment is realized by improving the shape of the parallel resonance patterns 121 to 124 instead of providing an enlarged portion in the linear portion of the spiral portion 111.

  The overall structure and manufacturing method of the planar antenna element 100 according to the present embodiment are the same as those described in the first embodiment except that the spiral portion 111 does not have an enlarged portion. Omitted.

FIG. 11 is an enlarged view of a portion corresponding to the region B in FIG. In the following description, the description will focus on the region B (straight line portions 111 _S2 , 111 _S6 , 111 _S10 ) in FIG. 1, but the same applies to other regions.

As shown in FIG. 11, in this example, an enlarged portion is not provided in each linear portion, and instead, the shape of the parallel resonance pattern 122 is different from that of the first embodiment. Specifically, the parallel resonance pattern 122 is a linear conductor pattern having a conductor width of WP3 (third conductor width), and has a conductor width of WP4 (fourth conductor width) at the end and the center thereof. It is configured to include an enlarged portion 122a where WP4> WP3). Further, the length WP5 of the parallel resonance pattern 122 is equal to the length between the outer end (upper end in FIG. 11) of the linear portion 111 _S2 and the inner end (lower end in FIG. 11) of the enlarged portion 111 _S10 . It has become.

The interval between the enlarged portions 122a is equal to the conductor pitch W3 of the spiral portion 111. Further, the length of the enlarged portion 122a is equal to the conductor width W1 of the spiral portion 111. Therefore, when the parallel resonance pattern 122 is arranged with one end aligned with the inner end of the enlarged portion 111 _S10 , as shown in FIG. 11A, the enlarged portion 122a and each of the straight portions 111 _S2 , 111 _S6 , 111 _S10 are formed. Just overlap each other. If WP4 = WP2 and the additional capacitance value is calculated in the same manner as in FIG. 6, then 25 × 3 = 75.

FIG. 11B shows a state in which the parallel resonance pattern 122 is shifted by W <b> 1 outward in the radial direction of the spiral portion 111. At this time, the enlargement unit 111 _S10 is not capacitively coupled to the enlargement unit 111 _S2 and the enlargement unit 111 _S6 . Assuming that WP3 = WP4 / 4, the additional capacitance value is 6.25 × 2 = 12.5.

  Although two patterns are shown in FIG. 11, other examples of the relative arrangement of the parallel resonance pattern 122 with respect to the antenna pattern 110 can be considered infinitely. When the parallel resonance pattern 122 is moved only in the radial direction (vertical direction in the drawing) of the spiral portion 111 without inclining the angle of the parallel resonance pattern 122, the additional capacitance value is the minimum value 12.5 (FIG. 11B). ) To a maximum value of 75 (in the case of FIG. 11A), and may change in small increments between these values.

  As described above, in the planar antenna element 100 according to the present embodiment, the enlarged portions 121a to 124a (the enlarged portions 121a, 123a, and 124a are not shown) are provided in the parallel resonance patterns 121 to 124, and thus the antenna. By adjusting the relative arrangement of the parallel resonance patterns 121 to 124 with respect to the pattern 110, the additional capacitance value can be adjusted relatively large and in small increments. Accordingly, the resonant frequency of the planar antenna element 100 is also relatively large and can be adjusted in small increments.

  Further, by providing the enlarged portions 121a to 124a, the resonant frequency of the planar antenna element 100 can be adjusted only by translating the parallel resonant patterns 121 to 124 in the radial direction of the spiral portion 111 (without tilting). Since it is possible, the angle adjustment of the parallel resonance patterns 121 to 124 is unnecessary, and the process is simplified.

  Furthermore, compared with the parallel resonance pattern described in the first embodiment, the parallel resonance pattern described in this embodiment has a smaller area as a whole, and therefore, the interference of radiated electromagnetic waves by the parallel resonance pattern is suppressed. The In addition, since it is not necessary to provide an enlarged portion in the antenna pattern, the resonance frequency can be adjusted as necessary even in a conventional planar antenna element without an enlarged portion (see FIGS. 12 to 14 described later). The same applies to the example.)

  The parallel resonance patterns 121 to 124 can take various shapes other than the shapes shown in the above embodiment. Hereinafter, two modified examples of the shape of the parallel resonance patterns 121 to 124 will be described.

  The parallel resonance pattern 122 of FIG. 12 has enlarged portions 122a-1 and 122a-2 only at the ends. The length of the inner enlarged portion 122a-1 is W1 as in the above embodiment, but the length of the outer enlarged portion 122a-2 is WP6 (> W1). Assuming that WP4 = WP2 and WP3 = WP4 / 4, the additional capacitance value is 25 × 2 + 6.25 = 56.25 in FIG. 12A and 25 + 6.25 = 31.25 in FIG.

  In the parallel resonance pattern 122 of FIG. 13, the conductor width of the inner end portion is WP4 and the conductor width of the outer end portion is WP3, and the conductor width continuously decreases monotonically from the inner end portion to the outer end portion. The additional capacity value is about 42 in FIG. 13A and about 48 in FIG. 13B when WP4 = WP2 and WP3 = WP4 / 4.

  As mentioned above, although preferable embodiment of this invention was described, this invention is not limited to such embodiment at all, and this invention can be implemented in various aspects in the range which does not deviate from the summary. Of course.

  For example, the relative arrangement of the parallel resonance pattern with respect to the antenna pattern can also be changed by tilting the parallel resonance pattern, and the resonance frequency can be adjusted also by this.

  FIG. 14 shows an example of such a case. In the example of FIG. 14, the enlarged portion is not provided in the linear portion of the spiral portion 111, and the same parallel resonance pattern as that of the first embodiment is used. FIG. 14A shows a state where the parallel resonance pattern is not tilted, and FIG. 14B shows a state where the parallel resonance pattern is tilted by θ = 40 °. The additional capacitance value is 25 × 3 = 75 in FIG. 14A, and is about 84 in FIG. 14B. Thus, the resonance frequency can be adjusted by tilting the parallel resonance pattern.

  Moreover, it is good also as changing a conductor width per linear part instead of making a part of each linear part into an enlarged part.

FIG. 15 shows an example of such a case. Spiral part of the example of FIG. 15 111 has an example as well as 3 laps straight section ₁₁₁ S1 _{- 111 S12} of that shown in FIG. 1, the linear portion ₁₁₁ S1 of first round counted from the outside to 111 The conductor width of _S4 is W2, the conductor width of the second straight portion 111 _{S5 to} 111 _S8 is W3 (W1 <W3 <W2), and the conductor width of the third straight portion 111 _{S9 to} 111 _S12 is W1. Yes. The parallel resonance patterns 121 to 124 have a length between the outer end (the left end in FIG. 15) of the straight portion 111 _S1 and the inner end (the right end in FIG. 15) of the straight portion 111 _S5 . Use the same one.

  By doing in this way, it becomes possible to adjust a resonant frequency by adjusting suitably the position of each parallel resonant pattern 121-124 with respect to the radial direction of the spiral part 111. FIG.

  It is also possible to adjust the resonance frequency by using the lead wiring pattern 130 as one of the parallel resonance patterns. For example, in the planar antenna element 100 shown in FIGS. 16 and 17, the lead-out wiring pattern 130 is slightly shifted to the right side of the drawing compared to the planar antenna element 100 shown in FIG. Since the capacitance of the capacitor (capacitor C31 shown in FIG. 4) formed by the coupling conductor pattern 131 in the lead-out wiring pattern 130 is changed by shifting the lead-out wiring pattern 130 in this way, the resonance frequency can also be adjusted. It becomes.

  In the above description, the parallel resonance patterns 121 to 124 and the lead-out wiring pattern 130 are formed on the antenna pattern 110. However, the parallel resonance patterns 121 to 124 and the lead wiring pattern 130 do not necessarily have to be on each other. It ’s enough.

  FIG. 18 and FIG. 19A are examples in which the parallel resonance patterns 121 to 124 and the lead wiring pattern 130 are formed below the antenna pattern 110 in the planar antenna element 100 shown in FIG. 1 and FIG. FIG. 19A is a schematic cross-sectional view along the line DD ′ shown in FIG.

  In the planar antenna element 100 shown in FIGS. 18 and 19A, a parallel resonance pattern can be further pasted on the antenna pattern 110. FIG. 19B shows a state where such a parallel resonance pattern 125 is pasted. According to this, the resonance frequency of the planar antenna element 100 can be adjusted by adjusting the relative arrangement of the parallel resonance pattern 125 with respect to the antenna pattern 110.

1 is a schematic plan view showing a structure of a planar antenna element according to a first embodiment of the present invention. FIG. 2 is a schematic cross-sectional view taken along line AA ′ shown in FIG. 1. It is a block diagram of the non-contact IC tag using the planar antenna element by the 1st Embodiment of this invention. 1 is an equivalent circuit diagram of a planar antenna element according to a first embodiment of the present invention. It is a flowchart of the manufacturing method of the planar antenna element by the 1st Embodiment of this invention. It is an enlarged view of the area | region B of FIG. (A) and (b) differ in the relative arrangement of the parallel resonance pattern with respect to the antenna pattern. It is an enlarged view of the area | region B of FIG. (A) and (b) differ in the relative arrangement of the parallel resonance pattern with respect to the antenna pattern. It is an enlarged view of the part corresponding to the area | region B of FIG. 1 by the modification of the 1st Embodiment of this invention. (A) and (b) differ in the relative arrangement of the parallel resonance pattern with respect to the antenna pattern. It is an enlarged view of the part corresponding to the area | region B of FIG. 1 by the other modification of the 1st Embodiment of this invention. (A) and (b) differ in the relative arrangement of the parallel resonance pattern with respect to the antenna pattern. (A) is the enlarged view of the part corresponding to the area | region B of FIG. 1 by the further another modification of the 1st Embodiment of this invention. (B) is the enlarged view of the part corresponding to the area | region B of FIG. 1 by the further another modification of the 1st Embodiment of this invention. FIG. 6 is an enlarged view of a portion corresponding to a region B in FIG. 1 according to the second embodiment of the present invention. (A) and (b) differ in the relative arrangement of the parallel resonance pattern with respect to the antenna pattern. It is an enlarged view of the part corresponding to the area | region B of FIG. 1 by the modification of the 2nd Embodiment of this invention. (A) and (b) differ in the relative arrangement of the parallel resonance pattern with respect to the antenna pattern. It is an enlarged view of the part corresponding to the area | region B of FIG. 1 by the other modification of the 2nd Embodiment of this invention. (A) and (b) differ in the relative arrangement of the parallel resonance pattern with respect to the antenna pattern. FIG. 7 is an enlarged view of a portion corresponding to region B of FIG. 1 according to a further modification of the present invention. (A) and (b) differ in the relative arrangement of the parallel resonance pattern with respect to the antenna pattern. It is a schematic plan view showing the structure of a planar antenna element according to a further modification of the present invention. It is a schematic plan view showing the structure of a planar antenna element according to a further modification of the present invention. FIG. 17 is a schematic cross-sectional view along the line CC ′ shown in FIG. 16. It is a schematic plan view showing the structure of a planar antenna element according to a further modification of the present invention. FIG. 19 is a schematic cross-sectional view along the line DD ′ shown in FIG. 18.

Explanation of symbols

C1 to C12, C31 to C33 Capacitors P1 and P2 Feeding terminal 50 Transmission / reception circuit 100 Planar antenna element 101 Insulating film 110 Antenna pattern 111 Spiral part 111 _{S1 to} 111 _S12 Linear part 111 _{S1W to} 111 _S12W Enlarged part 111a Inner peripheral end 111b Outer periphery End 112 Lead electrode parts 121 to 125 Parallel resonance patterns 121a to 124a Enlarged part 130 Lead wiring pattern 131 Coupling conductor pattern 132 Leading conductor pattern 132a End part 190 Adhesive layer

Claims (6)

A method of manufacturing a planar antenna element,
Forming an antenna pattern;
Forming a parallel resonant pattern of a predetermined shape for capacitively coupling a portion located on the relatively inner periphery side and a portion located on the relatively outer periphery side of the antenna pattern in a layer different from the antenna pattern;
With
A manufacturing method comprising adjusting a resonance frequency of the planar antenna element by adjusting a relative arrangement of the parallel resonance pattern with respect to the antenna pattern. A planar antenna element manufactured by the manufacturing method according to claim 1,
The antenna pattern has a spiral part,
The planar antenna element, wherein the spiral portion includes a portion having a first conductor width and a portion having a second conductor width wider than the first conductor width. A planar antenna element manufactured by the manufacturing method according to claim 1,
The planar antenna element, wherein the parallel resonance pattern includes a portion having a third conductor width and a portion having a fourth conductor width wider than the third conductor width. An antenna pattern having a spiral portion including a portion having a first conductor width and a portion having a second conductor width wider than the first conductor width;
A parallel resonant pattern having a predetermined shape that is formed in a layer different from the antenna pattern and capacitively couples a portion located on the relatively inner peripheral side and a portion located on the relatively outer peripheral side of the spiral portion. A planar antenna element characterized by the above. The spiral portion includes a first straight portion, a second straight portion that is adjacent to the first straight portion and is located on the inner peripheral side relative to the first straight portion, and the second straight portion. A third linear portion that is adjacent to the portion and positioned relatively on the inner peripheral side with respect to the second linear portion,
5. At least one of the first to third straight portions has an enlarged portion that is the second conductor width sandwiched between sections that are the first conductor width. The planar antenna element according to 1. Each of the first to third straight portions has an enlarged portion that is the second conductor width sandwiched between sections that are the first conductor width,
5. The planar antenna according to claim 4, wherein at least one of a length or a position of the enlarged portion is different between any one of the first to third linear portions and the other. element.

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