JP2009289338A - Magnetic recording medium and manufacturing method thereof - Google Patents

Magnetic recording medium and manufacturing method thereof Download PDF

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Publication number
JP2009289338A
JP2009289338A JP2008141074A JP2008141074A JP2009289338A JP 2009289338 A JP2009289338 A JP 2009289338A JP 2008141074 A JP2008141074 A JP 2008141074A JP 2008141074 A JP2008141074 A JP 2008141074A JP 2009289338 A JP2009289338 A JP 2009289338A
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Prior art keywords
magnetic recording
recording medium
processing
substrate
manufacturing
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Japanese (ja)
Inventor
Takahiro Shimizu
貴宏 清水
Takao Iihama
孝雄 飯濱
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Fuji Electric Co Ltd
Taiyo Co Ltd
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Fuji Electric Device Technology Co Ltd
Taiyo Co Ltd
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Priority to JP2008141074A priority Critical patent/JP2009289338A/en
Publication of JP2009289338A publication Critical patent/JP2009289338A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method for manufacturing a perpendicular magnetic recording medium with stable product quality by organizing a production apparatus to conduct stable surface working and a manufacturing method to install the surface working in-line immediately before a sputtering step. <P>SOLUTION: A working apparatus 3 to simultaneously work a plurality of substrates is made to synchronize with production capacity of the following step and made in-line, in a substrate working step of the perpendicular magnetic recording medium. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明はコンピュータの外部記録装置をはじめとする各種磁気記録装置に搭載される磁気記録媒体及びその製造方法に関する。   The present invention relates to a magnetic recording medium mounted on various magnetic recording devices including an external recording device of a computer and a method for manufacturing the same.

高い記録密度と低ノイズが要求される磁気記録媒体では、近年長手記録方式から垂直記録方式への転換が行われている。   In recent years, magnetic recording media that require high recording density and low noise have been switched from the longitudinal recording method to the perpendicular recording method.

垂直記録における特長としては、磁性を配行させる為の基板表面の特種形状は必要なく、磁気ヘッドを安定浮上させる為一定に管理された鏡面且つ均一な基板表面が必要であり、従来のテクスチュア工程による低粗さ且つ均一な表面加工による制御や、バッチ式の基板加工(表面研磨機)で表面品質をコントロールしテクスチュア工程を省略して磁性成膜する方法が多く採用されている(例えば、特許文献1参照)。   The special feature of perpendicular recording is that there is no need for a special shape on the surface of the substrate to distribute magnetism, and that a mirror surface and a uniform substrate surface that are uniformly controlled are required to stably float the magnetic head. Many methods have been adopted to control the surface quality with low roughness and uniform surface processing by using, and to control the surface quality by batch-type substrate processing (surface polishing machine) and omit the texture process to form a magnetic film (for example, patents) Reference 1).

特開2001−62704号公報JP 2001-62704 A

高記録密度を要する垂直磁気記録媒体において、基板表面加工時に発生する異方性を持った加工痕や加工ムラは、スパッタ工程での磁性膜の配向に悪影響を与え、電磁変換における記録エラーの基となる欠陥を作る原因となっている。又、加工痕や加工ムラにより磁気ヘッドの浮上特性も悪化させてしまい、この結果目的とする特性を得ることが出来なくなり、特に量産工程ではバラツキとして欠陥が発生する為に安定した製品品質の確保が困難である。   In perpendicular magnetic recording media that require high recording density, anisotropic processing marks and processing irregularities that occur during substrate surface processing adversely affect the orientation of the magnetic film in the sputtering process, and cause recording errors in electromagnetic conversion. It is a cause of making a defect. In addition, the flying characteristics of the magnetic head deteriorate due to processing traces and processing unevenness, and as a result, the target characteristics cannot be obtained, and defects are generated as variations in the mass production process, ensuring stable product quality. Is difficult.

本発明は、安定した表面加工を行う生産装置と、それをスパッタ工程の直前にインラインで構成する製造方法の構築により、安定した製品品質の垂直磁気記録媒体が生産できる装置及びシステムを提供することを目的としている。   The present invention provides an apparatus and a system capable of producing a perpendicular magnetic recording medium having a stable product quality by constructing a production apparatus that performs stable surface processing and a manufacturing method in which it is configured in-line immediately before a sputtering process. It is an object.

上記課題を解決するため、本発明は、基板表面品質としては表面研磨面(ランダムな粗さを持つ鏡面)を実現させ、テクスチュア加工による円周方向の加工痕の発生をなくした。
また、基板表面を両面研磨する表面研磨装置の小型化及び、自動化を行い、1台当りの処理能力を最適化せると共に、パット交換等のダウンタイムの短縮を図り、従来バッチ式であった表面研磨工程を自動且つインラインで成膜前に整備し、安定した表面品質を得ることにより、高特性の垂直磁気記録媒体の製造方法を提供する。
In order to solve the above problems, the present invention realizes a surface polished surface (mirror surface with random roughness) as the substrate surface quality, and eliminates the occurrence of circumferential processing marks due to texture processing.
In addition, by reducing the size and automation of the surface polishing equipment for double-side polishing the substrate surface, the processing capacity per unit is optimized, and downtime such as pad replacement is shortened. By providing a polishing process automatically and in-line before film formation to obtain a stable surface quality, a method for producing a high-performance perpendicular magnetic recording medium is provided.

以下、本発明の最良の実施形態について、添付図面を参照しつつ説明する。
本発明は、図1に記す生産プロセスにおいて、表面加工を行う工程をインラインで行
うために、生産ラインの投入能力に合わせた加工機の配置を行い、能力バランスを取る事により後工程に直結した製造方法を提供する。
DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, exemplary embodiments of the invention will be described with reference to the accompanying drawings.
In the production process shown in FIG. 1, the present invention is directly connected to the subsequent process by arranging the processing machines according to the input capacity of the production line and balancing the capacity in order to perform the surface processing step in-line. A manufacturing method is provided.

工程の概要図を図2に記す。ここで使用する表面加工機は、専用パットを用い被加工基板の両面を同時に加工する装置であるが、パット面に詰まる加工砥粒の除去の為のドレッシング時間や、パット自体の交換が必要になる為、ラインに必要な出力にあわせ、ダウンタイムを考慮した上での設備台数の設定を行う。   A schematic diagram of the process is shown in FIG. The surface processing machine used here is a device that uses a dedicated pad to simultaneously process both sides of the substrate to be processed. However, it is necessary to replace the pad itself with the dressing time for removing processing abrasive grains clogging the pad surface. Therefore, the number of equipment is set in consideration of downtime according to the output required for the line.

ダウンタイムの短縮を行うために、加工装置の定盤サイズは600〜800mmの大きさ、望ましくは660mm程度の大きさとし、ドレッシング時間は、30sec/サイクル、パット交換は1台につき24時間当たり1回として、ダウンタイムを90分以下で出来る設計としている。   To reduce downtime, the platen size of the processing equipment is 600 to 800 mm, preferably about 660 mm, the dressing time is 30 sec / cycle, and the pad is changed once per 24 hours. As a design, the downtime is 90 minutes or less.

工程レイアウトの配置を考慮した場合、加工装置の大きさは出来るだけ小さい方が望ましく、又、高記録密度を要する垂直磁気記録媒体のスパッタ前工程としてインライン化することから、クリンルームクラス100の環境に対応する装置設計であり、専用カセットの自動供給、自動取り出しができる機構が提供される。   When considering the layout of the process layout, it is desirable that the size of the processing equipment be as small as possible, and because it is inlined as a pre-sputtering process for perpendicular magnetic recording media that require high recording density, it is a clean room class 100 environment. A mechanism that can automatically supply and take out a dedicated cassette is provided.

図3に表面加工装置の加工プロセスの概要を記す。インライン化を目的として同時加工する被加工基板の取れ数を、2.5インチガラス基板では専用カセット(25枚)単位での処理を特徴とし、表面加工機は専用カセットからの被加工基板の自動取り出し、自動供給、自動加工、自動洗浄を行った後、次工程に送るべく専用カセットに自動で収納する。これらの工程を一つの装置で行い、洗浄工程に関しては枚葉処理で1枚当り5秒の洗浄を2段で行う事が出来、加工から洗浄までは60秒で行うことを特徴とし、1カセット(25枚)当り350秒以下で処理することができる。   FIG. 3 shows an outline of the processing process of the surface processing apparatus. The number of substrates to be processed simultaneously for the purpose of in-line processing is characterized by processing in units of dedicated cassettes (25 sheets) with a 2.5 inch glass substrate, and the surface processing machine automatically takes out the substrates to be processed from the dedicated cassette, After automatic supply, automatic processing, and automatic cleaning, it is automatically stored in a dedicated cassette for sending to the next process. These processes are carried out with a single device, and with regard to the washing process, it is possible to carry out washing for 5 seconds per sheet in two stages, and processing to washing in 60 seconds. It can be processed in 350 seconds or less per (25 sheets).

なお、図6は従来の長手磁気記録媒体のAFM像を示し、図7は本発明で加工された垂直磁気記録媒体の基板表面のAFM像を示す。   6 shows an AFM image of a conventional longitudinal magnetic recording medium, and FIG. 7 shows an AFM image of the substrate surface of the perpendicular magnetic recording medium processed by the present invention.

本発明の一実施形態は、図4に示すとおり、基板加工機の自動インライン化を実現した工程であり、製品供給取り出しコンベアー2に供給された専用カセットに収納された基板を加工後自動ラインで後工程に供給する生産ラインである。   As shown in FIG. 4, an embodiment of the present invention is a process that realizes automatic in-line processing of a substrate processing machine, and a substrate stored in a dedicated cassette supplied to a product supply / delivery conveyor 2 is processed in an automatic line after processing. This is a production line that is supplied to a subsequent process.

製品供給取り出しコンベアー2には、加工前の基板入り専用カセットと、加工後の空カセットが返却され、加工前の基板入り専用カセットは自動搬送1により表面加工機3に自動供給される。   The product supply / delivery conveyor 2 is returned with a dedicated cassette containing a substrate before processing and an empty cassette after processing, and the dedicated cassette with a substrate before processing is automatically supplied to the surface processing machine 3 by automatic conveyance 1.

工程レイアウトは、例えば、幅約2.5m、長さ約15m、約38mで構成され、表面加工機4台の構成では時間当たり約1,000枚程度の処理能力を有する。
図5に示す表面加工機3は、上記小スペース高出力を可能にする為、例えば、幅約3.0m、奥行約1.7mの約5mで設計され、2.5インチ基板の処理能力としては時間260枚の加工を可能とする。
The process layout is composed of, for example, a width of about 2.5 m, a length of about 15 m, and about 38 m 2 , and the configuration of four surface processing machines has a processing capacity of about 1,000 per hour.
The surface processing machine 3 shown in FIG. 5 is designed with, for example, about 5 m 2 having a width of about 3.0 m and a depth of about 1.7 m in order to enable the above-mentioned small space and high output. As a result, it is possible to process 260 sheets per hour.

供給取り出しコンベアー2から供給された専用カセットに入った被加工基板は、自動搬送1により表面加工機3に供給される。   The substrate to be processed that has entered the dedicated cassette supplied from the supply / conveyor 2 is supplied to the surface processing machine 3 by the automatic conveyance 1.

表面加工機3の供給コンベアー4は自動搬送機より未加工の専用カセットを受け取り、枚葉処理で供給待機部5に被加工基板を自動供給し、空になった専用カセットを自動搬送機1に排出する。   The supply conveyor 4 of the surface processing machine 3 receives an unprocessed dedicated cassette from the automatic transfer machine, automatically supplies the substrate to be processed to the supply standby unit 5 by single wafer processing, and the empty dedicated cassette is supplied to the automatic transfer machine 1. Discharge.

自動搬送機1は空になった専用カセットを供給コンベアー4より受け取り、製品供給取り出しコンベアー2に自動返却される。   The automatic carrier 1 receives the empty dedicated cassette from the supply conveyor 4 and automatically returns it to the product supply / conveyor 2.

供給待機部5に枚葉供給された被加工基板は、此処で25枚のバッチに纏められ、一括供給により表面研磨部6に供給され、25枚処理で両面同時研磨が行われる。   The substrates to be processed supplied to the supply standby unit 5 are collected into 25 batches here, supplied to the surface polishing unit 6 by batch supply, and double-sided simultaneous polishing is performed by 25 sheets processing.

加工後の基板は25枚同時に排出待機部7に移動され、同時に未加工の被加工基板が供給待機部5から供給され加工サイクルが繰り返される。   Twenty-five substrates after processing are simultaneously moved to the discharge standby unit 7, and at the same time, unprocessed substrates are supplied from the supply standby unit 5 and the processing cycle is repeated.

排出待機部7に移動された基板は、此処から枚葉処置でスクラブ洗浄部8に供給され、2回のスクラブ洗浄が1枚ずつ自動で実施される。   The substrate moved to the discharge standby unit 7 is supplied from here to the scrub cleaning unit 8 by single wafer processing, and two scrub cleanings are automatically performed one by one.

カセット収納部10は水没による浸漬機構で構成され、自動搬送システム1により次工程から空の状態の25枚収納の専用カセットが供給され待機されている。此処に洗浄が終わった基板が排出コンベアー9により供給され、専用カセットに25枚供給された時点で、カセット収納部10より自動搬送システム1に移動され次工程に供給される。   The cassette storage unit 10 is composed of an immersion mechanism by submerging, and a dedicated cassette for storing 25 empty sheets is supplied from the next process by the automatic transfer system 1 and is in a standby state. The substrate after cleaning is supplied by the discharge conveyor 9 and when 25 sheets are supplied to the dedicated cassette, the substrate is moved from the cassette storage unit 10 to the automatic transfer system 1 and supplied to the next process.

以上述べたように、本発明によるインライン化した生産工程の実現により、高品質な垂直磁気記録媒体用基板の安定した生産が実現できる。   As described above, stable production of a high-quality perpendicular magnetic recording medium substrate can be realized by realizing an in-line production process according to the present invention.

本発明の垂直磁気記録媒体プロセスフロー概要図である。1 is a process flow schematic diagram of a perpendicular magnetic recording medium of the present invention. 本発明の工程概要図である。It is a process outline figure of the present invention. 表面加工機プロセス概要図である。It is a surface processing machine process schematic diagram. 本発明のレイアウト概要図である。It is a layout schematic diagram of the present invention. 表面加工機概要図である。It is a surface processing machine schematic diagram. 従来の長手磁気記録媒体の基板表面AFM像である。It is a substrate surface AFM image of a conventional longitudinal magnetic recording medium. 本発明により加工された垂直磁気記録媒体の基板表面AFM像である。It is a substrate surface AFM image of a perpendicular magnetic recording medium processed according to the present invention.

符号の説明Explanation of symbols

1 自動搬送システム
2 製品供給取り出しコンベアー
3 表面加工機
4 表面加工機供給コンベアー
5 表面加工機供給待機部
6 表面加工機加工部
7 表面加工機排出待機部
8 表面加工機スクラブ洗浄部
9 表面加工機排出コンベアー
10 カセット収納部
DESCRIPTION OF SYMBOLS 1 Automatic conveyance system 2 Product supply taking-out conveyor 3 Surface processing machine 4 Surface processing machine supply conveyor 5 Surface processing machine supply standby part 6 Surface processing machine processing part
7 Surface processing machine discharge standby section 8 Surface processing machine scrub cleaning section
9 Surface processing machine discharge conveyor 10 Cassette storage

Claims (4)

垂直磁気記録媒体の基板加工工程において、複数枚の基板を同時に加工する加工装置を後工程の生産能力に同期させインライン化することを特徴とする垂直磁気記録媒体の製造方法。   A manufacturing method of a perpendicular magnetic recording medium, wherein in a substrate processing step of a perpendicular magnetic recording medium, a processing apparatus for simultaneously processing a plurality of substrates is in-lined in synchronization with a production capacity of a subsequent process. 請求項1の製造方法に用いられる基板加工機であって、複数枚の基板を同時加工し、且つインライン化を可能とすることを特徴とする垂直磁気記録媒体の基板加工機。   2. A substrate processing machine for a perpendicular magnetic recording medium, wherein the substrate processing machine is used in the manufacturing method according to claim 1, wherein a plurality of substrates are simultaneously processed and can be inlined. 請求項2に記載の基板加工機を用いて表面を加工された、均一且つ等方性の表面品質を有する垂直磁気記録媒体用のアルミニウム製又はガラス製の基板。   An aluminum or glass substrate for a perpendicular magnetic recording medium having a uniform and isotropic surface quality, the surface of which is processed using the substrate processing machine according to claim 2. 請求項3に記載された基板が用いられ、密着層、軟磁性層、中間層、グラニュラー磁性層と保護膜及び液体潤滑剤層が順次積層されてなる磁気記録媒体。   A magnetic recording medium using the substrate according to claim 3, wherein an adhesion layer, a soft magnetic layer, an intermediate layer, a granular magnetic layer, a protective film, and a liquid lubricant layer are sequentially laminated.
JP2008141074A 2008-05-29 2008-05-29 Magnetic recording medium and manufacturing method thereof Pending JP2009289338A (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01237931A (en) * 1988-03-18 1989-09-22 Alps Electric Co Ltd Apparatus for producing magnetic recording medium
JPH0997428A (en) * 1995-09-29 1997-04-08 Kao Corp Production of magnetic recording medium
JP2001062704A (en) * 1999-08-30 2001-03-13 Fuji Electric Co Ltd Polishing cloth and surface polishing work method
WO2007114400A1 (en) * 2006-03-31 2007-10-11 Hoya Corporation Method for manufacturing vertical magnetic recording medium

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01237931A (en) * 1988-03-18 1989-09-22 Alps Electric Co Ltd Apparatus for producing magnetic recording medium
JPH0997428A (en) * 1995-09-29 1997-04-08 Kao Corp Production of magnetic recording medium
JP2001062704A (en) * 1999-08-30 2001-03-13 Fuji Electric Co Ltd Polishing cloth and surface polishing work method
WO2007114400A1 (en) * 2006-03-31 2007-10-11 Hoya Corporation Method for manufacturing vertical magnetic recording medium

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