JP2009271253A5 - - Google Patents
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- Publication number
- JP2009271253A5 JP2009271253A5 JP2008120530A JP2008120530A JP2009271253A5 JP 2009271253 A5 JP2009271253 A5 JP 2009271253A5 JP 2008120530 A JP2008120530 A JP 2008120530A JP 2008120530 A JP2008120530 A JP 2008120530A JP 2009271253 A5 JP2009271253 A5 JP 2009271253A5
- Authority
- JP
- Japan
- Prior art keywords
- resist composition
- immersion exposure
- cyclic ketone
- chain ether
- exposure according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 4
- 150000003997 cyclic ketones Chemical class 0.000 claims description 2
- 238000007654 immersion Methods 0.000 claims description 2
- 239000012046 mixed solvent Substances 0.000 claims description 2
- 238000006116 polymerization reaction Methods 0.000 claims description 2
- 239000002904 solvent Substances 0.000 claims description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008120530A JP2009271253A (ja) | 2008-05-02 | 2008-05-02 | 液浸露光用レジスト組成物及びそれを用いたパターン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008120530A JP2009271253A (ja) | 2008-05-02 | 2008-05-02 | 液浸露光用レジスト組成物及びそれを用いたパターン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009271253A JP2009271253A (ja) | 2009-11-19 |
| JP2009271253A5 true JP2009271253A5 (https=) | 2011-04-21 |
Family
ID=41437867
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008120530A Pending JP2009271253A (ja) | 2008-05-02 | 2008-05-02 | 液浸露光用レジスト組成物及びそれを用いたパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2009271253A (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5540757B2 (ja) * | 2010-02-18 | 2014-07-02 | Ｊｓｒ株式会社 | 重合体の製造方法 |
| TW201144933A (en) * | 2010-03-17 | 2011-12-16 | Jsr Corp | Radiation-sensitive resin composition and resist pattern formation method |
| JP2022088041A (ja) | 2020-12-02 | 2022-06-14 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006098733A (ja) * | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP4774302B2 (ja) * | 2005-01-24 | 2011-09-14 | 富士フイルム株式会社 | 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP2007017889A (ja) * | 2005-07-11 | 2007-01-25 | Fujifilm Corp | レジスト組成物及び該レジスト組成物を用いたパターン形成方法 |
| JP4524237B2 (ja) * | 2005-09-28 | 2010-08-11 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP2007140188A (ja) * | 2005-11-18 | 2007-06-07 | Fujifilm Corp | ポジ型感光性組成物及びそれを用いたパターン形成方法 |
| JP4991326B2 (ja) * | 2006-01-24 | 2012-08-01 | 富士フイルム株式会社 | ポジ型感光性組成物及びそれを用いたパターン形成方法 |
-
2008
- 2008-05-02 JP JP2008120530A patent/JP2009271253A/ja active Pending
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